WO2004064105A1 - 陰極線管装置 - Google Patents
陰極線管装置 Download PDFInfo
- Publication number
- WO2004064105A1 WO2004064105A1 PCT/JP2004/000219 JP2004000219W WO2004064105A1 WO 2004064105 A1 WO2004064105 A1 WO 2004064105A1 JP 2004000219 W JP2004000219 W JP 2004000219W WO 2004064105 A1 WO2004064105 A1 WO 2004064105A1
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- Prior art keywords
- electrode
- electron beam
- grid
- lens
- force
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
- H01J29/488—Schematic arrangements of the electrodes for beam forming; Place and form of the elecrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
- H01J29/50—Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
- H01J29/503—Three or more guns, the axes of which lay in a common plane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/48—Electron guns
- H01J2229/4834—Electrical arrangements coupled to electrodes, e.g. potentials
- H01J2229/4837—Electrical arrangements coupled to electrodes, e.g. potentials characterised by the potentials applied
- H01J2229/4841—Dynamic potentials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/48—Electron guns
- H01J2229/4844—Electron guns characterised by beam passing apertures or combinations
- H01J2229/4848—Aperture shape as viewed along beam axis
Definitions
- the present invention relates to a cathode ray tube device, and more particularly to a power line configured to form fine beam spots on the entire surface of a phosphor screen to stably provide high resolution and good image quality.
- the present invention relates to a single cathode ray tube device.
- a method of forming a small beam spot on the phosphor screen a method of forming a small virtual object diameter of the electron beam is generally known (for example, , Japanese Unexamined Patent Application Publication No. 2000-3
- the third grid is connected to an anode and a resistor for dividing a voltage.
- the second grid and the third grid are supplied with a high voltage i> o, and a low voltage supplied to the second daid constituting the prefocus lens.
- a large potential difference is formed between the ridge and the ridge. That is, a prefocus lens having a strong prefocus action is formed.
- ⁇ ss- greatly penetrates into the ss- of the second Daridot G 2 through which the electron beam passes, and the effect of reducing the virtual object diameter can be obtained.
- the deflection yoke generates an asymmetric deflection magnetic field. It is composed of Due to the effect of this deflection magnetic field, the phosphor screen
- Beam spots formed on the V-line cause bleeding, especially at the periphery of the screen.
- a method of forming a V-force lens having an astigmatism effect in which the forcible force in the vertical direction is stronger than the horizontal direction is generally used. It has been adopted regularly. Specifically, a method of forming a horizontal z-slit around the electron beam M hole on the third grid side of the second grid, and the second grid of the third grid V The grid has a vertically long V around the electron beam passage hole on the side.
- V causes distortion, resulting in poor image quality
- the slit formed in the second grid or the third grid it is necessary to design the slit formed in the second grid or the third grid to have a shallow depth ⁇ to reduce the astigmatism effect.
- the beam spot shape becomes more sensitive to variations in the molding accuracy of electronic components and the accuracy of electronic assembly. For this reason, problems such as image quality degradation tend to occur. As a result, it is difficult to stably obtain good image quality.
- the beam spot is small over the entire phosphor screen and has little elliptical distortion.
- -It is necessary to form ⁇
- a high voltage electrode for example, the third grid
- a high voltage for example, an electrode potential on the low voltage side that constitutes the main lens.
- a high voltage for example, an electrode potential on the low voltage side that constitutes the main lens.
- the permeation voltage to the electron beam passage hole of the low voltage side ⁇ pole (for example, the second grid) constituting the lens is increased. This makes it possible to form a small beam spot on the phosphor screen.
- the change in the lens action per unit size of the electrode constituting the pre-forcing lens becomes large.
- the electrode constituting the pre-focus lens is provided with a structure such as a structure that gives an astigmatism effect, the intensity of the pre-focus lens effect will vary, resulting in a stable and favorable operation. It becomes impossible to form a beam spot having a complicated shape. In other words, the above-mentioned method cannot provide a sufficiently small and stable beam spot.
- the present invention has been made in view of the above-described problems, and has as its object to provide a cathode ray tube device capable of stably displaying a fine and high-resolution image.
- the cathode ray tube device is:
- An electron beam generating unit for generating an electron beam; a pre-force lens unit for accelerating an electron beam generated from the electron beam generating unit; and a pre-force lens unit for pre-focusing the electron beam.
- a sub-lens section for further pugi-forcing the electron beam pre-focused by the lens section, and an electron beam pre-focused by the sub-lens section on the phosphor screen.
- An electron gun assembly having a main lens that accelerates and focuses toward A deflection magnetic field for deflecting the electron beam emitted from the gun body horizontally and vertically.
- the pre-force lens portion is constituted by a screen power and a first force pole on which the first level voltage is applied, at least. At the same time, it is formed substantially rotationally symmetric with respect to the traveling direction of the electron beam,
- the sub-lens section includes at least the first force electrode, a second force electrode to which a second level voltage lower than the first level tu is applied, Composed by
- the soil lens portion is composed of at least the second force pole and an anode pole to which a third level voltage higher than the target U level is applied.
- the electron gun assembly has an asymmetric electron lens portion such that the horizontal diameter of the electron beam of the BU incident on the main lens portion is larger than the vertical diameter.
- An electron beam generating section for generating an electron beam; a pre-focus lens section for accelerating an electron beam generated from the electron beam generating section and forcing the electron beam; A sub-lens section that further pre-focuses the electron beam prefocused by the pre-force lens section, and an electron beam that is pre-focused by the sub-lens section.
- An electron gun assembly having a main lens portion that accelerates the beam toward the phosphor screen and also focuses, and A deflection magnetic field that generates a deflection magnetic field that deflects the electron beam emitted from the electron gun assembly in a horizontal direction and a vertical direction.
- the pre-focus lens section is composed of at least a screen electrode and a first focus electrode to which a first-level voltage is applied. Is formed substantially rotationally symmetric with respect to the traveling direction of the
- the sub-lens unit includes at least the first focus electrode, a second focus electrode to which a second level m pressure lower than the first level U is applied, and the first focus electrode. Force electrode and the
- the main lens portion includes at least the second focus electrode, and an anode electrode to which a third level pressure higher than the first level is applied.
- the intermediate electrode is electrically connected to the screen electrode, and a force ⁇ , a fourth level lower than the second level is applied to the intermediate electrode and the screen electrode. Voltage is applied,
- the electron gun assembly is characterized in that it has an asymmetric electron lens portion such that the horizontal diameter of the electron beam before entering the main lens portion is larger than the vertical diameter.
- FIG. 1 is a horizontal sectional view schematically showing a structure of a cathode ray tube device according to one embodiment of the present invention.
- Fig. 2 shows an electron gun structure applicable to the cathode ray tube device shown in Fig. 1. It is a horizontal sectional view showing roughly the structure of the body.
- FIG. 3A is a perspective view schematically showing a structure of a first dalid applicable to the electron gun structure shown in FIG.
- FIG. 3B is a cross-sectional view schematically showing a structure around the electron beam passage hole of the first grid shown in FIG. 3A.
- FIG. 4 is a perspective view schematically showing a structure of a second dalid applicable to the electron gun structure shown in FIG.
- FIG. 5 is a perspective view schematically showing a structure of a third grid applicable to the electron gun structure shown in FIG.
- FIG. 6 is a diagram showing the relationship between the voltage applied to the focus electrode and the deflection current in the electron gun structure shown in FIG.
- FIG. 7 is a horizontal sectional view schematically showing another structure of the electron gun structure applicable to the cathode ray tube device shown in FIG.
- FIG. 8 is a perspective view schematically showing a structure of a first dalid applicable to the electron gun structure shown in FIGS. 2 and 7.
- FIG. 9 is a perspective view schematically showing the structure of a third dalid applicable to the electron gun structure shown in FIGS.
- FIG. 10 is a perspective view schematically showing a structure of a first segment applicable to the electron gun structure shown in FIG. 2 and FIG.
- FIG. 11 is a perspective view schematically showing a structure of an intermediate electrode applicable to the electron gun structure shown in FIGS. 2 and 7.
- FIG. 12 is a horizontal sectional view schematically showing another structure of an electron gun structure applicable to the cathode ray tube device shown in FIG.
- FIG. 13 is a perspective view schematically showing the structure of a cylindrical body applied to the electron gun structure shown in FIG.
- FIG. 14 is a horizontal sectional view schematically showing another structure of the electron gun structure applicable to the cathode ray tube device shown in FIG.
- a cathode ray tube device that is, a self-compensation type in-line type color cathode ray tube device has an outer neck 9 made of glass.
- the outer periphery 9 has a panel 1 and a funnel 2 integrally joined to the nonel 1.
- the panel 1 has a green, red and green color on its inner surface. Equipped with a phosphor screen 3 consisting of three-color phosphor layers that emit light, dots, or stripes, respectively.
- a phosphor screen 3 consisting of three-color phosphor layers that emit light, dots, or stripes, respectively.
- o Shak mask 4 faces phosphor screen 3.
- the shadow of the shadow, Kumas'k 4 has many electron beam passage holes in its plane.
- the in-line type electron gun structure 7 is disposed inside a cylindrical neck 5 corresponding to the small diameter portion of the funnel 2.o
- the electron gun structure 7 is a center passing through the same horizontal plane.
- Beam 6 G Yo-i 3 mr child beam 6 B, 6 consisting of paired beams 6 B, 6 R
- the deflector H 8 is mounted along the outer surface extending from the large diameter portion of the funnel 2 to the neck 5.
- This deflection 3-8 is a non-uniform deflection that deflects the 3 electron beams 6B6G6R emitted from the S-Ienna gun structure 7 in the horizontal (X) and vertical (Y) directions.
- the asymmetric magnetic field of o that generates the magnetic field is a pink x It is formed for the deflection magnetic field and the vertical deflection magnetic field of the barrel type.
- the three-beams 6B, 6G, and 6R emitted from the electron gun assembly 7 are converted into shadows and electron beams of a mask 4. While undergoing self-conduction near the passage hole, it is deflected by the non-uniform magnetic field generated by deflection shock 8.
- the three electron beams 6R, 6G, and 6B run the phosphor screen 3 through the shadow mask 4 in the horizontal direction X and the vertical direction Y.
- a color image is displayed by shaping each electron beam and landing it on a phosphor layer of a specific color.
- the electron gun assembly 7 includes three force sources (R, G ⁇ B) arranged in a row in the horizontal direction X, and these cathodes K (R, G, B). It has three heaters and six electrodes that are individually heated. 6 electrodes, i.e. the first grid,
- 2nd, 3rd grid, (1st focus electrode) G3, 4th grid (2nd focus electrode) G4, and 5th grid (anode electrode) G5 is sequentially arranged along the tube axis Z from the input source K (RG, B) to the phosphor screen.
- the dalid G 4 is composed of at least two segments arranged in order along the pipe axis Z, namely the first segment G 4 _ 1 and the second segment G 4 12. ing. These cathodes K (R, G, B) and the six electrodes are fixed to the body by a pair of insulating supports
- the first grid G1 is composed of a plate-like electrode.
- This plate-shaped electrode has three force sources K (R, G,
- the electron beam passage hole 11 A is provided in the horizontal direction. It is formed in a horizontally long rectangular shape having a long side in X and a short side in the vertical direction Y
- the first good 'G 1 of ⁇ has a slit 11 B long in the horizontal direction X around the electron beam passage hole 11 A on the opposite side to the second grid KG 2.
- 1B has a long side extending in the horizontal direction X longer than the horizontal diameter of the thunderbolt beam 11A and the electron beam passage hole 11
- It is longer than the vertical diameter of A and is formed in a horizontally long rectangular shape with a short side extending in the vertical direction Y.
- such a first grid, G 1 is constituted by a plate-like electrode having a plate thickness T of, for example, less than 1 mm. Thickness T is 0 • 15 to 0.2
- the electron beam passage hole 11A has a horizontal diameter of about 0.6 mm and a vertical diameter of about 0.4 mm.
- the plate t around the formed child beam passage hole 11A is about 30 to 60% of the plate thickness T. In the embodiment of ⁇ , 0.06 to 0.0%. 9 mm.
- the second grid, G 2 is composed of a plate-like electrode. ⁇ This plate-like electrode is ⁇ attached to its plate tfi with three force sources K (R, G, It has three electron beam passage holes formed in a row in the horizontal direction X corresponding to B). That is, as shown in FIG. 4, the second dalid G 2 has a circular electron beam passage hole 12.
- the third grid G3 is formed by a cylindrical electrode having an integral structure.
- This cylindrical electrode has three force sources K (R, G, B) corresponding to the surface facing the second grid G2 and the surface facing the fourth grid G4. It has three electron beam passage holes formed in a line in the horizontal direction X. That is, as shown in FIG. 5, the third grid G3 has a circular electron beam passage hole slightly larger than the electron beam passage hole 12 on the surface facing the second dalide G2. It has 1 3. Further, the third grid G3 has an electron beam passage hole larger than the electron beam passage hole 13 on the surface facing the fourth grid G4.
- the first segment G4-1 of the fourth dalyd G4 is constituted by a cylindrical electrode having an integral structure.
- This cylindrical electrode has three force sources K (R, G, B) on the surface facing the third Daridot G3 and the surface facing the second segment G4-2.
- it has three electron beam passage holes formed in a row in the horizontal direction X.
- the electron beam passage hole formed on the surface facing the third grid G3 is circular and formed on the surface facing the second segment G412.
- the electron beam passage hole has a vertically long shape having a major axis in the vertical direction Y.
- the second segment G4-2 of the fourth dalyd G4 is formed by a cylindrical electrode having an integral structure.
- This cylindrical electrode is the first On the surface facing segment G 4-1 and the surface facing fifth Darid G 5, one row in horizontal direction X corresponding to three force sources K (R, G, B) It has three electron beam passage holes formed in the hole.
- the electron beam passage hole formed on the surface facing the first segment G4-1 has a horizontally long shape having a major axis in the horizontal direction X.
- the electron beam passage hole formed on the surface facing the grid G5 is circular.
- the fifth grid G5 is formed by a cylindrical electrode having an integral structure.
- This cylindrical electrode has three force sources K (R, G, B) on the surface facing the second segment G4-2 and on the phosphor screen side. It has three electron beam passage holes formed in a row in the horizontal direction X. In this embodiment, the electron beam passage holes formed on both end faces of the cylindrical electrode are circular.
- a voltage obtained by superimposing a video signal on a DC voltage of about 190 V is applied to the cathode K.
- the first grid G1 is grounded.
- a DC voltage of about 800 V is applied to the second grid G2.
- a fixed DC voltage of about 8.0 kV, that is, a focus voltage Vf1 is applied to the first segment G4-1 of the fourth grid G4.
- the second segment G 4 — 2 of the fourth grid G 4 has a fixed DC voltage V f 2 of approximately 8.0 kV, which is almost the same as the focus voltage V f 1, and a parabolic shape.
- a dynamic focus voltage on which a changing AC voltage component Vd is superimposed is applied. As shown in Fig. 6, this dynamic focus voltage is synchronized with the sawtooth-like deflection current and changes with the change in the electron beam deflection amount. It changes into a labora shape.
- the link force voltage is 8.0 kV at the lowest and, for example, about 9.0 kV at the highest.
- An anode voltage Eb of about 30 kV is applied to the fifth grid G5.
- the third grid G3 is applied with a voltage of a level higher than the force voltage Vf1 and lower than the anode voltage Eb, for example, a voltage of about 12.0 kV. .
- the third grid G3 of ⁇ is connected to a resistor R disposed near the gun body 7 in the neck 5 of the cathode ray tube device. One end is electrically connected to the fifth grid G5, and the other end of the resistor R is grounded.
- a voltage obtained by dividing the anode and the mi pressure Eb by a resistor R is applied.
- the third grid G3 is connected to the voltage supply terminal Ra of the resistor R, and a predetermined level of voltage is applied through the resistor R.
- the electron gun assembly 7 having the above-described configuration, by applying the above-described voltage to each grid, a child beam generating section, a pre-focus lens section, a sub-lens section, and the like are provided. ., The main lens part is formed respectively.
- the electron beam generating section is formed by the power grid K, the first grid G1, and the second grid G2.
- the electron beam generating section generates an electron beam and forms an object point with respect to the main lens section.
- the pre-force lens portion is formed by at least two electrodes, that is, the second grid V G2 and the third grid G 3.
- This pre-focus lens section The electron beam generated from the electron beam generating section is formed substantially rotationally symmetrical with respect to the traveling direction of the electron beam, and accelerates the electron beam. Pre-focus with force. That is, the pugi-focal lens portion has no astigmatism effect.
- the suppress portion is formed by at least two electrodes, that is, the first segment G411 of the third grid G3 and the fourth grid G4.
- This sub lens portion further reduces the divergence angle when the pre-forced electron beam is further pre-forced.
- the main lens part is formed by the fourth grid G4 and the fifth grid G5, and the main lens part of the main lens is formed by the pre-focused electron beam and the phosphor screen V3.
- the electron beam is deflected toward the periphery of the phosphor screen, the electron beam is deflected toward the periphery of the phosphor screen. 4 First segment of grid G 4 G 4 —
- a non-axisymmetric lens portion having a different force in the horizontal direction X and the vertical direction Y is formed between the first segment and the second segment G4-2. That is, at the time of deflection, first segmenting preparative G 4 one first and second segmenting Bok G 4 - potential power s electron beam one beam deflection amount increased accompanied to connexion expand between 2. Is the electron beam deflection angle
- the maximum potential difference between the first and second segments G4-1 and G4-2 causes a horizontal force X between the first segment G4-1 and the second segment G4-2.
- a quadrupole lens having a diverging action in the vertical direction Y is formed in addition to having a swelling action.
- the potential difference between the two-segment G4 — 2 and the fifth dalyd G5 is small, and the lens strength of the main lens is weak. That is, the electron beam is emitted from the phosphor screen.
- the intensity of the main lens is reduced in response to the fact that the distance from the electron gun structure to the phosphor screen is increased due to the deflection toward the periphery of the screen, and the image point becomes farther. To compensate for the defocus of the electron beam,
- the electron beam 6 (R, G, ⁇ ) is ⁇ the second grid G
- the light enters the pre-focus lens portion formed by the second and third grids G 3 and undergoes a pre-focus action.
- Yo electronic
- the electron beam 6 (R, G, ⁇ ) is the third grid G
- (R, G, B) compensates for the deflection aberration when passing through the quadrupole lens section formed by the first segment h G4 11 and the second segment G 4-2 That is, the electron beam 6 (R, G, B) receives a force action in the horizontal direction X and a divergent action in the vertical direction Y. The transverse distortion of the beam spot of the electron beam reaching the periphery of the phosphor screen is relaxed. Also, the electron beam is directed toward the center of the phosphor screen. 6 (RGB) is the t finally incident on the a ⁇ main lens eligible to receive the action of the quadrupole lens section, electron beams one beam 6 (R, G, B) is the fourth grid KG
- the electron beam 6 (R 5G, B) finally enters the phosphor screen due to the main lens portion formed by the fourth and fifth darlids, G5. When accelerated toward the screen, it is finally focused on the corresponding phosphor layer. Also, the synergy between the pre-focus lens sound
- the sub gun 7 is incident on the main lens unit. It has an asymmetrical pen lens section so that the horizontal diameter of the electron beam before the scanning is larger than the vertical diameter. That is, the electric field formed between the first grid VKG1 and the second grid V, G2 having the horizontally elongated electron beam passage holes 11A and the horizontally elongated slits 11B is an electron beam. Constructs an asymmetric electron lens part with one horizontal section
- the first child VG1 is formed with a horizontal child beam passage hole 11A and a horizontal slit 11B together with the first slit VG1. If one of the elongated electron beam passage hole 11A and the elongated slot 11B is formed in the first grid V1 and G1, the first grid is formed.
- An asymmetric electron lens portion can be formed between G1 and the second grid, G2.o By combining them, the asymmetric electron lens portion can be more effectively formed. The lens action can be easily adjusted.
- the electron beam generated from the electron beam generating section is generated.
- the electron beam 6 (R, G, B) is formed between the first Darid, G1 and the second VV de G2 after emitting each force K (R, G ⁇ B). Due to the applied electric field, a stronger focusing action is applied in the vertical direction Y than in the horizontal direction X. For this reason, the electron beam 6 (R, G, B) is shaped so as to have a horizontally long shape (a shape in which the horizontal diameter is larger than the vertical diameter) in a cross section perpendicular to the tube axis Z. It will be incident on the pre-focus lens. Therefore, it is possible to compensate for the effect of the deflection aberration caused by the deflection magnetic field, and to reduce the shape of the beam spot on the phosphor screen. Can be effectively suppressed.
- the first grid and the second grid in the electron beam generating portion having a relatively low potential difference are not applied to the prefocal lens portion having a large potential difference, but to the astigmatism effect.
- the astigmatism effect is provided between the y-axis and the y-axis. For this reason, it is possible to suppress the variation of the astigmatism effect with respect to the variation of the addendum of the first grid and the second grid, and to secure stable performance even when mass-produced.
- the secondary gun structure 7 shown in Fig. 7 has the same configuration as the electron gun structure shown in Fig. 2, but also the third grid, G3, and the second + The fourth good that constitutes
- An intermediate electrode G M is provided between the first segment G 41 of G 4 and o
- This intermediate electrode GM is composed of a plate-like electrode.
- This plate-shaped electrode has three force rods K (R G)
- This intermediate electrode GM is separated from the second electrode KG 7 by 7
- the lens strength of the sub-lens portion can be further enhanced, and the light intensity before entering the main lens portion can be improved.
- the asymmetric electron lens portion may be formed by an electric field other than the electric field between G1 and the second grid G2. That is, the first grid G1 is
- Fig. 8 As shown in Fig. 8, it has neither a horizontally long e-beam passing hole nor a horizontally long slit, and has a circular e-beam passing hole.
- the sub-lens portion forms an asymmetric electron lens portion having astigmatism.
- That third glycidyl Tsu de G 3 are vertical ⁇ Ka s horizontal by direction diameter Ri large of Rere elongated electron Bee surface facing the ⁇ first segmenting Bok G 4 one 1 thereof Remind as in FIG. 9 It has a system passage hole.
- the electron beam passage hole of the third grid G3 is formed in a vertically long rectangular shape having a short side in the horizontal direction X and a long side in the vertical direction Y.
- the first segment G4-1 is shown in Fig. 1.
- the first segment is used.
- the electron beam passage hole of the unit G4-1 has a long side in the horizontal direction X and especially in the vertical direction.
- the sub-lens portion has a lens action in which the force in the vertical direction Y is stronger than that of the focus in the horizontal direction X.
- the electron beam generated from the sub-beam generator passes through the pre-force lens while maintaining a substantially circular shape in a cross section orthogonal to the tube axis z, and then enters the sub-lens sound. You. Then, the sub-beam is subjected to a stronger focusing action in the vertical direction Y than in the horizontal direction X by the astigmatism action formed by the sub-lens portion. Since the electron beam is horizontally long in a cross section perpendicular to the tube axis z, a sufficiently small size and low distortion beam spot is formed on the phosphor screen as in the above-described embodiment. This makes it possible to stably display high-definition and high-resolution images.
- the third lens G, G 3 and the first segment in the sub-lens portion having a relatively low potential difference are not provided.
- G 4-1 is configured so as to provide a non-point-harvesting effect between and. For this reason, it is possible to suppress the variation of the astigmatism effect with respect to the fluctuation of the addition accuracy of the third grid and the first segment, and to achieve stable performance even in mass production. Can be secured o
- an asymmetric electron lens portion may be formed by using an electric field other than the electric field between the first grid G1 and the second grid G2. That is, the first grid G1 has a circular electron beam passage hole as shown in FIG.
- the sub lens unit has a vertical ⁇ ⁇ Construct an asymmetric electron lens having astigmatism stronger than the forcing force.
- O The sub-lens having such astigmatism is composed of the third grid G3 and the first segment G4. This is formed by forming a horizontally long electron beam passage hole as shown in FIG.
- the electron beam passage hole of the intermediate electrode GM is formed in a horizontally long rectangular shape having a long side in the horizontal direction X and a short side in the vertical direction Y.
- the intermediate electrode GM having such a horizontally elongated electron beam passage hole, and the third grid G3 and the 1-segment having a vertically elongated electron beam passage hole on the surface facing the intermediate electrode GM.
- the lens strength of the sub-lens part can be further enhanced in addition to the effect of the sub gun structure described above.
- the astigmatism effect can be more effectively applied to the electron beam of the eye [J incident on the lens unit.
- a beam spot having a sufficiently small size and a small distortion can be formed on the phosphor screen. fine and high the resolution for displaying the images stably for a possible force s o also, mass production was play a Niore, stable performance even Ru can and child secured.
- the main lens portion and the extended field electron lens may be used, that is, as shown in FIG.
- the second segment G4-12 of G4 is constituted by two cylindrical electrodes and one electric field compensator. That is, the second segment G 4-2 is constituted by sandwiching an electric field correction plate G 4 22 1 having an electron beam passage hole between two cylindrical electrodes G 4 2-1 and G 4 2 13. I have.
- the first cylindrical electrode G42-1 is arranged so as to face the first segment G411. This first cylindrical electrode G 4 2 1 1
- the electric field correction plate G422 is a plate-like electrode arranged on the side of the fifth tubular member G5 of the first cylindrical electrode G42-1.
- the electric field correction plate G 4 2 — 2 has three electron beam passage holes formed in a row in the horizontal direction corresponding to three force sources K (R, G, B) on the plate tfi.
- the two cylindrical electrodes G 4 2 — 3 having the electrodes are connected to the fifth grid G of the electric field compensator G 42-2.
- This second cylindrical electrode G42-3 is
- the fifth grid G5 is composed of two cylindrical electrodes and one electric field correction plate. That is, the fifth grid G5 is
- An electric field correction plate G512 having an electron beam passage hole is interposed between two cylindrical electrodes G5-1 and G5-3.
- the first cylindrical electrode G5-1 is arranged so as to face the second segment G4-2.
- the first cylindrical electrode G51-11 has an opening on the surface facing the second segment G4-2, through which the three electron beams are commonly passed.
- the electric field compensator G 5 — 2 is the first cylindrical electric It is a plate-like electrode arranged on the light screen side of pole G511.
- the electric field compensator G 5 — 2 was formed on the plate surface in a row in the horizontal direction corresponding to the three cathodes ⁇ (R, G, B).
- No. 3 is located on the phosphor screen side of the electric field compensator G5-2.
- the poles G5-13 are formed in a row in the horizontal direction corresponding to ⁇ 3 cathodes K (R, ⁇ G, B) With electron beam passage holes
- the first cylindrical electrode G5-1 of 5D and V5 is formed as a cylindrical body as shown in Fig.13. If an electric field expansion type main lens is constructed, It is only necessary that at least a part of the electrodes constituting the main lens part be provided with a cylindrical body.
- At least one of the surfaces opposed to 2 has a cylindrical body extending in the electron beam traveling direction.
- An electric field expansion type main lens unit was configured for V ⁇ G 5, and at least one intermediate ⁇ ⁇ pole was arranged between the fourth and fifth G 5 VKG 5.
- An intermediate electrode GM 'for the main lens may be arranged between V and V.
- the middle pole GM is connected to the resistor R. Then, a voltage obtained by dividing the anode voltage E b is applied. For this reason, the voltage applied to the intermediate electrode GM ′ is higher than the voltage applied to the second segment G412 and lower than the voltage applied to the fifth grid G5.
- At least one of the facing surfaces of the M ', and the fifth good G5 may be provided with a cylindrical body or a cylindrical electrode as shown in Fig. 13.
- the main lens portion is a large-diameter superimposed expansion type electronic lens, it is possible to sufficiently reduce the magnification, and as a result, it is possible to reduce the magnification on the phosphor screen. , It is possible to form a smaller beamhot ⁇
- a low potential is supplied to the two grids G2 constituting the prefocus lens unit, and 3 grid,
- G 3 is higher than the potential of the fourth grid G 4 ⁇ and the fifth grid
- a potential lower than the potential of G5 is supplied.
- the potential of the third grid G3 of ⁇ is supplied through the resistor R from the fifth Darido, G5 force, and thus is supplied.
- a large potential difference between the second grid G 2 and the third grid G 3 forms a pre-focus lens portion having a strong pre-force action.
- the potential penetration from the third grid G3 side to the electron beam passage hole of the second grid G2 increases, and the virtual object diameter is reduced.o
- the strong prefocus lens portion The action suppresses the expansion of the divergence angle of the child beam.
- X The electron beam flux before entering the lens is reduced.
- the second grid G2 and the third grid G3 have substantially circular electron beam passage holes, and the tube axis Z is formed between these grids.
- a rotationally symmetric center lens is formed at the center.
- this pre-focus lens section does not have an astigmatism effect.
- a pre-focus lens portion with a strong lens action was formed, and the pre-focus lens sound [5]
- the processing accuracy of the electrodes constituting the variance varied, and the axis deviation occurred when assembling the handgun. influence can and suppress Ru this to a minimum of the case, it is the degradation of by that beam spot Bok shape to these effects to suppress the force s possible ⁇
- the electron gun assembly includes the asymmetric electron lens portion such that the horizontal diameter of the electron beam incident on the main lens is larger than the vertical diameter. ing "
- the electron formed on the first grid G1 shall be a horizontal -pz shape that is long in the K-direction.
- a force source is provided around the beam passing hole formed in the first grid, G 1,
- Deflection magnetic field can reduce the influence of the deflection aberration and prevent the deterioration of the beam spot shape on the phosphor screen.
- the action can be further enhanced by forming the oblong hole and the oblong slit of the de G 1 together.
- the electrode on the high potential side ( The seedlings passing through the electron beam formed on G 3) have a vertically long shape.
- the hole has a long horizontal shape in the direction of the force source array. ⁇ Due to these effects, the electron beam before entering the main lens receives a stronger focusing action in the vertical direction than in the horizontal direction.
- the applied force S can reduce the influence of the deflection aberration caused by the deflection magnetic field, and can prevent the beam spot shape from deteriorating on the phosphor screen. .
- the action can be further enhanced by combining these third grids, the elongated holes of G3, and the elongated holes of the first segment G411.
- the sub-lens portion is formed by placing an intermediate pole UrM between the third grid G3 and the first segment G4-1 to further increase the lens strength. Also good. This makes it possible to more effectively force the electron beam before it enters the main lens unit.
- a cathode ray tube device capable of stably displaying a high-definition and high-resolution image.
Landscapes
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
- Electron Beam Exposure (AREA)
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020047013639A KR100662938B1 (ko) | 2003-01-15 | 2004-01-15 | 음극선관장치 |
US10/942,913 US7030548B2 (en) | 2003-01-15 | 2004-09-17 | Cathode-ray tube apparatus |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003007102A JP2004265604A (ja) | 2003-01-15 | 2003-01-15 | 陰極線管装置 |
JP2003-007102 | 2003-01-15 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/942,913 Continuation US7030548B2 (en) | 2003-01-15 | 2004-09-17 | Cathode-ray tube apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2004064105A1 true WO2004064105A1 (ja) | 2004-07-29 |
Family
ID=32709099
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/000219 WO2004064105A1 (ja) | 2003-01-15 | 2004-01-15 | 陰極線管装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7030548B2 (ja) |
JP (1) | JP2004265604A (ja) |
KR (1) | KR100662938B1 (ja) |
CN (1) | CN1698173A (ja) |
WO (1) | WO2004064105A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112516797B (zh) * | 2020-12-01 | 2022-09-16 | 中国科学院近代物理研究所 | 一种用于同位素分离系统的静电聚焦和加速系统及方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0393135A (ja) * | 1989-09-04 | 1991-04-18 | Matsushita Electron Corp | カラー受像管装置 |
JPH04315736A (ja) * | 1991-04-15 | 1992-11-06 | Nec Corp | インライン型カラー受像管用電子銃 |
JPH07130299A (ja) * | 1993-10-22 | 1995-05-19 | Samsung Display Devices Co Ltd | カラー陰極線管用電子銃 |
JPH07147145A (ja) * | 1993-11-25 | 1995-06-06 | Hitachi Ltd | 陰極線管用電子銃 |
JP2000331624A (ja) * | 1999-05-21 | 2000-11-30 | Mitsubishi Electric Corp | インライン型電子銃 |
JP2001084921A (ja) * | 1999-07-12 | 2001-03-30 | Toshiba Corp | カラーブラウン管装置 |
JP2002279916A (ja) * | 2001-01-09 | 2002-09-27 | Toshiba Corp | 陰極線管装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4764704A (en) * | 1987-01-14 | 1988-08-16 | Rca Licensing Corporation | Color cathode-ray tube having a three-lens electron gun |
JPH05290756A (ja) * | 1992-04-10 | 1993-11-05 | Toshiba Corp | カラー受像管 |
JP2000251757A (ja) * | 1999-02-26 | 2000-09-14 | Toshiba Corp | 陰極線管 |
JP2001283751A (ja) * | 2000-03-29 | 2001-10-12 | Toshiba Corp | 陰極線管装置 |
JP2002083557A (ja) * | 2000-06-29 | 2002-03-22 | Toshiba Corp | 陰極線管装置 |
KR100719526B1 (ko) * | 2000-08-22 | 2007-05-17 | 삼성에스디아이 주식회사 | 칼라 음극선관용 전자총 |
JP2002170503A (ja) * | 2000-11-30 | 2002-06-14 | Toshiba Corp | 陰極線管装置 |
KR100719533B1 (ko) * | 2001-05-04 | 2007-05-17 | 삼성에스디아이 주식회사 | 칼라 음극선관용 전자총 |
KR100468422B1 (ko) * | 2002-05-14 | 2005-01-27 | 엘지.필립스 디스플레이 주식회사 | 칼라음극선관용 전자총 |
-
2003
- 2003-01-15 JP JP2003007102A patent/JP2004265604A/ja not_active Abandoned
-
2004
- 2004-01-15 WO PCT/JP2004/000219 patent/WO2004064105A1/ja active Application Filing
- 2004-01-15 KR KR1020047013639A patent/KR100662938B1/ko not_active IP Right Cessation
- 2004-01-15 CN CNA2004800000504A patent/CN1698173A/zh active Pending
- 2004-09-17 US US10/942,913 patent/US7030548B2/en not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0393135A (ja) * | 1989-09-04 | 1991-04-18 | Matsushita Electron Corp | カラー受像管装置 |
JPH04315736A (ja) * | 1991-04-15 | 1992-11-06 | Nec Corp | インライン型カラー受像管用電子銃 |
JPH07130299A (ja) * | 1993-10-22 | 1995-05-19 | Samsung Display Devices Co Ltd | カラー陰極線管用電子銃 |
JPH07147145A (ja) * | 1993-11-25 | 1995-06-06 | Hitachi Ltd | 陰極線管用電子銃 |
JP2000331624A (ja) * | 1999-05-21 | 2000-11-30 | Mitsubishi Electric Corp | インライン型電子銃 |
JP2001084921A (ja) * | 1999-07-12 | 2001-03-30 | Toshiba Corp | カラーブラウン管装置 |
JP2002279916A (ja) * | 2001-01-09 | 2002-09-27 | Toshiba Corp | 陰極線管装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20050008649A (ko) | 2005-01-21 |
CN1698173A (zh) | 2005-11-16 |
US20050057196A1 (en) | 2005-03-17 |
US7030548B2 (en) | 2006-04-18 |
KR100662938B1 (ko) | 2006-12-28 |
JP2004265604A (ja) | 2004-09-24 |
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