DE602004016985D1 - Mehrzonen-keramikheizsystem und verfahren zu seiner herstellung - Google Patents

Mehrzonen-keramikheizsystem und verfahren zu seiner herstellung

Info

Publication number
DE602004016985D1
DE602004016985D1 DE602004016985T DE602004016985T DE602004016985D1 DE 602004016985 D1 DE602004016985 D1 DE 602004016985D1 DE 602004016985 T DE602004016985 T DE 602004016985T DE 602004016985 T DE602004016985 T DE 602004016985T DE 602004016985 D1 DE602004016985 D1 DE 602004016985D1
Authority
DE
Germany
Prior art keywords
sensor arrangement
temperature sensor
heating elements
ceramic heater
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004016985T
Other languages
English (en)
Inventor
Hongy Lin
Thomas Laskowski
Jason E Smith
Daniel J Block
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Watlow Electric Manufacturing Co
Original Assignee
Watlow Electric Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Watlow Electric Manufacturing Co filed Critical Watlow Electric Manufacturing Co
Publication of DE602004016985D1 publication Critical patent/DE602004016985D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
    • H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
    • H05B3/28—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
    • H05B3/283—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an inorganic material, e.g. ceramic

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Heating Bodies (AREA)
  • Resistance Heating (AREA)
  • Tunnel Furnaces (AREA)
  • Ceramic Products (AREA)
  • Drying Of Semiconductors (AREA)
DE602004016985T 2003-05-08 2004-02-13 Mehrzonen-keramikheizsystem und verfahren zu seiner herstellung Expired - Lifetime DE602004016985D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/431,758 US20040222210A1 (en) 2003-05-08 2003-05-08 Multi-zone ceramic heating system and method of manufacture thereof
PCT/US2004/004251 WO2004102076A2 (en) 2003-05-08 2004-02-13 Multi-zone ceramic heating system and method of manufacture thereof

Publications (1)

Publication Number Publication Date
DE602004016985D1 true DE602004016985D1 (de) 2008-11-20

Family

ID=33416519

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004016985T Expired - Lifetime DE602004016985D1 (de) 2003-05-08 2004-02-13 Mehrzonen-keramikheizsystem und verfahren zu seiner herstellung

Country Status (6)

Country Link
US (1) US20040222210A1 (de)
EP (1) EP1621048B1 (de)
JP (1) JP4908217B2 (de)
AT (1) ATE410905T1 (de)
DE (1) DE602004016985D1 (de)
WO (1) WO2004102076A2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7951616B2 (en) * 2006-03-28 2011-05-31 Lam Research Corporation Process for wafer temperature verification in etch tools
US8206996B2 (en) * 2006-03-28 2012-06-26 Lam Research Corporation Etch tool process indicator method and apparatus
US7572480B2 (en) * 2006-10-19 2009-08-11 Federal-Mogul World Wide, Inc. Method of fabricating a multilayer ceramic heating element
JP4879060B2 (ja) * 2007-03-26 2012-02-15 日本碍子株式会社 基板加熱装置
US8637794B2 (en) * 2009-10-21 2014-01-28 Lam Research Corporation Heating plate with planar heating zones for semiconductor processing
US8791392B2 (en) 2010-10-22 2014-07-29 Lam Research Corporation Methods of fault detection for multiplexed heater array
US8546732B2 (en) * 2010-11-10 2013-10-01 Lam Research Corporation Heating plate with planar heater zones for semiconductor processing
WO2013130593A1 (en) * 2012-02-27 2013-09-06 Watlow Electric Manufacturing Company Temperature detection and control system for layered heaters
DE102012101717A1 (de) * 2012-03-01 2013-09-05 Aixtron Se Verfahren und Vorrichtung zur Regelung der Oberflächentemperatur eines Suszeptors einer Substratbeschichtungseinrichtung
US9224626B2 (en) * 2012-07-03 2015-12-29 Watlow Electric Manufacturing Company Composite substrate for layered heaters
DE102012111458B4 (de) * 2012-11-27 2022-12-08 Tdk Electronics Ag Halbleitervorrichtung
CN104131268B (zh) * 2013-05-03 2017-02-08 北京北方微电子基地设备工艺研究中心有限责任公司 分区域加热方法、装置和半导体设备
JP6084906B2 (ja) * 2013-07-11 2017-02-22 日本碍子株式会社 セラミックヒータ
CN103874243B (zh) * 2014-03-27 2016-06-01 福建闽航电子有限公司 一种带温控的陶瓷发热片
US20170211185A1 (en) * 2016-01-22 2017-07-27 Applied Materials, Inc. Ceramic showerhead with embedded conductive layers
JP6758143B2 (ja) * 2016-09-29 2020-09-23 日本特殊陶業株式会社 加熱装置
US10679873B2 (en) * 2016-09-30 2020-06-09 Ngk Spark Plug Co., Ltd. Ceramic heater
US10796935B2 (en) * 2017-03-17 2020-10-06 Applied Materials, Inc. Electronic device manufacturing systems, methods, and apparatus for heating substrates and reducing contamination in loadlocks
GB2598522B (en) * 2017-05-03 2022-09-07 Jemella Ltd Hair styling appliance
US20210159102A1 (en) * 2019-11-26 2021-05-27 Tokyo Electron Limited THERMAL TREATMENTS USING A PLURALITY OF EMBEDDED RESISTANCE TEMPERATURE DETECTORS (RTDs)

Family Cites Families (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US166854A (en) * 1875-08-17 Improvement in vehicle fifth-wheels
US134775A (en) * 1873-01-14 Improvement in transplanters
US2938103A (en) * 1958-04-11 1960-05-24 Electrofilm Inc Thermostat-carrying electrical heating materials for surface application
US3789190A (en) * 1972-10-17 1974-01-29 A J Matlen Temperature regulation for electrical heater
US3813520A (en) * 1973-03-28 1974-05-28 Corning Glass Works Electric heating unit
US4549073A (en) * 1981-11-06 1985-10-22 Oximetrix, Inc. Current controller for resistive heating element
JPH0719645B2 (ja) * 1984-09-07 1995-03-06 日本電装株式会社 自己温度制御型発熱装置
JPS6183825A (ja) * 1984-10-02 1986-04-28 Babcock Hitachi Kk バ−ナ点火装置
GB8514785D0 (en) * 1985-06-11 1985-07-10 Micropore International Ltd Infra-red heaters
US4640224A (en) * 1985-08-05 1987-02-03 Spectrum Cvd, Inc. CVD heat source
US4607591A (en) * 1985-08-06 1986-08-26 Spectrum Cvd, Inc. CVD heater control circuit
JPH0617272B2 (ja) * 1986-02-12 1994-03-09 株式会社日本自動車部品総合研究所 窒化珪素−アルミナ系複合セラミツクスおよびその製造方法
US4778559A (en) * 1986-10-15 1988-10-18 Advantage Production Technology Semiconductor substrate heater and reactor process and apparatus
US4937435A (en) * 1987-12-14 1990-06-26 Thermon Manufacturing Company Flexible electric heating pad using PTC ceramic thermistor chip heating elements
US5001423A (en) * 1990-01-24 1991-03-19 International Business Machines Corporation Dry interface thermal chuck temperature control system for semiconductor wafer testing
JPH0628258B2 (ja) * 1990-07-20 1994-04-13 日本碍子株式会社 半導体ウエハー加熱装置及びその製造方法
US5134248A (en) * 1990-08-15 1992-07-28 Advanced Temperature Devices, Inc. Thin film flexible electrical connector
GB9020400D0 (en) * 1990-09-19 1990-10-31 Raychem Sa Nv Electrical heating tape
DE69130205T2 (de) * 1990-12-25 1999-03-25 Ngk Insulators Ltd Heizungsapparat für eine Halbleiterscheibe und Verfahren zum Herstellen desselben
US5264681A (en) * 1991-02-14 1993-11-23 Ngk Spark Plug Co., Ltd. Ceramic heater
US5436172A (en) * 1991-05-20 1995-07-25 Texas Instruments Incorporated Real-time multi-zone semiconductor wafer temperature and process uniformity control system
DE4130337C2 (de) * 1991-09-12 2002-05-02 Ego Elektro Blanc & Fischer Verfahren zum Betrieb einer elektrischen Heizeinheit und elektrische Heizeinheit
FR2682253A1 (fr) * 1991-10-07 1993-04-09 Commissariat Energie Atomique Sole chauffante destinee a assurer le chauffage d'un objet dispose a sa surface et reacteur de traitement chimique muni de ladite sole.
US5268989A (en) * 1992-04-16 1993-12-07 Texas Instruments Incorporated Multi zone illuminator with embeded process control sensors and light interference elimination circuit
US5783805A (en) * 1992-06-05 1998-07-21 Katzmann; Fred L. Electrothermal conversion elements, apparatus and methods for use in comparing, calibrating and measuring electrical signals
JP2828575B2 (ja) * 1993-11-12 1998-11-25 京セラ株式会社 窒化珪素質セラミックヒータ
JPH08274147A (ja) * 1995-03-30 1996-10-18 Kyocera Corp ウェハ保持装置
US6133557A (en) * 1995-01-31 2000-10-17 Kyocera Corporation Wafer holding member
US5715361A (en) * 1995-04-13 1998-02-03 Cvc Products, Inc. Rapid thermal processing high-performance multizone illuminator for wafer backside heating
US5830277A (en) * 1995-05-26 1998-11-03 Mattson Technology, Inc. Thermal processing system with supplemental resistive heater and shielded optical pyrometry
US5881208A (en) * 1995-12-20 1999-03-09 Sematech, Inc. Heater and temperature sensor array for rapid thermal processing thermal core
KR100280634B1 (ko) * 1996-05-05 2001-02-01 세이이치로 미야타 전기 발열체 및 이를 이용한 정전 척
US5885353A (en) * 1996-06-21 1999-03-23 Micron Technology, Inc. Thermal conditioning apparatus
US6066836A (en) * 1996-09-23 2000-05-23 Applied Materials, Inc. High temperature resistive heater for a process chamber
KR100551980B1 (ko) * 1997-11-03 2006-02-20 에이에스엠 아메리카, 인코포레이티드 저질량 지지체를 이용한 웨이퍼의 처리방법 및 장치
JPH11214127A (ja) * 1998-01-21 1999-08-06 Riken Corp ヒーター装置及びその製造方法
US5970214A (en) * 1998-05-14 1999-10-19 Ag Associates Heating device for semiconductor wafers
JP2000058237A (ja) * 1998-06-05 2000-02-25 Ngk Spark Plug Co Ltd セラミックヒ―タ及びそれを用いた酸素センサ
JP3764278B2 (ja) * 1998-07-13 2006-04-05 株式会社東芝 基板加熱装置、基板加熱方法及び基板処理方法
JP3892609B2 (ja) * 1999-02-16 2007-03-14 株式会社東芝 ホットプレートおよび半導体装置の製造方法
US6469283B1 (en) * 1999-03-04 2002-10-22 Applied Materials, Inc. Method and apparatus for reducing thermal gradients within a substrate support
US6231933B1 (en) * 1999-03-18 2001-05-15 Primaxx, Inc. Method and apparatus for metal oxide chemical vapor deposition on a substrate surface
US6191394B1 (en) * 1999-05-19 2001-02-20 Tokyo Electron Ltd. Heat treating apparatus
JP3228923B2 (ja) * 2000-01-18 2001-11-12 イビデン株式会社 半導体製造・検査装置用セラミックヒータ
JP4028149B2 (ja) * 2000-02-03 2007-12-26 日本碍子株式会社 加熱装置
EP1204299A1 (de) * 2000-04-29 2002-05-08 Ibiden Co., Ltd. Keramisches heizelement und verfahren zur regelung der temperatur des heizelement.
EP1391919A1 (de) * 2001-04-11 2004-02-25 Ibiden Co., Ltd. Keramisches heizelement für eine halbleiterherstellungs-/-untersuchungsvorrichtung
CN100401852C (zh) * 2001-04-30 2008-07-09 科林研发公司 用于控制工件支架表面上空间温度分布的方法与装置
DE10125350A1 (de) * 2001-05-23 2002-11-28 Linde Ag Vorrichtung zur Kühlung von Bauteilen mittels Hydraulikflüssigkeit aus einem hydraulischen Kreislauf
US6529686B2 (en) * 2001-06-06 2003-03-04 Fsi International, Inc. Heating member for combination heating and chilling apparatus, and methods
JP3888531B2 (ja) * 2002-03-27 2007-03-07 日本碍子株式会社 セラミックヒーター、セラミックヒーターの製造方法、および金属部材の埋設品
JP4136696B2 (ja) * 2003-02-12 2008-08-20 キヤノン株式会社 画像形成装置および画像形成方法

Also Published As

Publication number Publication date
US20040222210A1 (en) 2004-11-11
ATE410905T1 (de) 2008-10-15
EP1621048A2 (de) 2006-02-01
WO2004102076A2 (en) 2004-11-25
EP1621048A4 (de) 2007-04-11
WO2004102076A3 (en) 2005-06-16
JP4908217B2 (ja) 2012-04-04
JP2007515778A (ja) 2007-06-14
EP1621048B1 (de) 2008-10-08

Similar Documents

Publication Publication Date Title
DE602004016985D1 (de) Mehrzonen-keramikheizsystem und verfahren zu seiner herstellung
WO2008120469A1 (ja) 炭化珪素半導体素子の製造方法
CN104106128B (zh) 用于基板的选择性氧化的方法和设备
DE602005025976D1 (de) Herstellungsverfahren für ein siliziumcarbidhalbleiterbauelement
ATE422682T1 (de) Stempel, methode zu seiner herstellung und gebrauch desselben
TW200717753A (en) Cladding material and its fabrication method, method for molding cladding material, and heat sink using cladding material
WO2007030309A3 (en) Flexible graphite flooring heat spreader
TW200625520A (en) Method for forming trench isolation structure
TW200723370A (en) Multi-zone resistive heater
WO2008142568A3 (en) Thermally insulating ceramic substrates for gas sensors
DE60218898D1 (de) Vorrichtung und methode zur gehäuseverwerfungs-kompensation mit einem integrierten wärmeverteiler
JP2006013302A (ja) 基板載置装置及び基板温度調整方法
WO2008039611A3 (en) Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system
TW200709256A (en) Active cooling substrate support
CN103811335B (zh) 氧化硅薄膜制备方法、氧化膜厚度控制装置及氧化炉
WO2009075124A1 (ja) 半導体装置の製造方法および半導体装置
DK1605238T3 (da) Elektronisk varmefordelingsmåler
EP1681526A3 (de) Temperregel-Verfahren und -Vorrichtung, Wärmebehandlungs-Vorrichtung und Programm
TW200512807A (en) Substrate heater and fabrication method for the same
TW200730673A (en) Single-crystal semiconductor fabrication device and fabrication method thereof
TW200636829A (en) Apparatus and method for thermal processing
DE602005020453D1 (de) Inline-heizelement zur verwendung bei der chemischen halbleiter-nassbearbeitung und herstellungsverfahren dafür
TWI249187B (en) Rapid temperature compensation module for semiconductor tool
EP1300871A3 (de) Halbleiterbearbeitungsgerät und dafür geeignetes Elektrodenteil
ATE473424T1 (de) Füllstandssensor und zugehöriges betriebs-und herstellungsverfahren sowie entsprechende verwendung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition