WO2008099442A1 - 分光解析装置及び分光解析方法 - Google Patents

分光解析装置及び分光解析方法 Download PDF

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Publication number
WO2008099442A1
WO2008099442A1 PCT/JP2007/001453 JP2007001453W WO2008099442A1 WO 2008099442 A1 WO2008099442 A1 WO 2008099442A1 JP 2007001453 W JP2007001453 W JP 2007001453W WO 2008099442 A1 WO2008099442 A1 WO 2008099442A1
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WO
WIPO (PCT)
Prior art keywords
spectrum
thin film
operation unit
light
plane mode
Prior art date
Application number
PCT/JP2007/001453
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English (en)
French (fr)
Inventor
Takeshi Hasegawa
Original Assignee
Tokyo Institute Of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Institute Of Technology filed Critical Tokyo Institute Of Technology
Priority to US12/310,865 priority Critical patent/US8094308B2/en
Priority to JP2008557904A priority patent/JP4340814B2/ja
Priority to EP07859657.4A priority patent/EP2112498B1/en
Publication of WO2008099442A1 publication Critical patent/WO2008099442A1/ja

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/447—Polarisation spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Mathematical Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

　赤外光だけでなく可視光や紫外光、さらにはＸ線等、任意の波長の光を用いて、いかなる屈折率の薄膜支持体であっても高精度に薄膜解析が可能な分光解析装置を提供する。 　分光解析装置は、光源１と偏光フィルタ２と検出部３と回帰演算部４と吸光度スペクトル算出部５とからなる。光源１は、異なる入射角θｎで被測定部位に光を照射する。偏光フィルタ２は、ｓ偏光成分を遮蔽する。検出部３は、透過スペクトルＳを検出する。回帰演算部４は、透過スペクトルＳと、混合比率Ｒとを用いて、回帰分析により面内モードスペクトルｓｉｐ及び面外モードスペクトルｓｏｐを得る。吸光度スペクトル算出部５は、支持体に薄膜が支持されている状態と支持されていない状態で得られる結果を基に、薄膜面内モード吸光度スペクトルＡｉｐ及び薄膜面外モード吸光度スペクトルＡｏｐを算出する。
PCT/JP2007/001453 2007-02-16 2007-12-21 分光解析装置及び分光解析方法 WO2008099442A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/310,865 US8094308B2 (en) 2007-02-16 2007-12-21 Spectrometric analyzing device and spectrometric analyzing method
JP2008557904A JP4340814B2 (ja) 2007-02-16 2007-12-21 分光解析装置及び分光解析方法
EP07859657.4A EP2112498B1 (en) 2007-02-16 2007-12-21 Spectroscopic analyzing device and spectroscopic analyzing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007037051 2007-02-16
JP2007-037051 2007-02-16

Publications (1)

Publication Number Publication Date
WO2008099442A1 true WO2008099442A1 (ja) 2008-08-21

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/001453 WO2008099442A1 (ja) 2007-02-16 2007-12-21 分光解析装置及び分光解析方法

Country Status (4)

Country Link
US (1) US8094308B2 (ja)
EP (1) EP2112498B1 (ja)
JP (1) JP4340814B2 (ja)
WO (1) WO2008099442A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019097939A1 (ja) 2017-11-17 2019-05-23 国立大学法人京都大学 分光解析装置及び分光解析方法

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WO2012040466A2 (en) * 2010-09-23 2012-03-29 Nanolambda, Inc. Spectrum reconstruction method for minature spectrometers
EP2793281A4 (en) 2011-12-13 2016-01-06 Panasonic Corp ORGANIC ELECTROLUMINESCENT ELEMENT
TW201447272A (zh) * 2013-06-14 2014-12-16 Chieh Jui Technology Co Ltd 量測系統
GB2533589A (en) * 2014-12-22 2016-06-29 Ndc Infrared Eng Ltd Measurement of porous film
CN108508503B (zh) * 2017-02-27 2019-08-02 北京航空航天大学 一种可实现图谱及结构信息集成探测的遥感成像系统

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JPH04363645A (ja) * 1990-12-26 1992-12-16 Toshiba Corp 分光分析装置
JPH05296920A (ja) * 1992-04-22 1993-11-12 Mitsubishi Materials Corp 赤外分光光度測定装置
JP3046724B2 (ja) * 1994-10-04 2000-05-29 東芝セラミックス株式会社 ウエハの厚さ測定方法
JP3275944B2 (ja) * 1995-12-05 2002-04-22 日本電気株式会社 異方性薄膜検査法、異方性薄膜検査装置、液晶配向膜検査方法、液晶配向膜検査装置
JP3285365B2 (ja) * 1997-04-04 2002-05-27 ジェイ・エイ・ウーラム・カンパニー・インコーポレイテッド フォトアレイ検出器を備える回帰較正による回転補正器型分光エリプソメータシステム
JP2003090762A (ja) 2001-09-20 2003-03-28 New Industry Research Organization 非偏光電磁波を用いた薄膜の面内・面外モードスペクトルの測定方法
JP2005003386A (ja) * 2003-06-09 2005-01-06 Jasco Corp 屈折率測定装置及び屈折率測定方法
JP2006214778A (ja) * 2005-02-02 2006-08-17 National Institute Of Advanced Industrial & Technology ラングミュア・ブロジェット膜の膜厚と誘電率分散の同時決定方法および装置

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US5504582A (en) * 1992-09-18 1996-04-02 J. A. Woollam Co. Inc. System and method for compensating polarization-dependent sensitivity of dispersive optics in a rotating analyzer ellipsometer system
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EP1038167A4 (en) * 1997-12-12 2001-08-22 Perkin Elmer Corp ANALYSIS DEVICE USING OPTICAL RESONANCE
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Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04363645A (ja) * 1990-12-26 1992-12-16 Toshiba Corp 分光分析装置
JPH05296920A (ja) * 1992-04-22 1993-11-12 Mitsubishi Materials Corp 赤外分光光度測定装置
JP3046724B2 (ja) * 1994-10-04 2000-05-29 東芝セラミックス株式会社 ウエハの厚さ測定方法
JP3275944B2 (ja) * 1995-12-05 2002-04-22 日本電気株式会社 異方性薄膜検査法、異方性薄膜検査装置、液晶配向膜検査方法、液晶配向膜検査装置
JP3285365B2 (ja) * 1997-04-04 2002-05-27 ジェイ・エイ・ウーラム・カンパニー・インコーポレイテッド フォトアレイ検出器を備える回帰較正による回転補正器型分光エリプソメータシステム
JP2003090762A (ja) 2001-09-20 2003-03-28 New Industry Research Organization 非偏光電磁波を用いた薄膜の面内・面外モードスペクトルの測定方法
JP2005003386A (ja) * 2003-06-09 2005-01-06 Jasco Corp 屈折率測定装置及び屈折率測定方法
JP2006214778A (ja) * 2005-02-02 2006-08-17 National Institute Of Advanced Industrial & Technology ラングミュア・ブロジェット膜の膜厚と誘電率分散の同時決定方法および装置

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HASEGAWA T. ET AL.: "Optinum Condition of Fourier Transform Infrared Multiple-Angle Incidence Resolution Spectrometry for Surface Analysis", ANALYTICAL CHEMISTRY, vol. 74, no. 23, 1 December 2002 (2002-12-01), pages 6049 - 6054, XP008111095 *
HASEGAWA T.: "Advanced Multiple-Angle Incidence Resolution Spectrometry for Thin-Layer Analysis on a Low-Refractive-Index Substrate", ANALYTICAL CHEMISTRY, vol. 79, no. 12, 15 June 2007 (2007-06-15), pages 4385 - 4389, XP008111096 *
HASEGAWA T.: "Keiryo Kagaku ga Hiraku Atarashii Kaimen no Hikari Keisoku", SEIBUTSU KOGAKU, vol. 84, no. 4, 25 April 2006 (2006-04-25), pages 134 - 137, XP008111262 *
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TAKESHI HASEGAWA: "A Novel Optical Technique for Analysis of Surface and Interface Developed by Using Chemometrics", JOURNAL OF THE SOCIETY FOR BIOTECHNOLOGY, vol. 84, no. 4, April 2006 (2006-04-01), pages 134 - 137

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019097939A1 (ja) 2017-11-17 2019-05-23 国立大学法人京都大学 分光解析装置及び分光解析方法
JP2019095220A (ja) * 2017-11-17 2019-06-20 国立大学法人京都大学 分光解析装置及び分光解析方法
US11215507B2 (en) 2017-11-17 2022-01-04 Kyoto University Spectral analysis device and spectral analysis method

Also Published As

Publication number Publication date
EP2112498B1 (en) 2015-03-11
US20090316152A1 (en) 2009-12-24
JPWO2008099442A1 (ja) 2010-05-27
EP2112498A4 (en) 2014-04-23
JP4340814B2 (ja) 2009-10-07
EP2112498A1 (en) 2009-10-28
US8094308B2 (en) 2012-01-10

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