WO2005038924A1 - 超解像画素電極の配置構造及び信号処理方法 - Google Patents
超解像画素電極の配置構造及び信号処理方法 Download PDFInfo
- Publication number
- WO2005038924A1 WO2005038924A1 PCT/JP2004/015863 JP2004015863W WO2005038924A1 WO 2005038924 A1 WO2005038924 A1 WO 2005038924A1 JP 2004015863 W JP2004015863 W JP 2004015863W WO 2005038924 A1 WO2005038924 A1 WO 2005038924A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- sensor
- electrode
- unit
- wiring
- units
- Prior art date
Links
- 238000003672 processing method Methods 0.000 title claims description 3
- 238000001514 detection method Methods 0.000 claims description 13
- 230000005251 gamma ray Effects 0.000 claims description 9
- 230000003321 amplification Effects 0.000 claims description 8
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 8
- 238000000605 extraction Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 abstract description 5
- 230000035945 sensitivity Effects 0.000 abstract description 3
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 10
- 230000005855 radiation Effects 0.000 description 8
- 239000000758 substrate Substances 0.000 description 5
- 229910004613 CdTe Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910004611 CdZnTe Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/48—Increasing resolution by shifting the sensor relative to the scene
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/30—Circuitry of solid-state image sensors [SSIS]; Control thereof for transforming X-rays into image signals
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/60—Noise processing, e.g. detecting, correcting, reducing or removing noise
- H04N25/67—Noise processing, e.g. detecting, correcting, reducing or removing noise applied to fixed-pattern noise, e.g. non-uniformity of response
- H04N25/671—Noise processing, e.g. detecting, correcting, reducing or removing noise applied to fixed-pattern noise, e.g. non-uniformity of response for non-uniformity detection or correction
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N5/00—Details of television systems
- H04N5/30—Transforming light or analogous information into electric information
- H04N5/32—Transforming X-rays
Definitions
- a detector made of a substance with a high atomic weight and high absorption capacity.
- the detection elements made of these materials are arranged linearly or two-dimensionally, and the current is read from the electrodes attached to each element.
- the read current is pre-amplified and subjected to signal processing to form a two-dimensionally arranged image signal.
- the capacitance between the preamplifier and the sensor has a large effect on the read signal, but in the case of a visible light sensor, the signal current amount can be large, so the effect is small, and It can also be adjusted in signal processing. Disclosure of the invention
- Nerugi one X-ray-gamma As semiconductor detector used for the detection of high engineering Nerugi one X-ray-gamma, a compound semiconductor of CdTe, CdZnTe, TlBr, if Hgl 2 is used as an image detector, these materials pieces of the single crystal as an element , Linear or two-dimensional The current from each electrode is led to an amplifier, amplified, and processed to the required signal level. At this time, it is a technology related to the wiring from the element to the amplifier.
- each element When these elements are arranged linearly or two-dimensionally, the spatial resolution is determined by the number of elements per unit area. Therefore, in order to increase the resolution, each element must be arranged at a high density, but there are limitations due to restrictions on the placement technology such as bonding.
- the elements are staggered and sparsely arranged while maintaining the element spacing.
- a sparse arrangement when a sparse arrangement is used, a signal at a location where an element is missing is supplemented with a signal from another element in time and space, and a technique for obtaining a high-angle image resolution when integrating the signals is used.
- This is referred to as a resolution pixel configuration.
- the amplification part can have a laminated structure with the sensor, and the fine processing technology can be sufficiently miniaturized, so there are not many wiring problems.
- FIG. 1 shows a connection from a linear linear sensor unit 1 to an amplifier unit 5.
- Fig. 1-a shows a sensor in which the sensor unit 1 and the amplification unit 5 are integrated. The sensor part 1 and the i-width unit 5 are formed in a plane.
- Fig. 1-b shows the sensor unit 1 and the amplification unit 5.
- the amplifier 5 has a two-story stacked structure, and the signal from the sensor is directly connected to the amplifier.
- the purpose is to focus on the relative value of each sensor rather than the absolute value of the capacitance, and to make the capacitance of each sensor equal. This is due to the large capacitance This is because the signal voltage fluctuates due to small size, and it becomes difficult to perform signal processing in the subsequent stage.
- the electrodes have the same shape so that the capacitance due to the wiring to the amplifier is exactly the same for each element.
- the difference in capacitance due to the difference in wiring length is adjusted by adjusting the wiring width.
- FIG. 1 is a diagram showing a conventional sensor.
- FIG. 2 is a diagram showing a staggered arrangement and a pixel shifted arrangement.
- FIG. 3 is a diagram showing an example in which the mount bases of the elements are made the same pattern and the capacitance is made uniform.
- FIG. 4 is a diagram showing an example in which the area of the mount base of the element is changed.
- FIG. 5 is a diagram showing an example in which two staggered element rows are arranged to face each other and shifted by a quarter pitch.
- FIG. 6 is a diagram showing the arrangement of lead lines from two-dimensional pins using flexible wiring.
- FIG. 7 is a diagram showing an arrangement of lead lines from connection pins on a single-layer wiring board.
- FIG. 8 is a diagram showing the arrangement of lead lines of a wiring section in each stage of the multilayer wiring board.
- FIG. 9 is a diagram showing a wiring lead-out structure (1) as viewed from the side of the sensor in the multilayer board.
- FIG. 10 is a view showing a wiring lead-out structure (2) as viewed from the side of the sensor in the multilayer board.
- FIG. 11 is a diagram showing a shield area as viewed from above the sensor. BEST MODE FOR CARRYING OUT THE INVENTION
- the photosensitive area of the sensor is staggered (Fig. 2-a), the pixel is shifted (Fig. 2-b), etc., aiming at high resolution, but in the case of visible light
- Fig. 3 shows the pattern of the electrode part 3 on the substrate on which the sensor is mounted.
- Fig. 3-a shows a conventional pattern.
- the capacitance is not uniform because the length of the electrode part 3 is different.
- the improved pattern of FIG. 3B according to the present invention in order to make the capacitance uniform, the electrode portion 3 is the same even if it is staggered even if it is odd or even. Be converted to In other words, the capacitance differs due to the difference in the length of the wiring, and the voltage generated from the same electric charge differs, which causes output fluctuation.
- the electrode structure is the same, and the part where the element is mounted is
- the electrode part 3 is left as a dummy part 2 as it is arranged as the sensor part 1 and the part where the element is not mounted.
- the mounted elements are arranged in a staggered manner.
- the dummy part 2 has a smaller area than the sensor part 1 as shown in FIG. In this case, the density of the sensor can be increased.
- the wiring is kept at an appropriate distance directly below it, shielded by a ground electrode, and the wiring is connected to the amplifier as a strip line.
- the part of the amplifier is covered by a metal shield such as lead to protect it from radiation.
- the thickness of this cover needs to be determined according to the energy level, but it is about 1 mm to 1 cm thick.
- the common electrode side of the device is connected to ground potential with a suitable conductive material.
- Figure 11 shows the shield area viewed from the top of the sensor.
- FIG. 4 shows that the capacitance is made uniform by changing the area of the electrode portion 3.
- the electrode section 3 shown in Fig. 4 is adjusted so that the electrode line width is reduced from the center of the element row to both ends, and the combined capacitance of the electrode section 3 and the wiring section 4 connected to the amplifier input is the same. I have.
- the mounting positions of the elements are staggered, but the capacitance is exactly the same from the viewpoint of the amplifier.
- Fig. 5 shows an example of doubling the number of pixels by arranging the staggered substrates face-to-face to achieve high resolution.
- Figure 5 shows an example in which two staggered element rows are arranged facing each other and shifted by a quarter pitch.
- one element is spatially composed of four elements.
- the adjacent elements can be read after the leakage signal from the adjacent element is attenuated, so that the influence of the signals of the adjacent elements can be avoided.
- pixel shift arrangement can be easily configured.
- high-energy rays do not enter both amplifiers at the same time, and the signals of the amplifiers that did not receive the temporary interruption can be supplemented by the signals of the amplifiers that did not receive the temporary interruption. Can restore high energy radiation interference.
- the two rows of the staggered arrangement at this time are referred to as row C and row D.
- Providing positioning irregularities 11 to face each other is useful for positioning.
- the present invention is devised to avoid the influence from the adjacent elements and to match the wiring capacitance so as to obtain a uniform signal.
- Two rows of staggered blocks are placed facing each other to form a four-row staggered arrangement.
- the facing blocks By arranging the facing blocks so as to be shifted by a quarter pitch, the elements in the four rows are shifted from each other by a quarter pitch.
- Chidori When the arrangement rows are arranged in a staggered arrangement of one block in A row and B row, the A row and B row are shifted by a half pitch.
- row C and row D row D is shifted by a quarter pitch from row A.
- Rows D and B are shifted by a quarter pitch
- rows B and C are also shifted by a quarter pitch.
- the elements can be arranged with a quarter pitch shift between each other.
- the reading order in the order of column A, column D, column B, and column C it is possible to extend the time interval for reading adjacent wiring, and to read signals from adjacent electrodes. Can be prevented.
- A, D, B, and C are read with a quarter-period phase difference between them, A and B, and C and D can read signals so as to avoid mutual influence. I can do it.
- the signals read out in columns A and B, and in columns C and D are amplified and signal processed by the opposing amplifiers but are spatially separated. This also means that the structure is less susceptible to fatal effects such as scattered radiation, and if so, the signal can be easily repaired.
- Special features of radiation detectors include the fact that high-energy radiation impinging on the amplifier damages the amplifier and must be located separately from the sensor, and must be spatially separated to avoid the effects of scattered radiation.
- the fact that the amplifiers are arranged in a pair at positions far apart from each other has an extremely great advantage when the image signal is restored.
- the arrangement of the leads shown in FIG. 7 is common on a printed circuit board. Also in this case, a structure for making the capacitance uniform can be adopted.
- the wiring of each stage is arranged as shown in FIG. 8, and the boards of each stage are overlapped as shown in FIG. 9, and the wiring from the sensor unit 1 is vertically penetrated and connected.
- the above-described structure for making the capacitance uniform can be used for these wirings.
- the patterns of the first to fourth stages can be arranged in reverse to that of FIG. Industrial applicability
- the capacitance of the wiring uniform, the sensitivity unevenness of the sensor is reduced, and the signal processing in the subsequent stage is simplified.
- the number of elements can be easily doubled, and by taking out the signal extraction sequence alternately from each of the opposing substrates, the influence of the leakage signal by the adjacent wiring is reduced. It reduces the number of images and sharpens the image.
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Measurement Of Radiation (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Light Receiving Elements (AREA)
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/576,413 US7402811B2 (en) | 2003-10-21 | 2004-10-20 | Ultra-high resolution pixel electrode arrangement structure and signal processing method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003360408A JP4635191B2 (ja) | 2003-10-21 | 2003-10-21 | 超解像画素電極の配置構造及び信号処理方法 |
JP2003-360408 | 2003-10-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005038924A1 true WO2005038924A1 (ja) | 2005-04-28 |
Family
ID=34463414
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/015863 WO2005038924A1 (ja) | 2003-10-21 | 2004-10-20 | 超解像画素電極の配置構造及び信号処理方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7402811B2 (ja) |
JP (1) | JP4635191B2 (ja) |
WO (1) | WO2005038924A1 (ja) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7238926B2 (en) * | 2005-06-01 | 2007-07-03 | Eastman Kodak Company | Shared amplifier pixel with matched coupling capacitances |
JP4765506B2 (ja) * | 2005-09-16 | 2011-09-07 | 大日本印刷株式会社 | 放射線検出パネルの製造方法、放射線検出パネル |
JP2007136050A (ja) * | 2005-11-22 | 2007-06-07 | National Univ Corp Shizuoka Univ | X線検出器アレイ |
JP4289377B2 (ja) * | 2006-08-21 | 2009-07-01 | ソニー株式会社 | 物理量検出装置及び撮像装置 |
JP4365844B2 (ja) * | 2006-09-08 | 2009-11-18 | 三菱電機株式会社 | 荷電粒子線の線量分布測定装置 |
JP4872779B2 (ja) * | 2007-04-24 | 2012-02-08 | ソニー株式会社 | 転送パルス供給回路及び固体撮像装置 |
JP2009047467A (ja) * | 2007-08-15 | 2009-03-05 | Rigaku Corp | 放射線検出装置 |
JP5017025B2 (ja) * | 2007-08-31 | 2012-09-05 | キヤノン株式会社 | 光電変換装置の駆動方法 |
WO2009112962A2 (en) * | 2008-03-13 | 2009-09-17 | Koninklijke Philips Electronics N.V. | Low-power tdc-adc and anger logic in radiation detection applications |
US8648932B2 (en) | 2009-08-13 | 2014-02-11 | Olive Medical Corporation | System, apparatus and methods for providing a single use imaging device for sterile environments |
JP2011071760A (ja) * | 2009-09-25 | 2011-04-07 | Canon Inc | 情報処理装置、情報処理装置のジョブ処理方法、及びプログラム |
AU2011230538B2 (en) | 2010-03-25 | 2016-01-07 | DePuy Synthes Products, Inc. | System and method for providing a single use imaging device for medical applications |
EP2567287B1 (en) * | 2010-05-03 | 2019-08-21 | InVisage Technologies, Inc. | Devices and methods for high-resolution image and video capture |
WO2012112153A1 (en) * | 2011-02-17 | 2012-08-23 | Analogic Corporation | Detector array having effective size larger than actual size |
BR112013029020A2 (pt) | 2011-05-12 | 2019-10-01 | Olive Medical Corp | sensor de imagem com elementos de interconexão de otimização de tolerância |
JP5661570B2 (ja) * | 2011-06-29 | 2015-01-28 | 富士フイルム株式会社 | 放射線検出器、放射線画像撮影装置、放射線画像撮影システムおよび配線容量調整方法 |
IN2015MN00019A (ja) | 2012-07-26 | 2015-10-16 | Olive Medical Corp | |
WO2014145248A1 (en) | 2013-03-15 | 2014-09-18 | Olive Medical Corporation | Minimize image sensor i/o and conductor counts in endoscope applications |
EP2967285B1 (en) | 2013-03-15 | 2023-08-16 | DePuy Synthes Products, Inc. | Image sensor synchronization without input clock and data transmission clock |
JP6553929B2 (ja) * | 2015-04-13 | 2019-07-31 | キヤノン株式会社 | 放射線撮像装置および撮像システム |
US10182200B2 (en) * | 2016-05-05 | 2019-01-15 | Pixart Imaging Inc. | High accuracy displacement detection system with offset pixel array |
KR102467846B1 (ko) | 2017-11-16 | 2022-11-16 | 삼성전자주식회사 | 이미지 센서 및 그 이미지 센서를 구비한 전자 장치 |
KR102634290B1 (ko) * | 2018-11-09 | 2024-02-06 | 동우 화인켐 주식회사 | 패드 전극부 및 이를 갖는 터치센서 |
SE2050777A1 (en) | 2020-06-26 | 2021-07-13 | Direct Conv Ab | Sensor unit, radiation detector, method of manufacturing sensor unit, and method of using sensor unit |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6139573A (ja) * | 1984-07-30 | 1986-02-25 | Fuji Xerox Co Ltd | 原稿読み取り装置 |
JPS6155959A (ja) * | 1984-08-27 | 1986-03-20 | Fuji Xerox Co Ltd | 原稿読み取り装置 |
JPS61295656A (ja) * | 1985-06-25 | 1986-12-26 | Toshiba Corp | イメ−ジセンサ |
JPS63272071A (ja) * | 1987-04-30 | 1988-11-09 | Fuji Xerox Co Ltd | イメ−ジセンサ |
JPH02118952U (ja) * | 1989-03-14 | 1990-09-25 | ||
JPH05236210A (ja) * | 1992-02-06 | 1993-09-10 | Nec Corp | 高分解能撮像方式 |
JPH0750743A (ja) * | 1993-12-28 | 1995-02-21 | Fuji Xerox Co Ltd | 原稿読取装置 |
JPH07161956A (ja) * | 1993-12-07 | 1995-06-23 | Fuji Xerox Co Ltd | イメージセンサ |
JP2000324406A (ja) * | 1999-05-07 | 2000-11-24 | Canon Inc | 光電変換装置及びそれを用いた画像読み取りシステム |
JP2002314060A (ja) * | 2001-04-11 | 2002-10-25 | Kanegafuchi Chem Ind Co Ltd | イメージセンサおよびその製造方法 |
JP2003057350A (ja) * | 2001-08-09 | 2003-02-26 | Canon Inc | 信号転送装置、光電変換装置、放射線検出装置及びシステム |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02118952A (ja) | 1988-10-26 | 1990-05-07 | Matsushita Electric Ind Co Ltd | ディスク装着装置 |
-
2003
- 2003-10-21 JP JP2003360408A patent/JP4635191B2/ja not_active Expired - Fee Related
-
2004
- 2004-10-20 WO PCT/JP2004/015863 patent/WO2005038924A1/ja active Application Filing
- 2004-10-20 US US10/576,413 patent/US7402811B2/en not_active Expired - Fee Related
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6139573A (ja) * | 1984-07-30 | 1986-02-25 | Fuji Xerox Co Ltd | 原稿読み取り装置 |
JPS6155959A (ja) * | 1984-08-27 | 1986-03-20 | Fuji Xerox Co Ltd | 原稿読み取り装置 |
JPS61295656A (ja) * | 1985-06-25 | 1986-12-26 | Toshiba Corp | イメ−ジセンサ |
JPS63272071A (ja) * | 1987-04-30 | 1988-11-09 | Fuji Xerox Co Ltd | イメ−ジセンサ |
JPH02118952U (ja) * | 1989-03-14 | 1990-09-25 | ||
JPH05236210A (ja) * | 1992-02-06 | 1993-09-10 | Nec Corp | 高分解能撮像方式 |
JPH07161956A (ja) * | 1993-12-07 | 1995-06-23 | Fuji Xerox Co Ltd | イメージセンサ |
JPH0750743A (ja) * | 1993-12-28 | 1995-02-21 | Fuji Xerox Co Ltd | 原稿読取装置 |
JP2000324406A (ja) * | 1999-05-07 | 2000-11-24 | Canon Inc | 光電変換装置及びそれを用いた画像読み取りシステム |
JP2002314060A (ja) * | 2001-04-11 | 2002-10-25 | Kanegafuchi Chem Ind Co Ltd | イメージセンサおよびその製造方法 |
JP2003057350A (ja) * | 2001-08-09 | 2003-02-26 | Canon Inc | 信号転送装置、光電変換装置、放射線検出装置及びシステム |
Also Published As
Publication number | Publication date |
---|---|
US20070057190A1 (en) | 2007-03-15 |
JP2005129558A (ja) | 2005-05-19 |
US7402811B2 (en) | 2008-07-22 |
JP4635191B2 (ja) | 2011-02-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2005038924A1 (ja) | 超解像画素電極の配置構造及び信号処理方法 | |
JP5358509B2 (ja) | 放射線検出器モジュール | |
JP5868575B2 (ja) | 接続基板 | |
US6403964B1 (en) | Modular imaging apparatus | |
US5220170A (en) | X-ray imaging system and solid state detector therefor | |
JP2008506945A (ja) | 放射線検出器ヘッド | |
US7339246B2 (en) | Sensor arrangement consisting of light-sensitive and/or X-ray sensitive sensors | |
JP2006506829A (ja) | 連結検出器ピクセル、光子/パルスカウント輻射線像形成素子 | |
US20010035497A1 (en) | Detector support device for detecting ionizing radiations | |
US8513617B2 (en) | Edge-on two-dimensional detector arrays | |
JP5070637B2 (ja) | 放射線画像検出モジュール | |
US6753915B1 (en) | Photoelectric Conversion Apparatus and Image Pickup Apparatus having an Optimally Positioned Driving Wire | |
WO1994021998A1 (en) | X-ray imaging system and solid state detector therefor | |
US6465790B1 (en) | Micro gamma camera with semiconducting detectors | |
KR20200144118A (ko) | 센서 유닛, 방사선 검출기 및 센서 유닛 제조 방법 | |
TWI826931B (zh) | 放射線攝像裝置 | |
JP2015141037A (ja) | 放射線検出器 | |
WO2022074732A1 (ja) | 放射線撮像装置 | |
WO2022074733A1 (ja) | 放射線撮像装置 | |
JP7473134B2 (ja) | センサユニット、放射線検出器、センサユニットを製造する方法、及びセンサユニットを使用する方法 | |
US7521683B2 (en) | X-ray detector | |
JP5457971B2 (ja) | 半導体x線検出器 | |
JP2015125063A (ja) | 放射線検出器 | |
JP2005328966A (ja) | 放射線撮像装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2007057190 Country of ref document: US Ref document number: 10576413 Country of ref document: US |
|
122 | Ep: pct application non-entry in european phase | ||
WWP | Wipo information: published in national office |
Ref document number: 10576413 Country of ref document: US |