WO2009011381A1 - Nouveau polymère - Google Patents

Nouveau polymère Download PDF

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Publication number
WO2009011381A1
WO2009011381A1 PCT/JP2008/062903 JP2008062903W WO2009011381A1 WO 2009011381 A1 WO2009011381 A1 WO 2009011381A1 JP 2008062903 W JP2008062903 W JP 2008062903W WO 2009011381 A1 WO2009011381 A1 WO 2009011381A1
Authority
WO
WIPO (PCT)
Prior art keywords
polymer
novel polymer
disclosed
alkali
copolymerizing
Prior art date
Application number
PCT/JP2008/062903
Other languages
English (en)
Japanese (ja)
Inventor
Minoru Yamaguchi
Original Assignee
Nippon Shokubai Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Shokubai Co., Ltd. filed Critical Nippon Shokubai Co., Ltd.
Priority to KR1020107000778A priority Critical patent/KR101089531B1/ko
Priority to KR1020117016376A priority patent/KR101388818B1/ko
Publication of WO2009011381A1 publication Critical patent/WO2009011381A1/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • C08F222/402—Alkyl substituted imides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/12—Monomers containing a branched unsaturated aliphatic radical or a ring substituted by an alkyl radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)

Abstract

L'invention porte sur un polymère présentant une excellente résistance à la chaleur, qui présente une quantité réduite d'un gaz généré lorsqu'il est chauffé. De plus, le polymère est rapidement dissous dans un solvant organique ou un alcali, tout en présentant une excellente aptitude au développement alcalin. De façon spécifique, l'invention porte sur un nouveau polymère qui est obtenu par copolymérisation d'un maléimide N-substitué et/ou d'un composé ayant une structure spécifique et qui est un éther dimère d'acrylate de 2-(hydroxyalkyle), un vinyl toluène et un monomère ayant un groupe acide comme composants essentiels.
PCT/JP2008/062903 2007-07-18 2008-07-17 Nouveau polymère WO2009011381A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020107000778A KR101089531B1 (ko) 2007-07-18 2008-07-17 신규 중합체
KR1020117016376A KR101388818B1 (ko) 2007-07-18 2008-07-17 신규 중합체

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-186577 2007-07-18
JP2007186577 2007-07-18

Publications (1)

Publication Number Publication Date
WO2009011381A1 true WO2009011381A1 (fr) 2009-01-22

Family

ID=40259713

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/062903 WO2009011381A1 (fr) 2007-07-18 2008-07-17 Nouveau polymère

Country Status (4)

Country Link
JP (1) JP4296225B2 (fr)
KR (2) KR101089531B1 (fr)
TW (2) TWI542604B (fr)
WO (1) WO2009011381A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103163733A (zh) * 2011-12-09 2013-06-19 株式会社日本触媒 固化性树脂组合物及其用途
JP2013167786A (ja) * 2012-02-16 2013-08-29 Mitsubishi Chemicals Corp 有機絶縁膜用硬化性樹脂組成物、硬化物、ｔｆｔアクティブマトリックス基板及び液晶表示装置

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5250888B2 (ja) * 2007-07-18 2013-07-31 東友ファインケム株式会社 着色感光性樹脂組成物及びその着色感光性樹脂組成物を用いて得られるカラーフィルタ並びにそのカラーフィルタを備える液晶表示装置
JP5615123B2 (ja) * 2010-10-12 2014-10-29 株式会社日本触媒 重合体およびその用途
JP6095416B2 (ja) * 2012-10-08 2017-03-15 株式会社日本触媒 スチレン系ポリマー溶液
CN103848930A (zh) * 2013-12-30 2014-06-11 苏州瑞红电子化学品有限公司 一种含n-苯基马来酰亚胺光敏丙烯酸树脂的合成及其在负性光致抗蚀剂中的应用
TWI627504B (zh) * 2015-08-11 2018-06-21 奇美實業股份有限公司 彩色濾光片用感光性樹脂組成物及其應用
KR102366344B1 (ko) 2017-12-18 2022-02-23 가부시키가이샤 닛폰 쇼쿠바이 중합체, 경화성 수지 조성물, 및 그 용도

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09227665A (ja) * 1996-02-26 1997-09-02 Kobe Steel Ltd 耐熱性不飽和ポリエステル樹脂組成物、耐熱性繊維強化型複合材料およびこれらを含有する耐熱性成形品
JP2003082073A (ja) * 2001-09-11 2003-03-19 Nippon Petrochemicals Co Ltd 環状オレフィン単量体組成物およびその製造方法ならびに環状オレフィン重合体組成物および環状オレフィン重合体水素化組成物
JP2004300204A (ja) * 2003-03-28 2004-10-28 Nippon Shokubai Co Ltd 硬化性樹脂組成物およびその用途
JP2004300203A (ja) * 2003-03-28 2004-10-28 Nippon Shokubai Co Ltd 酸基含有ポリマー
JP2005097068A (ja) * 2003-08-26 2005-04-14 Matsushita Electric Works Ltd 人造大理石用樹脂組成物および該組成物を加熱硬化させて得られた人造大理石
JP2005239999A (ja) * 2004-01-27 2005-09-08 Nippon Shokubai Co Ltd 可視光線、近赤外線又はネオン光線吸収層形成用樹脂組成物
JP2006089528A (ja) * 2004-09-21 2006-04-06 Nippon Shokubai Co Ltd Ｌｅｄ封止剤、それを含む発光ダイオードおよび硬化性組成物
JP2007065155A (ja) * 2005-08-30 2007-03-15 Mitsubishi Chemicals Corp 色材分散液、着色樹脂組成物、カラーフィルタ、及び液晶表示装置
JP2007113000A (ja) * 2005-09-26 2007-05-10 Mitsubishi Chemicals Corp 色材分散液、着色樹脂組成物、カラーフィルタ、及び液晶表示装置
JP2007271727A (ja) * 2006-03-30 2007-10-18 Mitsubishi Chemicals Corp 緑色顔料分散液、着色樹脂組成物、カラーフィルタ及び液晶表示装置
JP2008056867A (ja) * 2006-09-04 2008-03-13 The Inctec Inc 顔料分散液および着色感光性組成物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3867177B2 (ja) * 1997-04-30 2007-01-10 Ｊｓｒ株式会社 カラーフィルタ用感放射線性組成物
TWI250996B (en) * 1999-09-01 2006-03-11 Jsr Corp Curable composition and color filter protective film
JP2004224894A (ja) * 2003-01-22 2004-08-12 Nippon Shokubai Co Ltd マレイミド系共重合体

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09227665A (ja) * 1996-02-26 1997-09-02 Kobe Steel Ltd 耐熱性不飽和ポリエステル樹脂組成物、耐熱性繊維強化型複合材料およびこれらを含有する耐熱性成形品
JP2003082073A (ja) * 2001-09-11 2003-03-19 Nippon Petrochemicals Co Ltd 環状オレフィン単量体組成物およびその製造方法ならびに環状オレフィン重合体組成物および環状オレフィン重合体水素化組成物
JP2004300204A (ja) * 2003-03-28 2004-10-28 Nippon Shokubai Co Ltd 硬化性樹脂組成物およびその用途
JP2004300203A (ja) * 2003-03-28 2004-10-28 Nippon Shokubai Co Ltd 酸基含有ポリマー
JP2005097068A (ja) * 2003-08-26 2005-04-14 Matsushita Electric Works Ltd 人造大理石用樹脂組成物および該組成物を加熱硬化させて得られた人造大理石
JP2005239999A (ja) * 2004-01-27 2005-09-08 Nippon Shokubai Co Ltd 可視光線、近赤外線又はネオン光線吸収層形成用樹脂組成物
JP2006089528A (ja) * 2004-09-21 2006-04-06 Nippon Shokubai Co Ltd Ｌｅｄ封止剤、それを含む発光ダイオードおよび硬化性組成物
JP2007065155A (ja) * 2005-08-30 2007-03-15 Mitsubishi Chemicals Corp 色材分散液、着色樹脂組成物、カラーフィルタ、及び液晶表示装置
JP2007113000A (ja) * 2005-09-26 2007-05-10 Mitsubishi Chemicals Corp 色材分散液、着色樹脂組成物、カラーフィルタ、及び液晶表示装置
JP2007271727A (ja) * 2006-03-30 2007-10-18 Mitsubishi Chemicals Corp 緑色顔料分散液、着色樹脂組成物、カラーフィルタ及び液晶表示装置
JP2008056867A (ja) * 2006-09-04 2008-03-13 The Inctec Inc 顔料分散液および着色感光性組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103163733A (zh) * 2011-12-09 2013-06-19 株式会社日本触媒 固化性树脂组合物及其用途
JP2013167786A (ja) * 2012-02-16 2013-08-29 Mitsubishi Chemicals Corp 有機絶縁膜用硬化性樹脂組成物、硬化物、ｔｆｔアクティブマトリックス基板及び液晶表示装置

Also Published As

Publication number Publication date
KR20110099315A (ko) 2011-09-07
TW200914474A (en) 2009-04-01
JP2009040999A (ja) 2009-02-26
KR101089531B1 (ko) 2011-12-05
TWI458744B (zh) 2014-11-01
TWI542604B (zh) 2016-07-21
JP4296225B2 (ja) 2009-07-15
KR20100049007A (ko) 2010-05-11
KR101388818B1 (ko) 2014-04-23
TW201428012A (zh) 2014-07-16

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