WO2006090593A1 - 走査型プローブ顕微鏡用変位検出機構およびこれを用いた走査型プローブ顕微鏡 - Google Patents
走査型プローブ顕微鏡用変位検出機構およびこれを用いた走査型プローブ顕微鏡 Download PDFInfo
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- WO2006090593A1 WO2006090593A1 PCT/JP2006/302315 JP2006302315W WO2006090593A1 WO 2006090593 A1 WO2006090593 A1 WO 2006090593A1 JP 2006302315 W JP2006302315 W JP 2006302315W WO 2006090593 A1 WO2006090593 A1 WO 2006090593A1
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- light
- cantilever
- axis
- displacement detection
- detection mechanism
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- 239000000523 sample Substances 0.000 title claims abstract description 206
- 230000007246 mechanism Effects 0.000 title claims abstract description 113
- 238000006073 displacement reaction Methods 0.000 title claims abstract description 75
- 238000001514 detection method Methods 0.000 title claims abstract description 62
- 238000005286 illumination Methods 0.000 claims abstract description 31
- 230000003287 optical effect Effects 0.000 claims description 56
- -1 cantilever Substances 0.000 claims description 7
- 230000001427 coherent effect Effects 0.000 claims description 7
- 238000005259 measurement Methods 0.000 abstract description 37
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 239000011521 glass Substances 0.000 description 31
- 239000000758 substrate Substances 0.000 description 12
- 239000007788 liquid Substances 0.000 description 9
- 238000010586 diagram Methods 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 5
- 239000002609 medium Substances 0.000 description 5
- 201000009310 astigmatism Diseases 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000002250 progressing effect Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- QNRATNLHPGXHMA-XZHTYLCXSA-N (r)-(6-ethoxyquinolin-4-yl)-[(2s,4s,5r)-5-ethyl-1-azabicyclo[2.2.2]octan-2-yl]methanol;hydrochloride Chemical compound Cl.C([C@H]([C@H](C1)CC)C2)CN1[C@@H]2[C@H](O)C1=CC=NC2=CC=C(OCC)C=C21 QNRATNLHPGXHMA-XZHTYLCXSA-N 0.000 description 1
- 241000282693 Cercopithecidae Species 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000012620 biological material Substances 0.000 description 1
- 239000012472 biological sample Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004629 contact atomic force microscopy Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000001963 growth medium Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q20/00—Monitoring the movement or position of the probe
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
- G01Q10/04—Fine scanning or positioning
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/18—Means for protecting or isolating the interior of a sample chamber from external environmental conditions or influences, e.g. vibrations or electromagnetic fields
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
- G01Q70/02—Probe holders
Definitions
- the materials for metals, semiconductors, ceramics, fats, polymers, biomaterials, and insulation materials are specified in the region, and the scanning probe microscope is used as an indicator of the property information material of the sample.
- SP cann ng P obe M o scope is known.
- the efficiency can be determined by performing the initial observation and specifying the location before the determination of the sample. Therefore, by arranging the objective illumination on or under the sample or the cantilever, the sample can be obtained, and by this, for example, scratches on the surface of the material can be observed and a specific place can be specified.
- the objective illumination is placed above or below the sample or cantilever in order to improve the measurement rate, the space for installing the above and the receiver will be small, and the light from the above part will be The reflection cannot be applied vertically. There Therefore, it is possible to irradiate the light from a part obliquely with reflection.
- the cantilever position is fixed to the holding part after the cantilever and extends toward the cantilever on the upper surface, and extends in the direction opposite to the cantilever direction. It is characterized in that, in the area delimited by X and from the area of the cantilever, the object is radiated to the X axis with respect to the X axis.
- the light from the part of the cant region in the region demarcated by X and the part from the part is reflected to the X axis. To this you can use the released space above the canch It is possible to easily reach the light without blocking the light from the area.
- the light that has entered the reflection may be reflected in the opposite regions across the axis with respect to the X and axis.
- the reflected light from the reflecting surface is not blocked and the reflected light is received.
- the traveling direction changing means for changing the traveling direction of the light emitted from the part on a plane parallel to the X plane including X, the irradiation from the part
- the traveling direction of the emitted light may be changed by the traveling direction changing means.
- a plurality of the row direction changing means are provided on the light emitted from the part, and the plurality of row direction changing means and the above
- the light is partially arranged in a ring shape on the upper surface, and the light from the part reaches the reflection while changing its row direction by a plurality of row direction changing means, Let the light reach the receiver.
- the traveling direction changing means, the light, and the light are arranged in a substantially annular shape, and therefore, in the cantilever area, they travel in an annular manner as the upper surface. Therefore, even if an objective lens or the like is placed on the cantilever side, it will proceed without being affected by the objective lens or the like.
- the bright microscope mechanism is characterized in that the objectives are arranged in a position where any one of the above-mentioned microscope, the cantilever, and the sample can be observed.
- the objective lens at the position of the probe, the cantilever, or the sample without the objective mechanism being disturbed by the microscope mechanism, and it is possible to provide the objective lens.
- the bright microscope it is a feature that any one of the probe, the cantilever, and the sample is irradiated with light from an arbitrary direction.
- the cantilever or the sample may be slightly moved by the skier.
- the probe can be accurately and reliably scanned on the sample.
- the skier may be provided so as to be oriented in the direction of extension of the z-axis, which is perpendicular to the X-axis, and the illumination may be passed through this passage.
- an objective lens is provided at a position where the displacement of the probe, the cantilever, or the sample can be observed through the above, or the cantilever or below the cantilever along the z-axis.
- the objective can be further provided to the slide, the cantilever, or the sample deviation without the objective being disturbed by the skier, and the objective can be provided.
- the skier is provided with an X skier that moves the cantilever along the X and axis, so that the cantilever can be finely moved along the X and axis.
- the skier is provided with a Z skier that moves the cantilever along the Z axis that is perpendicular to the X and axis, and ensures that the cantilever is along the Z axis. Even if you can move a little.
- the skier is provided with an XZ skier that moves the cant along the X and these Z and the Z that is fixed to the axis. Even if it is possible to make fine movements along the Z axis.
- a condenser lens is provided on the above-mentioned point which is reflected from the surface and reaches the above-mentioned point, so that the light reflected from the reflection surface passes through the condenser lens.
- the size of the spot that reaches is set to an appropriate size so that it can be set within, and even if the reflected light is deviated due to the quality of the light traveling or the type of cantilever, Can be collected.
- the scanning microscope structure can be made thin, it is possible to use a lens illumination lens, and an optical microscope image with high resolution can be obtained. This makes it possible to combine the scanning microscope and the optical microscope, and by using this microscope, the subject can be more frequently measured, and the scanning microscope image can be measured once more.
- FIG. 10A is a diagram showing a microscope according to Mitsui, (a) is a plan view of the scanning microscope, and (b) is a region thereof in (a).
- FIG. 3 is an enlarged plan view of the stage 2 moving mechanism.
- FIG. 33 is a plan view showing a stage moving mechanism of 32.
- FIG. 4 is an enlarged plan view of the 4th driving mechanism.
- FIG. 5 is a plan view showing a state in which displacement is provided in the push mechanism of 54.
- Figure 8 is a simplified view of a simplified version of 8 5 and developed on a straight line.
- 9 is a diagram in which light rays from the 9th cantilever are projected onto the XZ plane. 10 a) A plan view.
- FIG. 3 is a front view showing the second of the microscope according to the first embodiment.
- the cantilever is oscillated near the resonance frequency and close to the sample, and according to the amount of the phase, a test (D namcFoce Mode) is performed to keep the separation of the sample constant. .
- This 004 microscope is combined with an inverted microscope, and as shown in () and (b), it is provided on the main body 3 installed at 2 and as shown in () and (b). 4 and the microscope 8 provided for the measurement 4 and the illumination 5 provided for the measurement 4.
- Microscope 8 is set to 2 via X stage 3. Further, 9 is provided at the end of the inverted microscope 8, and 9 are provided with a plurality of lenses each having a different rate. Then, by turning 9, the positions of the plurality of lenses can be changed, and the plurality of lenses can be selectively arranged for observation. Is for the sample S and for observing S.
- the body portion 3 is configured by including a flat plate-shaped 3 supported by 2 extending vertically from 2.
- a mouth 5 is formed in 3 and a step 6 for holding the sample S is provided in the mouth 5.
- a stage mouth 7 is formed.
- the 005 stage 6 can move along the direction by the stage moving mechanism 27.
- Z is an axis that passes through the reflection 4 described later and extends perpendicularly to the sample 6 and the step 6 and an axis that is described later as the X and the axis straightened to the axis.
- the Z direction is the direction in which the Z axis extends and the direction of the scanning microscope.
- the stage moving mechanism 27 has a rectangular shape as shown in 2 and 3.
- the body portion 86 and the body portion 86 are provided 87 in a direction (that is, X) intersecting with (that is,) of the mechanism body portion 86.
- the above-mentioned step 6 is provided in 005487.
- the body portion 86 is provided with a body 9 extending in a direction opposite to the direction of 87. 9 is fixed to the fixed position of 3 shown in, by which the mechanism 86 is cantilevered.
- a cavity 93 is provided in the mechanism 86. At the end of the 93 inner wall 94 in the X direction, at the end of the force with the body 9
- the lower part 2 is provided at the end of the force where 87 is provided.
- 87 is provided at the end of the force provided with 3 and 3 at the end of the force provided with the main body 9 at the end of 4 are provided.
- the lower part 2 has a lower part 95 that extends downward from the upper inner wall 94
- the lower part 4 has an upper part 96 that extends upward from the lower inner wall 97. That is, the lower part 95 and the upper part 96 are arranged opposite to each other, extending in opposite directions.
- a moving portion 85 is provided between the lower portion 95 and the upper portion 96.
- the Z moving unit 85 is physically separated from the moving unit 5 and the X moving unit 52, which will be described later, and provided separately, and functions independently.
- the Z moving portion 85 is composed of the Z piezoelectric element 9 oriented in the X direction.
- the Z piezoelectric element 9 has its end fixed to the lower part 95 and is fixed to the upper part 96.
- Reference numeral 8 indicates an electrostatic sensor. By detecting the amount of movement of the mechanism 86 by this sensor 8, the position of the amount of movement of the stage 6 in the Z direction can be detected or detected. Depending on the position, the stage 6 can be moved into shape with respect to the voltage applied to the Z piezoelectric element 9.
- the above-mentioned 4 is installed on the surface of the stage 6.
- 4 includes a push mechanism (X scanner) 26, and the push mechanism 26 is provided with a crank-shaped crank 3. Then, by the crank 3, the push mechanism 26 is installed so that its center coincides with the step opening 7.
- the driving mechanism 26 is provided with the lawless mu 48 and mu 49, and these mu 48 and mu 49 are formed in a rat shape by expanded iron.
- the mu 48 and mu 49 are concentrically connected to each other through the moving part 5 and the X moving part 52, and are arranged as mu 48 and mu 49.
- the moving part 5 is installed in 57 along the X axis formed in the frame 48, and the X moving part 52 is also installed in X6 along the axis.
- the 006 moving part comprises a piezoelectric element 54 oriented in the X direction.
- the piezoelectric element 54 has a diamond-shaped upper surface so as to cover the surrounding area.
- a large 55 is provided.
- the large 55 is then connected to the 49 via 56.
- the X moving part 52 also includes an X piezoelectric element 6 oriented in the direction.
- a diamond-shaped X large 62 is provided around the X piezoelectric element 6, and the X large 62 is connected to the hole 49 via X 63.
- a parallel line 67 is installed at the corner of the M49.
- a shape 68 is provided, and 68 is provided parallel to the X plane including X and.
- a cantilever 2 supported by a holder 22 is provided.
- the direction is the direction in which the axis extends and the direction of the scanning microscope's row.
- X is assumed to pass through the reflection 4 and extend in the direction orthogonal to the above plane.
- the X direction is the direction in which the X axis extends and the direction of the scanning microscope.
- the 4 regions demarcated by these Xs will be referred to as C regions in the counterclockwise direction from the upper right region to 4 in the upper surface. That is, with the X and axis as coordinates, the limit is the range, the second limit is the range, the third limit is the range C, and the fourth limit is the range.
- the cantilever 2 has a region, and the tip has a region C.
- reference numeral 78 8 indicates an electrostatic sensor
- reference numeral 7 78 indicates a target
- these sensors 78 8 detect the movement of Mu 49 and the movement in the X direction. Then, the difference in the amount of movement of the cantilever 2 in the X direction is calculated, and with respect to the voltage applied to the piezoelectric element 54 and the X piezoelectric element 6, the movement 49 can be moved in a shape.
- a glass holder 23 made of glass is provided as shown in 6. This glass holder 23 forms a film due to the viscosity of the liquid between the glass holder 23 and the sample glass holder 23. It is for doing.
- the cantilever 22 has a columnar section that extends along the axis. 9 is provided, and at the end of the supporting portion 9, there is provided a hanging portion 8 that hangs downward from this end. A wire is provided at the end of the lower part 8.
- the 0070 cantilever 2 is provided toward the stage mouth portion 7. Cant
- a sharpened tip 2 is provided, and on the upper surface, a reflection 4 for reflecting light is provided. Further, after the cantilever 2 (2a is bonded to the glass holder 23 via 28, and is secured to the support 24 by the wire provided in the lower portion 8 described above. 2 is cantilevered so that the tip provided with probe 2 is free.
- a mechanism 33 for moving the cantilever 2 in the direction of 37 is provided, and 34 of the mechanism 33 is fixed to 3 of the main body section 3.
- An X stage 35 is provided on the surface of the Z mechanism 33, and the crank 3 is fixed to the surface of the X stage 35.
- the 5 is equipped with 4 which emits illumination and a condenser 4 which collects these 4 components.
- the lens unit 4 is arranged above the moving mechanism 26 by a holding unit 42 connected to the inverted microscope 8 and is supported by the moving mechanism 26 so as to be vertically movable.
- the drive mechanism 26 in the present embodiment is configured such that the displacement 2 for detecting the position of the cantilever 2 is provided on the surface of 68 as shown in 5.
- 2 has the length of ambient light as a hint, and the sun and suns diode (below, S
- S (, low hint) 4 of 68 After that, it is installed in the area. Then, when S 4 is driven, the hint light traveling along the X-axis is emitted toward the pair of regions that sandwich the axis, that is, the C region.
- An optical system 5 is installed on the original light from S 4 and from S 4. School 5 has a condensing lens 7 located opposite S 4. In addition, aberrations 8 and lid 9 are arranged in the direction from the lens 7 to the region C.
- the lenses 789 that make up graduate school 5 form an image of the light from S 4 on the can 4 of can 2.
- the 007nd and 9th are provided on the and to correct the spread of the spot of reflection 4.
- the (line direction changing means) 22 is provided in the area C after the above.
- 22 of S 4 is arranged along the X-ray with S 4 and science system 5, so that the light from S 4 passes through the optical system 5 and reaches 22 of.
- 22 of the above reflects the light that reaches it, changes its row direction, and advances the reflected light along the axis.
- 2 (row direction changing means) 23 shown in 5 and 7 are provided, and between these 22 2 and 23, a flat glass (positive ) 26 are provided. That is, 22 of, glass of compensation 26 and 23 of 2 are aligned along the axis.
- the glass 26 is detachably supported from above by the glass holder 27, and when the correction glass 26 is attached to a predetermined position, the light from 22 passes through the correction glass 26. Then, when the glass 26 is attached and when the glass 26 is removed, the change due to the fact that the correction glass 26 does not fold.
- the length is different when the constant is performed and when the atmospheric is determined. Because the light of reflection 4 is broken by passing the nutrient solution. is there.
- the correction glass 26 is set so that the length becomes suitable for constant temperature, and when the correction glass 26 is removed, the length becomes suitable for constant atmospheric temperature.
- the light condensing the light such as a lens 28 and a detector divided into four parts (). 2 are provided.
- the reflection 4 has 2
- the 23 rays are emitted from the C area toward the X and the axis, and further toward the area toward the X and the axis.
- displacement 2 moves iterator 2 in the Z direction.
- Z stage 3 S 4 and academic system 5
- Z stage 32 which moves in the Z direction.
- Z stage 3 is
- Z stage 32 makes it possible to adjust the positions of S 4 and School 5 in the Z direction.
- a directional step 9 is formed at 87 in this embodiment.
- the objective lens can be moved up and down by operating the wing diamond 8a provided on the microscope 8 as shown in (4), and S can be observed by the objective lens via the stage 9. I can do it.
- the sample is set to step 6 via the cell. Then, turn on 4 and irradiate on sample S. Then,
- the glass holder 23 of the cantilever 22 and the sample are passed in order, and further through the stage opening 7 to reach the objective arranged for observation.
- the state of the sample S is observed through the objective.
- turning 9 displaces the first lens from the observation and places the other lens in the observation. This will select the appropriate rate of index.
- the horn diamond 8a is operated, the objective lens moves upward, the objective lens comes close to the sample S, and is tuned.
- the X stage 3 moves and positions the inverted microscope 8.
- 8 is the quality of the enclosure of 22, 22, 23, glass hodder 23, and cantilever 2, and is expanded on a straight line. Therefore, it should be reflected in the actual situation.
- the light passes through the correction glass 26, it reaches 23 of 2 and is reflected there.
- this emitted light is focused on the X and Z axes by a predetermined degree and forms an image on the reflection 4 from the C region.
- the spot size of S in reflection 4 is about diameter. After that, it reflects and then spreads out again and progresses toward the area. That is, it travels toward the area after being separated by a predetermined number of times with respect to the X and Z axes.
- the condenser lens 28 By passing the condenser lens 28, the four images toward the detector 2.
- the irradiation from S 4 progresses in a ring shape over the upper surface of C region and region.
- the position of 4 changes.
- light is refracted by the medium (body or air) between the glass holder 23 sump S, the reflection 4 changes, and the imaging position shifts in the X plane.
- the position of the optical axis also changes.
- the imaging device can be moved in the X plane, and the spot of the reflection 4 S 4 can be imaged.
- the compensation glass 26 can be used to change the orientation, and it is also possible to correct the orientation in different directions.
- FIG. 9 shows a diagram in which the 4 rays of cantilever 2 are projected on the x Z plane.
- the human incident light illuminates the human eye in the light state, so that no light enters the objective lens and it is difficult to observe the spot. Therefore, in the case of light, as a matter of fact, by means of mechanism 33, a gap is provided between the cantilever 2 sample S, scattering 4 is inserted between them, and the cantilever 2 of the light scattered on scattering 4 is observed with the objective. Then, after locating the spot at the reflection 4, the scatter 4 was pulled out and the Z 2 was brought closer to the S by the Z mechanism 33. In the case of waving by 4, the nutrient solution was put between the scattering glass holders 23 to prevent the slippage.
- 011 S4 is outside light having a wavelength of 830 nm. There is a point at which the light is excited by the use of outside light, such as when the iosump is on time.
- the CC camera (not shown) has a sensitivity to the infrared light by taking into consideration the safety, so it is possible to observe even in the visible light.
- the scattering 4 may be arranged between the surfaces of the objective sample S. Alternatively, the spot may be observed with a reflecting microscope placed on the sample S.
- the angle of incidence of the light emitted from the reflection 4 differs depending on the above-mentioned angle, and also changes depending on the quality. Therefore, the reflected light is uncertain. Also, the light spreads again after being focused on the reflection 4.
- the condenser 28 by arranging the condenser 28 at a position where the light from the reflection 4 to the surface of the photodetector 2 is cut, the light is imaged toward the photodetector 2 and an appropriate spot size is set so that the light falls within the surface of the photodetector 2.
- the condensing lens 28 allows the light beam to be focused to a particular area. With this configuration, the photodetector 2 Z stage 3 can be downsized, and the photodetector 2 can be easily operated.
- Pr 2 raster scans the sample S at a predetermined time.
- the electrostatic sensor 788 detects the amount of movement in the X-direction, and the difference between the X-direction and the X-direction is corrected. In this way, by correcting the amount of movement in the X, direction, the piezoelectric element 54 and the X piezoelectric element 6 are not affected by the hysteresis and operate in the X, direction shape.
- the atomic force will cause the surface of the sample S to be attracted.
- the state of 2 changes and the phase changes.
- an iterator divided by 4 is used as iterator 2
- it is input to the ,,, and Z dock paths of this phase.
- a voltage is applied to the Z piezoelectric element 9 shown in 2 so that the phases are the same due to the Z dock and f.
- the piezoelectric element 9 repeats expansion and contraction at high speed when a voltage is applied.
- the Z piezoelectric element 9 expands and contracts, the stage 6 moves in the direction at a very high frequency via 87, and the sample S on the stage 6 moves in the Z direction. Thereby, the distance between the surface of the pre-sample S and the above-mentioned investigation is always kept constant.
- the electrostatic sensor 8 detects the amount of movement of the mechanism body 86, and the difference in the amount of movement of the stage 6 in the Z direction is generated according to the result. The difference in direction is corrected. This allows Stage 6 to move in the Z direction. [0111] It is also possible to detect the amount of fine movement by the electrostatic sensor 8 and display it as a report of the scanning microscope. In this case, higher speed scanning becomes possible. [0112] In this manner, the voltage applied to the X, Z piezoelectric elements 54 69 is input to the image, and the image of the surface of the sample S can be measured by imaging. In addition, by measuring various forces and physical forces acting with the sample S, the sex, the cloth of the sample S, the cloth of the surface of the sample S, and the sex information of the species of the proximity are determined.
- the reflection 4 from the C region is reflected toward the region by being reflected with respect to the X and Z axes, so that the line of the irradiation is not blocked and the detector 2 is easily reached.
- the device can be thinned, and the condenser 4 can be arranged in the middle of the structure.
- the space above 68 can be used more effectively.
- the correction glass 26 is detachably provided, the correction glass 26 can be attached and detached. By doing so, it is possible to easily correct the light required for the constant and the light required for the atmospheric constant. As a result, it is not necessary to provide a moving mechanism in the direction of the optical axis or to replace the cantilever 22 depending on the quality, and the device can be downsized and the order can be improved.
- the push mechanism 26 can reliably move the probe 2 in the X-direction, and the probe 2 can be accurately and reliably scanned on the sample S. 0120 Further, the push mechanism 26 is provided with a push 7,
- the displacement 2 can be configured as, a fine lens can be used, and the image of the inverted microscope 8 becomes clear with high resolution.
- the objective lens can be further attached to the sample S, and the lens can be provided to perform accurate measurement.
- the spot reaching the detector 2 can be made to have an appropriate size so as to be within the plane of the detector 2 and can be collected in the area.
- 0126 is the same as the element described in And attach a check mark.
- the microscope in this embodiment is a combination of the microscopes 8, the microscope 8 is provided with 4, and the main body 3 is provided with the lens 4 at 4 thereof.
- the stage 4 is equipped with a stage moving mechanism 27.
- the stage moving mechanism 27 is composed of a piezoelectric element 9, and the Z piezoelectric element 9 is installed in the Z direction.
- the Z piezoelectric element 9 is formed with () oriented in the Z direction, through which 4 and others are passed.
- an objective is provided for observation on the side of the moving mechanism 26.
- the push mechanism 26 observes push 2 or cantilever 2. It is designed so that it can move up and down during observation, and if it moves down, it will enter P7.
- the stage moving mechanism 27 is provided with, and since the illumination is passed through this, it is possible to determine the frequency without illuminating.
- the spot of S is located at the cantilever, it becomes possible by arranging the scattering between the cantisumps as in the first case and observing with a microscope. In this case, it is desirable to construct scattering on top of reflectivity such as semiconductors.
- the objective lens can be further provided in the cantilever 2 S, and the lens can be provided for frequent measurement.
- the push mechanism 26 for slightly moving the cantilever 2 in the X direction is provided as the X skier, but the present invention is not limited to this. You can also make a slight movement in the Z direction. In this case, the stage 6 as the X skier moves the stage 6 in the X direction.
- the push mechanism 26 and the stage move mechanism 27 are provided, the present invention is not limited to this, and it is also possible to provide three actuators as the XZ skier. At this time, the three actuators may be arranged on the side of the pump and the side of the sump. [0135] In the above, the scanning microscope and the cantilever are used.
- the sample is configured as a movable skier, but it may be configured independently of the skier, or if it is not provided with all or part of the XZ skier.
- the cantilever 2 is not limited to the cantilever but may be a cantilever having a triangular shape on the upper surface or a top end of a close-up microscope having a sharp cross-section with a sharp end.
- microscope that uses as a microscope and the mirror that reflects light, are also included.
- the objective lens can be placed at a position where the end of the microscope can be observed at any time, so that the focusing rate in the vicinity can be improved.
Abstract
Description
Claims
Priority Applications (3)
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JP2007504662A JP5305650B2 (ja) | 2005-02-24 | 2006-02-10 | 走査型プローブ顕微鏡用変位検出機構およびこれを用いた走査型プローブ顕微鏡 |
DE112006000419T DE112006000419T5 (de) | 2005-02-24 | 2006-02-10 | Abtastsondenmikroskop-Versatzerfassungsmechanismus und Abtastsondenmikroskop, welches dergleichen verwendet |
US11/842,722 US7614287B2 (en) | 2005-02-24 | 2007-08-21 | Scanning probe microscope displacement detecting mechanism and scanning probe microscope using same |
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JP2005048261 | 2005-02-24 | ||
JP2005-048261 | 2005-02-24 |
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US11/842,722 Continuation US7614287B2 (en) | 2005-02-24 | 2007-08-21 | Scanning probe microscope displacement detecting mechanism and scanning probe microscope using same |
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WO2006090593A1 true WO2006090593A1 (ja) | 2006-08-31 |
WO2006090593A9 WO2006090593A9 (ja) | 2007-06-14 |
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PCT/JP2006/302315 WO2006090593A1 (ja) | 2005-02-24 | 2006-02-10 | 走査型プローブ顕微鏡用変位検出機構およびこれを用いた走査型プローブ顕微鏡 |
Country Status (4)
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US (1) | US7614287B2 (ja) |
JP (1) | JP5305650B2 (ja) |
DE (1) | DE112006000419T5 (ja) |
WO (1) | WO2006090593A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006281437A (ja) * | 2005-03-08 | 2006-10-19 | Sii Nanotechnology Inc | 走査型プローブによる加工方法 |
JP2008209127A (ja) * | 2007-02-23 | 2008-09-11 | Sii Nanotechnology Inc | 走査型プローブ顕微鏡 |
KR20160115672A (ko) | 2015-03-25 | 2016-10-06 | 가부시키가이샤 히다치 하이테크 사이언스 | 주사 프로브 현미경 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5806457B2 (ja) * | 2010-09-15 | 2015-11-10 | 株式会社島津製作所 | 表面分析装置 |
JP6588278B2 (ja) * | 2015-09-01 | 2019-10-09 | 株式会社日立ハイテクサイエンス | 走査プローブ顕微鏡および走査プローブ顕微鏡の光軸調整方法 |
DE102017119093A1 (de) * | 2017-08-21 | 2019-02-21 | Carl Zeiss Microscopy Gmbh | Immersionsmikroskopie |
CN114184809B (zh) * | 2020-09-14 | 2024-01-23 | 长春理工大学 | 一种原子力探针测量单个搏动心肌细胞三维动态形貌的方法及装置 |
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- 2006-02-10 DE DE112006000419T patent/DE112006000419T5/de not_active Withdrawn
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JP2006281437A (ja) * | 2005-03-08 | 2006-10-19 | Sii Nanotechnology Inc | 走査型プローブによる加工方法 |
JP2008209127A (ja) * | 2007-02-23 | 2008-09-11 | Sii Nanotechnology Inc | 走査型プローブ顕微鏡 |
KR20160115672A (ko) | 2015-03-25 | 2016-10-06 | 가부시키가이샤 히다치 하이테크 사이언스 | 주사 프로브 현미경 |
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Also Published As
Publication number | Publication date |
---|---|
WO2006090593A9 (ja) | 2007-06-14 |
JP5305650B2 (ja) | 2013-10-02 |
US7614287B2 (en) | 2009-11-10 |
DE112006000419T5 (de) | 2008-01-17 |
US20080048115A1 (en) | 2008-02-28 |
JPWO2006090593A1 (ja) | 2008-07-24 |
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