WO2002047183A1 - Organischer feld-effekt-transistor, verfahren zur stukturierung eines ofets und integrierte schaltung - Google Patents
Organischer feld-effekt-transistor, verfahren zur stukturierung eines ofets und integrierte schaltung Download PDFInfo
- Publication number
- WO2002047183A1 WO2002047183A1 PCT/DE2001/004611 DE0104611W WO0247183A1 WO 2002047183 A1 WO2002047183 A1 WO 2002047183A1 DE 0104611 W DE0104611 W DE 0104611W WO 0247183 A1 WO0247183 A1 WO 0247183A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- ofet
- structuring
- organic
- functional polymer
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 29
- 230000005669 field effect Effects 0.000 title claims abstract description 6
- 229920001002 functional polymer Polymers 0.000 claims abstract description 22
- 238000000465 moulding Methods 0.000 claims description 14
- 239000011368 organic material Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 9
- 239000004020 conductor Substances 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 claims description 5
- 238000010924 continuous production Methods 0.000 claims description 2
- 238000009413 insulation Methods 0.000 claims description 2
- 238000010345 tape casting Methods 0.000 claims 1
- 229920000642 polymer Polymers 0.000 description 10
- 239000000463 material Substances 0.000 description 6
- 229920000767 polyaniline Polymers 0.000 description 6
- 239000004922 lacquer Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000007639 printing Methods 0.000 description 4
- 238000007606 doctor blade method Methods 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/621—Providing a shape to conductive layers, e.g. patterning or selective deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/464—Lateral top-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
- H10K71/221—Changing the shape of the active layer in the devices, e.g. patterning by lift-off techniques
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/821—Patterning of a layer by embossing, e.g. stamping to form trenches in an insulating layer
Definitions
- the invention relates to an organic field-effect transistor, a method for structuring an OFET and an integrated circuit with improved structuring of the functional polymer layers.
- Organic integrated circuits based on OFETs are used for microelectronic mass applications and disposable products such as identification and product "tags".
- a "tag” is e.g. an electronic bar code as it is attached to goods or on suitcases.
- OFETs have a wide range of uses as RFID tags: radio frequency identification tags that do not only have to be arranged on the surface. OFETs for these applications can do without the excellent performance of silicon technology, but this should ensure low manufacturing costs and mechanical flexibility.
- the components such as Electronic bar codes are typically one-way products and are only economically interesting if they are manufactured in inexpensive processes.
- the structured layer can only be structured with other known methods (such as printing) in such a way that the length 1 is the distance between
- Designated source and drain electrode and thus represents a measure of the power density of the OFET is at least 30 to 50 microns. However, lengths 1 of less than 10 ⁇ m are aimed for, so that apart from the elaborate lithography method, currently no structuring method seems sensible.
- the object of the invention is therefore to provide a cost-effective and mass-production method for structuring OFETs with high resolution. Furthermore, it is an object of the invention to create a more powerful OFET, which is equipped with more structured layers, and a more compact OFET, which can be produced with a smaller distance 1.
- the invention relates to an organic field-effect transistor (OFET), comprising at least the following layers on a substrate: an organic semiconductor layer between and above at least one source and at least one drain electrode which are made of a conductive organic material, an organic insulation layer over the semiconducting layer and an organic conductor layer, the conductor layer and at least one of the other two layers being structured.
- OFET organic field-effect transistor
- the invention also relates to a method for structuring an OFET Squeegee at least one functional polymer into a negative form.
- the invention relates to an integrated circuit which comprises at least one OFET, which has at least one structured conductor layer and a further structured layer.
- a negative form is a structured layer or a part of a structured layer that contains depressions into which the functional polymer, which for example forms an electrode of an OFET or a semiconductor or an insulator layer, is filled by doctor blades.
- the method comprises the following steps a) on a substrate or a lower layer, a, if necessary. full-surface molded layer, which is not applied to the area to be structured.
- This molded layer is not the functional polymer (i.e. semiconducting, conductive or insulating layer), but another organic material that serves as a shape or cliché for the conductive organic electrode layer. This other organic material should have insulating properties.
- the molding layer receives depressions corresponding to the structures by imprinting (pressing in a stamp impression with subsequent hardening by exposure), c) the functional polymer is then knife-coated into these depressions in liquid form, as a solution and / or as a melt.
- the negative shape of the structure on the molding layer can be produced on the substrate or a lower layer by the imprint method, which is a technique which is mature in the field of electronic and microelectronic components.
- the material of the negative form can be a UV-curing lacquer that has indentations after imprinting and exposure. Varnishes suitable for this purpose are commercially available and the method of structuring them by imprinting is known from the literature.
- a stamp is pressed onto the uncured molded polymer, which is applied as a layer on the substrate or a lower layer, in such a way that indentations occur in the manner in which the structuring is to take place.
- the layer provided with depressions is then hardened either thermally or by irradiation, which creates the solid molded layer into which the functional polymer can be knife-coated.
- doctor blade method is that the difficult structuring of functional polymers is prepared by the well-established and proven imprint method. This means that a rich technical background can be used and extremely fine structures can be achieved.
- the doctor blade method is also not material-specific. Rather, with the doctor method, polyaniline, but also any other conductive organic material, such as Polypyrrol, can be used to manufacture electrodes. Likewise, any other organic material such as Polythiophenes as semiconductors and / or polyvinylphenol as insulators are knife-coated and thus structured, that is to say the entire OFET.
- the negative mold is removed after the functional polymer has cured, so that any difference in height between the functional polymer and the negative mold that may result from evaporation of the solvent or shrinkage is reduced.
- the functional polymers can largely be left in their optimal consistency.
- polyaniline as a conductive organic material has a certain viscosity with optimal conductivity. If, for example, polyaniline is to be printed and not coated, its viscosity must be based on one of the printing methods This usually means a loss in conductivity.
- the viscosity range for doctoring is much larger than for printing, so that there is generally no need to make any changes in the viscosity of the organic material.
- an advantage of the doctor blade method is the ability to apply thick layers.
- the conductivity of 1 ⁇ m thick polymer electrodes is effectively higher than with the usual 0.2 ⁇ m layer thickness.
- “Functional polymer” here means any organic, organometallic and / or inorganic material that is functionally involved in the construction of an OFET and / or an integrated circuit made up of several OFETs. These include, for example, the conductive component (eg polyaniline), the one Electrode forms the semiconducting component that the
- organic material Everything that is based on organic material is referred to here briefly as “organic”, the term “organic material” encompassing all types of organic, organometallic and / or inorganic plastics, which are referred to in English as “plastics”, for example. These are all types of substances with the exception of classic semiconductors (germanium, silicon) and the typical metallic leads. ter. A restriction in the dogmatic sense ' to organic material as carbon-containing material is therefore not intended, rather the broad use of, for example, silicones is also contemplated. Furthermore, the term should not be restricted to polymeric or oligomeric materials, but the use of “small molecules” is also conceivable.
- each layer of an OFET to which a layer to be structured is applied is referred to here as the “lower layer”.
- the molding layer made of the molding polymer adjoins the “lower layer” or the substrate.
- the shape polymer is not defined here by the term “polymer” to be in a polymeric state of aggregation; rather, this substance can also be any plastics that can be used in practice to form a negative shape.
- Figure 1.1 shows the substrate or a lower layer 1 onto which the molding layer of the negative mold 2, for example made of a molding polymer such as a UV-curable lacquer, is applied over the entire surface, for example.
- the molding layer 2 is embossed with a stamp 4, as in FIG. 1.2. shown, provided with depressions, so there are 2 depressions with the stamp 4, which can be made of silicon dioxide (Si0 2 ), for example, in the molded layer. While the stamp 4 impresses the depressions 12, the molding layer 2 is irradiated with UV light, as a result of which the molding polymer 2 with permanent formation of the
- Wells 12 cures. This creates the depressions 12 in the molded layer 2, as shown in FIG. 1.3. are shown.
- the stamp 4 is pulled out of the molding layer 2 after the embossing has ended.
- the functional polymer 8 (for example polyaniline) is scraped into the recesses 12 using a doctor blade 9 (FIG. 1.4.).
- Figure 1.5 you can see how in the manufacture OFET the functional polymer 8. fills the depressions 12 of the molded layer 2.
- Figure 2 shows a further embodiment of the method in a continuous process or continuous web printing.
- the tape made of substrate or lower layer 1 with the molded polymer 2, which can be a UV-curable but also a thermally curable lacquer.
- This band is then subjected to 10 different work steps from left to right, as indicated by arrow 13, along several pressure rollers. First, it passes through the shadow plate 3, with which the not yet hardened molded polymer 2 is protected against radiation. Thereafter, depressions are embossed into the molded polymer 2 with the aid of the stamp roller 4, which are immediately hardened with the UV lamp 5 integrated in the stamp roller 4.
- the direction of the arrow from FIG. 5 indicates the direction of the light cone emitted from FIG. 5.
- the band provided with depressions 12 in the molding layer 2 then passes under a UV lamp or heater 6 for post-curing, so that a structured lacquer 7 is produced.
- the functional polymer 8 is then knife-coated into the structured lacquer 7 with the depressions 12, so that the finished structure 11 is produced.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Thin Film Transistor (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002548799A JP2004515928A (ja) | 2000-12-08 | 2001-12-07 | 有機電界効果トランジスタ、ofetの構造化法および集積回路 |
EP01999978A EP1346422A1 (de) | 2000-12-08 | 2001-12-07 | Organischer feld-effekt-transistor, verfahren zur stukturierung eines ofets und integrierte schaltung |
US10/433,959 US7229868B2 (en) | 2000-12-08 | 2001-12-07 | Organic field-effect transistor, method for structuring an OFET and integrated circuit |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10061297A DE10061297C2 (de) | 2000-12-08 | 2000-12-08 | Verfahren zur Sturkturierung eines OFETs |
DE10061297.0 | 2000-12-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2002047183A1 true WO2002047183A1 (de) | 2002-06-13 |
Family
ID=7666421
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE2001/004611 WO2002047183A1 (de) | 2000-12-08 | 2001-12-07 | Organischer feld-effekt-transistor, verfahren zur stukturierung eines ofets und integrierte schaltung |
Country Status (5)
Country | Link |
---|---|
US (1) | US7229868B2 (de) |
EP (1) | EP1346422A1 (de) |
JP (1) | JP2004515928A (de) |
DE (1) | DE10061297C2 (de) |
WO (1) | WO2002047183A1 (de) |
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WO2004055920A3 (en) * | 2002-12-14 | 2004-10-07 | Plastic Logic Ltd | Electronic devices |
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US6903958B2 (en) | 2000-09-13 | 2005-06-07 | Siemens Aktiengesellschaft | Method of writing to an organic memory |
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Also Published As
Publication number | Publication date |
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DE10061297C2 (de) | 2003-05-28 |
JP2004515928A (ja) | 2004-05-27 |
US7229868B2 (en) | 2007-06-12 |
US20040063267A1 (en) | 2004-04-01 |
EP1346422A1 (de) | 2003-09-24 |
DE10061297A1 (de) | 2002-06-27 |
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