WO2008146741A1 - トリクロロシランの製造方法と製造装置および多結晶シリコンの製造方法 - Google Patents
トリクロロシランの製造方法と製造装置および多結晶シリコンの製造方法 Download PDFInfo
- Publication number
- WO2008146741A1 WO2008146741A1 PCT/JP2008/059544 JP2008059544W WO2008146741A1 WO 2008146741 A1 WO2008146741 A1 WO 2008146741A1 JP 2008059544 W JP2008059544 W JP 2008059544W WO 2008146741 A1 WO2008146741 A1 WO 2008146741A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- producing
- cooling
- reaction
- trichlorosilane
- sec
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
このトリクロロシラン製造方法は、原料のテトラクロロシランと水素とを1000°C以上1900°C以下の第1温度範囲で転換反応させてトリクロロシラン、ジクロロシリレン、塩化水素、および高次シラン化合物を含む第1反応生成ガスを生成する転換反応工程(第1反応工程)と、上記第1反応生成ガスを1秒以内に950°C以下に冷却する第1冷却工程(0.01秒以内に600°C未満に冷却することを除く)と、600°C以上950°C以下の第2温度範囲に0.01秒以上5秒以下保持する第2反応工程と、第2反応工程後の第2反応生成ガスを600°C未満に冷却する第2冷却工程を有する。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2008800173836A CN101679045B (zh) | 2007-05-25 | 2008-05-23 | 三氯硅烷的制备方法和制备装置以及多晶硅的制备方法 |
EP08764590.9A EP2154110B1 (en) | 2007-05-25 | 2008-05-23 | Process for producing trichlorosilane |
US12/451,666 US9994455B2 (en) | 2007-05-25 | 2008-05-23 | Apparatus and method for manufacturing trichlorosilane and method for manufacturing polycrystalline silicon |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007139111 | 2007-05-25 | ||
JP2007-139111 | 2007-05-25 | ||
JP2008127143A JP5397580B2 (ja) | 2007-05-25 | 2008-05-14 | トリクロロシランの製造方法と製造装置および多結晶シリコンの製造方法 |
JP2008-127143 | 2008-05-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008146741A1 true WO2008146741A1 (ja) | 2008-12-04 |
Family
ID=40316832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/059544 WO2008146741A1 (ja) | 2007-05-25 | 2008-05-23 | トリクロロシランの製造方法と製造装置および多結晶シリコンの製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9994455B2 (ja) |
EP (1) | EP2154110B1 (ja) |
JP (1) | JP5397580B2 (ja) |
CN (1) | CN101679045B (ja) |
TW (1) | TWI434805B (ja) |
WO (1) | WO2008146741A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2233436A1 (en) * | 2009-03-11 | 2010-09-29 | Mitsubishi Materials Corporation | Apparatus and method for producing trichlorosilane |
US20120070361A1 (en) * | 2009-03-30 | 2012-03-22 | Denki Kagaku Kogyo Kabushiki Kaisha | Method for collection of hexachlorodisilane and plant for the method |
EP2746222A1 (de) | 2012-12-19 | 2014-06-25 | Wacker Chemie AG | Verfahren zur Konvertierung von Siliciumtetrachlorid in Trichlorsilan |
EP2394955A4 (en) * | 2009-02-04 | 2015-08-26 | Tokuyama Corp | PROCESS FOR PRODUCING POLYCRYSTALLINE SILICON |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5333725B2 (ja) * | 2008-10-30 | 2013-11-06 | 三菱マテリアル株式会社 | トリクロロシランの製造方法および利用方法 |
TW201031591A (en) * | 2008-10-30 | 2010-09-01 | Mitsubishi Materials Corp | Process for production of trichlorosilane and method for use thereof |
JP5392488B2 (ja) * | 2008-10-30 | 2014-01-22 | 三菱マテリアル株式会社 | トリクロロシランの製造方法および用途 |
JP5374576B2 (ja) * | 2009-03-06 | 2013-12-25 | 電気化学工業株式会社 | トリクロロシラン冷却塔およびそれを用いたトリクロロシラン製造方法 |
JPWO2010116500A1 (ja) * | 2009-04-08 | 2012-10-11 | 電気化学工業株式会社 | トリクロロシラン冷却塔およびそれを用いたトリクロロシラン製造方法 |
DE102009037155B3 (de) * | 2009-08-04 | 2010-11-04 | Schmid Silicon Technology Gmbh | Verfahren und Anlage zur Herstellung von Trichlorsilan |
DE102009056438B4 (de) | 2009-12-02 | 2013-05-16 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von Hexachlordisilan |
JP5482265B2 (ja) * | 2009-12-15 | 2014-05-07 | 三菱マテリアル株式会社 | トリクロロシラン製造装置 |
DE102010000981A1 (de) * | 2010-01-18 | 2011-07-21 | Evonik Degussa GmbH, 45128 | Closed loop-Verfahren zur Herstellung von Trichlorsilan aus metallurgischem Silicium |
JP5900224B2 (ja) * | 2011-11-30 | 2016-04-06 | 三菱マテリアル株式会社 | トリクロロシラン製造装置及び製造方法 |
EP2969948A1 (en) * | 2013-03-13 | 2016-01-20 | SiTec GmbH | Temperature management in chlorination processes and systems related thereto |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4895396A (ja) * | 1972-02-26 | 1973-12-07 | ||
JPS57156318A (en) * | 1981-03-16 | 1982-09-27 | Koujiyundo Silicon Kk | Production of trichlorosilane |
JPS6081010A (ja) * | 1983-10-13 | 1985-05-09 | Denki Kagaku Kogyo Kk | トリクロルシランの製造法 |
JPS6163519A (ja) * | 1984-09-04 | 1986-04-01 | Denki Kagaku Kogyo Kk | モノシラン製造法 |
JPS6221706A (ja) * | 1985-07-22 | 1987-01-30 | Nippon Steel Corp | トリクロルシランを介する珪素または珪素化合物の循環的製造方法 |
JPH07232910A (ja) * | 1994-01-28 | 1995-09-05 | Hemlock Semiconductor Corp | テトラクロロシランの水素添加法 |
WO2005102928A1 (de) * | 2004-04-23 | 2005-11-03 | Degussa Ag | VERFAHREN ZUR HERSTELLUNG VON HSiCl3 DURCH KATALYTISCHE HYDRODEHALOGENIERUNG VON SiCl4 |
JP3781439B2 (ja) | 1992-06-01 | 2006-05-31 | ヘムロック・セミコンダクター・コーポレーション | クロロシランおよび水素の反応器 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
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US4217334A (en) | 1972-02-26 | 1980-08-12 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler | Process for the production of chlorosilanes |
DE3139705C2 (de) * | 1981-10-06 | 1983-11-10 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Verfahren zur Aufarbeitung der bei der Siliciumabscheidung und der Siliciumtetrachlorid-Konvertierung anfallenden Restgase |
DE3809784C1 (ja) * | 1988-03-23 | 1989-07-13 | Huels Ag, 4370 Marl, De | |
CN1222471C (zh) | 2002-10-23 | 2005-10-12 | 同济大学 | 用三氯氢硅和四氯化硅混合源生产多晶硅的方法 |
DE102005005044A1 (de) * | 2005-02-03 | 2006-08-10 | Consortium für elektrochemische Industrie GmbH | Verfahren zur Herstellung von Trichlorsilan mittels thermischer Hydrierung von Siliciumtetrachlorid |
JP5601438B2 (ja) * | 2006-11-07 | 2014-10-08 | 三菱マテリアル株式会社 | トリクロロシランの製造方法およびトリクロロシラン製造装置 |
JP5488777B2 (ja) * | 2006-11-30 | 2014-05-14 | 三菱マテリアル株式会社 | トリクロロシランの製造方法およびトリクロロシランの製造装置 |
-
2008
- 2008-05-14 JP JP2008127143A patent/JP5397580B2/ja not_active Expired - Fee Related
- 2008-05-23 US US12/451,666 patent/US9994455B2/en active Active
- 2008-05-23 EP EP08764590.9A patent/EP2154110B1/en active Active
- 2008-05-23 CN CN2008800173836A patent/CN101679045B/zh not_active Expired - Fee Related
- 2008-05-23 WO PCT/JP2008/059544 patent/WO2008146741A1/ja active Application Filing
- 2008-05-23 TW TW097119193A patent/TWI434805B/zh active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4895396A (ja) * | 1972-02-26 | 1973-12-07 | ||
JPS5738524B2 (ja) | 1972-02-26 | 1982-08-16 | ||
JPS57156318A (en) * | 1981-03-16 | 1982-09-27 | Koujiyundo Silicon Kk | Production of trichlorosilane |
JPS6081010A (ja) * | 1983-10-13 | 1985-05-09 | Denki Kagaku Kogyo Kk | トリクロルシランの製造法 |
JPS6163519A (ja) * | 1984-09-04 | 1986-04-01 | Denki Kagaku Kogyo Kk | モノシラン製造法 |
JPS6221706A (ja) * | 1985-07-22 | 1987-01-30 | Nippon Steel Corp | トリクロルシランを介する珪素または珪素化合物の循環的製造方法 |
JP3781439B2 (ja) | 1992-06-01 | 2006-05-31 | ヘムロック・セミコンダクター・コーポレーション | クロロシランおよび水素の反応器 |
JPH07232910A (ja) * | 1994-01-28 | 1995-09-05 | Hemlock Semiconductor Corp | テトラクロロシランの水素添加法 |
WO2005102928A1 (de) * | 2004-04-23 | 2005-11-03 | Degussa Ag | VERFAHREN ZUR HERSTELLUNG VON HSiCl3 DURCH KATALYTISCHE HYDRODEHALOGENIERUNG VON SiCl4 |
Non-Patent Citations (1)
Title |
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See also references of EP2154110A4 * |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2394955A4 (en) * | 2009-02-04 | 2015-08-26 | Tokuyama Corp | PROCESS FOR PRODUCING POLYCRYSTALLINE SILICON |
EP2233436A1 (en) * | 2009-03-11 | 2010-09-29 | Mitsubishi Materials Corporation | Apparatus and method for producing trichlorosilane |
CN101844769A (zh) * | 2009-03-11 | 2010-09-29 | 三菱综合材料株式会社 | 三氯硅烷的制造装置和制造方法 |
US8491862B2 (en) | 2009-03-11 | 2013-07-23 | Mitsubishi Materials Corporation | Apparatus and method for producing trichlorosilane |
CN101844769B (zh) * | 2009-03-11 | 2013-11-06 | 三菱综合材料株式会社 | 三氯硅烷的制造装置和制造方法 |
US20120070361A1 (en) * | 2009-03-30 | 2012-03-22 | Denki Kagaku Kogyo Kabushiki Kaisha | Method for collection of hexachlorodisilane and plant for the method |
EP2746222A1 (de) | 2012-12-19 | 2014-06-25 | Wacker Chemie AG | Verfahren zur Konvertierung von Siliciumtetrachlorid in Trichlorsilan |
DE102012223784A1 (de) | 2012-12-19 | 2014-06-26 | Wacker Chemie Ag | Verfahren zur Konvertierung von Siliciumtetrachlorid in Trichlorsilan |
US9776878B2 (en) | 2012-12-19 | 2017-10-03 | Wacker Chemie Ag | Process for converting silicon tetrachloride to trichlorosilane |
Also Published As
Publication number | Publication date |
---|---|
EP2154110A4 (en) | 2015-07-15 |
TW200906723A (en) | 2009-02-16 |
TWI434805B (zh) | 2014-04-21 |
CN101679045B (zh) | 2013-07-24 |
EP2154110A1 (en) | 2010-02-17 |
US20100178230A1 (en) | 2010-07-15 |
US9994455B2 (en) | 2018-06-12 |
JP5397580B2 (ja) | 2014-01-22 |
CN101679045A (zh) | 2010-03-24 |
EP2154110B1 (en) | 2019-04-03 |
JP2009007240A (ja) | 2009-01-15 |
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