WO2001075394A1 - Dispositif de mesure des interferences - Google Patents

Dispositif de mesure des interferences Download PDF

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Publication number
WO2001075394A1
WO2001075394A1 PCT/JP2001/002534 JP0102534W WO0175394A1 WO 2001075394 A1 WO2001075394 A1 WO 2001075394A1 JP 0102534 W JP0102534 W JP 0102534W WO 0175394 A1 WO0175394 A1 WO 0175394A1
Authority
WO
WIPO (PCT)
Prior art keywords
interference
sample
image
measuring device
interference image
Prior art date
Application number
PCT/JP2001/002534
Other languages
English (en)
French (fr)
Inventor
Junji Endo
Jun Chen
Original Assignee
Japan Science And Technology Corporation
Hitachi, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Science And Technology Corporation, Hitachi, Ltd. filed Critical Japan Science And Technology Corporation
Priority to JP2001572826A priority Critical patent/JP4164261B2/ja
Publication of WO2001075394A1 publication Critical patent/WO2001075394A1/ja

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H01J2237/1514—Prisms
PCT/JP2001/002534 2000-03-30 2001-03-28 Dispositif de mesure des interferences WO2001075394A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001572826A JP4164261B2 (ja) 2000-03-30 2001-03-28 干渉計測装置

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000097877 2000-03-30
JP2000-097877 2000-03-30
JP2000244031 2000-08-07
JP2000-244031 2000-08-07

Publications (1)

Publication Number Publication Date
WO2001075394A1 true WO2001075394A1 (fr) 2001-10-11

Family

ID=26589145

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2001/002534 WO2001075394A1 (fr) 2000-03-30 2001-03-28 Dispositif de mesure des interferences

Country Status (3)

Country Link
US (1) US6950195B2 (ja)
JP (1) JP4164261B2 (ja)
WO (1) WO2001075394A1 (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005066998A1 (ja) * 2004-01-09 2005-07-21 Riken 干渉装置
WO2006082758A1 (ja) * 2005-02-03 2006-08-10 Riken 干渉装置
WO2006090556A1 (ja) * 2005-02-23 2006-08-31 Riken 干渉装置
JP2008021626A (ja) * 2006-06-15 2008-01-31 Tohoku Univ 電子顕微鏡、電子線ホログラム作成方法及び位相再生画像作成方法
US7508488B2 (en) 2004-10-13 2009-03-24 Carl Zeiss Smt Ag Projection exposure system and method of manufacturing a miniaturized device
JP2013229244A (ja) * 2012-04-26 2013-11-07 National Institute For Materials Science 透過型電子顕微鏡及び電子線干渉法
JP2016102883A (ja) * 2014-11-28 2016-06-02 住友ベークライト株式会社 光導波路、光導波路モジュールの製造方法及び電子機器

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7184149B2 (en) * 2003-06-18 2007-02-27 Dimensional Photonics International, Inc. Methods and apparatus for reducing error in interferometric imaging measurements
JP4512183B2 (ja) * 2004-03-31 2010-07-28 独立行政法人理化学研究所 電子線干渉装置
US7593228B2 (en) * 2005-10-26 2009-09-22 Indium Corporation Of America Technique for forming a thermally conductive interface with patterned metal foil
JP4978065B2 (ja) * 2006-06-12 2012-07-18 株式会社日立製作所 電子顕微鏡応用装置
CN101819319B (zh) * 2009-12-28 2012-07-04 中国科学院西安光学精密机械研究所 使用菲涅尔双棱镜产生多层光片的荧光显微方法及装置
JP2013518256A (ja) * 2010-01-22 2013-05-20 デユーク・ユニバーシテイ 分光光コヒーレンストモグラフィ（ｏｃｔ）およびフーリエドメイン低コヒーレンス干渉法のための多重ウィンドウ処理スキーム
US9823127B2 (en) 2010-01-22 2017-11-21 Duke University Systems and methods for deep spectroscopic imaging of biological samples with use of an interferometer and spectrometer
JP6051596B2 (ja) * 2012-05-24 2016-12-27 国立研究開発法人理化学研究所 干渉電子顕微鏡
US10054777B2 (en) * 2014-11-11 2018-08-21 California Institute Of Technology Common-mode digital holographic microscope
CN110709204B (zh) * 2017-03-29 2022-02-01 新泽西鲁特格斯州立大学 小样品曲率半径和热膨胀实时测量系统和方法
IL253799B (en) 2017-08-02 2018-06-28 Igal Igor Zlochin Retroreflective interferometer
WO2019239618A1 (ja) * 2018-06-11 2019-12-19 株式会社島津製作所 欠陥検出方法及び装置
DE102018126544A1 (de) * 2018-10-24 2020-04-30 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren und Vorrichtung zum Erfassen von Richtungsänderungen eines Lichtstrahls
WO2020217448A1 (ja) * 2019-04-26 2020-10-29 株式会社島津製作所 干渉画像撮像装置
US11460419B2 (en) 2020-03-30 2022-10-04 Fei Company Electron diffraction holography
US11456149B2 (en) * 2020-03-30 2022-09-27 Fei Company Methods and systems for acquiring 3D diffraction data

Citations (4)

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JPH03115809A (ja) * 1989-09-29 1991-05-16 Canon Inc エンコーダ
JPH0726826B2 (ja) * 1986-08-20 1995-03-29 富士写真光機株式会社 シェアリング干渉計装置
JPH0933228A (ja) * 1995-07-21 1997-02-07 Olympus Optical Co Ltd 干渉計装置
JPH10199464A (ja) * 1997-01-17 1998-07-31 Hitachi Ltd 電子干渉計測装置

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IL63264A (en) * 1980-11-04 1986-07-31 Israel Atomic Energy Comm Topographical mapping system and method
US4653855A (en) * 1984-10-09 1987-03-31 Quantum Diagnostics Ltd. Apparatus and process for object analysis by perturbation of interference fringes
JP2651154B2 (ja) * 1987-09-04 1997-09-10 株式会社日立製作所 電子線ホログラフィ装置
US5192867A (en) * 1989-01-13 1993-03-09 Hitachi, Ltd. Electron optical measurement apparatus
JP2857273B2 (ja) * 1991-12-24 1999-02-17 科学技術振興事業団 収差補正法及び収差補正装置
JP3285157B2 (ja) * 1992-08-11 2002-05-27 科学技術振興事業団 位相情報観測方法及び位相情報観測用干渉装置
US5432347A (en) * 1992-11-12 1995-07-11 U.S. Philips Corporation Method for image reconstruction in a high-resolution electron microscope, and electron microscope suitable for use of such a method
JP3378413B2 (ja) * 1994-09-16 2003-02-17 株式会社東芝 電子線描画装置及び電子線描画方法
JPH1140097A (ja) 1997-07-23 1999-02-12 Hitachi Ltd 電子線干渉装置
US6215578B1 (en) * 1998-09-17 2001-04-10 Vanguard International Semiconductor Corporation Electronically switchable off-axis illumination blade for stepper illumination system

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0726826B2 (ja) * 1986-08-20 1995-03-29 富士写真光機株式会社 シェアリング干渉計装置
JPH03115809A (ja) * 1989-09-29 1991-05-16 Canon Inc エンコーダ
JPH0933228A (ja) * 1995-07-21 1997-02-07 Olympus Optical Co Ltd 干渉計装置
JPH10199464A (ja) * 1997-01-17 1998-07-31 Hitachi Ltd 電子干渉計測装置

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7538323B2 (en) 2004-01-09 2009-05-26 Riken Interferometer
JP2005197165A (ja) * 2004-01-09 2005-07-21 Institute Of Physical & Chemical Research 干渉装置
JP4512180B2 (ja) * 2004-01-09 2010-07-28 独立行政法人理化学研究所 干渉装置
WO2005066998A1 (ja) * 2004-01-09 2005-07-21 Riken 干渉装置
US7508488B2 (en) 2004-10-13 2009-03-24 Carl Zeiss Smt Ag Projection exposure system and method of manufacturing a miniaturized device
WO2006082758A1 (ja) * 2005-02-03 2006-08-10 Riken 干渉装置
JP2006216345A (ja) * 2005-02-03 2006-08-17 Institute Of Physical & Chemical Research 干渉装置
US7872755B2 (en) 2005-02-03 2011-01-18 Riken Interferometer
US7750298B2 (en) 2005-02-23 2010-07-06 Riken Interferometer having three electron biprisms
JP2006313069A (ja) * 2005-02-23 2006-11-16 Institute Of Physical & Chemical Research 干渉装置
JP4523448B2 (ja) * 2005-02-23 2010-08-11 独立行政法人理化学研究所 荷電粒子線装置および干渉装置
WO2006090556A1 (ja) * 2005-02-23 2006-08-31 Riken 干渉装置
JP2008021626A (ja) * 2006-06-15 2008-01-31 Tohoku Univ 電子顕微鏡、電子線ホログラム作成方法及び位相再生画像作成方法
JP2013229244A (ja) * 2012-04-26 2013-11-07 National Institute For Materials Science 透過型電子顕微鏡及び電子線干渉法
JP2016102883A (ja) * 2014-11-28 2016-06-02 住友ベークライト株式会社 光導波路、光導波路モジュールの製造方法及び電子機器

Also Published As

Publication number Publication date
US6950195B2 (en) 2005-09-27
JP4164261B2 (ja) 2008-10-15
US20030160969A1 (en) 2003-08-28

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