WO2008096648A1 - 高融点金属合金、高融点金属珪化物、高融点金属炭化物、高融点金属窒化物あるいは高融点金属ホウ化物の難焼結体からなるターゲット及びその製造方法並びに同スパッタリングターゲット－バッキングプレート組立体及びその製造方法 - Google Patents

高融点金属合金、高融点金属珪化物、高融点金属炭化物、高融点金属窒化物あるいは高融点金属ホウ化物の難焼結体からなるターゲット及びその製造方法並びに同スパッタリングターゲット－バッキングプレート組立体及びその製造方法 Download PDF

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Publication number
WO2008096648A1
WO2008096648A1 PCT/JP2008/051364 JP2008051364W WO2008096648A1 WO 2008096648 A1 WO2008096648 A1 WO 2008096648A1 JP 2008051364 W JP2008051364 W JP 2008051364W WO 2008096648 A1 WO2008096648 A1 WO 2008096648A1
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Prior art keywords
melting point
point metal
target
sintering
resistant material
Prior art date
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PCT/JP2008/051364
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English (en)
French (fr)
Inventor
Yasuhiro Yamakoshi
Original Assignee
Nippon Mining & Metals Co., Ltd.
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Publication date
Application filed by Nippon Mining & Metals Co., Ltd. filed Critical Nippon Mining & Metals Co., Ltd.
Priority to US12/302,319 priority Critical patent/US9677170B2/en
Priority to KR1020087030241A priority patent/KR101086661B1/ko
Priority to JP2008557077A priority patent/JP4927102B2/ja
Priority to CN2008800004185A priority patent/CN101542011B/zh
Priority to EP08704146.3A priority patent/EP2119808B1/en
Publication of WO2008096648A1 publication Critical patent/WO2008096648A1/ja
Priority to US15/271,372 priority patent/US10344373B2/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
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    • B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/06—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
    • B22F7/08—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools with one or more parts not made from powder
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
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    • B22F3/162—Machining, working after consolidation
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    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
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Abstract

　高融点金属合金、高融点金属珪化物、高融点金属炭化物、高融点金属窒化物あるいは高融点金属ホウ化物の難焼結体からなるターゲット材とターゲット材以外の高融点金属板とが接合された構造を備えていることを特徴とする高融点金属合金、高融点金属珪化物、高融点金属炭化物、高融点金属窒化物あるいは高融点金属ホウ化物の難焼結体からなるターゲット。機械加工が難しい高融点金属合金、高融点金属珪化物、高融点金属炭化物、高融点金属窒化物あるいは高融点金属ホウ化物の難焼結体からなるターゲットを比較的容易に製造できるようにすると共に、ターゲット製造時及びハイパワースパッタリング時の割れの発生を効果的に抑制し、またターゲット原料のホットプレス時におけるダイスとの反応を抑制し、さらにターゲットの反りを低減できる高融点金属合金、高融点金属珪化物、高融点金属炭化物、高融点金属窒化物あるいは高融点金属ホウ化物の難焼結体からなるターゲット及びその製造方法を提供する。
PCT/JP2008/051364 2007-02-09 2008-01-30 高融点金属合金、高融点金属珪化物、高融点金属炭化物、高融点金属窒化物あるいは高融点金属ホウ化物の難焼結体からなるターゲット及びその製造方法並びに同スパッタリングターゲット－バッキングプレート組立体及びその製造方法 WO2008096648A1 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
US12/302,319 US9677170B2 (en) 2007-02-09 2008-01-30 Target formed of sintering-resistant material of high-melting point metal alloy, high-melting point metal silicide, high-melting point metal carbide, high-melting point metal nitride, or high-melting point metal boride, process for producing the target, assembly of the sputtering target-backing plate, and process for producing the same
KR1020087030241A KR101086661B1 (ko) 2007-02-09 2008-01-30 고융점 금속 합금, 고융점 금속 규화물, 고융점 금속 탄화물, 고융점 금속 질화물 혹은 고융점 금속 붕소화물의 난소결체로 이루어지는 타겟 및 그 제조 방법 그리고 동스퍼터링 타겟-백킹 플레이트 조립체 및 그 제조 방법
JP2008557077A JP4927102B2 (ja) 2007-02-09 2008-01-30 高融点金属合金、高融点金属珪化物、高融点金属炭化物、高融点金属窒化物あるいは高融点金属ホウ化物の難焼結体からなるターゲット及びその製造方法並びに同スパッタリングターゲット−バッキングプレート組立体及びその製造方法
CN2008800004185A CN101542011B (zh) 2007-02-09 2008-01-30 由高熔点难烧结物质构成的靶、靶-背衬板组件的制造方法
EP08704146.3A EP2119808B1 (en) 2007-02-09 2008-01-30 Target formed of sintering-resistant material of high-melting point metal alloy, high-melting point metal silicide, high-melting point metal carbide, high-melting point metal nitride, or high-melting point metal boride, process for producing the target, assembly of the sputtering target-backing plate, and process for producing the same
US15/271,372 US10344373B2 (en) 2007-02-09 2016-09-21 Process for producing a target formed of a sintering-resistant material of a high-melting point metal alloy, silicide, carbide, nitride or boride

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-030792 2007-02-09
JP2007030792 2007-02-09

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US12/302,319 A-371-Of-International US9677170B2 (en) 2007-02-09 2008-01-30 Target formed of sintering-resistant material of high-melting point metal alloy, high-melting point metal silicide, high-melting point metal carbide, high-melting point metal nitride, or high-melting point metal boride, process for producing the target, assembly of the sputtering target-backing plate, and process for producing the same
US15/271,372 Division US10344373B2 (en) 2007-02-09 2016-09-21 Process for producing a target formed of a sintering-resistant material of a high-melting point metal alloy, silicide, carbide, nitride or boride

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EP (2) EP2806048B1 (ja)
JP (2) JP4927102B2 (ja)
KR (1) KR101086661B1 (ja)
CN (2) CN102367567B (ja)
TW (1) TW200844243A (ja)
WO (1) WO2008096648A1 (ja)

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TWI671276B (zh) * 2014-03-26 2019-09-11 日商Ｊｘ日鑛日石金屬股份有限公司 由碳化鎢或碳化鈦構成之濺鍍靶、及其等之製造方法

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CN102367567B (zh) 2015-04-01
CN101542011B (zh) 2011-11-23
JPWO2008096648A1 (ja) 2010-05-20
CN102367567A (zh) 2012-03-07
EP2119808B1 (en) 2014-09-17
JP4927102B2 (ja) 2012-05-09
KR101086661B1 (ko) 2011-11-24
EP2119808A1 (en) 2009-11-18
TW200844243A (en) 2008-11-16
US20170009335A1 (en) 2017-01-12
US20090229975A1 (en) 2009-09-17
EP2806048A3 (en) 2014-12-24
EP2119808A4 (en) 2012-07-11
KR20090032037A (ko) 2009-03-31
TWI373534B (ja) 2012-10-01
US10344373B2 (en) 2019-07-09
EP2806048A2 (en) 2014-11-26
JP5346096B2 (ja) 2013-11-20
EP2806048B1 (en) 2017-10-11
US9677170B2 (en) 2017-06-13
JP2012136779A (ja) 2012-07-19

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