WO2009125133A3 - Procede de fabrication d'elements optiques plans et elements obtenus - Google Patents

Procede de fabrication d'elements optiques plans et elements obtenus Download PDF

Info

Publication number
WO2009125133A3
WO2009125133A3 PCT/FR2009/050514 FR2009050514W WO2009125133A3 WO 2009125133 A3 WO2009125133 A3 WO 2009125133A3 FR 2009050514 W FR2009050514 W FR 2009050514W WO 2009125133 A3 WO2009125133 A3 WO 2009125133A3
Authority
WO
WIPO (PCT)
Prior art keywords
ions
substrate
enamel
ion
molten salt
Prior art date
Application number
PCT/FR2009/050514
Other languages
English (en)
Other versions
WO2009125133A2 (fr
Inventor
Julien Sellier
Arnaud Huignard
Xavier Brajer
Original Assignee
Saint-Gobain Glass France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint-Gobain Glass France filed Critical Saint-Gobain Glass France
Priority to US12/934,764 priority Critical patent/US20110199687A1/en
Priority to JP2011501278A priority patent/JP2011515322A/ja
Priority to EP09730185A priority patent/EP2260009A2/fr
Priority to CN2009801193687A priority patent/CN102046547A/zh
Publication of WO2009125133A2 publication Critical patent/WO2009125133A2/fr
Publication of WO2009125133A3 publication Critical patent/WO2009125133A3/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/078—Glass compositions containing silica with 40% to 90% silica, by weight containing an oxide of a divalent metal, e.g. an oxide of zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
    • C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
    • C03C21/003—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions under application of an electrical potential difference
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
    • C03C21/005—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to introduce in the glass such metals or metallic ions as Ag, Cu
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C03C21/008—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in solid phase, e.g. using pastes, powders
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/04—Frit compositions, i.e. in a powdered or comminuted form containing zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C03C8/16—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions with vehicle or suspending agents, e.g. slip
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C03C8/18—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions containing free metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

Le procédé selon l'invention est basé sur l'échange ionique simultané de deux ions ayant une mobilité presque identique avec les ions d'un substrat verrier, l'un au moins des deux ions précités étant mis en œuvre sous la forme d'un émail. Selon un premier mode de réalisation, le procédé comprenant les étapes qui consistent à : a) déposer à la surface d'un substrat verrier qui contient un premier ion une composition d'émail contenant un deuxième ion choisi parmi les ions Ag, Tl, Ba ou Cu, ou leurs précurseurs, sous la forme d'un motif ou d'un réseau de motifs, b) porter le substrat à une température suffisante pour cuire l'émail, c) immerger le substrat dans un sel fondu qui comprend un troisième ion ayant une mobilité presque égale à celle du deuxième ion, d) appliquer un champ électrique au travers du substrat immergé de manière à ce que les deuxièmes ions provenant de l'émail et les troisièmes ions provenant du sel fondu remplacent simultanément les premiers ions dans le substrat, e) retirer le substrat du sel fondu, et f) éliminer l'émail.
PCT/FR2009/050514 2008-03-27 2009-03-25 Procede de fabrication d'elements optiques plans et elements obtenus. WO2009125133A2 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US12/934,764 US20110199687A1 (en) 2008-03-27 2009-03-25 Process for the manufacture of flat optical elements and elements thus obtained
JP2011501278A JP2011515322A (ja) 2008-03-27 2009-03-25 平面光学素子の製造方法およびその製造方法により得られた素子
EP09730185A EP2260009A2 (fr) 2008-03-27 2009-03-25 Procede de fabrication d'elements optiques plans et elements obtenus.
CN2009801193687A CN102046547A (zh) 2008-03-27 2009-03-25 用于制备平面光学元件的方法和获得的元件

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0851964A FR2929415B1 (fr) 2008-03-27 2008-03-27 Procede de fabrication d'elements optiques plans et elements obtenus
FR0851964 2008-03-27

Publications (2)

Publication Number Publication Date
WO2009125133A2 WO2009125133A2 (fr) 2009-10-15
WO2009125133A3 true WO2009125133A3 (fr) 2010-04-22

Family

ID=39967617

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR2009/050514 WO2009125133A2 (fr) 2008-03-27 2009-03-25 Procede de fabrication d'elements optiques plans et elements obtenus.

Country Status (8)

Country Link
US (1) US20110199687A1 (fr)
EP (1) EP2260009A2 (fr)
JP (1) JP2011515322A (fr)
KR (1) KR20100130201A (fr)
CN (1) CN102046547A (fr)
FR (1) FR2929415B1 (fr)
TW (1) TW201002642A (fr)
WO (1) WO2009125133A2 (fr)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5207357B2 (ja) * 2007-03-29 2013-06-12 独立行政法人産業技術総合研究所 ガラス部材の成形法および成形装置
US8673163B2 (en) 2008-06-27 2014-03-18 Apple Inc. Method for fabricating thin sheets of glass
US7810355B2 (en) 2008-06-30 2010-10-12 Apple Inc. Full perimeter chemical strengthening of substrates
EA019049B1 (ru) 2008-09-01 2013-12-30 Сэн-Гобэн Гласс Франс Способ получения стекла и полученное стекло
JP5616907B2 (ja) 2009-03-02 2014-10-29 アップル インコーポレイテッド ポータブル電子デバイスのガラスカバーを強化する技術
US9778685B2 (en) 2011-05-04 2017-10-03 Apple Inc. Housing for portable electronic device with reduced border region
US9213451B2 (en) 2010-06-04 2015-12-15 Apple Inc. Thin glass for touch panel sensors and methods therefor
JP2012009616A (ja) * 2010-06-24 2012-01-12 Asahi Glass Co Ltd 発光装置用レンズ
US10189743B2 (en) 2010-08-18 2019-01-29 Apple Inc. Enhanced strengthening of glass
US8873028B2 (en) 2010-08-26 2014-10-28 Apple Inc. Non-destructive stress profile determination in chemically tempered glass
US8824140B2 (en) 2010-09-17 2014-09-02 Apple Inc. Glass enclosure
US10781135B2 (en) * 2011-03-16 2020-09-22 Apple Inc. Strengthening variable thickness glass
US9725359B2 (en) 2011-03-16 2017-08-08 Apple Inc. Electronic device having selectively strengthened glass
US9128666B2 (en) 2011-05-04 2015-09-08 Apple Inc. Housing for portable electronic device with reduced border region
US9944554B2 (en) 2011-09-15 2018-04-17 Apple Inc. Perforated mother sheet for partial edge chemical strengthening and method therefor
US9516149B2 (en) 2011-09-29 2016-12-06 Apple Inc. Multi-layer transparent structures for electronic device housings
US10144669B2 (en) 2011-11-21 2018-12-04 Apple Inc. Self-optimizing chemical strengthening bath for glass
US20130133745A1 (en) * 2011-11-30 2013-05-30 James Patrick Hamilton Incorporation of alkaline earth ions into alkali-containing glass surfaces to inhibit alkali egress
US8684613B2 (en) 2012-01-10 2014-04-01 Apple Inc. Integrated camera window
US10133156B2 (en) 2012-01-10 2018-11-20 Apple Inc. Fused opaque and clear glass for camera or display window
GB201200890D0 (en) * 2012-01-19 2012-02-29 Univ Dundee An ion exchange substrate and metalized product and apparatus and method for production thereof
US8773848B2 (en) 2012-01-25 2014-07-08 Apple Inc. Fused glass device housings
WO2013163238A1 (fr) * 2012-04-24 2013-10-31 Ferro Corporation Émaux pour verre pouvant subir un échange d'ions et dépourvus de métaux lourds
US9946302B2 (en) 2012-09-19 2018-04-17 Apple Inc. Exposed glass article with inner recessed area for portable electronic device housing
US9459661B2 (en) 2013-06-19 2016-10-04 Apple Inc. Camouflaged openings in electronic device housings
JP6172667B2 (ja) * 2013-08-08 2017-08-02 国立大学法人東京工業大学 両面化学強化ガラスの製造方法
US9886062B2 (en) 2014-02-28 2018-02-06 Apple Inc. Exposed glass article with enhanced stiffness for portable electronic device housing
CN108821587B (zh) * 2018-08-14 2021-10-15 南京双峰油泵油嘴有限公司 一种铸铁工业搪瓷配方及工艺
CN111995242B (zh) * 2020-09-07 2022-04-15 成都光明光电股份有限公司 光学玻璃、玻璃预制件、光学元件和光学仪器

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0380468A2 (fr) * 1989-01-23 1990-08-01 Polaroid Corporation Méthode de fabrication de guides d'ondes enterrés
US4952037A (en) * 1985-03-05 1990-08-28 Nippon Sheet Glass Co., Ltd. Plate microlens and method for manufacturing the same
US20030000251A1 (en) * 2001-06-21 2003-01-02 Hong Tan Method for fabricating thallium-doped GRIN lens
US20030161048A1 (en) * 2002-02-22 2003-08-28 Nippon Sheet Glass Co., Ltd. Planar lens
EP1457794A2 (fr) * 2001-12-20 2004-09-15 Isuzu Glass Co., Ltd. Procede de formation de guide d'onde optique
WO2006040828A1 (fr) * 2004-10-15 2006-04-20 Toyo Glass Co., Ltd. Procede de fabrication de lentille grin et lentille grin

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0479490A3 (en) * 1990-10-02 1992-08-12 Physical Optics Corporation Volume holographic diffuser

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4952037A (en) * 1985-03-05 1990-08-28 Nippon Sheet Glass Co., Ltd. Plate microlens and method for manufacturing the same
EP0380468A2 (fr) * 1989-01-23 1990-08-01 Polaroid Corporation Méthode de fabrication de guides d'ondes enterrés
US20030000251A1 (en) * 2001-06-21 2003-01-02 Hong Tan Method for fabricating thallium-doped GRIN lens
EP1457794A2 (fr) * 2001-12-20 2004-09-15 Isuzu Glass Co., Ltd. Procede de formation de guide d'onde optique
US20030161048A1 (en) * 2002-02-22 2003-08-28 Nippon Sheet Glass Co., Ltd. Planar lens
WO2006040828A1 (fr) * 2004-10-15 2006-04-20 Toyo Glass Co., Ltd. Procede de fabrication de lentille grin et lentille grin

Also Published As

Publication number Publication date
WO2009125133A2 (fr) 2009-10-15
EP2260009A2 (fr) 2010-12-15
KR20100130201A (ko) 2010-12-10
TW201002642A (en) 2010-01-16
FR2929415B1 (fr) 2010-03-12
CN102046547A (zh) 2011-05-04
JP2011515322A (ja) 2011-05-19
US20110199687A1 (en) 2011-08-18
FR2929415A1 (fr) 2009-10-02

Similar Documents

Publication Publication Date Title
WO2009125133A3 (fr) Procede de fabrication d'elements optiques plans et elements obtenus
HK1144954A1 (en) Antifouling coating composition, antifouling coating film, substrates with the film, fouling-resistant substrates, process for forming the film on the surfaces of substrates, and method for inhibiting substrate from fouling
WO2007064597A3 (fr) Surfaces uniformes destinees a des substrats de materiau hybride, leurs procedes de production et d'utilisation
ATE486366T1 (de) Verfahren zum herstellen einer halbleiter-auf- isolator-struktur
DK1828071T3 (da) Fremgangsmåde til fremstilling af et glasagtigt substrat med antimikrobielle egenskaber
EP2155927A4 (fr) Dépôt d'ions métalliques sur des surfaces de substrats conducteurs
FR2933233B1 (fr) Substrat de haute resistivite bon marche et procede de fabrication associe
FR2963982B1 (fr) Procede de collage a basse temperature
DE602008006059D1 (de) Barriereschicht und herstellungsverfahren dafür
ATE532817T1 (de) Antimikrobielle beschichtungen mit einem komplex aus einem ionischen fluorpolymer und einem antimikrobiellen gegenion
WO2009086231A3 (fr) Procédés de nettoyage après dépôt et formulations pour substrats pourvus de couches de capotage
WO2007071723A3 (fr) Element optique comportant une couche antistatique et antireflet et son procede de fabrication
WO2008107113A9 (fr) Composition de revêtement
DE602006006135D1 (de) Silicium enthaltende antireflektive Beschichtungszusammensetzung, Silicium enthaltende antireflektive Beschichtung, Substrat prozessierende Zwischenschicht und Substrat prozessierende Methode
JP2007258634A5 (fr)
EA201171045A1 (ru) Антибактериальное стекло
ATE542785T1 (de) Verfahren zur elektrophoretischen beschichtung
ATE463837T1 (de) Inline-heizelement zur verwendung bei der chemischen halbleiter-nassbearbeitung und herstellungsverfahren dafür
JP2018505516A (ja) 破壊の危険性が低下した小型電子部材およびその製造方法
WO2010136338A3 (fr) Procédé pour produire une couche contenant des particules absorbant un rayonnement d'énergie
WO2009019373A3 (fr) Substrat de face avant d'ecran plasma, utilisation et procede de fabrication.
WO2013009714A3 (fr) Revêtement de métal résistant à la corrosion et son procédé de fabrication
JP2010072046A5 (fr)
SE0403042D0 (sv) Improved stabilization and performance of autocatalytic electroless process
WO2007140495A3 (fr) Procédé de fabrication d'un support de circuit

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200980119368.7

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 09730185

Country of ref document: EP

Kind code of ref document: A2

WWE Wipo information: entry into national phase

Ref document number: 2009730185

Country of ref document: EP

ENP Entry into the national phase

Ref document number: 20107021127

Country of ref document: KR

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 2011501278

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 12934764

Country of ref document: US