WO2008072709A1 - 回折光学素子の光学特性測定方法および回折光学素子の光学特性測定装置 - Google Patents
回折光学素子の光学特性測定方法および回折光学素子の光学特性測定装置 Download PDFInfo
- Publication number
- WO2008072709A1 WO2008072709A1 PCT/JP2007/074058 JP2007074058W WO2008072709A1 WO 2008072709 A1 WO2008072709 A1 WO 2008072709A1 JP 2007074058 W JP2007074058 W JP 2007074058W WO 2008072709 A1 WO2008072709 A1 WO 2008072709A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- light
- optical element
- spot
- diffractive optical
- diffraction
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0228—Testing optical properties by measuring refractive power
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
- G02B5/189—Structurally combined with optical elements not having diffractive power
Definitions
- the present invention relates to an optical property measuring method and an optical property measuring apparatus for a diffractive optical element.
- FIG. 10 shows a general diffractive optical element 122.
- this diffractive optical element 122 triangular wave grooves are formed in parallel on a flat plate.
- light is incident on the diffractive optical element 122, it is separated into diffracted light of the orders 0th order, 1st order, 2nd order,.
- the method for evaluating the diffraction efficiency of each order of diffracted light will be specifically described below.
- FIG. 11 is a diagram for explaining a diffraction efficiency evaluation method called a knife edge method.
- a diffraction efficiency evaluation method called a knife edge method.
- the diffracted beams of the respective orders are separated in the direction perpendicular to the optical axis to form an image.
- the imaged spot light is shielded with a thin light-shielding plate 123 whose edge is sufficiently long compared to the spot diameter, such as a knife blade, and scanned at regular intervals.
- Measure with Photodetector 124 Measure with Photodetector 124.
- the obtained intensity distribution force and the difference in intensity can be calculated, and the diffraction efficiency of each order can be calculated from this difference.
- Patent Document 1 discloses diffraction efficiency measurement of a diffractive optical element in which diffraction grooves are formed concentrically and the image formation points of diffraction spots of respective orders are formed in the same straight line.
- the measuring method is such that laser light is collimated by a collimator lens and incident on a diffractive optical element, and the light condensed by the diffractive optical element is magnified and observed with a microscope.
- the effect of overlapping the spot light of each order is provided with a pinhole slit around the diffracted spot light to block the influence.
- the knife edge method which is a general method for evaluating diffraction efficiency, can be used only when a plurality of diffraction spot lights are formed side by side perpendicular to the optical axis, and the diffraction grooves are formed concentrically.
- the diffractive optical element is formed with multiple diffracted spot lights aligned along the optical axis, so it cannot be evaluated by the knife edge method! /.
- Patent Document 1 evaluates a diffractive optical element formed concentrically.
- laser light is used as an evaluation light source, it is intended for an optical pickup lens and is diffracted with respect to a single wavelength. You can only evaluate efficiency.
- it is premised on laser light that can earn a sufficient amount of light as a light source, and a light source with a certain wavelength width is less light than laser light, so it cannot be handled by the method of Patent Document 1! / ,.
- the force using a pinhole slit to block the influence of spot light of an unnecessary order in the method of Patent Document 1 Slits with various hole diameters to correspond to each diffraction spot light and spot diameter. Need to prepare. For accurate evaluation, it is ideal to match the spot size and slit size exactly, and there is a limit to the evaluation using S and pinhole slits. Furthermore, in Embodiment 2 of Patent Document 1, the light amount when light passes through an aspherical lens instead of the diffractive optical element is obtained in advance when obtaining the diffraction efficiency, and this is used as the incident light amount value. However, this method is troublesome because it is necessary to prepare a lens having the same effective diameter as that of the diffractive optical element!
- Patent Document 1 Japanese Patent Laid-Open No. 09-196813
- Patent Document 1 targets an optical pickup lens, and is very difficult to use for evaluating a diffractive optical element used as an imaging lens.
- a chart depicting parallel lines and figures is imaged through the diffractive optical elements, and the images are observed to observe the distortion and blur of the lines and figures.
- the present invention that solves the problems in the evaluation of the diffractive optical element for use in imaging is that the diffracted light collected by the diffractive optical element that is an imaging lens can be used even in weak light in any wavelength region. It is an object of the present invention to provide a measurement method and an evaluation apparatus that can detect and evaluate spot light quantity, diffraction efficiency, and luminance distribution in the optical axis direction easily and accurately.
- the optical characteristic measurement method for a diffractive optical element of the present invention includes a filter process in which light emitted from a white light source is passed through a filter to be light in a specific wavelength range, and An incident step of making light in a wavelength range incident on an imaging lens composed of a diffractive optical element, an enlargement step of expanding light that has been condensed by the imaging lens and becomes spot light, and the enlarged spot light, A projecting step of projecting onto a photodetecting element having a plurality of pixels, and a distance changing step of changing a distance between the photodetecting element and the imaging lens in the optical axis direction of the spot light, The in-plane luminance distribution of the spot light in the plane perpendicular to the axis and the axial luminance distribution in the optical axis direction are measured by the optical detection element.
- an optical characteristic measuring apparatus for a diffractive optical element includes a white light source, a filter that extracts light in a specific wavelength region from the white light source, and a diffractive optical element that is an imaging lens.
- a photodetecting element comprising: a mount for mounting; an optical enlarging member for enlarging light in the specific wavelength range collected as spot light by the diffractive optical element; and a plurality of pixels for detecting a luminance distribution of the enlarged spot light And a distance changing member that changes the distance between the photodetecting element and the imaging lens in the optical axis direction of the spot light.
- the present invention it is possible to evaluate the diffraction efficiency of diffracted light that has passed through a diffractive optical element, which is an imaging lens, and collected, in an arbitrary wavelength range, and the evaluation of the diffractive optical element can be performed quickly. It can also be carried out easily.
- FIG. 1 A diagram showing a diffraction spot light measuring device
- FIG.2 Diagram showing diffraction spot measurement method for each order
- FIG.5 Diagram showing evaluation method of diffraction spot light at oblique incidence
- FIG. 11 is a diagram showing a measuring device for diffracted light from a conventional diffractive optical element.
- FIG. 1 shows a measuring apparatus for evaluating the optical characteristics of the spot light of the diffractive optical element 16 (imaging lens) in which the diffraction grooves are formed in a concentric annular zone structure.
- FIG. 7 is a flow showing a method for measuring the optical characteristics of the diffraction optical element 16.
- the optical characteristics to be measured are the amount of emitted spot light from the diffractive optical element 16, the luminance distribution in the optical axis direction, and the luminance distribution in a plane perpendicular to the optical axis.
- White light emitted from the light source (white light source) 11 passes through the wavelength band pass filter 12, and only light in an arbitrary wavelength band is transmitted. This is the white light emission step S 1 from the light source and the filter step S 2.
- the pinhole slit 13 is irradiated with the transmitted light in the specific wavelength region to stop the light (first aperture step S3), and the incident light emitted from the pinhole slit 13 is collimated by the collimator lens 14 (collimating).
- Step S4 collimated light is focused by the diaphragm 15 (second diaphragm step S5) and is incident on the diffractive optical element 16 to be examined (incident step S6).
- the diffractive optical element 16 is mounted on a mount 50 and fixed to the measuring device.
- the diffractive optical element 16 condenses incident light (condensing step S7).
- the spot light 17 is magnified by the objective lens using the microscope 18 (enlargement step S8) and projected onto the CCD 19 by the imaging lens of the microscope 18 And re-image (projection step S9).
- enlarging the spot light 17 with the microscope 18 is enlarging the image condensed by the diffractive optical element 16.
- the distance between the microscope 18 and the CCD 19 is fixed at a set value determined by the microscope 18.
- the in-plane brightness in the plane perpendicular to the light quantity and the optical axis It is possible to make detailed evaluations such as distribution and spot diameter (evaluation step SI 1).
- the distance change member 56 is used to move the microscope 18 and the CCD 19 together in the optical axis direction, and measure the spot light quantity, in-plane luminance distribution, and spot diameter at each position in the optical axis direction (distance change process S Ten). Further, in the enlargement step S8, the enlargement magnification may be changed as appropriate. Evaluation will be described later.
- the light source 11 may use infrared light or ultraviolet light depending on the purpose of use.
- the light source 11 and the wavelength bandpass filter 12 need to be appropriately adapted to that.
- the use of the wavelength bandpass filter 12 makes it possible to evaluate the light collection state of the spot light in an arbitrary wavelength range having a certain width compared to the spot light evaluation for a single wavelength. The resulting aberration of the diffractive optical element 16 can be evaluated. Further, when evaluating the spot light with respect to the white light of the diffractive optical element 16, it is not necessary to install the wavelength band pass filter 12 as long as the white light source is used as the light source 11.
- a filter that eliminates unnecessary light such as an IR cut filter
- these various filters may be placed between the light source 11 and the pinhole slit 13 or between the diffractive optical element 16 and the microscope 18 or between the microscope 18 and the CCD 19.
- the pinhole slit 13 corresponds to the subject of the diffractive optical element 16, if there is no problem with the amount of incident light, the diameter of the pinhole slit 13 can be reduced to make it more similar to a point light source. S can. Conversely, if the amount of incident light is small, it can be dealt with by increasing the diameter of the pinhole slit 13.
- the collimator lens 14 is used to virtually construct an infinite subject by collimating the incident light from the pinhole slit 13!
- the collimator lens 14 is not required, and the pinhole slit 13 may be installed at an appropriate position.
- the installation position of the diaphragm 15 of the diffractive optical element 16 is determined by the optical design of the diffractive optical element 16. The number of lenses and the number of diffractive surfaces can be arbitrarily determined, and the same evaluation is possible.
- the exit light from the diffractive optical element 16 is condensed by separating the spot light of each order on the optical axis, such as first-order light 17a and zero-order light 17b. Since the imaging lens normally uses primary light, the microscope 18 is moved and re-imaged on the CCD 19 to enlarge the spot light 17a of the primary light to be evaluated. At this time, the CCD 19 is also moved together with the microscope 18. This is to keep the magnification ratio constant.
- Positioning of the microscope 18 and the CCD 19 may be performed by finding a position where the focus is achieved to some extent while observing the image on the CCD 19 and finding a position where the brightness is maximum around that position.
- the spot light of the order other than the spot light 17a of the primary light to be evaluated for example, the spot light 17b of the 0th order light is not condensed on the CCD 19 due to the position of the microscope 18 and spreads greatly.
- the influence of the primary light spot light 17a on the brightness and light intensity measurement is small.
- the spot light 17b is also enlarged by the microscope 18, the spot light 17b expands sufficiently to protrude from the imaging area of the CCD 19, and the influence on the luminance value per pixel of the CCD 19 becomes sufficiently small.
- FIG. 3 shows an image on the CCD 19.
- the luminance of each point is measured by a plurality of pixels in the CCD 19, and the in-plane luminance distribution is measured from the measurement data.
- 33 is an image formed by the zero-order light at the position of the CCD 19. If the light intensity of the light source 11 is small and the primary light spot 17a is too weak to be detected by the CCD 19, the magnification of the refocusing spot 20a is increased by appropriately reducing the magnification of the microscope 18. Good.
- the diffraction spot light to be used has one order, and the light amount of the other order diffraction spot light needs to be minimized. Therefore, evaluation is performed with the microscope 18 at a high magnification so that the details of the spot light can be understood only when evaluating the required order of the diffraction spot light, and evaluation is performed when evaluating the other weak diffraction order light of unnecessary order. It is better to set the magnification as low as possible.
- the maximum luminance value I which has the maximum luminance among the luminances measured by all the pixels of the CCD 19, is obtained.
- X- and y-directions of the refocusing spot 20a (in the plane perpendicular to the optical axis)
- the amount of light E at the refocusing spot 20a can be found from Equation 1.
- the light quantity E is the sum of all the brightness values of all the pixels onto which the spot is projected.
- w is the radius of the re-condensing spot 20a when a set of pixels having luminance values greater than I / e 2 max is determined as a spot.
- I (r) is a luminance value measured by a pixel of the CCD 19 located at a radius r from the spot center.
- the spot light amount E when the diffraction spot light 17a has an elliptical shape is a radius in the major axis direction of the re-condensing spot 20a and a radius in the minor axis direction. If b is set as b, the following equation 2 is obtained.
- the maximum luminance value and the diameter of the re-condensing spot 20a are obtained, the light amount E of the re-condensing spot 2 Oa can be easily obtained.
- the maximum luminance value and diameter w of the refocusing spot 20a can be easily obtained from the luminance distribution data from the CCD 19 by image processing using a computer (arithmetic unit 54).
- the spot diameter w should be the average distance from the center of gravity of the spot to the edge. Furthermore, as another evaluation method for the amount of light E, the spot can be projected and the luminance values of all the pixels can be added together. At this point As described above, the luminance value of I / e may be determined as a threshold value, and the evaluation area may be a spot max.
- the diffraction efficiency of each order of diffraction spot light can be obtained by the following method.
- a specific method for obtaining the diffraction efficiency is a method in which the sum of the light amounts of the observed diffraction spot lights is used as a light amount value incident on the diffractive optical element 16, and the light amounts of the diffraction spot lights are divided by that value.
- all orders of diffraction spot light are all orders of diffraction spot light that can be detected by the CCD 19.
- the antireflection film can be added by vapor deposition or the like.
- the continuous maximum luminance distribution (axial luminance distribution) in the z direction is evaluated by measuring the luminance value at regular intervals while moving the CCD 19 in the z direction (optical axis direction). It becomes possible to do.
- the graph of the optical axis z—maximum luminance value makes it possible to easily determine the peak position of each order and the relative light intensity. Since this data makes it possible to easily and instantaneously check for the presence of unnecessary diffraction spot light, this data is particularly suitable for the evaluation of imaging diffraction grating lenses.
- the sharpness of the peak of the spot light the degree of condensing of the spot light of each diffraction order can be evaluated. The sharpness of the peak should be specified by the Q value.
- the Q value is a value represented by the following formula.
- ⁇ is a peak position in the optical axis direction
- zl is a position in the optical axis direction that is half the peak luminance value on the left side of the peak on the graph
- z2 is a peak position on the right side of the peak on the graph. It is a position in the optical axis direction that is a half value of the luminance value. Note that z2> zl.
- the wavelength band pass filter 12 is passed through another filter that passes a wavelength band different from the above. It is possible to evaluate the axial chromatic aberration amount of the spot light at the same time by performing the same evaluation with each wavelength filter instead of the filter and comparing the results. In this method, the axial chromatic aberration amount between each spot can be compared at the same time. However, during this evaluation, the maximum brightness value depends on the spot density, so the magnification of the microscope 18 needs to be constant. In addition, since the imaging positions of the diffracted spot lights are often sufficiently separated, the working distance in the z direction of the microscope 18 and the CCD 19 needs to be set so as to correspond to the total diffracted light imaging positions.
- the pixel pitch of the CCD 19 needs to be sufficiently small with respect to the spot diameter w on the CCD 19. For example, it is 1/10 or less with respect to the spot diameter w. More desirably, it is 1/50 or less. By doing so, there are more than 100 pixels in the spot light image, and it is possible to prevent the diffracted lights from interfering in the evaluation of the position z vs. maximum luminance value Imax in the optical axis direction. Power S can be.
- the condensing spots of each order in the optical axis direction are connected. Measure the image position, maximum brightness, light intensity, diffraction efficiency of each order, in-plane brightness distribution perpendicular to the optical axis of the focused spot of each order, sharpness of the focused peak, etc., and accumulate data Can be analyzed.
- the design values of each part of the lens As a result, the difference between the actual value and the actual value is found, and the lens can be easily corrected.
- FIG. 5 shows an apparatus for measuring diffracted light of the diffractive optical element 16 according to the second embodiment.
- This apparatus further includes an angle changing mechanism 51 in addition to the components shown in FIG. 1 described above, and includes an angle changing step in measurement. This makes it possible to change the angle of the incident light incident on the diffractive optical element 16 and to evaluate the oblique incidence characteristic (optical characteristic depending on the angle of view) of the diffraction efficiency with the force S.
- the angle variable mechanism is mounted on the mount 50 on which the diffractive optical element 16 and the diaphragm 15 are installed.
- the diffractive optical element 16 is attached, and diffractive optics by three micrometers etc. orthogonal to each other The angle formed by the optical axis of the element 16 and the optical axis 52 of the incident light is set.
- the angle variable mechanism 51 By tilting the diffractive optical element 16 to an arbitrary angle by the angle variable mechanism 51 while confirming a rotation angle meter or the like, it becomes possible to evaluate the diffraction efficiency with respect to oblique incidence at an arbitrary angle of view.
- the center position of the diffractive optical element 16 located on the optical axis of the element 16
- the components of the apparatus other than the diffractive optical element 16 are on the same straight line. They are arranged in parallel, and the diffraction spot lights of each order are collected on the same straight line. Therefore, the microscope 18 and the CCD 19 can be controlled by uniaxial control when evaluating the spot light of each order.
- components other than the diffractive optical element 16 may be tilted.
- the components other than the diffractive optical element 16 may be tilted as an integral configuration, or only the components on the incident light side such as the light source 11, the wavelength bandpass filter 12, and the pinhole slit 13 are tilted, and the microscope 18 and the CCD 19 are xyz. Place a micrometer etc. that can move in the direction to follow the spot light 17 '!
- the configuration of the measuring device is the configuration shown in FIG.
- a white halogen light source LA150FBU manufactured by Hayashi Watch Industry Co., Ltd.
- wavelength bandpass filters three types of RGB suitable for evaluation of imaging applications were used. The wavelength characteristics at each incident angle of 0 ° are shown below.
- Wavelength 640 700 Transmittance ⁇ 85%
- Wavelength 630 700nm Transmittance T ⁇ l% (DIF-50S-GRE manufactured by Sigma Koki Co., Ltd.)
- Wavelength 530-700nm transmittance T ⁇ l%
- an IR cut filter (CLDF-50S manufactured by Sigma Koki Co., Ltd.) was installed to remove IR light from the light source.
- a pinhole slit with a diameter of 0.2 mm was used, and parallel light was incident on the diffractive optical element using a collimator lens. Since the amount of light from the light source is weaker than that of the laser beam, a magnification of 50 times was used so that weak diffracted light could be evaluated.
- the CCD used was a 1 / 2-inch 380,000-color camera.
- the evaluation area was set to a rectangular area that could be filled with the target spot light.
- the luminance value on the CCD in a state where light is not incident from the light source in order to remove the influence on the luminance due to external light or the like is obtained, and the luminance value is obtained.
- Fig. 8 shows the results of measuring the maximum brightness distribution in the z direction of the spot light by moving the microscope and CCD in the optical axis direction (z direction).
- Fig. 8 shows the evaluation when light in the wavelength region of about 505 to 575 nm is passed through the diffractive optical element using the G filter, and the moving pitch in the z direction is 10 m.
- the origin of z is the center of the lens on the final surface, and was adjusted by focusing the microscope on the center of the lens.
- the vertical axis is the maximum luminance value of the observation light, normalized by the luminance value of the primary light.
- the force at which diffraction spot light peaks appear at three locations are the second order light, the first order light, and the zero order light from the left. From the spot diameter at each peak position, the amount of each diffracted spot light is obtained, and the diffraction efficiency of each diffracted light is obtained.
- the maximum secondary brightness value is larger than the optical simulation of the diffractive optical element as designed.
- the maximum luminance value of the 0th-order light is increased due to the transfer failure of the shape of the blaze tip in the manufacturing process. Therefore, through such evaluation, lens performance can be evaluated, leading to the development of high-quality lenses. Times in other wavelength ranges When the folding efficiency is obtained, it can be evaluated by the same method by changing the filter.
- FIG. 9 is a maximum luminance distribution diagram in each of the R, G, and B filters. This is the axial chromatic aberration, and this method can easily compare the amount of chromatic aberration between each order, allowing quick and easy evaluation of chromatic aberration. It is.
- an angle variable mechanism is attached to the apparatus of Example 1, and the same configuration as in FIG.
- the center axis 62 of the diffractive optical element 16, the main plane of the diffractive optical element 16, and the optical axis of incident light should be adjusted so that they intersect at one point ( That is, the principal point of the diffractive optical element 16 is overlapped with the optical axis of the incident light beam). This was adjusted by adding a micrometer capable of fine adjustment in the x, y, and z directions perpendicular to each other to the angle variable mechanism.
- the spot light can be imaged substantially on the optical axis of the incident light even if the diffractive optical element 16 is tilted with respect to the optical axis by the rotating shaft 63 attached to the angle variable mechanism.
- Micrometers x, y, z with minimum memory of 10 am were used.
- This adjustment is easy to adjust if the magnification of the microscope 18 is reduced. For example, 10 times. Thereby, the spot light with respect to an arbitrary angle of view can be simply evaluated. However, the larger the angle of view, the more easily the spot light position on the CCD 19 shifts greatly in the central force of the evaluation area 34, so the micrometer needs to be finely adjusted accordingly.
- the microscope 18 and the CCD 19 are moved on one axis as in the case of vertical incidence. Even in this case, a slight shift occurs, so fine adjustment in the x and y directions is appropriate. At this time, the adjustment is reduced by reducing the magnification of the microscope 18, and it is better to increase the magnification only when evaluating the spot light.
- the evaluation of a diffractive optical element for an imaging application or the like can be performed quickly and with high accuracy, and therefore, it is useful as a method for evaluating a diffractive optical element for an imaging application or the like.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Microscoopes, Condenser (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/442,674 US8089620B2 (en) | 2006-12-14 | 2007-12-13 | Method for measuring optical characteristics of diffraction optical element and apparatus for measuring optical characteristics of diffraction optical element |
JP2008549367A JP4295818B2 (ja) | 2006-12-14 | 2007-12-13 | 回折光学素子の光学特性測定方法および回折光学素子の光学特性測定装置 |
CN2007800356601A CN101553721B (zh) | 2006-12-14 | 2007-12-13 | 衍射光学元件的光学特性测定方法及衍射光学元件的光学特性测定装置 |
US13/308,080 US8390799B2 (en) | 2006-12-14 | 2011-11-30 | Method for measuring optical characteristics of diffraction optical element and apparatus for measuring optical characteristics of diffraction optical element |
US13/308,097 US8284388B2 (en) | 2006-12-14 | 2011-11-30 | Method for measuring optical characteristics of diffraction optical element and apparatus for measuring optical characteristics of diffraction optical element |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006336820 | 2006-12-14 | ||
JP2006-336820 | 2006-12-14 |
Related Child Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/442,674 A-371-Of-International US8089620B2 (en) | 2006-12-14 | 2007-12-13 | Method for measuring optical characteristics of diffraction optical element and apparatus for measuring optical characteristics of diffraction optical element |
US13/308,097 Division US8284388B2 (en) | 2006-12-14 | 2011-11-30 | Method for measuring optical characteristics of diffraction optical element and apparatus for measuring optical characteristics of diffraction optical element |
US13/308,080 Division US8390799B2 (en) | 2006-12-14 | 2011-11-30 | Method for measuring optical characteristics of diffraction optical element and apparatus for measuring optical characteristics of diffraction optical element |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008072709A1 true WO2008072709A1 (ja) | 2008-06-19 |
Family
ID=39511725
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/074058 WO2008072709A1 (ja) | 2006-12-14 | 2007-12-13 | 回折光学素子の光学特性測定方法および回折光学素子の光学特性測定装置 |
Country Status (4)
Country | Link |
---|---|
US (3) | US8089620B2 (ja) |
JP (1) | JP4295818B2 (ja) |
CN (1) | CN101553721B (ja) |
WO (1) | WO2008072709A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009031605A1 (ja) * | 2007-09-07 | 2009-03-12 | Nikon Corporation | ワーク欠陥検査装置およびそれを用いた光学部材の製造方法 |
WO2009066599A1 (ja) * | 2007-11-21 | 2009-05-28 | Tokyo Institute Of Technology | 収差測定方法及びその装置 |
JP2010014538A (ja) * | 2008-07-03 | 2010-01-21 | Nikon Corp | 回折性能測定装置 |
WO2010032409A1 (ja) * | 2008-09-17 | 2010-03-25 | パナソニック株式会社 | 画像処理装置、撮像装置、評価装置、画像処理方法及び光学系評価方法 |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201115183A (en) * | 2009-10-20 | 2011-05-01 | Ind Tech Res Inst | Stereovision system and calculation method for the distance between object and diffractive optical element |
JP5790178B2 (ja) * | 2011-03-14 | 2015-10-07 | オムロン株式会社 | 共焦点計測装置 |
CN102886601A (zh) * | 2011-07-21 | 2013-01-23 | 深圳市通发激光设备有限公司 | 设有动态光栏装置的激光焊接机 |
JP2013219452A (ja) * | 2012-04-05 | 2013-10-24 | Sony Corp | 色信号処理回路、色信号処理方法、色再現評価方法、撮像装置、電子機器、及び、試験装置 |
DE102012010960A1 (de) * | 2012-05-30 | 2013-12-05 | Fresnel Optics Gmbh | Anordnung zur optischen Charakterisierung vonFresnellinsen |
CN102735428B (zh) * | 2012-06-08 | 2014-10-01 | 中国科学院上海光学精密机械研究所 | 衍射光学元件光学性能的测量装置及测量方法 |
CN102759442B (zh) * | 2012-07-10 | 2015-01-07 | 中国科学院西安光学精密机械研究所 | 衍射光学元件位置色差定光轴方法 |
CN104568391B (zh) * | 2015-01-21 | 2017-09-26 | 中国科学院上海技术物理研究所 | 双光路切换互参考高精度aotf性能测试方法及装置 |
CN105890529B (zh) * | 2015-01-26 | 2018-08-17 | 北京师范大学 | 测量细丝直径的方法 |
CN105928688B (zh) * | 2016-04-19 | 2018-06-19 | 中国科学院上海光学精密机械研究所 | 基于单次曝光模式的光栅衍射效率光谱的测量装置和方法 |
CN105812638B (zh) * | 2016-05-13 | 2019-09-24 | 昆山丘钛微电子科技有限公司 | 摄像头模组pdaf多工位测试烧录一体化机台 |
DE112017003559T5 (de) * | 2016-07-14 | 2019-05-09 | Mitsubishi Electric Corporation | Laserbearbeitungsvorrichtung |
CN110068447B (zh) * | 2018-01-23 | 2021-07-27 | 舜宇光学(浙江)研究院有限公司 | 一体集成式衍射光学元件测试设备 |
CN108333859B (zh) * | 2018-02-08 | 2024-03-12 | 宁波舜宇光电信息有限公司 | 结构光投射装置、深度相机以基于深度相机的深度图像成像方法 |
WO2019216213A1 (ja) * | 2018-05-11 | 2019-11-14 | ソニー株式会社 | 分光計測装置、および分光計測方法 |
CN109342028A (zh) * | 2018-10-17 | 2019-02-15 | 深圳奥比中光科技有限公司 | 衍射光学元件检测方法与系统 |
CN109632269B (zh) * | 2018-12-27 | 2020-09-15 | 浙江舜宇光学有限公司 | 基于图像灰度信息检测光学衍射元件性能的方法 |
CN111060292B (zh) * | 2019-12-30 | 2021-05-14 | 中国科学院长春光学精密机械与物理研究所 | 一种衍射元件衍射效率的测量装置及测量方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5760243A (en) * | 1980-09-30 | 1982-04-12 | Ricoh Co Ltd | Measuring apparatus for fresnel lens |
JPH0448231A (ja) * | 1990-06-15 | 1992-02-18 | Okuma Mach Works Ltd | 平行光計測装置 |
JPH09196813A (ja) * | 1996-01-17 | 1997-07-31 | Matsushita Electric Ind Co Ltd | 回折効率測定方法及び回折効率測定装置 |
JP2000009587A (ja) * | 1998-06-23 | 2000-01-14 | Seiko Epson Corp | レンズアレイの検査方法および液晶表示装置の製造方法 |
JP2001004491A (ja) * | 1999-06-25 | 2001-01-12 | Sankyo Seiki Mfg Co Ltd | 光ビームの検査装置 |
JP2002277349A (ja) * | 2001-03-21 | 2002-09-25 | Ricoh Co Ltd | コリメータ評価方法およびコリメータ評価装置 |
JP2003114166A (ja) * | 2001-10-04 | 2003-04-18 | Olympus Optical Co Ltd | 複合レンズの芯ずれ検知方法及び芯ずれ検知装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5170221A (en) | 1990-06-15 | 1992-12-08 | Okuma Corp. | Parallel light ray measuring apparatus |
JP3735034B2 (ja) | 2000-12-12 | 2006-01-11 | シャープ株式会社 | ホログラム検査装置およびホログラム検査方法 |
JP4266082B2 (ja) | 2001-04-26 | 2009-05-20 | 株式会社東芝 | 露光用マスクパターンの検査方法 |
JP3912366B2 (ja) * | 2003-11-21 | 2007-05-09 | コニカミノルタセンシング株式会社 | 測光装置およびその非線形性補正方法 |
-
2007
- 2007-12-13 JP JP2008549367A patent/JP4295818B2/ja not_active Expired - Fee Related
- 2007-12-13 US US12/442,674 patent/US8089620B2/en not_active Expired - Fee Related
- 2007-12-13 CN CN2007800356601A patent/CN101553721B/zh not_active Expired - Fee Related
- 2007-12-13 WO PCT/JP2007/074058 patent/WO2008072709A1/ja active Search and Examination
-
2011
- 2011-11-30 US US13/308,080 patent/US8390799B2/en active Active
- 2011-11-30 US US13/308,097 patent/US8284388B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5760243A (en) * | 1980-09-30 | 1982-04-12 | Ricoh Co Ltd | Measuring apparatus for fresnel lens |
JPH0448231A (ja) * | 1990-06-15 | 1992-02-18 | Okuma Mach Works Ltd | 平行光計測装置 |
JPH09196813A (ja) * | 1996-01-17 | 1997-07-31 | Matsushita Electric Ind Co Ltd | 回折効率測定方法及び回折効率測定装置 |
JP2000009587A (ja) * | 1998-06-23 | 2000-01-14 | Seiko Epson Corp | レンズアレイの検査方法および液晶表示装置の製造方法 |
JP2001004491A (ja) * | 1999-06-25 | 2001-01-12 | Sankyo Seiki Mfg Co Ltd | 光ビームの検査装置 |
JP2002277349A (ja) * | 2001-03-21 | 2002-09-25 | Ricoh Co Ltd | コリメータ評価方法およびコリメータ評価装置 |
JP2003114166A (ja) * | 2001-10-04 | 2003-04-18 | Olympus Optical Co Ltd | 複合レンズの芯ずれ検知方法及び芯ずれ検知装置 |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009031605A1 (ja) * | 2007-09-07 | 2009-03-12 | Nikon Corporation | ワーク欠陥検査装置およびそれを用いた光学部材の製造方法 |
JPWO2009031605A1 (ja) * | 2007-09-07 | 2010-12-16 | 株式会社ニコン | ワーク欠陥検査装置およびそれを用いた光学部材の製造方法 |
JP5359876B2 (ja) * | 2007-09-07 | 2013-12-04 | 株式会社ニコン | ワーク欠陥検査装置およびそれを用いた光学部材の製造方法 |
WO2009066599A1 (ja) * | 2007-11-21 | 2009-05-28 | Tokyo Institute Of Technology | 収差測定方法及びその装置 |
JP2010014538A (ja) * | 2008-07-03 | 2010-01-21 | Nikon Corp | 回折性能測定装置 |
WO2010032409A1 (ja) * | 2008-09-17 | 2010-03-25 | パナソニック株式会社 | 画像処理装置、撮像装置、評価装置、画像処理方法及び光学系評価方法 |
JP4531853B2 (ja) * | 2008-09-17 | 2010-08-25 | パナソニック株式会社 | 画像処理装置、撮像装置、及び評価装置 |
JPWO2010032409A1 (ja) * | 2008-09-17 | 2012-02-02 | パナソニック株式会社 | 画像処理装置、撮像装置、及び評価装置 |
US8346010B2 (en) | 2008-09-17 | 2013-01-01 | Panasonic Corporation | Image processing device, imaging device, evaluation device, image processing method, and optical system evaluation method |
Also Published As
Publication number | Publication date |
---|---|
US8284388B2 (en) | 2012-10-09 |
US8089620B2 (en) | 2012-01-03 |
CN101553721B (zh) | 2011-06-15 |
CN101553721A (zh) | 2009-10-07 |
US20100085559A1 (en) | 2010-04-08 |
US20120069327A1 (en) | 2012-03-22 |
JP4295818B2 (ja) | 2009-07-15 |
US8390799B2 (en) | 2013-03-05 |
JPWO2008072709A1 (ja) | 2010-04-02 |
US20120140209A1 (en) | 2012-06-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2008072709A1 (ja) | 回折光学素子の光学特性測定方法および回折光学素子の光学特性測定装置 | |
JP3762746B2 (ja) | 共焦点顕微鏡及びこれを用いた高さ測定方法 | |
US7488924B2 (en) | Method for determining the focal position during imaging of a sample using an inclined position receiving device | |
US7528954B2 (en) | Method of adjusting optical imaging system, positional deviation detecting mark, method of detecting positional deviation, method of detecting position, position detecting device and mark identifying device | |
US9471984B2 (en) | Method for self-calibration of a microscope apparatus | |
WO2005116577A1 (ja) | 結像光学系の調整方法、結像装置、位置ずれ検出装置、マ-ク識別装置及びエッジ位置検出装置 | |
JP5816297B2 (ja) | マスク上の構造を特徴付ける方法及び方法を実施するためのデバイス | |
US20040227944A1 (en) | Mark position detection apparatus | |
US9268124B2 (en) | Microscope and method for characterizing structures on an object | |
WO2011052172A1 (ja) | 撮像装置およびそれを用いた測距装置 | |
JP2008215833A (ja) | 光学特性測定装置および光学特性測定方法 | |
JP2010216864A (ja) | 測光装置 | |
KR101826127B1 (ko) | 광학적 웨이퍼 검사 장치 | |
US20120250159A1 (en) | Method and apparatus for forming multiple images | |
JPWO2020100344A1 (ja) | 測定装置及び測定装置を用いた投光システム | |
JP2010014538A (ja) | 回折性能測定装置 | |
JP2001166202A (ja) | 焦点検出方法及び焦点検出装置 | |
NL2028376B1 (en) | Method of and arrangement for verifying an alignment of an infinity-corrected objective. | |
JP4639808B2 (ja) | 測定装置及びその調整方法 | |
JP7404005B2 (ja) | 偏心測定装置及び偏心測定方法 | |
JP2010139419A (ja) | 形状測定装置 | |
WO2020125793A1 (zh) | 投影物镜波像差检测装置及方法、光刻机 | |
JP2008077741A (ja) | 回折格子の測定装置及び回折格子の測定方法 | |
JP2007324338A (ja) | マーク位置検出装置及び調整方法 | |
Barnes et al. | Illumination optimization for optical semiconductor metrology |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 200780035660.1 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 07850574 Country of ref document: EP Kind code of ref document: A1 |
|
DPE1 | Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101) | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2008549367 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 12442674 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 07850574 Country of ref document: EP Kind code of ref document: A1 |
|
DPE1 | Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101) |