CN114008418A - 用于激光束轮廓描绘和激光束特征化系统的纳米纹理衰减器及其使用方法 - Google Patents

用于激光束轮廓描绘和激光束特征化系统的纳米纹理衰减器及其使用方法 Download PDF

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Publication number
CN114008418A
CN114008418A CN202080043679.6A CN202080043679A CN114008418A CN 114008418 A CN114008418 A CN 114008418A CN 202080043679 A CN202080043679 A CN 202080043679A CN 114008418 A CN114008418 A CN 114008418A
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CN
China
Prior art keywords
attenuator
nanotexture
signal
aperture
beam splitter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202080043679.6A
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English (en)
Chinese (zh)
Inventor
凯文·柯克汉
肯尼斯·菲尔
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Aofeier Optoelectronic Application Co ltd
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Alpha Spiricon
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Publication date
Application filed by Alpha Spiricon filed Critical Alpha Spiricon
Publication of CN114008418A publication Critical patent/CN114008418A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0418—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using attenuators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/108—Beam splitting or combining systems for sampling a portion of a beam or combining a small beam in a larger one, e.g. wherein the area ratio or power ratio of the divided beams significantly differs from unity, without spectral selectivity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/281—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for attenuating light intensity, e.g. comprising rotatable polarising elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J2001/0276—Protection
    • G01J2001/0285—Protection against laser damage
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/0014—Monitoring arrangements not otherwise provided for

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lasers (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
CN202080043679.6A 2019-06-22 2020-06-18 用于激光束轮廓描绘和激光束特征化系统的纳米纹理衰减器及其使用方法 Pending CN114008418A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962865160P 2019-06-22 2019-06-22
US62/865,160 2019-06-22
PCT/US2020/038389 WO2020263667A1 (en) 2019-06-22 2020-06-18 Nano-textured attenuator for use with laser beam profiling and laser beam characterization systems and method of use

Publications (1)

Publication Number Publication Date
CN114008418A true CN114008418A (zh) 2022-02-01

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CN202080043679.6A Pending CN114008418A (zh) 2019-06-22 2020-06-18 用于激光束轮廓描绘和激光束特征化系统的纳米纹理衰减器及其使用方法

Country Status (7)

Country Link
US (2) US20200400965A1 (enExample)
EP (1) EP3987258A4 (enExample)
JP (1) JP7582980B2 (enExample)
KR (1) KR102778184B1 (enExample)
CN (1) CN114008418A (enExample)
TW (1) TWI848129B (enExample)
WO (1) WO2020263667A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112334744A (zh) * 2018-07-20 2021-02-05 奥菲尔-斯皮里康公司 用于多图像激光束质量测量的聚焦校正的方法和设备

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11874163B2 (en) 2022-01-14 2024-01-16 Ophir Optronics Solutions, Ltd. Laser measurement apparatus having a removable and replaceable beam dump
WO2024032997A1 (en) * 2022-08-10 2024-02-15 British Telecommunications Public Limited Company An electromagnetic field detector

Citations (6)

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US5329350A (en) * 1992-05-21 1994-07-12 Photon, Inc. Measuring laser beam parameters using non-distorting attenuation and multiple simultaneous samples
US20010028664A1 (en) * 2000-01-25 2001-10-11 Klaus Vogler Energy monitor for molecular fluorine laser
US6497490B1 (en) * 1999-12-14 2002-12-24 Silicon Light Machines Laser beam attenuator and method of attenuating a laser beam
WO2015011786A1 (ja) * 2013-07-23 2015-01-29 日立マクセル株式会社 ナノ粒子薄膜を有する光学部品、及びこれを用いた光学応用装置
WO2018237048A1 (en) * 2017-06-20 2018-12-27 Ipg Photonics Corporation High power integrated delivery cable
CN109454324A (zh) * 2017-08-25 2019-03-12 株式会社迪思科 激光光束分析仪单元和激光加工装置

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US5371655A (en) * 1992-05-22 1994-12-06 Panavision International, L.P. System for varying light intensity such as for use in motion picture photography
JPH0815638A (ja) * 1994-06-29 1996-01-19 Toshiba Corp レーザ光学装置
JP2001174327A (ja) * 1999-12-15 2001-06-29 Anritsu Corp 光検出装置
WO2001059414A1 (en) 2000-02-09 2001-08-16 Lambda Physik Ag Vuv laser beam characterization system
US6618403B2 (en) * 2000-03-16 2003-09-09 Lambda Physik Ag Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser
JP2002188957A (ja) * 2000-12-21 2002-07-05 Ando Electric Co Ltd 光パワーセンサ
US7846152B2 (en) * 2004-03-24 2010-12-07 Amo Manufacturing Usa, Llc. Calibrating laser beam position and shape using an image capture device
JP4136739B2 (ja) 2003-03-19 2008-08-20 Ｈｏｙａ株式会社 光スポット検査装置
JP2005214752A (ja) 2004-01-29 2005-08-11 Orc Mfg Co Ltd レーザ光線測定装置
US8999857B2 (en) * 2010-04-02 2015-04-07 The Board Of Trustees Of The Leland Stanford Junior University Method for forming a nano-textured substrate
CN104238107A (zh) * 2014-07-07 2014-12-24 中国科学院上海光学精密机械研究所 数字化可调光衰减器
JP6903994B2 (ja) * 2016-03-29 2021-07-14 リコーイメージング株式会社 光学素子及びその製造方法
US10423047B2 (en) * 2016-07-27 2019-09-24 Coherent, Inc. Laser machining method and apparatus

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5329350A (en) * 1992-05-21 1994-07-12 Photon, Inc. Measuring laser beam parameters using non-distorting attenuation and multiple simultaneous samples
US6497490B1 (en) * 1999-12-14 2002-12-24 Silicon Light Machines Laser beam attenuator and method of attenuating a laser beam
US20010028664A1 (en) * 2000-01-25 2001-10-11 Klaus Vogler Energy monitor for molecular fluorine laser
WO2015011786A1 (ja) * 2013-07-23 2015-01-29 日立マクセル株式会社 ナノ粒子薄膜を有する光学部品、及びこれを用いた光学応用装置
WO2018237048A1 (en) * 2017-06-20 2018-12-27 Ipg Photonics Corporation High power integrated delivery cable
CN109454324A (zh) * 2017-08-25 2019-03-12 株式会社迪思科 激光光束分析仪单元和激光加工装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112334744A (zh) * 2018-07-20 2021-02-05 奥菲尔-斯皮里康公司 用于多图像激光束质量测量的聚焦校正的方法和设备
US11965775B2 (en) 2018-07-20 2024-04-23 Ophir Optronics Solutions, Ltd. Method and apparatus for focus correction of multi-image laser beam quality measurements
CN112334744B (zh) * 2018-07-20 2024-09-13 奥菲尔-斯皮里康公司 用于多图像激光束质量测量的聚焦校正的方法和设备

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Publication number Publication date
JP7582980B2 (ja) 2024-11-13
WO2020263667A9 (en) 2021-07-01
KR102778184B1 (ko) 2025-03-11
EP3987258A1 (en) 2022-04-27
KR20220024662A (ko) 2022-03-03
US20200400965A1 (en) 2020-12-24
EP3987258A4 (en) 2023-07-05
US20230296909A1 (en) 2023-09-21
TWI848129B (zh) 2024-07-11
JP2022537450A (ja) 2022-08-25
US12326572B2 (en) 2025-06-10
WO2020263667A1 (en) 2020-12-30
TW202112019A (zh) 2021-03-16

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Effective date of registration: 20241118

Address after: Israel Jerusalem

Applicant after: Aofeier Optoelectronic Application Co.,Ltd.

Country or region after: Israel

Address before: Utah, USA

Applicant before: Alpha spiricon

Country or region before: U.S.A.

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Application publication date: 20220201