WO2005078001A1 - エポキシ樹脂の製造方法、エポキシ樹脂組成物及び硬化物 - Google Patents
エポキシ樹脂の製造方法、エポキシ樹脂組成物及び硬化物 Download PDFInfo
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- WO2005078001A1 WO2005078001A1 PCT/JP2005/001763 JP2005001763W WO2005078001A1 WO 2005078001 A1 WO2005078001 A1 WO 2005078001A1 JP 2005001763 W JP2005001763 W JP 2005001763W WO 2005078001 A1 WO2005078001 A1 WO 2005078001A1
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- WIPO (PCT)
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- epoxy resin
- group
- resin composition
- naphthol
- epichlorohydrin
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
- C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
- C08G59/063—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols with epihalohydrins
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0326—Organic insulating material consisting of one material containing O
Definitions
- the present invention relates to an epoxy resin and an epoxy resin composition useful for encapsulation of electric and electronic parts, circuit board materials, adhesives, paints, and the like, and a cured product thereof.
- Patent Document 1 JP-A-3-717
- Patent Document 2 Japanese Patent Application Laid-Open No. Hei 3-90075
- an object of the present invention is to provide applications such as lamination, molding, casting, and adhesion that are excellent in moisture resistance, heat resistance, flame retardancy, adhesion to a metal substrate, and the like and have good moldability.
- An epoxy resin useful for the present invention a method for producing the same, an epoxy resin composition using the same, and a cured product thereof. Means for solving the problem
- R and R represent a hydrogen atom or a hydrocarbon group having 18 carbon atoms
- X is a direct bond
- This is a method for producing an epoxy resin which comprises mixing 60 parts by weight of a bisphenol compound represented by the formula (1) and then reacting the mixture with epichlorohydrin.
- the present invention is an epoxy resin obtained by the above-described method for producing an epoxy resin.
- This epoxy resin preferably has a softening point of 50 to 110 ° C.
- the present invention provides an epoxy resin composition containing the epoxy resin and the curing agent, and a cured epoxy resin obtained by curing the epoxy resin composition.
- the epoxy resin of the present invention is obtained by reacting a mixture of a naphthol resin represented by the general formula (1) and a bisphenol compound represented by the general formula (2) with epichlorohydrin. Gaining power S can. Even if the epoxidized naphthol resin has a high viscosity, an epoxy resin having excellent fluidity can be obtained by combining it with an epoxidized bisphenol compound having a low viscosity.
- the mixing ratio of the naphthol resin and the bisphenol compound is in the range of 10 to 60 parts by weight, preferably 15 to 40 parts by weight of the bisphenol compound per 100 parts by weight of the naphthol resin. If the amount is less than this, the effect of improving the fluidity is small, and if it is more than this, heat resistance, moisture resistance and flame retardancy are reduced.
- the naphthol resin used in the present invention has a structure represented by the above general formula (1), wherein the repeating unit n is a force having an average value of 1.1 to 4.0. S, preferably 1.2 to 3.0. If it is smaller than this, heat resistance and moisture resistance decrease, and if it is larger than this, viscosity increases and moldability decreases.
- the softening point of the naphthol resin is usually 50 to 150 ° C, preferably 60 to 120 ° C, and more preferably 60 to 90 ° C. If it is lower than this, the heat resistance decreases, and if it is higher than this, the fluidity decreases.
- the hydroxyl equivalent is usually in the range of 180 to 240, preferably in the range of 190 to 230.
- the naphthol resin used in the present invention can be obtained, for example, by reacting a naphthol with an aromatic crosslinking agent such as p_xylylene diol in the presence of an acidic catalyst. In this reaction, usually 0.1 to 0.9 mol of an aromatic crosslinking agent is used per 1 mol of naphthols. After the completion of the reaction, excess naphthols are usually removed from the system by a method such as distillation under reduced pressure. Further, it is possible to remove excess naphthols out of the system by, for example, reacting the remaining naphthols with formaldehyde such as paraformaldehyde as described in JP-A-5-148333.
- formaldehyde such as paraformaldehyde
- a method may be used in which the dimer is left in the system as a dimer to reduce apparently remaining naphthols.
- the naphthols are usually removed until the amount remaining in the naphthol resin becomes 5% by weight or less, preferably 2% by weight or less.
- the naphthols used in producing the naphthol resin used in the present invention include 11-naphthol and 2-naphthol, which may be used alone or as a mixture.
- the aromatic crosslinking agent include p-xylylene diol, 1,4-dichloromethylbenzene, 1,4-dimethoxymethylbenzene, and 1,4-diethoxymethylbenzene. You can.
- the bisphenol conjugate used in the present invention has a structure represented by the above formula (2).
- R and R are a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, an isopropyl group,
- hydrocarbon group having 118 carbon atoms such as a ruyl group, a propargyl group, a butyl group, an n-aminol group, a sec-amyl group, a tert-amyl group, a cyclohexynole group, a phenyl group or a benzyl group. And preferably a hydrogen atom or a methyl group.
- X represents a direct bond, an ether group, a snolesulfide group, a sulfone group, a ketone group, a methylene group or an isopropylidene group, and is preferably a direct bond or a methylene group.
- bisphenol compounds include 4,4'-dihydroxybiphenyl, 3,3 ', 5,5'_tetramethyl-1,4,4'-dihydroxybiphenyl, 4,4'-dihydroxydiphenylmethane, 3,3'_dimethyl-4,4'-dihydroxydiphenylmethane, 3,3 ', 5,5'-tetramethyl-4,4'-dihydroxydiphenylmethane, 4,4'-dihydroxydiphenylether, 3,3 ', 5,5'-tetramethinolee 4,4'dihydroxydiphenyl ether, 4,4'dihydroxydiphenylsulfide, 3,3'_dimethyl-4,4'-dihydroxydiphenylsulfide, 3,3', 5,5'-tetramethyl-4,4'-dihydroxydiphenylsulfide, 4,4'-dihydroxydiphenylsulfone, 3,3 ', 5,5'-tetrame
- the epoxy resin of the present invention can be produced by reacting a mixture of the naphthol resin of the general formula (1) and the bisphenol compound of the general formula (2) with epichlorohydrin. This reaction can be performed in the same manner as a usual epoxidation reaction.
- the mixture is dissolved at 20-150 ° C, preferably 30-150 ° C in the presence of an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide.
- an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide.
- the amount of the alkali metal hydroxide used at this time is 0.8-1.2 monoles, preferably 0.9-1.0 monoles, based on 1 mol of the total of the hydroxyl groups of the naphthol resin and the bisphenol compound. Range.
- epichlorohydrin is used in excess of the total amount of hydroxyl groups in the naphthol resin and the bisphenol compound in general. is there.
- a solvent such as dimethyl sulfoxide, diethylene glycol dimethyl ether, or triethylene glycol dimethyl ether may coexist.
- the epoxy resin of the present invention is obtained by the above-mentioned production method, and has a hydroxyl group strength in a naphthol resin represented by the general formulas (1) and (2) and a bisphenol-conjugated product glycidyl ether. Mainly those that have changed into groups (preferably 90 wt% or more), and include small amounts of those where some of the epoxy groups have expanded and oligomerized. This epoxy resin has a soft point of 50-110. C is desirable.
- the epoxy resin of the present invention can employ a method of further contacting the epoxy resin obtained by the above reaction with a basic substance in order to reduce hydrolyzable chlorine.
- This reaction is usually performed in a solvent such as toluene, xylene, n-butanol, methyl isobutyl ketone.
- the basic substance include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide.
- the amount of hydrolyzable chlorine in the epoxy resin of the present invention is preferably small from the viewpoint of improving the reliability of the electronic component to be sealed. Although not particularly limited, it is preferably 100 ppm or less, more preferably 500 ppm or less.
- the hydrolyzable chlorine refers to a value measured by the following method. That is, 0.5 g of the sample was dissolved in 30 ml of dioxane, 10 ml of 1N-K ⁇ H was added, and the mixture was boiled under reflux for 30 minutes, cooled to room temperature, and 100 ml of 80% acetone water was added. Is the value obtained by potentiometric titration.
- the epoxy resin composition of the present invention comprises an epoxy resin and a curing agent, and contains the epoxy resin of the present invention as an essential component as an epoxy resin component.
- the epoxy resin composition of the present invention may contain, in addition to the epoxy resin of the present invention, a normal epoxy resin having two or more epoxy groups in a molecule.
- a normal epoxy resin having two or more epoxy groups in a molecule.
- Such epoxy resins include, for example, bisphenol A, bisphenol F, bisphenol S, fluorene bisphenol, 4,4'-biphenol, 2,2'-biphenol, hydroquinone, resole Divalent phenols such as syn, tris- (4-hydroxyphenyl) methane, 1,1,2,2-tetrakis (4-hydroxyphenyl) ethane, phenol novolak, o_cresol novolak, etc.
- glycidyl ether derivatives derived from halogenated bisphenols such as phenols having a valency or higher and tetrabromobisphenol A.
- epoxy resins may be used alone or in combination of two or more.
- the amount of these compounds may be within a range that does not impair the object of the present invention, but is usually preferably within 50% by weight based on the epoxy resin of the present invention.
- curing agent used in the epoxy resin composition of the present invention all those generally known as curing agents for epoxy resins can be used. Examples include dicyandiamide, polyhydric phenols, acid anhydrides, aromatic and aliphatic amines.
- polyvalent phenols examples include bisphenol A, bisphenol F, bisphenol S, fluorene bisphenol, 4,4'-biphenol, 2,2'-biphenol, hydroquinone, and resorcinol.
- the softening point of the phenolic curing agent is preferably 40 to 150 ° C, more preferably 50 to 120 ° C. If it is lower than this, there is a problem of blocking during storage, and if it is higher than this, there is a problem in kneadability and moldability in preparing the epoxy resin composition. Further, the melt viscosity at 150 ° C. is preferably not more than 20 boys, more preferably not more than 5 boys. Higher than this In addition, there is a problem in kneadability and moldability during preparation of the epoxy resin composition.
- Examples of the acid anhydride include phthalic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, methylhymic anhydride, nadic anhydride, and trimellitic anhydride Etc.
- amines examples include 4,4, -diaminodiphenylmethane, 4,4, -diaminodiphenylpropane, 4,4'-diaminodiphenylsulfone, m-phenylenediamine, and p-xylylenediamine.
- aromatic amines such as amines and aliphatic amines such as ethylenediamine, hexamethylenediamine, diethylenetriamine and triethylenetetramine.
- one or more of these curing agents can be used in combination.
- the epoxy resin composition of the present invention is useful for sealing.
- the inorganic filler to be added to the epoxy resin composition for sealing include silica, alumina, zircon, calcium silicate, calcium carbonate, silicon carbide, silicon nitride, boron nitride, zirconia, fosterite, steatite, One or more of spinel, mullite, titania, etc. may be mentioned, and the form thereof may be powder, spherical beads and the like. Of these, spherical fused silica is preferred from the viewpoint of increasing the packing of the inorganic filler. Usually, silica is used in combination with one having several types of particle size distribution. The range of the average particle size of the silica to be combined is 0.5- ⁇ .
- the compounding amount of the inorganic filler is 75% by weight or more, preferably 80% by weight or more of the entire epoxy resin composition. If less than this, the effect of improving solder heat resistance and flame retardancy is small.
- the epoxy resin composition of the present invention may be added with a conventionally known curing accelerator, for example, amines, imidazoles, organic phosphines, Lewis acids and the like.
- a conventionally known curing accelerator for example, amines, imidazoles, organic phosphines, Lewis acids and the like.
- 1,8-diazabicyclo (5,4,0) pandecene-7 triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris (dimethylaminomethyl) phenol Tertiary amines, such as 2-methylimidazole, 2-phenylimidazole, 2-phenylimidazole, imidazoles such as 4-methylimidazole, 2-heptadecylimidazole, tributylphosphine, methyldiphenylphosphine, trif Enylphosphine, diphenylphosphine Organic phosphines such as fin
- tetraphenylboron salts such as ethynole-4-methylimidazolone'tetraphenylborate, N_methylmorpholine.tetraphenylporate and the like.
- the amount of addition is usually 0.210 parts by weight based on 100 parts by weight of the epoxy resin.
- the epoxy resin composition of the present invention includes a coupling agent such as a release agent such as carnauba wax or an ester wax, an epoxy silane, an amino silane, a ureido silane, a butyl silane, an alkyl silane, an organic titanate, or an aluminum alcoholate.
- a coupling agent such as a release agent such as carnauba wax or an ester wax, an epoxy silane, an amino silane, a ureido silane, a butyl silane, an alkyl silane, an organic titanate, or an aluminum alcoholate.
- the above-mentioned raw materials are sufficiently mixed in a predetermined amount by a mixer or the like, then kneaded by a mixing roll, an extruder, or the like, cooled, and pulverized to seal the electronic component.
- An epoxy resin composition suitable for stopping can be prepared.
- a low-pressure transfer molding method is the most common, but an injection molding method or a compression molding method is also possible.
- FIG. 1 shows a GPC chart of the epoxy resin A obtained in Example 1.
- the epoxy equivalent was 248, the softening point was 72 ° C, the melt viscosity at 150 ° C based on the ICI cone-plate method was 0.13 Pa's, and the hydrolyzable chlorine was 320 ppm.
- the GPC chart of the obtained resin is shown in FIG.
- the GPC measurement was performed using an apparatus: HLC-82A (manufactured by Tosoh Corporation) and a force ram: three TSK-GEL 2000 X and one TSK-GEL4000 X (both manufactured by Tosoh Corporation).
- Example 2 170 g of the naphthol resin obtained in Synthesis Example 2 and 30 g of 4,4, dihydroxybiphenyl are dissolved in 640 g of epichlorohydrin and 96 ⁇ Og of diethylene glycol dimethyl ether, and 48% sodium hydroxide at 65 ° C. under reduced pressure (about 140 mmHg). An aqueous solution of 94. Og was added dropwise over 4 hours. During this time, the generated water was removed from the system by azeotropic distillation with epichlorohydrin, and the distilled epichlorohydrin was returned to the system. After the addition, the reaction was continued for another 30 minutes.
- Synthesis Example 1 obtained in naphthol resin 200g of E peak chlorohydrin 640 g, and ⁇ military diethylene glycol Honoré dimethylcarbamoyl Honoré ether Honoré 96. 0 g, under reduced pressure (about 140mmHg), 48 0/0 water at 65 ° C acid 77.2 g of an aqueous sodium chloride solution was added dropwise over 4 hours. During this time, the generated water was removed from the system by azeotropy with the hydrin at the epichloro mouth, and the distilled epichlorohydrin was returned to the system. After the addition, the reaction was continued for another 30 minutes.
- Example 13 Epoxy resin synthesized in 1-3, Comparative Examples 1 and 2, 0-cresol novolak type epoxy resin (epoxy equivalent 197, softening point 54 ° C, melt viscosity at 150 ° C 90 mPa's; EOC N-1020, manufactured by Nippon Kayaku; epoxy resin F), phenol novolak (OH equivalent: 104, softening point: 46 mC, melt viscosity at 150 ° C: 20 mPa's; phenol resin A) and phenol aralkyl resin ( OH equivalent 175, softening point 75 ° C, melt viscosity at 150 ° C 0.32 Pa-s; MEH-780 0S, manufactured by Meiwa Kasei; phenol resin B), 1-naphthol aralkyl resin (OH equivalent 205, softening Melt viscosity at 77 ° C and 150 ° C 40mPa's; SN_475L, manufactured by Nippon Steel Chemical; phenolic
- the epoxy resin composition was molded at 175 ° C, post-cured at 175 ° C for 12 hours to obtain a cured product test piece, which was then subjected to various physical property measurements.
- the glass transition point was determined with a thermomechanical measuring device at a temperature rising rate of 7 ° C / min. Bending test at room temperature and 240 ° C
- the flexural modulus at high temperature and flexural modulus were measured by the three-point bending method.
- Adhesive strength was measured at 175 ° C using a compression molding machine at 25 ° C x 12.5mm X O.5mm between two copper or iron plates, and post-cured at 175 ° C for 12 hours. It was evaluated by determining the tensile shear strength.
- the blocking ratio after standing at 25 ° C. for 24 hours using powder of an lmm pass of the epoxy resin composition was expressed in terms of% by weight.
- the storage stability was represented by a residual spiral flow after the epoxy resin composition was left at 25 ° C. for one week.
- the epoxy resin composition of the present invention is excellent in moisture resistance, heat resistance, flame retardancy, adhesion to a metal substrate, and the like, and has good moldability, and is used as a sealing material for electronic and electric parts. It can be suitably used. Further, the epoxy resin cured product of the present invention and sealing with the same The obtained electronic parts have excellent heat resistance and electrical insulation. ADVANTAGE OF THE INVENTION According to the manufacturing method of the epoxy resin of this invention, epoxidation progresses easily and industrial implementation becomes possible.
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- Chemical Kinetics & Catalysis (AREA)
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- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
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Applications Claiming Priority (2)
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JP2004-036995 | 2004-02-13 | ||
JP2004036995A JP4667753B2 (ja) | 2004-02-13 | 2004-02-13 | エポキシ樹脂の製造方法、エポキシ樹脂組成物及び硬化物 |
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WO2005078001A1 true WO2005078001A1 (ja) | 2005-08-25 |
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PCT/JP2005/001763 WO2005078001A1 (ja) | 2004-02-13 | 2005-02-07 | エポキシ樹脂の製造方法、エポキシ樹脂組成物及び硬化物 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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US8981160B2 (en) | 2006-08-17 | 2015-03-17 | Nipponkayaku Kabushikikaisha | Modified liquid epoxy resin as well as epoxy resin composition using the same and cured product thereof |
Families Citing this family (2)
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WO2008143314A1 (ja) * | 2007-05-24 | 2008-11-27 | Nippon Kayaku Kabushiki Kaisha | 液状エポキシ樹脂、エポキシ樹脂組成物、および硬化物 |
CN102725323B (zh) * | 2010-05-26 | 2015-08-19 | 京瓷化成株式会社 | 片状树脂组合物、使用该片状树脂组合物的电路元器件、电子元器件的密封方法、连接方法及固定方法、以及复合片材、使用该复合片材的电子元器件、电子设备、复合片材的制造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02219812A (ja) * | 1989-02-21 | 1990-09-03 | Hitachi Ltd | 熱硬化性樹脂組成物及びそれを用いたコイル、パネル |
JPH0625385A (ja) * | 1992-07-08 | 1994-02-01 | Shin Etsu Chem Co Ltd | エポキシ樹脂組成物及び半導体装置 |
JPH0925334A (ja) * | 1995-07-13 | 1997-01-28 | Hitachi Ltd | エポキシ樹脂組成物 |
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JP2551452B2 (ja) * | 1988-03-11 | 1996-11-06 | 油化シェルエポキシ株式会社 | 封止用エポキシ樹脂組成物 |
JPH03716A (ja) * | 1989-05-30 | 1991-01-07 | Nippon Steel Chem Co Ltd | 新規なエポキシ化合物及びその製造方法 |
JP3315436B2 (ja) * | 1992-06-19 | 2002-08-19 | ジャパンエポキシレジン株式会社 | ビフェノール骨格含有エポキシ樹脂の製造方法 |
JP3933763B2 (ja) * | 1997-04-18 | 2007-06-20 | 新日鐵化学株式会社 | エポキシ樹脂組成物及び電子部品 |
-
2004
- 2004-02-13 JP JP2004036995A patent/JP4667753B2/ja not_active Expired - Fee Related
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- 2005-02-07 WO PCT/JP2005/001763 patent/WO2005078001A1/ja active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02219812A (ja) * | 1989-02-21 | 1990-09-03 | Hitachi Ltd | 熱硬化性樹脂組成物及びそれを用いたコイル、パネル |
JPH0625385A (ja) * | 1992-07-08 | 1994-02-01 | Shin Etsu Chem Co Ltd | エポキシ樹脂組成物及び半導体装置 |
JPH0925334A (ja) * | 1995-07-13 | 1997-01-28 | Hitachi Ltd | エポキシ樹脂組成物 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8981160B2 (en) | 2006-08-17 | 2015-03-17 | Nipponkayaku Kabushikikaisha | Modified liquid epoxy resin as well as epoxy resin composition using the same and cured product thereof |
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JP2005226004A (ja) | 2005-08-25 |
JP4667753B2 (ja) | 2011-04-13 |
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