SE0403042D0 - Improved stabilization and performance of autocatalytic electroless process - Google Patents
Improved stabilization and performance of autocatalytic electroless processInfo
- Publication number
- SE0403042D0 SE0403042D0 SE0403042A SE0403042A SE0403042D0 SE 0403042 D0 SE0403042 D0 SE 0403042D0 SE 0403042 A SE0403042 A SE 0403042A SE 0403042 A SE0403042 A SE 0403042A SE 0403042 D0 SE0403042 D0 SE 0403042D0
- Authority
- SE
- Sweden
- Prior art keywords
- bath
- metal
- autocatalytic
- autocatalytic electroless
- performance
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1675—Process conditions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1651—Two or more layers only obtained by electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1875—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment only one step pretreatment
- C23C18/1882—Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/54—Contact plating, i.e. electroless electrochemical plating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Priority Applications (16)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0403042A SE0403042D0 (sv) | 2004-12-14 | 2004-12-14 | Improved stabilization and performance of autocatalytic electroless process |
CA 2591411 CA2591411C (en) | 2004-12-14 | 2005-12-13 | Improved stabilization and performance of autocatalytic electroless processes |
PCT/SE2005/001930 WO2006065221A1 (en) | 2004-12-14 | 2005-12-13 | Stabilization amd performance of autocatalytic electroless processes. |
US11/791,512 US20080206474A1 (en) | 2004-12-14 | 2005-12-13 | Stabilization and Performance of Autocatalytic Electroless Processes |
AU2005317239A AU2005317239B2 (en) | 2004-12-14 | 2005-12-13 | Stabilization amd performance of autocatalytic electroless processes. |
BRPI0519014-2A BRPI0519014A2 (pt) | 2004-12-14 | 2005-12-13 | mÉtodo para deposiÇço de um substrato com um metal, objeto, banho de deposiÇço de prata sem eletricidade autocatalÍtica, e, mÉtodo para deposiÇço autocatalÍtica de prata metÁlica |
UAA200707939A UA91995C2 (ru) | 2004-12-14 | 2005-12-13 | Способы нанесения покрытия металла на подкладку автокаталитическим осажденимем, ванна для осуществления способов и изделие с нанесенным покрытием |
KR1020077016208A KR101314035B1 (ko) | 2004-12-14 | 2005-12-13 | 자기 촉매적 무전해 공정들의 안정성 및 수행 |
JP2007546613A JP4891919B2 (ja) | 2004-12-14 | 2005-12-13 | 自己触媒無電解法の改善された安定化及び性能 |
CN200580042943XA CN101080512B (zh) | 2004-12-14 | 2005-12-13 | 自催化无电工艺的稳定和性能 |
CN200910205698XA CN101693992B (zh) | 2004-12-14 | 2005-12-13 | 自催化无电工艺的稳定和性能 |
RU2007126815A RU2398049C2 (ru) | 2004-12-14 | 2005-12-13 | Усовершенствованные стабилизация и рабочие характеристики автокаталитических способов нанесения покрытия методом химического восстановления |
MX2007006537A MX2007006537A (es) | 2004-12-14 | 2005-12-13 | Estabilizacion y desempeno de procesos autocataliticos no electroliticos. |
EP05819079.4A EP1828435A4 (en) | 2004-12-14 | 2005-12-13 | STABILIZATION AND EFFICIENCY OF AUTO CATALYTIC ELECTRICITY PROCESSES |
IL183354A IL183354A0 (en) | 2004-12-14 | 2007-05-21 | Stabilization and performance of autocatalytic electroless processes |
NO20072917A NO20072917L (no) | 2004-12-14 | 2007-06-07 | Autokatalytisk fremgangsmate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0403042A SE0403042D0 (sv) | 2004-12-14 | 2004-12-14 | Improved stabilization and performance of autocatalytic electroless process |
Publications (1)
Publication Number | Publication Date |
---|---|
SE0403042D0 true SE0403042D0 (sv) | 2004-12-14 |
Family
ID=33550639
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE0403042A SE0403042D0 (sv) | 2004-12-14 | 2004-12-14 | Improved stabilization and performance of autocatalytic electroless process |
Country Status (15)
Country | Link |
---|---|
US (1) | US20080206474A1 (sv) |
EP (1) | EP1828435A4 (sv) |
JP (1) | JP4891919B2 (sv) |
KR (1) | KR101314035B1 (sv) |
CN (2) | CN101080512B (sv) |
AU (1) | AU2005317239B2 (sv) |
BR (1) | BRPI0519014A2 (sv) |
CA (1) | CA2591411C (sv) |
IL (1) | IL183354A0 (sv) |
MX (1) | MX2007006537A (sv) |
NO (1) | NO20072917L (sv) |
RU (1) | RU2398049C2 (sv) |
SE (1) | SE0403042D0 (sv) |
UA (1) | UA91995C2 (sv) |
WO (1) | WO2006065221A1 (sv) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009139366A1 (ja) * | 2008-05-15 | 2009-11-19 | 日鉱金属株式会社 | 基板 |
DE102008063030A1 (de) | 2008-12-23 | 2010-06-24 | Bundesdruckerei Gmbh | Sicherheits- und/oder Wertdokument mit einer leitfähigen Struktur und Verfahren zu dessen Herstellung |
EP2784181B1 (en) * | 2013-03-27 | 2015-12-09 | ATOTECH Deutschland GmbH | Electroless copper plating solution |
CN107002242B (zh) | 2014-12-17 | 2020-02-11 | 埃托特克德国有限公司 | 用于化学镀钯的镀浴组合物和方法 |
US20170051411A1 (en) * | 2015-08-20 | 2017-02-23 | Macdermid Acumen, Inc. | Electroless Silver Plating Bath and Method of Using the Same |
JP7080781B2 (ja) * | 2018-09-26 | 2022-06-06 | 株式会社東芝 | 多孔質層の形成方法、エッチング方法、物品の製造方法、半導体装置の製造方法、及びめっき液 |
Family Cites Families (30)
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US2842461A (en) * | 1955-12-02 | 1958-07-08 | Hauserman Co E F | Lead coating process and material |
US2842561A (en) * | 1956-02-06 | 1958-07-08 | Ici Ltd | New dyestuff intermediates |
US3403035A (en) * | 1964-06-24 | 1968-09-24 | Process Res Company | Process for stabilizing autocatalytic metal plating solutions |
US3839165A (en) * | 1967-08-26 | 1974-10-01 | Henkel & Cie Gmbh | Nickel electroplating method |
US3650777A (en) * | 1971-02-11 | 1972-03-21 | Kollmorgen Corp | Electroless copper plating |
US4293591A (en) * | 1975-10-23 | 1981-10-06 | Nathan Feldstein | Process using activated electroless plating catalysts |
US4412947A (en) * | 1979-09-12 | 1983-11-01 | Seton Company | Collagen sponge |
JPS6033358A (ja) * | 1983-08-04 | 1985-02-20 | Hitachi Chem Co Ltd | 無電解銅めっき液 |
CA1319319C (en) * | 1986-03-17 | 1993-06-22 | Donald Charles Mente | Thickening aqueous systems |
US4999054A (en) * | 1986-12-19 | 1991-03-12 | Lamerie, N.V. | Gold plating solutions, creams and baths |
US5364460A (en) * | 1993-03-26 | 1994-11-15 | C. Uyemura & Co., Ltd. | Electroless gold plating bath |
US5803957A (en) * | 1993-03-26 | 1998-09-08 | C. Uyemura & Co.,Ltd. | Electroless gold plating bath |
JP3332668B2 (ja) * | 1994-07-14 | 2002-10-07 | 松下電器産業株式会社 | 半導体装置の配線形成に用いる無電解めっき浴及び半導体装置の配線形成方法 |
US5905157A (en) * | 1997-12-12 | 1999-05-18 | Bayer Corporation | Process for producing 2-(methylthio)-5-(trifluoromethyl)-1,3,4-thiadiazole using methyldithiocarbazinate and trifluoroacetic acid |
JP3920462B2 (ja) * | 1998-07-13 | 2007-05-30 | 株式会社大和化成研究所 | 貴金属を化学的還元析出によって得るための水溶液 |
US6066889A (en) * | 1998-09-22 | 2000-05-23 | International Business Machines Corporation | Methods of selectively filling apertures |
US6361823B1 (en) * | 1999-12-03 | 2002-03-26 | Atotech Deutschland Gmbh | Process for whisker-free aqueous electroless tin plating |
JP2001342453A (ja) * | 2000-06-01 | 2001-12-14 | Mitsubishi Rayon Co Ltd | キレート剤組成物 |
JP2002004058A (ja) * | 2000-06-16 | 2002-01-09 | Kuwana Shoji Kk | 無電解めっきによる金属成形体の製造方法とその成形体 |
US6416812B1 (en) * | 2000-06-29 | 2002-07-09 | International Business Machines Corporation | Method for depositing copper onto a barrier layer |
US6387542B1 (en) * | 2000-07-06 | 2002-05-14 | Honeywell International Inc. | Electroless silver plating |
US6793793B2 (en) * | 2000-08-24 | 2004-09-21 | Hideo Yoshida | Electrochemical treating method such as electroplating and electrochemical reaction device therefor |
US7163589B2 (en) * | 2001-05-23 | 2007-01-16 | Argos Associates, Inc. | Method and apparatus for decontamination of sensitive equipment |
JP4660806B2 (ja) * | 2001-05-30 | 2011-03-30 | 石原薬品株式会社 | 無電解銀メッキ浴 |
KR20040018558A (ko) * | 2001-08-13 | 2004-03-03 | 가부시키 가이샤 에바라 세이사꾸쇼 | 반도체장치와 그 제조방법 및 도금액 |
US6645567B2 (en) * | 2001-12-19 | 2003-11-11 | Intel Corporation | Electroless plating bath composition and method of using |
US6821324B2 (en) * | 2002-06-19 | 2004-11-23 | Ramot At Tel-Aviv University Ltd. | Cobalt tungsten phosphorus electroless deposition process and materials |
US7166152B2 (en) * | 2002-08-23 | 2007-01-23 | Daiwa Fine Chemicals Co., Ltd. | Pretreatment solution for providing catalyst for electroless plating, pretreatment method using the solution, and electroless plated film and/or plated object produced by use of the method |
JP2004195391A (ja) * | 2002-12-19 | 2004-07-15 | Kurita Water Ind Ltd | 非イオン性界面活性剤を含んだ有機化合物含有水の処理方法および処理装置 |
JP4441726B2 (ja) * | 2003-01-24 | 2010-03-31 | 石原薬品株式会社 | スズ又はスズ合金の脂肪族スルホン酸メッキ浴の製造方法 |
-
2004
- 2004-12-14 SE SE0403042A patent/SE0403042D0/sv unknown
-
2005
- 2005-12-13 UA UAA200707939A patent/UA91995C2/ru unknown
- 2005-12-13 RU RU2007126815A patent/RU2398049C2/ru not_active IP Right Cessation
- 2005-12-13 CA CA 2591411 patent/CA2591411C/en not_active Expired - Fee Related
- 2005-12-13 KR KR1020077016208A patent/KR101314035B1/ko not_active IP Right Cessation
- 2005-12-13 WO PCT/SE2005/001930 patent/WO2006065221A1/en active Application Filing
- 2005-12-13 EP EP05819079.4A patent/EP1828435A4/en not_active Withdrawn
- 2005-12-13 JP JP2007546613A patent/JP4891919B2/ja not_active Expired - Fee Related
- 2005-12-13 MX MX2007006537A patent/MX2007006537A/es active IP Right Grant
- 2005-12-13 CN CN200580042943XA patent/CN101080512B/zh not_active Expired - Fee Related
- 2005-12-13 AU AU2005317239A patent/AU2005317239B2/en not_active Ceased
- 2005-12-13 BR BRPI0519014-2A patent/BRPI0519014A2/pt not_active IP Right Cessation
- 2005-12-13 US US11/791,512 patent/US20080206474A1/en not_active Abandoned
- 2005-12-13 CN CN200910205698XA patent/CN101693992B/zh not_active Expired - Fee Related
-
2007
- 2007-05-21 IL IL183354A patent/IL183354A0/en unknown
- 2007-06-07 NO NO20072917A patent/NO20072917L/no not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JP2008523253A (ja) | 2008-07-03 |
CN101080512A (zh) | 2007-11-28 |
RU2398049C2 (ru) | 2010-08-27 |
UA91995C2 (ru) | 2010-09-27 |
AU2005317239A1 (en) | 2006-06-22 |
MX2007006537A (es) | 2007-08-20 |
WO2006065221A1 (en) | 2006-06-22 |
BRPI0519014A2 (pt) | 2008-12-23 |
NO20072917L (no) | 2007-09-14 |
RU2007126815A (ru) | 2009-01-27 |
CN101693992A (zh) | 2010-04-14 |
CN101080512B (zh) | 2011-08-17 |
JP4891919B2 (ja) | 2012-03-07 |
CN101693992B (zh) | 2012-12-26 |
KR20070092988A (ko) | 2007-09-14 |
IL183354A0 (en) | 2007-09-20 |
US20080206474A1 (en) | 2008-08-28 |
KR101314035B1 (ko) | 2013-10-02 |
CA2591411A1 (en) | 2006-06-22 |
EP1828435A4 (en) | 2014-10-29 |
AU2005317239B2 (en) | 2010-03-04 |
CA2591411C (en) | 2014-01-28 |
EP1828435A1 (en) | 2007-09-05 |
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