WO2008109262A1 - Sulfuration resistant chip resistor and method for making same - Google Patents

Sulfuration resistant chip resistor and method for making same Download PDF

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Publication number
WO2008109262A1
WO2008109262A1 PCT/US2008/054557 US2008054557W WO2008109262A1 WO 2008109262 A1 WO2008109262 A1 WO 2008109262A1 US 2008054557 W US2008054557 W US 2008054557W WO 2008109262 A1 WO2008109262 A1 WO 2008109262A1
Authority
WO
WIPO (PCT)
Prior art keywords
terminal electrodes
chip resistor
protective coating
external
sulfuration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2008/054557
Other languages
English (en)
French (fr)
Inventor
Michael Belman
Leonid Akhtman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vishay Intertechnology Inc
Original Assignee
Vishay Intertechnology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vishay Intertechnology Inc filed Critical Vishay Intertechnology Inc
Priority to JP2009552007A priority Critical patent/JP2010520624A/ja
Priority to EP08730372.3A priority patent/EP2130207B1/en
Priority to HK10109112.2A priority patent/HK1142715B/xx
Priority to CN200880010666.8A priority patent/CN101681705B/zh
Publication of WO2008109262A1 publication Critical patent/WO2008109262A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C1/00Details
    • H01C1/02Housing; Enclosing; Embedding; Filling the housing or enclosure
    • H01C1/034Housing; Enclosing; Embedding; Filling the housing or enclosure the housing or enclosure being formed as coating or mould without outer sheath
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/28Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals
    • H01C17/288Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals by thin film techniques

Definitions

  • the present invention relates to chip resistors, and in particular, chip resistors which are sulfuration resistant.
  • Terminal electrodes in a majority of thick- film chip resistors and in some thin- film resistors are made of silver-based cermets.
  • Metallic silver has several advantageous properties, including high electrical conductivity and excellent immunity to oxidizing when silver based cermets are fired in the air.
  • Unfortunately metallic silver also has its shortcomings. Once such shortcoming is metallic silver's remarkable susceptibility to sulfur and sulfur compounds. At that, silver forms non-conductive silver sulfide resulting in open circuit in the silver-based resistor terminals. The described failure mechanism is called sulfuration phenomenon or sulfuration.
  • FIG. 2 A prior art non sulfur proof thick-film chip resistor is presented in Figure 2. It consists of an isolative substrate 1, upper silver-based terminal electrodes 2, bottom silver- based electrodes 3, a resistive element 4, an optional protective layer 5, an external protective layer 6, plated nickel layer 7, and a plated finishing layer (commonly tin) 8. Each upper electrode 2 is covered by abutting layers: (a) external protective coating 6
  • the disadvantages of the first method include the expensiveness of sulfur proof noble metals, the lower electrical conductivity of sulfur proof noble metals relative to metallic silver, as well as the possible incompatibility of non-silver terminals with thick- film resistor inks that are designed for use with silver termination.
  • auxiliary upper electrodes 9 ( Figure 3) and uppermost overcoat 6'.
  • Auxiliary upper electrodes 9 cover completely each of upper silver-based terminal electrodes 2 and overlap partially the external protective coating 6.
  • the uppermost overcoat 6' covers the middle portion of the resistor and overlaps auxiliary upper electrodes 9.
  • the auxiliary upper electrodes should be both platable
  • auxiliary upper electrodes include low electrical conductivity and poor platability of polymer-based materials with carbon or base metal filler, possible resistance shift when sintering type inks are used for auxiliary upper electrodes, problematic implementation in small size resistors (1 mm length and less) where it is difficult to keep positional relationship between multiple layers that overlap each other in the terminal, and increased resistor thickness.
  • Another object, feature, aspect, or advantage of the present invention is to improve over the state of the art relative to addressing the sulfuration phenomenon with chip type of resistor.
  • Another object, feature, or advantage of the present invention is to provide for a chip resistor which is sulfuration resistant which does not require an additional protective layer which would increase thickness of the chip resistor beyond the thickness of a standard
  • Yet another object, feature, or advantage of the present invention is a configuration or design that is applicable to all sizes of chip resistors, including the smallest ones where, for example, introduction of an additional protective layer with secure overlaps with adjacent layers would be potentially problematic.
  • a still further object, feature, or advantage of the present invention is to provide a chip resistor which does not have the limitations associate with the additional protective layers found in the prior art, such as being (a) conductive, (b) non-silver, (c) suitable for deposition at low temperature. Materials that meet such requirements (for example polymer based carbon ink) have limited platability.
  • a still further object, feature, or advantage of the present invention is to provide a sulfuration resistant chip resistor with terminals having good platability.
  • a chip resistor includes upper sulfuration-susceptible terminal electrodes on opposite sides of a resistive element mounted over an insulating substrate and an external non-conductive protective coating over the resistive element.
  • a method for deterring sulfuration in a chip resistor having upper sulfuration-susceptible terminal electrodes on opposite sides of a resistive element mounted over an insulating substrate, an external non-conductive protective coating over the resistive element, and at least one conducting metal plated layer covering opposite face sides of the insulating substrate and part of the top sulfuration-susceptible terminal electrodes.
  • the method provides for sealing the terminal electrodes from the external environment. The sealing may be performed by overlapping the metal plated layer over exposed top portions of the terminal electrodes and over adjacent edges of the external non-conductive protective coating or sealing the terminal electrodes comprises moralizing adjacent edges of the external non-conductive protective coating prior to application of the metal plated layer.
  • a chip resistor is formed by the process of forming top terminal electrodes and a resistive element on the top of an insulative substrate having face sides, forming a non-conducting external protective coating over the resistive element and adjacent portions of the top terminal electrodes, masking a middle portion of the external protective coating, metallizing edges of the external protective coating by sputtering, metallizing face sides of the substrate by sputtering or by conductive ink application, removing the mask, nickel plating the metallized edges of the external protective coating and face sides of the substrate, and placing a finishing layer over the nickel plating.
  • a chip resistor includes an insulating substrate having a top surface, an opposite bottom surface and opposing face surfaces, top terminal electrodes formed on the top surface of the substrate, bottom electrodes formed on the bottom surface of the substrate, a resistive element positioned between the top terminal electrodes and partially overlapping the top terminal electrodes, an external protective coating that partially covers the top terminal electrodes, wherein edges of the external protective coating being activated to facilitate coverage by plating, a plated layer of nickel covering the face surfaces of the substrate, the top and bottom electrodes, and overlapping the edges of the external protective coating thereby sealing the underlying top terminal electrodes from ambient atmosphere.
  • BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a substantially enlarged cross-sectional view of an apparatus according
  • Figure 2 is a substantially enlarged cross-sectional view of a prior art (non
  • Figure 3 is similar to Figure 2 but illustrates a prior art sulfuration resistant resistor.
  • Figure 4 is a cross-sectional diagram and illustration of a method of making the
  • resistor of Figure 1 according to an aspect of the present invention.
  • Figure 5 is a cross-sectional diagram and illustration of a method of making a resistor using a metallization process using low intensity sputtering (without masking).
  • Figure 6 is a cross-sectional diagram and illustration of a method of making a resistor using very high intensity sputtering (with or without masking).
  • Figure 7 is a flow diagram illustrating one embodiment of a manufacturing process of the present invention.
  • the present invention relates to a chip resistor (Figure 1) that comprises an insulating substrate 11, top terminal electrodes 12 formed on top surface of the substrate using silver-based cermet, bottom electrodes 13, resistive element 14 that is situated between the top terminal electrodes 12 and overlaps them partially, optional internal protective coating 15 that covers resistive element 14 completely or partially, external protective coating 16 that covers completely the internal protection coating 15 and partially covers top terminal electrodes 12, plated layer of nickel 17 that covers face sides of the substrate, top 12 and bottom 13 electrodes, and overlaps partially external protective coating 16, finishing plated layer 18 that covers nickel layer 17.
  • Figure 1 that comprises an insulating substrate 11, top terminal electrodes 12 formed on top surface of the substrate using silver-based cermet, bottom electrodes 13, resistive element 14 that is situated between the top terminal electrodes 12 and overlaps them partially, optional internal protective coating 15 that covers resistive element 14 completely or partially, external protective coating 16 that covers completely the internal protection coating 15 and partially covers top terminal electrodes 12, plated layer of nickel 17 that covers face sides of the substrate, top 12 and bottom 13 electrodes,
  • the overlap of nickel layer 17 and external protective layer 16 possesses a sealing property because of making the edges of external protective layer 16 platable prior to nickel plating process.
  • silver terminal electrodes are sealed without use of dedicated protective layers.
  • the silver terminal electrodes are sealed by imparting a protective function to the nickel plating layer that is commonly used as diffusion and leaching barrier between the silver electrodes and the finishing metallization layer (commonly, the tin layer) in terminals of standard (non sulfur proof) chip resistors.
  • dielectric material like protective layer 16 platable Possible ways to make dielectric material like protective layer 16 platable include, without limitation, activating it for example by application of conductive material (metal sputtering, chemical deposition of metal, etc.) or by changing its structure (carbonization of polymers by heating, etc.).
  • Figure 4 shows a process where metal sputtering is used for activation of the edges of the external protective coating 16.
  • An appropriate metal for example nichrome alloy
  • the sputtered metallization layer promotes nickel to plate not only silver terminals 12, 13, and face surfaces 11' of the substrate 11 but to extend to the edges of external protective coating 16 sealing the underlying silver electrodes 12.
  • a good adhesion between nickel layer and metallized edges of external protective coating 16 insures good sealing of silver electrodes 12.
  • FIG. 5 shows a second implementation of sputtering process.
  • Sputtering is performed from the top side of chip resistor without masking of the external protective coating 16 but with extremely low intensity of sputtering.
  • Resulting poor metallization facilitates plating of the external protective coating edge but very soon degrades in plating bath because of mechanical abrasion. Therefore, solid metallization of entire top surface does not form.
  • FIG. 6 shows a third implementation of sputtering process.
  • Sputtering is performed from face sides of stacked chips with or without masking of external protective coating 16 with very high intensity of sputtering sufficient to penetrate into the gap between the adjacent stacked chips and insure metallization of extreme portions of top side of chip.
  • the gap between stacked chips exists because the middle portion of chip covered by external protective coating 16 is thicker than terminal area.
  • nickel layer 7 cannot act as a silver protection element because of the poor adhesion of plated nickel layer 7 to the edge of protective coatings 6 ( Figure 2) and 6' ( Figure 3).
  • the present invention provides for imparting the function of protective layer to the plated nickel layer that is commonly used as diffusion and leaching barrier between silver electrodes and finishing metallization layer (tin layer) in terminals of standard (non sulfur proof chip resistor).
  • an appropriate metal for example nichrome alloy
  • nichrome alloy is deposed on the edges of external protective coating (that are adjacent to silver electrodes) making these edges platable. It promotes nickel to plate not only silver electrodes but to extend to the edges of external protective coating sealing the underlying silver electrodes. Advantages of this approach include that no additional protective layer is needed.
  • thickness of chip resistor is the same as thickness of standard (non sulfur-proof) chip resistor.
  • the configuration is applicable to all sizes of chips including the smallest ones as there need not be an additional protective layer.
  • the terminals maintain good platability.
  • the present invention also relates to the method of making the chip resistor.
  • Figure 7 illustrates one embodiment of a manufacturing process of the present invention.
  • step 20 the top 12 and bottom 13 terminal electrodes formation is performed.
  • step 21 resistive element 14 formation is performed.
  • step 22 an optional internal protective coating 15 formation may be performed. Of course, this step is optional and not required.
  • step 23 external protective coating 16 formation is performed.
  • step 24 an optional masking of middle portion of external protective coating by mask 19 may be performed.
  • activation of the edges of external protective coating 16 (for example by metal sputtering as shown in Figures 4-6) is performed.
  • step 26 activation of face sides 11' of the substrate 11 (for example by metal sputtering or by conductive ink application) is performed.
  • step 27 removal of the optional mask is performed where the optional mask was used.
  • step 28 plating is performed (preferably using nickel or a nickel alloy).
  • step 29 the layer plating is finished.
  • Step 25 imparts the withstand ability of chip resistor to sulfur containing ambient environment by sealing the sulfuration susceptible terminals.

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Non-Adjustable Resistors (AREA)
  • Details Of Resistors (AREA)
PCT/US2008/054557 2007-03-01 2008-02-21 Sulfuration resistant chip resistor and method for making same Ceased WO2008109262A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009552007A JP2010520624A (ja) 2007-03-01 2008-02-21 耐硫化チップ抵抗器およびその製造方法
EP08730372.3A EP2130207B1 (en) 2007-03-01 2008-02-21 Sulfuration resistant chip resistor and method for making same
HK10109112.2A HK1142715B (en) 2007-03-01 2008-02-21 Sulfuration resistant chip resistor and method for making same
CN200880010666.8A CN101681705B (zh) 2007-03-01 2008-02-21 抗硫化芯片电阻器及其制造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US89250307P 2007-03-01 2007-03-01
US60/892,503 2007-03-01

Publications (1)

Publication Number Publication Date
WO2008109262A1 true WO2008109262A1 (en) 2008-09-12

Family

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Application Number Title Priority Date Filing Date
PCT/US2008/054557 Ceased WO2008109262A1 (en) 2007-03-01 2008-02-21 Sulfuration resistant chip resistor and method for making same

Country Status (6)

Country Link
US (3) US7982582B2 (enExample)
EP (1) EP2130207B1 (enExample)
JP (4) JP2010520624A (enExample)
CN (2) CN101681705B (enExample)
TW (2) TWI479514B (enExample)
WO (1) WO2008109262A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
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US10104776B2 (en) 2016-01-08 2018-10-16 Samsung Electro-Mechanics Co., Ltd. Chip resistor element
US11056630B2 (en) 2019-02-13 2021-07-06 Samsung Electronics Co., Ltd. Display module having glass substrate on which side wirings are formed and manufacturing method of the same

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US7982582B2 (en) * 2007-03-01 2011-07-19 Vishay Intertechnology Inc. Sulfuration resistant chip resistor and method for making same
CN103219964A (zh) 2012-01-18 2013-07-24 新科实业有限公司 衰减器
JP6227877B2 (ja) * 2013-02-26 2017-11-08 ローム株式会社 チップ抵抗器、およびチップ抵抗器の製造方法
CN104347208B (zh) * 2013-07-31 2018-10-12 南京中兴新软件有限责任公司 一种电阻器制作方法、电阻器及电路
JP6274789B2 (ja) * 2013-08-30 2018-02-07 ローム株式会社 チップ抵抗器
JP6386723B2 (ja) * 2013-12-11 2018-09-05 Koa株式会社 抵抗素子の製造方法
TWI508109B (zh) * 2013-12-25 2015-11-11 Yageo Corp Chip resistors
JP6326192B2 (ja) 2014-03-19 2018-05-16 Koa株式会社 チップ抵抗器およびその製造法
US9336931B2 (en) 2014-06-06 2016-05-10 Yageo Corporation Chip resistor
JP6373723B2 (ja) * 2014-10-31 2018-08-15 Koa株式会社 チップ抵抗器
US9818512B2 (en) 2014-12-08 2017-11-14 Vishay Dale Electronics, Llc Thermally sprayed thin film resistor and method of making
JP6398749B2 (ja) * 2015-01-28 2018-10-03 三菱マテリアル株式会社 抵抗器及び抵抗器の製造方法
WO2016153116A1 (ko) * 2015-03-23 2016-09-29 조인셋 주식회사 내 환경성이 향상된 탄성 전기접촉단자 및 그 제조 방법
JP2017168817A (ja) * 2016-03-15 2017-09-21 ローム株式会社 チップ抵抗器およびその製造方法
TWI598878B (zh) * 2016-05-24 2017-09-11 宇瞻科技股份有限公司 抗硫化之記憶體儲存裝置
CN105931663B (zh) * 2016-05-24 2019-03-01 宇瞻科技股份有限公司 抗硫化的内存存储装置
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CN108231308B (zh) * 2016-12-21 2020-03-24 李文熙 铝端电极芯片电阻器的制造方法
DE112017006585T5 (de) 2016-12-27 2019-09-12 Rohm Co., Ltd. Chip-widerstand und verfahren zu seiner herstellung
TWI605476B (zh) * 2017-02-06 2017-11-11 Anti-vulcanization chip resistor and its manufacturing method
CN108399992B (zh) * 2017-02-08 2019-12-27 东莞华科电子有限公司 抗硫化的晶片电阻及其制法
CN107331486A (zh) * 2017-06-28 2017-11-07 中国振华集团云科电子有限公司 抗硫化电阻器及其制备方法
DE112018005181B4 (de) 2017-11-02 2025-04-10 Rohm Co., Ltd. Chip-widerstand
CN107946075B (zh) * 2017-11-18 2024-01-30 湖南艾华集团股份有限公司 叠层电容器
KR102160500B1 (ko) * 2018-07-11 2020-09-28 주식회사 테토스 기판 측면부 배선 형성 방법
CN109148065B (zh) * 2018-08-21 2020-02-18 广东风华高新科技股份有限公司 一种抗硫化片式电阻器及其制造方法
US11600410B2 (en) 2018-08-23 2023-03-07 Mitsubishi Materials Corporation Thermistor with protective film and manufacturing method thereof
TWI707366B (zh) * 2020-03-25 2020-10-11 光頡科技股份有限公司 電阻元件
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JP2023114299A (ja) * 2022-02-04 2023-08-17 Koa株式会社 チップ抵抗器
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Publication number Priority date Publication date Assignee Title
US10104776B2 (en) 2016-01-08 2018-10-16 Samsung Electro-Mechanics Co., Ltd. Chip resistor element
US11056630B2 (en) 2019-02-13 2021-07-06 Samsung Electronics Co., Ltd. Display module having glass substrate on which side wirings are formed and manufacturing method of the same
US11646400B2 (en) 2019-02-13 2023-05-09 Samsung Electronics Co., Ltd. Display module having glass substrate on which side wirings are formed and manufacturing method of the same

Also Published As

Publication number Publication date
US7982582B2 (en) 2011-07-19
TWI479514B (zh) 2015-04-01
JP2013080952A (ja) 2013-05-02
US20130335191A1 (en) 2013-12-19
JP2013219387A (ja) 2013-10-24
US20120126934A1 (en) 2012-05-24
CN102682938A (zh) 2012-09-19
HK1142715A1 (en) 2010-12-10
JP6546118B2 (ja) 2019-07-17
US8514051B2 (en) 2013-08-20
TWI423271B (zh) 2014-01-11
JP2010520624A (ja) 2010-06-10
JP2016157980A (ja) 2016-09-01
TW201303912A (zh) 2013-01-16
TW200901234A (en) 2009-01-01
CN101681705A (zh) 2010-03-24
CN101681705B (zh) 2012-02-15
EP2130207A1 (en) 2009-12-09
CN102682938B (zh) 2016-06-15
US20080211619A1 (en) 2008-09-04
US8957756B2 (en) 2015-02-17
EP2130207B1 (en) 2018-09-05

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