WO2005037846A1 - シラン化合物、ポリシロキサンおよび感放射線性樹脂組成物 - Google Patents
シラン化合物、ポリシロキサンおよび感放射線性樹脂組成物 Download PDFInfo
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- WO2005037846A1 WO2005037846A1 PCT/JP2004/015150 JP2004015150W WO2005037846A1 WO 2005037846 A1 WO2005037846 A1 WO 2005037846A1 JP 2004015150 W JP2004015150 W JP 2004015150W WO 2005037846 A1 WO2005037846 A1 WO 2005037846A1
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- formula
- polysiloxane
- carbon atoms
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- -1 Silane compound Chemical class 0.000 title claims abstract description 286
- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 103
- 230000005855 radiation Effects 0.000 title claims abstract description 58
- 239000011342 resin composition Substances 0.000 title claims abstract description 35
- 229910000077 silane Inorganic materials 0.000 title claims abstract description 25
- 239000002253 acid Substances 0.000 claims abstract description 77
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 45
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 22
- 125000001153 fluoro group Chemical group F* 0.000 claims abstract description 15
- 125000004432 carbon atom Chemical group C* 0.000 claims description 50
- 150000001875 compounds Chemical class 0.000 claims description 38
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 23
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 23
- 125000002723 alicyclic group Chemical group 0.000 claims description 17
- 238000005227 gel permeation chromatography Methods 0.000 claims description 17
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 13
- 229910052799 carbon Inorganic materials 0.000 claims description 11
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 9
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 9
- 239000011737 fluorine Substances 0.000 claims description 8
- 125000000962 organic group Chemical group 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 239000004793 Polystyrene Substances 0.000 claims description 6
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 6
- 229920002223 polystyrene Polymers 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 125000001183 hydrocarbyl group Chemical class 0.000 claims 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 229920005989 resin Polymers 0.000 abstract description 19
- 239000011347 resin Substances 0.000 abstract description 19
- 239000002994 raw material Substances 0.000 abstract description 6
- 230000002194 synthesizing effect Effects 0.000 abstract description 5
- 238000006243 chemical reaction Methods 0.000 description 54
- 239000000243 solution Substances 0.000 description 53
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 51
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 49
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 39
- 239000000203 mixture Substances 0.000 description 37
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 33
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 26
- 229910052757 nitrogen Inorganic materials 0.000 description 25
- 238000009792 diffusion process Methods 0.000 description 20
- 239000007864 aqueous solution Substances 0.000 description 19
- 229920000642 polymer Polymers 0.000 description 19
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 17
- 150000002430 hydrocarbons Chemical class 0.000 description 17
- 238000000034 method Methods 0.000 description 16
- 235000006408 oxalic acid Nutrition 0.000 description 16
- 239000002904 solvent Substances 0.000 description 16
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 15
- 230000007423 decrease Effects 0.000 description 15
- 229960004063 propylene glycol Drugs 0.000 description 15
- 229910052710 silicon Inorganic materials 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 14
- 239000012153 distilled water Substances 0.000 description 14
- 239000010410 layer Substances 0.000 description 14
- 239000000047 product Substances 0.000 description 14
- 230000035945 sensitivity Effects 0.000 description 13
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 229940022663 acetate Drugs 0.000 description 12
- 238000011161 development Methods 0.000 description 12
- 230000018109 developmental process Effects 0.000 description 12
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 12
- 238000011156 evaluation Methods 0.000 description 12
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 12
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 12
- 230000008569 process Effects 0.000 description 12
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 11
- 230000002378 acidificating effect Effects 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 11
- 238000006068 polycondensation reaction Methods 0.000 description 11
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 11
- XEUCQOBUZPQUMQ-UHFFFAOYSA-N Glycolone Chemical compound COC1=C(CC=C(C)C)C(=O)NC2=C1C=CC=C2OC XEUCQOBUZPQUMQ-UHFFFAOYSA-N 0.000 description 10
- UWIULCYKVGIOPW-UHFFFAOYSA-N Glycolone Natural products CCOC1=C(CC=CC)C(=O)N(C)c2c(O)cccc12 UWIULCYKVGIOPW-UHFFFAOYSA-N 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 10
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical group C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 9
- 238000010992 reflux Methods 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 8
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 8
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 8
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 8
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 8
- 230000007547 defect Effects 0.000 description 8
- 230000007935 neutral effect Effects 0.000 description 8
- 239000012044 organic layer Substances 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 8
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 7
- 239000005977 Ethylene Substances 0.000 description 7
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 7
- 125000003118 aryl group Chemical group 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 238000004090 dissolution Methods 0.000 description 7
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 7
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 7
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- 238000005406 washing Methods 0.000 description 7
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 6
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 6
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 230000009471 action Effects 0.000 description 6
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical compound C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 6
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 6
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 150000001721 carbon Chemical group 0.000 description 6
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 6
- 238000010894 electron beam technology Methods 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 6
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 6
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 6
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 6
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000010835 comparative analysis Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000001312 dry etching Methods 0.000 description 5
- 235000019441 ethanol Nutrition 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229930195733 hydrocarbon Natural products 0.000 description 5
- 238000007689 inspection Methods 0.000 description 5
- 150000002576 ketones Chemical class 0.000 description 5
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 4
- AILVYPLQKCQNJC-UHFFFAOYSA-N 2,6-dimethylcyclohexan-1-one Chemical compound CC1CCCC(C)C1=O AILVYPLQKCQNJC-UHFFFAOYSA-N 0.000 description 4
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 4
- ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 2-octanone Chemical compound CCCCCCC(C)=O ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 0.000 description 4
- DWYHDSLIWMUSOO-UHFFFAOYSA-N 2-phenyl-1h-benzimidazole Chemical compound C1=CC=CC=C1C1=NC2=CC=CC=C2N1 DWYHDSLIWMUSOO-UHFFFAOYSA-N 0.000 description 4
- VQGHOUODWALEFC-UHFFFAOYSA-N 2-phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CC=N1 VQGHOUODWALEFC-UHFFFAOYSA-N 0.000 description 4
- AOKRXIIIYJGNNU-UHFFFAOYSA-N 3-methylcyclopentan-1-one Chemical compound CC1CCC(=O)C1 AOKRXIIIYJGNNU-UHFFFAOYSA-N 0.000 description 4
- JVZRCNQLWOELDU-UHFFFAOYSA-N 4-Phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=NC=C1 JVZRCNQLWOELDU-UHFFFAOYSA-N 0.000 description 4
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 4
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 4
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 4
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 4
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 4
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 4
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 4
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 4
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 4
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 4
- 150000001735 carboxylic acids Chemical class 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- 150000001924 cycloalkanes Chemical group 0.000 description 4
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 4
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 4
- QPMJENKZJUFOON-PLNGDYQASA-N ethyl (z)-3-chloro-2-cyano-4,4,4-trifluorobut-2-enoate Chemical compound CCOC(=O)C(\C#N)=C(/Cl)C(F)(F)F QPMJENKZJUFOON-PLNGDYQASA-N 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- OTTZHAVKAVGASB-UHFFFAOYSA-N hept-2-ene Chemical compound CCCCC=CC OTTZHAVKAVGASB-UHFFFAOYSA-N 0.000 description 4
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 4
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 4
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 4
- LPEKGGXMPWTOCB-UHFFFAOYSA-N methyl 2-hydroxypropionate Chemical compound COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 4
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 description 4
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 4
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 4
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 3
- LFSAPCRASZRSKS-UHFFFAOYSA-N 2-methylcyclohexan-1-one Chemical compound CC1CCCCC1=O LFSAPCRASZRSKS-UHFFFAOYSA-N 0.000 description 3
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 3
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 3
- LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical compound O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 150000003973 alkyl amines Chemical class 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- QDHFHIQKOVNCNC-UHFFFAOYSA-M butane-1-sulfonate Chemical compound CCCCS([O-])(=O)=O QDHFHIQKOVNCNC-UHFFFAOYSA-M 0.000 description 3
- 125000003262 carboxylic acid ester group Chemical group [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 description 3
- 150000001733 carboxylic acid esters Chemical group 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 150000003997 cyclic ketones Chemical class 0.000 description 3
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 3
- 125000006341 heptafluoro n-propyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)* 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 3
- PJGSXYOJTGTZAV-UHFFFAOYSA-N pinacolone Chemical compound CC(=O)C(C)(C)C PJGSXYOJTGTZAV-UHFFFAOYSA-N 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 150000003460 sulfonic acids Chemical class 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- SNICXCGAKADSCV-JTQLQIEISA-N (-)-Nicotine Chemical compound CN1CCC[C@H]1C1=CC=CN=C1 SNICXCGAKADSCV-JTQLQIEISA-N 0.000 description 2
- FHBXQJDYHHJCIF-UHFFFAOYSA-N (2,3-diaminophenyl)-phenylmethanone Chemical compound NC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1N FHBXQJDYHHJCIF-UHFFFAOYSA-N 0.000 description 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 2
- VKOQDQSVHAOFJL-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) butanoate Chemical compound CCCC(=O)OCCC(C)(C)OC VKOQDQSVHAOFJL-UHFFFAOYSA-N 0.000 description 2
- OWSKJORLRSWYGK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) propanoate Chemical compound CCC(=O)OCCC(C)(C)OC OWSKJORLRSWYGK-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- RXYPXQSKLGGKOL-UHFFFAOYSA-N 1,4-dimethylpiperazine Chemical compound CN1CCN(C)CC1 RXYPXQSKLGGKOL-UHFFFAOYSA-N 0.000 description 2
- BOGFHOWTVGAYFK-UHFFFAOYSA-N 1-[2-(2-propoxyethoxy)ethoxy]propane Chemical compound CCCOCCOCCOCCC BOGFHOWTVGAYFK-UHFFFAOYSA-N 0.000 description 2
- FUWDFGKRNIDKAE-UHFFFAOYSA-N 1-butoxypropan-2-yl acetate Chemical compound CCCCOCC(C)OC(C)=O FUWDFGKRNIDKAE-UHFFFAOYSA-N 0.000 description 2
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 2
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 2
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 2
- NRGGMCIBEHEAIL-UHFFFAOYSA-N 2-ethylpyridine Chemical compound CCC1=CC=CC=N1 NRGGMCIBEHEAIL-UHFFFAOYSA-N 0.000 description 2
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 2
- YGOFNNAZFZYNIX-UHFFFAOYSA-N 3-N-phenylbenzene-1,2,3-triamine Chemical compound NC=1C(=C(C=CC1)NC1=CC=CC=C1)N YGOFNNAZFZYNIX-UHFFFAOYSA-N 0.000 description 2
- JJYPMNFTHPTTDI-UHFFFAOYSA-N 3-methylaniline Chemical compound CC1=CC=CC(N)=C1 JJYPMNFTHPTTDI-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- KWOIWTRRPFHBSI-UHFFFAOYSA-N 4-[2-[3-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=CC(C(C)(C)C=2C=CC(N)=CC=2)=CC=1C(C)(C)C1=CC=C(N)C=C1 KWOIWTRRPFHBSI-UHFFFAOYSA-N 0.000 description 2
- VJXRKZJMGVSXPX-UHFFFAOYSA-N 4-ethylpyridine Chemical compound CCC1=CC=NC=C1 VJXRKZJMGVSXPX-UHFFFAOYSA-N 0.000 description 2
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical compound NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 2
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 2
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- WJYIASZWHGOTOU-UHFFFAOYSA-N Heptylamine Chemical compound CCCCCCCN WJYIASZWHGOTOU-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- SVYKKECYCPFKGB-UHFFFAOYSA-N N,N-dimethylcyclohexylamine Chemical compound CN(C)C1CCCCC1 SVYKKECYCPFKGB-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- XTUVJUMINZSXGF-UHFFFAOYSA-N N-methylcyclohexylamine Chemical compound CNC1CCCCC1 XTUVJUMINZSXGF-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N Propionic acid Chemical compound CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- DFPAKSUCGFBDDF-ZQBYOMGUSA-N [14c]-nicotinamide Chemical compound N[14C](=O)C1=CC=CN=C1 DFPAKSUCGFBDDF-ZQBYOMGUSA-N 0.000 description 2
- SZOJKESAWDFSND-UHFFFAOYSA-N acetic acid;2-methyl-2-[(2-methylpropan-2-yl)oxy]propane Chemical compound CC(O)=O.CC(C)(C)OC(C)(C)C SZOJKESAWDFSND-UHFFFAOYSA-N 0.000 description 2
- REEVUBVBEQNVEP-UHFFFAOYSA-N acetic acid;methyl acetate Chemical compound CC(O)=O.COC(C)=O REEVUBVBEQNVEP-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- 239000000908 ammonium hydroxide Substances 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- 230000001588 bifunctional effect Effects 0.000 description 2
- DGHQMSLDUXOQEO-UHFFFAOYSA-N butan-2-yl 2-hydroxypropanoate Chemical compound CCC(C)OC(=O)C(C)O DGHQMSLDUXOQEO-UHFFFAOYSA-N 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000006841 cyclic skeleton Chemical group 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 2
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 2
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 2
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- 229940117360 ethyl pyruvate Drugs 0.000 description 2
- LIWAQLJGPBVORC-UHFFFAOYSA-N ethylmethylamine Chemical compound CCNC LIWAQLJGPBVORC-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 125000001188 haloalkyl group Chemical group 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 125000006342 heptafluoro i-propyl group Chemical group FC(F)(F)C(F)(*)C(F)(F)F 0.000 description 2
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 2
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 2
- LKMUBWWZTSZGGV-UHFFFAOYSA-N methyl 4,4,4-trifluoro-3-oxobutanoate Chemical compound COC(=O)CC(=O)C(F)(F)F LKMUBWWZTSZGGV-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- FRQONEWDWWHIPM-UHFFFAOYSA-N n,n-dicyclohexylcyclohexanamine Chemical compound C1CCCCC1N(C1CCCCC1)C1CCCCC1 FRQONEWDWWHIPM-UHFFFAOYSA-N 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 229960002715 nicotine Drugs 0.000 description 2
- SNICXCGAKADSCV-UHFFFAOYSA-N nicotine Natural products CN1CCCC1C1=CC=CN=C1 SNICXCGAKADSCV-UHFFFAOYSA-N 0.000 description 2
- 235000001968 nicotinic acid Nutrition 0.000 description 2
- 239000011664 nicotinic acid Substances 0.000 description 2
- 229960003512 nicotinic acid Drugs 0.000 description 2
- 125000006344 nonafluoro n-butyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 2
- ZWRUINPWMLAQRD-UHFFFAOYSA-N nonan-1-ol Chemical compound CCCCCCCCCO ZWRUINPWMLAQRD-UHFFFAOYSA-N 0.000 description 2
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 2
- 229960002446 octanoic acid Drugs 0.000 description 2
- KJIFKLIQANRMOU-UHFFFAOYSA-N oxidanium;4-methylbenzenesulfonate Chemical compound O.CC1=CC=C(S(O)(=O)=O)C=C1 KJIFKLIQANRMOU-UHFFFAOYSA-N 0.000 description 2
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 125000000538 pentafluorophenyl group Chemical group FC1=C(F)C(F)=C(*)C(F)=C1F 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- ILVGAIQLOCKNQA-UHFFFAOYSA-N propyl 2-hydroxypropanoate Chemical compound CCCOC(=O)C(C)O ILVGAIQLOCKNQA-UHFFFAOYSA-N 0.000 description 2
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 2
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 2
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 2
- 125000001453 quaternary ammonium group Chemical group 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 235000017550 sodium carbonate Nutrition 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- IXXMVXXFAJGOQO-UHFFFAOYSA-N tert-butyl 2-hydroxypropanoate Chemical compound CC(O)C(=O)OC(C)(C)C IXXMVXXFAJGOQO-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- RYNQKSJRFHJZTK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) acetate Chemical compound COC(C)(C)CCOC(C)=O RYNQKSJRFHJZTK-UHFFFAOYSA-N 0.000 description 1
- DSSYKIVIOFKYAU-XCBNKYQSSA-N (R)-camphor Chemical group C1C[C@@]2(C)C(=O)C[C@@H]1C2(C)C DSSYKIVIOFKYAU-XCBNKYQSSA-N 0.000 description 1
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- PYSYKOPZHYNYSZ-UHFFFAOYSA-N 1,1,1,2,3,3-hexafluoro-2-(1,1,2,2,3,3,3-heptafluoropropoxy)-3-(1,2,2,2-tetrafluoroethoxy)propane Chemical compound FC(F)(F)C(F)OC(F)(F)C(F)(C(F)(F)F)OC(F)(F)C(F)(F)C(F)(F)F PYSYKOPZHYNYSZ-UHFFFAOYSA-N 0.000 description 1
- GRHYFDZMGZYXAP-UHFFFAOYSA-N 1,1,1,3,5,5,5-heptafluoropentane-2,4-dione Chemical compound FC(F)(F)C(=O)C(F)C(=O)C(F)(F)F GRHYFDZMGZYXAP-UHFFFAOYSA-N 0.000 description 1
- GILIYJDBJZWGBG-UHFFFAOYSA-N 1,1,1-trifluoropropan-2-ol Chemical compound CC(O)C(F)(F)F GILIYJDBJZWGBG-UHFFFAOYSA-N 0.000 description 1
- MAYNRHVBTKYGSD-UHFFFAOYSA-N 1,1,1-trifluoropropan-2-yl acetate Chemical compound FC(F)(F)C(C)OC(C)=O MAYNRHVBTKYGSD-UHFFFAOYSA-N 0.000 description 1
- HDCGZKPLSIIZAZ-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,6-tridecafluoro-n,n-bis(1,1,2,2,3,3,4,4,5,5,6,6,6-tridecafluorohexyl)hexan-1-amine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F HDCGZKPLSIIZAZ-UHFFFAOYSA-N 0.000 description 1
- GHBZJUJZNRLHBI-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,6-decafluoro-5,6-bis(trifluoromethyl)cyclohexane Chemical compound FC(F)(F)C1(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C1(F)C(F)(F)F GHBZJUJZNRLHBI-UHFFFAOYSA-N 0.000 description 1
- UDYXMTORTDACTG-UHFFFAOYSA-N 1,1,3-tributylthiourea Chemical compound CCCCNC(=S)N(CCCC)CCCC UDYXMTORTDACTG-UHFFFAOYSA-N 0.000 description 1
- 125000005657 1,3-cyclobutylene group Chemical group [H]C1([H])C([H])([*:1])C([H])([H])C1([H])[*:2] 0.000 description 1
- 125000005655 1,3-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:1])C([H])([H])C([H])([*:2])C1([H])[H] 0.000 description 1
- 125000005838 1,3-cyclopentylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:2])C([H])([H])C1([H])[*:1] 0.000 description 1
- PVDLUGWWIOGCNH-UHFFFAOYSA-N 1,3-difluoro-2-propanol Chemical compound FCC(O)CF PVDLUGWWIOGCNH-UHFFFAOYSA-N 0.000 description 1
- 125000004955 1,4-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:1])C([H])([H])C([H])([H])C1([H])[*:2] 0.000 description 1
- 125000004958 1,4-naphthylene group Chemical group 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- SGUVLZREKBPKCE-UHFFFAOYSA-N 1,5-diazabicyclo[4.3.0]-non-5-ene Chemical compound C1CCN=C2CCCN21 SGUVLZREKBPKCE-UHFFFAOYSA-N 0.000 description 1
- UZWOADNMVRRYDE-UHFFFAOYSA-N 1-(2,4-difluorophenyl)propan-1-one Chemical compound CCC(=O)C1=CC=C(F)C=C1F UZWOADNMVRRYDE-UHFFFAOYSA-N 0.000 description 1
- MKYMZVXJKBOGLV-UHFFFAOYSA-N 1-(trifluoromethoxy)propan-2-ol Chemical compound CC(O)COC(F)(F)F MKYMZVXJKBOGLV-UHFFFAOYSA-N 0.000 description 1
- 239000005968 1-Decanol Substances 0.000 description 1
- KZVBBTZJMSWGTK-UHFFFAOYSA-N 1-[2-(2-butoxyethoxy)ethoxy]butane Chemical compound CCCCOCCOCCOCCCC KZVBBTZJMSWGTK-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- CQXWYYNCCHWGOM-UHFFFAOYSA-N 1-bicyclo[2.2.1]heptanylsilane Chemical compound C1CC2CCC1([SiH3])C2 CQXWYYNCCHWGOM-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- KLXJPQNHFFMLIG-UHFFFAOYSA-N 1-ethoxy-2,2,2-trifluoroethanol Chemical compound CCOC(O)C(F)(F)F KLXJPQNHFFMLIG-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- 125000004066 1-hydroxyethyl group Chemical group [H]OC([H])([*])C([H])([H])[H] 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- NRKYWOKHZRQRJR-UHFFFAOYSA-N 2,2,2-trifluoroacetamide Chemical compound NC(=O)C(F)(F)F NRKYWOKHZRQRJR-UHFFFAOYSA-N 0.000 description 1
- DEXWRCYOMLUJRF-UHFFFAOYSA-N 2,2,2-trifluoroethyl butanoate Chemical compound CCCC(=O)OCC(F)(F)F DEXWRCYOMLUJRF-UHFFFAOYSA-N 0.000 description 1
- JJRRHZPKVSFERJ-UHFFFAOYSA-N 2,2,3,3,4,4,4-heptafluorobutyl acetate Chemical compound CC(=O)OCC(F)(F)C(F)(F)C(F)(F)F JJRRHZPKVSFERJ-UHFFFAOYSA-N 0.000 description 1
- PJDOLCGOTSNFJM-UHFFFAOYSA-N 2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-pentadecafluorooctan-1-ol Chemical compound OCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F PJDOLCGOTSNFJM-UHFFFAOYSA-N 0.000 description 1
- MSXVQELLSMPBFD-UHFFFAOYSA-N 2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9-hexadecafluorononan-1-ol Chemical compound OCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)F MSXVQELLSMPBFD-UHFFFAOYSA-N 0.000 description 1
- YUMDTEARLZOACP-UHFFFAOYSA-N 2,2,3,3,4,4,5,5,6,6-decafluorocyclohexan-1-one Chemical compound FC1(F)C(=O)C(F)(F)C(F)(F)C(F)(F)C1(F)F YUMDTEARLZOACP-UHFFFAOYSA-N 0.000 description 1
- MPXDAIBTYWGBSL-UHFFFAOYSA-N 2,4-difluoro-1-methylbenzene Chemical compound CC1=CC=C(F)C=C1F MPXDAIBTYWGBSL-UHFFFAOYSA-N 0.000 description 1
- SYOJIJGSPQLZAY-UHFFFAOYSA-N 2,6-dimethylphosphinine Chemical compound CC1=CC=CC(C)=P1 SYOJIJGSPQLZAY-UHFFFAOYSA-N 0.000 description 1
- YGJQVYPYTUOONJ-UHFFFAOYSA-N 2-(propoxymethyl)adamantane Chemical compound C1C(C2)CC3CC1C(COCCC)C2C3 YGJQVYPYTUOONJ-UHFFFAOYSA-N 0.000 description 1
- GTEXIOINCJRBIO-UHFFFAOYSA-N 2-[2-(dimethylamino)ethoxy]-n,n-dimethylethanamine Chemical compound CN(C)CCOCCN(C)C GTEXIOINCJRBIO-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- XHRCFGDFESIFRG-UHFFFAOYSA-N 2-chloro-n-ethyl-n-[(2-methylphenyl)methyl]ethanamine Chemical compound ClCCN(CC)CC1=CC=CC=C1C XHRCFGDFESIFRG-UHFFFAOYSA-N 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- UWQPDVZUOZVCBH-UHFFFAOYSA-N 2-diazonio-4-oxo-3h-naphthalen-1-olate Chemical class C1=CC=C2C(=O)C(=[N+]=[N-])CC(=O)C2=C1 UWQPDVZUOZVCBH-UHFFFAOYSA-N 0.000 description 1
- NDFPMZSLDATQFF-UHFFFAOYSA-N 2-diazonio-4-oxocyclohexa-1,5-dien-1-olate Chemical compound [N-]=[N+]=C1CC(=O)C=CC1=O NDFPMZSLDATQFF-UHFFFAOYSA-N 0.000 description 1
- ZVUNTIMPQCQCAQ-UHFFFAOYSA-N 2-dodecanoyloxyethyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OCCOC(=O)CCCCCCCCCCC ZVUNTIMPQCQCAQ-UHFFFAOYSA-N 0.000 description 1
- NGEWQZIDQIYUNV-UHFFFAOYSA-N 2-hydroxy-3-methylbutyric acid Chemical compound CC(C)C(O)C(O)=O NGEWQZIDQIYUNV-UHFFFAOYSA-N 0.000 description 1
- QGVQOXWNOSEKGM-UHFFFAOYSA-N 2-hydroxyacetic acid;prop-1-ene Chemical compound CC=C.OCC(O)=O QGVQOXWNOSEKGM-UHFFFAOYSA-N 0.000 description 1
- HXDLWJWIAHWIKI-UHFFFAOYSA-N 2-hydroxyethyl acetate Chemical compound CC(=O)OCCO HXDLWJWIAHWIKI-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- BWLBGMIXKSTLSX-UHFFFAOYSA-N 2-hydroxyisobutyric acid Chemical compound CC(C)(O)C(O)=O BWLBGMIXKSTLSX-UHFFFAOYSA-N 0.000 description 1
- 125000004398 2-methyl-2-butyl group Chemical group CC(C)(CC)* 0.000 description 1
- CJFUEPJVIFJOOU-UHFFFAOYSA-N 2-perfluorobutyltetrahydrofuran Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C1CCCO1 CJFUEPJVIFJOOU-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- WFCSWCVEJLETKA-UHFFFAOYSA-N 2-piperazin-1-ylethanol Chemical compound OCCN1CCNCC1 WFCSWCVEJLETKA-UHFFFAOYSA-N 0.000 description 1
- QMAQLCVJIYANPZ-UHFFFAOYSA-N 2-propoxyethyl acetate Chemical compound CCCOCCOC(C)=O QMAQLCVJIYANPZ-UHFFFAOYSA-N 0.000 description 1
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 description 1
- HDBGBTNNPRCVND-UHFFFAOYSA-N 3,3,3-trifluoropropan-1-ol Chemical compound OCCC(F)(F)F HDBGBTNNPRCVND-UHFFFAOYSA-N 0.000 description 1
- KSNKQSPJFRQSEI-UHFFFAOYSA-M 3,3,3-trifluoropropanoate Chemical compound [O-]C(=O)CC(F)(F)F KSNKQSPJFRQSEI-UHFFFAOYSA-M 0.000 description 1
- RBPHBIMHZSTIDT-UHFFFAOYSA-N 3,3,4,4,5,5,5-heptafluoropentan-2-ol Chemical compound CC(O)C(F)(F)C(F)(F)C(F)(F)F RBPHBIMHZSTIDT-UHFFFAOYSA-N 0.000 description 1
- HIYRIYOUSQLJHP-UHFFFAOYSA-N 3-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=CC(N)=CC=1C(C)(C)C1=CC=C(N)C=C1 HIYRIYOUSQLJHP-UHFFFAOYSA-N 0.000 description 1
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 1
- 229940018563 3-aminophenol Drugs 0.000 description 1
- GSFQHLMKIMLFLH-UHFFFAOYSA-N 3-butyladamantan-1-ol Chemical compound C1C(C2)CC3CC2(O)CC1(CCCC)C3 GSFQHLMKIMLFLH-UHFFFAOYSA-N 0.000 description 1
- WLTSXAIICPDFKI-UHFFFAOYSA-N 3-dodecene Chemical class CCCCCCCCC=CCC WLTSXAIICPDFKI-UHFFFAOYSA-N 0.000 description 1
- 125000004208 3-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C([H])C(*)=C1[H] 0.000 description 1
- 125000004921 3-methyl-3-pentyl group Chemical group CC(CC)(CC)* 0.000 description 1
- VLJSLTNSFSOYQR-UHFFFAOYSA-N 3-propan-2-ylphenol Chemical compound CC(C)C1=CC=CC(O)=C1 VLJSLTNSFSOYQR-UHFFFAOYSA-N 0.000 description 1
- CGRIOEGIXRPCJU-UHFFFAOYSA-N 4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,11-heptadecafluoroundecane-1,2-diol Chemical compound OCC(O)CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F CGRIOEGIXRPCJU-UHFFFAOYSA-N 0.000 description 1
- DAHZCNRVTNHGGR-UHFFFAOYSA-N 4,4,5,5,6,6,7,7,8,8,9,9,9-tridecafluorononane-1,2-diol Chemical compound OCC(O)CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F DAHZCNRVTNHGGR-UHFFFAOYSA-N 0.000 description 1
- MSKAVHSHJVKFBQ-UHFFFAOYSA-N 4-(2-phenylpropan-2-yl)aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=CC=C1 MSKAVHSHJVKFBQ-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- UYAFNMBGMXYWSZ-UHFFFAOYSA-N 4-(dimethylamino)-2-methylidenebutanamide Chemical compound CN(C)CCC(=C)C(N)=O UYAFNMBGMXYWSZ-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- NFGPNZVXBBBZNF-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]phenol Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(N)C=C1 NFGPNZVXBBBZNF-UHFFFAOYSA-N 0.000 description 1
- HESXPOICBNWMPI-UHFFFAOYSA-N 4-[2-[4-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=C(C(C)(C)C=2C=CC(N)=CC=2)C=CC=1C(C)(C)C1=CC=C(N)C=C1 HESXPOICBNWMPI-UHFFFAOYSA-N 0.000 description 1
- XNKDTTOZCUNJEZ-UHFFFAOYSA-N 4-aminophenol propane Chemical compound CCC.NC1=CC=C(C=C1)O XNKDTTOZCUNJEZ-UHFFFAOYSA-N 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- GCNTZFIIOFTKIY-UHFFFAOYSA-N 4-hydroxypyridine Chemical class OC1=CC=NC=C1 GCNTZFIIOFTKIY-UHFFFAOYSA-N 0.000 description 1
- QHPQWRBYOIRBIT-UHFFFAOYSA-N 4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C=C1 QHPQWRBYOIRBIT-UHFFFAOYSA-N 0.000 description 1
- VNPXSBILOLAXAT-UHFFFAOYSA-N 5,8-difluoro-2,3-dihydro-1,4-benzodioxine Chemical compound O1CCOC2=C1C(F)=CC=C2F VNPXSBILOLAXAT-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- SQNZLBOJCWQLGQ-UHFFFAOYSA-N 6,6,7,7,8,8,8-heptafluoro-2,2-dimethyloctane-3,5-dione Chemical compound CC(C)(C)C(=O)CC(=O)C(F)(F)C(F)(F)C(F)(F)F SQNZLBOJCWQLGQ-UHFFFAOYSA-N 0.000 description 1
- MCWDDAAVFNMHKO-UHFFFAOYSA-N 6-methylimidazo[2,1-b][1,3]thiazole-5-carbaldehyde Chemical compound S1C=CN2C(C=O)=C(C)N=C21 MCWDDAAVFNMHKO-UHFFFAOYSA-N 0.000 description 1
- JRLTTZUODKEYDH-UHFFFAOYSA-N 8-methylquinoline Chemical group C1=CN=C2C(C)=CC=CC2=C1 JRLTTZUODKEYDH-UHFFFAOYSA-N 0.000 description 1
- 241000114726 Acetes Species 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 101100434207 Arabidopsis thaliana ACT8 gene Proteins 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- HMKUJAZOPHMNSY-UHFFFAOYSA-N C1(=CC=CC=C1)C1=CC(=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)C4=CC=CC=C4 Chemical group C1(=CC=CC=C1)C1=CC(=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)C4=CC=CC=C4 HMKUJAZOPHMNSY-UHFFFAOYSA-N 0.000 description 1
- DRYOBTJUPKLKLU-UHFFFAOYSA-N CC(C)C(C(C(CCC(F)(F)F)=O)C(C(F)(F)F)=O)=O Chemical compound CC(C)C(C(C(CCC(F)(F)F)=O)C(C(F)(F)F)=O)=O DRYOBTJUPKLKLU-UHFFFAOYSA-N 0.000 description 1
- 241001517013 Calidris pugnax Species 0.000 description 1
- PMPVIKIVABFJJI-UHFFFAOYSA-N Cyclobutane Chemical compound C1CCC1 PMPVIKIVABFJJI-UHFFFAOYSA-N 0.000 description 1
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical compound C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 1
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical compound C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 description 1
- FPVVYTCTZKCSOJ-UHFFFAOYSA-N Ethylene glycol distearate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCCOC(=O)CCCCCCCCCCCCCCCCC FPVVYTCTZKCSOJ-UHFFFAOYSA-N 0.000 description 1
- AEMRFAOFKBGASW-UHFFFAOYSA-M Glycolate Chemical compound OCC([O-])=O AEMRFAOFKBGASW-UHFFFAOYSA-M 0.000 description 1
- 102100038720 Histone deacetylase 9 Human genes 0.000 description 1
- 101001032092 Homo sapiens Histone deacetylase 9 Proteins 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- YIKSCQDJHCMVMK-UHFFFAOYSA-N Oxamide Chemical compound NC(=O)C(N)=O YIKSCQDJHCMVMK-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- MZZINWWGSYUHGU-UHFFFAOYSA-J ToTo-1 Chemical compound [I-].[I-].[I-].[I-].C12=CC=CC=C2C(C=C2N(C3=CC=CC=C3S2)C)=CC=[N+]1CCC[N+](C)(C)CCC[N+](C)(C)CCC[N+](C1=CC=CC=C11)=CC=C1C=C1N(C)C2=CC=CC=C2S1 MZZINWWGSYUHGU-UHFFFAOYSA-J 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 239000005858 Triflumizole Substances 0.000 description 1
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical compound OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 1
- DUPFPCKBSBQVPC-UHFFFAOYSA-N [N].C1CN2CCN1CC2 Chemical compound [N].C1CN2CCN1CC2 DUPFPCKBSBQVPC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 125000004054 acenaphthylenyl group Chemical group C1(=CC2=CC=CC3=CC=CC1=C23)* 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- IPSOQTFPIWIGJT-UHFFFAOYSA-N acetic acid;1-propoxypropane Chemical compound CC(O)=O.CCCOCCC IPSOQTFPIWIGJT-UHFFFAOYSA-N 0.000 description 1
- KSZVHVUMUSIKTC-UHFFFAOYSA-N acetic acid;propan-2-one Chemical compound CC(C)=O.CC(O)=O KSZVHVUMUSIKTC-UHFFFAOYSA-N 0.000 description 1
- HXGDTGSAIMULJN-UHFFFAOYSA-N acetnaphthylene Natural products C1=CC(C=C2)=C3C2=CC=CC3=C1 HXGDTGSAIMULJN-UHFFFAOYSA-N 0.000 description 1
- VLLNJDMHDJRNFK-UHFFFAOYSA-N adamantan-1-ol Chemical compound C1C(C2)CC3CC2CC1(O)C3 VLLNJDMHDJRNFK-UHFFFAOYSA-N 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- QQQCWVDPMPFUGF-ZDUSSCGKSA-N alpinetin Chemical compound C1([C@H]2OC=3C=C(O)C=C(C=3C(=O)C2)OC)=CC=CC=C1 QQQCWVDPMPFUGF-ZDUSSCGKSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229960003805 amantadine Drugs 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 125000001204 arachidyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 235000008429 bread Nutrition 0.000 description 1
- QDHFHIQKOVNCNC-UHFFFAOYSA-N butane-1-sulfonic acid Chemical compound CCCCS(O)(=O)=O QDHFHIQKOVNCNC-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- WPMHFXGENQDHSS-UHFFFAOYSA-N butyl 3,3,3-trifluoropropanoate Chemical compound CCCCOC(=O)CC(F)(F)F WPMHFXGENQDHSS-UHFFFAOYSA-N 0.000 description 1
- MSMXWPURKINWLE-UHFFFAOYSA-N butyl N,N-didecylcarbamate Chemical compound CCCCCCCCCCN(C(=O)OCCCC)CCCCCCCCCC MSMXWPURKINWLE-UHFFFAOYSA-N 0.000 description 1
- FKCNTKCVNXZGGY-UHFFFAOYSA-N butyl n-nonylcarbamate Chemical compound CCCCCCCCCNC(=O)OCCCC FKCNTKCVNXZGGY-UHFFFAOYSA-N 0.000 description 1
- 125000004744 butyloxycarbonyl group Chemical group 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- MIOPJNTWMNEORI-UHFFFAOYSA-N camphorsulfonic acid Chemical compound C1CC2(CS(O)(=O)=O)C(=O)CC1C2(C)C MIOPJNTWMNEORI-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 125000000753 cycloalkyl group Chemical class 0.000 description 1
- 125000004981 cycloalkylmethyl group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- DDTBPAQBQHZRDW-UHFFFAOYSA-N cyclododecane Chemical group C1CCCCCCCCCCC1 DDTBPAQBQHZRDW-UHFFFAOYSA-N 0.000 description 1
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- WJTCGQSWYFHTAC-UHFFFAOYSA-N cyclooctane Chemical compound C1CCCCCCC1 WJTCGQSWYFHTAC-UHFFFAOYSA-N 0.000 description 1
- 239000004914 cyclooctane Substances 0.000 description 1
- XCIXKGXIYUWCLL-UHFFFAOYSA-N cyclopentanol Chemical compound OC1CCCC1 XCIXKGXIYUWCLL-UHFFFAOYSA-N 0.000 description 1
- YQLZOAVZWJBZSY-UHFFFAOYSA-N decane-1,10-diamine Chemical compound NCCCCCCCCCCN YQLZOAVZWJBZSY-UHFFFAOYSA-N 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- XXTZHYXQVWRADW-UHFFFAOYSA-N diazomethanone Chemical compound [N]N=C=O XXTZHYXQVWRADW-UHFFFAOYSA-N 0.000 description 1
- QVQGTNFYPJQJNM-UHFFFAOYSA-N dicyclohexylmethanamine Chemical compound C1CCCCC1C(N)C1CCCCC1 QVQGTNFYPJQJNM-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- 208000018459 dissociative disease Diseases 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- QFTYSVGGYOXFRQ-UHFFFAOYSA-N dodecane-1,12-diamine Chemical compound NCCCCCCCCCCCCN QFTYSVGGYOXFRQ-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012156 elution solvent Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- ZKRJCMKLCDWROR-ONEGZZNKSA-N ethyl (e)-4,4,4-trifluorobut-2-enoate Chemical compound CCOC(=O)\C=C\C(F)(F)F ZKRJCMKLCDWROR-ONEGZZNKSA-N 0.000 description 1
- JVHJRIQPDBCRRE-UHFFFAOYSA-N ethyl 2,2,3,3,4,4,4-heptafluorobutanoate Chemical compound CCOC(=O)C(F)(F)C(F)(F)C(F)(F)F JVHJRIQPDBCRRE-UHFFFAOYSA-N 0.000 description 1
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 1
- GFUIDHWFLMPAGY-UHFFFAOYSA-N ethyl 2-hydroxy-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)O GFUIDHWFLMPAGY-UHFFFAOYSA-N 0.000 description 1
- ZWEDFBKLJILTMC-UHFFFAOYSA-N ethyl 4,4,4-trifluoro-3-hydroxybutanoate Chemical compound CCOC(=O)CC(O)C(F)(F)F ZWEDFBKLJILTMC-UHFFFAOYSA-N 0.000 description 1
- SRVTXLPAWBTQSA-UHFFFAOYSA-N ethyl 4,4,4-trifluoro-3-methylbutanoate Chemical compound CCOC(=O)CC(C)C(F)(F)F SRVTXLPAWBTQSA-UHFFFAOYSA-N 0.000 description 1
- PSRZMXNNQTWAGB-UHFFFAOYSA-N ethyl 4,4,4-trifluorobutanoate Chemical compound CCOC(=O)CCC(F)(F)F PSRZMXNNQTWAGB-UHFFFAOYSA-N 0.000 description 1
- KNFXXAGQEUUZAZ-UHFFFAOYSA-N ethyl ethaneperoxoate Chemical compound CCOOC(C)=O KNFXXAGQEUUZAZ-UHFFFAOYSA-N 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- ZQTYQMYDIHMKQB-UHFFFAOYSA-N exo-norborneol Chemical compound C1CC2C(O)CC1C2 ZQTYQMYDIHMKQB-UHFFFAOYSA-N 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 125000004175 fluorobenzyl group Chemical group 0.000 description 1
- RQIOMXQOMYOGKD-UHFFFAOYSA-N fluorocyclohexane Chemical compound FC1[CH]CCCC1 RQIOMXQOMYOGKD-UHFFFAOYSA-N 0.000 description 1
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229940100608 glycol distearate Drugs 0.000 description 1
- 150000008282 halocarbons Chemical group 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- QVTWBMUAJHVAIJ-UHFFFAOYSA-N hexane-1,4-diol Chemical compound CCC(O)CCCO QVTWBMUAJHVAIJ-UHFFFAOYSA-N 0.000 description 1
- NDOGLIPWGGRQCO-UHFFFAOYSA-N hexane-2,4-dione Chemical compound CCC(=O)CC(C)=O NDOGLIPWGGRQCO-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 229960004592 isopropanol Drugs 0.000 description 1
- LGYTZKPVOAIUKX-UHFFFAOYSA-N kebuzone Chemical compound O=C1C(CCC(=O)C)C(=O)N(C=2C=CC=CC=2)N1C1=CC=CC=C1 LGYTZKPVOAIUKX-UHFFFAOYSA-N 0.000 description 1
- 229960000194 kebuzone Drugs 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- XOCNYZFAMHDXJK-UHFFFAOYSA-N methyl 2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-pentadecafluorooctanoate Chemical compound COC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F XOCNYZFAMHDXJK-UHFFFAOYSA-N 0.000 description 1
- QJFHNYDPNSFJMR-UHFFFAOYSA-N methyl 2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-nonadecafluorodecanoate Chemical compound COC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F QJFHNYDPNSFJMR-UHFFFAOYSA-N 0.000 description 1
- CFNCFMKWDPDIPT-UHFFFAOYSA-N methyl 2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-heptadecafluorononanoate Chemical compound COC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F CFNCFMKWDPDIPT-UHFFFAOYSA-N 0.000 description 1
- YPGCUXBNTDXTKF-UHFFFAOYSA-N methyl 2,3,3,3-tetrafluoropropanoate Chemical compound COC(=O)C(F)C(F)(F)F YPGCUXBNTDXTKF-UHFFFAOYSA-N 0.000 description 1
- YSGBMDFJWFIEDF-UHFFFAOYSA-N methyl 2-hydroxy-3-methylbutanoate Chemical compound COC(=O)C(O)C(C)C YSGBMDFJWFIEDF-UHFFFAOYSA-N 0.000 description 1
- YLRJDXIQQPRCNS-UHFFFAOYSA-N methyl 3-(trifluoromethoxy)propanoate Chemical compound COC(=O)CCOC(F)(F)F YLRJDXIQQPRCNS-UHFFFAOYSA-N 0.000 description 1
- CAAULPUQFIIOTL-UHFFFAOYSA-N methyl dihydrogen phosphate Chemical compound COP(O)(O)=O CAAULPUQFIIOTL-UHFFFAOYSA-N 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- DAZXVJBJRMWXJP-UHFFFAOYSA-N n,n-dimethylethylamine Chemical compound CCN(C)C DAZXVJBJRMWXJP-UHFFFAOYSA-N 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- GMTCPFCMAHMEMT-UHFFFAOYSA-N n-decyldecan-1-amine Chemical compound CCCCCCCCCCNCCCCCCCCCC GMTCPFCMAHMEMT-UHFFFAOYSA-N 0.000 description 1
- VXPJBVRYAHYMNY-UHFFFAOYSA-N n-methyl-2-[2-(methylamino)ethoxy]ethanamine Chemical compound CNCCOCCNC VXPJBVRYAHYMNY-UHFFFAOYSA-N 0.000 description 1
- NZOLSRPWNVZXTK-UHFFFAOYSA-N n-methyladamantan-1-amine Chemical compound C1C(C2)CC3CC2CC1(NC)C3 NZOLSRPWNVZXTK-UHFFFAOYSA-N 0.000 description 1
- JACMPVXHEARCBO-UHFFFAOYSA-N n-pentylpentan-1-amine Chemical compound CCCCCNCCCCC JACMPVXHEARCBO-UHFFFAOYSA-N 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical class C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- LRTFPLFDLJYEKT-UHFFFAOYSA-N para-isopropylaniline Chemical compound CC(C)C1=CC=C(N)C=C1 LRTFPLFDLJYEKT-UHFFFAOYSA-N 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229950008618 perfluamine Drugs 0.000 description 1
- 229950011087 perflunafene Drugs 0.000 description 1
- LOQGSOTUHASIHI-UHFFFAOYSA-N perfluoro-1,3-dimethylcyclohexane Chemical compound FC(F)(F)C1(F)C(F)(F)C(F)(F)C(F)(F)C(F)(C(F)(F)F)C1(F)F LOQGSOTUHASIHI-UHFFFAOYSA-N 0.000 description 1
- FYJQJMIEZVMYSD-UHFFFAOYSA-N perfluoro-2-butyltetrahydrofuran Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C1(F)OC(F)(F)C(F)(F)C1(F)F FYJQJMIEZVMYSD-UHFFFAOYSA-N 0.000 description 1
- UWEYRJFJVCLAGH-IJWZVTFUSA-N perfluorodecalin Chemical compound FC1(F)C(F)(F)C(F)(F)C(F)(F)[C@@]2(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[C@@]21F UWEYRJFJVCLAGH-IJWZVTFUSA-N 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- AQZYBQIAUSKCCS-UHFFFAOYSA-N perfluorotripentylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F AQZYBQIAUSKCCS-UHFFFAOYSA-N 0.000 description 1
- JAJLKEVKNDUJBG-UHFFFAOYSA-N perfluorotripropylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)F JAJLKEVKNDUJBG-UHFFFAOYSA-N 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 150000008379 phenol ethers Chemical group 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 150000004885 piperazines Chemical class 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920000083 poly(allylamine) Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- QLNJFJADRCOGBJ-UHFFFAOYSA-N propionamide Chemical compound CCC(N)=O QLNJFJADRCOGBJ-UHFFFAOYSA-N 0.000 description 1
- 229940080818 propionamide Drugs 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003216 pyrazines Chemical class 0.000 description 1
- VJUHYIKUHCCGOR-UHFFFAOYSA-N pyridine 1H-quinolin-4-one Chemical class OC1=CC=NC2=CC=CC=C12.N1=CC=CC=C1 VJUHYIKUHCCGOR-UHFFFAOYSA-N 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- HSMVPDGQOIQYSR-KGENOOAVSA-N triflumizole Chemical compound C1=CN=CN1C(/COCCC)=N/C1=CC=C(Cl)C=C1C(F)(F)F HSMVPDGQOIQYSR-KGENOOAVSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- VEDJZFSRVVQBIL-UHFFFAOYSA-N trisilane Chemical compound [SiH3][SiH2][SiH3] VEDJZFSRVVQBIL-UHFFFAOYSA-N 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229940075420 xanthine Drugs 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Definitions
- the present invention relates to a silane conjugate, a polysiloxane, and a radiation-sensitive resin composition.
- the present invention relates to a novel silani conjugate, a novel polysiloxane, and a radiation-sensitive resin containing the polysiloxane and suitable for fine processing using radiation such as far ultraviolet rays, electron beams, and X-rays. Composition.
- One of the means that can respond to the miniaturization of such wiring patterns is to shorten the wavelength of radiation used in the lithography process.
- g-line wavelength 436 nm
- i-line wavelength 365 nm
- Far ultraviolet rays such as KrF excimer laser (wavelength 248 nm), ArF excimer laser (wavelength 193 nm) and F2 excimer laser (wavelength 157 nm), electron beams, X-rays, etc. are being used instead of ultraviolet rays. I have.
- siloxane polymer e.g., J. Photopolym. Sci. TechnoL, Vol. 12, No. 4 (1999) P. 561-570, SPIE, Vol.3678 (1999) P.13-23).
- polysiloxane-based It is also known that a polymer is excellent in dry etching resistance, and in particular, a resist containing a polyorganopolysilsesquioxane having a ladder structure has high plasma resistance.
- some chemically amplified resists using siloxane polymers have already been reported. That is, radiation sensitivity using a polysiloxane having an acid-dissociable group in a side chain, in which an acid-dissociable group such as a carboxylic acid ester group or a phenol ether group is bonded to a silicon atom via one or more carbon atoms.
- a resin composition has been disclosed (see, for example, JP-A-5-323611).
- a positive resist using a polymer in which a carboxyl group of poly (2-carboxyethylsiloxane) is protected by an acid-dissociable group such as t-butyl group is disclosed (for example, Japanese Patent Application Laid-Open No. 8-160623). reference.;).
- the resist has a low protection ratio of carboxyl groups, a large amount of a carboxylic acid component is present in an unexposed portion, and development with a normal alkali developing solution is difficult.
- this polyorganosilsesquioxane Sesquioxane is produced by adding an acid-dissociable group-containing (meth) acrylic monomer to a condensation product such as vinyl trialkoxysilane or ⁇ -methacryloxypropyl trialkoxysilane. Since the unsaturated groups derived from the (meth) acrylic monomer remain in the chain, there is a problem in terms of transparency at wavelengths of 193 nm or less.
- the publication also discloses a resist resin composition using a polymer obtained by esterifying polyhydroxycanoleboninoleetinoresinoreses sesquioxane with t-butyl alcohol. This polymer also has a low carboxyl group protection rate. There is a problem similar to that of Japanese Unexamined Patent Publication No. 8-160623 as a resist to be used.
- the acid-dissociable group in the siloxane-based polymer can be dissociated at a relatively low temperature, and the temperature of the heat treatment after exposure can be reduced. Yes, resulting in moderate suppression of acid diffusion caused by exposure It is also required that when a line 'and' space pattern is formed, the line width of the line pattern is not easily changed due to the density of the pattern (ie, ID bias).
- Japanese Patent Application Laid-Open No. 2002-268225 discloses a carboxylic acid ester group esterified with an acid labile group (t-butyl group, 1-methylcyclohexyl group, 1-ethylcyclopentyl group, etc.) and a fluorine atom.
- a high molecular weight compound having a cyclic organic group substituted with a fluoroalkyl group and having a siloxane-based repeating unit in which the cyclic organic group is bonded to a silicon atom more specifically, 2t butoxycarbol-2-trifluoro Oromethyl-5 (6) -trichlorosilylnorbornane and 2-hydroxy-2-trifluoromethyl-5 (6) -trichloro mouth Polycondensate with silylnorbornane and 2-t butoxycarbol-ru-2-trifluoromethyl- 5 (6) -Trichlorosilylnorbornane and 2- [2-hydroxy-2,2-di (trifluoromethyl) ethyl] -5 (6) -Trichlorosilylnorbornane
- a chemically amplified resist containing the polycondensate and the polymer compound is disclosed, and the chemically amplified resist is said to be excellent in sensitivity, resolution and plasma etching resistance.
- process margins such as ID bias and depth of focus (OF) have become important characteristics of recent chemically amplified resists, including the use of siloxane polymers, as resist patterns have become finer. Therefore, there is a strong demand for a chemically amplified resist having an excellent property balance including such a process margin.
- An object of the present invention is to provide a radiation-sensitive resin having high transparency at a wavelength of 193 nm or less, and particularly useful as a chemically amplified resist excellent in property balance including process tolerance such as ID bias and depth of focus (DOF).
- An object of the present invention is to provide a novel polysiloxane suitable as a resin component in a composition.
- Another object of the present invention is to provide a radiation-sensitive resin composition containing the polysiloxane and being useful as a chemically amplified resist excellent in the balance of characteristics including the process tolerance.
- Still another object of the present invention is to provide a novel silani conjugate which is useful as a raw material for synthesizing the polysiloxane.
- the present invention firstly
- silane-bonded compound (1) also provides power.
- each R independently represents a linear, branched or cyclic alkyl group having 120 carbon atoms
- R 1 and R 2 each independently represent a fluorine atom
- n is 0 or 1
- k is 1 or 2
- the present invention secondly,
- polysiloxane (1) having a structural unit represented by the following formula (1) and having a polystyrene-equivalent weight average molecular weight of 500 to 1,000,000 by gel permeation chromatography (GPC) (hereinafter referred to as "polysiloxane (1)”) It consists of).
- R 1 and R 2 are each independently a fluorine atom, a linear or branched alkyl group having 114 carbon atoms or a linear or branched alkyl group having 114 carbon atoms.
- n is 0 or 1
- k is 1 or 2
- k 2. is there.
- the present invention is, thirdly,
- a radiation-sensitive resin composition comprising (A) a polysiloxane (1) and (B) a radiation-sensitive acid generator.
- examples of the linear, branched or cyclic alkyl group having 1 to 20 carbon atoms of R include a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, — Methylpropyl, 1-methylpropyl, t-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nor, n-decyl, n-dodecyl And n-tetradecyl, n-hexadecyl, n-octadecyl, eicosyl, cyclopentyl, cyclohexyl and the like.
- these alkyl groups a methyl group, an ethyl group and the like are preferable.
- examples of the linear or branched alkyl group having 1 to 4 carbon atoms of R 1 and R 2 include a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, Examples thereof include a 2-methylpropyl group, a 1-methylpropyl group and a t-butyl group.
- alkyl groups a methyl group, an ethyl group and the like are preferable.
- Examples of the linear or branched fluorinated alkyl group having 1 to 4 carbon atoms of R 1 and R 2 include, for example, a fluoromethyl group, a trifluoromethyl group, a 2,2,2-trifluoroethyl group , Pentafluoroethyl, 3,3,3 trifluoro-n-propyl, 3,3,3,2, pentafluoro-n-propyl, heptafluoro-n-propyl, 4,4,4 trifluoron-butyl And 4,4,4,3,3 pentafluoro-n-butyl groups, 4,4,4,3,3,2,2-heptafluoro-n-butyl groups, nonafluoro-n-butyl groups and the like.
- fluorinated alkyl groups trifluoromethyl, 2,2,2-trifluoroethyl, pentafluoroethyl and the like are preferred.
- R 1 and R 2 are particularly preferably a fluorine atom, a methyl group, an ethyl group, a trifluoromethyl group, a 2,2,2-trifluoroethyl group, a pentafluoroethyl group and the like.
- n is preferably 0 and 1 are both preferable m is 1 and 2 are both preferable i is 0-2.
- silani conjugate (I) examples include a compound represented by the following formula (PI-I) —formula (G1-4)), a compound represented by the following formula (1-2-1) —formula (1) -2-4).
- trisilane silane and a corresponding derivative of bicyclo [2.2.1] hept-2-ene or tetracyclo [4.4.0] may be used.
- I 7 ' 10 ] can be synthesized by an addition reaction with a corresponding derivative of dodeca 3ene in the presence of chloroplatinic acid (H2PtC16).
- Silane conjugate (I) is a raw material for synthesizing polysiloxane (1) and polysiloxane (1-1). It can be used very suitably as a raw material, and is also useful as a raw material or intermediate for synthesizing other related silane compounds or other polysiloxanes.
- the polysiloxane (1) is a polysiloxane having a structural unit represented by the formula (1) (hereinafter, referred to as “structural unit (1)”).
- the carboxylic acid ester structure in the formula (1) forms an acid dissociable group that dissociates by the action of an acid to generate a carboxyl group.
- examples of the linear or branched alkyl group having 1 to 4 carbon atoms of R 1 and R 2 and the linear or branched fluorinated alkyl group having 14 carbon atoms include, for example, Examples of the linear or branched alkyl group having 14 to 14 carbon atoms and the linear or branched fluorinated alkyl group having 14 carbon atoms of R 1 and R 2 in the formula (I) are exemplified. The same groups as mentioned above can be mentioned.
- R 1 is particularly preferably a methyl group, an ethyl group, a propyl group, a butyl group and the like.
- R 2 is particularly a fluorine atom, a methyl group, an ethyl group and a trifluoromethyl group. , 2,2,2-trifluoroethyl group, pentafluoroethyl group and the like are preferable k is 1 and 2 are both preferable i is particularly preferably 0.
- the structural unit (1) is a unit obtained by condensing the above-mentioned silane compound (I) at three OR groups bonded to its silicon atom, and a preferred specific example thereof is a silane compound (I) Preferably, LV, a compound represented by the above formula ⁇ -1-l) —formula (1-1-4)) or a compound represented by the above formula (1-2-1) —formula (1-2-4)
- the structural unit (1) may be present alone or in combination of two or more.
- the polysiloxane (1) can have one or more structural units other than the structural unit (1) (hereinafter, referred to as “other structural units (H)”).
- the other structural unit (H) is, for example, a structural unit represented by the following formula (3), (4) or (5).
- structural units derived from styrene structural units derived from bifunctional silani conjugates in the condensation reaction are listed. Can go
- E represents a monovalent organic group having a fluorinated hydrocarbon group.
- R 4 is a linear or branched, cyclic, or polycyclic alkyl group having a carbon number of 120, a linear or branched alkyl group having a carbon number of 120, 6 carbon atoms O0SI
- a monovalent aromatic hydrocarbon group having 20 or a monovalent halogenated aromatic hydrocarbon group having 6 to 20 carbon atoms is shown.
- examples of the monovalent organic group having a fluorinated hydrocarbon group of E include a group represented by the following formula (6) or (7).
- each Y independently represents a divalent hydrocarbon group having a cyclic skeleton and having 4 to 20 carbon atoms, and the divalent hydrocarbon group is substituted.
- Each Z independently represents a hydrogen atom, a monovalent hydrocarbon group having 1 to 10 carbon atoms or a monovalent halogenated hydrocarbon group having 1 to 10 carbon atoms.
- one of Y and Z is a group having a fluorine atom.
- examples of the divalent hydrocarbon group having 420 to 20 carbon atoms having a cyclic skeleton of Y and a substituted derivative thereof include:
- a group having a bridged alicyclic skeleton such as a group represented by the following formula ( ⁇ -4) -1 ( ⁇ -19)
- the group having a cycloalkane skeleton, the group having an aromatic skeleton and the group having a bridged alicyclic skeleton are those having a cycloalkane skeleton, an aromatic skeleton and a bridged alicyclic skeleton represented by the formula (2): It is preferable to bond directly to the silicon atom of.
- ⁇ is preferably a group having a norbornane skeleton or a tetracyclododecane skeleton, more preferably a group substituted with a fluorine atom or a trifluoromethyl group, and particularly preferably a group represented by the formula ( ⁇ —4), a group represented by the formula ( ⁇ —6), a formula ( ⁇ —9), or a formula (Y-10).
- Examples of the 1-valent monovalent hydrocarbon group having 1 to 10 carbon atoms include a methyl group, an ethyl group, an ⁇ -propyl group, an i-propyl group, an n-butyl group, a 2-methylpropyl group and a 1-methylpropyl group.
- a methyl group, an ethyl group, an ⁇ propyl group, an ⁇ butyl group and the like are preferable.
- Examples of the monovalent monovalent hydrocarbon group having 1 to 10 carbon atoms include, for example, the monovalent hydrocarbon group having 1 to 10 carbon atoms, such as a fluorine atom, a chlorine atom, and a bromine atom.
- One or more, or preferably one or more, preferably one or more fluorine-substituted groups can be mentioned, and specific examples thereof include trifluoromethyl group, 2, 2, 2 triflumizole Ruo Roe butyl group, penta full O Roe butyl group, 3, 3, 3-doo Rifuruoro eta - propyl, 3, 3, 3, 2, 2-pentafluoro-over eta propyl, Heputafu Fluoro ⁇ —propyl group, 4,4,4 trifluoro- ⁇ butyl group, 4,4,4,3,3-pentafluoro ⁇ —butyl group, 4,4,4,3,3,2,2-h
- ⁇ is particularly preferably a hydrogen atom, a heptafluoro- ⁇ -propyl group, or the like.
- a linear or branched alkyl group having 120 carbon atoms of R 4 For example, methyl, ethyl, n-propyl, i-propyl, n-butyl, 2-methylpropyl, 1-methylpropyl, t-butyl, n-pentyl, n-hexyl, n-heptyl Group, n-octyl group, n-nor group, n-decyl group and the like.
- Examples of the linear or branched halogenated alkyl group having 1200 carbon atoms include a trifluoromethyl group, Examples thereof include a pentafluoroethyl group, a heptafluoro- n -propyl group, and a heptafluoro-i-propyl group.
- Examples of the monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms include a phenyl group and an ⁇ -group. Examples thereof include a naphthyl group, a j8-naphthyl group, a benzyl group, and a phenethyl group.
- Examples of the monovalent halogenated aromatic hydrocarbon group having 6 to 20 carbon atoms include a pentafluorophenyl group, Par Fluoro-benzyl group, perfluorophenethyl group, 2- (pentafluorophenyl) hexafluoro-n-propyl group, 3- (pentafluorophenyl) hexafluoro-n-propyl group, etc.
- R 4 represents a methyl group, an ethyl group, a trifluoromethyl group, a pentafluoroethyl group, a perfluorophenethyl group, or 3- (pentafluorophenyl).
- Xafluoro-n-propyl and the like are preferred.
- the content of the structural units (1) is usually 10 to 100 mol 0/0, preferably 15 90 mol 0/0, more preferably 20- 70 mol%. In this case, if the content of the structural unit (1) is less than 10 mol%, the dissolution contrast tends to be insufficient and the resolution tends to decrease.
- the polysiloxane (1) has a polystyrene-equivalent weight average molecular weight (hereinafter, referred to as “Mw”) by gel permeation chromatography (GPC) of 500 to 1,000,000, preferably 500 to 100,000. Particularly preferred is 500 to 40,000. In this case, if the Mw force is less than 500, the glass transition temperature (Tg) of the obtained polymer tends to decrease, while if it exceeds 1,000, 000, the solubility of the obtained polymer in the solvent decreases. Tend.
- Mw polystyrene-equivalent weight average molecular weight
- Polysiloxane (1) has high transparency to radiation of wavelength It has excellent resistance to etching and is particularly excellent in ID bias.It is particularly suitable for use as a resin component in chemically amplified resists for microfabrication using radiation such as deep ultraviolet rays, electron beams, and X-rays. In addition to these, they can be used alone or as a mixture with various other polysiloxanes, for example, in molded articles, films, laminates, paints, and the like.
- polysiloxane (1) As the polysiloxane (1), the structural unit (1) and a structural unit represented by the following formula (2) (excluding the structural unit (1)) (hereinafter, referred to as “structural unit (2)”) (Hereinafter referred to as “polysiloxane (11)”).
- each R independently represents a linear or branched alkyl group having 14 to 14 carbon atoms or a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof. Or any two R 3 are bonded to each other to form a divalent alicyclic hydrocarbon group having 412 carbon atoms or a derivative thereof together with the carbon atom to which each is bonded, The remaining R 3 is a linear or branched alkyl group having 1 to 4 carbon atoms or a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof, and m is 0 or 1.
- the structural unit (1) in the polysiloxane (1-1) include the above-mentioned formula (1-1-1) set (1-1-4) which is a preferred specific example of the silane compound (I). )) Or a unit obtained by condensing the compound represented by the formula (1-2-1) —the compound represented by the formula (1-2-4). G) a unit obtained by condensing the silanied product represented by 1) is preferable.
- the structural unit (1) may be present alone or in combination of two or more.
- examples of the linear or branched alkyl group having 14 carbon atoms of R 3 include a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, and a 2-methyl group.
- examples thereof include a propyl group, a 1-methylpropyl group, a t-butyl group and the like.
- alkyl groups a methyl group, an ethyl group, an n-propyl group and the like are preferable.
- R 3 has a carbon number of 4-1 20 which is a monovalent alicyclic hydrocarbon group and any two R 3 s are mutually bonded to form a carbon atom having a carbon number of 4-1 20
- the divalent alicyclic hydrocarbon group include groups derived from cycloalkanes such as cyclobutane, cyclopentane, cyclohexane, cycloheptane, and cyclooctane; adamantane, bicyclo [2.2.1] heptane , cited tetracyclo [6. 2.1.3 I 3 '6.
- dodecane tricyclo [5.2.2 1.0 2 '6] and a group derived from bridged hydrocarbons such as decane be able to.
- monovalent alicyclic hydrocarbon groups and divalent alicyclic hydrocarbon groups groups derived from cyclopentane, cyclohexane, adamantane, bicyclo [2.2.1] heptane, and the like are exemplified. preferable.
- Trialkylmethyl groups such as butyl group, 2-methyl-2-butyl group, 2-ethyl-2-butyl group, 3-methyl-3-butyl group, 3-ethyl-3-butyl group, 3-methyl-3-pentyl group
- Alkyl-substituted bridged hydrocarbon groups such as
- 1-methyl-1-cyclopentylethyl group 1-methyl-1- (2-hydroxycyclopentyl) ethyl group, 1-methyl-1 (3-hydroxycyclopentyl) ethyl group, 1-methyl-1-cyclohexylethyl group, 1-methyl-11 (3 —Hydroxycyclohexyl) ethyl group, 1-methyl-1- (4-hydroxycyclohexyl) ethyl group, 1-methyl-1-cycloheptylethyl group, 1-methyl-1 -— (3-hydroxycycloheptyl) ethyl group, 1 A dialkyl cycloalkylmethyl group such as -methyl-1- (4-hydroxycycloheptyl) ethyl group;
- 1,1-dicyclopentylethyl group 1,1-di (2-hydroxycyclopentyl) ethyl group, 1,1-di (3-hydroxycyclopentyl) ethyl group, 1,1-dicyclohexylethyl group, 1,1- Di (3-hydroxycyclohexyl) ethyl group, 1,1-di (4-hydroxycyclohexyl) ethyl group, 1,1-dicycloheptylethyl group, 1,1-di (3-hydroxycycloheptyl) ) Ethyl and 1,1-di (4-hydroxycycloheptyl) ethyl groups such as alkyl-dicycloalkylmethyl groups;
- examples of the structure corresponding to C (R 3 ) 3 include a t-butyl group, a 2-methyladamantane-2-yl group, and a 2-ethylethylamantane-2-yl group.
- the carboxylic acid ester structure in the structural unit (2) forms an acid dissociable group that dissociates under the action of an acid to form a carboxy group.
- m is preferably both 0 and 1.
- the structural unit (2) may be present alone or in combination of two or more.
- the polysiloxane (1-1) may have one or more types of structural units other than the structural units (1) and (2) (hereinafter, referred to as “other structural units (j8)”).
- the other structural unit ( ⁇ ) for example, a condensation of the structural unit represented by the formula (3), (4) or (5) described above with respect to the other structural unit (a)
- a structural unit derived from a trifunctional or tetrafunctional silane compound for the reaction there may be mentioned a structural unit derived from a bifunctional silane compound for the condensation reaction.
- the content of the structural units (1) usually, 3 to 50 mole 0/0, Preferably it is 3-45 mol%, more preferably 5-40 mol%. In this case, if the content of the structural unit (1) is less than 3 mol%, the resolution as a resist tends to decrease, while if it exceeds 50 mol%, the sensitivity as a resist tends to decrease.
- the content of the structural unit (2) is usually 3 to 50 mol%, preferably 3 to 45 mol%, and more preferably 5 to 40 mol%. In this case, if the content of the structural unit (2) is less than 3 mol%, the resolution as a resist tends to decrease, while if it exceeds 50 mol%, the sensitivity as a resist tends to decrease.
- the content of the other structural unit (j8) is usually at most 85 mol%, preferably at most 80 mol%. In this case, the content of the other structural unit is more than 85 mole 0/0, resolution as a resist tends to decrease.
- the polystyrene (1-1) has a polystyrene-equivalent weight average molecular weight (hereinafter referred to as “Mw”) determined by gel permeation chromatography (GPC) of 500 to 1,000,000, preferably 500. — 100,000, particularly preferably 500—40,000.
- Mw polystyrene-equivalent weight average molecular weight
- GPC gel permeation chromatography
- Polysiloxane (1-1) has high transparency to radiation with a wavelength of 193 nm or less and excellent dry etching resistance.
- chemical processing for fine processing using radiation such as far ultraviolet rays, electron beams, and X-rays. It can be used very suitably as a resin component in amplification type resists, and is also useful alone or in combination with other various siloxane resins, for example, in molded products, films, laminates, paints, etc. .
- the polysiloxane (1) may be prepared, for example, by adding the silani conjugate (I) together with the silani conjugate which may give another structural unit) under acidic or basic conditions without solvent or solvent. Although it can be produced by polycondensation in an aqueous solution, it is preferable to produce the polycondensation under acidic conditions and then continue the reaction under basic conditions.
- the polysiloxane (1-1) may be obtained, for example, by combining the silani conjugate (I) and the silani conjugate that provides the structural unit (2) with, in some cases, the silani conjugate that provides another structural unit (). Together with the product under acidic or basic conditions without solvent or in a solvent. However, it is preferable to carry out polycondensation under acidic conditions and then to continue the reaction under basic conditions to produce.
- a compound represented by the following formula (8) or (9) may be used as a silane compound providing another structural unit (a) or another structural unit ( ⁇ ). It is also possible to use a part or the whole of each silane conjugate as a partial condensate.
- each R ′ independently represents a linear, branched or cyclic alkyl group having 120 carbon atoms
- each Y represents the formula (6) and the formula ( This is the same as Y in 7).
- an acidic catalyst is used for the polycondensation under acidic conditions.
- the acidic catalyst examples include hydrochloric acid, sulfuric acid, nitric acid, formic acid, acetic acid, n-propionic acid, butyric acid, valeric acid, oxalic acid, malonic acid, succinic acid, maleic acid, fumaric acid, adipic acid, phthalic acid, Examples thereof include terephthalic acid, acetic anhydride, maleic anhydride, citric acid, boric acid, phosphoric acid, titanium tetrachloride, zinc chloride, aluminum chloride, benzenesulfonic acid, p-toluenesulfonic acid, and methanesulfonic acid.
- hydrochloric acid sulfuric acid, acetic acid, oxalic acid, malonic acid, maleic acid, fumaric acid, acetic anhydride, maleic anhydride and the like are preferable.
- the acidic catalysts can be used alone or in combination of two or more.
- the amount of the acidic catalyst to be used is usually 0.01-1.000 parts by weight based on 100 parts by weight of the total amount of the silane conjugate.
- a basic catalyst In the polycondensation and reaction under basic conditions, a basic catalyst is used. It is.
- the basic catalysts examples of the inorganic bases include lithium hydroxide, sodium hydroxide, potassium hydroxide, calcium hydroxide, barium hydroxide, sodium hydrogen carbonate, potassium hydrogen carbonate, sodium carbonate, and potassium carbonate. And the like.
- organic bases for example,
- linear, branched or cyclic monoalkylamines such as n-xylamine, n-butylamine, n-butyramine, n-noramine, n-decylamine and cyclohexylamine;
- Linear or branched such as di-n-butylamine, di-pentylamine, di-n-xylamine, di-n-butylamine, di-n-butylamine, di-n-nor-lamine, di-n-decylamine, cyclohexylmethylamine, dicyclohexylamine, etc. Or cyclic dialkylamines;
- Aromatic amines such as aniline, N-methylaniline, N, N-dimethylaniline, 2-methylaniline, 3-methylaline, 4-methylaline, 4-troaline, diphenylamine, triphenylamine, naphthylamine, etc. ;
- Imidazole benzimidazole, 4-methylimidazole, 4-methyl-2 phenyluimi Imidazoles such as dazole;
- Pyridine 2-methylpyridine, 4-methylpyridine, 2-ethylpyridine, 4-ethylpyridine, 2-phenylpyridine, 4-phenylpyridine, 2-methyl-4-phenylpyridine, nicotine, nicotinic acid, nicotinamide, quinoline, 4-hydroxyquinoline Pyridines such as 1,8-oxyquinoline and acridine; piperazines such as piperazine and 1- (2-hydroxyethyl) piperazine;
- triethylamine, tri-n-propylamine, tri-n-butynoleamine, pyridine and the like are preferable.
- the basic catalysts can be used alone or in combination of two or more.
- the amount of the basic catalyst used is usually 0.01 to 10,000 parts by weight based on 100 parts by weight of the total amount of the silani conjugate.
- Cyclic ketones such as cyclopentanone, 3-methylcyclopentanone, cyclohexanone, 2-methylcyclohexanone, 2,6-dimethylcyclohexanone, and isophorone;
- Alkyl 3-alkoxypropionates such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, and ethyl 3-ethoxypropionate;
- Dialkylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol getyl ether, diethylene glycol di-n-propyl ether, diethylene glycol di- n -butyl ether;
- Ethylene glycol monoalkyl ether acetates such as ethylene glycol monomethinooleate enorea acetate, ethylene glycol monomethyl enoate monoteracetate, and ethylene glycol mono- n -propyl ether acetate;
- Aromatic hydrocarbons such as toluene and xylene
- N-methylpyrrolidone N, N-dimethylformamide, N, N-dimethylacetamide, ben Ginoleetinooleatenole, G-n-hexinoleatenole, diethylene glycolone monomethinoleate, terephthalate, diethylene glycol monoethyl ether, caproic acid, caprylic acid, 1-otanol, 1-nonanol, benzyl alcohol, acetic acid Examples include benzyl, ethyl benzoate, getyl oxalate, getyl maleate, ⁇ -butyrolataton, ethylene carbonate, propylene carbonate and the like.
- solvents can be used alone or in combination of two or more.
- the amount of the solvent to be used is generally 2,000 parts by weight or less based on 100 parts by weight of the total amount of the silani conjugate.
- the polysiloxane (1) and the polycondensation for producing the polysiloxane (11) can be carried out in the absence of a solvent or in the form of 2-butanone, 2-pentanone, 3-methyl-2-butanone, 2-hexanone, 4-methinolay 2-pentanone , 3-methyl-2-pentanone, 3,3-dimethyl-2-butanone, 2-heptanone, 2-butanone, cyclopentanone, 3-methylcyclopentanone, cyclohexanone, 2-methylcyclohexanone, 2,6- Dimethylcyclohexanone, diethylene glycol dimethyenoate, diethylene glycolone diethylene glycol, diethylene glycolone resin ⁇ -propynoleatenoate, diethylene glycolone resin ⁇ Ethyleneglyconolemonoethenoeteno Acetate, it is preferably carried out in a solvent such as ethylene glycol monomethyl over ⁇ propyl ether acetate
- the reaction conditions for the polycondensation under acidic or basic conditions and the reaction under basic conditions are as follows: the reaction temperature is usually 50- + 300 ° C, preferably 20-100 ° C, The reaction time is usually about 1 minute to 100 hours.
- the radiation-sensitive resin composition of the present invention contains (A) a polysiloxane (1) and (B) a radiation-sensitive acid generator (hereinafter, referred to as “acid generator (B)”). .
- the polysiloxane (1) is a polysiloxane (1) having the structural unit (1) and the structural unit (3), and the structural unit ( 1) And polysiloxane (1) having structural unit (2) or polysiloxane (1) having structural unit (1), structural unit (2) and structural unit (3).
- the polysiloxane (1) can be used alone or in combination of two or more.
- one or more other polysiloxanes can be used in combination with the polysiloxane (1).
- Examples of the other polysiloxane include a polysiloxane having at least one structural unit represented by the formula (3), (4) or (5).
- the acid generator (B) is a component that generates an acid upon exposure.
- the acid dissociates the acid-dissociable group present in the polysiloxane (1), and as a result, the exposed portion of the resist film becomes alkaline. It becomes easily soluble in a developing solution and has an action of forming a positive resist pattern.
- the acid generator (B) is not particularly limited as long as it has the above-mentioned action.
- a compound capable of generating a sulfonic acid or a carboxylic acid upon exposure hereinafter referred to as “acid generator”) Agent (Bl) ”).
- Examples of the sulfonic acid or carboxylic acid which also generates an acid generator (B1) force include those described in JP-A-2002-220471, and more specifically, a methyl group, an ethyl group, n-propyl, i-propyl, n-butyl, i-butyl, sec-butyl, t-butyl, n-pentyl, n-xyl, n-butyl, n-octyl; trifluoromethyl, pentaful Oroethyl group, heptafluoro- n -propyl group, heptafluoro-i-propyl group, nonafluoro-n-butyl group, nonafluoro-i-butyl group, nonafluoro- sec -butyl group, nonafluoro-t-butyl group, perfluoro-n-pentyl group, perfluoro-n-xy
- the acid generator (B1) for example, an acid generator that generates the sulfonic acid or carboxylic acid is used. Palladium salt compound, sulfonated compound that generates the sulfonic acid, sulfonated compound that generates the sulfonic acid, oxime compound that generates the sulfonic acid, carboxylic acid compound that generates the carboxylic acid And diazo ketone conjugates that generate the sulfonic acid or carboxylic acid, and halogen-containing conjugates that generate the sulfonic acid or carboxylic acid.
- oxamide conjugate examples include, but are not limited to, odonium salts and sulfo-pam salts (including tetrahydrothiophene salts).
- Rudonium salt dinaphthyl monodonium salt, triphenyl sulfo-pam salt, trinaphthyl sulfo-pam salt, diphenyl'methyl sulfo-pam salt, dicyclohexyl-2-oxocyclohexyl sulfo-pam salt, 2 —Oxocyclohexyldimethyl sulfo-dimethyl salt, Fehl'benzyl methyl sulfo-dimethyl salt, 1 naphthyldimethyl sulfo-dimethyl salt, 1 naphthyl getyl sulfo-dimethyl salt, 1— (naphthalene 1-yl ) Tetrahydrothiophene-dimethyl salts, or
- sulfone conjugate examples include j8-ketosulfones,
- sulfonic acid compound examples include sulfonic acid esters, sulfonic acid imides, aryl sulfonic acid esters, and iminosulfonates.
- oxime compound examples include oxime sulfonic acids containing an aryl group.
- carboxylic acid conjugate examples include carboxylic acid esters, carboxylic acid imides, and carboxylic acid cyanates.
- diazoketone compound examples include 1,3-diketo-2 diazoide conjugates, diazobenzoquinone conjugates, and diazonaphthoquinone compounds.
- halogen-containing conjugate examples include a haloalkyl group-containing hydrocarbon and a haloalkyl group-containing heterocyclic conjugate.
- the acid generator ( ⁇ ) may be used alone or in combination of two or more.
- two or more acid generators (B1) that generate different sulfonic acids can be used in combination, and two or more acid generators (B1) that generate different carboxylic acids can be used in combination.
- one or more acid generators (B1) that generate sulfonic acids and one or more acid generators (B1) that generate carboxylic acids can be used in combination.
- the amount of the acid generator (B) used is usually from 0.1 to 30 parts by weight, preferably from 0.5 to 30 parts by weight, based on 100 parts by weight of all the polysiloxane components, in view of securing sensitivity and developability as a resist. — 20 parts by weight. In this case, if the amount of the acid generator (B) is less than 0.1 part by weight, sensitivity and developability tend to decrease, while if it exceeds 30 parts by weight, transparency to radiation decreases, There is a tendency that it is difficult to obtain a rectangular resist pattern.
- the radiation-sensitive resin composition of the present invention can contain various additives such as an acid diffusion controller, a dissolution controller, and a surfactant.
- the acid diffusion controller is a component having a function of controlling a diffusion phenomenon of an acid generated by an acid generator upon exposure in a resist film and suppressing an undesired chemical reaction in a non-exposed area.
- the storage stability of the radiation-sensitive resin composition obtained is further improved, the resolution as a resist is further improved, and the exposure power is also kept until development processing. Variations in the line width of the resist pattern due to variations in time (PED) can be suppressed, and a composition with excellent process stability can be obtained.
- the basicity does not change due to exposure or heat treatment during the resist pattern formation process.
- Nitrogen-containing organic compounds are preferred.
- Examples of such a nitrogen-containing organic compound include a compound represented by the following formula (10) (hereinafter, referred to as “acid diffusion controller (C)”).
- each R 5 independently represents a hydrogen atom, a linear, branched or cyclic alkyl group, an aryl group or an aralkyl group; And the aralkyl group may be substituted with a functional group such as a hydroxyl group.
- U 1 represents a divalent organic group, and s is an integer of 0-2.
- a polyamino compound and a polymer having three or more nitrogen atoms are collectively referred to as “acid diffusion controller (C3)”.
- examples of the nitrogen-containing organic compound other than the acid diffusion controller (C) include a quaternary ammonium hydroxide compound, an amide group-containing compound, a perylene compound, and a nitrogen-containing heterocyclic compound.
- Examples of the acid diffusion controller (C1) include mono- (cyclo) alkylamines such as n-hexylamine, n-heptylamine, n-octylamine, n-norylamine, n-decylamine, cyclohexylamine and the like; n - Buchiruamin, di n - Kishiruamin Ruamin, di n- de Shiruamin, cyclohexyl methyl ⁇ Min cyclohexane, dicyclohexyl - Penchiruamin, di n- hexyl Amin, Puchiruamin to G n-, di n- Okuchiruamin, di n- Bruno Di (cyclo) alkylamines such as triethylamine, tree n-propylamine, tree n-butylamine, tree n-pentylamine, tree n-hexylamine, tree n-hept
- Examples of the acid diffusion controller (C2) include ethylenediamine, N, N, ⁇ ′, ⁇ ′-tetramethylethylenediamine, ⁇ , ⁇ , ⁇ ′, ⁇ , -tetrakis (2-hydroxypropyl) ethylenediamine, Tetramethylenediamine, 1,3-bis [1- (4-aminophenol) -1-methylethyl] benzenetetramethylenediamine, hexamethylenediamine, 4,4'-diaminodipheninolemethane, 4,4 , Diaminodiphenyl ether, 4, 4, diaminobenzophenone, 4, 4, diaminodiphenylamine, 2,2-bis (4-aminophenyl) propane, 2- (3-aminophenyl) -2 (4-aminophenyl) propane, 2- (4-aminophenol) -2- (3-hydroxyphenyl) p Mouth bread, 2- (4-aminophenol)-2- (4-hydroxyphenyl
- Examples of the acid diffusion controller (C3) include polymers of polyethyleneimine, polyallylamine, and 2-dimethylaminoethylacrylamide.
- Examples of the quaternary ammonium hydroxide compound include, for example, tetramethyl ammonium hydroxide, tetraethyl ammonium hydroxide, tetra- n -propyl ammonium hydroxide, tetra-n-butyl ammonium hydroxide and the like. be able to.
- amide group-containing conjugate examples include N-t butoxycarbonyl n-butyrylamine, Nt butoxycarbonyl n-nonylamine, Nt butoxycarbonyldi-n-decylamine, and Nt butoxycarbonyldicyclo.
- urea compound examples include urea, methyl perea, 1,1-dimethyl perea, 1, Examples thereof include 3-dimethylperyl, 1,1,3,3-tetramethylperyl, 1,3-diphenylperylene, and tri-n-butylthiourea.
- nitrogen-containing heterocyclic compound examples include imidazoles such as imidazole, 4-methylimidazole, 1-benzyl-2-methylimidazole, 4-methyl-2 phenylimidazole, benzimidazole and 2-phenylbenzoimidazole; pyridine , 2-methylpyridine, 4-methylpyridine, 2-ethylpyridine, 4-ethylpyridine, 2-phenylpyridine, 4-phenylpyridine, 2-methyl-4-phenylpyridine, nicotine, nicotinic acid, nicotinamide, quinoline, 4-hydroxy Pyridines such as quinoline, 8-year-old xyquinoline and ataridine; the strength of pyrazines such as piperazine and 1- (2-hydroxyethyl) pirazine; pyrazin; pyrazole; pyridazine; quinosaline; Pyrrolidine, piperidine, 3-piberidino-1,2 Propanediol, morpholine
- the amount of the acid diffusion controller is usually 100 mol% or less, preferably 50 mol% or less, more preferably 30 mol% or less, based on the acid generator (B). In this case, if the amount of the acid diffusion controller exceeds 100 mol%, the sensitivity as a resist and the developability of an exposed portion tend to decrease. If the amount of the acid diffusion controller is less than 0.1 mol%, the pattern shape and dimensional fidelity of the resist may be reduced depending on the process conditions.
- dissolution controlling agent examples include, for example, compounds having an action of controlling the dissolution contrast and Z or the dissolution rate when a resist is used.
- the amount of the dissolution controlling agent is usually 50 parts by weight or less, preferably 30 parts by weight or less based on 100 parts by weight of the total polysiloxane component. In this case, if the amount of the dissolution controlling agent exceeds 50 parts by weight, the heat resistance of the resist tends to decrease. Further, the surfactant is a component having an effect of improving coating properties, striation, developability, and the like.
- Examples of such a surfactant include polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, and polyoxyethylene. Shiechiren n - O Chi Ruff enyl ether, polyoxyethylene n - nonylphenyl ether, polyethylene glycol dilaurate, Bruno and polyethylene glycol distearate - other ON-based surfactant, the following trade names, KP341 (manufactured by Shin-Etsu Chemical Industrial Co., Ltd.), Polyflow No. 75, No.
- surfactants can be used alone or in combination of two or more.
- the amount of the surfactant is usually 2 parts by weight or less based on 100 parts by weight of the total polysiloxane component.
- additives other than the above include an antihalation agent, an adhesion aid, a storage stabilizer, and an antifoaming agent.
- the radiation-sensitive resin composition of the present invention is usually dissolved in a solvent such that the total solid content is usually 125 to 25% by weight, preferably 2 to 15% by weight.
- a solvent such that the total solid content is usually 125 to 25% by weight, preferably 2 to 15% by weight.
- it is prepared as a composition solution by filtering with a filter having a pore size of about 0.2 m.
- the solvent used for preparing the composition solution for example,
- Cyclic ketones such as cyclopentanone, 3-methylcyclopentanone, cyclohexanone, 2-methylcyclohexanone, 2,6-dimethylcyclohexanone, and isophorone;
- Alkyl 3-alkoxypropionates such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, and ethyl 3-ethoxypropionate;
- 2,4-difluoropropiophenone fluorocyclohexane, 1,1,1,2,2,3,3-heptafluoro-7,7-dimethyl 4,6 octanedione, 1,1,1,3 , 5, 5, 5 heptafluoropentane 2,4-dione, 3,3,4,4,5,5,5 heptafluorone-pentanone, 1,1,1,2,2,6,6,6-octafluoro —
- Fluorine-containing ketones such as 2,4-hexanedione, trifluorobutanoyl 1,1,1 trifluoro-5-methyl-2,4-hexanedione, perfluorocyclohexanone;
- Fluorine-containing amines such as trifluoroacetamide, perfluorotributylamine, perfluorotrihexylamine, perfluorotripentylamine, and perfluorotripropylamine;
- Fluorine-substituted cyclic hydrocarbons such as 2,4-difluorotoluene, perfluorodecalin, perfluoro (1,2-dimethylcyclohexane), perfluoro (1,3-dimethylcyclohexane)
- fluorine-containing solvents such as 2,4-difluorotoluene, perfluorodecalin, perfluoro (1,2-dimethylcyclohexane), perfluoro (1,3-dimethylcyclohexane
- n-propyl alcohol i-propyl alcohol, n-butyl alcohol, t-butyl alcohol, cyclohexanol, ethylene glycol monomethinolate, ethylene glycol monoethylenoate, ethylene glycolone mono n propynoleate , Ethylene glycolone mono- n- butynoleatenole, diethylene glycolone resin methinoleatenole, diethylene glycol getyl ether, diethylene glycol di- n -propyl ether, diethylene glycolone resin n-butynoleatene, ethylene glycolonele Methinoleatenorea acetate, ethylene glycolone monoetinorea acetate, ethyleneglyconelemono n propyl ether acetate, propylene glycol mono Chirueteru, propylene glycolate over Honoré mono ethyl Honoré ether Honoré, propylene glycol Honoré mono
- solvents can be used alone or in combination of two or more.
- linear or branched ketones, cyclic ketones, propylene glycol monoalkyl ether acetates, 2-hydroxy Preferred are alkyl propionates, alkyl 3-alkoxypropionates, and fluorine-containing solvents.
- the acid generator caruric acid is generated by exposure.
- the acid dissociable group in the polysiloxane (1) is dissociated to form a carboxy group.
- the solubility of the exposed portion of the resist in an alkali developing solution increases, and Is dissolved and removed by an alkaline developer to obtain a positive resist pattern.
- the composition solution is applied by a suitable coating means such as spin coating, casting coating, roll coating, etc., for example, a silicon wafer, aluminum
- a suitable coating means such as spin coating, casting coating, roll coating, etc.
- a silicon wafer aluminum
- a resist film is formed by coating on a wafer or a substrate on which an underlayer film has been formed in advance, and a heat treatment (hereinafter, referred to as “PB”) may be performed in some cases.
- the resist film is exposed so as to form a predetermined resist pattern.
- the radiation used at this time is preferably a deep ultraviolet ray represented by an F2 excimer laser (wavelength: 157 nm) or an ArF excimer laser (wavelength: 193 nm), an electron beam, an X-ray, or the like.
- PEB a heat treatment
- the heating conditions for PEB vary depending on the composition of the resist composition. C, preferably 50-170. C.
- an organic or inorganic lower film is formed on a substrate to be used (for example, Japanese Patent Publication No. 6-12452).
- a protective film may be provided on the resist film in order to prevent the influence of basic impurities contained in the environmental atmosphere (see, for example, JP-A-5-188598). Or a combination of these techniques.
- a predetermined resist pattern is formed by developing the exposed resist film.
- Examples of the developer used for development include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, ammonia water, ethylamine, n-propylamine, getylamine, and di-n-propylamine.
- Alkaline compounds such as droxide, pyrrole, piperidine, choline, 1,8-diazabicyclo— [5.4.0] —7-indene, 1,5-diazabicyclo [4.3.0] —5-nonene
- Alkaline aqueous solution in which at least one kind is dissolved is preferred.
- the concentration of the alkaline aqueous solution is usually 10% by weight or less. In this case, if the concentration of the alkaline aqueous solution exceeds 10% by weight, unexposed portions may be dissolved in the developer, which is not preferable.
- an organic solvent is added to the developer composed of the alkaline aqueous solution.
- Examples of the organic solvent include ketones such as acetone, 2-butanone, 4-methyl-2-pentanone, cyclopentanone, cyclohexanone, 3-methylcyclopentanone, and 2,6-dimethylcyclohexanone; methyl alcohol; Alcohols such as ethyl alcohol, n- propyl alcohol, i-propyl alcohol, n-butyl alcohol, t-butyl alcohol, cyclopentanol, cyclohexanol, 1,4-hexanediol, and 1,4-hexanedimethylol; Ethers such as tetrahydrofuran and dioxane; esters such as ethyl acetate, n-butyl acetate and i-amyl acetate; aromatic hydrocarbons such as toluene and xylene; phenol, acetate acetone, and dimethylformamide.
- ketones such as acetone, 2-butan
- organic solvents can be used alone or It can be used as a mixture of two or more.
- the amount of the organic solvent used is preferably 100% by volume or less based on the alkaline aqueous solution. In this case, if the amount of the organic solvent used exceeds 100% by volume, the developability may be reduced and the undeveloped portion of the exposed portion may be increased.
- an appropriate amount of a surfactant or the like can be added to a developer composed of an alkaline aqueous solution.
- the film After development with a developing solution composed of an alkaline aqueous solution, the film is generally washed with water and dried.
- the Mw of the polysiloxane obtained in each of the following Examples and Comparative Examples and the polymer obtained in the following Preparation Example were measured using GPC columns (2 G2000HXL, 1 G3000HXL, 1 G4000HXL) manufactured by Tosoh Corporation. The measurement was carried out by gel permeation chromatography (GPC) using monodisperse polystyrene as a standard under the analysis conditions of a flow rate of 1.0 milliliter Z, an elution solvent of tetrahydrofuran, and a column temperature of 40 ° C.
- GPC gel permeation chromatography
- reaction solution was returned to room temperature, diluted with n-hexane, filtered with a suction funnel covered with celite, and the obtained filtrate was distilled off under reduced pressure to obtain a crude product. Thereafter, the crude product was purified by distillation under reduced pressure to obtain 262 g of a compound as a fraction having a boiling point of 137 ° C at 0.06 mmHg.
- reaction solution was transferred to a separating funnel, the aqueous layer was discarded, and ion-exchanged water was added to wash the reaction solution. The water washing was repeated until the reaction solution became neutral. Thereafter, the organic layer was distilled off under reduced pressure to obtain 51.lg of polysiloxane (1). Mw of the obtained polysiloxane (1) was 1,530.
- Preparation Example (Preparation of Composition for Forming Underlayer Film) A separable flask equipped with a thermometer was charged with 100 parts by weight of acenaphthylene, 78 parts by weight of toluene, 52 parts by weight of dioxane, and 3 parts by weight of azobisisobutymouth-tolyl under a nitrogen atmosphere and stirred at 70 ° C. for 5 hours. Then, 5.2 parts by weight of p-toluenesulfonic acid monohydrate and 40 parts by weight of paraformaldehyde were added, and the mixture was heated to 120 ° C. and further stirred for 6 hours. Thereafter, the reaction solution was poured into a large amount of isopropyl alcohol, and the precipitated polymer was separated by filtration and dried at 40 ° C. under reduced pressure to obtain a polymer having an Mw of 22,000.
- each composition solution was applied by spin coating on a substrate on which a lower layer film was formed in advance on a silicon wafer surface, and PB was performed for 90 seconds on a hot plate maintained at 100 ° C. to obtain a film thickness of 1, A 500A resist film was formed.
- the lower layer film is prepared by spin-coating the above-mentioned composition for forming a lower layer film on a silicon wafer, and then beta-curing on a hot plate at 180 ° C for 60 seconds and further at 300 ° C for 120 seconds. It is a film with a thickness of 3,000 A formed in this way.
- the optimal exposure was defined as the exposure that formed a line 'and' space pattern (1L1S) with a line width of lOOnm with a 1: 1 line width, and the optimal exposure was defined as the sensitivity (1L1S).
- the line width (CD) of the line pattern was measured when 5 lines per line (1L5S) with a line width of 180 nm were formed at this optimum exposure dose.
- the acid generator (B) is as follows.
- Evaluation Example 6-7 and Comparative Evaluation Example 2 Evaluation of radiation-sensitive resin composition 100 parts of each polysiloxane shown in Table 2 (however, based on weight; the same applies hereinafter), 900 parts of 2-heptanone, the acid generator (B) shown in Table 2, and the total amount of the acid generator (B) A composition solution was prepared by uniformly mixing 8 mol% of 2-phenylbenzimidazole.
- ARC29A anti-reflection film
- PB was performed at 140 ° C. for 90 seconds to form a resist film.
- the cross-sectional shape of the formed line 'and' space pattern (1L1S) with a line width of 100 nm was evaluated by observing the cross-sectional shape with a scanning electron microscope. Evaluation of contact hole patterns
- the optimum exposure was defined as the exposure that formed a hole 'and' space pattern (1H1S) with a contact hole diameter of lOOnm with a 1: 1 line width, and the optimum exposure was defined as sensitivity (1H1S).
- the pixel size of the defect inspection device was set to 0.16 ⁇ m and the threshold was set to 13 was set, the measurement was performed in the array mode, and the difference between the comparison image and the pixel unit was detected.
- the development defects extracted were detected, and the number of development defects was calculated.
- the acid generator (B) is as follows.
- a composition solution was prepared by uniformly mixing 900 parts, the acid generator (B) shown in Table 1, and 8 mol% of 2-phenylbenzimidazole with respect to the total amount of the acid generator (B).
- each composition solution was applied by spin coating on a substrate on which a lower layer film was formed in advance on a silicon wafer surface, and PB was performed for 90 seconds on a hot plate maintained at 100 ° C. to obtain a film thickness of 1, A 500A resist film was formed.
- the lower layer film was formed in the same manner as in the case of Evaluation Examples 1 to 5 and Comparative Evaluation Example 1.
- the optimal exposure was defined as the exposure that formed a 90 nm line 'and' space pattern (1L1S) with a 1: 1 line width, and the optimal exposure was defined as sensitivity (1L1S).
- the line width of the line pattern becomes 8 lnm or more and 99 nm or less.
- the range was measured and defined as the depth of focus (DOF (ILIS)).
- the acid generator (B) is as follows.
- the silane compound (I) of the present invention can be used particularly suitably as a raw material for synthesizing the polysiloxane (1) of the present invention.
- the radiation-sensitive resin composition of the present invention containing polysiloxane (1) as a resin component can lower the PEB temperature and control the diffusion of acid generated by exposure.
- the ID bias, the depth of focus (DOF) process margin, and the sensitivity are high. It has excellent pattern shape, and also has excellent resolution, dry etching resistance, developability, and the like.
- the radiation-sensitive resin composition of the present invention containing a polysiloxane (1-1) having two types of acid-dissociable groups having different acid-dissociation properties as a resin component has a line 'and' space pattern and In both cases of the hole 'and' space pattern, the process margin is excellent, especially regarding the depth of focus (DOF), the sensitivity is high, and the resolution, dry etching resistance, developability, etc. are also excellent.
- DOF depth of focus
- the radiation-sensitive resin composition of the present invention containing the polysiloxane (1) and the polysiloxane (1-1) can ensure a good balance of the above excellent properties. Therefore, the radiation-sensitive resin composition of the present invention can be extremely suitably used as a chemically amplified resist for fine processing using various kinds of radiation such as far ultraviolet rays, electron beams, and X-rays.
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Description
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US10/576,075 US20080026314A1 (en) | 2003-10-15 | 2004-10-14 | Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition |
EP04792382A EP1679314A4 (en) | 2003-10-15 | 2004-10-14 | SILANE COMPOUND, POLYSILOXANE, AND RADIATION RESISTANT RESIN COMPOSITION |
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---|---|---|---|---|
JP2007070337A (ja) * | 2005-08-11 | 2007-03-22 | Shin Etsu Chem Co Ltd | ポリシクロオレフィン官能性ポリシロキサン |
JP2007246596A (ja) * | 2006-03-14 | 2007-09-27 | Shin Etsu Chem Co Ltd | 含フッ素ケイ素化合物、シリコーン樹脂、それを用いたレジスト組成物、及びパターン形成方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4140506B2 (ja) * | 2003-10-28 | 2008-08-27 | Jsr株式会社 | 感放射線性樹脂組成物 |
US8034965B2 (en) | 2007-11-09 | 2011-10-11 | Shin-Etsu Chemical Co., Ltd. | Norbornane skeleton structure-containing organosilicon compound and method of producing same |
TWI398489B (zh) * | 2010-08-31 | 2013-06-11 | Chi Mei Corp | 光硬化性聚矽氧烷組成物及其所形成之基材保護膜 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11302382A (ja) * | 1997-08-06 | 1999-11-02 | Shin Etsu Chem Co Ltd | 高分子シリコーン化合物、レジスト材料及びパターン形成方法 |
JP2002278073A (ja) * | 2001-03-16 | 2002-09-27 | Jsr Corp | 感放射線性樹脂組成物 |
JP2003026728A (ja) * | 2001-07-13 | 2003-01-29 | Shin Etsu Chem Co Ltd | 高分子化合物、レジスト材料、及びパターン形成方法 |
Family Cites Families (1)
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US6531260B2 (en) * | 2000-04-07 | 2003-03-11 | Jsr Corporation | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition |
-
2004
- 2004-10-14 WO PCT/JP2004/015150 patent/WO2005037846A1/ja active Application Filing
- 2004-10-14 EP EP04792382A patent/EP1679314A4/en not_active Withdrawn
- 2004-10-14 US US10/576,075 patent/US20080026314A1/en not_active Abandoned
- 2004-10-15 TW TW093131437A patent/TW200517442A/zh unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11302382A (ja) * | 1997-08-06 | 1999-11-02 | Shin Etsu Chem Co Ltd | 高分子シリコーン化合物、レジスト材料及びパターン形成方法 |
JP2002278073A (ja) * | 2001-03-16 | 2002-09-27 | Jsr Corp | 感放射線性樹脂組成物 |
JP2003026728A (ja) * | 2001-07-13 | 2003-01-29 | Shin Etsu Chem Co Ltd | 高分子化合物、レジスト材料、及びパターン形成方法 |
Non-Patent Citations (1)
Title |
---|
See also references of EP1679314A4 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007070337A (ja) * | 2005-08-11 | 2007-03-22 | Shin Etsu Chem Co Ltd | ポリシクロオレフィン官能性ポリシロキサン |
JP2007246596A (ja) * | 2006-03-14 | 2007-09-27 | Shin Etsu Chem Co Ltd | 含フッ素ケイ素化合物、シリコーン樹脂、それを用いたレジスト組成物、及びパターン形成方法 |
JP4687898B2 (ja) * | 2006-03-14 | 2011-05-25 | 信越化学工業株式会社 | 含フッ素ケイ素化合物、シリコーン樹脂、それを用いたレジスト組成物、及びパターン形成方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1679314A4 (en) | 2008-12-24 |
EP1679314A1 (en) | 2006-07-12 |
TW200517442A (en) | 2005-06-01 |
US20080026314A1 (en) | 2008-01-31 |
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