WO2009016919A1 - 処理装置および処理装置を含むクリーンシステム - Google Patents

処理装置および処理装置を含むクリーンシステム Download PDF

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Publication number
WO2009016919A1
WO2009016919A1 PCT/JP2008/062090 JP2008062090W WO2009016919A1 WO 2009016919 A1 WO2009016919 A1 WO 2009016919A1 JP 2008062090 W JP2008062090 W JP 2008062090W WO 2009016919 A1 WO2009016919 A1 WO 2009016919A1
Authority
WO
WIPO (PCT)
Prior art keywords
processing apparatus
chamber
space
main body
apparatus main
Prior art date
Application number
PCT/JP2008/062090
Other languages
English (en)
French (fr)
Inventor
Kensuke Hirata
Original Assignee
Ihi Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ihi Corporation filed Critical Ihi Corporation
Priority to KR1020107002389A priority Critical patent/KR101289367B1/ko
Priority to CN2008801000514A priority patent/CN101779085B/zh
Publication of WO2009016919A1 publication Critical patent/WO2009016919A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
    • F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
    • F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
    • F24F3/167—Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F2221/00—Details or features not otherwise provided for
    • F24F2221/40—HVAC with raised floors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Ventilation (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
  • Devices For Use In Laboratory Experiments (AREA)

Abstract

　クリーンシステムは、チャンバを囲む天井と、床面とを有する部屋と、前記チャンバと連通し、前記チャンバ内の空気を清浄化して清浄空気を供給する送風装置と、前記清浄空気を受容するべく配置された装置本体と、前記装置本体を支持し、前記床面との間で通気可能な空間を気密に囲むべく構成された台であって、前記空間に連通した取入口と、前記装置本体を通過した前記清浄空気を前記取入口を経由して前記空間へ導入する吸引ファンと、を備えた台と、前記空間と前記チャンバとを連通するべく、前記台および前記天井と気密に結合した還流ダクトと、を備える。
PCT/JP2008/062090 2007-07-27 2008-07-03 処理装置および処理装置を含むクリーンシステム WO2009016919A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020107002389A KR101289367B1 (ko) 2007-07-27 2008-07-03 처리 장치 및 처리 장치를 포함하는 클린 시스템
CN2008801000514A CN101779085B (zh) 2007-07-27 2008-07-03 处理装置及具有处理装置的洁净系统

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007196459A JP5125291B2 (ja) 2007-07-27 2007-07-27 薄板処理装置及びクリーン薄板処理システム
JP2007-196459 2007-07-27

Publications (1)

Publication Number Publication Date
WO2009016919A1 true WO2009016919A1 (ja) 2009-02-05

Family

ID=40304156

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/062090 WO2009016919A1 (ja) 2007-07-27 2008-07-03 処理装置および処理装置を含むクリーンシステム

Country Status (5)

Country Link
JP (1) JP5125291B2 (ja)
KR (1) KR101289367B1 (ja)
CN (1) CN101779085B (ja)
TW (1) TW200909751A (ja)
WO (1) WO2009016919A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109227605A (zh) * 2018-10-24 2019-01-18 胡友红 一种工业机器人精密组装车间
CN113488413A (zh) * 2021-07-06 2021-10-08 华海清科股份有限公司 晶圆后处理设备及其应用的具有导流功能的通风系统

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106839245A (zh) * 2017-01-20 2017-06-13 温州弘大市政园林建设有限公司 一种室内绿色建筑装饰工程结构

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63157436A (ja) * 1986-12-22 1988-06-30 Hitachi Electronics Eng Co Ltd ウエハカセツト収納ボツクス
JPH11337115A (ja) * 1998-05-27 1999-12-10 Fuji Denki Sosetsu Co Ltd クリーンルームの局所空調システム
JP2001093827A (ja) * 1999-07-16 2001-04-06 Tokyo Electron Ltd 処理システム
JP2002039583A (ja) * 2000-07-24 2002-02-06 Ricoh Elemex Corp 空気清浄システム
JP2002174441A (ja) * 2000-12-08 2002-06-21 Mitsubishi Electric Corp 空気清浄システム及び空気清浄ハウジング
JP2003194390A (ja) * 2001-12-27 2003-07-09 Mitsubishi Electric Corp 空気調和システム
JP2005159141A (ja) * 2003-11-27 2005-06-16 Ishikawajima Harima Heavy Ind Co Ltd 基板搬送装置及び基板保管搬送装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11141939A (ja) * 1997-11-13 1999-05-28 Toyota Autom Loom Works Ltd 電源装置
JP3884570B2 (ja) * 1998-05-29 2007-02-21 大日本スクリーン製造株式会社 基板処理装置
US6426303B1 (en) * 1999-07-16 2002-07-30 Tokyo Electron Limited Processing system

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63157436A (ja) * 1986-12-22 1988-06-30 Hitachi Electronics Eng Co Ltd ウエハカセツト収納ボツクス
JPH11337115A (ja) * 1998-05-27 1999-12-10 Fuji Denki Sosetsu Co Ltd クリーンルームの局所空調システム
JP2001093827A (ja) * 1999-07-16 2001-04-06 Tokyo Electron Ltd 処理システム
JP2002039583A (ja) * 2000-07-24 2002-02-06 Ricoh Elemex Corp 空気清浄システム
JP2002174441A (ja) * 2000-12-08 2002-06-21 Mitsubishi Electric Corp 空気清浄システム及び空気清浄ハウジング
JP2003194390A (ja) * 2001-12-27 2003-07-09 Mitsubishi Electric Corp 空気調和システム
JP2005159141A (ja) * 2003-11-27 2005-06-16 Ishikawajima Harima Heavy Ind Co Ltd 基板搬送装置及び基板保管搬送装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109227605A (zh) * 2018-10-24 2019-01-18 胡友红 一种工业机器人精密组装车间
CN109227605B (zh) * 2018-10-24 2021-08-10 上海稻黄电子设备技术有限公司 一种工业机器人精密组装车间
CN113488413A (zh) * 2021-07-06 2021-10-08 华海清科股份有限公司 晶圆后处理设备及其应用的具有导流功能的通风系统

Also Published As

Publication number Publication date
JP2009030899A (ja) 2009-02-12
JP5125291B2 (ja) 2013-01-23
CN101779085B (zh) 2012-10-03
TWI362476B (ja) 2012-04-21
KR20100037617A (ko) 2010-04-09
TW200909751A (en) 2009-03-01
KR101289367B1 (ko) 2013-07-29
CN101779085A (zh) 2010-07-14

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