WO2006040275A1 - Systeme de distribution de gaz allonge - Google Patents

Systeme de distribution de gaz allonge Download PDF

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Publication number
WO2006040275A1
WO2006040275A1 PCT/EP2005/054986 EP2005054986W WO2006040275A1 WO 2006040275 A1 WO2006040275 A1 WO 2006040275A1 EP 2005054986 W EP2005054986 W EP 2005054986W WO 2006040275 A1 WO2006040275 A1 WO 2006040275A1
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WO
WIPO (PCT)
Prior art keywords
distribution system
gas
gas distribution
strips
strip
Prior art date
Application number
PCT/EP2005/054986
Other languages
English (en)
Inventor
Anja Blondeel
Wilmert De Bosscher
Parsifal Goderis
Ivan Van De Putte
Original Assignee
Bekaert Advanced Coatings
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bekaert Advanced Coatings filed Critical Bekaert Advanced Coatings
Priority to EP05801451A priority Critical patent/EP1807547A1/fr
Priority to CN2005800346371A priority patent/CN101040061B/zh
Priority to JP2007535153A priority patent/JP5046334B2/ja
Publication of WO2006040275A1 publication Critical patent/WO2006040275A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0063—Reactive sputtering characterised by means for introducing or removing gases

Definitions

  • the invention relates to an elongated gas distribution system for mounting in a plasma apparatus.
  • the technology to treat large area substrates by means of vacuum related sputtering processes is gaining importance.
  • the in- line treatment of large area glass panes in huge vacuum installations is becoming more and more important as it allows to finish building glass with e.g. low-emissivity or soil-resistant coatings.
  • the substrate is conveyed across an elongated sputtering source that is oriented perpendicular to the conveying direction.
  • the sputtering source is by preference a rotating sputtering target at the surface of which a magnetically confined plasma racetrack is maintained.
  • the plasma is generated through ionisation of a noble gas, notably argon.
  • the ionised argon atoms strike the target surface thereby ejecting target atoms from the target.
  • a layer starts to form.
  • a reactive gas such as oxygen or nitrogen is administered during the process a compound layer will form, while these gases react with the impinging target atoms.
  • a plasma can also be used to clean surfaces.
  • the substrate is held at a negative bias and the impinging action of the argon ions cleans the surface from contaminants. This plasma cleaning is gaining more and more ground in the field of pre-treatment of difficult to coat polymers (PTFE, PVDF,...) and in the field of cleaning steel sheets from organic contaminants prior to further processing.
  • the gas distribution system in the state-of-the-art apparatus is made out of tubes.
  • One of the earliest described arrangements being a tube with small holes at regular distances extending along the target (see US
  • the inventors searched for other ways to implement a elongated, fast responding, easy to control and possibly cooled gas distribution system that allows for a differential gas feed along the width of the installation.
  • the object of the invention is to solve the problems of the state-of-the- art elongated gas distribution system in a plasma deposition or plasma cleaning apparatus. It is a further object of the invention to provide an elongated gas distribution system where different process gases can be distributed through a single device. Another object of the invention is to provide a differential gas supply over the width of the installation. It is a further object of the invention to provide a fast responding gas distribution system in terms of the amount of gas supplied and in terms of change in differential gas feed. Another object of the invention is to have a gas distribution system with an integrated cooling system in it.
  • a first aspect of the invention relates to the combination of features of claim 1.
  • an elongated gas distribution system for mounting in a plasma deposition or plasma cleaning apparatus comprises at least one inlet, and at least one series of outlets, each of said series of outlets corresponding to one of said inlets.
  • a series of outlets is meant at least two outlets but preferably more. Most preferred are around a hundred outlets.
  • Said outlets are holes where the gas flows into the evacuable chamber of the apparatus. These holes may be foreseen with replaceable exit nozzles that fit into the holes.
  • the series of outlets are arranged in elongated rows in a direction substantially perpendicular to the direction of the movement of the substrate and substantially parallel to the elongated target.
  • One series of outlets can span the whole width of the installation e.g. to feed the noble gas.
  • different series of outlets can be arranged in a single row e.g. to feed the left side, the middle and the right side of the installation. This is the preferred arrangement for feeding reactive gasses, as it allows for a differential gas feed over the width of the installation, hence a control of the film composition over the width of the substrate.
  • more than three series of outlets can be implemented in one row the limit being set by the number of inlets that also have to be accommodated on the gas distribution system.
  • the invention is characterised by the way the gas distribution system is constructed. It comprises a series of strips with a length that is substantially equal to the width of the installation. This length can be anywhere between 0.30 m and 10 meters.
  • the strips have a thickness that is dependent on the space available for the gas distribution system and the overall gas flow to be achieved. In practice this will generally be between 1 mm and 70 mm.
  • the width of the strip is determined by the span that has to be overcome and the overall gas flow pattern that has to be achieved. In general this width will be between 1 cm and 30 cm.
  • the number of strips is depending on the number of inlets and/or the number of process gasses that have to be fed to the vacuum chamber. At least two strips are needed to implement the invention.
  • the series of outlet openings are arranged in the length dimension.
  • the gas outlets series are arranged in the side formed by the length and thickness dimension of the strips.
  • the gas outlet series emit the gas in rows that are arranged at the outer side (length by width) of one of the two outermost strips of the stacks.
  • the strips are made out of an appropriate material that has the correct combination of gas tightness, strength to weight, durability and temperature resistance.
  • a good electrical conductivity may be of importance e.g. in a plasma cleaning operation where the gas distribution system can act as an anode.
  • the magnetic properties can be of importance as well in case a plasma forms in the vicinity of the gas distribution system.
  • the gas distribution system can be made neutral (magnetic permeability close to one) or ferromagnetic
  • Each of said strips has a first and a second side. With a side is meant the surface formed by the length and the width dimension. At least one of the sides has grooves in it.
  • the grooves are so configured, that when the strips are stacked upon each other channels form.
  • Each of said channels connects one of said inlets with the corresponding series of outlets.
  • the grooves can be made by any kind of suitable process: • by far the most preferred way to make the grooves is that they are milled out by means of a semicircular or U-shaped milling borehead. The most convenient is to use a numerically controlled steered milling machine that allows the grooving of very complex patterns, thus forming channels that can never be accomplished by means of traditional tubing.
  • the grooves can be made by successive embossing of a suitably formed rod into the strip by means of a hydraulic press.
  • the rod must be much harder than the material of the strip.
  • the desired pattern can also be obtained in one stroke by means of a negative of the pattern to be imprinted. This negative must of course be harder than the strip material.
  • the grooves can be obtained by casting the strip material in a mold having the negative shape of the distribution channel. This is the least preferred method due to its cost and inflexibility.
  • the stacking of the strips should be such that the channels are substantially gastight at lower pressure differences. This can be achieved by bolting the strips together or by pressing them together by means of a clamping system, or by means of gluing or by any other means that allows a substantially gastight stack to be formed.
  • Another way of achieving gastight channels is to cut out the channels through the strip by means of e.g. a laser-cutting machine or a torch burner or any other cutting apparatus that is fit to cut the material.
  • the strip will then loose its coherency and will have to be positioned (much like a jigsaw puzzle with gaps between the pieces) between two adjacent strips before stacking the strips together.
  • More complex channels can be achieved by drilling holes in the strips at the appropriate places to allow channels that can change levels from one strip to the other (dependent claim 3).
  • Gas flow controlling means can be mounted in or on said stack of strips (dependent claim 4). With gas flow controlling means is meant any means known in the art to block, partially block or divert a flow of gas.
  • the gas flow controlling means can mounted on the stack of strips e.g. on the outer length by width sides of the outermost strips. For example a channel can be led to the outer side of the outer strip through a first hole made in this outer strip. On this outer strip a gas controlling means is mounted before the channel continues its path through a second hole in the same strip.
  • the gas controlling means can also be implemented inside the stack of strips e.g. by implementing shutters or diverters in the strip.
  • the gas flow controlling means can be adjustable off-line i.e. whenever the apparatus is down and the controlling means is reachable. More preferred is however if the gas flow controlling means can be adjusted remotely when the sputtering apparatus is functioning. This can be done in several ways (dependent claim 5): • mechanically, when force is transmitted to the gas controlling means by means of solid intermediates like rods, levers, gearwheels, cables or the like that are actuated from outside the vacuum.
  • the gas flow controlling means can be split into two major families: valves and vanes (dependent claim 6). Valves can stepwise or continuously adjust the gas flow from no flow to the maximum flow allowed through the channel. Such valves must be mounted in line with the channels. Vanes divert the gas flow from one single feed channel into two or more receiving channels. Vanes will therefore always be mounted at a branching of a channel.
  • a channel structure that is particularly easy to implement according the invention is a tree structure (dependent claim 7).
  • Any tree structure can be readily implemented as long as it fulfils the requirements of a tree i.e. that the structure has a root that splits into two or more branches, that each branch can on its turn split into other branches and that all branches finally end up in leaves.
  • the inlet of the gas distribution system then corresponds to the root, the channels to the branches and the outlet series to the leaves.
  • an adjustable valve can regulate the total flow of gas and at the splitting of two branches, a vane can adjust the balance of the gas flows going into either of the connecting branches.
  • a diffusor is preferably used so that the gas is emitted evenly into the vacuum chamber.
  • a foraminated plate that covers the outlets can conveniently be used to this end.
  • strips of fabric made out of sintered or woven or knitted metal fibre covering the outlets have been found to be practical in order to scatter the gas atoms in all directions (dependent claim 9).
  • the fibres making up such a fabric are made of stainless steel (preferably AISI 316L) and are between 1 and 80 micron thick.
  • a combination of a foraminated plate with a sintered metal fibre strip is also possible and included into the inventive concept.
  • the gas distribution system can be further completed with the integration of a cooling system (dependent claim 10).
  • a cooling channel can conveniently be incorporated.
  • Such a channel will have a fluid inlet and a corresponding fluid outlet, the fluid inlet for introducing the cooled fluid and the outlet for extraction of the heated fluid.
  • the shape of the channel can be serpentine-like having the inlet at one end of the single channel and the outlet at the other end. Or it can comprise a broader feed channel that feeds a set of parallel subchannels which on their turn end in a collector channel that connects to the single outlet. Or it can have a net-like structure. In case one cooling channel is not enough more cooling channels can of course be incorporated on different sides of the strips.
  • the fluid can be a gas or a liquid.
  • the plasma deposition or plasma cleaning apparatus comprising the above described gas distribution system is also claimed (independent claim 11).
  • the gas distribution system according the invention is used in conjunction with a feedback system (dependent claim 12).
  • the feedback system uses specific parameters of the plasma (such as gas composition by means of on-line mass spectroscopy or ion concentration of certain species by optical emission spectroscopy or the target voltage that varies with the plasma condition) as an input to remotely control the gas controlling means of the gas distribution system.
  • the feedback signal can be based on the properties of the coating as deposited on the substrate such as e.g. refractive index, conductivity, transparency or any other measurable quantity.
  • the gas distribution system can also be steered by the properties of the coating that remains e.g. the amount of coating that remains.
  • FIGURE 1 descibes the prior art implementation of the "tube-in- tube” system
  • FIGURE 2 is a schematic drawing on where the gas distribution system can normally be found in a large area coater.
  • FIGURE 3 shows an exploded view of a first implementation of the invention where the gas distibution system allows to distribute two process gasses.
  • FIGURE 4 shows another way to implement the invention.
  • FIGURE 5 describes a system where the gas flow can be controlled by means of a vane.
  • FIGURE 6 'a', 'b' and 'c' is a more detailed description of an adjustable vane
  • FIGURE 7 'a' and 'b' shows how an electromagnetically controlled membrane valve can be implemented according the invention.
  • FIGURE 8 'a' and 'b' shows very simple but convenient types of valves that can be adjusted off-line.
  • - FIGURE 9 shows an additional strip that can be used to cool the gas distribution system.
  • FIGURE 10 'a' shows another way to implement the elongated gas distribution system when no space is available sideways from the targets.
  • FIGURE 10 'b' shows a layout of the elongated gas distribution system as seen from the top (length times width face), 'c' as seen from the one side (length times thickness face), 'd' as seen from the bottom (length times width face), 'e' as seen from the other side (length times thickness face). Description of the preferred embodiments of the invention.
  • the prior art gas distribution system is shown in FIGURE 1 : the gas 140 enters the process chamber 110 through a first tube 120.
  • the first tube distributes the gas a first time through holes 122 along the length of the tube into a second, larger tube 130 that is fixed coaxially to the first tube 120.
  • a series of nozzles 132 further distributes the gas into the chamber 110.
  • the cavity between both tubes acts as a expansion buffer vessel and allows the gas to expand evenly at an intermediate pressure across the width of the process chamber. However, the cavity withholds the gas for an amount of time such that a fast change in the amount of gas fed in response to a change in the plasma parameters is delayed.
  • FIGURE 2 illustrates where the gas distribution system according the invention can preferably be found in a large area plasma apparatus
  • Such an apparatus is in essence a large vacuum chamber 210 having the necessary ancillary equipment to maintain a vacuum (not shown) and to feed and convey large substrates 220 usually by means of rollers 230 inside this vacuum.
  • top boxes such as 240 are mounted that are modular and can easily be exchanged. These top boxes 240 carry two tubular targets 250; 250' by means of two pairs of end blocks (not shown) that connect the targets to the top box.
  • the top box further contains all necessary piping, electrical networking and mechanical drive equipment (not shown) in order to feed the targets 250, 250' with respectively coolant and electrical current while they are rotatably driven.
  • the gas distribution systems 260 and 270 are mounted alongside the targets while gas feeds 280 and 290 feed the necessary gasses from the gas supply (not shown) through the top box 240 and the gas distribution systems 260, 270 into the vacuum chamber 210.
  • a first embodiment of the inventive gas distribution system will now be described in more detail with the help of FIGURE 3.
  • the strips are made of an aluminium alloy commonly known as AIMgSiI (composition in percent by weight: Si (0.7 - 1.3), Mg (0.4 - 0.8),
  • the remainder being Al having a thickness of 7 mm, a width of 100 mm and a length of 900 mm.
  • the length can easily be scaled up to 3860 mm - which is the largest target length in use today (152 inch) - and even more.
  • a binary tree pattern has been milled out.
  • the grooves 316 have a U shape with a width of 8 mm.
  • the inlet 312 connects to the outlet series of which two outlets are indicated with 314, 314'. The depth of the U-grooves varies from 8 mm to 0.5 mm.
  • the depth depends on the bifurcation level of the channel: at each bifurcation, the depth of the split branches is half of the depth of the feeding branch. In this way the gas flow splits substantially equal at each bifurcation and the pressure difference remains equal between bifurcation levels.
  • the inlet groove 312 thus has a depth of 8 mm
  • the outlet 314 will have a depth of 0.5 mm while outlet 314' will have a depth of 2 mm.
  • the interdistance between individual outlets will have to be accommodated as well. It will be clear from the above that the by far the most preferred way to achieve such lateral uniformity is to use a balanced binary tree having 2 n outlets with 'n' being the number of bifurcation levels (preferably n is larger than 4).
  • strip 320 two buffer volumes 322 and 328 have been milled out.
  • the volumes enlarge in the widthwise direction of the strip from the inlet 321 towards the middle of the strip.
  • Grooves such as 324 have been milled out that split into two channels 326 that have an outlet 327 in order to allow the gas to expand into the vacuum chamber.
  • the strip 330 forms the channels engraved in strip 320 when attached to it.
  • Strip 330 has no particular embossing.
  • the bottom side of strip 320 likewise forms the channels as engraved in strip 310.
  • the three strips are tightly connected to one another by fastening means such as the bolt and nut pairs 340, 350, 340', 350' and 340", 350".
  • the channels of strip 310 are used to feed the noble gas, while the patterning of strip 320 is used to feed the reactive gas.
  • the double structure in strip 320 allows for a differential gas feed between the left and right side of the gas distribution system.
  • the gas distribution system is mounted with the widthwise dimension vertical thus allowing a space saving mount in the vicinity of a tubular target. Additionally, when mounted in this direction, the stack of strips has a sufficient stiffness in order to prevent sagging of the gas distribution system.
  • FIGURE 4 describes a second embodiment of the invention with a stack of 3 strips made of stainless steel (AISI 316) 410, 420, 440.
  • Strips 410 and 440 are blank and do not have any embossing or engraving.
  • Strip 420 has now been cut into pieces. As the cutting has been done with a constant width, the gas pressure difference between different bifurcation levels will decrease towards the outlets. After cutting the strip 420 falls apart in several pieces such as 422, 424, 426; 428; 430, 432. These pieces must be put back in place on the mounting strip 410 by means of e.g. gluing.
  • gluing strip 440 By gluing strip 440 on top of the strips, a channel structure is formed with an inlet 434 and several outlets such 436.
  • the elongated gas distribution system is completed with a U- shaped foraminated plate 452 having slots 450 for diffusing the gas into the apparatus.
  • the plate 452 can be clipped onto the assembled stack and fixed to it by means of e.g. screws (not shown). Not shown, put equally well conceivable is that in stead of the plate 452 a strip of sintered metal fibre fabric is used. Or the strip of metal fibre fabric can be held in place by means of a foraminated plate.
  • the embodiment of FIGURE 5 introduces the concepts of level change by means of holes drilled into the strips and the use of a gas controlling means.
  • the gas distribution system comprises three strips 510, 520 and 540 that are stacked on top of each other.
  • a hole 524 drilled through strip 520 feeds part of the gas supplied into the tree structure 512 engraved in the adjacent strip 510.
  • the other part of the gas is fed through groove 526 to a gas controlling means 550 incorporated in the strip 540.
  • the gas controlling means divides the gas flow into the grooves 528 and 532.
  • the gas controlling means 550 will be further explained in the explanation of FIGURE 6. At the ends of the grooves 528 and 532 the gas is transferred to the next strip 510 by means of feed-through holes 530 and 534.
  • Strip 510 has three engravings 516, 512 and 514 each feeding a series of outlets: while the middle series of outlets fed by tree 512 provides a constant supply of gas in the middle of the gas distribution system, the balance in gas flow between the left tree 516 and right tree 514 can be changed at will by means of the gas controlling means 550.
  • the use of feed-through holes greatly adds to the design flexibility of the gas distribution system as it makes crossovers from different gas channels possible.
  • the gas controlling means 550 of FIGURE 5 will now be described in more detail by means of FIGURE 6.
  • At least two strips 630 and 640 are needed to implement the gas controlling means that in this case is a vane.
  • the first strip 630 three grooves at 120° angles to one another are milled out: 610 where the gas is supplied and fed into the channels 614 and 612 (shown from the side in FIGURE 6b and from the top in FIGURE 6c).
  • the second strip 640 a stepped, circular hole has been machined.
  • a tightly fitting diverter 600 comprising a circular cap 606 and a 120° segment diverter piece 602 can rotate in this hole.
  • the diverter piece 602 is made of a sliding but compressible material such as PTFE or Hypalon® available from "DuPont Dow elastomers".
  • the diverter piece partly or completely blocks the entrance to the channels 612 and 614 but due to the 120° angular arrangement, the total area for the gas to escape remains constant and equal to the area of the feeding channel 610.
  • the arrangement thus allows to partition the incoming gas flow into two separate gas flows without changing the total amount of exiting gas.
  • the diverter is held in place by a holding ring 604 that is fastened to the strip 640 by means of screws or the holding ring can be threaded into the hole in strip 640.
  • An O-ring 605 ensures the gas tightness of the whole structure. The outgoing gas flow balance can now conveniently be adjusted by turning the diverter 600.
  • Such an adjustment can be done off-line by manual intervention or it can be done on-line by means of a remotely controlled electrical stepper motor or a remotely actuated mechanical gear and toothed lath arrangement.
  • FIGURE 8 a and b show two simple implementations of an on-line valve that nevertheless are very practical.
  • FIGURE 8 a shows a first strip 820 and a second strip 810 that are attached to one another.
  • Strip 820 has a channel 822 grooved in it with a certain groove width.
  • a bolt 802 is threaded into the strip 810 and can be turned down to the receiving hole 812. When the bolt is screwed into the threaded hole, the path of the gas is partially or completely blocked. It is of course necessary that the diameter of the bolt is larger than the width of the channel.
  • FIGURE 8 b shows again a channel 852 formed between two strips 854 and 853 that can be blocked by a turnable bolt 856 that has a tight fit into a hole drilled through strip 853 and partly into strip 854.
  • the bolt 856 has a diametrically through-drilled hole 858.
  • the bolt is held in place by means of a U-shaped clip 864 fixed to the strip 852 that engages into the circumferential groove 866 of the bolt 856.
  • O-ring 862 ensures that the valve remains gastight.
  • the gasflow through the channel 852 can be adjusted.
  • FIGURE 7 illustrates how an electrically actuated valve can conveniently be implemented between two strips 710 and 720 of the gas distribution system.
  • FIGURE 7a shows the valve in a cross section along the plane AA' that is represented in FIGURE 7b the latter being a top view of the valve with the cap 730 removed.
  • the ingoing channel 722 and the outgoing channel 712 are milled out of the facing sides of the strips 710, 720.
  • the ingoing channel 722 ends in a hole 723 through strip 720.
  • the outgoing channel 712 ends in a semicircle. Concentrically with this semicircle, a ring 725 is fastened to strip 710. On top of this ring 725 an O-ring 724 is fixed.
  • This O-ring is made of a resilient and gas tight material such as Viton® from "DuPont Dow elastomers".
  • a disk-like membrane 740 (preferably made from very thin stainless steel) having a ring shaped corrugation at its outer rim closes off the O-ring 724 in neutral condition.
  • a magnetic anchor 736 is attached to the membrane 740.
  • the magnetic anchor can freely move in the cavity 737 in which also a small amount of - preferably the noble - gas is kept under a pressure higher than the working pressure of the gas admitted through the ingoing channel 722.
  • An electromagnet 732 as part of the cap 730 can be remotely actuated by application of electrical current through leads 734.
  • the cap 730 is kept gas tight by means of O-ring 738.
  • the membrane 740 is attached gas tight to the cap 730 by means of welding or brasing or by any other means suitable for the purpose.
  • the electromagnet 732 lifts the magnetic anchor 736 and the membrane attached to it from its O-ring 724 seat.
  • the gas can then flow from the ingoing channel 722 to the outgoing channel 712.
  • the gas under pressure held in the cavity 737 will seat the membrane back in place, thus blocking the gas flow.
  • the inventors also found that the need for a high pressure, gas tight cavity 737 can also be circumvented by using a helical spring (not shown) to push the membrane 740 onto to the O-ring 724: an alternative not depicted in the figures provided.
  • the cap 730 can also be integrated in another strip on top of 720.
  • FIGURE 9 shows again a strip 910 wherein a single channel 914 has been milled out.
  • the channel has a serpentine -like shape for ensuring a large contacts surface between the cooling liquid and the gas distribution system 930.
  • the cooling liquid is fed through the inlet 912 and extracted through the outlet 916 - in this case by way of example - both mounted on the width by length side of the strip 910.
  • a high temperature resistant gasket 920 (or even better two gaskets, parallel to one another, for double safety) is also included to prevent liquid leakage into the vacuum.
  • FIGURE 10 'a' Another advantageous embodiment is shown in FIGURE 10 'a'.
  • the elongated gas distribution system 1070 is mounted above two rotatable targets 1050, 1050'.
  • the elongated gas distribution system is carried by a top box 1040 mountable on a module 1010 of a large area coater.
  • Different feeds for inert gas 1060 and reactive gas 1060' are provided.
  • the complete lay-out of the channels is shown in FIGURE 10 'b', 'c', 'd', and 'e'. All channels are milled out of a single rectangular strip of aluminium alloy (AIMgSiI).
  • inlet openings 1080, 1090, 1100, 1110, and 1120 are provided at one end of the strip.
  • the closing strips at either side of the elongated gas distribution system are not shown.
  • the exit holes are provided at both length times thickness sides of the strip.
  • the one (length times width) face - for convenience called the 'upper' face although no particular orientation should be implied therewith - as shown on FIGURE 10 'b' shows the distribution tree 1082 of the inert gas.
  • This tree 1082 is a binary tree with two main branches at either side of the gas distribution system. In total there are 32 exit openings that are all fed through the single gas inlet 1080 that is fed by the inert gas feed 1060'.
  • the distribution channels for the reactive gas are milled.
  • reactive gas is fed to four different inlets 1090, 1100, 1110, and 1120 that connect to different corresponding binary trees 1092, 1102, 1112, and 1122.
  • Each of the trees emits gas at either side of and in different zones along the elongated gas distribution system.
  • the gas flow to each of the individual inlets can be controlled through throttle valves mounted in the top box 1040.
  • Crossovers for the channels are made possible through loopholes that lead the gas to the other side of the strip.
  • tree 1092 is fed by inlet 1090. First the gas is led through channel 1098.
  • a loophole 1096 at the other side of the strip is needed to cross the inert gas supply tree 1082.
  • gas flow controlling means 1093, 1103, 1113, 1123 in the form as the ones described in FIGURES 6, 7 or 8 can easily be incorporated in the elongated gas distribution system. As these gas flow controlling means are in the vicinity of the outlet tree of the gas, they allow for a fast response to needed changes in the gas flow.
  • the gas flow controlling means can be adjusted on-line by mechanical means 1062, 1062', 1062", 1062'" (1062", 1062'" not being visible because they are hidden by 1062, 1062') that are reachable through the top box 1040.
  • These means can take the form of rotating pins that rotate in a vacuum tight bearing and engage with the gas flow controlling means 1093, 1103, 1113, 1123.

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  • Optics & Photonics (AREA)
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  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

L'invention porte sur un système de distribution de gaz destiné à un appareil de revêtement par projection plasma ou de nettoyage au plasma. Le système de l'invention se présente sous la forme d'une pile de bandes allongées. Les bandes sont munies de rainures meulées qui forment des canaux dès que les bandes sont empilées les unes sur les autres. L'agencement précité offre une souplesse de conception particulièrement élevée et permet d'obtenir un système de distribution de gaz arborescent à fines ramifications. Ledit agencement rend également possible l'intégration de moyens de régulation de débit gazeux tels que des soupapes ou des papillons à l'intérieur ou sur le système de distribution de gaz. En actionnant lesdits moyens de régulation de débit gazeux sur la base d'un paramètre de rétroaction d'entrée de plasma, de dépôt de couche ou de nettoyage de substrat, on obtient un système de distribution de gaz à réaction rapide. En outre, on peut utiliser certaines bandes pour intégrer un circuit de refroidissement destiné refroidir le système de distribution de gaz allongé précité.
PCT/EP2005/054986 2004-10-11 2005-10-04 Systeme de distribution de gaz allonge WO2006040275A1 (fr)

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EP05801451A EP1807547A1 (fr) 2004-10-11 2005-10-04 Systeme de distribution de gaz allonge
CN2005800346371A CN101040061B (zh) 2004-10-11 2005-10-04 细长的气体分配系统
JP2007535153A JP5046334B2 (ja) 2004-10-11 2005-10-04 長型ガス分配システム

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EP04104976.8 2004-10-11
EP04104976 2004-10-11

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WO2006040275A1 true WO2006040275A1 (fr) 2006-04-20

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JP (1) JP5046334B2 (fr)
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WO2007045110A2 (fr) * 2005-10-17 2007-04-26 Oc Oerlikon Balzers Ag Moyens de nettoyage pour dispositifs pecvd a grande surface utilisant une source de plasma a distance
WO2008113571A1 (fr) * 2007-03-20 2008-09-25 Leybold Optics Gmbh Système de répartition de gaz
DE102007026349A1 (de) * 2007-06-06 2008-12-11 Aixtron Ag Aus einer Vielzahl diffusionsverschweißter Scheiben bestehender Gasverteiler
DE102014103740A1 (de) * 2014-01-09 2015-07-23 Von Ardenne Gmbh Sputteranordnung und Sputter-Verfahren
US10138544B2 (en) 2011-06-27 2018-11-27 Soleras, LTd. Sputtering target
CN113481469A (zh) * 2021-06-04 2021-10-08 广东铭丰包装材料有限公司 一种匀气机构及镀铝机
EP3940744A1 (fr) * 2020-07-14 2022-01-19 Chang Hoon Lee Système et procédé de nettoyage de la surface d'un substrat à l'aide d'un dispositif de génération de plasma rouleau à rouleau

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JP5862529B2 (ja) * 2012-09-25 2016-02-16 東京エレクトロン株式会社 基板処理装置及びガス供給装置
JP6170340B2 (ja) * 2013-05-21 2017-07-26 東京エレクトロン株式会社 ガス供給ヘッド、ガス供給機構及び基板処理装置
JP6373708B2 (ja) * 2014-09-30 2018-08-15 株式会社Ｓｃｒｅｅｎホールディングス プラズマ処理装置およびプラズマ処理方法
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WO2007045110A2 (fr) * 2005-10-17 2007-04-26 Oc Oerlikon Balzers Ag Moyens de nettoyage pour dispositifs pecvd a grande surface utilisant une source de plasma a distance
WO2007045110A3 (fr) * 2005-10-17 2007-07-12 Oc Oerlikon Balzers Ag Moyens de nettoyage pour dispositifs pecvd a grande surface utilisant une source de plasma a distance
WO2008113571A1 (fr) * 2007-03-20 2008-09-25 Leybold Optics Gmbh Système de répartition de gaz
DE102007026349A1 (de) * 2007-06-06 2008-12-11 Aixtron Ag Aus einer Vielzahl diffusionsverschweißter Scheiben bestehender Gasverteiler
WO2008148773A1 (fr) 2007-06-06 2008-12-11 Aixtron Ag Distributeur de gaz à plusieurs disques soudés par diffusion et procédé de fabrication d'un tel distributeur de gaz
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EP3940744A1 (fr) * 2020-07-14 2022-01-19 Chang Hoon Lee Système et procédé de nettoyage de la surface d'un substrat à l'aide d'un dispositif de génération de plasma rouleau à rouleau
JP2022018061A (ja) * 2020-07-14 2022-01-26 フン リ，チャン ロール・ツー・ロールプラズマ生成装置を利用した基材の表面洗浄システム及び方法
CN113481469A (zh) * 2021-06-04 2021-10-08 广东铭丰包装材料有限公司 一种匀气机构及镀铝机

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CN101040061B (zh) 2011-07-06
CN101040061A (zh) 2007-09-19
EP1807547A1 (fr) 2007-07-18
JP2008516084A (ja) 2008-05-15
JP5046334B2 (ja) 2012-10-10

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