WO2008146333A1 - 質量分析装置 - Google Patents

質量分析装置 Download PDF

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Publication number
WO2008146333A1
WO2008146333A1 PCT/JP2007/000582 JP2007000582W WO2008146333A1 WO 2008146333 A1 WO2008146333 A1 WO 2008146333A1 JP 2007000582 W JP2007000582 W JP 2007000582W WO 2008146333 A1 WO2008146333 A1 WO 2008146333A1
Authority
WO
WIPO (PCT)
Prior art keywords
ionization
chamber
ions
conducted
laser irradiation
Prior art date
Application number
PCT/JP2007/000582
Other languages
English (en)
French (fr)
Inventor
Hideaki Izumi
Kiyoshi Ogawa
Yoshikazu Yoshida
Original Assignee
Shimadzu Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corporation filed Critical Shimadzu Corporation
Priority to JP2009516076A priority Critical patent/JP5024375B2/ja
Priority to PCT/JP2007/000582 priority patent/WO2008146333A1/ja
Publication of WO2008146333A1 publication Critical patent/WO2008146333A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
    • H01J49/0459—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for solid samples
    • H01J49/0463—Desorption by laser or particle beam, followed by ionisation as a separate step
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
    • H01J49/161—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission using photoionisation, e.g. by laser
    • H01J49/162—Direct photo-ionisation, e.g. single photon or multi-photon ionisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
    • H01J49/161—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission using photoionisation, e.g. by laser
    • H01J49/164—Laser desorption/ionisation, e.g. matrix-assisted laser desorption/ionisation [MALDI]

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

 　大気圧雰囲気の下でＭＡＬＤＩイオン化を行うイオン化室（１）から次の第１中間真空室（１０）にイオンを導入する加熱キャピラリ（７）の出口に、レーザ照射により二次的なイオン化を行う二次イオン化領域（３３）を設ける。イオン化室（１）内でイオン化されなかった又は途中で再結合により発生した試料由来の中性分子がイオンとともにガス流に乗って第１中間真空室（１０）内に吐き出されるが、レーザ照射により、大気圧よりも低いガス圧の下で中性分子は高い効率でイオン化される。これにより、従来よりも多量のイオンを後段の高真空雰囲気にある分析室へ送り込むことができ、質量分析の感度や精度を向上させることができる。
PCT/JP2007/000582 2007-05-30 2007-05-30 質量分析装置 WO2008146333A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009516076A JP5024375B2 (ja) 2007-05-30 2007-05-30 質量分析装置
PCT/JP2007/000582 WO2008146333A1 (ja) 2007-05-30 2007-05-30 質量分析装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/000582 WO2008146333A1 (ja) 2007-05-30 2007-05-30 質量分析装置

Publications (1)

Publication Number Publication Date
WO2008146333A1 true WO2008146333A1 (ja) 2008-12-04

Family

ID=40074622

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/000582 WO2008146333A1 (ja) 2007-05-30 2007-05-30 質量分析装置

Country Status (2)

Country Link
JP (1) JP5024375B2 (ja)
WO (1) WO2008146333A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010170987A (ja) * 2008-12-26 2010-08-05 Canon Anelva Corp 質量分析方法およびそれに用いる質量分析装置
GB2556074A (en) * 2016-11-17 2018-05-23 Micromass Ltd Axial atmospheric pressure photo-ionization imaging source and inlet device
CN114068288A (zh) * 2020-08-03 2022-02-18 布鲁克·道尔顿有限及两合公司 具有掺杂气辅助的电离的解吸离子源
CN114354737A (zh) * 2022-03-18 2022-04-15 中国科学技术大学 一种具有常压激光解析电离和二次光电离的质谱成像装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101508146B1 (ko) * 2014-02-17 2015-04-07 광주과학기술원 기화-전자 이온화기 및 레이저 이온화기를 포함하는 에어로졸 질량분석기

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61285649A (ja) * 1985-06-13 1986-12-16 Mitsubishi Electric Corp レ−ザ−質量分析装置
JPH06201567A (ja) * 1992-09-11 1994-07-19 American Teleph & Telegr Co <Att> 質量スペクトル測定用手段を含む装置
JPH08240566A (ja) * 1995-01-17 1996-09-17 At & T Corp レーザ支援による粒子分析
JP2005243573A (ja) * 2004-02-27 2005-09-08 Mitsubishi Heavy Ind Ltd 試料分析装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6646257B1 (en) * 2002-09-18 2003-11-11 Agilent Technologies, Inc. Multimode ionization source
JP4645197B2 (ja) * 2005-01-05 2011-03-09 株式会社島津製作所 質量分析方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61285649A (ja) * 1985-06-13 1986-12-16 Mitsubishi Electric Corp レ−ザ−質量分析装置
JPH06201567A (ja) * 1992-09-11 1994-07-19 American Teleph & Telegr Co <Att> 質量スペクトル測定用手段を含む装置
JPH08240566A (ja) * 1995-01-17 1996-09-17 At & T Corp レーザ支援による粒子分析
JP2005243573A (ja) * 2004-02-27 2005-09-08 Mitsubishi Heavy Ind Ltd 試料分析装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010170987A (ja) * 2008-12-26 2010-08-05 Canon Anelva Corp 質量分析方法およびそれに用いる質量分析装置
GB2556074A (en) * 2016-11-17 2018-05-23 Micromass Ltd Axial atmospheric pressure photo-ionization imaging source and inlet device
US11127576B2 (en) 2016-11-17 2021-09-21 Micromass Uk Limited Axial atmospheric pressure photo-ionization imaging source and inlet device
CN114068288A (zh) * 2020-08-03 2022-02-18 布鲁克·道尔顿有限及两合公司 具有掺杂气辅助的电离的解吸离子源
CN114354737A (zh) * 2022-03-18 2022-04-15 中国科学技术大学 一种具有常压激光解析电离和二次光电离的质谱成像装置

Also Published As

Publication number Publication date
JPWO2008146333A1 (ja) 2010-08-12
JP5024375B2 (ja) 2012-09-12

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