US20170084587A1 - Light-emitting device - Google Patents

Light-emitting device Download PDF

Info

Publication number
US20170084587A1
US20170084587A1 US15/268,681 US201615268681A US2017084587A1 US 20170084587 A1 US20170084587 A1 US 20170084587A1 US 201615268681 A US201615268681 A US 201615268681A US 2017084587 A1 US2017084587 A1 US 2017084587A1
Authority
US
United States
Prior art keywords
light
layer
lateral surface
reflective
emitting device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
US15/268,681
Other versions
US9922963B2 (en
Inventor
Cheng-Wei HUNG
Jui-Fu Chang
Chin-Hua Hung
Yu-Feng Lin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nichia Corp
Original Assignee
Genesis Photonics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from TW104144809A external-priority patent/TWI583027B/en
Application filed by Genesis Photonics Inc filed Critical Genesis Photonics Inc
Assigned to GENESIS PHOTONICS INC. reassignment GENESIS PHOTONICS INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CHANG, JUI-FU, HUNG, CHENG-WEI, HUNG, CHIN-HUA, LIN, YU-FENG
Priority to US15/268,681 priority Critical patent/US9922963B2/en
Publication of US20170084587A1 publication Critical patent/US20170084587A1/en
Priority to US15/924,461 priority patent/US10497681B2/en
Publication of US9922963B2 publication Critical patent/US9922963B2/en
Application granted granted Critical
Priority to US16/699,805 priority patent/US10957674B2/en
Assigned to NICHIA CORPORATION reassignment NICHIA CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: GENESIS PHOTONICS INC.
Assigned to GENESIS PHOTONICS INC. reassignment GENESIS PHOTONICS INC. ADDRESS CHANGE REGISTRATION FORM Assignors: GENESIS PHOTONICS INC.
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/075Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
    • H01L25/0753Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • H01L33/501Wavelength conversion elements characterised by the materials, e.g. binder
    • H01L33/502Wavelength conversion materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • H01L33/501Wavelength conversion elements characterised by the materials, e.g. binder
    • H01L33/502Wavelength conversion materials
    • H01L33/504Elements with two or more wavelength conversion materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • H01L33/505Wavelength conversion elements characterised by the shape, e.g. plate or foil
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • H01L33/508Wavelength conversion elements having a non-uniform spatial arrangement or non-uniform concentration, e.g. patterned wavelength conversion layer, wavelength conversion layer with a concentration gradient of the wavelength conversion material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52Encapsulations
    • H01L33/54Encapsulations having a particular shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52Encapsulations
    • H01L33/56Materials, e.g. epoxy or silicone resin
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/58Optical field-shaping elements
    • H01L33/60Reflective elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0033Processes relating to semiconductor body packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0033Processes relating to semiconductor body packages
    • H01L2933/0041Processes relating to semiconductor body packages relating to wavelength conversion elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0033Processes relating to semiconductor body packages
    • H01L2933/005Processes relating to semiconductor body packages relating to encapsulations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0033Processes relating to semiconductor body packages
    • H01L2933/0058Processes relating to semiconductor body packages relating to optical field-shaping elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/483Containers
    • H01L33/486Containers adapted for surface mounting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/62Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls

Definitions

  • the disclosure relates in general to a light-emitting device, and more particularly to a light-emitting device having a reflective layer.
  • Conventional light-emitting device includes a phosphor glue and a light-emitting component, wherein the phosphor glue covers an upper surface and a lateral surface of the light-emitting component.
  • the high temperature generated by the light-emitting component when illuminating, will negatively affect the phosphor glue, speed up the deterioration of the phosphor glue and change the light color.
  • the disclosure provides a light-emitting device capable of relieving the deterioration of the phosphor glue.
  • a light-emitting device includes a substrate, a light-emitting component, a wavelength conversion layer, an adhesive layer and a reflective layer.
  • the light-emitting component is disposed on the substrate.
  • the wavelength conversion layer comprises a high-density phosphor layer and a low-density phosphor layer.
  • the adhesive layer is formed between the light-emitting component and the high-density phosphor layer.
  • the reflective layer is formed above the substrate and covering a lateral surface of the light-emitting component, a lateral surface of the adhesive layer and a lateral surface of the wavelength conversion layer.
  • FIG. 1 illustrates a cross-sectional view of a light-emitting device according to an embodiment of the invention
  • FIG. 2 illustrates a cross sectional view of a light-emitting device according to another embodiment of the invention
  • FIG. 3 illustrates a cross sectional view of a light-emitting device according to another embodiment of the invention
  • FIG. 4 illustrates a cross sectional view of a light-emitting device according to another embodiment of the invention
  • FIGS. 5A to 5H illustrate manufacturing processes of the light-emitting device of FIG. 1 ;
  • FIGS. 6A to 6C illustrate another manufacturing processes of the light-emitting device of FIG. 1 ;
  • FIGS. 7A to 7C illustrate manufacturing processes of the light-emitting device of FIG. 2 ;
  • FIGS. 8A to 8C illustrate manufacturing processes of the light-emitting device of FIG. 3 ;
  • FIGS. 9A to 9F illustrate manufacturing processes of the light-emitting device of FIG. 4 .
  • FIG. 1 illustrates a cross-sectional view of a light-emitting device 100 according to an embodiment of the invention.
  • the light-emitting device 100 includes a substrate 110 , a light-emitting component 120 , a wavelength conversion layer 130 , an adhesive layer 140 and a reflective layer 150 .
  • the substrate 110 is, for example, a ceramic substrate.
  • the substrate 110 includes a base 111 , a third electrode 112 , a fourth electrode 113 , a first pad 114 , a second pad 115 , a first conductive pillar 116 and a second conductive pillar 117 .
  • the base 111 is made of a material such as silicon-based material.
  • the base 111 has a first surface 111 u and a second surface 111 b opposite to the first surface 111 u .
  • the third electrode 112 and the fourth electrode 113 are formed on the first surface 111 u of the base 111
  • the first pad 114 and the second pad 115 are formed on the second surface 111 b of the base 111 .
  • the first conductive pillar 116 and the second conductive pillar 117 pass through the base 111 , wherein the first conductive pillar 116 connects the third electrode 112 to the first pad 114 for electrically connecting the third electrode 112 to the first pad 114 , and the second conductive pillar 117 connects the fourth electrode 113 to the second pad 115 for electrically connecting the fourth electrode 113 to the second pad 115 .
  • the light-emitting device 100 may be disposed on a circuit board (not illustrated), wherein the first pad 114 and the second pad 115 of the substrate 110 are electrically connected to two electrodes (not illustrated) of the circuit board, such that the light-emitting component 120 is electrically connected to the circuit board through the first pad 114 and the second pad 115 .
  • the light-emitting component 120 is disposed on the substrate 110 .
  • the light-emitting component 120 includes a first electrode 121 and a second electrode 122 , wherein the first electrode 121 and the second electrode 122 are electrically connected to the third electrode 112 and the fourth electrode 113 respectively.
  • the light-emitting component 120 is, for example, a light-emitting diode.
  • the light-emitting component 120 may further comprise a first type semiconductor layer, a second type semiconductor layer and a light emitting layer, wherein the light emitting layer is formed between the first type semiconductor layer and the second type semiconductor layer.
  • the first type semiconductor layer is realized by such as an N-type semiconductor layer
  • the second type semiconductor layer is realized by such as an P-type semiconductor layer.
  • the first type semiconductor layer is realized by such as a P-type semiconductor layer
  • the second type semiconductor layer is realized by such as an N-type semiconductor layer.
  • the P-type semiconductor is realized by a GaN-based semiconductor doped with trivalent elements such as a gallium nitride based semiconductor layer which is doped with Beryllium (Be), zinc (Zn), manganese (Mn), chromium (Cr), magnesium (Mg), calcium (Ca), etc.
  • the N-type semiconductor is realized by a GaN-based semiconductor doped with doped with silicon (Si), germanium (Ge), tin (Sn), sulfur (S), oxygen (O), titanium (Ti) and or zirconium (Zr), etc.
  • the light emitting layer 122 may be realized by a structure of In x Al y Ga 1-x-y N (0 ⁇ x 0 ⁇ y x+y ⁇ 1) or a structure which is doped with Boron (B), phosphorus (P) or arsenic (As).
  • the light emitting layer 122 may be a single-layered structure or multi-layered structure.
  • the first electrode 121 may be realized by a single-layered structure or a multi-layered structure which is made of at least one of materials including gold, aluminum, silver, copper, rhodium (Rh), ruthenium (Ru), palladium (Pd), iridium (Ir), platinum (Pt), chromium, tin, nickel, titanium, tungsten (W), chromium alloys, titanium tungsten alloys, nickel alloys, copper silicon alloy, aluminum silicon copper alloy, aluminum silicon alloy, gold tin alloy, but is not limited thereto.
  • the second electrode 122 may be realized by a single-layered structure or a multi-layered structure.
  • the second electrode 122 may be made of a material similar to that of the first electrode 121 .
  • the wavelength conversion layer 130 includes a high-density phosphor layer 131 and a low-density phosphor layer 132 .
  • the wavelength conversion layer 130 includes a plurality of phosphor particles, wherein a region whose phosphor particle density is higher is defined as the high-density phosphor layer 131 , and a region whose phosphor particle density is lower is defined as the low-density phosphor layer 132 .
  • a ratio of a phosphor particle density of the high-density phosphor layer 131 and a phosphor particle density of the low-density phosphor layer 132 ranges between 1 and 10 15 , wherein the range may contain or may not contain 1 and 10 15 .
  • the high-density phosphor layer 131 is located between the light-emitting component 120 and the low-density phosphor layer 132 . That is, the light emitted from the light-emitting component 120 first passes through the high-density phosphor layer 131 , and then is emitted out of the wavelength conversion layer 130 through the low-density phosphor layer 132 . Due the design of the high-density phosphor layer 131 , the light color of the light-emitting device 100 can be collectively distributed in the chromaticity coordinate. As a result, the yield of the light-emitting device 100 may be increased.
  • the low-density phosphor layer 132 may increase a light mixing probability.
  • the low-density phosphor layer 132 increases the probability of the light L 1 contacting the phosphor particles.
  • a thickness T 2 of the low-density phosphor layer 132 is larger than a thickness T 1 of the high-density phosphor layer 131 , and accordingly the light mixing probability of the light L 1 of the light-emitting component 120 can be further increased.
  • a ratio of the thickness T 2 and the thickness T 1 ranges between 1 and 1000, wherein the range may contain or may not contain 1 and 1000.
  • the wavelength conversion layer 130 covers the entire upper surface 120 u of the light-emitting component 120 . That is, in the present embodiment, the area of the wavelength conversion layer 130 viewed from the top view is larger than the area of the light-emitting component 120 viewed from the top view. In an embodiment, a ratio of the area of the wavelength conversion layer 130 viewed from the top view and the area of the light-emitting component 120 viewed from the top view ranges between 1 and 1.35, however less than 1 or larger than 1.35 is also feasible.
  • the wavelength conversion layer 130 may be made of a material including sulfide, Yttrium aluminum garnet (YAG), LuAG, silicate, nitride, oxynitride, fluoride, TAG, KSF, KTF, etc.
  • the adhesive layer 140 is, for example, a transparent adhesive.
  • the adhesive layer 140 includes a first lateral portion 141 and a heat resistance layer 142 .
  • the first lateral portion 141 covers a portion of a lateral surface 120 s of the light-emitting component 120 , and another portion or the other portion of the lateral surface 120 s of the light-emitting component 120 is covered by the reflective layer 150 .
  • the first lateral portion 141 is shaped into a closed ring shape which surrounds the entire lateral surface 120 s of the light-emitting component 120 .
  • the first lateral portion 141 may be shaped into an open ring shape.
  • the heat resistance layer 142 of the adhesive layer 140 is formed between the high-density phosphor layer 131 and the light-emitting component 120 , and accordingly it can increase the heat resistance between the light-emitting component 120 and the wavelength conversion layer 130 to slows the degrading speed of the wavelength conversion layer 130 .
  • the heat generated from the light-emitting component 120 is easily transmitted to the wavelength conversion layer 130 , it will speed up the deterioration of the phosphor particles within the wavelength conversion layer 130 .
  • the thickness of the heat resistance layer 142 may range between 1 and 1000, wherein the range may contain or may not contain 1 and 1000.
  • the reflective layer 150 is formed above the substrate 110 and covers the lateral surface 120 s of the light-emitting component 120 , a lateral surface 141 s of the first lateral portion 141 of the adhesive layer 140 and a lateral surface 130 s of the wavelength conversion layer 130 , and accordingly it can advantageously protect the light-emitting component 120 and the wavelength conversion layer 130 from being exposed to be damaged.
  • the reflective layer 150 may reflect the light L 1 emitted from the lateral surface 120 s of the light-emitting component 120 to the wavelength conversion layer 130 , and accordingly it can increase the luminous efficiency of the light-emitting device 100 .
  • the reflective layer 150 further covers a lateral surface of the first electrode 121 , a lateral surface of the second electrode 122 , a lateral surface of the third electrode 112 and a lateral surface of the fourth electrode 113 . As a result, it can prevent the first electrode 121 , the second electrode 122 , the third electrode 112 and the fourth electrode 113 from being exposed and damaged by the environment, such as oxidation, humidity, etc.
  • the reflective layer 150 includes a filling portion 152 , and the first gap G 1 and/or the second gap G 2 is filled with the filling portion 152 .
  • the reflective layer 150 includes a first reflective portion 151 which surrounds the lateral surface 120 s of the light-emitting component 120 .
  • the first reflective portion 151 has a first reflective surface 151 s facing the lateral surface 120 s of the light-emitting component 120 and/or the wavelength conversion layer 130 for reflecting the light L 1 emitted from the lateral surface 120 s of the light-emitting component 120 to the wavelength conversion layer 130 .
  • the first reflective surface 151 s is a convex surface facing the lateral surface 120 s of the light-emitting component 120 and/or the wavelength conversion layer 130 .
  • the first reflective surface 151 s may be a concave surface.
  • the convex first reflective surface 151 s connects a lower surface 130 b of the wavelength conversion layer 130 to the lateral surface 120 s of the light-emitting component 120 .
  • it can increase the probability of the light L 1 emitted from the light-emitting component 120 contacting the convex surface, such that the light L 1 emitted from the light-emitting component 120 almost or completely is reflected by the reflective layer 150 to the wavelength conversion layer 130 and then is emitted out of the light-emitting device 100 , and accordingly it can increase the luminous efficiency of the light-emitting device 100 .
  • the reflective layer 150 has a reflectivity larger than 90%.
  • the reflective layer 150 may be made of a material including Poly phthalic amide (PPA), polyamide (PA), polyethylene terephthalate (PTT), polyethylene terephthalate (PET), polyethylene terephthalate 1,4-cyclohexane dimethylene terephthalate (PCT), epoxy compound (EMC), silicone compound (SMC) or other resin/ceramic material having high reflectivity.
  • the reflective layer 150 may be a white glue.
  • the luminous area of the light-emitting device 100 can increase by 40% and the brightness of the light-emitting device 100 can increase by 15%.
  • FIG. 2 illustrates a cross sectional view of a light-emitting device 200 according to another embodiment of the invention.
  • the light-emitting device 200 includes the substrate 110 , the light-emitting component 120 , the wavelength conversion layer 130 , the adhesive layer 140 and the reflective layer 150 .
  • the top-viewed area of the wavelength conversion layer 130 of the light-emitting device 200 is substantially equal to the top-viewed area of the light-emitting component 120 of the light-emitting device 200 , that is, the ratio of the top-viewed area of the wavelength conversion layer 130 and the top-viewed area of the light-emitting component 120 is about 1.
  • the entire lateral surface 120 s of the light-emitting component 120 and the entire lateral surface 142 s of the heat resistance layer 142 of the adhesive layer 140 are exposed, and accordingly the entire lateral surface 120 s of the light-emitting component 120 and the entire lateral surface 142 s of the heat resistance layer 142 of the adhesive layer 140 can be covered by the reflective layer 150 .
  • the lateral surface 120 s of the light-emitting component 120 the lateral surface 130 s of the wavelength conversion layer 130 and the lateral surface 142 s of the heat resistance layer 142 of the adhesive layer 140 can be formed in the same singulation process, the lateral surface 120 s , the lateral surface 130 s and the lateral surface 142 s are substantially aligned or flush with each other.
  • FIG. 3 illustrates a cross sectional view of a light-emitting device 300 according to another embodiment of the invention.
  • the light-emitting device 300 includes the substrate 110 , the light-emitting component 120 , the wavelength conversion layer 130 , the adhesive layer 140 and the reflective layer 150 .
  • the reflective layer 150 of the light-emitting device 300 further covers a lateral surface 110 s of the substrate 110 , and accordingly it can prevent or reduce the damage by the exterior environmental factors (such as air, water, gas, etc.) through the lateral surface 110 s of the substrate 110 . Furthermore, due to the reflective layer 150 covering the lateral surface 110 s of the substrate 110 , it can increase a length of a path P 1 from the exterior environmental to the electrode (the first electrode 121 and/or the second electrode 122 ) of the light-emitting component 120 (in comparison with the path P 1 of FIG. 1 , the length of the path P 1 of the present embodiment is longer), and accordingly it can reduce the probability of the light-emitting component 120 being damaged by the environmental factors for increasing the reliability and life of the light-emitting device 300 .
  • the top-viewed area of the wavelength conversion layer 130 of the light-emitting device 300 is substantially equal to the top-viewed area of the light-emitting component 120 .
  • Such structure is similar to the structure of the light-emitting device 200 , and the similarities are not repeated.
  • FIG. 4 illustrates a cross sectional view of a light-emitting device 400 according to another embodiment of the invention.
  • the light-emitting device 400 includes the substrate 110 , a plurality of the light-emitting components 120 , the wavelength conversion layer 130 , the adhesive layer 140 and the reflective layer 150 .
  • the light-emitting components 120 are disposed on the substrate 110 .
  • the adhesive layer 140 covers at least a portion of the lateral surface 120 s of each light-emitting component 120 .
  • a portion of the adhesive layer 140 of the light-emitting device 400 is further formed between adjacent two light-emitting components 120 .
  • the adhesive layer 140 further includes a second lateral portion 143 located between two light-emitting components 120 , and the second lateral portion 143 has a lower surface 143 s , wherein the lower surface 143 s is a convex surface or a concave surface.
  • the reflective layer 150 is formed between adjacent two light-emitting components 120 .
  • the reflective layer 150 further includes a second reflective portion 153 , wherein the second reflective portion 153 is located between adjacent two light-emitting components 120 .
  • the second reflective portion 153 has a second reflective surface 153 s complying with the lower surface 143 s , and accordingly the second reflective surface 153 s is a concave surface.
  • the lower surface 143 s may be a concave surface
  • the second reflective surface 153 s is a convex surface.
  • the second reflective surface 153 s may reflect the light L 1 emitted by the light-emitting component 120 to the wavelength conversion layer 130 , and accordingly it can increase the luminous efficiency of the light-emitting device 400 .
  • the reflective layer 150 of the light-emitting device 400 may further cover the lateral surface 110 s of the substrate 110 s .
  • Such structure is similar to the structure of the light-emitting device 300 , and the similarities are not repeated.
  • the top-viewed area of the wavelength conversion layer 130 of the light-emitting device 400 is substantially equal to the top-viewed area of the light-emitting component 120 .
  • Such structure is similar to the structure of the light-emitting device 200 , and the similarities are not repeated.
  • FIGS. 5A to 5H illustrate manufacturing processes of the light-emitting device 100 of FIG. 1 .
  • a wavelength conversion resin 130 ′ is formed on a carrier 10 by way of, for example, dispensing.
  • the wavelength conversion resin 130 ′ contains a plurality of the phosphor particles 133 .
  • the polarity of the carrier 10 and the polarity of the wavelength conversion resin 130 ′ are different, and accordingly the wavelength conversion resin 130 ′ and the carrier 10 may be easily detached.
  • the carrier 10 may include a double-sided adhesive layer and a carrier plate, wherein the double-sided adhesive layer is adhered to the carrier plate for carrying the wavelength conversion resin 130 ′.
  • the wavelength conversion resin 130 ′ As illustrated in FIG. 5B , after the wavelength conversion resin 130 ′ is stood for a period such as 24 hours, most of the phosphor particles 133 precipitate on a bottom of the wavelength conversion resin 130 ′ to form the high-density phosphor layer 131 , wherein the other of the phosphor particles 133 are distributed within the other portion of the wavelength conversion layer material 130 ′ to form the low-density phosphor layer 132 .
  • the high-density phosphor layer 131 and the low-density phosphor layer 132 form the wavelength conversion layer 130 .
  • the wavelength conversion layer 130 is cured.
  • the positions of the phosphor particles 133 can be fixed, and accordingly it can prevent the density distribution of the phosphor particles 133 within the wavelength conversion layer 130 from being easily changed.
  • the carrier 10 and the wavelength conversion layer 130 are separated to expose the high-density phosphor layer 131 of the wavelength conversion layer 130 .
  • the substrate 110 and at least one light-emitting component 120 are provided, wherein the light-emitting component 120 is disposed on the substrate 110 .
  • the substrate 110 may be disposed on another carrier 10 ′, wherein the carrier 10 ′ has a structure similar to that of the carrier 10 , and the similarities are not repeated.
  • the high-density phosphor layer 131 of the wavelength conversion layer 130 is adhered to the light-emitting component 120 by the adhesive layer 140 .
  • the adhesive layer 140 is formed on the upper surface 120 u of the light-emitting component 120 by way of, for example, applying or dispensing.
  • the wavelength conversion layer 130 is disposed on the adhesive layer 140 , such that the adhesive layer 140 adheres the light-emitting component 120 to the high-density phosphor layer 131 of the wavelength conversion layer 130 . Since the wavelength conversion layer 130 extrudes the adhesive layer 140 , the adhesive layer 140 flow toward two sides of the light-emitting component 120 to form the first lateral portion 141 . Due to surface tension, the lateral surface 141 s of the first lateral portion 141 forms a concave surface. Depending on the amount of the adhesive layer 140 and/or the property of the adhesive layer 140 , the lateral surface 141 s may form a convex surface. In addition, depending on the amount of the adhesive layer 140 and/or the property of the adhesive layer 140 , the first lateral portion 141 may cover at least a portion of the lateral surface 120 s of the light-emitting component 120 .
  • a portion of the adhesive layer 140 which remains on between the wavelength conversion layer 130 and the light-emitting component 120 forms the heat resistance layer 142 .
  • the heat resistance layer 142 may reduce the heat of transmitting to the wavelength conversion layer 130 from the light-emitting component 120 , and accordingly it can slow the degrading speed of the wavelength conversion layer 130 .
  • At least one first singulation path W 1 passing through the wavelength conversion layer 130 is formed to cut off the wavelength conversion layer 130 .
  • the first singulation path W 1 does not pass through the first lateral portion 141 of the adhesive layer 140 .
  • the first singulation path W 1 may pass through a portion of the first lateral portion 141 .
  • the lateral surface 130 s of the wavelength conversion layer 130 is formed by the first singulation path W 1 , wherein the lateral surface 130 s may be a plane or a curved surface.
  • the cutting width for forming the first singulation path W 1 may be substantially equal to the width of the first singulation path W 1 .
  • the double-sided adhesive layer (not illustrated) disposed on the carrier 10 ′ may be stretched to increase an interval between adjacent two light-emitting components 120 .
  • the first singulation path W 1 may be formed using a thin blade.
  • the fluid reflective layer 150 is formed above the substrate 110 by way of, for example, compression molding, wherein the reflective layer 150 covers a portion of the lateral surface 120 s of the light-emitting component 120 , the lateral surface 130 s of the wavelength conversion layer 130 , the lateral surface 141 s of the first lateral portion 141 of the adhesive layer 140 , the lateral surface of the third electrode 112 of the substrate 110 , the lateral surface of the fourth electrode 113 of the substrate 110 , the lateral surface of the first electrode 121 of the light-emitting component 120 and the lateral surface of the second electrode 122 of the light-emitting component 120 .
  • the reflective layer 150 includes the first reflective portion 151 surrounding the entire lateral surface 120 s of the light-emitting component 120 .
  • the first reflective portion 151 has the first reflective surface 151 s . Due to the lateral surface 141 s of the adhesive layer 140 being a concave surface, the first reflective surface 151 s covering the lateral surface 141 s is a convex surface facing the wavelength conversion layer 130 and the light-emitting component 120 .
  • the convex first reflective surface 151 s can reflect the light L 1 emitted from the lateral surface 120 s to the wavelength conversion layer 130 , and accordingly it can increase the luminous efficiency of the light-emitting device 100 .
  • the first reflective surface 151 s of the reflective layer 150 can contact the lower surface 130 b of the wavelength conversion layer 130 .
  • the convex first reflective surface 151 s connects the lower surface 130 b of the wavelength conversion layer 130 to the lateral surface 120 s of the light-emitting component 120 , and accordingly it can increase the contacting area of the light L 1 emitted from the light-emitting component 120 and the convex surface (the first reflective surface 151 s ).
  • the reflective layer 150 is cured by way of heating.
  • At least one second singulation path W 2 passing through the reflective layer 150 and the substrate 110 is formed to form the light-emitting device 100 of FIG. 1 .
  • the first reflective surface 151 s of the reflective layer 150 and the lateral surface 110 s of the substrate 110 are formed by the second singulation path W 2 , wherein the first reflective surface 151 s and the lateral surface 110 s are substantially aligned or flush with each other.
  • the second singulation path W 2 may pass through the wavelength conversion layer 130 , the reflective layer 150 and the substrate 110 , such that the wavelength conversion layer 130 , the reflective layer 150 and the substrate 110 form the lateral surface 130 s , the lateral surface 150 s and lateral surface 110 s respectively, wherein the lateral surface 130 s , the lateral surface 150 s and lateral surface 110 s are substantially aligned or flush with each other.
  • the cutting width for forming the second singulation path W 2 may be substantially equal to the width of the second singulation path W 2 .
  • the double-sided adhesive layer (not illustrated) disposed on the carrier 10 ′ may be stretched to increase an interval between adjacent two light-emitting components 120 .
  • the second singulation path W 2 may be formed using a thin blade.
  • FIGS. 6A to 6C illustrate another manufacturing processes of the light-emitting device 100 of FIG. 1 .
  • the adhesive layer 140 is formed on the high-density phosphor layer 131 of the wavelength conversion layer 130 by way of, for example, applying or dispensing.
  • the substrate 110 and the light-emitting component 120 of FIG. 5C are disposed on the adhesive layer 140 , wherein the light-emitting component 120 contacts with the adhesive layer 140 , such that the adhesive layer 140 adheres the light-emitting component 120 to the high-density phosphor layer 131 of the wavelength conversion layer 130 .
  • the adhesive layer 140 flows toward two sides of the light-emitting component 120 to form the first lateral portion 141 . Due to surface tension, the lateral surface 141 s of the first lateral portion 141 forms a concave surface. Depending on the amount of the adhesive layer 140 and/or the property of the adhesive layer 140 , the first lateral portion 141 may cover at least a portion of the lateral surface 120 s of the light-emitting component 120 . In addition, as illustrated in an enlargement view of FIG. 6B , a portion of the adhesive layer 140 which remains on between the wavelength conversion layer 130 and the light-emitting component 120 forms the heat resistance layer 142 . The heat resistance layer 142 may reduce the heat of transmitting to the wavelength conversion layer 130 from the light-emitting component 120 , and accordingly it can slow the degrading speed of the wavelength conversion layer 130 .
  • the light-emitting components 120 , the wavelength conversion layer 130 and the substrate 110 are inverted, such that the wavelength conversion layer 130 faces upwardly.
  • FIGS. 7A to 7C illustrate manufacturing processes of the light-emitting device 200 of FIG. 2 .
  • the structure of FIG. 5E is formed by using the processes of FIG. 5A to 5E
  • the structure of FIG. 6C is formed by using the processes of FIG. 6A to 6C .
  • At least one first singulation path W 1 passing through the wavelength conversion layer 130 and the first lateral portion 141 which covers the lateral surface 120 s of the light-emitting component 120 is formed, by way of cutting, to cut off the wavelength conversion layer 130 and remove the first lateral portion 141 . Since the first singulation path W 1 cuts off the first lateral portion 141 , such that the entire lateral surface 120 s of the light-emitting component 120 and the entire lateral surface 142 s of the heat resistance layer 142 are be formed and exposed.
  • the fluid reflective layer 150 is formed above the substrate 110 by way of, for example, compression molding, wherein the reflective layer 150 covers the entire lateral surface 120 s of the light-emitting component 120 , the entire lateral surface 142 s of the heat resistance layer 142 , the entire lateral surface 130 s of the wavelength conversion layer 130 , the lateral surface of the third electrode 112 of the substrate 110 , the lateral surface of the fourth electrode 113 of the substrate 110 , the lateral surface of the first electrode 121 of the light-emitting component 120 and the lateral surface of the second electrode 122 of the light-emitting component 120 .
  • the reflective layer 150 is cured by way of heating.
  • At least one second singulation path W 2 passing through the reflective layer 150 and the substrate 110 is formed, by way of cutting, to form the light-emitting device 200 of FIG. 2 .
  • the lateral surface 150 s of the reflective layer 150 and the lateral surface 110 s of the substrate 110 are formed by the second singulation path W 2 , wherein the lateral surface 150 s and the lateral surface 110 s are substantially aligned or flush with each other.
  • FIGS. 8A to 8C illustrate manufacturing processes of the light-emitting device 300 of FIG. 3 .
  • the structure of FIG. 5E is formed by using the processes of FIG. 5A to 5E
  • the structure of FIG. 6C is formed by using the processes of FIG. 6A to 6C .
  • At least one first singulation path W 1 passing through the wavelength conversion layer 130 and the substrate 110 is formed, by way of cutting, to cut off the wavelength conversion layer 130 and the substrate 110 .
  • the lateral surface 130 s of the wavelength conversion layer 130 and the lateral surface 110 s of the substrate 110 are formed by the first singulation path W 1 , wherein the lateral surface 130 s and the lateral surface 110 s are substantially aligned or flush with each other.
  • the fluid reflective layer 150 is formed above the substrate 110 by way of, for example, dispensing, wherein the reflective layer 150 covers a portion of the lateral surface 120 s of the light-emitting component 120 , the lateral surface 130 s of the wavelength conversion layer 130 , the lateral surface 141 s of the first lateral portion 141 of the adhesive layer 140 , the lateral surface 110 s of the substrate 110 , the lateral surface of the third electrode 112 of the substrate 110 , the lateral surface of the fourth electrode 113 of the substrate 110 , the lateral surface of the first electrode 121 of the light-emitting component 120 and the lateral surface of the second electrode 122 of the light-emitting component 120 .
  • the reflective layer 150 is cured by way of heating.
  • At least one second singulation path W 2 passing through the reflective layer 150 is formed to form the light-emitting device 300 of FIG. 3 , wherein the lateral surface 150 s and the reflective layer 150 is formed by the second singulation path W 2 .
  • the second singulation path W 2 may pass through the wavelength conversion layer 130 , the reflective layer 150 and the substrate 110 , such that the wavelength conversion layer 130 , the reflective layer 150 and the substrate 110 form the lateral surface 130 s , the lateral surface 150 s and lateral surface 110 s respectively, wherein the lateral surface 130 s , the lateral surface 150 s and lateral surface 110 s are substantially aligned or flush with each other.
  • FIGS. 9A to 9F illustrate manufacturing processes of the light-emitting device 400 of FIG. 4 .
  • the substrate 110 and a plurality of the light-emitting components 120 are provided, wherein the light-emitting components 120 are disposed on the substrate 110 .
  • the substrate 110 and the light-emitting components 120 are disposed on the carrier 10 ′.
  • the adhesive layer 140 is formed on the upper surface 120 u of the light-emitting component 120 by way of, for example, applying or dispensing.
  • the wavelength conversion layer 130 is disposed on the adhesive layer 140 , such that the adhesive layer 140 adheres each light-emitting component 120 to the high-density phosphor layer 131 of the wavelength conversion layer 130 . Since the wavelength conversion layer 130 extrudes the adhesive layer 140 , the adhesive layer 140 flow toward two sides of the light-emitting component 120 to form the first lateral portion 141 .
  • the first lateral portion 141 has the lateral surface 141 s . Due to surface tension, the lateral surface 141 s is a concave surface. However, depending on the amount of the adhesive layer 140 and/or the property of the adhesive layer 140 , the lateral surface 141 s may form a convex surface facing substrate 110 . In addition, depending on the amount of the adhesive layer 140 and/or the property of the adhesive layer 140 , the first lateral portion 141 may cover at least a portion of the lateral surface 120 s of the light-emitting component 120 .
  • a portion of the adhesive layer 140 which remains on between the wavelength conversion layer 130 and the light-emitting component 120 forms the heat resistance layer 142 .
  • the heat resistance layer 142 can increase the heat resistance between the light-emitting component 120 and the wavelength conversion layer 130 , and accordingly it can slow the degrading speed of the wavelength conversion layer 130 .
  • the adhesive layer 140 further includes the second lateral portion 143 which is formed between adjacent two light-emitting components 120 .
  • the second lateral portion 143 has the lower surface 143 s . Due to surface tension, the lower surface 143 s forms a concave surface facing the substrate 110 . However, depending on the amount of the adhesive layer 140 and/or the property of the adhesive layer 140 , the lower surface 143 s may be a concave surface facing the substrate 110 .
  • At least one first singulation path W 1 passing through the wavelength conversion layer 130 is formed to cut off the wavelength conversion layer 130 .
  • the first singulation path W 1 does not pass through the first lateral portion 141 of the adhesive layer 140 .
  • the first singulation path W 1 may pass through a portion of the first lateral portion 141 or the entire first lateral portion 141 .
  • the fluid reflective layer 150 is formed above the substrate 110 by way of, for example, dispensing, wherein the reflective layer 150 covers a portion of the lateral surface 120 s of the light-emitting component 120 , the lateral surface 130 s of the wavelength conversion layer 130 , the lateral surface 141 s of the first lateral portion 141 of the adhesive layer 140 , the lower surface 143 s of the second lateral portion 143 , the lateral surface of the third electrode 112 of the substrate 110 , the lateral surface of the fourth electrode 113 of the substrate 110 , the lateral surface of the first electrode 121 of the light-emitting component 120 and the lateral surface of the second electrode 122 of the light-emitting component 120 through the first singulation path W 1 .
  • the reflective layer 150 includes the first reflective portion 151 and the second reflective portion 153 , wherein the first reflective portion 151 covers the first lateral portion 141 , and the second reflective portion 153 covers the second lateral portion 143 .
  • the first reflective portion 151 has the first reflective surface 151 s complying with the lateral surface 141 s , and the first reflective surface 151 s is a convex surface due to the lateral surface 141 s being a concave surface.
  • the second reflective portion 153 has the second reflective surface 153 s complying with the lower surface 143 s , and the second reflective surface 153 s is a concave surface due to the lateral surface 141 s being a convex surface.
  • the reflective layer 150 is cured by way of heating.
  • At least one second singulation path W 2 passing through the reflective layer 150 and the substrate 110 is formed to form the light-emitting device 400 of FIG. 4 .
  • the lateral surface 150 s of the reflective layer 150 and the lateral surface 110 s of the substrate 110 are formed by the second singulation path W 2 , wherein the lateral surface 150 s and the lateral surface 110 s are substantially aligned or flush with each other.
  • the second singulation path W 2 may pass through the wavelength conversion layer 130 , the reflective layer 150 and the substrate 110 , such that the wavelength conversion layer 130 , the reflective layer 150 and the substrate 110 form the lateral surface 130 s , the lateral surface 150 s and lateral surface 110 s respectively, wherein the lateral surface 130 s , the lateral surface 150 s and lateral surface 110 s are substantially aligned or flush with each other.
  • the reflective layer 150 of the light-emitting device 400 may cover the lateral surface 120 s of at least one light-emitting component 120 , the lateral surface 142 s of the heat resistance layer 142 and the lateral surface 130 s of the wavelength conversion layer 130 by using processes of FIGS. 7A to 7C .
  • the reflective layer 150 of the light-emitting device 400 may cover the lateral surface 110 s of the substrate 110 by using processes of FIGS. 8A to 8B .

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Led Device Packages (AREA)

Abstract

A light-emitting device includes a substrate, a light-emitting component, a wavelength conversion component, an adhesive and a reflective layer. The light-emitting component is disposed on the substrate. The wavelength conversion component includes a high-density phosphor layer and a lower-density phosphor layer. The adhesive is formed between the light-emitting device and the high-density phosphor layer. The reflective layer is formed above the substrate and covers a lateral surface of the light-emitting component, a lateral surface of the adhesive and a lateral surface of the wavelength conversion component.

Description

  • This application claims the benefits of U.S. provisional application Ser. No. 62/220,249, filed Sep. 18, 2015, U.S. provisional application Ser. No. 62/241,729, filed Oct. 14, 2015, and Taiwan application Serial No. 104144809, filed Dec. 31, 2015, the subject matters of which are incorporated herein by reference.
  • TECHNICAL FIELD
  • The disclosure relates in general to a light-emitting device, and more particularly to a light-emitting device having a reflective layer.
  • BACKGROUND
  • Conventional light-emitting device includes a phosphor glue and a light-emitting component, wherein the phosphor glue covers an upper surface and a lateral surface of the light-emitting component. The high temperature generated by the light-emitting component, when illuminating, will negatively affect the phosphor glue, speed up the deterioration of the phosphor glue and change the light color.
  • Therefore, it has become a prominent task for the industry to slow the deterioration of the phosphor glue.
  • SUMMARY
  • Thus, the disclosure provides a light-emitting device capable of relieving the deterioration of the phosphor glue.
  • According to one embodiment, a light-emitting device is provided. The light-emitting device includes a substrate, a light-emitting component, a wavelength conversion layer, an adhesive layer and a reflective layer. The light-emitting component is disposed on the substrate. The wavelength conversion layer comprises a high-density phosphor layer and a low-density phosphor layer. The adhesive layer is formed between the light-emitting component and the high-density phosphor layer. The reflective layer is formed above the substrate and covering a lateral surface of the light-emitting component, a lateral surface of the adhesive layer and a lateral surface of the wavelength conversion layer.
  • The above and other aspects of the invention will become better understood with regard to the following detailed description of the preferred but non-limiting embodiment (s). The following description is made with reference to the accompanying drawings.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 illustrates a cross-sectional view of a light-emitting device according to an embodiment of the invention;
  • FIG. 2 illustrates a cross sectional view of a light-emitting device according to another embodiment of the invention;
  • FIG. 3 illustrates a cross sectional view of a light-emitting device according to another embodiment of the invention;
  • FIG. 4 illustrates a cross sectional view of a light-emitting device according to another embodiment of the invention;
  • FIGS. 5A to 5H illustrate manufacturing processes of the light-emitting device of FIG. 1;
  • FIGS. 6A to 6C illustrate another manufacturing processes of the light-emitting device of FIG. 1;
  • FIGS. 7A to 7C illustrate manufacturing processes of the light-emitting device of FIG. 2;
  • FIGS. 8A to 8C illustrate manufacturing processes of the light-emitting device of FIG. 3; and
  • FIGS. 9A to 9F illustrate manufacturing processes of the light-emitting device of FIG. 4.
  • DETAILED DESCRIPTION
  • FIG. 1 illustrates a cross-sectional view of a light-emitting device 100 according to an embodiment of the invention. The light-emitting device 100 includes a substrate 110, a light-emitting component 120, a wavelength conversion layer 130, an adhesive layer 140 and a reflective layer 150.
  • The substrate 110 is, for example, a ceramic substrate. In the present embodiment, the substrate 110 includes a base 111, a third electrode 112, a fourth electrode 113, a first pad 114, a second pad 115, a first conductive pillar 116 and a second conductive pillar 117.
  • The base 111 is made of a material such as silicon-based material. The base 111 has a first surface 111 u and a second surface 111 b opposite to the first surface 111 u. The third electrode 112 and the fourth electrode 113 are formed on the first surface 111 u of the base 111, and the first pad 114 and the second pad 115 are formed on the second surface 111 b of the base 111. The first conductive pillar 116 and the second conductive pillar 117 pass through the base 111, wherein the first conductive pillar 116 connects the third electrode 112 to the first pad 114 for electrically connecting the third electrode 112 to the first pad 114, and the second conductive pillar 117 connects the fourth electrode 113 to the second pad 115 for electrically connecting the fourth electrode 113 to the second pad 115.
  • The light-emitting device 100 may be disposed on a circuit board (not illustrated), wherein the first pad 114 and the second pad 115 of the substrate 110 are electrically connected to two electrodes (not illustrated) of the circuit board, such that the light-emitting component 120 is electrically connected to the circuit board through the first pad 114 and the second pad 115.
  • The light-emitting component 120 is disposed on the substrate 110. The light-emitting component 120 includes a first electrode 121 and a second electrode 122, wherein the first electrode 121 and the second electrode 122 are electrically connected to the third electrode 112 and the fourth electrode 113 respectively.
  • The light-emitting component 120 is, for example, a light-emitting diode. Although not illustrated, the light-emitting component 120 may further comprise a first type semiconductor layer, a second type semiconductor layer and a light emitting layer, wherein the light emitting layer is formed between the first type semiconductor layer and the second type semiconductor layer. The first type semiconductor layer is realized by such as an N-type semiconductor layer, and the second type semiconductor layer is realized by such as an P-type semiconductor layer. Alternatively, the first type semiconductor layer is realized by such as a P-type semiconductor layer, and the second type semiconductor layer is realized by such as an N-type semiconductor layer. The P-type semiconductor is realized by a GaN-based semiconductor doped with trivalent elements such as a gallium nitride based semiconductor layer which is doped with Beryllium (Be), zinc (Zn), manganese (Mn), chromium (Cr), magnesium (Mg), calcium (Ca), etc. The N-type semiconductor is realized by a GaN-based semiconductor doped with doped with silicon (Si), germanium (Ge), tin (Sn), sulfur (S), oxygen (O), titanium (Ti) and or zirconium (Zr), etc. The light emitting layer 122 may be realized by a structure of InxAlyGa1-x-yN (0≦x
    Figure US20170084587A1-20170323-P00001
    0≦y
    Figure US20170084587A1-20170323-P00001
    x+y≦1) or a structure which is doped with Boron (B), phosphorus (P) or arsenic (As). In addition, the light emitting layer 122 may be a single-layered structure or multi-layered structure.
  • The first electrode 121 may be realized by a single-layered structure or a multi-layered structure which is made of at least one of materials including gold, aluminum, silver, copper, rhodium (Rh), ruthenium (Ru), palladium (Pd), iridium (Ir), platinum (Pt), chromium, tin, nickel, titanium, tungsten (W), chromium alloys, titanium tungsten alloys, nickel alloys, copper silicon alloy, aluminum silicon copper alloy, aluminum silicon alloy, gold tin alloy, but is not limited thereto. The second electrode 122 may be realized by a single-layered structure or a multi-layered structure. The second electrode 122 may be made of a material similar to that of the first electrode 121.
  • The wavelength conversion layer 130 includes a high-density phosphor layer 131 and a low-density phosphor layer 132. The wavelength conversion layer 130 includes a plurality of phosphor particles, wherein a region whose phosphor particle density is higher is defined as the high-density phosphor layer 131, and a region whose phosphor particle density is lower is defined as the low-density phosphor layer 132. In an embodiment, a ratio of a phosphor particle density of the high-density phosphor layer 131 and a phosphor particle density of the low-density phosphor layer 132 ranges between 1 and 1015, wherein the range may contain or may not contain 1 and 1015.
  • In the present embodiment, the high-density phosphor layer 131 is located between the light-emitting component 120 and the low-density phosphor layer 132. That is, the light emitted from the light-emitting component 120 first passes through the high-density phosphor layer 131, and then is emitted out of the wavelength conversion layer 130 through the low-density phosphor layer 132. Due the design of the high-density phosphor layer 131, the light color of the light-emitting device 100 can be collectively distributed in the chromaticity coordinate. As a result, the yield of the light-emitting device 100 may be increased. The low-density phosphor layer 132 may increase a light mixing probability. In detail, for the light L1 which has not contacted the phosphor particles within the high-density phosphor layer 131 yet, the low-density phosphor layer 132 increases the probability of the light L1 contacting the phosphor particles. In the present embodiment, a thickness T2 of the low-density phosphor layer 132 is larger than a thickness T1 of the high-density phosphor layer 131, and accordingly the light mixing probability of the light L1 of the light-emitting component 120 can be further increased. In an embodiment, a ratio of the thickness T2 and the thickness T1 ranges between 1 and 1000, wherein the range may contain or may not contain 1 and 1000.
  • The wavelength conversion layer 130 covers the entire upper surface 120 u of the light-emitting component 120. That is, in the present embodiment, the area of the wavelength conversion layer 130 viewed from the top view is larger than the area of the light-emitting component 120 viewed from the top view. In an embodiment, a ratio of the area of the wavelength conversion layer 130 viewed from the top view and the area of the light-emitting component 120 viewed from the top view ranges between 1 and 1.35, however less than 1 or larger than 1.35 is also feasible.
  • In an embodiment, the wavelength conversion layer 130 may be made of a material including sulfide, Yttrium aluminum garnet (YAG), LuAG, silicate, nitride, oxynitride, fluoride, TAG, KSF, KTF, etc.
  • The adhesive layer 140 is, for example, a transparent adhesive. The adhesive layer 140 includes a first lateral portion 141 and a heat resistance layer 142. The first lateral portion 141 covers a portion of a lateral surface 120 s of the light-emitting component 120, and another portion or the other portion of the lateral surface 120 s of the light-emitting component 120 is covered by the reflective layer 150. Viewed from the direction of the top view of FIG. 1, the first lateral portion 141 is shaped into a closed ring shape which surrounds the entire lateral surface 120 s of the light-emitting component 120. In another embodiment, the first lateral portion 141 may be shaped into an open ring shape.
  • As illustrated in an enlargement view of FIG. 1, the heat resistance layer 142 of the adhesive layer 140 is formed between the high-density phosphor layer 131 and the light-emitting component 120, and accordingly it can increase the heat resistance between the light-emitting component 120 and the wavelength conversion layer 130 to slows the degrading speed of the wavelength conversion layer 130. In detail, if the heat generated from the light-emitting component 120 is easily transmitted to the wavelength conversion layer 130, it will speed up the deterioration of the phosphor particles within the wavelength conversion layer 130. In the present embodiment, due to the forming of the heat resistance layer 142, the heat transmitted to the wavelength conversion layer 130 can be decreased, and accordingly it can slow the deterioration of the phosphor particles within the wavelength conversion layer 130. In an embodiment, the thickness of the heat resistance layer 142 may range between 1 and 1000, wherein the range may contain or may not contain 1 and 1000.
  • The reflective layer 150 is formed above the substrate 110 and covers the lateral surface 120 s of the light-emitting component 120, a lateral surface 141 s of the first lateral portion 141 of the adhesive layer 140 and a lateral surface 130 s of the wavelength conversion layer 130, and accordingly it can advantageously protect the light-emitting component 120 and the wavelength conversion layer 130 from being exposed to be damaged. The reflective layer 150 may reflect the light L1 emitted from the lateral surface 120 s of the light-emitting component 120 to the wavelength conversion layer 130, and accordingly it can increase the luminous efficiency of the light-emitting device 100.
  • As illustrated in FIG. 1, the reflective layer 150 further covers a lateral surface of the first electrode 121, a lateral surface of the second electrode 122, a lateral surface of the third electrode 112 and a lateral surface of the fourth electrode 113. As a result, it can prevent the first electrode 121, the second electrode 122, the third electrode 112 and the fourth electrode 113 from being exposed and damaged by the environment, such as oxidation, humidity, etc.
  • There is a first gap G1 between the first electrode 121 and the second electrode 122, and there is a second gap G2 between the third electrode 112 and the fourth electrode 113. The reflective layer 150 includes a filling portion 152, and the first gap G1 and/or the second gap G2 is filled with the filling portion 152.
  • The reflective layer 150 includes a first reflective portion 151 which surrounds the lateral surface 120 s of the light-emitting component 120. The first reflective portion 151 has a first reflective surface 151 s facing the lateral surface 120 s of the light-emitting component 120 and/or the wavelength conversion layer 130 for reflecting the light L1 emitted from the lateral surface 120 s of the light-emitting component 120 to the wavelength conversion layer 130. In the present embodiment, the first reflective surface 151 s is a convex surface facing the lateral surface 120 s of the light-emitting component 120 and/or the wavelength conversion layer 130. In another embodiment, the first reflective surface 151 s may be a concave surface.
  • As illustrated in FIG. 1, the convex first reflective surface 151 s connects a lower surface 130 b of the wavelength conversion layer 130 to the lateral surface 120 s of the light-emitting component 120. As a result, it can increase the probability of the light L1 emitted from the light-emitting component 120 contacting the convex surface, such that the light L1 emitted from the light-emitting component 120 almost or completely is reflected by the reflective layer 150 to the wavelength conversion layer 130 and then is emitted out of the light-emitting device 100, and accordingly it can increase the luminous efficiency of the light-emitting device 100.
  • In an embodiment, the reflective layer 150 has a reflectivity larger than 90%. The reflective layer 150 may be made of a material including Poly phthalic amide (PPA), polyamide (PA), polyethylene terephthalate (PTT), polyethylene terephthalate (PET), polyethylene terephthalate 1,4-cyclohexane dimethylene terephthalate (PCT), epoxy compound (EMC), silicone compound (SMC) or other resin/ceramic material having high reflectivity. In addition, the reflective layer 150 may be a white glue.
  • As described above, in comparison with the conventional light-emitting device, the luminous area of the light-emitting device 100 can increase by 40% and the brightness of the light-emitting device 100 can increase by 15%.
  • FIG. 2 illustrates a cross sectional view of a light-emitting device 200 according to another embodiment of the invention. The light-emitting device 200 includes the substrate 110, the light-emitting component 120, the wavelength conversion layer 130, the adhesive layer 140 and the reflective layer 150.
  • In comparison with the light-emitting device 100, the top-viewed area of the wavelength conversion layer 130 of the light-emitting device 200 is substantially equal to the top-viewed area of the light-emitting component 120 of the light-emitting device 200, that is, the ratio of the top-viewed area of the wavelength conversion layer 130 and the top-viewed area of the light-emitting component 120 is about 1. Due the first lateral portion 141 of the adhesive layer 140 being removed, the entire lateral surface 120 s of the light-emitting component 120 and the entire lateral surface 142 s of the heat resistance layer 142 of the adhesive layer 140 are exposed, and accordingly the entire lateral surface 120 s of the light-emitting component 120 and the entire lateral surface 142 s of the heat resistance layer 142 of the adhesive layer 140 can be covered by the reflective layer 150. Furthermore, since the lateral surface 120 s of the light-emitting component 120, the lateral surface 130 s of the wavelength conversion layer 130 and the lateral surface 142 s of the heat resistance layer 142 of the adhesive layer 140 can be formed in the same singulation process, the lateral surface 120 s, the lateral surface 130 s and the lateral surface 142 s are substantially aligned or flush with each other.
  • FIG. 3 illustrates a cross sectional view of a light-emitting device 300 according to another embodiment of the invention. The light-emitting device 300 includes the substrate 110, the light-emitting component 120, the wavelength conversion layer 130, the adhesive layer 140 and the reflective layer 150.
  • In comparison with the light-emitting device 100, the reflective layer 150 of the light-emitting device 300 further covers a lateral surface 110 s of the substrate 110, and accordingly it can prevent or reduce the damage by the exterior environmental factors (such as air, water, gas, etc.) through the lateral surface 110 s of the substrate 110. Furthermore, due to the reflective layer 150 covering the lateral surface 110 s of the substrate 110, it can increase a length of a path P1 from the exterior environmental to the electrode (the first electrode 121 and/or the second electrode 122) of the light-emitting component 120 (in comparison with the path P1 of FIG. 1, the length of the path P1 of the present embodiment is longer), and accordingly it can reduce the probability of the light-emitting component 120 being damaged by the environmental factors for increasing the reliability and life of the light-emitting device 300.
  • In another embodiment, the top-viewed area of the wavelength conversion layer 130 of the light-emitting device 300 is substantially equal to the top-viewed area of the light-emitting component 120. Such structure is similar to the structure of the light-emitting device 200, and the similarities are not repeated.
  • FIG. 4 illustrates a cross sectional view of a light-emitting device 400 according to another embodiment of the invention. The light-emitting device 400 includes the substrate 110, a plurality of the light-emitting components 120, the wavelength conversion layer 130, the adhesive layer 140 and the reflective layer 150. The light-emitting components 120 are disposed on the substrate 110. The adhesive layer 140 covers at least a portion of the lateral surface 120 s of each light-emitting component 120.
  • In comparison with the aforementioned light-emitting device, a portion of the adhesive layer 140 of the light-emitting device 400 is further formed between adjacent two light-emitting components 120. For example, the adhesive layer 140 further includes a second lateral portion 143 located between two light-emitting components 120, and the second lateral portion 143 has a lower surface 143 s, wherein the lower surface 143 s is a convex surface or a concave surface. The reflective layer 150 is formed between adjacent two light-emitting components 120. For example, the reflective layer 150 further includes a second reflective portion 153, wherein the second reflective portion 153 is located between adjacent two light-emitting components 120. The second reflective portion 153 has a second reflective surface 153 s complying with the lower surface 143 s, and accordingly the second reflective surface 153 s is a concave surface. In another embodiment, the lower surface 143 s may be a concave surface, and the second reflective surface 153 s is a convex surface. The second reflective surface 153 s may reflect the light L1 emitted by the light-emitting component 120 to the wavelength conversion layer 130, and accordingly it can increase the luminous efficiency of the light-emitting device 400.
  • In another embodiment, the reflective layer 150 of the light-emitting device 400 may further cover the lateral surface 110 s of the substrate 110 s. Such structure is similar to the structure of the light-emitting device 300, and the similarities are not repeated.
  • In another embodiment, the top-viewed area of the wavelength conversion layer 130 of the light-emitting device 400 is substantially equal to the top-viewed area of the light-emitting component 120. Such structure is similar to the structure of the light-emitting device 200, and the similarities are not repeated.
  • FIGS. 5A to 5H illustrate manufacturing processes of the light-emitting device 100 of FIG. 1.
  • As illustrated in FIG. 5A, a wavelength conversion resin 130′ is formed on a carrier 10 by way of, for example, dispensing. The wavelength conversion resin 130′ contains a plurality of the phosphor particles 133. The polarity of the carrier 10 and the polarity of the wavelength conversion resin 130′ are different, and accordingly the wavelength conversion resin 130′ and the carrier 10 may be easily detached. In addition, although not illustrated, the carrier 10 may include a double-sided adhesive layer and a carrier plate, wherein the double-sided adhesive layer is adhered to the carrier plate for carrying the wavelength conversion resin 130′.
  • As illustrated in FIG. 5B, after the wavelength conversion resin 130′ is stood for a period such as 24 hours, most of the phosphor particles 133 precipitate on a bottom of the wavelength conversion resin 130′ to form the high-density phosphor layer 131, wherein the other of the phosphor particles 133 are distributed within the other portion of the wavelength conversion layer material 130′ to form the low-density phosphor layer 132. The high-density phosphor layer 131 and the low-density phosphor layer 132 form the wavelength conversion layer 130.
  • Then, the wavelength conversion layer 130 is cured. As a result, the positions of the phosphor particles 133 can be fixed, and accordingly it can prevent the density distribution of the phosphor particles 133 within the wavelength conversion layer 130 from being easily changed.
  • Then, the carrier 10 and the wavelength conversion layer 130 are separated to expose the high-density phosphor layer 131 of the wavelength conversion layer 130.
  • As illustrated in FIG. 5C, the substrate 110 and at least one light-emitting component 120 are provided, wherein the light-emitting component 120 is disposed on the substrate 110. In addition, the substrate 110 may be disposed on another carrier 10′, wherein the carrier 10′ has a structure similar to that of the carrier 10, and the similarities are not repeated.
  • Then, the high-density phosphor layer 131 of the wavelength conversion layer 130 is adhered to the light-emitting component 120 by the adhesive layer 140. The following description will be made with reference to the accompanying drawings.
  • As illustrated in FIG. 5D, the adhesive layer 140 is formed on the upper surface 120 u of the light-emitting component 120 by way of, for example, applying or dispensing.
  • As illustrated in FIG. 5E, the wavelength conversion layer 130 is disposed on the adhesive layer 140, such that the adhesive layer 140 adheres the light-emitting component 120 to the high-density phosphor layer 131 of the wavelength conversion layer 130. Since the wavelength conversion layer 130 extrudes the adhesive layer 140, the adhesive layer 140 flow toward two sides of the light-emitting component 120 to form the first lateral portion 141. Due to surface tension, the lateral surface 141 s of the first lateral portion 141 forms a concave surface. Depending on the amount of the adhesive layer 140 and/or the property of the adhesive layer 140, the lateral surface 141 s may form a convex surface. In addition, depending on the amount of the adhesive layer 140 and/or the property of the adhesive layer 140, the first lateral portion 141 may cover at least a portion of the lateral surface 120 s of the light-emitting component 120.
  • As illustrated in an enlargement view of FIG. 5E, a portion of the adhesive layer 140 which remains on between the wavelength conversion layer 130 and the light-emitting component 120 forms the heat resistance layer 142. The heat resistance layer 142 may reduce the heat of transmitting to the wavelength conversion layer 130 from the light-emitting component 120, and accordingly it can slow the degrading speed of the wavelength conversion layer 130.
  • As illustrated in FIG. 5F, at least one first singulation path W1 passing through the wavelength conversion layer 130 is formed to cut off the wavelength conversion layer 130. In the present embodiment, the first singulation path W1 does not pass through the first lateral portion 141 of the adhesive layer 140. In another embodiment, the first singulation path W1 may pass through a portion of the first lateral portion 141. The lateral surface 130 s of the wavelength conversion layer 130 is formed by the first singulation path W1, wherein the lateral surface 130 s may be a plane or a curved surface.
  • The cutting width for forming the first singulation path W1 may be substantially equal to the width of the first singulation path W1. Alternatively, after the first singulation path W1 is formed, the double-sided adhesive layer (not illustrated) disposed on the carrier 10′ may be stretched to increase an interval between adjacent two light-emitting components 120. Under such design, the first singulation path W1 may be formed using a thin blade.
  • As illustrated in FIG. 5G, the fluid reflective layer 150 is formed above the substrate 110 by way of, for example, compression molding, wherein the reflective layer 150 covers a portion of the lateral surface 120 s of the light-emitting component 120, the lateral surface 130 s of the wavelength conversion layer 130, the lateral surface 141 s of the first lateral portion 141 of the adhesive layer 140, the lateral surface of the third electrode 112 of the substrate 110, the lateral surface of the fourth electrode 113 of the substrate 110, the lateral surface of the first electrode 121 of the light-emitting component 120 and the lateral surface of the second electrode 122 of the light-emitting component 120.
  • In addition, the reflective layer 150 includes the first reflective portion 151 surrounding the entire lateral surface 120 s of the light-emitting component 120. The first reflective portion 151 has the first reflective surface 151 s. Due to the lateral surface 141 s of the adhesive layer 140 being a concave surface, the first reflective surface 151 s covering the lateral surface 141 s is a convex surface facing the wavelength conversion layer 130 and the light-emitting component 120. The convex first reflective surface 151 s can reflect the light L1 emitted from the lateral surface 120 s to the wavelength conversion layer 130, and accordingly it can increase the luminous efficiency of the light-emitting device 100.
  • Since the first singulation path W1 of FIG. 5F does not pass through the first lateral portion 141 of the adhesive layer 140, the first reflective surface 151 s of the reflective layer 150 can contact the lower surface 130 b of the wavelength conversion layer 130. As a result, the convex first reflective surface 151 s connects the lower surface 130 b of the wavelength conversion layer 130 to the lateral surface 120 s of the light-emitting component 120, and accordingly it can increase the contacting area of the light L1 emitted from the light-emitting component 120 and the convex surface (the first reflective surface 151 s).
  • Then, the reflective layer 150 is cured by way of heating.
  • As illustrated in FIG. 5H, at least one second singulation path W2 passing through the reflective layer 150 and the substrate 110 is formed to form the light-emitting device 100 of FIG. 1. The first reflective surface 151 s of the reflective layer 150 and the lateral surface 110 s of the substrate 110 are formed by the second singulation path W2, wherein the first reflective surface 151 s and the lateral surface 110 s are substantially aligned or flush with each other.
  • In another embodiment, the second singulation path W2 may pass through the wavelength conversion layer 130, the reflective layer 150 and the substrate 110, such that the wavelength conversion layer 130, the reflective layer 150 and the substrate 110 form the lateral surface 130 s, the lateral surface 150 s and lateral surface 110 s respectively, wherein the lateral surface 130 s, the lateral surface 150 s and lateral surface 110 s are substantially aligned or flush with each other.
  • In addition, the cutting width for forming the second singulation path W2 may be substantially equal to the width of the second singulation path W2. Alternatively, after the second singulation path W2 is formed, the double-sided adhesive layer (not illustrated) disposed on the carrier 10′ may be stretched to increase an interval between adjacent two light-emitting components 120. Under such design, the second singulation path W2 may be formed using a thin blade.
  • FIGS. 6A to 6C illustrate another manufacturing processes of the light-emitting device 100 of FIG. 1.
  • As illustrated in FIG. 6A, the adhesive layer 140 is formed on the high-density phosphor layer 131 of the wavelength conversion layer 130 by way of, for example, applying or dispensing.
  • As illustrated in FIG. 6B, the substrate 110 and the light-emitting component 120 of FIG. 5C are disposed on the adhesive layer 140, wherein the light-emitting component 120 contacts with the adhesive layer 140, such that the adhesive layer 140 adheres the light-emitting component 120 to the high-density phosphor layer 131 of the wavelength conversion layer 130.
  • Due to the light-emitting component 120 extruding the adhesive layer 140, the adhesive layer 140 flows toward two sides of the light-emitting component 120 to form the first lateral portion 141. Due to surface tension, the lateral surface 141 s of the first lateral portion 141 forms a concave surface. Depending on the amount of the adhesive layer 140 and/or the property of the adhesive layer 140, the first lateral portion 141 may cover at least a portion of the lateral surface 120 s of the light-emitting component 120. In addition, as illustrated in an enlargement view of FIG. 6B, a portion of the adhesive layer 140 which remains on between the wavelength conversion layer 130 and the light-emitting component 120 forms the heat resistance layer 142. The heat resistance layer 142 may reduce the heat of transmitting to the wavelength conversion layer 130 from the light-emitting component 120, and accordingly it can slow the degrading speed of the wavelength conversion layer 130.
  • As illustrated in FIG. 6C, the light-emitting components 120, the wavelength conversion layer 130 and the substrate 110 are inverted, such that the wavelength conversion layer 130 faces upwardly.
  • The following steps are similar the corresponding steps of FIGS. 5A to 5H, and the similarities are not repeated.
  • FIGS. 7A to 7C illustrate manufacturing processes of the light-emitting device 200 of FIG. 2.
  • Firstly, the structure of FIG. 5E is formed by using the processes of FIG. 5A to 5E, or the structure of FIG. 6C is formed by using the processes of FIG. 6A to 6C.
  • Then, as illustrated in FIG. 7A, at least one first singulation path W1 passing through the wavelength conversion layer 130 and the first lateral portion 141 which covers the lateral surface 120 s of the light-emitting component 120 is formed, by way of cutting, to cut off the wavelength conversion layer 130 and remove the first lateral portion 141. Since the first singulation path W1 cuts off the first lateral portion 141, such that the entire lateral surface 120 s of the light-emitting component 120 and the entire lateral surface 142 s of the heat resistance layer 142 are be formed and exposed.
  • As illustrated in FIG. 7B, the fluid reflective layer 150 is formed above the substrate 110 by way of, for example, compression molding, wherein the reflective layer 150 covers the entire lateral surface 120 s of the light-emitting component 120, the entire lateral surface 142 s of the heat resistance layer 142, the entire lateral surface 130 s of the wavelength conversion layer 130, the lateral surface of the third electrode 112 of the substrate 110, the lateral surface of the fourth electrode 113 of the substrate 110, the lateral surface of the first electrode 121 of the light-emitting component 120 and the lateral surface of the second electrode 122 of the light-emitting component 120.
  • Then, the reflective layer 150 is cured by way of heating.
  • As illustrated in FIG. 7C, at least one second singulation path W2 passing through the reflective layer 150 and the substrate 110 is formed, by way of cutting, to form the light-emitting device 200 of FIG. 2. The lateral surface 150 s of the reflective layer 150 and the lateral surface 110 s of the substrate 110 are formed by the second singulation path W2, wherein the lateral surface 150 s and the lateral surface 110 s are substantially aligned or flush with each other.
  • FIGS. 8A to 8C illustrate manufacturing processes of the light-emitting device 300 of FIG. 3.
  • Firstly, the structure of FIG. 5E is formed by using the processes of FIG. 5A to 5E, or the structure of FIG. 6C is formed by using the processes of FIG. 6A to 6C.
  • Then, as illustrated in FIG. 8A, at least one first singulation path W1 passing through the wavelength conversion layer 130 and the substrate 110 is formed, by way of cutting, to cut off the wavelength conversion layer 130 and the substrate 110. The lateral surface 130 s of the wavelength conversion layer 130 and the lateral surface 110 s of the substrate 110 are formed by the first singulation path W1, wherein the lateral surface 130 s and the lateral surface 110 s are substantially aligned or flush with each other.
  • As illustrated in FIG. 8B, the fluid reflective layer 150 is formed above the substrate 110 by way of, for example, dispensing, wherein the reflective layer 150 covers a portion of the lateral surface 120 s of the light-emitting component 120, the lateral surface 130 s of the wavelength conversion layer 130, the lateral surface 141 s of the first lateral portion 141 of the adhesive layer 140, the lateral surface 110 s of the substrate 110, the lateral surface of the third electrode 112 of the substrate 110, the lateral surface of the fourth electrode 113 of the substrate 110, the lateral surface of the first electrode 121 of the light-emitting component 120 and the lateral surface of the second electrode 122 of the light-emitting component 120.
  • Then, the reflective layer 150 is cured by way of heating.
  • As illustrated in FIG. 8C, at least one second singulation path W2 passing through the reflective layer 150 is formed to form the light-emitting device 300 of FIG. 3, wherein the lateral surface 150 s and the reflective layer 150 is formed by the second singulation path W2.
  • In another embodiment, the second singulation path W2 may pass through the wavelength conversion layer 130, the reflective layer 150 and the substrate 110, such that the wavelength conversion layer 130, the reflective layer 150 and the substrate 110 form the lateral surface 130 s, the lateral surface 150 s and lateral surface 110 s respectively, wherein the lateral surface 130 s, the lateral surface 150 s and lateral surface 110 s are substantially aligned or flush with each other.
  • FIGS. 9A to 9F illustrate manufacturing processes of the light-emitting device 400 of FIG. 4.
  • As illustrated in FIG. 9A, the substrate 110 and a plurality of the light-emitting components 120 are provided, wherein the light-emitting components 120 are disposed on the substrate 110.
  • As illustrated in FIG. 9A, the substrate 110 and the light-emitting components 120 are disposed on the carrier 10′.
  • As illustrated in FIG. 9B, the adhesive layer 140 is formed on the upper surface 120 u of the light-emitting component 120 by way of, for example, applying or dispensing.
  • As illustrated in FIG. 9C, the wavelength conversion layer 130 is disposed on the adhesive layer 140, such that the adhesive layer 140 adheres each light-emitting component 120 to the high-density phosphor layer 131 of the wavelength conversion layer 130. Since the wavelength conversion layer 130 extrudes the adhesive layer 140, the adhesive layer 140 flow toward two sides of the light-emitting component 120 to form the first lateral portion 141. The first lateral portion 141 has the lateral surface 141 s. Due to surface tension, the lateral surface 141 s is a concave surface. However, depending on the amount of the adhesive layer 140 and/or the property of the adhesive layer 140, the lateral surface 141 s may form a convex surface facing substrate 110. In addition, depending on the amount of the adhesive layer 140 and/or the property of the adhesive layer 140, the first lateral portion 141 may cover at least a portion of the lateral surface 120 s of the light-emitting component 120.
  • As illustrated in an enlargement view of FIG. 9C, a portion of the adhesive layer 140 which remains on between the wavelength conversion layer 130 and the light-emitting component 120 forms the heat resistance layer 142. The heat resistance layer 142 can increase the heat resistance between the light-emitting component 120 and the wavelength conversion layer 130, and accordingly it can slow the degrading speed of the wavelength conversion layer 130.
  • In addition, the adhesive layer 140 further includes the second lateral portion 143 which is formed between adjacent two light-emitting components 120. The second lateral portion 143 has the lower surface 143 s. Due to surface tension, the lower surface 143 s forms a concave surface facing the substrate 110. However, depending on the amount of the adhesive layer 140 and/or the property of the adhesive layer 140, the lower surface 143 s may be a concave surface facing the substrate 110.
  • As illustrated in FIG. 9D, at least one first singulation path W1 passing through the wavelength conversion layer 130 is formed to cut off the wavelength conversion layer 130. In the present embodiment, the first singulation path W1 does not pass through the first lateral portion 141 of the adhesive layer 140. In another embodiment, the first singulation path W1 may pass through a portion of the first lateral portion 141 or the entire first lateral portion 141.
  • As illustrated in FIG. 9E, the fluid reflective layer 150 is formed above the substrate 110 by way of, for example, dispensing, wherein the reflective layer 150 covers a portion of the lateral surface 120 s of the light-emitting component 120, the lateral surface 130 s of the wavelength conversion layer 130, the lateral surface 141 s of the first lateral portion 141 of the adhesive layer 140, the lower surface 143 s of the second lateral portion 143, the lateral surface of the third electrode 112 of the substrate 110, the lateral surface of the fourth electrode 113 of the substrate 110, the lateral surface of the first electrode 121 of the light-emitting component 120 and the lateral surface of the second electrode 122 of the light-emitting component 120 through the first singulation path W1.
  • In addition, the reflective layer 150 includes the first reflective portion 151 and the second reflective portion 153, wherein the first reflective portion 151 covers the first lateral portion 141, and the second reflective portion 153 covers the second lateral portion 143. The first reflective portion 151 has the first reflective surface 151 s complying with the lateral surface 141 s, and the first reflective surface 151 s is a convex surface due to the lateral surface 141 s being a concave surface. The second reflective portion 153 has the second reflective surface 153 s complying with the lower surface 143 s, and the second reflective surface 153 s is a concave surface due to the lateral surface 141 s being a convex surface.
  • Then, the reflective layer 150 is cured by way of heating.
  • As illustrated in FIG. 9F, at least one second singulation path W2 passing through the reflective layer 150 and the substrate 110 is formed to form the light-emitting device 400 of FIG. 4. The lateral surface 150 s of the reflective layer 150 and the lateral surface 110 s of the substrate 110 are formed by the second singulation path W2, wherein the lateral surface 150 s and the lateral surface 110 s are substantially aligned or flush with each other.
  • In another embodiment, the second singulation path W2 may pass through the wavelength conversion layer 130, the reflective layer 150 and the substrate 110, such that the wavelength conversion layer 130, the reflective layer 150 and the substrate 110 form the lateral surface 130 s, the lateral surface 150 s and lateral surface 110 s respectively, wherein the lateral surface 130 s, the lateral surface 150 s and lateral surface 110 s are substantially aligned or flush with each other.
  • In other embodiment, the reflective layer 150 of the light-emitting device 400 may cover the lateral surface 120 s of at least one light-emitting component 120, the lateral surface 142 s of the heat resistance layer 142 and the lateral surface 130 s of the wavelength conversion layer 130 by using processes of FIGS. 7A to 7C.
  • In other embodiment, the reflective layer 150 of the light-emitting device 400 may cover the lateral surface 110 s of the substrate 110 by using processes of FIGS. 8A to 8B.
  • It will be apparent to those skilled in the art that various modifications and variations can be made to the disclosed embodiments. It is intended that the specification and examples be considered as exemplary only, with a true scope of the disclosure being indicated by the following claims and their equivalents.

Claims (19)

What is claimed is:
1. A light-emitting device, comprises:
a substrate;
a light-emitting component disposed on the substrate;
a wavelength conversion layer comprising a high-density phosphor layer and a low-density phosphor layer;
an adhesive layer formed between the light-emitting component and the high-density phosphor layer; and
a reflective layer formed above the substrate and covering a lateral surface of the light-emitting component, a lateral surface of the adhesive layer and a lateral surface of the wavelength conversion layer.
2. The light-emitting device according to claim 1, wherein the substrate has a lateral surface and the reflective layer further covers the lateral surface of the substrate.
3. The light-emitting device according to claim 1, wherein the light-emitting component comprises a first electrode and a second electrode, and the reflective layer further covers a lateral surface of the first electrode and a lateral surface of the second electrode.
4. The light-emitting device according to claim 1, wherein the adhesive layer comprises a first lateral portion, the first lateral portion covers a portion of the lateral surface of the light-emitting component, and the reflective layer covers another portion of the lateral surface of the light-emitting component.
5. The light-emitting device according to claim 1, wherein the reflective layer covers the entire lateral surface of the light-emitting component.
6. The light-emitting device according to claim 1, wherein the wavelength conversion layer covers the entire light-emitting component.
7. The light-emitting device according to claim 1, wherein an area of the wavelength conversion layer is equal to or larger than an area of the light-emitting component.
8. The light-emitting device according to claim 7, wherein a ratio of the area of the wavelength conversion layer and the area of the light-emitting component ranges between 1 and 1.35.
9. The light-emitting device according to claim 1, wherein the reflective layer comprises a first reflective portion, and the first reflective portion surrounds the light-emitting component.
10. The light-emitting device according to claim 9, wherein the first reflective portion has a first reflective surface facing the lateral surface of the light-emitting component.
11. The light-emitting device according to claim 10, wherein the first reflective surface is a convex surface facing the lateral surface of the light-emitting component.
12. The light-emitting device according to claim 11, wherein the convex surface connects a lower surface of the wavelength conversion layer to the lateral surface of the light-emitting component.
13. The light-emitting device according to claim 1, comprising:
a plurality of the light-emitting components disposed on the substrate;
wherein the adhesive layer comprises a second lateral portion formed between adjacent two of the light-emitting components.
14. The light-emitting device according to claim 1, comprising:
a plurality of the light-emitting components disposed on the substrate;
wherein the reflective layer comprises a second reflective portion formed between adjacent two of the light-emitting components.
15. The light-emitting device according to claim 14, wherein the second reflective portion has a second reflective surface, and the second reflective surface is a concave surface facing the wavelength conversion layer.
16. The light-emitting device according to claim 14, wherein the second reflective portion has a second reflective surface, and the second reflective surface is a convex surface facing the wavelength conversion layer.
17. The light-emitting device according to claim 1, wherein, comprising:
a plurality of the light-emitting components disposed on the substrate;
wherein each light-emitting component comprises a first electrode and a second electrode, and the reflective layer covers a lateral surface of the first electrode and a lateral surface of the second electrode.
18. The light-emitting device according to claim 1, wherein a ratio of a phosphor particle density of the high-density phosphor layer and a phosphor particle density of the low-density phosphor layer ranges between 1 and 1015.
19. The light-emitting device according to claim 1, wherein a ratio of a thickness of the low-density phosphor layer and a thickness of the high-density phosphor layer ranges between 1 and 1000.
US15/268,681 2015-09-18 2016-09-19 Light-emitting device Active US9922963B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US15/268,681 US9922963B2 (en) 2015-09-18 2016-09-19 Light-emitting device
US15/924,461 US10497681B2 (en) 2015-09-18 2018-03-19 Light-emitting device
US16/699,805 US10957674B2 (en) 2015-09-18 2019-12-02 Manufacturing method

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US201562220249P 2015-09-18 2015-09-18
US201562241729P 2015-10-14 2015-10-14
TW104144809A TWI583027B (en) 2015-09-18 2015-12-31 Light-emitting device and manufacturing method thereof
TW104144809A 2015-12-31
TW104144809 2015-12-31
US15/268,681 US9922963B2 (en) 2015-09-18 2016-09-19 Light-emitting device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US15/924,461 Continuation US10497681B2 (en) 2015-09-18 2018-03-19 Light-emitting device

Publications (2)

Publication Number Publication Date
US20170084587A1 true US20170084587A1 (en) 2017-03-23
US9922963B2 US9922963B2 (en) 2018-03-20

Family

ID=58283210

Family Applications (3)

Application Number Title Priority Date Filing Date
US15/268,681 Active US9922963B2 (en) 2015-09-18 2016-09-19 Light-emitting device
US15/924,461 Active US10497681B2 (en) 2015-09-18 2018-03-19 Light-emitting device
US16/699,805 Active US10957674B2 (en) 2015-09-18 2019-12-02 Manufacturing method

Family Applications After (2)

Application Number Title Priority Date Filing Date
US15/924,461 Active US10497681B2 (en) 2015-09-18 2018-03-19 Light-emitting device
US16/699,805 Active US10957674B2 (en) 2015-09-18 2019-12-02 Manufacturing method

Country Status (2)

Country Link
US (3) US9922963B2 (en)
CN (3) CN111223975A (en)

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180108815A1 (en) * 2016-10-19 2018-04-19 Nichia Corporation Light emitting device and method of manufacturing same
US20180130930A1 (en) * 2016-11-08 2018-05-10 Stanley Electric Co., Ltd. Semiconductor light emitting device
US20190006568A1 (en) * 2017-06-28 2019-01-03 Nichia Corporation Light emitting device
JP2019009223A (en) * 2017-06-22 2019-01-17 豊田合成株式会社 Light-emitting device
US20190035986A1 (en) * 2017-07-28 2019-01-31 Nichia Corporation Method of manufacturing light emitting device
CN109309153A (en) * 2017-07-28 2019-02-05 晶元光电股份有限公司 Light emitting device and method for manufacturing the same
WO2019046422A1 (en) * 2017-09-01 2019-03-07 Cree, Inc. Light emitting diodes, components and related methods
US20190123252A1 (en) * 2017-10-25 2019-04-25 Lextar Electronics Corporation Light-emitting diode device and manufacturing method thereof
JP2019096872A (en) * 2017-11-17 2019-06-20 スタンレー電気株式会社 Semiconductor light emitting device
US20190237637A1 (en) * 2018-02-01 2019-08-01 Epistar Corporation Light-emitting device and manufacturing method thereof
JP2019176081A (en) * 2018-03-29 2019-10-10 日亜化学工業株式会社 Light-emitting device and method for manufacturing the same
US10580932B2 (en) 2016-12-21 2020-03-03 Nichia Corporation Method for manufacturing light-emitting device
EP3633744A1 (en) * 2018-10-04 2020-04-08 Nichia Corporation Light emitting device
JP2020123746A (en) * 2020-04-28 2020-08-13 日亜化学工業株式会社 Manufacturing method of light emitting device
TWI743410B (en) * 2018-02-01 2021-10-21 晶元光電股份有限公司 Light-emitting device and manufacturing method thereof
US11189758B2 (en) * 2018-07-24 2021-11-30 Nichia Corporation Light-emitting device
US11205743B2 (en) 2018-12-21 2021-12-21 Lumileds Llc High luminance light emitting device and method for creating a high luminance light emitting device
US11244931B2 (en) * 2018-10-04 2022-02-08 Nichia Corporation Light emitting device with enhanced color mixing quality
US11342486B2 (en) * 2017-10-31 2022-05-24 Suzhou Lekin Semiconductor Co., Ltd. Light-emitting device package and lighting device having same
US20220216380A1 (en) * 2018-03-20 2022-07-07 Nichia Corporation Light emitting device and method of manufacturing light emitting device
WO2022173686A1 (en) * 2021-02-11 2022-08-18 Creeled, Inc. Light emitting diode package having a cover structure with an optical arrangement, and manufacturing method
WO2023205042A1 (en) * 2022-04-21 2023-10-26 Creeled, Inc. Emission height arrangements in light-emitting diode packages and related devices and methods
EP4203082A4 (en) * 2020-10-22 2024-02-28 Stanley Electric Co., Ltd. Semiconductor light emitting device and semiconductor light emitting module
USD1036711S1 (en) 2022-02-17 2024-07-23 Creeled, Inc. Light-emitting diode package
EP4411842A1 (en) * 2023-02-06 2024-08-07 Bridgelux, Inc. Full spectrum white light emitting devices

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9997676B2 (en) 2014-05-14 2018-06-12 Genesis Photonics Inc. Light emitting device and manufacturing method thereof
US10439111B2 (en) 2014-05-14 2019-10-08 Genesis Photonics Inc. Light emitting device and manufacturing method thereof
TWI557952B (en) 2014-06-12 2016-11-11 新世紀光電股份有限公司 Light emitting component
US9922963B2 (en) 2015-09-18 2018-03-20 Genesis Photonics Inc. Light-emitting device
CN107689409B (en) * 2016-08-03 2019-09-20 展晶科技(深圳)有限公司 Light emitting diode
TWI651870B (en) * 2016-10-19 2019-02-21 新世紀光電股份有限公司 Light emitting device and method of manufacturing same
CN109494289B (en) * 2017-09-11 2020-08-11 行家光电股份有限公司 Light emitting device using quantum dot color conversion and method of manufacturing the same
KR102392013B1 (en) * 2017-09-15 2022-04-28 쑤저우 레킨 세미컨덕터 컴퍼니 리미티드 Light emitting device package
TWI778167B (en) 2017-11-05 2022-09-21 新世紀光電股份有限公司 Light emitting apparatus and manufacturing method thereof
US10784423B2 (en) 2017-11-05 2020-09-22 Genesis Photonics Inc. Light emitting device
DE102017128717B4 (en) * 2017-12-04 2023-03-09 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Process for producing an optoelectronic component
WO2019210486A1 (en) * 2018-05-03 2019-11-07 Xi' An Raysees Technology Co. Ltd Cob led and method for packaging cob led
KR20190134941A (en) * 2018-05-24 2019-12-05 서울반도체 주식회사 Light emitting device
JP7161100B2 (en) * 2018-09-25 2022-10-26 日亜化学工業株式会社 Light-emitting device and manufacturing method thereof
CN109273579B (en) * 2018-11-22 2022-04-22 江西省晶能半导体有限公司 LED lamp bead preparation method
CN111312866A (en) * 2018-12-12 2020-06-19 蚌埠三颐半导体有限公司 Packaging method and packaging structure of light emitting diode chip
JP6947989B2 (en) * 2019-03-28 2021-10-13 日亜化学工業株式会社 Linear light source and planar light emitting device
CN111063784A (en) * 2019-12-30 2020-04-24 江西省晶能半导体有限公司 LED lamp bead preparation method
CN111092142A (en) * 2019-12-30 2020-05-01 江西省晶能半导体有限公司 White light LED chip and preparation method thereof
CN111063783A (en) * 2019-12-30 2020-04-24 江西省晶能半导体有限公司 Preparation method of fluorescent diaphragm and preparation method of LED lamp bead
US11348400B2 (en) * 2020-10-08 2022-05-31 SG Gaming. Inc. Gaming systems and methods with emotive lighting

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120025218A1 (en) * 2010-08-02 2012-02-02 Ito Kosaburo Semiconductor light-emitting device and manufacturing method
US20120236582A1 (en) * 2011-01-24 2012-09-20 Waragaya Takeshi Semiconductor light emitting device and manufacturing method
US20140054621A1 (en) * 2012-08-23 2014-02-27 Stanley Electric Co., Ltd. Semiconductor light-emitting device including transparent plate with slanted side surface
US20140117396A1 (en) * 2011-05-18 2014-05-01 Osram Opto Semiconductors Gmbh Optoelectronic semiconductor chip, optoelectronic semiconductor component, and a method for producing an optoelectronic semiconductor component
US8860061B2 (en) * 2012-01-23 2014-10-14 Stanley Electric Co., Ltd. Semiconductor light-emitting device, manufacturing method for the same and vehicle headlight

Family Cites Families (148)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6155699A (en) 1999-03-15 2000-12-05 Agilent Technologies, Inc. Efficient phosphor-conversion led structure
WO2001082386A1 (en) 2000-04-24 2001-11-01 Rohm Co., Ltd. Edge-emitting light-emitting semiconductor device and method of manufacture thereof
JP3866058B2 (en) 2001-07-05 2007-01-10 シャープ株式会社 Semiconductor device, wiring board and tape carrier
CN1464953A (en) 2001-08-09 2003-12-31 松下电器产业株式会社 Led illuminator and card type led illuminating light source
KR100447867B1 (en) 2001-10-05 2004-09-08 삼성전자주식회사 Semiconductor package
US6952079B2 (en) 2002-12-18 2005-10-04 General Electric Company Luminaire for light extraction from a flat light source
JP3716252B2 (en) 2002-12-26 2005-11-16 ローム株式会社 Light emitting device and lighting device
US9142740B2 (en) 2003-07-04 2015-09-22 Epistar Corporation Optoelectronic element and manufacturing method thereof
JP4411892B2 (en) 2003-07-09 2010-02-10 日亜化学工業株式会社 Light source device and vehicle headlamp using the same
TWI220076B (en) 2003-08-27 2004-08-01 Au Optronics Corp Light-emitting device
JP2005191530A (en) 2003-12-03 2005-07-14 Sumitomo Electric Ind Ltd Light emitting device
JP4357311B2 (en) 2004-02-04 2009-11-04 シチズン電子株式会社 Light emitting diode chip
JP4516337B2 (en) 2004-03-25 2010-08-04 シチズン電子株式会社 Semiconductor light emitting device
JP4667803B2 (en) 2004-09-14 2011-04-13 日亜化学工業株式会社 Light emitting device
EP1845394B1 (en) 2005-01-31 2011-12-28 Toppan Printing Co., Ltd. Optical sheet, and backlight unit and display using the same
US9018655B2 (en) 2005-02-03 2015-04-28 Epistar Corporation Light emitting apparatus and manufacture method thereof
TWI244228B (en) 2005-02-03 2005-11-21 United Epitaxy Co Ltd Light emitting device and manufacture method thereof
JP4706825B2 (en) 2005-02-18 2011-06-22 日亜化学工業株式会社 Side-view type light emitting device
KR100665219B1 (en) 2005-07-14 2007-01-09 삼성전기주식회사 Wavelengt-converted light emitting diode package
CN100485989C (en) 2005-11-22 2009-05-06 夏普株式会社 Light emitting element, production method thereof, backlight unit having the light emitting element, and production method thereof
KR100640496B1 (en) 2005-11-23 2006-11-01 삼성전기주식회사 Vertically structured gan type led device
TWI309480B (en) 2006-07-24 2009-05-01 Everlight Electronics Co Ltd Led packaging structure
JP4905009B2 (en) 2006-09-12 2012-03-28 豊田合成株式会社 Method for manufacturing light emitting device
US7889421B2 (en) 2006-11-17 2011-02-15 Rensselaer Polytechnic Institute High-power white LEDs and manufacturing method thereof
KR101319209B1 (en) 2006-11-24 2013-10-16 엘지디스플레이 주식회사 Backlight unit of liquid crystal display device
JP4859050B2 (en) * 2006-11-28 2012-01-18 Dowaエレクトロニクス株式会社 Light emitting device and manufacturing method thereof
US8252615B2 (en) 2006-12-22 2012-08-28 Stats Chippac Ltd. Integrated circuit package system employing mold flash prevention technology
CN101578479A (en) 2007-01-12 2009-11-11 松下电器产业株式会社 Light-emitting device and illumination apparatus using the same
TW200841089A (en) 2007-04-09 2008-10-16 Chu-Liang Cheng Light source module and liquid crystal display
US7810956B2 (en) 2007-08-23 2010-10-12 Koninklijke Philips Electronics N.V. Light source including reflective wavelength-converting layer
KR20100077213A (en) 2007-11-19 2010-07-07 파나소닉 주식회사 Semiconductor light emitting device and method for manufacturing semiconductor light emitting device
JP5526782B2 (en) 2007-11-29 2014-06-18 日亜化学工業株式会社 Light emitting device and manufacturing method thereof
GB0801509D0 (en) 2008-01-28 2008-03-05 Photonstar Led Ltd Light emitting system with optically transparent thermally conductive element
RU2010143026A (en) 2008-03-21 2012-04-27 Конинклейке Филипс Элкектроникс Н.В. (Nl) LIGHTING DEVICE
JP2009245981A (en) 2008-03-28 2009-10-22 Toyota Central R&D Labs Inc Led light-emitting device
TWI416755B (en) 2008-05-30 2013-11-21 Epistar Corp Light source module, related light bar and related liquid crystal display
US7888691B2 (en) 2008-08-29 2011-02-15 Koninklijke Philips Electronics N.V. Light source including a wavelength-converted semiconductor light emitting device and a filter
US7973327B2 (en) 2008-09-02 2011-07-05 Bridgelux, Inc. Phosphor-converted LED
US7825427B2 (en) 2008-09-12 2010-11-02 Bridgelux, Inc. Method and apparatus for generating phosphor film with textured surface
US7928655B2 (en) 2008-11-10 2011-04-19 Visera Technologies Company Limited Light-emitting diode device and method for fabricating the same
CN101515621B (en) 2009-02-19 2011-03-30 旭丽电子(广州)有限公司 LED chip, manufacturing method and encapsulating method
CN103050601B (en) 2009-03-11 2015-10-28 晶元光电股份有限公司 Light-emitting device
US8317384B2 (en) 2009-04-10 2012-11-27 Intellectual Discovery Co., Ltd. Light guide film with cut lines, and optical keypad using such film
JP5482378B2 (en) 2009-04-20 2014-05-07 日亜化学工業株式会社 Light emitting device
WO2010134331A1 (en) 2009-05-22 2010-11-25 Panasonic Corporation Semiconductor light-emitting device and light source device using the same
EP2448023B1 (en) 2009-06-22 2016-08-31 Nichia Corporation Light-emitting device
US8097894B2 (en) 2009-07-23 2012-01-17 Koninklijke Philips Electronics N.V. LED with molded reflective sidewall coating
TWI403003B (en) 2009-10-02 2013-07-21 Chi Mei Lighting Tech Corp Light-emitting diode and method for manufacturing the same
CN102074639B (en) 2009-11-24 2013-06-05 展晶科技(深圳)有限公司 Light emitting diode and manufacturing process thereof
TWI512918B (en) 2010-01-14 2015-12-11 Xintec Inc Chip package and manufacturing method thereof
DE112011100376B4 (en) 2010-01-29 2024-06-27 Citizen Electronics Co., Ltd. METHOD FOR PRODUCING A LIGHT-EMITTING DEVICE
KR101763972B1 (en) 2010-02-09 2017-08-01 니치아 카가쿠 고교 가부시키가이샤 Light emitting device
US8771577B2 (en) 2010-02-16 2014-07-08 Koninklijke Philips N.V. Light emitting device with molded wavelength converting layer
US8362515B2 (en) 2010-04-07 2013-01-29 Chia-Ming Cheng Chip package and method for forming the same
EP2378576A2 (en) 2010-04-15 2011-10-19 Samsung LED Co., Ltd. Light emitting diode package, lighting apparatus having the same, and method for manufacturing light emitting diode package
JP5390472B2 (en) * 2010-06-03 2014-01-15 株式会社東芝 Semiconductor light emitting device and manufacturing method thereof
JP5414627B2 (en) 2010-06-07 2014-02-12 株式会社東芝 Semiconductor light emitting device and manufacturing method thereof
JP5572013B2 (en) * 2010-06-16 2014-08-13 スタンレー電気株式会社 Light emitting device and manufacturing method thereof
JP5701523B2 (en) 2010-06-22 2015-04-15 日東電工株式会社 Semiconductor light emitting device
JP5566785B2 (en) 2010-06-22 2014-08-06 日東電工株式会社 Composite sheet
CN102315354B (en) 2010-06-29 2013-11-06 展晶科技(深圳)有限公司 Packaging structure of light emitting diode
JP5486431B2 (en) 2010-07-27 2014-05-07 日東電工株式会社 LIGHT EMITTING DEVICE COMPONENT, LIGHT EMITTING DEVICE, AND ITS MANUFACTURING METHOD
TWI462340B (en) 2010-09-08 2014-11-21 Epistar Corp A light emitting structure and a manufacturing method thereof
US20120061700A1 (en) 2010-09-09 2012-03-15 Andreas Eder Method and system for providing a reliable light emitting diode semiconductor device
CN102412344A (en) 2010-09-23 2012-04-11 展晶科技(深圳)有限公司 Light emitting diode packaging method
KR20120050282A (en) 2010-11-10 2012-05-18 삼성엘이디 주식회사 Light emitting device package and method of manufacturing the same
CN201910421U (en) 2010-12-01 2011-07-27 宝创科技股份有限公司 Planar structure for LED (light-emitting diode) device
KR20120072962A (en) 2010-12-24 2012-07-04 삼성엘이디 주식회사 Light emitting device package and method of manufacturing the same
KR20120082190A (en) 2011-01-13 2012-07-23 삼성엘이디 주식회사 Light emitting device package
JP5537446B2 (en) 2011-01-14 2014-07-02 株式会社東芝 Light emitting device, light emitting module, and method of manufacturing light emitting device
JP5647028B2 (en) 2011-02-14 2014-12-24 スタンレー電気株式会社 Light emitting device and manufacturing method thereof
CN102683538B (en) 2011-03-06 2016-06-08 维亚甘有限公司 LED package and manufacture method
TWI473305B (en) * 2011-03-10 2015-02-11 Formosa Epitaxy Inc Light emitting diode structure
US9041046B2 (en) * 2011-03-15 2015-05-26 Avago Technologies General Ip (Singapore) Pte. Ltd. Method and apparatus for a light source
US20120235188A1 (en) * 2011-03-15 2012-09-20 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Method and Apparatus for a Flat Top Light Source
KR20120106568A (en) 2011-03-18 2012-09-26 가부시키가이샤 한도오따이 에네루기 켄큐쇼 Light-emitting device and manufacturing method thereof
US8899767B2 (en) 2011-03-31 2014-12-02 Xicato, Inc. Grid structure on a transmissive layer of an LED-based illumination module
US20120261689A1 (en) 2011-04-13 2012-10-18 Bernd Karl Appelt Semiconductor device packages and related methods
JP5670249B2 (en) 2011-04-14 2015-02-18 日東電工株式会社 Light emitting element transfer sheet manufacturing method, light emitting device manufacturing method, light emitting element transfer sheet, and light emitting device
JP5745319B2 (en) 2011-04-14 2015-07-08 日東電工株式会社 Fluorescent reflection sheet and method for manufacturing light emitting diode device
KR20140022019A (en) 2011-04-20 2014-02-21 가부시키가이샤 에루므 Light emitting device and method for manufacturing same
JP5680472B2 (en) 2011-04-22 2015-03-04 シチズンホールディングス株式会社 Manufacturing method of semiconductor light emitting device
CN103688377B (en) 2011-05-16 2018-06-08 日亚化学工业株式会社 Light-emitting device and its manufacturing method
TW201248725A (en) 2011-05-31 2012-12-01 Aceplux Optotech Inc Epitaxial substrate with transparent cone, LED, and manufacturing method thereof.
JP5840388B2 (en) 2011-06-01 2016-01-06 日東電工株式会社 Light emitting diode device
JP2013016588A (en) 2011-07-01 2013-01-24 Citizen Electronics Co Ltd Led light-emitting device
JP2013062320A (en) * 2011-09-12 2013-04-04 Olympus Corp Light emitting device
JP5848562B2 (en) 2011-09-21 2016-01-27 シチズン電子株式会社 Semiconductor light emitting device and manufacturing method thereof.
JP5893888B2 (en) 2011-10-13 2016-03-23 シチズン電子株式会社 Semiconductor light emitting device
US20130094177A1 (en) 2011-10-13 2013-04-18 Intematix Corporation Wavelength conversion component with improved thermal conductive characteristics for remote wavelength conversion
TW201318221A (en) 2011-10-26 2013-05-01 Episil Technologies Inc Silicon submount for light emitting diode and method of forming the same
KR101905535B1 (en) 2011-11-16 2018-10-10 엘지이노텍 주식회사 Light emitting device and light apparatus having thereof
KR101957700B1 (en) 2012-02-01 2019-03-14 삼성전자주식회사 Ligt Emitting Device
US9240530B2 (en) 2012-02-13 2016-01-19 Cree, Inc. Light emitter devices having improved chemical and physical resistance and related methods
US8946747B2 (en) 2012-02-13 2015-02-03 Cree, Inc. Lighting device including multiple encapsulant material layers
US9735198B2 (en) 2012-03-30 2017-08-15 Cree, Inc. Substrate based light emitter devices, components, and related methods
TWI495056B (en) 2012-04-24 2015-08-01 Genesis Photonics Inc Substrate structure
CN105742468B (en) 2012-04-27 2018-07-06 宁波港波电子有限公司 Light-emitting diode encapsulation structure and its manufacturing method
JP5816127B2 (en) 2012-04-27 2015-11-18 株式会社東芝 Semiconductor light emitting device and manufacturing method thereof
CN103378279B (en) 2012-04-27 2016-08-31 上海力锐网络科技有限公司 Package structure for LED manufacture method
CN103515520B (en) 2012-06-29 2016-03-23 展晶科技(深圳)有限公司 Package structure for LED and manufacture method thereof
US20140009060A1 (en) 2012-06-29 2014-01-09 Nitto Denko Corporation Phosphor layer-covered led, producing method thereof, and led device
CN103531669B (en) 2012-07-05 2016-09-07 北京时代浩鼎科技股份有限公司 The manufacture method of package structure for LED
US9287475B2 (en) 2012-07-20 2016-03-15 Cree, Inc. Solid state lighting component package with reflective polymer matrix layer
DE102012107290A1 (en) 2012-08-08 2014-02-13 Osram Opto Semiconductors Gmbh Optoelectronic semiconductor device, conversion agent platelets and method of making a conversion agent platelet
US9337405B2 (en) 2012-08-31 2016-05-10 Nichia Corporation Light emitting device and method for manufacturing the same
JP6149487B2 (en) 2012-11-09 2017-06-21 日亜化学工業株式会社 LIGHT EMITTING DEVICE MANUFACTURING METHOD AND LIGHT EMITTING DEVICE
JP2014112669A (en) 2012-11-12 2014-06-19 Citizen Holdings Co Ltd Semiconductor light-emitting device and manufacturing method of the same
CN103855142B (en) 2012-12-04 2017-12-29 东芝照明技术株式会社 Light-emitting device and lighting device
CN104854716B (en) 2012-12-10 2017-06-20 西铁城时计株式会社 LED matrix and its manufacture method
TWM453969U (en) 2012-12-26 2013-05-21 Genesis Photonics Inc Light emitting device
CN103137571A (en) 2013-01-22 2013-06-05 日月光半导体制造股份有限公司 Semiconductor encapsulation structure and manufacturing method thereof
KR20140094752A (en) 2013-01-22 2014-07-31 삼성전자주식회사 An electronic device package and a packaging substrate for the same
JP5819335B2 (en) 2013-02-18 2015-11-24 株式会社東芝 Semiconductor light emitting device and manufacturing method thereof
KR101958418B1 (en) 2013-02-22 2019-03-14 삼성전자 주식회사 Light emitting device package
JP2014170902A (en) 2013-03-05 2014-09-18 Toshiba Corp Semiconductor light-emitting device and manufacturing method of the same
FR3003403B1 (en) 2013-03-14 2016-11-04 Commissariat Energie Atomique METHOD FOR FORMING LIGHT EMITTING DIODES
CN103199183B (en) 2013-04-08 2016-01-27 厦门市三安光电科技有限公司 A kind of encapsulating structure improving vertical LED chip brightness
TWI540766B (en) 2013-07-10 2016-07-01 隆達電子股份有限公司 Light emitting diode package structure
CN104347610B (en) * 2013-07-23 2017-06-20 深圳市瑞丰光电子股份有限公司 Embedded LED device and preparation method thereof and luminaire
TW201507209A (en) 2013-08-01 2015-02-16 Genesis Photonics Inc Light emitting diode package structure and manufacturing method thereof
CN104425671A (en) 2013-08-21 2015-03-18 展晶科技(深圳)有限公司 Method for manufacturing light emitting diode
CN104465936B (en) * 2013-09-13 2017-05-24 展晶科技(深圳)有限公司 Light emitting diode
EP2854186A1 (en) 2013-09-26 2015-04-01 Seoul Semiconductor Co., Ltd. Light source module, fabrication method therefor, and backlight unit including the same
KR20150035399A (en) 2013-09-26 2015-04-06 서울반도체 주식회사 Light source module, manufacturing method thereof and backlight unit having the same
KR20150042362A (en) 2013-10-10 2015-04-21 삼성전자주식회사 Light emitting diode package and method of manufacturing the same
TWI520383B (en) 2013-10-14 2016-02-01 新世紀光電股份有限公司 Light emitting diode package structure
TWI533478B (en) 2013-10-14 2016-05-11 新世紀光電股份有限公司 Flip chip light emitting diode package structure
CN103531725A (en) 2013-10-16 2014-01-22 上海和辉光电有限公司 Electroluminescent component and packaging method thereof
JP6182050B2 (en) 2013-10-28 2017-08-16 株式会社東芝 Semiconductor light emitting device
US9419189B1 (en) 2013-11-04 2016-08-16 Soraa, Inc. Small LED source with high brightness and high efficiency
KR102075993B1 (en) 2013-12-23 2020-02-11 삼성전자주식회사 Method of Fabricating White LED Devices
JP6244906B2 (en) * 2013-12-27 2017-12-13 日亜化学工業株式会社 Semiconductor light emitting device
EP3092667B1 (en) * 2014-01-06 2019-04-24 Lumileds Holding B.V. Thin led flash for camera
TWI542047B (en) 2014-01-13 2016-07-11 邱羅利士公司 Manufacturing method of light emitting diode package structure
KR101584201B1 (en) 2014-01-13 2016-01-13 삼성전자주식회사 Semiconductor light emitting device
JP2015173142A (en) 2014-03-11 2015-10-01 株式会社東芝 semiconductor light-emitting device
JP2015176960A (en) * 2014-03-14 2015-10-05 株式会社東芝 light-emitting device
US20150280078A1 (en) 2014-03-31 2015-10-01 SemiLEDs Optoelectronics Co., Ltd. White flip chip light emitting diode (fc led) and fabrication method
TWI557955B (en) 2014-04-23 2016-11-11 光寶光電(常州)有限公司 Led carrier and manufacturing method thereof
CN203910851U (en) 2014-05-23 2014-10-29 晶科电子(广州)有限公司 White light LED chip
CN204155931U (en) 2014-06-25 2015-02-11 常州欧密格光电科技有限公司 A kind of extra small ultra-thin specular removal Quartering shot type highlighted white light polycrystalline LED element
US9601670B2 (en) 2014-07-11 2017-03-21 Cree, Inc. Method to form primary optic with variable shapes and/or geometries without a substrate
CN104253194A (en) 2014-09-18 2014-12-31 易美芯光(北京)科技有限公司 Structure and method for packaging of chip-size white LED (light emitting diode)
US20160181476A1 (en) 2014-12-17 2016-06-23 Apple Inc. Micro led with dielectric side mirror
US20160190406A1 (en) 2014-12-24 2016-06-30 Epistar Corporation Light-emitting device and manufacturing method thereof
CN204857783U (en) 2015-04-09 2015-12-09 江西省晶瑞光电有限公司 Side -emitting's LED
US9922963B2 (en) 2015-09-18 2018-03-20 Genesis Photonics Inc. Light-emitting device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120025218A1 (en) * 2010-08-02 2012-02-02 Ito Kosaburo Semiconductor light-emitting device and manufacturing method
US20120236582A1 (en) * 2011-01-24 2012-09-20 Waragaya Takeshi Semiconductor light emitting device and manufacturing method
US20140117396A1 (en) * 2011-05-18 2014-05-01 Osram Opto Semiconductors Gmbh Optoelectronic semiconductor chip, optoelectronic semiconductor component, and a method for producing an optoelectronic semiconductor component
US8860061B2 (en) * 2012-01-23 2014-10-14 Stanley Electric Co., Ltd. Semiconductor light-emitting device, manufacturing method for the same and vehicle headlight
US20140054621A1 (en) * 2012-08-23 2014-02-27 Stanley Electric Co., Ltd. Semiconductor light-emitting device including transparent plate with slanted side surface

Cited By (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180108815A1 (en) * 2016-10-19 2018-04-19 Nichia Corporation Light emitting device and method of manufacturing same
US10896998B2 (en) * 2016-10-19 2021-01-19 Nichia Corporation Method of manufacturing light emitting device
US11322664B2 (en) * 2016-10-19 2022-05-03 Nichia Corporation Method of manufacturing light emitting device
US10559724B2 (en) * 2016-10-19 2020-02-11 Nichia Corporation Light emitting device and method of manufacturing same
US20180130930A1 (en) * 2016-11-08 2018-05-10 Stanley Electric Co., Ltd. Semiconductor light emitting device
US10971663B2 (en) * 2016-11-08 2021-04-06 Stanley Electric Co., Ltd. Semiconductor light emitting device
US10811560B2 (en) 2016-12-21 2020-10-20 Nichia Corporation Method for manufacturing light-emitting device
US10580932B2 (en) 2016-12-21 2020-03-03 Nichia Corporation Method for manufacturing light-emitting device
JP2019009223A (en) * 2017-06-22 2019-01-17 豊田合成株式会社 Light-emitting device
US10267470B2 (en) * 2017-06-22 2019-04-23 Toyoda Gosei Co., Ltd. Light emitting device
US20190006568A1 (en) * 2017-06-28 2019-01-03 Nichia Corporation Light emitting device
US11329203B2 (en) * 2017-06-28 2022-05-10 Nichia Corporation Light emitting device including covering member and optical member
US10693045B2 (en) * 2017-07-28 2020-06-23 Nichia Corporation Method for attaching light transmissive member to light emitting element for manufacturing light emitting device
US12087890B2 (en) 2017-07-28 2024-09-10 Nichia Corporation Light emitting device including shaped bonding member for attaching light transmissive member to light emitting element
US11245057B2 (en) 2017-07-28 2022-02-08 Nichia Corporation Method for attaching light transmissive member to light emitting element
CN109309153A (en) * 2017-07-28 2019-02-05 晶元光电股份有限公司 Light emitting device and method for manufacturing the same
US20190035986A1 (en) * 2017-07-28 2019-01-31 Nichia Corporation Method of manufacturing light emitting device
US10361349B2 (en) 2017-09-01 2019-07-23 Cree, Inc. Light emitting diodes, components and related methods
CN111052422A (en) * 2017-09-01 2020-04-21 科锐公司 Light emitting diodes, components and related methods
WO2019046422A1 (en) * 2017-09-01 2019-03-07 Cree, Inc. Light emitting diodes, components and related methods
US10720559B2 (en) * 2017-10-25 2020-07-21 Lextar Electronics Corporation Light-emitting diode device and manufacturing method thereof
US20190123252A1 (en) * 2017-10-25 2019-04-25 Lextar Electronics Corporation Light-emitting diode device and manufacturing method thereof
US11342486B2 (en) * 2017-10-31 2022-05-24 Suzhou Lekin Semiconductor Co., Ltd. Light-emitting device package and lighting device having same
JP7221659B2 (en) 2017-11-17 2023-02-14 スタンレー電気株式会社 semiconductor light emitting device
JP2019096872A (en) * 2017-11-17 2019-06-20 スタンレー電気株式会社 Semiconductor light emitting device
CN110112123A (en) * 2018-02-01 2019-08-09 晶元光电股份有限公司 Light emitting device and its manufacturing method
US10741734B2 (en) * 2018-02-01 2020-08-11 Epistar Corporation Light-emitting device and manufacturing method thereof
US20190237637A1 (en) * 2018-02-01 2019-08-01 Epistar Corporation Light-emitting device and manufacturing method thereof
TWI743410B (en) * 2018-02-01 2021-10-21 晶元光電股份有限公司 Light-emitting device and manufacturing method thereof
TWI775608B (en) * 2018-02-01 2022-08-21 晶元光電股份有限公司 Light-emitting device
US11380824B2 (en) * 2018-02-01 2022-07-05 Epistar Corporation Light-emitting device and manufacturing method thereof
US20230335687A1 (en) * 2018-03-20 2023-10-19 Nichia Corporation Light emitting device and method of manufacturing light emitting device
US11715819B2 (en) * 2018-03-20 2023-08-01 Nichia Corporation Light emitting device and method of manufacturing light emitting device
US20220216380A1 (en) * 2018-03-20 2022-07-07 Nichia Corporation Light emitting device and method of manufacturing light emitting device
JP2019176081A (en) * 2018-03-29 2019-10-10 日亜化学工業株式会社 Light-emitting device and method for manufacturing the same
JP7082279B2 (en) 2018-03-29 2022-06-08 日亜化学工業株式会社 Light emitting device and its manufacturing method
US11189758B2 (en) * 2018-07-24 2021-11-30 Nichia Corporation Light-emitting device
EP3633744A1 (en) * 2018-10-04 2020-04-08 Nichia Corporation Light emitting device
US11244931B2 (en) * 2018-10-04 2022-02-08 Nichia Corporation Light emitting device with enhanced color mixing quality
US11205743B2 (en) 2018-12-21 2021-12-21 Lumileds Llc High luminance light emitting device and method for creating a high luminance light emitting device
US11830723B2 (en) 2018-12-21 2023-11-28 Lumileds Llc High luminance light emitting device and method for creating a high luminance light emitting device
JP2020123746A (en) * 2020-04-28 2020-08-13 日亜化学工業株式会社 Manufacturing method of light emitting device
JP7054020B2 (en) 2020-04-28 2022-04-13 日亜化学工業株式会社 Light emitting device
EP4203082A4 (en) * 2020-10-22 2024-02-28 Stanley Electric Co., Ltd. Semiconductor light emitting device and semiconductor light emitting module
WO2022173686A1 (en) * 2021-02-11 2022-08-18 Creeled, Inc. Light emitting diode package having a cover structure with an optical arrangement, and manufacturing method
USD1036711S1 (en) 2022-02-17 2024-07-23 Creeled, Inc. Light-emitting diode package
WO2023205042A1 (en) * 2022-04-21 2023-10-26 Creeled, Inc. Emission height arrangements in light-emitting diode packages and related devices and methods
EP4411842A1 (en) * 2023-02-06 2024-08-07 Bridgelux, Inc. Full spectrum white light emitting devices

Also Published As

Publication number Publication date
US9922963B2 (en) 2018-03-20
US20180211942A1 (en) 2018-07-26
US10957674B2 (en) 2021-03-23
CN106549092A (en) 2017-03-29
CN111211206A (en) 2020-05-29
US10497681B2 (en) 2019-12-03
CN111223975A (en) 2020-06-02
US20200105725A1 (en) 2020-04-02

Similar Documents

Publication Publication Date Title
US10957674B2 (en) Manufacturing method
US10388838B2 (en) Light-emitting device and manufacturing method thereof
US11024785B2 (en) Light-emitting diode packages
US9620693B2 (en) Light emitting device and lighting system having the same
US8748917B2 (en) Light emitting device and method thereof
TWI634677B (en) Light emitting device package
EP2312631B1 (en) Light emitting device and light emitting device package having the same
KR20150095430A (en) Light emitting diode package and light emitting device using the same
KR20220047961A (en) Light emitting module and light unit having thereof
EP2365541A2 (en) Light emitting device, method of manufacturing the light emitting device, light emitting device package, and lighting unit
KR101786082B1 (en) Light emitting device
EP2860773B1 (en) Light-emitting device, and light-emitting device package
TWI697136B (en) Light-emitting device
JP2016119464A (en) Light emitting device
KR102024296B1 (en) Light emitting device package
KR101860317B1 (en) Light emitting device
KR101896676B1 (en) Light emitting device, and light emitting device package
KR20120118236A (en) Light emitting device

Legal Events

Date Code Title Description
AS Assignment

Owner name: GENESIS PHOTONICS INC., TAIWAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:HUNG, CHENG-WEI;CHANG, JUI-FU;HUNG, CHIN-HUA;AND OTHERS;REEL/FRAME:039775/0459

Effective date: 20160910

STCF Information on status: patent grant

Free format text: PATENTED CASE

MAFP Maintenance fee payment

Free format text: PAYMENT OF MAINTENANCE FEE, 4TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1551); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

Year of fee payment: 4

AS Assignment

Owner name: NICHIA CORPORATION, JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:GENESIS PHOTONICS INC.;REEL/FRAME:066044/0807

Effective date: 20231123

Owner name: GENESIS PHOTONICS INC., TAIWAN

Free format text: ADDRESS CHANGE REGISTRATION FORM;ASSIGNOR:GENESIS PHOTONICS INC.;REEL/FRAME:066044/0133

Effective date: 20221201