WO2020263667A1 - Nano-textured attenuator for use with laser beam profiling and laser beam characterization systems and method of use - Google Patents
Nano-textured attenuator for use with laser beam profiling and laser beam characterization systems and method of use Download PDFInfo
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- WO2020263667A1 WO2020263667A1 PCT/US2020/038389 US2020038389W WO2020263667A1 WO 2020263667 A1 WO2020263667 A1 WO 2020263667A1 US 2020038389 W US2020038389 W US 2020038389W WO 2020263667 A1 WO2020263667 A1 WO 2020263667A1
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- WIPO (PCT)
- Prior art keywords
- textured
- nano
- attenuator
- signal
- beamsplitter
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0418—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using attenuators
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
- G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/108—Beam splitting or combining systems for sampling a portion of a beam or combining a small beam in a larger one, e.g. wherein the area ratio or power ratio of the divided beams significantly differs from unity, without spectral selectivity
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/281—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for attenuating light intensity, e.g. comprising rotatable polarising elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J2001/0276—Protection
- G01J2001/0285—Protection against laser damage
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/0014—Monitoring arrangements not otherwise provided for
Definitions
- Nano-Textured Attenuator for Use with Laser Beam Profiling and Laser
- laser measurement is be used to monitor the performance of laser systems.
- these measurements which include beam profiling, spectral observations, temporal observations, or intensity observations are performed by creating a sample of the intensity map at a plane transverse to the propagation axis of the laser beam.
- characterization has proven useful in monitoring the performance of low power laser systems, a number of shortcomings have been identified when these systems are used to monitor the performance of high power laser systems.
- 2-D matrix sensors such as CCD devices, CMOS devices, pyroelectric devices, and/or InGaAs devices are saturated at fluences several magnitudes less than the fluences of the output signals of the high-power laser systems under test.
- presently available beam profiling systems, high laser power measurement systems, and similar laser power measurement systems utilize one or more thin-film coated attenuators to reduce output signal fluence.
- the power densities of many high- power laser system output signals exceed the damage threshold of thin-film reflective coatings used in making thin-film coated attenuators. As such, the performance of thin-film coated attenuators tends to degrade thereby permitting potentially damaging fluence to be incident
- the present application discloses various embodiments of a nano-textured attenuator for use with a variety of laser beam profiling systems, laser power measurement systems, and various other systems configured to measure or otherwise characterize laser output signals or beams.
- the nano-textured attenuators disclosed herein are well-suited for use with laser outputs in excess of about 200 W to 5000 W (i.e. high power) or more, although those skilled in the art will appreciate that the various embodiments of the nano-textured attenuator disclosed herein may be used at any variety of laser powers.
- the nano-textured attenuator includes a body defining in in the aperture, a measurement aperture, at least one beam dump aperture.
- At least one coupling fixture may be formed on or positioned on the body. In one embodiment, the coupling fixture is positioned proximate to the measurement aperture.
- a first nano-textured beamsplitter is positioned within the body. During use, the first nano-textured beamsplitter is configured to transmit 85% to 99.9999% of an input signal therethrough while reflecting 0.0001% to form at least one partially attenuated signal.
- At least a second nano-textured beamsplitter is positioned within the body.
- the second nano-textured beamsplitter is configured to transmit 85% to 99.9999% of an input signal therethrough while reflecting 0.0001% to form at least one attenuated measurement signal.
- At least one camera communication with the measurement aperture be configured to measure at least one optical characteristic of the attenuated measurement signal.
- the nano-textured attenuator includes a body defining in in the aperture, a measurement aperture, at least one beam dump aperture.
- At least one coupling fixture may be formed on or positioned on the body. In one embodiment, the coupling fixture is positioned proximate to the measurement aperture.
- a nano-textured beamsplitter is positioned within the body. During use, the nano-textured beamsplitter is configured to transmit 85% to 99.9999% of an input signal therethrough while reflecting 0.0001% to form at least one partially attenuated signal.
- a at least one nano-textured optical component is positioned within the body. During use, the nano-textured optical component is configured to transmit 85% to 99.9999% of the partially attenuated signal therethrough while reflecting 0.0001% to form at least one attenuated measurement signal.
- communication with the measurement aperture be configured to measure at least one optical characteristic of the attenuated measurement signal.
- the present application discloses a nano-textured attenuator which includes a body defining in in the aperture, a measurement aperture, at least one beam dump aperture. At least one coupling fixture may be formed on or positioned on the body. In one embodiment, the coupling fixture is positioned proximate to the measurement aperture. A first nano-textured beamsplitter is positioned within the body. During use, the first nano-textured beamsplitter is configured to transmit 85% to 99.9999% of an input signal therethrough while reflecting 0.0001% to form at least one partially attenuated signal. At least a second nano-textured beamsplitter is positioned within the body.
- the second nano-textured beamsplitter is configured to transmit 85% to 99.9999% of an input signal therethrough while reflecting 0.0001% to form at least one attenuated measurement signal.
- At least one attenuator/filter body having at least filter coupled thereto may be selectively positionable within the optical beam path of the attenuated measurement signal.
- at least one camera communication with the measurement aperture be configured to measure at least one optical characteristic of the attenuated measurement signal
- the present application also discloses a method of measuring high laser power optical signal which includes directing at least one input laser signal to a first nano-textured beamsplitter. A portion of the input laser signal is reflected with the first nano-textured beamsplitter to form at least one partially attenuated signal. The partially attenuated signal has 0.0001% to 15% of the power of the laser input signal while transmitting 85% to 99.9999% of the laser input signal through the first nano-textured beamsplitter. Thereafter, a portion of the partially attenuated signal from the first nano-textured beamsplitter is reflected by at least a second nano-textured beamsplitter to form at least one attenuated measurement signal.
- the attenuated measurement signal has 0.0001% to 15% of the power of the partially attenuated signal while transmitting 85% to 99.9999% of the laser input signal through the second nano- textured beamsplitter. Finally, at least one optical characteristic of the attenuated
- measurement signal may be measured with at least one sensor system.
- Attenuator/filter body between at least one of the first nano-textured beamsplitter, the second nano-textured beamsplitter, and the at least one sensor system.
- Figure 1 shows an elevated perspective view of an embodiment of a nano-textured attenuator for with laser beam profiling and laser beam characterization systems
- Figure 2 shows alternate elevated perspective view of an embodiment of the nano- textured attenuator for use with laser beam profiling and laser beam characterization systems
- Figure 3 shows a planar side view of an embodiment of a nano-textured attenuator having a camera system coupled thereto for use with laser beam profiling and laser beam characterization systems;
- Figure 4 shows an elevated perspective view of an embodiment of a nano-textured attenuator having a camera system coupled thereto for use with laser beam profiling and laser beam characterization systems;
- Figure 5 shows a schematic diagram of the internal components of an embodiment of a nano-textured attenuator for use with laser beam profiling and laser beam characterization systems; and [0018] Figure 6 shows a schematic diagram of the internal components of another embodiment of a nano-textured attenuator for use with laser beam profiling and laser beam characterization systems.
- the present application discloses various embodiments of a nano-textured attenuator for use with a variety of laser beam profiling systems, laser power measurement systems, and various other systems configured to measure or otherwise characterize laser output signals or beams.
- the nano-textured attenuator disclosed herein is well-suited for use with laser outputs in excess of about 200 W to 5000 W (i.e. high power) or more, although those skilled in the art will appreciate that the various embodiments of the nano-textured attenuator disclosed herein may be used at any variety of laser powers.
- Figures 1-4 show various views of an embodiment of a nano-textured attenuator for use with laser beam profiling systems, laser measurements systems, and similar laser beam characterization systems.
- the nano-textured attenuator 10 includes a body 12 having at least one input aperture 14 formed therein.
- a single input aperture 14 is formed in the body 12, although those skilled in the art will appreciate that any number of input apertures 14 may be formed on the body 12.
- the input aperture 14 may be formed on any surface of the body 12.
- the input aperture 14 may be formed having any variety of transverse dimensions, shapes, or configurations.
- the input aperture 14 may include one or more windows or protective elements enclosing the input aperture 14.
- input aperture 14 not include one or more protective windows.
- At least one coupling fixture 16 may be formed on or couple to the body 12.
- the coupling fixture 16 defines at least one profiling and/or measurement aperture or characterization aperture 18 (hereinafter measurement aperture 18) therein.
- the measurement aperture 18 may or may not include at least one protective window.
- the coupling fixture 16 may include at least one coupling member or feature 20 thereby permitting one or more cameras, sensors, characterization systems, or similar devices to be coupled to the body 12 of the nano-textured attenuator 10.
- the coupling member 20 comprises one or more thread features permitting one or more cameras, sensors, characterization systems, or similar devices to be selectively coupled to and/or detached from the body 12 of the nano-textured attenuator 10 and threaded relation.
- any variety of coupling members 20 or similar coupling features may be used to selectively couple and/or detach one or more cameras, sensors, characterization systems, or similar devices to the body 12 of the nano-textured attenuator 10 disclosed herein.
- the coupling member 20 may be configured to couple one or more fiber-optic devices or other systems to the body 12.
- the coupling feature 16 may be configured to have one or more cameras, sensors, characterization systems, or similar devices non-detachably coupled to the body 12.
- at least one camera, sensor, characterization system, or similar device may be integrally formed on or within the body 12 of the nano-textured attenuator 10.
- the coupling fixture 16 need not include a coupling member 20.
- the nano-textured attenuator 10 may include one or more attenuator or filter bodies configured to be selectively inserted into and withdrawn from at least one beam path formed within the body 12. As shown, the attenuator filter bodies may be positioned between the input aperture 14 and the measurement aperture 18. In the illustrated embodiment, a first attenuator/filter body 22 and a second attenuator/filter body 26 may be selectively inserted into withdrawn from the body 12. Those skilled in the art will appreciate the any number of attenuator/filter bodies may be used in the embodiments of the nano-textured attenuator 10 disclosed herein.
- the first attenuator/filter body 22 includes at least a first filter receiver 24 form thereon and configured to receive and retain at least a first filter or optical component therein.
- at least a second filter receiver 28 may be formed in or coupled to the second attenuator/filter body 26.
- the second filter receiver 28 may be configured to receive and retain at least one filter or optical component therein.
- the first filter receiver 24 and/or the second filter receiver 20 may be configured to receive and retain at least one attenuator, optical component, filter, polarizer, wave plate, diffuser, or similar device therein.
- at least one of the first filter 24 and the second filter 28 may comprise at least one thin film coated optical filter therein.
- the first attenuator/filter body 22 and/or the second attenuator/filter body 26 may be selectively inserted into or withdrawn from at least one optical pathway formed within the body 12. As such, filters or optical components retained by the first attenuator/filter body 22 and/or the second attenuator/filter body 26 may be inserted into withdrawn from at least one optical pathway formed within the body 12. In the illustrated embodiment, the first attenuator/filter body 22 and the second attenuator/filter body 26 may be manually actuated.
- At least one of the first attenuator/filter body 22 and the second attenuator/filter body 26 may include one or more mechanical actuators permitting autonomous insertion and withdrawal of at least one of the first attenuator/filter body 22 and the second attenuator/filter body 26 from the body 12.
- one or more beam dump passages or apertures may be formed on the body 12.
- a first beam dump aperture 30 may be formed on the body 12, while Figure 3b shows a second beam dump aperture 32 formed on the body 12.
- the nano-textured attenuator 10 includes a first beam dump aperture 30 and at least a second beam dump aperture 32 formed on the body 12.
- the first beam dump aperture 30 and the second beam dump aperture 32 may be configured to permit at least one output beam to be transmitted or emitted therefrom.
- the first beam dump aperture 30 may be configured to be positioned proximate to at least one beam dump (not shown).
- the second beam dump aperture 32 may likewise be configured to be positioned proximate to at least a second beam dump (not shown).
- at least one of the first beam dump aperture BO and the second beam dump aperture 32 may be configured to transmit or otherwise emit at least one output beam from the body 12.
- the nano-textured attenuator 10 may be configured to be coupled to and/or be positioned proximate to at least one camera, sensor, characterization system, or similar device.
- Figures 3a, 3b, and 4 show various views of an embodiment of a nano-textured attenuator 10 having one or more cameras, sensors, characterization systems, or similar devices 40 coupled thereto.
- the camera 40 includes a first camera body 42 and a second camera body 44.
- At least one camera coupling device or system 46 may be coupled to or formed on at least one of the first camera body 42 in the second camera body 44.
- the camera coupling device 46 may be configured to selectively engage and be retained by the coupling member 20 formed on the coupling fixture 16 of the body 12 (see Figure 1).
- the camera coupling device 46 may be configured to selectively engage in coupled to a portion of the body 12 such that at least a portion of the camera 40 is in communication with the measurement aperture 18 formed in the body 12.
- the camera 40 need not be detachable from the body 12.
- the camera 40 includes at least one output and/or data coupler 48, thereby permitting measurement or characterization data recorded by the camera 40 to be provided to at least one external processor (not shown).
- any variety of camera systems or devices may be used with a couple to the body 12 of the nano- textured attenuator 10.
- Exemplary camera systems or devices include, without limitation, 2-D matrix sensors, CCD devices, CMOS devices, InGaAs devices, polarization sensor or measuring devices, spectral or temporal measurement devices, power meters, and the like.
- Figure 5 shows the internal components of an embodiment of a nano-textured attenuator.
- a first nano-textured beamsplitter or prism 50 and at least a second nano-textured beamsplitter 52 may be positioned within the body 12, although those skilled in the art will appreciate that any number of nano-textured beamsplitters, prisms, or alternate nano-textured optical elements may be positioned within the body 12.
- at least one of the first nano-textured beamsplitter 50 and the second nano- textured beamsplitter 52 may be positioned on at least one selectively adjustable optical mount.
- the position and/or orientation of at least one of the first nano-textured beamsplitter 50 and/or the second nano-textured beamsplitter 52 may be selectively adjusted by a user.
- at least one of the first nano-textured beamsplitter 50 and the second nano-textured beamsplitter 52 may be positioned on fixed optical mounts such that the position and/or orientation of the first nano-textured beamsplitter 50 and/or the second nano- textured beamsplitter 52 is fixed.
- an input beam 70 may be directed into the body 12 of the nano-textured attenuator 10 via the input aperture 14.
- the input beam 70 may be incident on a portion of the first nano-textured beamsplitter 50 positioned within the body 12.
- a portion of the input beam 70 may be reflected or otherwise or otherwise directed by the first nano-textured beamsplitter 50 to form a partially attenuated beam 74 which is directed within the body 12.
- At least one of the first and second nano- textured beamsplitters 50, 52 are manufactured from CorningTM 7980 Grade OF UV fused silica having undergone one or more nano-texturing processes, although those skilled in the art will appreciate that any variety of substrates may be used to form the of the first and second nano- textured beamsplitters 50, 52.
- one or more thin film coatings may also be applied to at least one of the first and second nano-textured beamsplitters 50, 52. Exemplary thin film coatings include AR coatings and the like.
- a portion of the input beam 70 is transmitted through the first nano-textured beamsplitter 50 to form a first output beam 72.
- the first output beam 72 may be emitted from the body 12 via the first beam dump aperture 30.
- the first nano-textured beamsplitter 50 is configured to transmit approximately 95% to about 99.9999% the power and/or fluence of the input beam 70 there through.
- the first output beam 72 encompasses approximately 95% to about 99.9999% the power and/or fluence of the input beam 70, which may be directed to one or more external beam dumps (not shown).
- the partially attenuated beam 74 traversing through the body 12 encompasses approximately 5% to about 0.1% or less of the power and/or fluence of the input beam 70.
- the second nano-textured beamsplitter 52 is configured to transmit approximately 95% to about 99.9999% the power and/or fluence of an incident optical signal there through. As such, approximately 95% to about 99.9999% the power and/or fluence of the partially attenuated beam 74 incident on the second nano- textured beamsplitter 52 is transmitted there through to form a second output beam 76.
- the second output beam 76 is directed through the second beam dump aperture 32 two one or more external beam dumps (not shown).
- approximately 5% to about point one percent 0.1 or less of the power and/or fluence of the partially attenuated beam 74 may be directed by the second nano-textured beamsplitter 52 to form at least one attenuated measurement beam 78 directed to the camera/sensor 40 coupled to the body 12.
- the attenuated measurement beam 78 encompasses approximately .25% to about 0.001 % or less of the power and/or fluence of the input beam 70.
- the attenuated measurement beam 78 encompasses approximately .000001% or less of the power and/or fluence of the input beam 70.
- the transmission characteristics of the first nano-textured beamsplitter 50 and second nano- textured beamsplitter 52 may range from about 85% to about 99.99999% transmission of an incident optical signal.
- optical signal reflected by at least one of the first nano- textured beamsplitter 50 and the second nano-textured beamsplitter 52 may contain about 15% to about .00001% or less of the power and/or fluence of an incident optical signal.
- the attenuated measurement beam 78 may be directed to the camera/sensor 40 coupled to the body 12.
- the attenuated measurement beam 78 may traverse through at least one of the first attenuator/filter body 22 in/or the second attenuator/filter body 26 to further attenuate or otherwise filter the attenuated measurement beam 78.
- the nano-textured attenuator 10 may include a single nano-textured beamsplitter, prism, or optical element within the body 12.
- Figure 6 shows an alternate embodiment of a nano-textured attenuator 10 having a single nano-textured beamsplitter 50 within the body 12.
- the first nano-textured beamsplitter 50 is configured to transmit approximately 95% to about 99.9999% the power and/or fluence of the input beam 70 there through.
- the first output beam 72 encompasses approximately 95% to about 99.9999% the power and/or fluence of the input beam 70, which may be directed to one or more external beam dumps (not shown).
- the partially attenuated beam 74 traversing through the body 12 encompasses approximately 5% to about 0.1% or less of the power and/or fluence of the input beam 70.
- the optical component 54 comprises one or more lenses, beamsplitters, wave plates, polarizers, and the like. Further, the optical component 54 may include one or more optical coatings 56 applied thereto. Exemplary optical coatings 56 include, without limitation, anti-reflection (AR) coatings, thin-film coatings, and the like. Optionally, the optical component 54 may comprise a nano-textured substrate, a grating, or a similar optical component.
- AR anti-reflection
- the optical component 54 may comprise a nano-textured substrate, a grating, or a similar optical component.
- the optical component 54 may be configured to transmit approximately 95% to about ninety-nine point nine percent 99.9999% the power and/or fluence of an incident optical signal there through. As such, approximately 95% to about 99.9999% the power and/or fluence of the partially attenuated beam 74 incident on the optical component 54 is transmitted there through to form a second output beam 76. In one embodiment, the second output beam 76 is directed through the second beam dump aperture 32 two one or more external beam dumps (not shown). Further, approximately 5% to about 0.1% or less of the power and/or fluence of the partially attenuated beam 74 may be directed by the optical component 54 to form an attenuated profiling/measurement beam 78 which may be directed to the camera/sensor 40 coupled to the body 12. In one embodiment, the attenuated measurement beam 78
- the transmission characteristics of the first nano-textured beamsplitter 50 and the optical component 54 may range from about 85% to about 99.99999% transmission of an incident optical signal. As such, and optical signal reflected by at least one of the first nano-textured beamsplitter 50 and the optical 54 may contain about 15% to about .00001% or less of the power and/or fluence of an incident optical signal.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Optical Elements Other Than Lenses (AREA)
- Lasers (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021576284A JP7582980B2 (ja) | 2019-06-22 | 2020-06-18 | レーザビームプロファイリング及びレーザビーム特性評価システムとともに使用されるナノテクスチャ減衰器及びその使用方法 |
| CN202080043679.6A CN114008418A (zh) | 2019-06-22 | 2020-06-18 | 用于激光束轮廓描绘和激光束特征化系统的纳米纹理衰减器及其使用方法 |
| KR1020227001705A KR102778184B1 (ko) | 2019-06-22 | 2020-06-18 | 레이저 빔 프로파일링과 사용하기 위한 나노-텍스처 감쇠기 및 레이저 빔 특성화 시스템 및 사용 방법 |
| EP20831625.7A EP3987258A4 (en) | 2019-06-22 | 2020-06-18 | NANOTEXTURED ATTENUATOR FOR USE WITH LASER BEAM PROFILING AND CHARACTERIZATION SYSTEMS, AND METHOD OF USE |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962865160P | 2019-06-22 | 2019-06-22 | |
| US62/865,160 | 2019-06-22 |
Publications (2)
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| WO2020263667A1 true WO2020263667A1 (en) | 2020-12-30 |
| WO2020263667A9 WO2020263667A9 (en) | 2021-07-01 |
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| PCT/US2020/038389 Ceased WO2020263667A1 (en) | 2019-06-22 | 2020-06-18 | Nano-textured attenuator for use with laser beam profiling and laser beam characterization systems and method of use |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US20200400965A1 (enExample) |
| EP (1) | EP3987258A4 (enExample) |
| JP (1) | JP7582980B2 (enExample) |
| KR (1) | KR102778184B1 (enExample) |
| CN (1) | CN114008418A (enExample) |
| TW (1) | TWI848129B (enExample) |
| WO (1) | WO2020263667A1 (enExample) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| KR102767094B1 (ko) * | 2018-07-20 | 2025-02-13 | 오퍼 옵트로닉스 솔루션스 리미티드 | 다중-영상 레이저 빔 품질 측정의 초점 보정을 위한 방법 및 장치 |
| US11874163B2 (en) | 2022-01-14 | 2024-01-16 | Ophir Optronics Solutions, Ltd. | Laser measurement apparatus having a removable and replaceable beam dump |
| WO2024032997A1 (en) * | 2022-08-10 | 2024-02-15 | British Telecommunications Public Limited Company | An electromagnetic field detector |
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| US6497490B1 (en) * | 1999-12-14 | 2002-12-24 | Silicon Light Machines | Laser beam attenuator and method of attenuating a laser beam |
| CN104238107A (zh) * | 2014-07-07 | 2014-12-24 | 中国科学院上海光学精密机械研究所 | 数字化可调光衰减器 |
| US20190061063A1 (en) | 2017-08-25 | 2019-02-28 | Disco Corporation | Laser beam profiler unit and laser processing apparatus |
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| JP2001174327A (ja) * | 1999-12-15 | 2001-06-29 | Anritsu Corp | 光検出装置 |
| WO2001059414A1 (en) | 2000-02-09 | 2001-08-16 | Lambda Physik Ag | Vuv laser beam characterization system |
| US6618403B2 (en) * | 2000-03-16 | 2003-09-09 | Lambda Physik Ag | Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser |
| JP2002188957A (ja) * | 2000-12-21 | 2002-07-05 | Ando Electric Co Ltd | 光パワーセンサ |
| US7846152B2 (en) * | 2004-03-24 | 2010-12-07 | Amo Manufacturing Usa, Llc. | Calibrating laser beam position and shape using an image capture device |
| JP4136739B2 (ja) | 2003-03-19 | 2008-08-20 | Hoya株式会社 | 光スポット検査装置 |
| JP2005214752A (ja) | 2004-01-29 | 2005-08-11 | Orc Mfg Co Ltd | レーザ光線測定装置 |
| US8999857B2 (en) * | 2010-04-02 | 2015-04-07 | The Board Of Trustees Of The Leland Stanford Junior University | Method for forming a nano-textured substrate |
| WO2015011786A1 (ja) * | 2013-07-23 | 2015-01-29 | 日立マクセル株式会社 | ナノ粒子薄膜を有する光学部品、及びこれを用いた光学応用装置 |
| JP6903994B2 (ja) * | 2016-03-29 | 2021-07-14 | リコーイメージング株式会社 | 光学素子及びその製造方法 |
| US10423047B2 (en) * | 2016-07-27 | 2019-09-24 | Coherent, Inc. | Laser machining method and apparatus |
| WO2018237048A1 (en) * | 2017-06-20 | 2018-12-27 | Ipg Photonics Corporation | High power integrated delivery cable |
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- 2020-06-18 KR KR1020227001705A patent/KR102778184B1/ko active Active
- 2020-06-18 CN CN202080043679.6A patent/CN114008418A/zh active Pending
- 2020-06-18 EP EP20831625.7A patent/EP3987258A4/en not_active Withdrawn
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| JPH0815638A (ja) * | 1994-06-29 | 1996-01-19 | Toshiba Corp | レーザ光学装置 |
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| US20010028664A1 (en) | 2000-01-25 | 2001-10-11 | Klaus Vogler | Energy monitor for molecular fluorine laser |
| CN104238107A (zh) * | 2014-07-07 | 2014-12-24 | 中国科学院上海光学精密机械研究所 | 数字化可调光衰减器 |
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Also Published As
| Publication number | Publication date |
|---|---|
| JP7582980B2 (ja) | 2024-11-13 |
| WO2020263667A9 (en) | 2021-07-01 |
| KR102778184B1 (ko) | 2025-03-11 |
| EP3987258A1 (en) | 2022-04-27 |
| KR20220024662A (ko) | 2022-03-03 |
| US20200400965A1 (en) | 2020-12-24 |
| EP3987258A4 (en) | 2023-07-05 |
| US20230296909A1 (en) | 2023-09-21 |
| TWI848129B (zh) | 2024-07-11 |
| JP2022537450A (ja) | 2022-08-25 |
| CN114008418A (zh) | 2022-02-01 |
| US12326572B2 (en) | 2025-06-10 |
| TW202112019A (zh) | 2021-03-16 |
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