MX2009007483A - Metales refractarios de alta densidad y blancos de pulverizacion catodica de aleaciones. - Google Patents

Metales refractarios de alta densidad y blancos de pulverizacion catodica de aleaciones.

Info

Publication number
MX2009007483A
MX2009007483A MX2009007483A MX2009007483A MX2009007483A MX 2009007483 A MX2009007483 A MX 2009007483A MX 2009007483 A MX2009007483 A MX 2009007483A MX 2009007483 A MX2009007483 A MX 2009007483A MX 2009007483 A MX2009007483 A MX 2009007483A
Authority
MX
Mexico
Prior art keywords
high density
alloys
refractory metals
sputtering targets
density refractory
Prior art date
Application number
MX2009007483A
Other languages
English (en)
Inventor
Prabhat Kumar
Gary Rozak
Rong-Chein Richard Wu
Steven A Miller
Charles B Wood
Glen Zeman
Original Assignee
Starck H C Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Starck H C Inc filed Critical Starck H C Inc
Publication of MX2009007483A publication Critical patent/MX2009007483A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/02—Compacting only
    • B22F3/04—Compacting only by applying fluid pressure, e.g. by cold isostatic pressing [CIP]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10—Sintering only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10—Sintering only
    • B22F3/1017—Multiple heating or additional steps
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/045—Alloys based on refractory metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/24—After-treatment of workpieces or articles
    • B22F2003/241—Chemical after-treatment on the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/24—After-treatment of workpieces or articles
    • B22F2003/247—Removing material: carving, cleaning, grinding, hobbing, honing, lapping, polishing, milling, shaving, skiving, turning the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B22F2998/10—Processes characterised by the sequence of their steps
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Powder Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

La presente invención se refiere a un proceso para producir productos de metales refractarios de alta densidad, vía un proceso de presión/sinterización. La invención también se dirige a un proceso para producir un blanco por pulverización catódica y al blanco de pulverización catódica así producido.
MX2009007483A 2007-01-16 2008-01-15 Metales refractarios de alta densidad y blancos de pulverizacion catodica de aleaciones. MX2009007483A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/653,816 US8784729B2 (en) 2007-01-16 2007-01-16 High density refractory metals and alloys sputtering targets
PCT/US2008/051078 WO2008089188A1 (en) 2007-01-16 2008-01-15 High density refractory metals & alloys sputtering targets

Publications (1)

Publication Number Publication Date
MX2009007483A true MX2009007483A (es) 2009-07-22

Family

ID=39432500

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2009007483A MX2009007483A (es) 2007-01-16 2008-01-15 Metales refractarios de alta densidad y blancos de pulverizacion catodica de aleaciones.

Country Status (11)

Country Link
US (2) US8784729B2 (es)
EP (1) EP2125270B1 (es)
JP (2) JP2010516892A (es)
KR (2) KR101505211B1 (es)
CN (1) CN101594955A (es)
BR (1) BRPI0806677A2 (es)
MX (1) MX2009007483A (es)
MY (1) MY153683A (es)
RU (1) RU2009131055A (es)
WO (1) WO2008089188A1 (es)
ZA (1) ZA200904823B (es)

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WO2006117145A2 (en) * 2005-05-05 2006-11-09 H.C. Starck Gmbh Coating process for manufacture or reprocessing of sputter targets and x-ray anodes
CA2606478C (en) * 2005-05-05 2013-10-08 H.C. Starck Gmbh Method for coating a substrate surface and coated product
JP4162094B2 (ja) * 2006-05-30 2008-10-08 三菱重工業株式会社 常温接合によるデバイス、デバイス製造方法ならびに常温接合装置
US20080078268A1 (en) 2006-10-03 2008-04-03 H.C. Starck Inc. Process for preparing metal powders having low oxygen content, powders so-produced and uses thereof
BRPI0718237A2 (pt) * 2006-11-07 2013-11-12 Starck H C Gmbh Método para revestir uma superfície de substrato e produto revestido
US20080145688A1 (en) 2006-12-13 2008-06-19 H.C. Starck Inc. Method of joining tantalum clade steel structures
US8197894B2 (en) * 2007-05-04 2012-06-12 H.C. Starck Gmbh Methods of forming sputtering targets
US8246903B2 (en) 2008-09-09 2012-08-21 H.C. Starck Inc. Dynamic dehydriding of refractory metal powders
US8043655B2 (en) * 2008-10-06 2011-10-25 H.C. Starck, Inc. Low-energy method of manufacturing bulk metallic structures with submicron grain sizes
CN103140600B (zh) * 2010-09-30 2015-06-10 日立金属株式会社 钼靶的制造方法
CN101956159A (zh) * 2010-09-30 2011-01-26 金堆城钼业股份有限公司 一种高纯钼溅射靶材的制备方法
CN102069189A (zh) * 2010-12-24 2011-05-25 金堆城钼业股份有限公司 一种制备高纯材料的粉末冶金方法
CN102139371B (zh) * 2011-05-04 2013-01-23 佛山市钜仕泰粉末冶金有限公司 一种钨合金靶材及其制备方法
US9412568B2 (en) 2011-09-29 2016-08-09 H.C. Starck, Inc. Large-area sputtering targets
US9761884B2 (en) * 2014-06-19 2017-09-12 GM Global Technology Operations LLC Synthesis of alloy nanoparticles as a stable core for core-shell electrocatalysts
CN104439239B (zh) * 2014-11-06 2017-05-03 金堆城钼业股份有限公司 一种重复利用中频感应烧结炉钨钼废发热体的方法
WO2017105488A1 (en) * 2015-12-18 2017-06-22 Intel Corporation Refractory metal alloy targets for physical vapor deposition
US11286172B2 (en) 2017-02-24 2022-03-29 BWXT Isotope Technology Group, Inc. Metal-molybdate and method for making the same
JP7174476B2 (ja) * 2017-03-31 2022-11-17 Ｊｘ金属株式会社 タングステンターゲット

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Also Published As

Publication number Publication date
US8784729B2 (en) 2014-07-22
ZA200904823B (en) 2010-04-28
BRPI0806677A2 (pt) 2014-05-27
US20140299466A1 (en) 2014-10-09
JP2014012895A (ja) 2014-01-23
EP2125270A1 (en) 2009-12-02
CN101594955A (zh) 2009-12-02
JP2010516892A (ja) 2010-05-20
KR101505211B1 (ko) 2015-03-23
MY153683A (en) 2015-03-13
US20080171215A1 (en) 2008-07-17
RU2009131055A (ru) 2011-02-27
KR20140129302A (ko) 2014-11-06
KR101542708B1 (ko) 2015-08-06
JP5586752B2 (ja) 2014-09-10
KR20090104105A (ko) 2009-10-05
EP2125270B1 (en) 2014-04-16
WO2008089188A1 (en) 2008-07-24

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