TWI848129B - 用於雷射束輪廓描繪和雷射束特徵化系統的奈米紋理衰減器及其使用方法 - Google Patents

用於雷射束輪廓描繪和雷射束特徵化系統的奈米紋理衰減器及其使用方法 Download PDF

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Publication number
TWI848129B
TWI848129B TW109120986A TW109120986A TWI848129B TW I848129 B TWI848129 B TW I848129B TW 109120986 A TW109120986 A TW 109120986A TW 109120986 A TW109120986 A TW 109120986A TW I848129 B TWI848129 B TW I848129B
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TW
Taiwan
Prior art keywords
nanotexture
attenuator
attenuated
measurement
aperture
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TW109120986A
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English (en)
Chinese (zh)
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TW202112019A (zh
Inventor
凱文 柯克漢
肯尼斯 菲爾
Original Assignee
美商Ｍｋｓ儀器公司
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Application filed by 美商Ｍｋｓ儀器公司 filed Critical 美商Ｍｋｓ儀器公司
Publication of TW202112019A publication Critical patent/TW202112019A/zh
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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0418—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using attenuators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/108—Beam splitting or combining systems for sampling a portion of a beam or combining a small beam in a larger one, e.g. wherein the area ratio or power ratio of the divided beams significantly differs from unity, without spectral selectivity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/281—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for attenuating light intensity, e.g. comprising rotatable polarising elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J2001/0276—Protection
    • G01J2001/0285—Protection against laser damage
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/0014—Monitoring arrangements not otherwise provided for

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lasers (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
TW109120986A 2019-06-22 2020-06-20 用於雷射束輪廓描繪和雷射束特徵化系統的奈米紋理衰減器及其使用方法 TWI848129B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201962865160P 2019-06-22 2019-06-22
US62/865,160 2019-06-22

Publications (2)

Publication Number Publication Date
TW202112019A TW202112019A (zh) 2021-03-16
TWI848129B true TWI848129B (zh) 2024-07-11

Family

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Family Applications (1)

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TW109120986A TWI848129B (zh) 2019-06-22 2020-06-20 用於雷射束輪廓描繪和雷射束特徵化系統的奈米紋理衰減器及其使用方法

Country Status (7)

Country Link
US (2) US20200400965A1 (enExample)
EP (1) EP3987258A4 (enExample)
JP (1) JP7582980B2 (enExample)
KR (1) KR102778184B1 (enExample)
CN (1) CN114008418A (enExample)
TW (1) TWI848129B (enExample)
WO (1) WO2020263667A1 (enExample)

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KR102767094B1 (ko) * 2018-07-20 2025-02-13 오퍼 옵트로닉스 솔루션스 리미티드 다중-영상 레이저 빔 품질 측정의 초점 보정을 위한 방법 및 장치
US11874163B2 (en) 2022-01-14 2024-01-16 Ophir Optronics Solutions, Ltd. Laser measurement apparatus having a removable and replaceable beam dump
WO2024032997A1 (en) * 2022-08-10 2024-02-15 British Telecommunications Public Limited Company An electromagnetic field detector

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US5371655A (en) * 1992-05-22 1994-12-06 Panavision International, L.P. System for varying light intensity such as for use in motion picture photography
US6497490B1 (en) * 1999-12-14 2002-12-24 Silicon Light Machines Laser beam attenuator and method of attenuating a laser beam
CN104238107A (zh) * 2014-07-07 2014-12-24 中国科学院上海光学精密机械研究所 数字化可调光衰减器
US20190061063A1 (en) * 2017-08-25 2019-02-28 Disco Corporation Laser beam profiler unit and laser processing apparatus

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US5329350A (en) * 1992-05-21 1994-07-12 Photon, Inc. Measuring laser beam parameters using non-distorting attenuation and multiple simultaneous samples
JPH0815638A (ja) * 1994-06-29 1996-01-19 Toshiba Corp レーザ光学装置
JP2001174327A (ja) * 1999-12-15 2001-06-29 Anritsu Corp 光検出装置
KR20020030736A (ko) * 2000-01-25 2002-04-25 추후제출 분자 불소 레이저용 에너지 감시 장치
WO2001059414A1 (en) 2000-02-09 2001-08-16 Lambda Physik Ag Vuv laser beam characterization system
US6618403B2 (en) * 2000-03-16 2003-09-09 Lambda Physik Ag Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser
JP2002188957A (ja) * 2000-12-21 2002-07-05 Ando Electric Co Ltd 光パワーセンサ
US7846152B2 (en) * 2004-03-24 2010-12-07 Amo Manufacturing Usa, Llc. Calibrating laser beam position and shape using an image capture device
JP4136739B2 (ja) 2003-03-19 2008-08-20 Ｈｏｙａ株式会社 光スポット検査装置
JP2005214752A (ja) 2004-01-29 2005-08-11 Orc Mfg Co Ltd レーザ光線測定装置
US8999857B2 (en) * 2010-04-02 2015-04-07 The Board Of Trustees Of The Leland Stanford Junior University Method for forming a nano-textured substrate
WO2015011786A1 (ja) * 2013-07-23 2015-01-29 日立マクセル株式会社 ナノ粒子薄膜を有する光学部品、及びこれを用いた光学応用装置
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US5371655A (en) * 1992-05-22 1994-12-06 Panavision International, L.P. System for varying light intensity such as for use in motion picture photography
US6497490B1 (en) * 1999-12-14 2002-12-24 Silicon Light Machines Laser beam attenuator and method of attenuating a laser beam
CN104238107A (zh) * 2014-07-07 2014-12-24 中国科学院上海光学精密机械研究所 数字化可调光衰减器
US20190061063A1 (en) * 2017-08-25 2019-02-28 Disco Corporation Laser beam profiler unit and laser processing apparatus

Also Published As

Publication number Publication date
JP7582980B2 (ja) 2024-11-13
WO2020263667A9 (en) 2021-07-01
KR102778184B1 (ko) 2025-03-11
EP3987258A1 (en) 2022-04-27
KR20220024662A (ko) 2022-03-03
US20200400965A1 (en) 2020-12-24
EP3987258A4 (en) 2023-07-05
US20230296909A1 (en) 2023-09-21
JP2022537450A (ja) 2022-08-25
CN114008418A (zh) 2022-02-01
US12326572B2 (en) 2025-06-10
WO2020263667A1 (en) 2020-12-30
TW202112019A (zh) 2021-03-16

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