WO2011038704A3 - Kokille zum stranggiessen - Google Patents

Kokille zum stranggiessen Download PDF

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Publication number
WO2011038704A3
WO2011038704A3 PCT/DE2010/000441 DE2010000441W WO2011038704A3 WO 2011038704 A3 WO2011038704 A3 WO 2011038704A3 DE 2010000441 W DE2010000441 W DE 2010000441W WO 2011038704 A3 WO2011038704 A3 WO 2011038704A3
Authority
WO
WIPO (PCT)
Prior art keywords
die
continuous casting
copper
die plate
reworking
Prior art date
Application number
PCT/DE2010/000441
Other languages
English (en)
French (fr)
Other versions
WO2011038704A2 (de
Inventor
Egon Evertz
Ralf Evertz
Stefan Evertz
Original Assignee
Egon Evertz K.G. (Gmbh & Co.)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=41413318&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2011038704(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Egon Evertz K.G. (Gmbh & Co.) filed Critical Egon Evertz K.G. (Gmbh & Co.)
Priority to EP10721642.6A priority Critical patent/EP2393965B1/de
Priority to US13/375,972 priority patent/US8813825B2/en
Priority to BRPI1015535A priority patent/BRPI1015535A2/pt
Priority to CN201080018864.6A priority patent/CN102421944B/zh
Publication of WO2011038704A2 publication Critical patent/WO2011038704A2/de
Publication of WO2011038704A3 publication Critical patent/WO2011038704A3/de
Priority to ZA2011/07472A priority patent/ZA201107472B/en
Priority to HK12105190.3A priority patent/HK1164382A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
    • B22D11/00—Continuous casting of metals, i.e. casting in indefinite lengths
    • B22D11/04—Continuous casting of metals, i.e. casting in indefinite lengths into open-ended moulds
    • B22D11/059—Mould materials or platings
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C25D15/02—Combined electrolytic and electrophoretic processes with charged materials
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/67—Electroplating to repair workpiece
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Continuous Casting (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

Die Erfindung betrifft eine Kupfer-Kokille oder Kupfer-Kokillenplatte sowie ein Verfahren zur Aufarbeitung solcher verschlissener Kokillen oder Kokillenplatten, die zum Stranggießen von Metallen oder Metall-Legierungen verwendet werden. Erfindungsgemäß wird eine Beschichtung auf der Kokilleninnenwand oder der dem Gießstrang zugewandten Kokillenplattenseite aus Kupfer, welches elektrolytisch aufgetragen wird, verwendet.
PCT/DE2010/000441 2009-09-29 2010-04-20 Kokille zum stranggiessen WO2011038704A2 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
EP10721642.6A EP2393965B1 (de) 2009-09-29 2010-04-20 Kokille zum stranggiessen
US13/375,972 US8813825B2 (en) 2009-09-29 2010-04-20 Permanent mold for continuous casting
BRPI1015535A BRPI1015535A2 (pt) 2009-09-29 2010-04-20 coquilha para lingotamento contínuo
CN201080018864.6A CN102421944B (zh) 2009-09-29 2010-04-20 连铸用的结晶器
ZA2011/07472A ZA201107472B (en) 2009-09-29 2011-10-12 Die for continuous casting
HK12105190.3A HK1164382A1 (en) 2009-09-29 2012-05-28 Die for continuous casting

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE202009013126U DE202009013126U1 (de) 2009-09-29 2009-09-29 Kokille zum Stranggießen
DE202009013126.2 2009-09-29

Publications (2)

Publication Number Publication Date
WO2011038704A2 WO2011038704A2 (de) 2011-04-07
WO2011038704A3 true WO2011038704A3 (de) 2011-08-18

Family

ID=41413318

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2010/000441 WO2011038704A2 (de) 2009-09-29 2010-04-20 Kokille zum stranggiessen

Country Status (9)

Country Link
US (1) US8813825B2 (de)
EP (1) EP2393965B1 (de)
CN (1) CN102421944B (de)
BR (1) BRPI1015535A2 (de)
DE (1) DE202009013126U1 (de)
HK (1) HK1164382A1 (de)
PL (1) PL2393965T3 (de)
WO (1) WO2011038704A2 (de)
ZA (1) ZA201107472B (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011114556A1 (de) 2011-09-30 2013-04-04 Egon Evertz Kg (Gmbh & Co.) Kupfer-Kokille oder Kupfer-Kokillenplatte zum Stranggießen von Metallen oder Metalllegierungen
US8932518B2 (en) 2012-02-29 2015-01-13 General Electric Company Mold and facecoat compositions
CN102776550B (zh) * 2012-08-01 2014-11-05 西峡龙成特种材料有限公司 结晶器铜板上下镀层一次电镀成型电解槽
US9511417B2 (en) 2013-11-26 2016-12-06 General Electric Company Silicon carbide-containing mold and facecoat compositions and methods for casting titanium and titanium aluminide alloys
US9192983B2 (en) 2013-11-26 2015-11-24 General Electric Company Silicon carbide-containing mold and facecoat compositions and methods for casting titanium and titanium aluminide alloys
DE102018129966A1 (de) * 2018-11-27 2020-05-28 apt Extrusions GmbH & Co. KG Verfahren zur Herstellung eines in einem Strangpressprozess umformbaren Erzeugnisses durch Stranggießen
CN109355684A (zh) * 2018-11-28 2019-02-19 德阳深捷科技有限公司 一种应用于连铸结晶器的增材制造结构及增材制造方法和装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55141364A (en) * 1979-04-23 1980-11-05 Mitsubishi Metal Corp Composite tubular mold
JPS5668555A (en) * 1979-11-12 1981-06-09 Sumitomo Metal Ind Ltd Mold for continuous casting
DE3211199A1 (de) * 1982-03-26 1983-09-29 Egon 5650 Solingen Evertz Verfahren zum vernickeln von kokillenwaenden
JPH071086A (ja) * 1993-06-15 1995-01-06 Daido Steel Co Ltd 銅製鋳造モールドの補修方法
DE102005040151A1 (de) * 2005-08-25 2007-03-01 Galvotech Dier Gmbh Nanopartikelschicht

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3671407A (en) * 1970-09-11 1972-06-20 United States Steel Corp Method for preventing high-temperature blistering of copper coatings electro-deposited on copper substrates
JPS5377840A (en) * 1976-12-21 1978-07-10 Mishima Kosan Co Ltd Preparation of mold for slab
DE3038289A1 (de) 1980-10-10 1982-05-27 Egon 5650 Solingen Evertz Verfahren zum abscheiden von metallschichten auf den waenden von kokillen
DE3377700D1 (en) * 1982-11-04 1988-09-22 Voest Alpine Ag Open-ended mould for a continuous-casting plant
JPS62154570A (ja) * 1985-12-27 1987-07-09 Furukawa Battery Co Ltd:The 蓄電池用電極板の製造法
IT1215386B (it) 1987-03-18 1990-02-08 Danieli Off Mecc Procedimento di recupero per cristallizzatore di lingottiera per colata continua.
JPH0659523B2 (ja) * 1988-09-09 1994-08-10 ノムラテクノリサーチ株式会社 連続鋳造用鋳型の製造方法
DE4041830A1 (de) 1990-12-24 1992-06-25 Schloemann Siemag Ag Stahlstranggiesskokille
FR2747400B1 (fr) * 1996-04-12 1998-05-22 Usinor Sacilor Procede de conditionnement de la surface externe en cuivre ou alliage de cuivre d'un element d'une lingotiere de coulee continue des metaux, du type comportant une etape de nickelage et une etape de denickelage
FR2750903B1 (fr) * 1996-07-11 1998-09-18 Usinor Sacilor Element d'une lingotiere pour la coulee continue des metaux, comprenant une paroi refroidie en cuivre ou en alliage de cuivre comportant sur sa surface externe un revetement metallique et procede pour son revetement
JPH10305351A (ja) * 1997-05-08 1998-11-17 Nkk Corp 連続鋳造用鋳型の補修方法
WO2003099490A1 (de) 2002-05-27 2003-12-04 Concast Ag Verfahren zur galvanischen beschichtung einer stranggiesskokille

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55141364A (en) * 1979-04-23 1980-11-05 Mitsubishi Metal Corp Composite tubular mold
JPS5668555A (en) * 1979-11-12 1981-06-09 Sumitomo Metal Ind Ltd Mold for continuous casting
DE3211199A1 (de) * 1982-03-26 1983-09-29 Egon 5650 Solingen Evertz Verfahren zum vernickeln von kokillenwaenden
JPH071086A (ja) * 1993-06-15 1995-01-06 Daido Steel Co Ltd 銅製鋳造モールドの補修方法
DE102005040151A1 (de) * 2005-08-25 2007-03-01 Galvotech Dier Gmbh Nanopartikelschicht

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Week 198051, Derwent World Patents Index; AN 1980-91089C, XP002642778 *
DATABASE WPI Week 198130, Derwent World Patents Index; AN 1981-54166D, XP002642779 *

Also Published As

Publication number Publication date
US20120067541A1 (en) 2012-03-22
EP2393965B1 (de) 2016-06-08
US8813825B2 (en) 2014-08-26
CN102421944A (zh) 2012-04-18
EP2393965A2 (de) 2011-12-14
BRPI1015535A2 (pt) 2016-04-26
CN102421944B (zh) 2014-12-17
DE202009013126U1 (de) 2009-12-10
PL2393965T3 (pl) 2017-05-31
ZA201107472B (en) 2012-09-26
WO2011038704A2 (de) 2011-04-07
HK1164382A1 (en) 2012-09-21

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