WO2009144110A1 - Procede de refroidissement d'un plasma micro-onde et systeme de destruction selective de molecules chimiques utilisant ce procede - Google Patents
Procede de refroidissement d'un plasma micro-onde et systeme de destruction selective de molecules chimiques utilisant ce procede Download PDFInfo
- Publication number
- WO2009144110A1 WO2009144110A1 PCT/EP2009/055264 EP2009055264W WO2009144110A1 WO 2009144110 A1 WO2009144110 A1 WO 2009144110A1 EP 2009055264 W EP2009055264 W EP 2009055264W WO 2009144110 A1 WO2009144110 A1 WO 2009144110A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- fluid
- tube
- mixture
- cooling
- dielectric
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/4622—Microwave discharges using waveguides
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/463—Microwave discharges using antennas or applicators
Definitions
- the invention relates to a method for cooling a plasma treatment system of a fluid or a mixture of fluids, especially gaseous fluids, comprising means for coupling between a microwave power source and a mixture of particularly gaseous fluids circulating in a tube. dielectric at the level of the coupling means for transferring a portion of the microwave energy to the fluid mixture to create a plasma therein to cause the breaking of at least some of the chemical bonds of the fluid molecules, said tube dielectric being cooled by a circulation of a cooling fluid in thermal contact with the outer wall of the tube to be cooled.
- the invention also relates to a system for the selective destruction of chemical molecules using this cooling method.
- the multiple steps of making the semiconductor elements and their interconnections use gaseous substances used in ionic implants or etching and physical or chemical deposition reactors ( "PVD” or “CVD”).
- Some of these substances may be so-called greenhouse gases, that is to say, contributing to the global warming of the climate when they are present in the atmosphere, such as in particular certain fluorinated derivatives, in particular gases. known as “PFC” (perfluorinated gas) or “HFC” (hydrofluorocarbon gas) or certain fluids and in particular certain atmospheric pollutants immediately dangerous for life or health, and more particularly those that are toxic, corrosive, flammable, pyrophoric and / or explosive.
- PFC perfluorinated gas
- HFC hydrofluorocarbon gas
- the gas obtained comprises a small amount of fluorinated gases such as for example CF4 or C2F6 that it is necessary to best remove the gas to be purified.
- gaseous effluents such as in particular the PFC or HFC type effluents emanating from the etching chambers are systematically diluted in nitrogen at the level of the primary vacuum pumps because of their dangerousness.
- the mixture of gases entering a treatment system or destruction of effluents of the type named above is therefore mainly constituted by nitrogen.
- the use at atmospheric pressure of a carrier gas such as nitrogen requires a large amount of energy to ionize the gas and to maintain a nitrogen plasma.
- a carrier gas such as nitrogen
- tubes including ceramic causes problems of temperature resistance of the different materials used.
- the discharge tube is in fact cooled by a coolant circulating from one of its ends to the other, in a determined space between said tube and a second outer coaxial tube for confinement to the liquid.
- the invention aims to overcome the various disadvantages mentioned above by using a cooling system of the tube, in particular dielectric, in which is generated the plasma at atmospheric pressure, different from the systems used in the prior art.
- the circulation of the cooling fluid in thermal contact with the dielectric tube is carried out co-currently with the circulation of the fluid or mixture of fluids in the dielectric tube and on the other hand the fluid of cooling comprises at least one oil chosen from linear alpha olefins having a carbon chain of at least ten carbon atoms and / or perfluorocarbon liquids having a dielectric constant ⁇ of less than 2.5, absorbance micro waves ⁇ tan ⁇ ranging between 10 ⁇ 2 and 10 ⁇ 4 and a specific heat Cp ⁇ 0.6 g. cal / g. 0 C.
- the inversion of the direction of circulation of the oil (co-current with the circulation of the mixture of fluids, that is to say in the present example, from top to bottom) allows a better cooling at the ceramic / oil junction and avoids the formation of a vaporized oil film at the same junction.
- Specific heat Cp such that: Cp ⁇ 0.6, preferably Cp ⁇ 0.3.
- At least one linear alpha olefin preferably a linear olefin C-14 or tetradecene-1 and / or a perfluorocarbon fluid (PFC) having a dielectric constant ⁇ ⁇ 2 and / or an absorbance tan ⁇ ⁇ 10, will be used.
- PFC perfluorocarbon fluid
- the injection of the fluid mixture into the tube is carried out at atmospheric pressure or at a pressure close to atmospheric pressure.
- the injection of the fluid mixture and / or an inert complementary gas in the form of a vortex into the dielectric tube will be carried out.
- the fluid to be treated and the cooling fluid flow from top to bottom.
- the invention also relates to a plasma treatment system comprising: means for injecting a fluid and / or a gas; a dielectric tube receiving the fluid and / or the gas; a microwave generator; means for coupling the microwaves and the fluid and / or a gas to create a plasma in the dielectric tube; means for cooling the dielectric tube placed outside the tube, using a cooling fluid; a source of linear olefin alfa and / or perfluorocarbon fluid connected to the cooling means of the tube; means for circulating the cooling fluid cocurrently of the fluid or mixture of fluids to be treated, preferably from top to bottom.
- FIG. 1 an overall schematic view of the system according to the invention
- Figure 2a a vertical sectional view of a fluid injection head using a vortex and adaptable to the system of Figure 1
- - Figure 2b a sectional view along AA of the view of Figure 1
- Figure 2c a horizontal sectional view along BB of the view of Figure 2a
- Figure 3 is an alternative embodiment of an injection head creating a vortex.
- the plasma gas treatment system A comprises a surgeide type field applicator 1 as described in EP-A-874537, a heat exchanger B and washing means C, and cleaning means at dry D (or arranged in reverse order if desired).
- the system A is supplied via the plasma start gas valve Vd and / or via the valve Vf to the gas to be treated and comes from one of the reactors CVD1, CVD2, CVD3,. .. CVDn, via respective valves V1, V2, V3, ..Vn (these gases can be gases from semiconductor manufacturing reactors or flat screens or optical fibers or solar cells, etc.).
- the system A also comprises a dielectric tube 16 surrounded by a cooling system comprising a coolant 19 sufficiently weakly absorbing the microwaves in order to keep the power available to maintain the plasma, circulating in the space 18 delimited by the outer tube.
- the fluid inlet 19 is located in the lower part 13 of the system A and the outlet 20 of the fluid 19 after cooling the tube 16 is located in the upper part 24.
- the field applicator 1 in its central reduced portion 3 (reduction of the small side of the hollow rectangular waveguide section relative to the standard) is traversed by the dielectric tube 16, the silica tube 17 surrounding the space 18 for circulation of the cooling fluid .
- Sleeves of electrically conductive material 7, 8 acting as electromagnetic screens are arranged respectively around the top and bottom of the aforementioned tubes. Between the lower part of the sleeve 7 and the dielectric tube, an optimal radial distance is provided in order to obtain the maximum coupling between the guide wave and tube, without disturbance of microwaves by the presence of the sleeve.
- the same optimized radial distance is provided between the upper part of the sleeve 8 and the tube at the lower part of the applicator 1.
- the sleeves 7, 8 are respectively adjacent to the upper part 24 and the lower part 13.
- the field applicator 1 hollow rectangular waveguide comprises a central portion 3 of reduced section relative to the standard section used at the inlet / outlet 2, 4 located on either side of this central portion 3.
- the microwave power when the system is in operation, flows from the side part 2 to the central part 3, at which the microwaves are concentrated to be thrown along the tube 16 of the part and the another of this central portion 3 of the field applicator, so as to create a plasma in the tube 16 by yielding energy throughout the propagation of the wave along the tube.
- This plasma is started using the electrode 23 which is integral with the support 10 situated above the upper part 9 of the system A.
- the electrode 23 is maintained substantially along the axis of the dielectric tube 16 and is connected to a high voltage source or starter coil.
- the plasma starting system is connected to the valve Vn and essentially comprises two branches: one connected to an Ar argon source via a mass flow regulator and a VAr valve, the other to a nitrogen source via a mass flow controller and a valve VN 2 .
- the heat exchanger B makes it possible to cool the hot gases coming from the plasma of the system A and to send them at around 150 ° C. at most to the washer C and the dry cleaner D (or vice versa).
- Figure 2 is shown a gas injection system (starting or process) in the form of a vortex.
- the gas injection ducts and / or fluid arrive tangentially in the vertical duct 54, located in the extension of the tube dielectric 16, to create a rotational effect of the gases and / or fluids injected.
- FIG. 2a is a vertical sectional view of the upper part 9, 24 of the plasma system A.
- Four gas injection pipes (57, 51), (58, 62), (59, 53), and (60, 64) all visible in Figure 2b (which is a sectional view along AA of Figure 1) to create the vortex in the conduit 54.
- the support 10 of the electrode 23 is secured to the upper portion 9 (24) .
- the four injection lines are preferably oriented (in the horizontal plane) at 90 ° from each other and can be oriented (in the vertical plane) either horizontally or from top to bottom.
- the ducts (70, 72) and (71, 73) (visible in FIG. 2c which is a horizontal section BB in FIG.
- FIG. 3 represents a schematic view of an alternative embodiment of an injection head 9 of gas to be treated in the plasma, with which an effective vortex is produced.
- This injection head 9 has an inlet (11) for introducing the gases to be treated which are then conducted via the channel 80 which is coaxial with the inlet 11 to the peripheral channel, the successive portions of which are shown in section 81, 82, 83 and 84, this continuous channel, surrounding the solid central portion 85 (similar structure to that of a spiral staircase around a central column 85).
- This solid central portion 85 is preferably made of conductive material and ends with a portion lower conical 86 serving as ignition electrode of the plasma which is created in the dielectric tube 16.
- the solid parts 87, 88, 89, 90 and 91 projecting from the axis 85 are the solid parts arranged in a spiral around of the axis 85 delimiting the passage of the gas.
- the upper portion 92 above the central portion 85 is housed in a movable part 93 ensuring the attachment of this central portion and the gas tightness by the O-ring 94.
- the channel 81, 82, ... leading the gas to give it a vortex effect in the tube 16 will have an axis inclined relative to the horizontal between about 25 ° and 35 °, more preferably of the order of 30 °.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Fluid Mechanics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Treating Waste Gases (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/994,695 US20110073282A1 (en) | 2008-05-28 | 2009-04-30 | Method for cooling microwave plasma and system for the selective destruction of chemical molecules using said method |
JP2011510926A JP2011522691A (ja) | 2008-05-28 | 2009-04-30 | マイクロ波プラズマの冷却方法およびそれを用いる化学分子の選択的破壊のためのプラズマ処理システム |
EP09753765A EP2286641A1 (fr) | 2008-05-28 | 2009-04-30 | Procede de refroidissement d'un plasma micro-onde et systeme de destruction selective de molecules chimiques utilisant ce procede |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08305206A EP2131633A1 (fr) | 2008-05-28 | 2008-05-28 | Procédé de refroidissement d'un plasma micro-onde et système de destruction sélective de molécules chimiques utilisant ce procédé |
EP08305206.8 | 2008-05-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009144110A1 true WO2009144110A1 (fr) | 2009-12-03 |
Family
ID=39811616
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2009/055264 WO2009144110A1 (fr) | 2008-05-28 | 2009-04-30 | Procede de refroidissement d'un plasma micro-onde et systeme de destruction selective de molecules chimiques utilisant ce procede |
Country Status (6)
Country | Link |
---|---|
US (1) | US20110073282A1 (fr) |
EP (2) | EP2131633A1 (fr) |
JP (1) | JP2011522691A (fr) |
KR (1) | KR20110021816A (fr) |
TW (1) | TW200952568A (fr) |
WO (1) | WO2009144110A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101720987B1 (ko) | 2015-04-28 | 2017-04-10 | 주식회사 글로벌스탠다드테크놀로지 | 난분해성 유해가스의 처리장치 및 방법 |
EP3309815B1 (fr) * | 2016-10-12 | 2019-03-20 | Meyer Burger (Germany) AG | Dispositif de traitement au plasma comprenant deux sources de plasma excitées par micro-ondes couplées ensemble et procédé de fonctionnement d'un tel dispositif de traitement au plasma |
GB201811003D0 (en) | 2018-07-04 | 2018-08-15 | Bp Plc | Multiple cooling circuit systems and methods for using them |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4828703A (en) * | 1983-12-28 | 1989-05-09 | Union Carbide Corporation | Method for replacing PCB-containing coolants in electrical induction apparatus with substantially PCB-free dielectric coolants |
US5159527A (en) * | 1991-12-05 | 1992-10-27 | Minnesota Mining And Manufacturing Company | Dielectric liquids |
US6541917B1 (en) * | 1998-12-22 | 2003-04-01 | L'air Liquide Societe Anonyme A Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude | Section of pipe for a gas treatment device and device incorporating such a section of pipe |
WO2006008421A2 (fr) * | 2004-07-13 | 2006-01-26 | L'air Liquide, Societe Anonyme A Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude | Traitement d'effluents gazeux par plasma a pression atmospherique |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
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SE434676B (sv) * | 1981-10-22 | 1984-08-06 | Skf Steel Eng Ab | Sett och anordning for uppvermning av for industriella endamal avsedd processluft |
CA1261735A (fr) * | 1984-04-20 | 1989-09-26 | William J. Klaila | Methode et dispositif de separation de fractions d'hydrocarbures, pour faciliter l'extraction et le raffinage des hydrocarbures liquides, pour isoler les reservoirs de stockage, et pour le decrassage des citernes de stockage et des pipelines |
JPH0693397B2 (ja) * | 1987-12-29 | 1994-11-16 | 日本高周波株式会社 | 熱プラズマ発生装置 |
JPH03214600A (ja) * | 1990-01-17 | 1991-09-19 | Nippon Koshuha Kk | マイクロ波熱プラズマ反応装置 |
JPH0562793A (ja) * | 1991-08-30 | 1993-03-12 | Hitachi Ltd | プラズマヒータ |
JP3390788B2 (ja) * | 1993-09-13 | 2003-03-31 | 独立行政法人産業技術総合研究所 | 高周波誘導熱プラズマ発生方法および有機ハロゲン化合物の分解方法 |
FR2751565B1 (fr) * | 1996-07-26 | 1998-09-04 | Air Liquide | Procede et installation de traitement de gaz perfluores et hydrofluorocarbones en vue de leur destruction |
EP0946414B1 (fr) * | 1996-11-04 | 2005-06-29 | Materials Modification, Inc. | Synthese chimique par plasma hyperfrequence de poudres ultrafines |
FR2762748B1 (fr) * | 1997-04-25 | 1999-06-11 | Air Liquide | Dispositif d'excitation d'un gaz par plasma d'onde de surface |
JP2000119671A (ja) * | 1998-10-20 | 2000-04-25 | Matsushita Refrig Co Ltd | 冷凍システム |
JP4035916B2 (ja) * | 1999-03-30 | 2008-01-23 | 松下電工株式会社 | プラズマ処理装置及びプラズマ処理方法 |
JP2001025658A (ja) * | 1999-07-15 | 2001-01-30 | Mitsubishi Heavy Ind Ltd | プラズマ着火方法及び有機ハロゲン化合物の分解方法 |
JP4075237B2 (ja) * | 1999-08-17 | 2008-04-16 | 松下電工株式会社 | プラズマ処理システム及びプラズマ処理方法 |
CN1679136A (zh) * | 2002-08-30 | 2005-10-05 | 艾克塞利斯技术公司 | 微波等离子体发生器的气体管端盖 |
JP2004313998A (ja) * | 2003-04-18 | 2004-11-11 | Ebara Corp | ハロゲン化物の分解装置 |
JP3621946B1 (ja) * | 2004-02-27 | 2005-02-23 | 三菱重工業株式会社 | 有機ハロゲン化合物放電分解装置およびその方法 |
JP2006102717A (ja) * | 2004-10-08 | 2006-04-20 | Taiyo Nippon Sanso Corp | 有害成分含有ガスの処理方法および処理装置 |
-
2008
- 2008-05-28 EP EP08305206A patent/EP2131633A1/fr not_active Withdrawn
-
2009
- 2009-04-30 US US12/994,695 patent/US20110073282A1/en not_active Abandoned
- 2009-04-30 KR KR1020107026506A patent/KR20110021816A/ko not_active Application Discontinuation
- 2009-04-30 JP JP2011510926A patent/JP2011522691A/ja active Pending
- 2009-04-30 WO PCT/EP2009/055264 patent/WO2009144110A1/fr active Application Filing
- 2009-04-30 EP EP09753765A patent/EP2286641A1/fr not_active Withdrawn
- 2009-05-25 TW TW098117230A patent/TW200952568A/zh unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US4828703A (en) * | 1983-12-28 | 1989-05-09 | Union Carbide Corporation | Method for replacing PCB-containing coolants in electrical induction apparatus with substantially PCB-free dielectric coolants |
US5159527A (en) * | 1991-12-05 | 1992-10-27 | Minnesota Mining And Manufacturing Company | Dielectric liquids |
US6541917B1 (en) * | 1998-12-22 | 2003-04-01 | L'air Liquide Societe Anonyme A Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude | Section of pipe for a gas treatment device and device incorporating such a section of pipe |
WO2006008421A2 (fr) * | 2004-07-13 | 2006-01-26 | L'air Liquide, Societe Anonyme A Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude | Traitement d'effluents gazeux par plasma a pression atmospherique |
Non-Patent Citations (1)
Title |
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ANONYMOUS: "*M Fluorinert Electronic Liquid FC-72 - Product Information", May 2000, 3M, SPECIALTY MATERIALS, ST. PAUL, MN, USA, XP002500154 * |
Also Published As
Publication number | Publication date |
---|---|
KR20110021816A (ko) | 2011-03-04 |
TW200952568A (en) | 2009-12-16 |
EP2131633A1 (fr) | 2009-12-09 |
EP2286641A1 (fr) | 2011-02-23 |
US20110073282A1 (en) | 2011-03-31 |
JP2011522691A (ja) | 2011-08-04 |
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