WO2008096855A1 - 常温溶融塩浴を用いた電気Al-Zr合金めっき浴とそれを用いるめっき方法 - Google Patents
常温溶融塩浴を用いた電気Al-Zr合金めっき浴とそれを用いるめっき方法 Download PDFInfo
- Publication number
- WO2008096855A1 WO2008096855A1 PCT/JP2008/052151 JP2008052151W WO2008096855A1 WO 2008096855 A1 WO2008096855 A1 WO 2008096855A1 JP 2008052151 W JP2008052151 W JP 2008052151W WO 2008096855 A1 WO2008096855 A1 WO 2008096855A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electric
- bath
- halides
- room temperature
- alloy plating
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/66—Electroplating: Baths therefor from melts
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Paints Or Removers (AREA)
Abstract
本発明は、(A)アルミニウムハロゲン化物、(B)N-アルキルピリジニウムハライド類、N-アルキルイミダゾリウムハライド類、N,N'-アルキルイミダゾリウムハライド類、N-アルキルピラゾリウムハライド類及びN,N'-アルキルピラゾリウムハライド類からなる群より選ばれる1種又は2種以上の化合物及び(C)ジルコニウムハロゲン化物を含む電気Al-Zr合金めっき浴であって、(A)アルミニウムハロゲン化物と(B)化合物とのモル比が1:1~3:1であり、さらに(D)芳香族有機溶媒、(E)有機重合体及び(F)光沢剤から選ばれる1種又は2種以上の添加剤を含む電気Al-Zr合金めっき浴を提供する。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES08711030.0T ES2597855T3 (es) | 2007-02-09 | 2008-02-08 | Baño de electrodepósito de aleación Al-Zr usando baño de sal fundida a temperatura ambiente y procedimiento de depósito usando tal baño |
US12/526,468 US10023968B2 (en) | 2007-02-09 | 2008-02-08 | Electric Al—Zr alloy plating bath using room temperature molten salt bath and plating method using the same |
EP08711030.0A EP2130949B8 (en) | 2007-02-09 | 2008-02-08 | ELECTRIC Al-Zr ALLOY PLATING BATH USING ROOM TEMPERATURE MOLTEN SALT BATH AND PLATING METHOD USING THE SAME |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007030553A JP5270846B2 (ja) | 2007-02-09 | 2007-02-09 | 常温溶融塩浴を用いた電気Al−Zr合金めっき浴とそれを用いるめっき方法 |
JP2007-030553 | 2007-02-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008096855A1 true WO2008096855A1 (ja) | 2008-08-14 |
Family
ID=39681756
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/052151 WO2008096855A1 (ja) | 2007-02-09 | 2008-02-08 | 常温溶融塩浴を用いた電気Al-Zr合金めっき浴とそれを用いるめっき方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US10023968B2 (ja) |
EP (1) | EP2130949B8 (ja) |
JP (1) | JP5270846B2 (ja) |
ES (1) | ES2597855T3 (ja) |
WO (1) | WO2008096855A1 (ja) |
Cited By (3)
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WO2010136814A3 (en) * | 2009-05-29 | 2011-03-31 | Astron Advanced Materials Limited | Electrodeposition of elemental zirconium |
WO2010106072A3 (de) * | 2009-03-18 | 2011-09-01 | Basf Se | Elektrolyt und oberflächenaktive additive für die galvanische abscheidung glatter, dichter aluminium-schichten aus ionischen flüssigkeiten |
CN102796502A (zh) * | 2012-09-11 | 2012-11-28 | 西华师范大学 | 缓蚀剂溴化-n-烷基吡啶丙烯酸酯及其制备方法 |
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JP2008195990A (ja) * | 2007-02-09 | 2008-08-28 | Dipsol Chem Co Ltd | 電気アルミニウムめっき浴及びそれを用いためっき方法 |
JP5080097B2 (ja) * | 2007-02-09 | 2012-11-21 | ディップソール株式会社 | 溶融塩電気アルミニウムめっき浴及びそれを用いためっき方法 |
JP2009173977A (ja) * | 2008-01-22 | 2009-08-06 | Dipsol Chem Co Ltd | 常温溶融塩浴を用いた電気Al又はAl合金めっき浴及びそれを用いるめっき方法 |
JP5581523B2 (ja) | 2009-10-19 | 2014-09-03 | ディップソール株式会社 | アルミニウムまたはアルミニウム合金バレル電気めっき方法 |
WO2011073113A1 (de) * | 2009-12-15 | 2011-06-23 | Basf Se | Thiazol-verbindungen als additive in elektrolytlösungen für elektrochemische zellen und batterien |
US8821707B2 (en) | 2010-08-04 | 2014-09-02 | Dipsol Chemicals Co., Ltd. | Electric Al or Al alloy plating bath using room temperature molten salt bath and plating method using the same |
US20130168258A1 (en) * | 2010-09-30 | 2013-07-04 | Hitachi, Ltd. | Aluminum electroplating solution |
JP2012144763A (ja) * | 2011-01-11 | 2012-08-02 | Sumitomo Electric Ind Ltd | アルミニウム構造体の製造方法およびアルミニウム構造体 |
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US10190227B2 (en) * | 2013-03-14 | 2019-01-29 | Xtalic Corporation | Articles comprising an electrodeposited aluminum alloys |
CN103741171B (zh) * | 2014-01-24 | 2016-01-20 | 东北大学 | 一种铝液-熔盐法生产铝锆合金的方法 |
US9752242B2 (en) | 2014-09-17 | 2017-09-05 | Xtalic Corporation | Leveling additives for electrodeposition |
CN104388713A (zh) * | 2014-10-31 | 2015-03-04 | 三祥新材股份有限公司 | 一种铝锆合金的制备方法 |
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CN105274368A (zh) * | 2015-12-07 | 2016-01-27 | 三祥新材股份有限公司 | 一种铝铪合金制备方法 |
CN105648489A (zh) * | 2015-12-21 | 2016-06-08 | 中国航空工业集团公司北京航空材料研究院 | 一种用于Al-Zr合金电镀的电镀液、其制备方法及电镀方法 |
US10590514B2 (en) | 2016-07-01 | 2020-03-17 | Xtalic Corporation | Nanostructured aluminum zirconium alloys for improved anodization |
US10590558B2 (en) | 2016-09-23 | 2020-03-17 | Xtalic Corporation | Nanostructured aluminum alloys for improved hardness |
US10509646B2 (en) | 2017-06-02 | 2019-12-17 | Apple Inc. | Software update rollbacks using file system volume snapshots |
US11268188B2 (en) | 2019-05-02 | 2022-03-08 | Apple Inc. | Aluminum physical vapor deposition for the cosmetic finishing of recycled aluminum alloys |
US11613825B2 (en) | 2019-05-28 | 2023-03-28 | Battelle Memorial Institute | Composition and method embodiments for plating metal coatings |
US20210156041A1 (en) * | 2019-11-22 | 2021-05-27 | Hamilton Sundstrand Corporation | Metallic coating and method of application |
Citations (9)
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JPS60221596A (ja) * | 1983-12-23 | 1985-11-06 | エルテツチ・システムス・コ−ポレ−シヨン | 電解法、電気めつき被膜およびその使用 |
JPS6270593A (ja) * | 1985-09-20 | 1987-04-01 | Nisshin Steel Co Ltd | 電気アルミニウムめつき浴およびそのめつき浴によるめつき方法 |
EP0339536A1 (en) | 1988-04-26 | 1989-11-02 | Nisshin Steel Co., Ltd. | Plating bath for electrodeposition of aluminum and plating process making use of the bath |
EP0398358A2 (en) | 1989-05-18 | 1990-11-22 | Mitsubishi Petrochemical Co., Ltd. | Aluminum electroplating method |
EP0404188A1 (en) | 1989-06-23 | 1990-12-27 | Nisshin Steel Co., Ltd. | Non-aqueous electrolytic aluminum plating bath composition |
EP0404179A1 (en) | 1989-06-22 | 1990-12-27 | Mitsubishi Petrochemical Co., Ltd. | Method for producing ambient temperature molten salt |
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JPH0472089A (ja) * | 1990-07-12 | 1992-03-06 | Deitsupusoole Kk | アルミニウムめっき浴 |
JPH0551785A (ja) * | 1991-05-21 | 1993-03-02 | Deitsupusoole Kk | 電気アルミニウムめつき浴 |
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JPS6051785A (ja) | 1983-08-31 | 1985-03-23 | Kobe Steel Ltd | 褐炭の2段水添液化方法 |
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JP3221897B2 (ja) * | 1991-11-22 | 2001-10-22 | ディップソール株式会社 | 電気アルミニウムめっき液の精製方法およびめっき方法 |
-
2007
- 2007-02-09 JP JP2007030553A patent/JP5270846B2/ja not_active Expired - Fee Related
-
2008
- 2008-02-08 ES ES08711030.0T patent/ES2597855T3/es active Active
- 2008-02-08 EP EP08711030.0A patent/EP2130949B8/en not_active Not-in-force
- 2008-02-08 US US12/526,468 patent/US10023968B2/en not_active Expired - Fee Related
- 2008-02-08 WO PCT/JP2008/052151 patent/WO2008096855A1/ja active Application Filing
Patent Citations (9)
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JPS60221596A (ja) * | 1983-12-23 | 1985-11-06 | エルテツチ・システムス・コ−ポレ−シヨン | 電解法、電気めつき被膜およびその使用 |
JPS6270593A (ja) * | 1985-09-20 | 1987-04-01 | Nisshin Steel Co Ltd | 電気アルミニウムめつき浴およびそのめつき浴によるめつき方法 |
EP0339536A1 (en) | 1988-04-26 | 1989-11-02 | Nisshin Steel Co., Ltd. | Plating bath for electrodeposition of aluminum and plating process making use of the bath |
EP0398358A2 (en) | 1989-05-18 | 1990-11-22 | Mitsubishi Petrochemical Co., Ltd. | Aluminum electroplating method |
EP0404179A1 (en) | 1989-06-22 | 1990-12-27 | Mitsubishi Petrochemical Co., Ltd. | Method for producing ambient temperature molten salt |
EP0404188A1 (en) | 1989-06-23 | 1990-12-27 | Nisshin Steel Co., Ltd. | Non-aqueous electrolytic aluminum plating bath composition |
EP0461727A2 (en) | 1990-06-13 | 1991-12-18 | Shell Internationale Researchmaatschappij B.V. | Electrodeposition of aluminium alloys |
JPH0472089A (ja) * | 1990-07-12 | 1992-03-06 | Deitsupusoole Kk | アルミニウムめっき浴 |
JPH0551785A (ja) * | 1991-05-21 | 1993-03-02 | Deitsupusoole Kk | 電気アルミニウムめつき浴 |
Non-Patent Citations (2)
Title |
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See also references of EP2130949A4 * |
TSUDA T. ET AL.: "Electrodeposition of Al-Zr Alloys from Lewis Acidic Aluminum Chloride-1-Ethyl-3-methylimidazolium Chloride Melt", JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 151, no. 7, 2004, pages C447 - C454, XP008118599 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010106072A3 (de) * | 2009-03-18 | 2011-09-01 | Basf Se | Elektrolyt und oberflächenaktive additive für die galvanische abscheidung glatter, dichter aluminium-schichten aus ionischen flüssigkeiten |
WO2010136814A3 (en) * | 2009-05-29 | 2011-03-31 | Astron Advanced Materials Limited | Electrodeposition of elemental zirconium |
US9017541B2 (en) | 2009-05-29 | 2015-04-28 | Astron Advanced Materials Limited | Electrodeposition of elemental zirconium |
CN102796502A (zh) * | 2012-09-11 | 2012-11-28 | 西华师范大学 | 缓蚀剂溴化-n-烷基吡啶丙烯酸酯及其制备方法 |
CN102796502B (zh) * | 2012-09-11 | 2014-02-19 | 西华师范大学 | 缓蚀剂溴化-n-烷基吡啶丙烯酸酯及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
US10023968B2 (en) | 2018-07-17 |
EP2130949B8 (en) | 2016-10-12 |
JP5270846B2 (ja) | 2013-08-21 |
EP2130949A1 (en) | 2009-12-09 |
JP2008195988A (ja) | 2008-08-28 |
EP2130949A4 (en) | 2011-08-03 |
ES2597855T3 (es) | 2017-01-23 |
US20100285322A1 (en) | 2010-11-11 |
EP2130949B1 (en) | 2016-08-31 |
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