WO1990011603A1 - Fil electrique isole - Google Patents

Fil electrique isole Download PDF

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Publication number
WO1990011603A1
WO1990011603A1 PCT/JP1990/000401 JP9000401W WO9011603A1 WO 1990011603 A1 WO1990011603 A1 WO 1990011603A1 JP 9000401 W JP9000401 W JP 9000401W WO 9011603 A1 WO9011603 A1 WO 9011603A1
Authority
WO
WIPO (PCT)
Prior art keywords
oxide
layer
chromium oxide
wire
containing layer
Prior art date
Application number
PCT/JP1990/000401
Other languages
English (en)
Japanese (ja)
Inventor
Shinji Inazawa
Kouichi Yamada
Kazuo Sawada
Original Assignee
Sumitomo Electric Industries, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries, Ltd. filed Critical Sumitomo Electric Industries, Ltd.
Priority to KR1019900702515A priority Critical patent/KR940000845B1/ko
Priority to DE69013448T priority patent/DE69013448T2/de
Priority to EP90904938A priority patent/EP0416131B1/fr
Publication of WO1990011603A1 publication Critical patent/WO1990011603A1/fr
Priority to US08/023,077 priority patent/US5372886A/en
Priority to HK96795A priority patent/HK96795A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B7/00—Insulated conductors or cables characterised by their form
    • H01B7/17—Protection against damage caused by external factors, e.g. sheaths or armouring
    • H01B7/29—Protection against damage caused by extremes of temperature or by flame
    • H01B7/292—Protection against damage caused by extremes of temperature or by flame using material resistant to heat
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B7/00—Insulated conductors or cables characterised by their form
    • H01B7/02—Disposition of insulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H01B13/06—Insulating conductors or cables
    • H01B13/065—Insulating conductors with lacquers or enamels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
    • H01B3/10—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances metallic oxides
    • H01B3/105—Wires with oxides

Definitions

  • the present invention relates to an insulated wire, and more particularly to an insulated wire such as a wiring wire and a winding wire used in a high vacuum environment such as a high vacuum device or a device used at a high temperature, or in a high temperature environment. Things.
  • Insulated wires may be used for equipment that requires safety at high temperatures, such as heating equipment and fire alarms. Insulated wires are also used in environments where automobiles are heated to high temperatures. Conventionally, as such an insulated wire, an insulated wire in which a conductor is covered with a heat-resistant organic resin such as polyimide-fluorinated resin is used.
  • a heat-resistant organic resin such as polyimide-fluorinated resin
  • the conductor is inserted into an insulated wire in the form of a conductor passed through a ceramic tube, or a tube made of a heat-resistant alloy such as a stainless steel alloy filled with metal oxide fine particles such as magnesium oxide. Ml Cape Inlet (Mineral Insulated Cab 1e) etc. in the form of passing through have been used for such purposes.
  • a glass braided insulated wire that uses a fiber woven fabric as an insulating member is exemplified.
  • the highest temperature at which insulation can be maintained is at most
  • insulated wires with improved heat resistance using ceramic tube made of glass have drawbacks such as poor flexibility.
  • the MI cable is composed of a heat-resistant alloy tube and a conductor, the outer diameter of the cable increases. As a result, the Ml cable has a relatively large cross section for the amount of power allowed by the conductor passed through the heat-resistant alloy tube.
  • the outer layer of the MI cable is made of a heat-resistant alloy tube, it has good flexibility.
  • it in order to use it as a wire for winding wound on a bobbin or the like in a coil shape, it is necessary to bend a pipe made of a heat-resistant alloy at a predetermined curvature. At this time, the bending work performed on the heat-resistant alloy pipe involves difficulty.
  • the MI cable is wound in a coil shape, it is difficult to improve the winding density because the outer layer pipe is thicker than the conductor.
  • alumite wire which is an anodized aluminum or aluminum alloy wire, as an insulated wire with good heat resistance, insulation and heat dissipation.
  • the base material is limited to aluminum.
  • the inorganic insulating layer formed on the base material is also limited to aluminum oxide. Therefore, there was a problem that a combination of a base material and an inorganic insulating layer suitable for various uses could not be selected.
  • this invention was made in order to solve the said problem, and it aims at providing the insulated wire provided with the following matters.
  • a combination of a base material and an inorganic insulating layer suitable for various uses can be selected.
  • the insulated wire according to the present invention comprises a base material and chromium oxide. And an oxide insulating layer.
  • the substrate has an outer surface and includes a conductor.
  • the chromium oxide-containing layer is formed on the outer surface of the substrate.
  • the oxide insulating layer is formed by applying a precursor solution of a metal oxide on the chromium oxide-containing layer by a sol-gel method or an organic acid salt pyrolysis method.
  • the chromium oxide-containing layer is preferably formed by an electrochemical method.
  • the electrochemical method means an electrolytic plating method or an electroless plating method.
  • Underlayer performing oxide insulating layer in order to function lay favored as a contact ⁇ is, C r 0 3 - X ( .. 1 5 ⁇ X ⁇ 2 5) may be any layer. That is, the layer formed by the electrochemical method has a chromium oxide layer as the outermost layer.
  • the oxide insulating layer preferably contains silicon oxide, aluminum oxide, and zirconium oxide. From the viewpoint of high conductivity and cost, it is preferable that the base material be a copper or copper alloy. In consideration of applications at higher temperatures, the surface layer of the base material preferably contains nickel, chromium, silver, iron or iron alloy, stainless alloy, titanium or titanium alloy.
  • a chromium plating layer is formed as a good adhesion layer on a conductor such as a ⁇ or ⁇ alloy.
  • insulating oxide ceramics such as silicon oxide obtained by heat treatment of the precursor solution of the metal oxide show little adhesion to the chromium plating layer. This is a book This is based on the knowledge of the inventor.
  • a layer having a chromium oxide layer as the outermost layer is formed on the outer surface of the substrate. On this chromium oxide layer, an insulating oxide ceramic adheres as a layer having good adhesion.
  • the chromium oxide layer is formed by an electrochemical method.
  • an electrolytic solution obtained by adding a small amount of an organic acid to an aqueous solution of chromic acid is used.
  • a surge bath mainly composed of chromic acid and sulfuric acid is known as an electrolytic bath used for performing chromium plating, but differs from this bath in the following points.
  • the mineral acid mixed in the electrolytic bath has the function of dissolving the chromium oxide generated on the surface of the plating layer during electroplating. Therefore, when a surge bath is used, a glossy metallic chromium layer is plated. In the present invention, it is necessary to preferentially plate chromium oxide.
  • the electrolytic bath used in the present invention a small amount of organic acid is added to the electrolytic bath used in the present invention.
  • a mineral acid such as sulfuric acid
  • a particularly dilute electrolytic bath must be used. That is, the chromic acid concentration is less than 50 g Z £ and the sulfuric acid concentration is less than 1 g Z IL.
  • the processing of the precursor solution forms a thin film of insulating ceramic, but in order to increase the adhesion of this thin film, the surface of the layer mainly composed of chromium oxide must be rough. I like it.
  • a chromium oxide-containing layer may be formed by an electrolytic plating method using an electrolytic solution obtained by adding, for example, sodium citrate, sodium carbonate, or the like to an aqueous solution of sodium chromate.
  • the formed layer is mainly composed of chromium oxide generated by reducing hexavalent chromium in the electrolytic solution to trivalent.
  • the electrolytic plating treatment when ⁇ is used as the base material, the base material surface is oxidized, and a chromium oxide-containing layer is formed outside.
  • the oxidation of the chromium oxide-containing layer does not decrease the adhesion of the chromium oxide-containing layer to the substrate due to the oxidation of the substrate surface.
  • the conditions for the electrolytic plating when forming the chromium oxide-containing layer of the present invention are different from the generally used plating in terms of processing current density and the like.
  • the current density is set to 1 0 ⁇ 6 O AZdm 2
  • the current density is set to 1 0 0 ⁇ 2 0 0 AZdm 2 .
  • a roughened chromium oxide-containing layer can be formed.
  • An insulating oxide layer is formed on the chromium oxide-containing layer by applying a precursor solution of a metal oxide.
  • a precursor solution of a metal oxide refers to a solution prepared from a metal organic compound, and is prepared by a sol-gel method or It is roughly classified according to the organic acid salt pyrolysis method, and includes the following two types of evenings.
  • the first type of precursor solution is a solution formed by subjecting a compound containing a hydrolyzable metal-oxygen-organic group bond such as a metal alkoxide and metal acetate to a hydrolysis reaction and a dehydration condensation reaction. is there.
  • This solution may contain an organic solvent such as alcohol, a starting compound such as a metal alkoxide, water and a catalyst necessary for the hydrolysis reaction.
  • a hydrolyzable metal-oxygen-organic group bond such as a metal alkoxide and metal acetate
  • This solution may contain an organic solvent such as alcohol, a starting compound such as a metal alkoxide, water and a catalyst necessary for the hydrolysis reaction.
  • hydroxide sols generated from inorganic salts they often contain organic residues such as alkoxides.
  • the second type of precursor solution is a solution in which a metal organic compound such as an organic acid salt of a metal is dissolved in a suitable organic solvent.
  • a metal oxide is generated by heating and thermally decomposing after coating. For this reason, the decomposition temperature of the metal organic compound used needs to be lower than its boiling point or sublimation point.
  • the metal-organic compound referred to in this specification is, for example, "metal — organicco mpounds" described in journal of Materials Science 12 (1977) pp. 1203 to 128. It is the same concept as.
  • the coating must be left above room temperature to volatilize organic solvents and remove residual organic matter.
  • the temperature of this neglected atmosphere constitutes the substrate The temperature must not be higher than the melting point of the metal used.
  • metal oxide precursor solution By applying a metal oxide precursor solution, almost all metal oxide-based ceramic coatings can be formed.
  • a metal oxide formed by this method include S i 0 2 AI 2 ⁇ 3, Z r 0 T i 0 2, M g O , and the like.
  • the metal alkoxide used in the first type of precursor solution include ethoxide, propoxide, butoxide and the like.
  • the organic acid salt used in the second type of precursor solution a metal salt such as naphthenic acid, caprylic acid, stearic acid, and octylic acid is preferable.
  • An oxide insulating layer formed from a precursor solution of a metal oxide by a sol-gel method or an organic acid salt pyrolysis method is a completely metal oxide oxide.
  • This oxide is preferably formed by a heat treatment in an atmosphere of an oxygen stream.
  • the decomposition of the compound contained in the solution applied on the chromium oxide-containing layer is usually completed completely at a temperature of about 500 ° C.
  • the heat treatment is performed at a higher temperature, the reaction between the elements constituting the chromium oxide-containing layer and the metal or metalloid contained in the applied solution is accelerated, so that the chromium oxide-containing layer is accelerated.
  • the adhesion between the metal and the oxide layer is improved.
  • the ceramic oxide insulating layer exhibits excellent heat resistance even at a high temperature of 500 ° C. or more.
  • the chromium oxide-containing layer has excellent adhesion to the conductor constituting the base material. Therefore, compared with the case where the oxide insulating layer is formed directly on the outer surface of the conductor by heat treatment of the precursor solution of the metal oxide, the adhesive force between the oxide insulating layer and the outer surface of the base material is higher. Is improved. Therefore, the insulated electric wire provided by the present invention has heat resistance and good flexibility.
  • the oxide insulating layer formed on the chromium oxide-containing layer has a smooth outer surface. Therefore, it is possible to obtain a high breakdown voltage in proportion to the film thickness and to reduce the number of gas adsorption sources.
  • a chromium oxide-containing layer is formed between the substrate and the oxide insulating layer. Therefore, a combination with an inorganic insulating layer suitable for various uses can be selected via the chromium oxide-containing layer.
  • FIG. 1 is a cross-sectional view showing a cross section of an insulated wire according to the present invention, corresponding to the first embodiment.
  • FIG. 2 is a cross-sectional view showing a cross section of an insulated wire according to the present invention corresponding to the second embodiment.
  • FIG. 3 is a cross-sectional view showing a cross section of an insulated wire according to the present invention in accordance with a third embodiment.
  • FIG. 4 is a cross-sectional view showing a cross section of an insulated wire according to the present invention corresponding to the fourth embodiment.
  • FIG. 5 is a graph showing the measurement results of the surface roughness of the chromium oxide-containing layer formed according to Examples 3 and 4.
  • FIG. 6 is a graph showing the measurement results of the surface roughness of the chromium plating layer formed according to the comparative example.
  • Electrolytic plating was applied to the outer surface of a copper wire with a wire diameter of 2 mm ⁇ .
  • a solution having a concentration of 40 gZ £ of chromic anhydride and 0.45 gZ £ of sulfuric acid was used as the electrolyte.
  • the bathing condition was 50 bath temperature. C, the current density was 140 AZ dm 2 , and the processing time was 2 minutes.
  • a chromium oxide-containing layer was formed on the outer surface of the copper wire with a thickness of about 1 m.
  • a nitric acid was added to a solution mixed at a molar ratio of 3/100 with respect to tetrabutyl orthosilicate. They were added in molar proportions. Thereafter, the solution was heated and stirred at a temperature of 80 ° C. for 2 hours. As a result, a coating solution used for the sol-gel method was synthesized.
  • the wire coated with the coating solution on the outer surface in this manner was immersed in the solution 9 and subjected to heating for 10 minutes at a temperature of 400 ° C. 10 times. Finally, the wire was heated in a stream of oxygen at a temperature of 500 ° C. for 10 minutes.
  • FIG. 1 shows the insulated wire obtained as described above.
  • FIG. 1 is a cross-sectional view showing a cross section of the insulating wire obtained in Example 1.
  • a chromium oxide-containing layer 2 is formed on the outer surface of copper wire 1.
  • a silicon oxide layer 3 is formed as an oxide insulating layer by a sol-gel method. The thickness of the insulating layer formed by the oxide containing layer 2 and the silicon oxide layer 3 was about 4.0 m.
  • the breakdown voltage was measured to evaluate the insulation properties of the insulated wires obtained. At room temperature, the breakdown voltage was 800 V, and at 800, it was 600 V. Even when this insulated wire was wound on the outer peripheral surface of a cylinder having a diameter of 10 cm, no crack was generated in the insulating layer.
  • Electrolytic plating was performed by passing a DC current of 0.5 A / dm 2 . At this time, about 1 solution of 30 g each of sodium chromate, sodium citrate and sodium carbonate dissolved in water was used as the electrolyte.
  • a copper oxide layer having a thickness of about 1 m is formed on the outer surface of the copper wire, and a chromium oxide-containing layer is formed to a thickness of about 0.1 zm outside the copper oxide layer.
  • the wire obtained in (a) was immersed in the coating solution in (b).
  • the wire coated with the coating solution on the outer surface in this manner was heated 10 times at a temperature of 400 ° C. for 10 minutes.
  • FIG. 2 is a cross-sectional view showing a cross section of the insulated wire obtained in Example 2.
  • a copper oxide layer 12 is formed on the outer surface of copper wire 11.
  • a chromium oxide containing layer 13 is formed outside the copper oxide layer 12.
  • a zirconium oxide layer 14 is formed on the chromium oxide-containing layer 13 as an oxide insulating layer by a sol-gel method. The thickness of the insulating layer formed by the copper oxide layer 12, the chromium oxide-containing layer 13 and the zirconium oxide layer 14 was about 3. O Azm.
  • the insulation breakdown voltage was measured. At room temperature, the breakdown voltage was 700 V, and at 700 ° C, it was 500 V. Further, even when this insulated wire was wound on the outer peripheral surface of a cylinder having a diameter of 10 cm, no crack was generated in the insulating layer.
  • Electrolytic treatment was applied to the outer surface of a nickel-plated copper wire with a wire diameter of 1.8 mm0.
  • the electrolytic solution those having a concentration of chromic anhydride of 200 £, ammonium metavanadate of 20 gZ £, and acetic acid of 6.5 g ZL were used.
  • the plating conditions were such that the base material was used as a cathode, the bath temperature was 50 ° C., the current density was 150 A / dm 2 , and the treatment time was 2 minutes.
  • a chromium oxide-containing layer having a thickness of about 1 m was formed on the outer surface of the nickel-plated copper wire.
  • the surface condition of the chromium oxide-containing layer is determined by the surface roughness of IS0468-19882, medium and line average roughness Ra is 0.15 m and maximum height Ry is 0.87. m.
  • Surface roughness measurements are made by S loan company of America The measurement was carried out using a DEKTAK 3030 surface profiler under the conditions of a stylus diameter of 0,5 ⁇ ⁇ , a stylus pressure of 10 mg, a standard length of 50 m, and no cutoff filter. The measurement results are shown in FIG.
  • a coating solution was prepared by dissolving 20 g of 2-ethylhexanoic silicate in 10 OmJL of dibutyl ether.
  • the wire obtained in (a) was immersed in the coating solution in (b).
  • the wire coated with the coating solution on the outer surface in this manner was subjected to 10 heating steps of 500 ° C. for 10 minutes.
  • FIG. 3 shows the insulated wire obtained as described above.
  • FIG. 3 is a cross-sectional view showing a cross section of the insulated wire obtained in Example 3.
  • a Nigger-plated copper wire having a Nigel plating layer 22 formed on the outer surface of copper wire 21 is used as a base material.
  • a chromium oxide-containing layer 23 is formed on the outer surface of the nickel-plated copper wire.
  • a silicon oxide layer 24 is formed as an oxide insulating layer by an organic acid salt pyrolysis method. The thickness of the insulating layer composed of the chromium oxide containing layer 23 and the silicon oxide layer 24 was about 5 m.
  • the insulation breakdown voltage was measured. At room temperature, the dielectric breakdown voltage was 500 V, at 800 ° C, it was 300 V, and on the outer peripheral surface of a 5 cm diameter cylinder, No cracks were generated in the insulating layer even when it was wound.
  • the plating conditions were as follows: the base material was used as the cathode, and the bath temperature was 50. C, current density was 150 AZ dm 2 , and processing time was 2 minutes. In this way, a chromium oxide-containing layer having a thickness of about 1 m was formed on the outer surface of the stainless steel clad copper wire.
  • the surface condition is determined by the Sur R ace Roughness of IS 0 4 6 8-1 9 8 2, the center line average roughness Ra is 0.15 ⁇ m and the maximum height Ry is 0.87 m Met.
  • the measurement was performed using a surface shape measuring instrument DEKTAK 300 manufactured by Sloan of America, with a stylus diameter of 0.5 m, a stylus pressure of 10 mg, a reference length of 50 ⁇ , and a cut-off filter. Conditions not used Made below. As a result of this measurement, the one shown in FIG. 5 was obtained as in Example 3.
  • the wire obtained in (a) was immersed in the coating solution in (b).
  • the wire coated with the coating solution on the outer surface in this manner was subjected to 10 heating steps of 500 ° C. for 10 minutes.
  • FIG. 4 is a cross-sectional view showing a cross section of the insulated wire obtained in Example 4.
  • a stainless steel clad copper wire having a stainless alloy layer 32 on the outer surface of copper wire 31 is used as a base material.
  • a chromium oxide-containing layer 33 is formed on the outer surface of the stainless steel copper wire.
  • an aluminum oxide layer 34 is formed as an oxide insulating layer by an organic acid salt pyrolysis method.
  • This aluminum oxide layer 34 is made of aluminum that is originally mixed in the coating solution. It is composed of an aluminum oxide mixed layer containing fine particles.
  • the film thickness of the insulating layer composed of the chromium oxide containing layer 33 and the aluminum oxide layer 34 was about 12 m.
  • the breakdown voltage was measured to evaluate the insulation properties of the insulated wires obtained. At room temperature, the breakdown voltage was 900 V, and at 800 ° C, it was 700 V. In addition, no cracks occurred in the insulating layer even when this insulated wire was wrapped around the outer circumference of a 15 cm diameter cylinder.
  • Electrolytic plating was applied to the outer surface of a nickel-plated copper wire with a wire diameter of 1.8 mm.
  • the electrolyte used had a concentration of 250 g / p of chromic anhydride and 2.5 gZJl of sulfuric acid.
  • the plating conditions were such that the substrate was used as a cathode, the bath temperature was 50 ° C., the current density was 40 A / dm 2 , and the treatment time was 2 minutes.
  • a chromium-containing layer having a thickness of about 1 m was formed on the outer surface of the nickel-plated copper wire.
  • the average surface roughness Ra was 0.06; / m, and the maximum height Ry was 0.51 m.
  • the measurement was performed using a surface profiler DE KT AK300, manufactured by Sloan of America, with a stylus diameter of 0.5 ⁇ m, a stylus pressure of 10 mg, a reference length of 50 ⁇ m, and a Conditions without using a filter Made below. The results of this measurement are shown in FIG. Glossy chrome metal layer formed on the outer surface of nickel-plated copper wire o
  • a coating solution was prepared by dissolving 20 g of 2-ethylhexane silicate silicate in 10 O mA of dimethyl ether.
  • the wire obtained in (a) was immersed in the coating solution in (b).
  • the wire coated with the coating solution on the outer surface in this way was subjected to a heating step at a temperature of 500 ° C. for 10 minutes.After the heating, the formed insulating layer was peeled into a film. And showed no adhesion.
  • the insulated wire according to the present invention can be used as a wiring wire, a winding wire, or the like used in a high vacuum environment such as a high vacuum device or a high-temperature device, or in a high temperature environment.
  • a high vacuum environment such as a high vacuum device or a high-temperature device, or in a high temperature environment.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Insulated Conductors (AREA)
  • Processes Specially Adapted For Manufacturing Cables (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

Fil électrique isolé destiné à être utilisé comme fil de câblage ou comme fil d'enroulement dans des équipements fonctionnant dans des environnements sous vide poussé ou à haute température. Ce fil comprend un élément de base (1), une couche d'oxyde de chrome (2) et une couche isolante en oxyde (3). L'élement de base (1) comprend un conducteur. La couche d'oxyde de chrome (2) est formée sur la surface externe de l'organe de base (1). La couche isolante en oxyde (3) est formée sur la couche d'oxyde de chrome (2) par l'application d'une solution précurseur d'un oxyde métallique selon le procédé sol-gel ou le procédé de pyrolyse de sel d'acide organique. Le fil électrique isolé présente une excellente flexibilité ainsi qu'une bonne résistance à la chaleur et ne constitue pas une source de particules pouvant adsorber un gaz.
PCT/JP1990/000401 1989-03-28 1990-03-26 Fil electrique isole WO1990011603A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1019900702515A KR940000845B1 (ko) 1989-03-28 1990-03-26 절연 전선
DE69013448T DE69013448T2 (de) 1989-03-28 1990-03-26 Isolierte elektrische litze.
EP90904938A EP0416131B1 (fr) 1989-03-28 1990-03-26 Fil electrique isole
US08/023,077 US5372886A (en) 1989-03-28 1993-02-26 Insulated wire with an intermediate adhesion layer and an insulating layer
HK96795A HK96795A (en) 1989-03-28 1995-06-15 Insulated electric wire

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP1/77028 1989-03-28
JP7702889 1989-03-28
JP2070843A JP2890631B2 (ja) 1989-03-28 1990-03-20 絶縁電線
JP2/70843 1990-03-20

Publications (1)

Publication Number Publication Date
WO1990011603A1 true WO1990011603A1 (fr) 1990-10-04

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP1990/000401 WO1990011603A1 (fr) 1989-03-28 1990-03-26 Fil electrique isole

Country Status (9)

Country Link
EP (1) EP0416131B1 (fr)
JP (1) JP2890631B2 (fr)
KR (1) KR940000845B1 (fr)
AU (1) AU627859B2 (fr)
CA (1) CA2029868C (fr)
DE (1) DE69013448T2 (fr)
DK (1) DK0416131T3 (fr)
HK (1) HK96795A (fr)
WO (1) WO1990011603A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2827333B2 (ja) * 1989-10-13 1998-11-25 住友電気工業株式会社 耐熱絶縁コイルの製造方法
EP0510258B1 (fr) * 1991-04-26 1995-06-14 Sumitomo Electric Industries, Limited Procédé de fabrication d'un membre isolé
EP0729157B1 (fr) * 1995-02-24 1998-04-29 Sumitomo Electric Industries, Ltd. Elément électrique conducteur tel qu'un fil muni d'un revêtement isolant inorganique
JPH1066288A (ja) * 1996-08-21 1998-03-06 Ebara Corp 高耐熱モータ
CN113445088B (zh) * 2021-06-28 2021-12-14 沈伟 一种具有高吸热性的均热板及其制备方法

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JPS56149775A (en) * 1980-04-18 1981-11-19 Agency Of Ind Science & Technol Manufacture of oxide film for solid electrolyte of fuel cell
EP0188370A2 (fr) * 1985-01-14 1986-07-23 Raychem Limited Fil électrique avec enduction réfractaire
EP0188369A2 (fr) * 1985-01-14 1986-07-23 Raychem Limited Article à enduction réfractaire
JPS63239150A (ja) * 1987-03-27 1988-10-05 Sumitomo Electric Ind Ltd 超電導セラミツクス薄膜の製造方法
JPS63247374A (ja) * 1987-04-02 1988-10-14 Permelec Electrode Ltd 着色チタン材の製造方法
JPS63279524A (ja) * 1987-05-08 1988-11-16 Sumitomo Electric Ind Ltd 超電導薄膜の形成方法
JPS6481116A (en) * 1987-09-21 1989-03-27 Fujikura Ltd Superconductor

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JPS60208494A (ja) * 1984-03-31 1985-10-21 Kawasaki Steel Corp 溶接性に優れたシ−ム溶接缶用表面処理鋼板
JPS63281313A (ja) * 1987-05-12 1988-11-17 Sumitomo Electric Ind Ltd 耐熱電線

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Publication number Priority date Publication date Assignee Title
JPS56149775A (en) * 1980-04-18 1981-11-19 Agency Of Ind Science & Technol Manufacture of oxide film for solid electrolyte of fuel cell
EP0188370A2 (fr) * 1985-01-14 1986-07-23 Raychem Limited Fil électrique avec enduction réfractaire
EP0188369A2 (fr) * 1985-01-14 1986-07-23 Raychem Limited Article à enduction réfractaire
JPS63239150A (ja) * 1987-03-27 1988-10-05 Sumitomo Electric Ind Ltd 超電導セラミツクス薄膜の製造方法
JPS63247374A (ja) * 1987-04-02 1988-10-14 Permelec Electrode Ltd 着色チタン材の製造方法
JPS63279524A (ja) * 1987-05-08 1988-11-16 Sumitomo Electric Ind Ltd 超電導薄膜の形成方法
JPS6481116A (en) * 1987-09-21 1989-03-27 Fujikura Ltd Superconductor

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Title
See also references of EP0416131A4 *

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Publication number Publication date
EP0416131A1 (fr) 1991-03-13
CA2029868C (fr) 1996-09-24
AU5273690A (en) 1990-10-22
DE69013448T2 (de) 1995-02-23
AU627859B2 (en) 1992-09-03
JPH0315113A (ja) 1991-01-23
DE69013448D1 (de) 1994-11-24
CA2029868A1 (fr) 1990-09-29
HK96795A (en) 1995-06-23
EP0416131B1 (fr) 1994-10-19
KR920700456A (ko) 1992-02-19
EP0416131A4 (en) 1992-11-25
DK0416131T3 (da) 1995-02-27
KR940000845B1 (ko) 1994-02-02
JP2890631B2 (ja) 1999-05-17

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