WO2001034863A1 - ALLIAGE A BASE DE Fe-Ni POUR MASQUE A SEMI-TENSION - Google Patents

ALLIAGE A BASE DE Fe-Ni POUR MASQUE A SEMI-TENSION Download PDF

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Publication number
WO2001034863A1
WO2001034863A1 PCT/JP2000/005445 JP0005445W WO0134863A1 WO 2001034863 A1 WO2001034863 A1 WO 2001034863A1 JP 0005445 W JP0005445 W JP 0005445W WO 0134863 A1 WO0134863 A1 WO 0134863A1
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Prior art keywords
less
semi
tension
mask
alloy
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PCT/JP2000/005445
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English (en)
Japanese (ja)
Inventor
Toshiyuki Ono
Original Assignee
Nippon Mining & Metals Co., Ltd.
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Publication date
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Priority to DE10085130T priority Critical patent/DE10085130T1/de
Publication of WO2001034863A1 publication Critical patent/WO2001034863A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/08—Ferrous alloys, e.g. steel alloys containing nickel
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/004—Very low carbon steels, i.e. having a carbon content of less than 0,01%
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/02—Ferrous alloys, e.g. steel alloys containing silicon
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/04—Ferrous alloys, e.g. steel alloys containing manganese
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/06—Ferrous alloys, e.g. steel alloys containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/12—Ferrous alloys, e.g. steel alloys containing tungsten, tantalum, molybdenum, vanadium, or niobium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/16—Ferrous alloys, e.g. steel alloys containing copper
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/06—Screens for shielding; Masks interposed in the electron stream
    • H01J29/07—Shadow masks for colour television tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00—Details of cathode ray tubes or electron beam tubes
    • H01J2229/07—Shadow masks
    • H01J2229/0727—Aperture plate
    • H01J2229/0733—Aperture plate characterised by the material

Definitions

  • the present invention relates to a semi-tensile mask (Semi-Stretched tension-mask) made of Fe—Ni alloy used for a cathode ray tube (CRT). Fe, Ni-based alloys with excellent creep characteristics and excellent suppression of masking after baking after tensioning, and their Fe-N
  • the present invention relates to a semi-tension mask manufactured using an i-based alloy and a color brown tube using the semi-tension mask.
  • the cathode ray tube is provided with a mask as a mechanism for causing an electron beam emitted from an electron gun to precisely strike a predetermined phosphor on a phosphor screen to give a specific color tone.
  • a shadow mask method is used in which a mask material is formed by etching a dot or slot for electron beam transmission and then press-molded into a mask form, and a long slit for electron beam transmission is etched in the mask material. After being formed by processing, it is roughly divided into the aperture grill type, which is pulled up and down and stretched over the frame.
  • This semi-tension mask method uses dots or slots for electron beam transmission.
  • the mask material formed by the etching process is pulled up and down in the same way as the aperture grill method without being pressed, and is supported on the frame (stretching method).
  • the mask material was pulled not only up and down but also left and right in a total of four directions.
  • the mask often broke. Attempts have been made to pull the mask material in only two directions, up and down, in order to avoid the risk of such a mask breaking.
  • Masks made by this improvement are now called semi-'stretched 'tension masks, or simply semi-tension masks, because they were pulled in two directions rather than in four directions. Was.
  • FIG. 1 and 2 are explanatory views schematically illustrating a semi-tension type mask and an aperture grill type mask, respectively. Both types of masks are pulled up and down.
  • a semi-tension mask a number of vertical slot rows are formed over the entire width, and each slot row is composed of a number of slots with a bridge interposed between adjacent slots, while an aperture grill type mask has a large number of rows over the entire width. It includes a long vertical slit and requires a damper line to suppress the vibration of the mask from an acoustic source such as a speaker.
  • the bridge in the semi-tension type mask is an unetched portion between the slots in each slot row when the slots are formed by etching. The bridge acts to prevent twisting of the array of vertical slots.
  • the semi-tension type mask is also called a tension mask with a bridge because a bridge exists in each slot row.
  • the semi-tension mask method enables more flattening, higher brightness, and higher resolution than the shadow mask method using a press. Furthermore, due to the presence of the bridge, it has better vibration resistance than the aperture grill system, does not require a damper line, and reduces the vertical pull load, contributing to cost reduction.
  • the semi-tension mask method unlike the aperture grill method, a doming phenomenon occurs due to thermal expansion due to low stretching force and bridging, etc., so that an InVar alloy having a low coefficient of thermal expansion is used.
  • the adoption of Fe-Ni-based alloys, which are the center, is being considered.
  • tension down was caused by baking at the mask assembly stage. It was found that large problems, such as the occurrence of screens, occurred.
  • the conventional Invar alloy was found to be inaccurate for the semi-tension mask method, but the cause of this was investigated in detail at each stage of the mask manufacturing and found to be related to the creep characteristics of the material. It has been found.
  • the material etched in the form of dots or slots is blackened, then welded to the frame material, and stretched so that a constant load is applied.
  • the "blackening treatment” refers to a treatment in which the mask material is heated in a steam or combustion gas atmosphere to form a black film such as an iron oxide film on the surface of the mask material so as to make it black. After that, it is stretched so that a constant load is applied, welded to the frame material, and the backing is used to remove the distortion caused by welding.
  • the InVar alloy pulled by the frame material exhibited plastic deformation at high temperature, that is, creep phenomenon. When the creep phenomenon occurs, the load stretched by the mask elongation is reduced (tension down), causing various problems such as generation of shear and deterioration of vibration characteristics.
  • An object of the present invention is to establish a countermeasure for preventing the occurrence of creep during blackening, stretching and baking in a semi-tension mask.
  • the inventors of the present invention basically add one or more of Cu, Nb, Mo, W and Ta to a 6- ⁇ -based alloy, and preferably add A 1 and Si in appropriate amounts.
  • the impurities C, P, and S are regulated, and the final working ratio is adjusted to an appropriate range, and if necessary, a strain relief annealing is performed. No cleaving occurred, and it was found that the cleave characteristics could be greatly improved.
  • Ni is 34% or more and 45% or less, Mn is 0.01% or more and 0.5% or less, and one or more of Cu, Nb, Mo, W, and Ta is 0.011 in total.
  • Fe-Ni alloy for semi-tension masks characterized by having excellent creep properties, containing at least 1.5% and not more than 1.5%, with the balance being Fe and unavoidable impurities.
  • C is 0.010% or less
  • P is 0.015% or less
  • S is 0.010% or less.
  • the working degree of the final cold rolling is set to 15% or more and 60% or less.
  • Fe-Ni alloy for semi-tension masks described in (1) to (6) characterized by performing strain relief annealing after final cold rolling.
  • the present invention also provides
  • the Fe—Ni-based alloy mask material is formed by etching dots or slots for electron beam transmission by etching.
  • a semi-tension mask characterized by being stretched up and down after being subjected to a
  • FIG. 1 schematically illustrates a semi-tension type mask.
  • the mask is pulled up and down.
  • a semi-tension mask a number of vertical slot rows are formed over the entire width, and each slot row is composed of a number of slots with a bridge interposed between adjacent slots.
  • Pre-tension in semi-tension type mask Edges are unetched portions between slots in each slot row when slots are formed by etching.
  • the bridge acts to prevent the vertical row of slots from twisting.
  • the semi-tension method enables more flattening, higher brightness and higher resolution than the shadow mask method using a press. Furthermore, it has better vibration characteristics than the aperture grill system, does not require a damper wire, and reduces the vertical pull load, contributing to cost reduction.
  • Ni is 34% or more and 45% or less
  • Mn is 0.01% or more and 0.5% or less
  • one or more of Cu, Nb, Mo, W, and Ta are used.
  • a total of 0.01% or more and 1.5% or less desirably further contains Si in a range of 0.005% or more and 0.20% or less, A1 in a range of 0.005% or more and 0.003% or less
  • the balance consists of Fe and unavoidable impurities.
  • excellent creep characteristics are regulated, where C is regulated at 0.010% or less, P is regulated at 0.015% or less, and S is regulated at 0.010% or less.
  • a Fe-Ni alloy having a specified composition is melted in a vacuum melting furnace, then forged and hot-rolled to a thickness of 2 to 4 mm, and then cold-rolled and bright annealed. Is repeated to form a cold-rolled material having a thickness of about 0.3 mm to about 0.1 mm. Furthermore, after recrystallization annealing, it is rolled to a thickness of 0.1 mm ⁇ 0.05 mm by final cold rolling to produce a mask material. Preferably, after the final cold rolling, strain relief annealing is performed at a temperature of 350 to 500 ° C for 10 minutes to 1 hour.
  • the mask material is baked with photoresist on both sides, and after development, dots or slots are etched by spraying an etching solution mainly containing an aqueous ferric chloride solution.
  • a blackening treatment is performed in a steam or combustion gas atmosphere at a temperature of 580 to 670, then pulled up and down, and welded in a state of being stretched over a frame to produce a semi-tension mask.
  • baking is performed at a temperature of 350 to 500 for 10 minutes to 1 hour to remove the distortion caused by welding and the like.
  • the film is generally stretched after blackening. If the blackening temperature is much lower than the recrystallization temperature of the Fe-Ni alloy, work hardening of the alloy can be performed as described in the patent application (Japanese Patent Application No. 10-356219). Can be used to improve the creep characteristics. However, the blackening temperature and the heat treatment called "baking" are more severe. At higher temperatures, the effect of improving the creep characteristics due to the processing effect becomes less than expected.
  • the greatest effect expected from increasing the blackening temperature is improvement in magnetic properties.
  • the maximum relative magnetic permeability when blackening treatment is performed at 590 ° C. is 87 0 to 100 0, but 5 0 higher 6
  • the blackening process is performed at 40 ° C.
  • the maximum relative magnetic permeability becomes 130 to 120.
  • a terrestrial magnetism shield after AC demagnetization such as a cathode ray tube
  • the larger the maximum relative magnetic permeability the better the shielding performance. Therefore, it is desired that the blackening treatment can be performed at a temperature higher than the temperature at which softening starts in the conventional Fe—Ni alloy.
  • the present invention by selecting the type and amount of the element to be added to the Fe—Ni-based alloy, there is almost no increase in the coefficient of thermal expansion, and no precipitate that hinders etching is generated. Use a new Fe-Ni-based alloy that can produce a better effect than work hardening and can reduce the creep rate.
  • the present invention exerts a particularly remarkable effect when a heat treatment such as a blackening treatment is performed at a temperature higher than a temperature at which the conventional Fe—Ni alloy starts softening.
  • the final cold rolling work ratio is 15% or more and 60% or less, and the tensile strength after final cold rolling is 60 ON / mm 2 or more and 700 NZmm 2 or less.
  • the 0.2% proof stress after the final cold rolling is assumed 5 7 is 0 NZmm 2 or 6 7 0 NZmm 2 below.
  • a semi-tension mask is generally blackened before being stretched, non-uniform residual stress occurs when it is etched into dots or slots, and the shape of the semi-tension mask when it is released by blackening is increased. Therefore, it is desirable to remove the residual stress of the mask material before etching by performing strain relief annealing after the final cold rolling to prevent the residual stress from becoming uneven due to the etching.
  • Ni The content of Ni affects the thermal expansion characteristics and softening characteristics. If Ni exceeds 36%, the coefficient of thermal expansion increases, which is disadvantageous in terms of cost. However, since the creep elongation in the baking is small due to the rise in the softening temperature, the bridging tension of the semi-tension mask can be increased to prevent deterioration of the doming characteristics due to thermal expansion. Furthermore, the larger the Ni, the better the magnetic properties, which is advantageous in terms of magnetic shielding. However, if Ni exceeds 45%, the difference in thermal expansion characteristics from mild steel becomes smaller, so that considering the cost, there is no advantage in using Fe-Ni alloy for semi-tension masks. Therefore, the upper limit of Ni is set to 45%.
  • the lower limit of Ni is set to 34%.
  • increasing the bridging tension with a semi-tension mask requires high strength for the frame and increases the cost.Therefore, the overall Ni component range is at least 34% based on the thermal expansion characteristics and cost. 38% or less is desirable.
  • Mn is necessary to detoxify S contained as an impurity that inhibits hot workability. If Mn is less than 0.01%, this effect is not obtained, and if it exceeds 0.5%, the etching property is impaired and the coefficient of thermal expansion becomes large. Therefore, the component range is set to 0.01% or more and 0.5% or less, but a preferable range for improving the etching property and the thermal expansion property is 0.01% or more and 0.1% or less.
  • Si is added as a deoxidizing agent. However, if Si is more than 0.2%, the etching property is greatly impaired, so it is preferably 0.20% or less. However, since it is small but has the effect of improving the cleave characteristics, the lower limit of the component range is set to 0.005% or more. However, to improve the etching properties The preferred range is 0.005% or more and 0.03% or less.
  • a 1 is used as a deoxidizing agent, and dissolving 81 more than 0.005% has the effect of improving creep properties.
  • A1 content is more than 0.03%, alumina is formed, and the etching property is impaired, and surface defects due to alumina are generated in cold rolling. Therefore, its component range is set to 0.005% or more and 0.030% or less.
  • C forms carbides, but if C exceeds 0.010%, carbides are excessively generated, which inhibits the etching property. Therefore, C is set to 0.01% or less. However, since solid solution C also has an adverse effect on etching properties, it is preferable that C is as small as possible, and a more preferable range of C is 0.005% or less.
  • S If S exceeds 0.010%, hot workability is impaired, and sulfide-based inclusions are increased to adversely affect etching properties. Therefore, the upper limit is set to 0.010% or less.
  • Cu, Nb, Mo, W, Ta Creep characteristics can be improved by adding Cu, Nb, Mo, W, and Ta. However, if the total amount is less than 0.01%, the effect of improving the clip is small.
  • the larger the amount of addition the better the creep characteristics, but the larger the coefficient of thermal expansion.
  • increasing the amounts of Nb, Mo, W, and Ta also increases costs.
  • the addition of Cu, Nb, Mo, W, and Ta raises the softening temperature.
  • the doping characteristics due to thermal expansion can be increased by increasing the tension of the semi-tension mask. Degradation can be prevented.
  • adding more than 1.5% increases the cost, so that the component range of one or more of these elements is set to 0.01% or more and 1.5% or less in total.
  • Final cold rolling reduction If the final cold rolling reduction is less than 15%, the amount of work hardening is small, and the creep improvement effect is not so noticeable. On the other hand, when the working ratio exceeds 60%, softening starts during the blackening treatment, and on the contrary, the high-temperature strength and the creep properties are reduced. Therefore, the final cold rolling degree should be between 15% and 60%. Blackening temperature When the temperature exceeds 600 ° C., the working ratio of the final cold rolling is preferably from 20% to 40%.
  • Strain relief annealing does not affect cleave elongation after blackening treatment, but is performed to suppress uneven deformation caused by release of residual stress during blackening treatment. It is desirable. After final cold rolling, it is recommended to perform strain relief annealing at a temperature of 350 to 500 ° C for 10 minutes to 1 hour.
  • Tensile strength after final cold rolling For semi-tension mask materials, the higher the mask strength when applying tension and the higher temperature and creep strength of the mask during baking heat treatment, the greater the design margin. Born and preferred. It has been found that the mechanical properties of these masks can be defined by the material strength after final cold rolling. If the tensile strength after the final cold rolling is less than 60 O NZmm 2 , it is very difficult to set the load that can be stretched on the mask to a preferable range, so the lower limit was set to 60 O NZ mm 2 . on the other hand,
  • the softening start temperature starts to decrease. Therefore, the range of the tensile strength after the final cold rolling is set to be 60 O NZmm 2 or more and 70 ON / mm 2 or less.
  • Table 1 shows the alloy compositions used in the examples of the present invention.
  • these materials were finally rolled to a thickness of 0.1 mm in a cold state after recrystallization annealing to produce materials with various final working degrees.
  • the average thermal expansion coefficient between 30 ° C and 100 ° C was measured for materials having the chemical components A to Y in Table 1 and a final cold-rolling reduction of about 35%.
  • An aqueous ferric chloride solution of 45 Baume at 60 ° C was sprayed on the surface at a pressure of 0.3 MPa, and the state of the etching surface was observed.
  • Table 2 shows the results of tensile strength, 0.2% resistance to heat and creep elongation, and the state of the etched surface as etchability.
  • No. 1 to No. 14 are examples of the present invention satisfying claims 1 to 6 (composition and final cold rolling workability and strength requirements).
  • No. 15 and No. 17 have low strength after final cold rolling because the degree of final cold rolling is less than 15%, and are not preferable for handling such as etching.
  • No. 16 and No. 18 show that the final cold rolling reduction exceeds 60%, the softening start temperature decreases, and as a result, the creep elongation under the load of 20 ONZmm 2 is large, The creep elongation after blackening at 640 ° C exceeds 0.16%, which is the lower limit of the occurrence of shear in the semi-tension mask.
  • the creep elongation of Nb-added No. 18 was smaller, so the softening start temperature was higher depending on the added elements (Cu, Nb, Mo, W, Ta). It can be seen that it is moving to the side.
  • No. 19 and No. 20 do not contain the added elements (Cu, Nb, Mo, W, Ta) in the amounts specified in the present invention (0.01 to 1.5%). load to the creep elongation of 20 ONZmm 2 stress even when the blackened at 600 ° C regardless of the rolling working ratio exceeds 16% 0.1.
  • No. 21, No. 25, and No. 32 indicate that the chemical component (Nb or Ni) is within the range specified by the present invention (Ni: 34 to 45%, Nb: 0.01 to 1.5%).
  • the thermal expansion coefficient is large because of the It is unsuitable as a disc material.
  • the amounts of added elements of Cu, Nb, Mo, W, and Ta exceeded the range of the present invention, comparison was made only for Nb. It is clear from the results in Table 2 that the expansion is large. If the expansion exceeds the range of the present invention, the material becomes unsuitable as a material for a semi-tension mask.
  • a 1 2 ⁇ 3 is present in clustered, because Mn S and Rinhen ⁇ is extending linearly for ductile the shape of the edge of the dot-like or slot-like etched holes make worse.
  • Mn increased the coefficient of thermal expansion.
  • No. 30 has a creep elongation of 0.16% or less and a low coefficient of thermal expansion, but since Mn is less than 0.01%, embrittlement due to S segregation during hot working can be made harmless. In some cases, cracks and flaws may occur during forging and hot rolling. In addition, the roughness of the crystal grain boundary is large when the etching is performed, which is considered to be due to segregation of S at the crystal grain boundary.
  • the Fe-Ni-based alloy of the present invention has excellent cleave characteristics and a low coefficient of thermal expansion, it is suitable as a material for color cathode-ray tubes without color shift. It is particularly effective when performing blackening at high temperatures (above 600) to improve magnetic shielding.
  • the semi-tension mask according to the present invention is suitable for enabling a flat screen of a color cathode ray tube.
  • 1 and 2 are explanatory views schematically illustrating a semi-tension type mask and an aperture grill type mask, respectively.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)
  • Heat Treatment Of Sheet Steel (AREA)

Abstract

L'invention concerne un alliage à base de Fe-Ni pour un masque à semi-tension comprenant du Ni à raison de 34 à 45 %, du Mn à raison de 0,1 à 0,5 %, et la somme d'un ou plusieurs Cu, Nb, Mo et Ta à raison de 0,01 à 1,5 %, et comprenant, de préférence, 0,005 à 0,20 % de Si et 0,005 à 0,030 % d'Al, le reste de l'alliage étant constitué par du Fe et des impuretés inévitables, de préférence, à condition que le contenu de C, P, et S soit respectivement inférieur ou égal à 0,010 %, inférieur ou égal à 0,015 %, et inférieur ou égal à 0,010 %. L'invention concerne également un masque à semi-tension utilisant l'alliage à base de Fe-Ni, ainsi qu'un tube cathodique couleur utilisant le masque à semi-tension. L'alliage à base de Fe-Ni possède d'excellentes caractéristiques de fluage. Le phénomène du fluage provoque les problèmes d'apparition de rides dans un masque, de réduction des caractéristiques de vibration, et analogue. Un taux de fluage amélioré a été observé après soumission d'un masque à semi-tension classique à un noircissement par traitement aux fins d'amélioration de ses caractéristiques magnétiques.
PCT/JP2000/005445 1999-11-09 2000-08-14 ALLIAGE A BASE DE Fe-Ni POUR MASQUE A SEMI-TENSION WO2001034863A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE10085130T DE10085130T1 (de) 1999-11-09 2000-08-14 Fe-Ni-Legierung für Halbspannungsmaske, Halbspannungsmaske aus der Legierung und die Maske verwendende Farbbildröhre

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP31765499A JP2001131715A (ja) 1999-11-09 1999-11-09 セミテンションマスク用Ｆｅ−Ｎｉ系合金並びにそれを用いたセミテンションマスク及びカラーブラウン管
JP11-317654 1999-11-09

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WO2001034863A1 true WO2001034863A1 (fr) 2001-05-17

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JP (1) JP2001131715A (fr)
KR (1) KR100375191B1 (fr)
DE (1) DE10085130T1 (fr)
TW (1) TW567232B (fr)
WO (1) WO2001034863A1 (fr)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07224359A (ja) * 1994-02-08 1995-08-22 Hitachi Metals Ltd 高強度高エッチング性シャドウマスク材料およびシャドウマスクの製造方法
JPH07268557A (ja) * 1994-03-29 1995-10-17 Nippon Yakin Kogyo Co Ltd 黒化処理性に優れたシャドウマスク用Ｆｅ−Ｎｉ系合金及びその製造方法
JPH0813096A (ja) * 1994-06-28 1996-01-16 Nkk Corp エッチング性と表面処理性に優れた電子用高強度 低熱膨張合金薄板とその製造法
JPH08333638A (ja) * 1994-12-27 1996-12-17 Imphy Sa 鉄／ニッケル合金のシャドーマスクの製造方法
JPH09263891A (ja) * 1996-03-29 1997-10-07 Nippon Yakin Kogyo Co Ltd 打ち抜き性に優れた高強度低熱膨張性Ｆｅ−Ｎｉ系合金材料およびその製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07224359A (ja) * 1994-02-08 1995-08-22 Hitachi Metals Ltd 高強度高エッチング性シャドウマスク材料およびシャドウマスクの製造方法
JPH07268557A (ja) * 1994-03-29 1995-10-17 Nippon Yakin Kogyo Co Ltd 黒化処理性に優れたシャドウマスク用Ｆｅ−Ｎｉ系合金及びその製造方法
JPH0813096A (ja) * 1994-06-28 1996-01-16 Nkk Corp エッチング性と表面処理性に優れた電子用高強度 低熱膨張合金薄板とその製造法
JPH08333638A (ja) * 1994-12-27 1996-12-17 Imphy Sa 鉄／ニッケル合金のシャドーマスクの製造方法
JPH09263891A (ja) * 1996-03-29 1997-10-07 Nippon Yakin Kogyo Co Ltd 打ち抜き性に優れた高強度低熱膨張性Ｆｅ−Ｎｉ系合金材料およびその製造方法

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Publication number Publication date
DE10085130T1 (de) 2002-10-24
TW567232B (en) 2003-12-21
KR100375191B1 (ko) 2003-03-08
KR20010050107A (ko) 2001-06-15
JP2001131715A (ja) 2001-05-15

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