ATE463837T1 - Inline-heizelement zur verwendung bei der chemischen halbleiter-nassbearbeitung und herstellungsverfahren dafür - Google Patents
Inline-heizelement zur verwendung bei der chemischen halbleiter-nassbearbeitung und herstellungsverfahren dafürInfo
- Publication number
- ATE463837T1 ATE463837T1 AT05759168T AT05759168T ATE463837T1 AT E463837 T1 ATE463837 T1 AT E463837T1 AT 05759168 T AT05759168 T AT 05759168T AT 05759168 T AT05759168 T AT 05759168T AT E463837 T1 ATE463837 T1 AT E463837T1
- Authority
- AT
- Austria
- Prior art keywords
- heating element
- protective layer
- single crystal
- resistive heating
- alumina substrate
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
- H05B2203/003—Heaters using a particular layout for the resistive material or resistive elements using serpentine layout
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Resistance Heating (AREA)
- Surface Heating Bodies (AREA)
- Weting (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/867,108 US7164104B2 (en) | 2004-06-14 | 2004-06-14 | In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same |
PCT/US2005/020761 WO2005124829A2 (en) | 2004-06-14 | 2005-06-10 | In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE463837T1 true ATE463837T1 (de) | 2010-04-15 |
Family
ID=34972370
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT05759168T ATE463837T1 (de) | 2004-06-14 | 2005-06-10 | Inline-heizelement zur verwendung bei der chemischen halbleiter-nassbearbeitung und herstellungsverfahren dafür |
Country Status (6)
Country | Link |
---|---|
US (1) | US7164104B2 (de) |
EP (1) | EP1774571B1 (de) |
JP (1) | JP2008504675A (de) |
AT (1) | ATE463837T1 (de) |
DE (1) | DE602005020453D1 (de) |
WO (1) | WO2005124829A2 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9835355B2 (en) * | 2007-11-01 | 2017-12-05 | Infinity Fluids Corp. | Inter-axial inline fluid heater |
US20100077602A1 (en) * | 2008-09-27 | 2010-04-01 | Wolfgang Kollenberg | Method of making an electrical heater |
JP5415797B2 (ja) * | 2009-03-24 | 2014-02-12 | 株式会社Kelk | 流体加熱装置 |
US20110008030A1 (en) * | 2009-07-08 | 2011-01-13 | Shimin Luo | Non-metal electric heating system and method, and tankless water heater using the same |
DE102009034307A1 (de) * | 2009-07-21 | 2011-01-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Hochtemperaturheizung sowie Verfahren zu dessen Herstellung |
CN103453272B (zh) * | 2013-09-12 | 2015-07-15 | 扬中市金元化工电力设备厂 | 一种管道用加热装置 |
US20210235549A1 (en) * | 2020-01-27 | 2021-07-29 | Lexmark International, Inc. | Thin-walled tube heater for fluid |
WO2022031791A1 (en) * | 2020-08-04 | 2022-02-10 | Micropen Technologies Corporation | Fluid conduit assemblies and fluid transport systems |
Family Cites Families (34)
Publication number | Priority date | Publication date | Assignee | Title |
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CH429954A (de) | 1964-05-21 | 1967-02-15 | Raytheon Co | Kathodenanordnung mit indirekter Heizung |
US3304459A (en) | 1964-05-21 | 1967-02-14 | Raytheon Co | Heater for an indirectly heated cathode |
US3515850A (en) * | 1967-10-02 | 1970-06-02 | Ncr Co | Thermal printing head with diffused printing elements |
FR2142272A5 (de) | 1971-06-18 | 1973-01-26 | Cibie Projecteurs | |
US3875413A (en) * | 1973-10-09 | 1975-04-01 | Hewlett Packard Co | Infrared radiation source |
US3852563A (en) * | 1974-02-01 | 1974-12-03 | Hewlett Packard Co | Thermal printing head |
US4213030A (en) | 1977-07-21 | 1980-07-15 | Kyoto Ceramic Kabushiki Kaisha | Silicon-semiconductor-type thermal head |
JPS6055549B2 (ja) * | 1977-09-08 | 1985-12-05 | 関西ペイント株式会社 | 被膜形成用組成物 |
US4378489A (en) * | 1981-05-18 | 1983-03-29 | Honeywell Inc. | Miniature thin film infrared calibration source |
US4472723A (en) * | 1982-04-23 | 1984-09-18 | Oki Electric Industry Co., Ltd. | Thermal head |
GB8402244D0 (en) * | 1984-01-27 | 1984-02-29 | Pilkington Brothers Plc | Glass window |
DE3437397A1 (de) * | 1984-10-12 | 1986-04-17 | Drägerwerk AG, 2400 Lübeck | Infrarot-strahler |
JPH02148675A (ja) * | 1988-11-30 | 1990-06-07 | Mitsubishi Electric Corp | 小型発熱体 |
DE69022651D1 (de) * | 1989-07-12 | 1995-11-02 | Mitsubishi Electric Corp | Dünnes Hochtemperaturheizelement und Verfahren zu dessen Herstellung. |
JP2911195B2 (ja) * | 1990-08-24 | 1999-06-23 | 富士通株式会社 | リン酸エッチング処理装置 |
JPH04351103A (ja) | 1991-05-29 | 1992-12-04 | Sumitomo Electric Ind Ltd | マイクロ波共振器 |
FR2708626B1 (fr) * | 1993-08-02 | 1998-06-05 | Director General Agency Ind | Film ultramince transparent et conducteur et procédé pour sa fabrication. |
US5408069A (en) * | 1993-09-28 | 1995-04-18 | Mischel, Jr.; James V. | Self-defogging mirror |
US5895591A (en) | 1994-07-06 | 1999-04-20 | Ngk Spark Plug Co., Ltd. | Ceramic heater and oxygen sensor |
KR0155969B1 (ko) | 1995-11-30 | 1999-10-01 | 김광호 | 냉장고의 선반 |
US5790752A (en) | 1995-12-20 | 1998-08-04 | Hytec Flow Systems | Efficient in-line fluid heater |
KR100280634B1 (ko) * | 1996-05-05 | 2001-02-01 | 세이이치로 미야타 | 전기 발열체 및 이를 이용한 정전 척 |
US5951896A (en) | 1996-12-04 | 1999-09-14 | Micro C Technologies, Inc. | Rapid thermal processing heater technology and method of use |
US6037574A (en) | 1997-11-06 | 2000-03-14 | Watlow Electric Manufacturing | Quartz substrate heater |
IL122476A0 (en) * | 1997-12-07 | 1998-06-15 | Amt Ltd | Electrical heating elements and method for producing same |
US6205649B1 (en) * | 1999-06-01 | 2001-03-27 | Mark A. Clayton | Method of making a ceramic heater with platinum heating element |
US6144802A (en) | 1999-06-29 | 2000-11-07 | Hyundai Electronics Industries Co., Ltd. | Fluid heater for semiconductor device |
US6222166B1 (en) * | 1999-08-09 | 2001-04-24 | Watlow Electric Manufacturing Co. | Aluminum substrate thick film heater |
JP2001102153A (ja) * | 1999-09-30 | 2001-04-13 | Ibiden Co Ltd | セラミックヒーター |
US6580061B2 (en) | 2000-02-01 | 2003-06-17 | Trebor International Inc | Durable, non-reactive, resistive-film heater |
US6636062B2 (en) * | 2001-04-10 | 2003-10-21 | Delta Design, Inc. | Temperature control device for an electronic component |
JP3582518B2 (ja) * | 2001-04-18 | 2004-10-27 | 住友電気工業株式会社 | 抵抗発熱体回路パターンとそれを用いた基板処理装置 |
WO2002096290A1 (en) * | 2001-05-31 | 2002-12-05 | Respironics, Inc. | Heater for optical gas sensor |
JP2003107946A (ja) * | 2001-10-01 | 2003-04-11 | Takao Kawamura | 定着用ヒート・プレート、定着用半円形発熱部材、及び、ベルト式定着装置 |
-
2004
- 2004-06-14 US US10/867,108 patent/US7164104B2/en active Active
-
2005
- 2005-06-10 DE DE602005020453T patent/DE602005020453D1/de active Active
- 2005-06-10 AT AT05759168T patent/ATE463837T1/de active
- 2005-06-10 WO PCT/US2005/020761 patent/WO2005124829A2/en active Application Filing
- 2005-06-10 EP EP05759168A patent/EP1774571B1/de not_active Not-in-force
- 2005-06-10 JP JP2007516606A patent/JP2008504675A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE602005020453D1 (de) | 2010-05-20 |
JP2008504675A (ja) | 2008-02-14 |
EP1774571A2 (de) | 2007-04-18 |
US7164104B2 (en) | 2007-01-16 |
EP1774571B1 (de) | 2010-04-07 |
WO2005124829A3 (en) | 2006-05-18 |
WO2005124829A2 (en) | 2005-12-29 |
US20050274714A1 (en) | 2005-12-15 |
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Legal Events
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UEP | Publication of translation of european patent specification |
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