WO2009122598A1 - 論理回路 - Google Patents
論理回路 Download PDFInfo
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- WO2009122598A1 WO2009122598A1 PCT/JP2008/065084 JP2008065084W WO2009122598A1 WO 2009122598 A1 WO2009122598 A1 WO 2009122598A1 JP 2008065084 W JP2008065084 W JP 2008065084W WO 2009122598 A1 WO2009122598 A1 WO 2009122598A1
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- terminal
- switching element
- logic circuit
- pulse
- bistable
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- G—PHYSICS
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- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/313—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of semiconductor devices with two electrodes, one or two potential barriers, and exhibiting a negative resistance characteristic
Definitions
- the present invention relates to a logic circuit using a two-terminal switching element having a memory property, in particular, a spin valve element to which a tunnel magnetoresistance effect (TMR) or a giant magnetoresistance effect (GMR) is applied.
- TMR tunnel magnetoresistance effect
- GMR giant magnetoresistance effect
- the tunnel practicing tunnel magnetoresistance (TMR) effect that occurs in the laminated structure of ferromagnetic layers, insulating layers and ferromagnetic layers is currently considered the most practical.
- the spin valve element applies a giant magnetoresistance (GMR) effect generated in a laminated structure of a ferromagnetic layer, a nonmagnetic layer (conductive layer), and a ferromagnetic layer.
- GMR giant magnetoresistance
- MRAM magnetic random access memory
- DRAM Dynamic Random Access Memory
- SDRAM Synchronous DRAM
- these spin valve elements are basically bistable resistance elements having two stable resistance values with respect to one applied voltage value. Therefore, if a logic circuit having a memory property is formed using these spin valve elements, the number of elements may be significantly reduced as compared with a logic circuit using a current silicon element. Therefore, in order to improve the integration degree, it is desired to realize a logic circuit using the spin valve element.
- Patent Document 1 discloses that a programmable logic circuit is formed using a spin transistor, but the circuit follows a conventional CMOS circuit, and is not necessarily a feature of the spin valve element. It is not something that takes advantage of the high integration.
- Patent Document 2 proposes an element provided with a third electrode for detecting its own potential in a magnetic layer of a spin valve element, and a logic circuit using the element. Is not disclosed.
- the logic circuit does not have a structure suitable for high integration because the spin valve element used has three terminals.
- Patent Document 3 proposes a logic circuit (bistable circuit) configured using an organic bistable resistance element having two stable resistance values with respect to one applied voltage value. An example of this logic circuit is shown in FIG.
- This logic circuit has a configuration in which a resistance element 103 is connected in series to a two-terminal switching element 101 which is an organic bistable resistance element, and operates as follows. That is, when the two-terminal switching element 101 is in a low resistance state, a two-terminal switching element 101 is brought into a high resistance state by inputting a trigger pulse of a predetermined voltage to the reset input terminal 107 with the DC bias voltage Vt applied. As a result, the potential of the output terminal 109 changes from Vt-Von to Vt-Voff.
- Von is the terminal voltage of the element 101 in the low resistance state
- Voff (> Von) is the terminal voltage of the element 101 in the high resistance state.
- the two-terminal switching element 101 made of an organic bistable resistance element does not have a memory property, it is necessary to continue to apply the bias voltage Vt in order to maintain the state. For this reason, when a write input pulse is applied, there is a disadvantage that current leaks to the bias voltage line and that unnecessary power is consumed.
- the present invention has been made in view of the above points, and an object of the present invention is to provide a logic circuit having a current efficiency with a simple configuration using a two-terminal bistable switching element having memory characteristics.
- a two-terminal bistable switching element having a characteristic of having a second resistance value different from the first resistance value and a characteristic of maintaining each of the above-described states under non-voltage application;
- a first switching element having one end connected to one terminal of the bistable switching element;
- a second switching element having one end connected to the other terminal of the two-terminal bistable switching element via a resistance element;
- First and second pulse input terminals connected to one and other terminals of the two-terminal bistable switching element, respectively, the other end of the first switching element, and the second switching Bias voltage is applied between the other end of the child, to provide a logic circuit, wherein a trigger pulse is input from the first and second pulse input terminals.
- the logic circuit may further include third and fourth switching elements connected to one and other terminals of the two-terminal bistable switching element, respectively.
- the third switching element is operated to reduce the impedance at one terminal of the two-terminal bistable switching element when a trigger pulse is input from the second pulse input terminal
- the fourth switching element is operated so as to lower the impedance at the other terminal of the two-terminal bistable switching element when a trigger pulse is input from the first pulse input terminal.
- the two-terminal bistable switching element for example, at least an insulating layer or a nonmagnetic layer and a pair of ferromagnetic layers having different coercive forces provided in a form sandwiching the insulating layer or the nonmagnetic layer And a bistable resistance element having an insulator thin film and a pair of electrodes provided so as to sandwich the insulator thin film can be applied.
- the two-terminal bistable switching element controls the formation and disappearance of metal clusters in the gap by applying an electric field to the minute gap between the solid electrolyte electrode and the metal electrode.
- An atomic switch configured to electrically turn on and off between the electrodes may be used.
- the first resistance value when a voltage equal to or lower than the first threshold voltage is applied, the first resistance value is obtained, and when a voltage higher than the second threshold voltage and higher than the second threshold voltage is applied.
- a state having a second resistance value different from the first resistance value, and a characteristic of maintaining each of the states under non-voltage application, and in series with each other in the same polarity The first and second two-terminal bistable switching elements and the first and second terminals connected to one end and the other end of the series circuit of the first and second two-terminal bistable switching elements, respectively.
- a switching element a first pulse input terminal connected to one end and the other end of the series circuit, and a second pulse input terminal connected to an intermediate point of the series circuit, the first circuit
- the other end of the switching element and the second switch Bias voltage is applied between the other end of the grayed elements, also provides the logic circuit, wherein a trigger pulse is input from the first and second pulse input terminals.
- the logic circuit may further include third, fourth, and fifth switching elements connected to one end, the other end, and an intermediate point of the series circuit, respectively.
- the third and fourth switching elements are operated so as to reduce impedances at one end and the other end of the series circuit, respectively, when a trigger pulse is input from the second pulse input terminal
- the fifth switching element is operated so as to lower the impedance at the midpoint of the series circuit when a trigger pulse is input from the first pulse input terminal.
- At least one of the first and second two-terminal bistable switching elements for example, at least an insulating layer or a nonmagnetic layer and a mutual coercive force provided so as to sandwich the insulating layer or the nonmagnetic layer are provided.
- a spin valve element having a pair of different ferromagnetic layers, or a bistable resistance element having an insulator thin film and a pair of electrodes provided so as to sandwich the insulator thin film can be applied.
- At least one of the first and second two-terminal bistable switching elements applies an electric field to the minute gap between the solid electrolyte electrode and the metal electrode, thereby controlling formation and disappearance of the metal cluster in the gap.
- An atomic switch configured to electrically turn on and off between the solid electrolyte electrode and the metal electrode by this control may be used.
- the first and second pulse input terminals are connected to each other via a rectifier element as necessary.
- bistable switching element spin valve element, atomic switch, etc.
- memory property nonvolatile
- FIG. 1 is a circuit diagram showing a first embodiment of a logic circuit according to the present invention. It is sectional drawing which shows the basic composition part of the spin valve element using TMR. It is sectional drawing which shows the basic composition part of the spin valve element using GMR. It is explanatory drawing which shows an example of the electrical property of a spin valve element. It is a circuit diagram which shows 2nd Embodiment of the logic circuit based on this invention. It is a circuit diagram which shows 3rd Embodiment of the logic circuit based on this invention. It is a circuit diagram which shows 4th Embodiment of the logic circuit which concerns on this invention. It is a circuit diagram at the time of connecting an amplifier to the logic circuit which concerns on this invention.
- FIG. 7 is an explanatory diagram illustrating a configuration example of a conventional logic circuit.
- FIG. 2 shows a basic configuration of the spin valve element 1 to which the tunnel magnetoresistance effect (TMR) is applied.
- the spin valve element 1 includes a single insulator layer 5 formed on a substrate 3 and a pair of ferromagnetic layers 7 (fixed layer) and 9 (free layer) sandwiching the insulator layer 5.
- electrode layers 11 and 13, an antiferromagnetic layer (pinned layer) 15, a capping layer 17 and the like are added as necessary.
- the magnetization direction of the ferromagnetic layer 7 is fixed by magnetic coupling with the antiferromagnetic layer 15 or the like.
- torque that is parallel to the fixed layer 7 acts on the spin of the free layer 9.
- a torque that is antiparallel to the fixed layer 7 acts on the spin of the free layer 9.
- the portion above the insulator layer 5 is made sufficiently smaller than the substrate side.
- Insulating film 10 is generally formed around.
- a step of forming a laminated film from 2 to electrode 7 an exposure process step by applying a negative resist and a photolithographic method, and ion milling.
- a method including a step of cutting out a portion on the insulator layer 5 by the step, a step of forming the insulating layer 10 by SiO 2 coating or the like, and a step of applying the wiring 11 after lift-off.
- FIG. 3 shows the basic components of a spin valve element 1 ′ to which the giant magnetoresistive effect (GMR) is applied.
- This spin valve element is basically the same as the spin valve element 1 to which the tunnel magnetoresistive effect is applied, except for the point that the insulator layer 5 shown in FIG. 3 is replaced by a nonmagnetic layer 23. .
- the spin valve elements 1 and 1 generally have electrical characteristics as shown in FIG. 4 (however, the direction of voltage and current is positive from the fixed layer 7 toward the free layer 9). That is, when electrons flow from the fixed layer 7 (voltage and current are in the negative direction), a torque that is parallel to the fixed layer 7 acts on the spin of the free layer 9. As a result, below a certain threshold voltage ⁇ Vp, the spins of the free layer 9 and the fixed layer 7 become parallel and the electrical resistance decreases (corresponding to a negative voltage in FIG. 4). Conversely, when electrons flow from the free layer 9 toward the fixed layer 7, a torque that is antiparallel to the fixed layer 7 acts on the spin of the free layer 9. As a result, the electrical resistance increases at another threshold voltage Vap or higher.
- FIG. 1 shows a basic configuration of a logic circuit according to the first embodiment of the present invention.
- the spin valve element 1 is used as a two-terminal bistable switching element having a memory function.
- the spin valve element 1 ′ having the same function, an atomic switch, and the like are used.
- a terminal bistable switching element may be used. The same applies to other embodiments described later.
- the logic circuit of this embodiment has a configuration in which a switching element 25, the spin valve element 1, a resistance element 27, and a switching element 29 are connected in series between a terminal a and a ground terminal c.
- a set input terminal (S terminal) 33 is connected to one terminal of the spin valve element 1 to which the switching element 25 is connected via a rectifying element 31, and the spin valve element 1 to which the resistance element 27 is connected.
- a reset input terminal (R terminal) 37 and an output terminal (Q terminal) 39 are connected to the other terminal via a rectifying element 35.
- This logic circuit operates as follows. That is, when the switching elements 25 and 29 are turned off and a DC bias voltage Vt is applied between the terminals a and c, a voltage having a value corresponding to the current state of the spin valve element 1 is output from the Q terminal 39. .
- the DC bias voltage Vt is specifically set so that the voltage applied to the spin valve element 1 is sufficiently smaller than the voltages Vp and Vap shown in FIG. 2 so that the state of the spin valve element 1 does not change. Selected to be.
- the resistance value in the low resistance state of the spin valve element 1 is Ron and the resistance value in the high resistance state is Roff
- Voff Vt ⁇ Rs / (Rs + Roff) Where Rs is the resistance value of the resistance element 27
- Switching between the two operating points can be controlled by supplying a switching current to the spin valve element 1 with both the switching elements 25 and 29 turned on. That is, by inputting a pulse current from the S terminal 33, the voltage of the Q terminal 39 can be set to Von, and by inputting a pulse current from the R terminal 37, the voltage of the Q terminal 39 can be set to Voff. it can.
- the absolute value of the larger one of the voltages Vp and Vap shown in FIG. 2 is set as Vm, and a voltage pulse equal to or higher than Vm is selectively applied as a trigger signal to the S terminal 33 and the R terminal 37.
- the synchronization of the input timing of the voltage pulse to the S terminal 33 and the R terminal 37 and the on / off timing of the switching elements 25 and 29 uses, for example, field effect transistors as the switching elements 25 and 29, and the S terminal 33 and the R terminal.
- the input timing of the voltage pulse to 37 and the gate signal input timing to each of the transistors corresponding to the terminals 33 and 37 can be easily realized.
- FIG. 5 shows a logic circuit according to the second embodiment of the present invention.
- the logic circuit according to the present embodiment is different from the first embodiment in that switching elements 41 and 43 are further added.
- the switching element 41 has one end connected to one terminal of the spin valve element 1 and the other end grounded.
- the switching element 43 has one end connected to the other end of the spin valve element 1 and the other end grounded.
- the synchronization of the input timing of the voltage pulse to the S terminal 33 and the R terminal 37 and the on / off timing of the switching elements 41 and 43 uses, for example, field effect transistors as the switching elements 41 and 43, and the S terminal 33 and the R terminal.
- the input timing of the voltage pulse to 37 and the gate signal input timing to each of the transistors corresponding to the terminals 33 and 37 can be synchronized.
- the connection portion of the rectifying element 35 is grounded via the switching element 43 simultaneously with the input of the voltage pulse to the S terminal 33, and the voltage pulse to the R terminal 37 is set. Since the connecting portion of the rectifying element 31 is grounded via the switching element 41 simultaneously with the input of the input, the input pulse from the S terminal 33 wraps around to the R terminal 37 side, and the input pulse from the R terminal 37 becomes the S terminal. It is prevented that it goes around to the 33 side. Therefore, there is an advantage that it is not necessary to consider the conditions for the impedance when the S terminal 33 side is viewed from one end of the spin valve element 1 and the impedance when the R terminal 37 side is viewed from the other end of the spin valve element 1.
- the logic circuit according to the first and second embodiments does not change state when a voltage pulse is not input to either the S terminal 33 or the R terminal 37. Further, when voltage pulses are simultaneously input to both the S terminal 33 and the R terminal 37, the pulses cancel each other, so that no change in state occurs.
- the spin valve element 1 since the spin valve element 1 has a memory property, the state of the Q output terminal 39 is maintained even when the switching elements 25 and 29 are in an off state, that is, even when a bias voltage is not applied. Further, the state of the Q output terminal 39 is maintained even when the pulse current from the S terminal 33 and the R terminal 37 disappears.
- the pulse input to the S terminal 33 and the R terminal 37 is 1, the non-input is 0, the current state value of the Q terminal 39 is Qn, and the pulse is input.
- the state value of the Q terminal 39 at the next stage is Qn + 1
- the Q terminal 39 corresponds to the combination of pulse input “1” and non-input “0” to the S terminal 33 and R terminal 37.
- the state value (voltage value) of will change as shown in the table below.
- pulses having the same voltage value and time width are input to the S terminal 33 and the R terminal 37, but the voltage value and the time width are different as long as the above-described conditions are satisfied. Pulses can be used as input pulses.
- the flip-flop circuits are classified according to their functions into RS (Reset / set) flip-flop circuits, JK flip-flop circuits, T (Trigger) flip-flop circuits, and D (Delay) flip-flop circuits (for example, Takeo Miyata “ (See page 89, 1998, Corona).
- RS Reset / set flip-flop circuits
- JK flip-flop circuits JK flip-flop circuits
- T (Trigger) flip-flop circuits flip-flop circuits
- D (Delay) flip-flop circuits for example, Takeo Miyata “ (See page 89, 1998, Corona).
- the logic table of the RS flip-flop circuit which is the most basic flip-flop circuit, is shown below.
- FIG. 6 shows a logic circuit according to the third embodiment of the present invention.
- the resistance element 27 of the logic circuit shown in FIG. 1 is replaced with the spin valve element 2, and one end and the other end of the series circuit of the two-terminal bistable switching elements 1 and 2 are respectively rectifier elements.
- the intermediate point of this series circuit is connected to the R terminal 37 via the rectifying element 35.
- the spin valve element 2 has the same configuration and characteristics as the spin valve element 1 (see FIG. 2), and is connected in series to the spin valve element 1 in a form in which the polarity direction is the same as that of the spin valve element 1. Yes.
- one of the spin valve elements 1 and 2 is placed in a high resistance state in both the set state and the reset state. Therefore, when the bias voltage Vt is applied, There is an advantage that the current value is reduced.
- FIG. 7 shows a logic circuit according to the fourth embodiment of the present invention.
- the logic circuit according to the present embodiment has a configuration in which switching elements 51, 53, and 55 are added to the logic circuit according to the third embodiment.
- Switching elements 51 and 53 have one end connected to one end and the other end of a series circuit of two-terminal bistable switching elements 1 and 2, respectively, and switching element 52 has one end connected to an intermediate point of the series circuit. Has been.
- the other ends of the switching elements 51, 53 and 55 are all grounded.
- the switching elements 51 and 55 are turned off, and the switching element 53 is turned on.
- the spin valve element 1 transitions to the low resistance state
- the spin valve element 2 transitions to the high resistance state.
- the switching elements 51 and 55 and the switching element 53 are turned on and off, respectively, so that the states of the spin valve elements 1 and 2 are reversed.
- the synchronization of the input timing of the voltage pulse to the S terminal 33 and the R terminal 37 and the on / off timing of the switching elements 51, 53, and 55 uses, for example, field effect transistors as the switching elements 51, 53, and 55, and the S terminal. 33, and a method of synchronizing the input timing of the voltage pulse to the R terminal 37 and the input timing of the gate signal to each transistor.
- the following advantages can be obtained. That is, since the input pulses from the S terminal 33 and the R terminal 37 do not wrap around to the R terminal 37 and the S terminal 33 side, respectively, the S terminal 33 side is seen from the coupling portion of the switching element 25 and the spin valve element 1. It is not necessary to consider the impedance and the conditions for the impedance when the R terminal 37 side is viewed from the coupling portion of the spin valve element 1 and the resistance element 27.
- the operation result is obtained even after the logic operation is performed by the pulse input from the S terminal 33 and the R terminal 37 and then the power is turned off.
- the calculation result can be read out by storing the current and energizing again when necessary. Therefore, the advantage that power consumption can be reduced is also obtained.
- the rectifying elements 31 and 35 shown in FIG. 1 and the rectifying element 47 shown in FIG. 6 can be omitted if the impedances of the S terminal 33 and the R terminal 37 are sufficiently high.
- an amplifier circuit can be added to the subsequent stage of the logic circuit according to each of the embodiments as necessary.
- FIG. 8 shows an example in which an amplifier circuit composed of one bipolar transistor is used, and the Q terminal 39 of the logic circuit is connected to the base terminal of the bipolar transistor.
- the features of the spin valve element used in each of the above embodiments are that it has a memory property, has a long repeated life, and can operate at high speed. As described above, this spin valve element is roughly classified into the TMR spin valve element 1 shown in FIG. 2 and the GMR spin valve element 1 ′ shown in FIG.
- a silicon substrate or a glass substrate is used as the substrate 2 of the TMR spin valve element 1. Further, Ta, Pt, Cu, and Au are used as the material for the electrode layers 11 and 13, IrMn and PtMn are used as the material for the antiferromagnetic layer 15, and Co, CoFe, and the like are used as the material for the ferromagnetic layer 7 (fixed layer).
- CoFeB is Al 2 O 3 , MgO as the material of the insulator layer 5, Co, CoFe, CoFeB, NiFe as the material of the ferromagnetic layer 9 (free layer), and Cu, Pd as the material of the capping layer 17. Is a representative example, but is not limited thereto.
- the spin valve element 1 In producing the spin valve element 1, it is effective to perform annealing in a magnetic field in order to adjust the crystallinity of each layer and the magnetic anisotropy of the fixed layer after laminating the above constituent materials. Further, if necessary, the ferromagnetic layer 7 (fixed layer) and the ferromagnetic layer 9 (free layer) can be an antiferromagnetic coupling film made of, for example, CoFeB / Ru / CoFeB. As described above, the GMR spin valve element 1 ′ has the same configuration as the TMR spin valve element 1 except that the insulator layer 5 of the TMR spin valve element 1 is replaced with the nonmagnetic layer 23.
- bistable resistance element including a single insulating thin film and electrodes sandwiching the insulating thin film. Is also an element suitable for the present invention.
- This bistable resistive element is used as an insulator material, for example, Fe 2 O 3 , NiO, CoO, Cu x O, TiO 2 , Ta 2 O 5 , Nb 2 O 5 , Al 2 O 3 , ZrO x , various perovskites.
- This bistable resistance element can reversibly change resistance by applying a voltage pulse between the upper electrode and the lower electrode.
- This bistable resistive element made of an insulating thin film has the advantage that it has a memory property and a ratio of two resistance values is large and that it can operate at high speed.
- An atomic switch can also be used as the two-terminal bistable switching element in the present invention.
- This atomic switch controls the formation and annihilation of metal clusters in the gap by applying an electric field to the minute gap between the metal electrode and the solid electrolyte electrode made of AgS, Cu 2 S, etc. It electrically turns on and off between the electrode and the metal electrode.
- This atomic switch has a feature that the ratio of two resistance values is large because almost no current flows in the off state. Of course, it also has memory characteristics.
- bistable switching elements such as the bistable resistance element and the atomic switch
- the bistable resistance element and the atomic switch can be replaced with a stable switching element.
- both the elements 1 and 2 are replaced with the other two-terminal bistable switching elements, one of the elements 1 and 2 is replaced with the bistable resistance element, and the other is replaced with the atomic switch. You may do it.
- Example 1 The TMR spin valve element 1 was produced by the following procedure. That is, by sputtering, Au (5 nm thickness) / Ta (5 nm thickness) is formed as the electrode layer 11 on the substrate 3 made of silicon, and Ni 80 Fe 20 (5 nm thickness) / IrMn (8 nm thickness) is formed as the antiferromagnetic layer 15. ), Co 70 Fe 10 (2 nm thickness) / Ru (0.8 nm thickness) / Co 40 Fe 40 B 20 (6 nm thickness) as the ferromagnetic layer 7, and MgO (0.8 nm thickness) as the insulator layer 5 are fixed.
- Co 40 Fe 40 B 20 (2 nm thickness) / Ta (5 nm thickness) / Ru (5 nm thickness) as layer 9, Cu (2 nm thickness) as capping layer 17, and Au (2 nm thickness) as electrode layer 13 are sequentially stacked.
- patterning was performed by electron beam irradiation, and a 100 nm ⁇ 50 nm elliptical columnar spin valve element was formed by ion milling.
- SiO 2 film was formed by CVD, the resist on the spin valve element was removed by lift-off, and then annealed at 350 ° C. in a magnetic field of about 4 kOe.
- Example 1 was constructed as a sample of Example 1 using the spin valve element thus obtained.
- bipolar transistors having an emitter-collector voltage loss of 0.2 V in the ON state are used as the switching elements 25 and 27, and those having a resistance value Rs of 2 k ⁇ are used as the resistance element 27.
- Example 2 The circuit shown in FIG. 7 was used. A field effect transistor was used as the switching elements 51, 53, and 55, and the spin valve elements 1 and 2 were prepared by the same method as in Example 1 to obtain a sample of Example 2.
- Example 3 A bistable resistance element 1 ′ using an insulating thin film was produced by the following procedure. That is, Cu (200 nm thickness) was formed as the lower electrode layer 11 on the substrate 2 made of silicon by sputtering, and then the surface was flattened by ordinary chemical mechanical polishing. Next, a Cu x O film (120 nm thickness) was formed by thermal oxidation, and then TiN (50 nm thickness) was formed to form the upper electrode 13. Further, after applying a negative resist, patterning was performed by electron beam irradiation, and a 200 nm ⁇ circular columnar bistable resistance element was formed by ion milling. Next, after the SiO 2 film was formed by the CVD method, the resist on the bistable resistance element was removed by lift-off. Using the bistable resistance element obtained in this way, the circuit shown in FIG.
- Test Example Table 3 summarizes the driving conditions and the operation results for each sample obtained in Examples 1 to 3 above.
- the input pulse width was 20 ns for Examples 1 and 2 and 70 ns for Example 3.
- good results were obtained, and the operation as an RS flip-flop circuit was confirmed.
- bistable switching element spin valve element, atomic switch, etc.
- memory property nonvolatile
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Abstract
Description
また、特許文献2は、スピンバルブ素子の磁性層に自身の電位を検出するための第3の電極を具備させる素子と、それを用いた論理回路を提案しているが、具体的な回路構成は開示していない。しかも、その論理回路は、使用されているスピンバルブ素子が3端子であるため、高集積化に適した構造を有していない。
特許文献3は、印加される1つの電圧値に対し2つの安定な抵抗値を持つ有機双安定抵抗素子を用いて構成した論理回路(双安定回路)を提案している。この論理回路の一例を図9に示す。
したがって、この論理回路は、いわゆるRSフリップフロップとしての機能を有する。
また、前記2端子双安定スイッチング素子が、固体電解質電極と金属電極間の微小ギャップに電界を印加することによって、該ギャップにおける金属クラスターの形成と消滅を制御し、この制御によって固体電解質電極と金属電極間を電気的にオンオフするように構成された原子スイッチであっても良い。
なお、前記第1および第2のパルス入力端子は、必要に応じて、それぞれ整流素子を介して接続される。
3 基板
5 絶縁体層
7 強磁性層(固定層)
9 強磁性層(フリー層)
11、13 電極層
15 反強磁性層(ピン止め層)
17 キャッピング層
23 非磁性層
25、29 スイッチング素子
27 抵抗素子
31,35、47 整流素子
33 セット入力端子
37 リセット入力端子
39 出力端子
41、43、51、53、55 スイッチング素子
57 増幅用トランジスタ
以下に説明する本発明の第1~第4の実施形態においては、双安定素子としてスピンバルブ素子を使用している。そこで、まず、このピンバルブ素子について説明する。
図2は、トンネル磁気抵抗効果(TMR)を応用したスピンバルブ素子1の基本構成を示す。このスピンバルブ素子1は、基板3の上に構成された1層の絶縁体層5と、該絶縁体層5を挟む1対の強磁性層7(固定層)および9(フリー層)とを備え、必要に応じて、電極層11、13、反強磁性層(ピン止め層)15、キャッピング層17などが付加される。
すなわち、固定層7から電子を流すと(電圧、電流としてはマイナス方向となる)、フリー層9のスピンには固定層7と平行となるようなトルクが働く。その結果、ある閾値電圧-Vp以下では、フリー層9と固定層7のスピンが平行になってその電気抵抗が小さくなる(図4ではマイナス電圧に相当)。また逆に、フリー層9から固定層7に向かって電子を流すと、フリー層9のスピンには固定層7と反平行となるようなトルクが働く。その結果、別の閾値電圧Vap以上では、その電気抵抗が大きくなる。
ここで、上記直流バイアス電圧Vtは、スピンバルブ素子1の状態が変化しないように、具体的には、該スピンバルブ素子1に印加される電圧が図2に示す電圧Vp、Vapよりも充分小さくなるよう選択される。
スピンバルブ素子1の低抵抗状態での抵抗値をRon、高抵抗状態での抵抗値をRoffとすると、この低抵抗状態および高抵抗状態におけるQ端子39の電圧値VonおよびVoffは、それぞれ以下のように表される。
Von = Vt×Rs /(Rs + Ron)
Voff= Vt×Rs /(Rs + Roff)
ただし、Rsは抵抗素子27の抵抗値
具体的には、図2に示す電圧Vp、Vapの大きい方の絶対値をVmとして、S端子33およびR端子37にVm以上の電圧パルスをトリガ信号として選択的に印加する。すなわち、S端子33に上記電圧パルスを入力すれば、スピンバルブ素子1の固定層7からフリー層9に向かって電子が流れるので、該スピンバルブ素子1が低抵抗状態に遷移する。これにより、Q端子39の電位は、電流を流す前の状態に関わらずVon = Vt×Rs /(Rs + Ron)となる。同様に、R端子37に上記電圧パルスを印加すれば、スピンバルブ素子1のフリー層9から固定層7に向かって電子が流れるので、該スピンバルブ素子1が高抵抗状態に遷移する。この結果、Q端子39の電位は、電流を流す前の状態に関わらずVoff = Vt×Rs /(Rs + Roff)となる。
一方、R端子37にVm以上の電圧パルスを印加すると同時に、スイッチング素子41および43をそれぞれオン動作およびオフ動作させると、スピンバルブ素子1のフリー層9から固定層7に向かって電子が流れるので、該スピンバルブ素子1が高抵抗状態に遷移する。これによって、Q端子の電位は電流を流す前の状態に関わらずVoff = Vt×Rs /(Rs + Roff)となる。
また、スピンバルブ素子1は、メモリー性を有するので、スイッチング素子25、29がオフ状態であっても、つまり、バイアス電圧が印加されない状態であってもそのQ出力端子39の状態が維持され、また、S端子33とR端子37からのパルス電流が消失している状態でもQ出力端子39の状態が維持される。
なお、上記の各実施形態では、S端子33、R端子37に同じ電圧値と時間幅を有するパルスを入力しているが、前述した条件を満たすものであれば、電圧値と時間幅が異なるパルスを入力パルスとして用いることが可能である。
以下に、最も基本的なフリップフロップ回路である上記RSフリップフロップ回路の論理表を示す。
なお、その他のタイプのフリップフロップ回路は、RSフリップフロップ回路を元に、他種類の素子を併用して構成することが可能である(上記した文献「速解論理回路」を参照)。
スピンバルブ素子2は、スピンバルブ素子1と同等の構成および特性(図2参照)を有し、極性の向きがスピンバルブ素子1のそれと同じになる形態で該スピンバルブ素子1に直列接続されている。
この状態でのQ端子39の電圧は、Von = Vt×Roff/(Ron+Roff)となる。ここで、RonおよびRoffは、それぞれスピンバルブ素子1、2の低抵抗状態および高抵抗状態での抵抗値である。
前述したように、一般に、Von 、Voffには Von > Voffという関係がある。したがって、Von 、Voffをそれぞれセット状態「1」、リセット状態「0」と定義すれば、本実施形態の論理回路が上記表2の動作(RSフリップフロップとしての動作)をしていることが理解される。
また、R端子37に電圧パルスが印加されると同時に、スイッチング素子51、55およびスイッチング素子53がそれぞれオン動作およびオフ動作され、これによってスピンバルブ素子1、2の状態が逆転する。
また、上記各実施形態に係る論理回路の後段に、必要に応じて増幅回路を付加することも可能である。図8には、1つのバイポーラトランジスタからなる増幅回路を用い、このバイポーラトランジスタのベース端子に上記論理回路のQ端子39を接続した例が示されている。
前述のように、このスピンバルブ素子は、図2に示すTMRスピンバルブ素子1と図3に示すGMRスピンバルブ素子1'に大別される。
また、必要に応じて、強磁性層7(固定層)や強磁性層9(フリー層)を、例えばCoFeB/ Ru/ CoFeBなどからなる反強磁性結合膜とすることも可能である。なお、前記したように、GMRスピンバルブ素子1'は、TMRスピンバルブ素子1の絶縁体層5を非磁性層23に置換したことを除き、該TMRスピンバルブ素子1と同様の構成を持つ。
この双安定抵抗素子は、絶縁体の材料として、例えばFe2O3、NiO、CoO、CuxO、TiO2、Ta2O5、Nb2O5、Al2O3、ZrOx、各種ペロブスカイト型酸化物(Pr1-xCaxMnO3、SrTiO3等)を用いることができ、また、電極の材料としては、Pt、Ti、Ni、Cu、TiNを用いることができるが、それらに限定されるものでは無い。
この双安定抵抗素子は、上部電極と下部電極間に電圧パルスを印加することにより抵抗を可逆的に変化させることができる。この絶縁体薄膜からなる双安定抵抗素子は、メモリー性を持つという特長の他、2つの抵抗値の比率が大きく、かつ、高速動作が可能であるという特長を有する。
この原子スイッチは、オフ状態で電流がほとんど流れないため、2つの抵抗値の比率が大きいという特長を持つ。もちろん、メモリー性も有する。
「実施例1」
TMRスピンバルブ素子1を以下の手順で作製した。すなわち、スパッタ手法により、シリコンからなる基板3の上に電極層11としてAu(5nm厚)/ Ta(5nm厚)を、反強磁性層15としてNi80Fe20(5nm厚)/ IrMn(8nm厚)を、強磁性層7としてCo70Fe10(2nm厚) / Ru(0.8nm厚)/ Co40Fe40B20(6nm厚)を、絶縁体層5としてMgO(0.8nm厚)を、固定層9としてCo40Fe40B20(2nm厚)/ Ta(5nm厚)/ Ru(5nm厚) を、キャッピング層17としてCu(2nm厚)を、電極層13としてAu(2nm厚)を順次積層した。さらに、ネガレジストを塗布した後、電子線照射によりパターニングを施し、イオンミリングにより100nm x 50nmの楕円形柱状のスピンバルブ素子を形成した。
つぎに、CVD法によりSiO2膜を形成した後、スピンバルブ素子上のレジストをリフトオフにより除去し、ついで、4kOe程度の磁場中において、350℃でアニールを行った。
このようにして得られたスピンバルブ素子を用いて、図1に示すような回路を実施例1の試料として構成した。ここで、スイッチング素子25、27として、ON状態でのエミッタ・コレクタ間の電圧損失が0.2Vであるバイポーラトランジスタを用い、また、抵抗素子27として、抵抗値Rsが2kΩのものを用いた。
回路として図7に示すものを用いた。スイッチング素子51、53、55として電界効果型トランジスタを用い、スピンバルブ素子1、2を実施例1と同様の手法で作成することによってこの実施例2の試料を得た。
絶縁体薄膜を用いた双安定抵抗素子1'を以下の手順で作製した。すなわち、スパッタ手法により、シリコンからなる基板2の上に下部電極層11としてCu(200nm厚)を成膜し、その後、通常の化学機械研磨により表面を平坦化した。次いで、熱酸化によりCuxO膜(120nm厚)形成した後、 TiN(50nm厚)を形成して上部電極13を作成した。さらに、ネガレジストを塗布した後、電子線照射によりパターニングを施し、イオンミリングにより200nm φの円形柱状の双安定抵抗素子を形成した。つぎに、CVD法によりSiO2膜を形成した後、双安定抵抗素子上のレジストをリフトオフにより除去した。
このようにして得られた双安定抵抗素子を用いて、実施例2と同様に図6に示す回路を実施例3の試料として構成した。
試験例
上記の実施例1~3で得られた各試料についての駆動条件とそれによる動作結果を表3にまとめた。入力パルス幅は、実施例1,2については20ns、実施例3については70nsとした。いずれの実施例においても良好な結果が得られ、RSフリップフロップ回路としての動作が確認された。
Claims (11)
- 第1の閾値電圧以下の電圧が印加された場合に第1の抵抗値を持つ状態になり、前記第1の閾値電圧より大きい第2の閾値電圧以上の電圧が印加された場合に前記第1の抵抗値とは異なる第2の抵抗値を持つ状態になる特性、および非電圧印加下で前記の各状態を維持する特性を有した2端子双安定スイッチング素子と、
前記2端子双安定スイッチング素子の一方の端子に一端が接続された第1のスイッチング素子と、
前記2端子双安定スイッチング素子の他方の端子に抵抗素子を介して一端が接続された第2のスイッチング素子と、
前記2端子双安定スイッチング素子の一方および他方の端子にそれぞれ接続された第1および第2のパルス入力端子と、を備え、
前記第1のスイッチング素子の他端と、前記第2のスイッチング素子の他端との間にバイアス電圧が加えられ、前記第1および第2のパルス入力端子からトリガパルスが入力されることを特徴とする論理回路。 - 前記2端子双安定スイッチング素子の一方および他方の端子にそれぞれ接続された第3および第4のスイッチング素子をさらに備え、
前記第3のスイッチング素子は、前記第2のパルス入力端子からトリガパルスが入力された場合に、前記2端子双安定スイッチング素子の一方の端子におけるインピーダンスを低下させるように作動され、
前記第4のスイッチング素子は、前記第1のパルス入力端子からトリガパルスが入力された場合に、前記2端子双安定スイッチング素子の他方の端子におけるインピーダンスを低下させるように作動されることを特徴とする請求項1に記載の論理回路。 - 前記2端子双安定スイッチング素子が、少なくとも、絶縁体層もしくは非磁性層と、この絶縁体層もしくは非磁性層を挟む形態で設けられた相互に保磁力の異なる1対の強磁性層とを有するスピンバルブ素子であること特徴とする請求項1に記載の論理回路。
- 前記2端子双安定スイッチング素子が、絶縁体薄膜と、該絶縁体薄膜を挟む形態で設けられた一対の電極とを有する双安定抵抗素子であることを特徴とする請求項1に記載の論理回路。
- 前記2端子双安定スイッチング素子が、固体電解質電極と金属電極間の微小ギャップに電界を印加することによって、該ギャップにおける金属クラスターの形成と消滅を制御し、この制御によって固体電解質電極と金属電極間を電気的にオンオフするように構成された原子スイッチであることを特徴とする論理回路。
- 第1の閾値電圧以下の電圧が印加された場合に第1の抵抗値を持つ状態になり、前記第1の閾値電圧より大きい第2の閾値電圧以上の電圧が印加された場合に前記第1の抵抗値とは異なる第2の抵抗値を持つ状態になる特性と、非電圧印加下で前記の各状態を維持する特性とを有し、互いの極性が揃う形態で直列接続された第1および第2の2端子双安定スイッチング素子と、
前記第1および第2の2端子双安定スイッチング素子の直列回路の一端および他端にそれぞれの一端が接続された第1および第2のスイッチング素子と、
前記直列回路の一端と他端に接続された第1のパルス入力端子と、
前記直列回路の中間点に接続された第2のパルス入力端子と、を備え、
前記第1のスイッチング素子の他端と、前記第2のスイッチング素子の他端との間にバイアス電圧が加えられ、前記第1および第2のパルス入力端子からトリガパルスが入力されることを特徴とする論理回路。 - 前記直列回路の一端、他端および中間点にそれぞれ接続された第3、第4および第5のスイッチング素子をさらに備え、
前記第3および第4のスイッチング素子は、前記第2のパルス入力端子からトリガパルスが入力された場合に、それぞれ前記直列回路の一端および他端におけるインピーダンスを低下させるように作動され、
前記第5のスイッチング素子は、前記第1のパルス入力端子からトリガパルスが入力された場合に、前記直列回路の中点におけるインピーダンスを低下させるように作動されることを特徴とする請求項6に記載の論理回路。 - 前記第1および第2の2端子双安定スイッチング素子の少なくとも一方が、少なくとも、絶縁体層もしくは非磁性層と、この絶縁体層もしくは非磁性層を挟む形態で設けられた相互に保磁力の異なる1対の強磁性層とを有するスピンバルブ素子であること特徴とする請求項6に記載の論理回路。
- 前記第1および第2の2端子双安定スイッチング素子の少なくとも一方が、絶縁体薄膜と、該絶縁体薄膜を挟む形態で設けられた一対の電極とを有する双安定抵抗素子であることを特徴とする請求項6に記載の論理回路。
- 前記第1および第2の2端子双安定スイッチング素子の少なくとも一方が、固体電解質電極と金属電極間の微小ギャップに電界を印加することによって、該ギャップにおける金属クラスターの形成と消滅を制御し、この制御によって固体電解質電極と金属電極間を電気的にオンオフするように構成された原子スイッチであることを特徴とする請求項6に記載の論理回路。
- 前記第1および第2のパルス入力端子がそれぞれ整流素子を介して接続されることを特徴とする請求項1または6に記載の論理回路。
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WO2006115062A1 (ja) * | 2005-04-20 | 2006-11-02 | Kyoto University | 汎用論理モジュール及びそれを有する回路 |
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US4301379A (en) * | 1979-10-17 | 1981-11-17 | Ncr Corporation | Latching Schmitt trigger circuit |
JP4744934B2 (ja) | 2004-06-16 | 2011-08-10 | 株式会社東芝 | スピントランジスタ |
US7411235B2 (en) * | 2004-06-16 | 2008-08-12 | Kabushiki Kaisha Toshiba | Spin transistor, programmable logic circuit, and magnetic memory |
JP2006024714A (ja) | 2004-07-07 | 2006-01-26 | Matsushita Electric Ind Co Ltd | プログラマブルロジックデバイス |
JP2007103663A (ja) | 2005-10-04 | 2007-04-19 | Toshiba Corp | 磁気素子、記録再生素子、論理演算素子および論理演算器 |
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2008
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JP2005235307A (ja) * | 2004-02-19 | 2005-09-02 | Tohoku Techno Arch Co Ltd | 磁気抵抗効果素子を用いたロジックインメモリ回路 |
WO2006022017A1 (ja) * | 2004-08-27 | 2006-03-02 | Fuji Electric Holdings Co., Ltd. | 論理回路 |
WO2006115062A1 (ja) * | 2005-04-20 | 2006-11-02 | Kyoto University | 汎用論理モジュール及びそれを有する回路 |
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JP2017507511A (ja) * | 2013-12-18 | 2017-03-16 | インターモレキュラー, インク.Intermolecular, Inc. | 抵抗スイッチングシュミットトリガ及びコンパレータ |
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KR20110002000A (ko) | 2011-01-06 |
JPWO2009122598A1 (ja) | 2011-07-28 |
EP2264893A1 (en) | 2010-12-22 |
KR101398303B1 (ko) | 2014-05-27 |
JP5201489B2 (ja) | 2013-06-05 |
US7880502B2 (en) | 2011-02-01 |
US20100289525A1 (en) | 2010-11-18 |
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