WO2009028297A1 - 電子回路 - Google Patents

電子回路 Download PDF

Info

Publication number
WO2009028297A1
WO2009028297A1 PCT/JP2008/063786 JP2008063786W WO2009028297A1 WO 2009028297 A1 WO2009028297 A1 WO 2009028297A1 JP 2008063786 W JP2008063786 W JP 2008063786W WO 2009028297 A1 WO2009028297 A1 WO 2009028297A1
Authority
WO
WIPO (PCT)
Prior art keywords
field effect
electronic circuit
effect transistor
magnetoresistive device
controlled
Prior art date
Application number
PCT/JP2008/063786
Other languages
English (en)
French (fr)
Inventor
Satoshi Sugahara
Shuichiro Yamamoto
Original Assignee
Tokyo Institute Of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Institute Of Technology filed Critical Tokyo Institute Of Technology
Publication of WO2009028297A1 publication Critical patent/WO2009028297A1/ja

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0611Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
    • H01L27/0617Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
    • H01L27/0629Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with diodes, or resistors, or capacitors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/165Auxiliary circuits
    • G11C11/1659Cell access
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B61/00Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • H10B61/20Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors
    • H10B61/22Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors of the field-effect transistor [FET] type
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/10Magnetoresistive devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Networks Using Active Elements (AREA)
  • Hall/Mr Elements (AREA)
  • Mram Or Spin Memory Techniques (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)

Abstract

 本発明は、電界効果トランジスタ20と、電界効果トランジスタ20のソースSに接続された磁気抵抗素子10と、を具備する電子回路である。本発明によれば、磁気抵抗素子10の磁化状態により、電界効果トランジスタ20のゲート-ソース間に印加される電圧を制御できる。電界効果トランジスタ20の電流駆動能力をの磁化状態で制御できることから擬似的にスピントランジスタとしての動作が可能となる。また、電界効果トランジスタ20と磁気抵抗素子10から電子回路を構成するため、容易に製造することができる。
PCT/JP2008/063786 2007-08-31 2008-07-31 電子回路 WO2009028297A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-225698 2007-08-31
JP2007225698A JP2009059884A (ja) 2007-08-31 2007-08-31 電子回路

Publications (1)

Publication Number Publication Date
WO2009028297A1 true WO2009028297A1 (ja) 2009-03-05

Family

ID=40387024

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/063786 WO2009028297A1 (ja) 2007-08-31 2008-07-31 電子回路

Country Status (2)

Country Link
JP (1) JP2009059884A (ja)
WO (1) WO2009028297A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4516137B2 (ja) * 2008-03-27 2010-08-04 株式会社東芝 半導体集積回路
JP5234547B2 (ja) * 2009-03-27 2013-07-10 国立大学法人東京工業大学 電子回路

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS566541A (en) * 1979-06-28 1981-01-23 Nec Corp Semiconductor logic circuit
JP2002008367A (ja) * 2000-06-19 2002-01-11 Nec Corp 磁気ランダムアクセスメモリ
JP2003157671A (ja) * 2001-11-22 2003-05-30 Internatl Business Mach Corp <Ibm> 不揮発性ラッチ回路
JP2003281878A (ja) * 2002-03-22 2003-10-03 Tdk Corp 抵抗素子を用いたデータ記憶素子及びその製造方法
JP2004200641A (ja) * 2002-12-16 2004-07-15 Hynix Semiconductor Inc Nand型磁気抵抗ラム
JP2006526907A (ja) * 2003-05-08 2006-11-24 シーメンス アクチエンゲゼルシヤフト 機能のコンフィギュレーション可能な論理回路デバイスを有する構成要素
JP2007228574A (ja) * 2006-02-22 2007-09-06 Samsung Electronics Co Ltd 磁気トンネル接合セルを利用した排他的論理和論理回路及び該論理回路の駆動方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS566541A (en) * 1979-06-28 1981-01-23 Nec Corp Semiconductor logic circuit
JP2002008367A (ja) * 2000-06-19 2002-01-11 Nec Corp 磁気ランダムアクセスメモリ
JP2003157671A (ja) * 2001-11-22 2003-05-30 Internatl Business Mach Corp <Ibm> 不揮発性ラッチ回路
JP2003281878A (ja) * 2002-03-22 2003-10-03 Tdk Corp 抵抗素子を用いたデータ記憶素子及びその製造方法
JP2004200641A (ja) * 2002-12-16 2004-07-15 Hynix Semiconductor Inc Nand型磁気抵抗ラム
JP2006526907A (ja) * 2003-05-08 2006-11-24 シーメンス アクチエンゲゼルシヤフト 機能のコンフィギュレーション可能な論理回路デバイスを有する構成要素
JP2007228574A (ja) * 2006-02-22 2007-09-06 Samsung Electronics Co Ltd 磁気トンネル接合セルを利用した排他的論理和論理回路及び該論理回路の駆動方法

Also Published As

Publication number Publication date
JP2009059884A (ja) 2009-03-19

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