US20230296909A1 - Nano-Textured Attenuator for Use with Laser Beam Profiling and Laser Beam Characterization Systems and Method of Use - Google Patents
Nano-Textured Attenuator for Use with Laser Beam Profiling and Laser Beam Characterization Systems and Method of Use Download PDFInfo
- Publication number
- US20230296909A1 US20230296909A1 US18/132,411 US202318132411A US2023296909A1 US 20230296909 A1 US20230296909 A1 US 20230296909A1 US 202318132411 A US202318132411 A US 202318132411A US 2023296909 A1 US2023296909 A1 US 2023296909A1
- Authority
- US
- United States
- Prior art keywords
- nano
- textured
- attenuator
- attenuated
- beamsplitter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012512 characterization method Methods 0.000 title claims description 25
- 238000000034 method Methods 0.000 title claims description 6
- 230000002238 attenuated effect Effects 0.000 claims abstract description 77
- 238000005259 measurement Methods 0.000 claims abstract description 73
- 230000003287 optical effect Effects 0.000 claims abstract description 52
- 230000008878 coupling Effects 0.000 claims abstract description 26
- 238000010168 coupling process Methods 0.000 claims abstract description 26
- 238000005859 coupling reaction Methods 0.000 claims abstract description 26
- 230000001681 protective effect Effects 0.000 claims description 7
- 238000004891 communication Methods 0.000 abstract description 4
- 239000010409 thin film Substances 0.000 description 8
- 230000005855 radiation Effects 0.000 description 7
- 238000000576 coating method Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 238000009501 film coating Methods 0.000 description 3
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000037361 pathway Effects 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000002123 temporal effect Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/281—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for attenuating light intensity, e.g. comprising rotatable polarising elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/108—Beam splitting or combining systems for sampling a portion of a beam or combining a small beam in a larger one, e.g. wherein the area ratio or power ratio of the divided beams significantly differs from unity, without spectral selectivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0418—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using attenuators
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
- G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J2001/0276—Protection
- G01J2001/0285—Protection against laser damage
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/0014—Monitoring arrangements not otherwise provided for
Definitions
- laser systems offering high output powers from about 500 W to 5000 W or more are being implemented in various fields.
- laser measurement systems are used to monitor the performance of such laser systems.
- these measurements which include beam profiling, spectral observations, temporal observations, or intensity observations are performed by creating a sample of the intensity map at a plane transverse to the propagation axis of the laser beam.
- laser output measurements including beam profiling and laser beam characterization has proven useful in monitoring the performance of low-power laser systems
- a number of shortcomings have been identified when these systems are used to monitor the performance of high power laser systems.
- 2-D matrix sensors such as CCD devices, CMOS devices, pyroelectric devices, and/or InGaAs devices are saturated at fluences several magnitudes less than the fluences of the output beams of the high-power laser systems under test.
- presently available beam profiling systems, high laser power measurement systems, and similar laser power measurement systems utilize one or more thin-film coated attenuators to reduce output beam fluence.
- the present application discloses various embodiments of a nano-textured attenuator for use with a variety of laser beam profiling systems, laser power measurement systems, and various other systems configured to measure or otherwise characterize laser output signals or beams.
- the nanotextured attenuators disclosed herein are well suited for use with laser outputs in excess of about 200 W to 5000 W (i.e. high power) or more, although those skilled in the art will appreciate that the various embodiments of the nano-textured attenuator disclosed herein may be used at any variety of laser powers.
- the nano-textured attenuator includes a body defining an input aperture, a measurement aperture, and at least one beam dump aperture. At least one coupling fixture may be formed on or positioned on the body. In one embodiment, the coupling fixture is positioned proximate to the measurement aperture.
- a first nano-textured beamsplitter is positioned within the body. During use, the first nano-textured beamsplitter is configured to transmit 85% to 99.9999% of an input beam therethrough while reflecting 0.0001% to form at least one partially attenuated beam. At least a second nano-textured beamsplitter is positioned within the body.
- the second nano-textured beamsplitter is configured to transmit 85% to 99.9999% of the partially attenuated beam therethrough while reflecting 0.0001 % of the partially attenuated beam to form at least one attenuated measurement beam.
- At least one camera in communication with the measurement aperture is configured to measure at least one optical characteristic of the attenuated measurement beam.
- the nano-textured attenuator of claim 1 may further comprise at least one selectively movable mount configured to adjustably support at least one of the first nano-textured beamsplitter and the second nano-textured beamsplitter.
- a protective window may be installed in at least one of the at least one input aperture, the at least one measurement aperture, and the at least one first beam dump aperture.
- the 85% to 99.9999% of the at least one partially attenuated beam may form a second output beam directed through at least one second beam dump aperture.
- a power of the attenuated measurement beam is approximately 0.0001 % of a power of the input beam.
- a power of the attenuated measurement beam is approximately 0.00001% of a power of the input beam.
- a power of the attenuated measurement beam is approximately 0.000001% of a power of the input beam.
- a power of the attenuated measurement beam is approximately 0.0000001% of a power of the input beam.
- the nano-textured attenuator includes a body defining an input aperture, a measurement aperture, and at least one beam dump aperture. At least one coupling fixture may be formed on or positioned on the body. In one embodiment, the coupling fixture is positioned proximate to the measurement aperture. A nano-textured beamsplitter is positioned within the body. During use, the nano-textured beamsplitter is configured to transmit 85% to 99.9999% of an input beam therethrough while reflecting 0.0001% to form at least one partially attenuated beam. At least one nano-textured optical component is positioned within the body.
- the nano-textured optical component is configured to transmit 85% to 99.9999% of the partially attenuated beam therethrough while reflecting 0.0001 % to form at least one attenuated measurement beam.
- At least one camera in communication with the measurement aperture be configured to measure at least one optical characteristic of the attenuated measurement beam.
- the nano-textured attenuator of claim 1 may further comprise at least one selectively movable mount configured to adjustably support at least one of the first nano-textured beamsplitter and the nano-textured optical component.
- a protective window may be installed in at least one of the at least one input aperture, the at least one measurement aperture, and the at least one first beam dump aperture.
- the 85% to 99.9999% of the at least one partially attenuated beam may form a second output beam directed through at least one second beam dump aperture.
- a power of the attenuated measurement beam is approximately 0.0001% of a power of the input beam.
- a power of the attenuated measurement beam is approximately 0.00001% of a power of the input beam.
- a power of the attenuated measurement beam is approximately 0.000001% of a power of the input beam.
- a power of the attenuated measurement beam is approximately 0.0000001% of a power of the input beam.
- the present application also discloses a method of measuring high laser power optical signal which includes directing at least one input beam to a first nanotextured beamsplitter. A portion of the input beam is reflected with the first nanotextured beamsplitter to form at least one partially attenuated beam. The partially attenuated beam has 0.0001% to 15% of the power of the input beam while transmitting 85% to 99.9999% of the input beam through the first nano-textured beamsplitter. Thereafter, a portion of the partially attenuated beam from the first nano-textured beamsplitter is reflected by at least a second nano-textured beamsplitter to form at least one attenuated measurement beam.
- the attenuated measurement beam has 0.0001% to 15% of the power of the partially attenuated beam while transmitting 85% to 99.9999% of the partially attenuated beam through the second nano-textured beamsplitter.
- at least one optical characteristic of the attenuated measurement beam may be measured with at least one sensor system.
- FIG. 1 shows an elevated perspective view of an embodiment of a nanotextured attenuator for with laser beam profiling and laser beam characterization systems.
- FIG. 2 shows alternate elevated perspective view of an embodiment of the nano-textured attenuator for use with laser beam profiling and laser beam characterization systems.
- FIG. 3 shows a planar side view of an embodiment of a nano-textured attenuator having a camera system coupled thereto for use with laser beam profiling and laser beam characterization systems.
- FIG. 4 shows an elevated perspective view of an embodiment of a nanotextured attenuator having a camera system coupled thereto for use with laser beam profiling and laser beam characterization systems.
- FIG. 5 shows a schematic diagram of the internal components of an embodiment of a nano-textured attenuator for use with laser beam profiling and laser beam characterization systems.
- FIG. 6 shows a schematic diagram of the internal components of another embodiment of a nano-textured attenuator for use with laser beam profiling and laser beam characterization systems.
- the present application discloses various embodiments of a nano-textured attenuator for use with a variety of laser beam profiling systems, laser power measurement systems, and various other systems configured to measure or otherwise characterize laser beams or signals.
- the nanotextured attenuator disclosed herein is well suited for use with laser beams in excess of about 200 Watts to 10,000 Watts (i.e., “high power”) or more, although those skilled in the art will appreciate that the various embodiments of the nano-textured attenuator disclosed herein may be used with laser beams at any variety of laser powers.
- the optical performance of the embodiments of the nano-textured attenuator disclosed herein are at least partially enabled by novel nanotextured optical surfaces having extremely low reflectivity (e.g., two nano-textured surfaces capable of attenuating a 10 kilowatt input laser beam to approximately 10 nanowatts incident on the sensor of a beam-profiling camera).
- novel nanotextured optical surfaces having extremely low reflectivity e.g., two nano-textured surfaces capable of attenuating a 10 kilowatt input laser beam to approximately 10 nanowatts incident on the sensor of a beam-profiling camera.
- beam and “optical signal” used herein refer to optical radiation incident on, reflected by, or transmitted through nano-textured surfaces of the optical elements described in the embodiments below. These terms are generally used interchangeably as required in order to recite the novel features of the embodiments disclosed herein.
- the sources of the beams or optical signals may include coherent sources (e.g., lasers), partially coherent sources, or incoherent sources (e.g., broadband lamps).
- FIGS. 1 - 4 show various views of an embodiment of a nano-textured attenuator for use with laser beam profiling systems, laser measurements systems, and similar laser beam characterization systems.
- the nano-textured attenuator 10 includes a body 12 having at least one input aperture 14 formed therein.
- a single input aperture 14 is formed in the body 12 , although those skilled in the art will appreciate that any number of input apertures 14 may be formed on the body 12 .
- the input aperture 14 may be formed on any surface of the body 12 .
- the input aperture 14 may be formed having any variety of transverse dimensions, shapes, or configurations.
- the input aperture 14 may include one or more windows or protective elements enclosing the input aperture 14 .
- the input aperture 14 not include one or more protective windows.
- At least one coupling fixture 16 may be formed on or coupled to the body 12 .
- the coupling fixture 16 defines at least one profiling and/or measurement aperture or characterization aperture 18 (hereinafter measurement aperture 18 ) therein.
- the measurement aperture 18 may or may not include at least one protective window.
- any number of measurement apertures 18 may be formed on or positioned proximate to the coupling fixture 16 .
- the coupling fixture 16 may include at least one coupling member or feature 20 thereby permitting one or more cameras, sensors, characterization systems, or similar devices to be coupled to the body 12 of the nano-textured attenuator 10 .
- the coupling member 20 comprises one or more threaded features permitting one or more cameras, sensors, characterization systems, or similar devices to be selectively coupled to and/or detached from the body 12 of the nano-textured attenuator 10 .
- the coupling member 20 may be configured to couple one or more fiber-optic devices or other systems to the body 12 .
- the coupling feature 16 may be configured to have one or more cameras, sensors, characterization systems, or similar devices non-detachably coupled to the body 12 .
- at least one camera, sensor, characterization system, or similar device may be integrally formed on or within the body 12 of the nano-textured attenuator 10 .
- the coupling fixture 16 need not include a coupling member 20 .
- the nano-textured attenuator 10 may include one or more attenuator or filter bodies configured to be selectively inserted into and withdrawn from at least one beam path formed within the body 12 .
- the attenuator filter bodies may be positioned between the input aperture 14 and the measurement aperture 18 .
- a first attenuator/filter body 22 and a second attenuator/filter body 26 may be selectively inserted into and withdrawn from the body 12 .
- any number of attenuator/filter bodies may be used in the embodiments of the nano-textured attenuator 10 disclosed herein. As shown in FIG.
- the first attenuator/filter body 22 includes at least a first filter receiver 24 form thereon and configured to receive and retain at least a first filter or optical component 25 therein.
- at least a second filter receiver 28 may be formed in or coupled to the second attenuator/filter body 26 .
- the second filter receiver 28 may be configured to receive and retain at least one filter or optical component 29 therein.
- the first filter receiver 24 and/or the second filter receiver 28 may be configured to receive and retain at least one attenuator, optical component, filter, polarizer, wave plate, diffuser, or similar device therein.
- At least one of the first filter 25 and the second filter 29 may comprise at least one thin film coated optical filter therein.
- the first attenuator/filter body 22 and/or the second attenuator/filter body 26 may be selectively inserted into or withdrawn from at least one optical pathway formed within the body 12 .
- filters or optical components retained by the first attenuator/filter body 22 and/or the second attenuator/filter body 26 may be inserted into withdrawn from at least one optical pathway formed within the body 12 .
- the first attenuator/filter body 22 and the second attenuator/filter body 26 may be manually actuated.
- At least one of the first attenuator/filter body 22 and the second attenuator/filter body 26 may include one or more mechanical actuators permitting autonomous insertion and withdrawal of at least one of the first attenuator/filter body 22 and the second attenuator/filter body 26 from the body 12 .
- one or more beam dump passages or apertures may be formed on the body 12 .
- a first beam dump aperture 30 is formed on the body 12
- FIG. 3 shows a second beam dump aperture 32 formed on the body 12 .
- the nano-textured attenuator 10 includes a first beam dump aperture 30 and at least a second beam dump aperture 32 formed on the body 12 .
- any number of beam dump apertures may be formed on the body 12 of the nano-textured attenuator 10 .
- the first beam dump aperture 30 and the second beam dump aperture 32 may be configured to permit at least one output beam to be transmitted or emitted therefrom.
- the first beam dump aperture 30 may be configured to be positioned proximate to at least one beam dump (not shown).
- the second beam dump aperture 32 may likewise be configured to be positioned proximate to at least a second beam dump (not shown).
- at least one of the first beam dump aperture 30 and the second beam dump aperture 32 may be configured to transmit or otherwise emit at least one output beam from the body 12 .
- the nano-textured attenuator 10 may be configured to be coupled to and/or be positioned proximate to at least one camera, sensor, characterization system, or similar device.
- FIGS. 3 and 4 show various views of an embodiment of a nano-textured attenuator 10 having one or more cameras, sensors, characterization systems, or similar devices 40 coupled thereto.
- the camera 40 includes a first camera body 42 and a second camera body 44 .
- At least one camera coupling device or system 46 may be coupled to or formed on at least one of the first camera body 42 and the second camera body 44 .
- the camera coupling device 46 may be configured to selectively engage and be retained by the coupling member 20 formed on the coupling fixture 16 of the body 12 (see FIG.
- the camera coupling device 46 may be configured to selectively engage or be coupled to a portion of the body 12 such that at least a portion of the camera 40 is in communication with the measurement aperture 18 formed in the body 12 .
- the camera 40 need not be detachable from the body 12 .
- the camera 40 includes at least one output and/or data coupler 48 , thereby permitting measurement or characterization data recorded by the camera 40 to be provided to at least one external processor (not shown).
- Those skilled in the art will appreciate that any variety of camera systems or devices may be used with or coupled to the body 12 of the nano-textured attenuator 10 .
- Exemplary camera systems or devices include, without limitation, 2-D matrix sensors, CCD devices, CMOS devices, InGaAs devices, polarization sensor or measuring devices, spectral or temporal measurement devices, power meters, and the like.
- FIG. 5 shows the internal components of an embodiment of a nano-textured attenuator.
- a first nano-textured beamsplitter or prism 50 and at least a second nano-textured beamsplitter 52 may be positioned within the body 12 , although those skilled in the art will appreciate that any number of nano-textured beamsplitters, prisms, or alternate nano-textured optical elements may be positioned within the body 12 .
- at least one of the first nano-textured beamsplitter 50 and the second nano-textured beamsplitter 52 may be positioned on at least one selectively adjustable optical mount.
- the position and/or orientation of at least one of the first nano-textured beamsplitter 50 and/or the second nano-textured beamsplitter 52 may be selectively adjusted by a user.
- at least one of the first nano-textured beamsplitter 50 and the second nano-textured beamsplitter 52 may be positioned on fixed optical mounts such that the position and/or orientation of the first nano-textured beamsplitter 50 and/or the second nano-textured beamsplitter 52 is fixed.
- an input beam 70 (also referred to herein as “input laser signal” or “incident optical signal”) may be directed into the body 12 of the nano-textured attenuator 10 via the input aperture 14 .
- the input beam 70 may be incident on a portion of the first nano-textured beamsplitter 50 positioned within the body 12 .
- a portion of the input beam 70 may be reflected or otherwise directed by the first nano-textured beamsplitter 50 to form a partially attenuated beam 74 which is directed within the body 12 .
- At least one of the first and second nano-textured beamsplitters 50 , 52 are manufactured from CorningTM 7980 Grade 0F UV fused silica having undergone one or more nano-texturing processes, although those skilled in the art will appreciate that any variety of substrates may be used to form the first and second nanotextured beamsplitters 50 , 52 .
- one or more thin film coatings may also be applied to at least one of the first and second nano-textured beamsplitters 50 , 52 .
- Exemplary thin film coatings include AR coatings and the like.
- a portion of the input beam 70 is transmitted through the first nano-textured beamsplitter 50 to form a first output beam 72 (also referred to herein as “first output signal 72 ”).
- the first output beam 72 may be emitted from the body 12 via the first beam dump aperture 30 .
- the first nano-textured beamsplitter 50 is configured to transmit approximately 95% to about 99.9999% of the power and/or fluence of the input beam 70 therethrough.
- the first output beam 72 encompasses approximately 95% to about 99.9999% the power and/or fluence of the input beam 70 , which may be directed to one or more external beam dumps (not shown).
- the partially attenuated beam 74 traversing through the body 12 encompasses approximately 5% to about 0.0001% or less of the power and/or fluence of the input beam 70 .
- the second nano-textured beamsplitter 52 is configured to transmit approximately 95% to about 99.9999% of the power and/or fluence of an incident optical signal (e.g., the partially attenuated beam 74 ) therethrough. As such, approximately 95% to about 99.9999% the power and/or fluence of the partially attenuated beam 74 incident on the second nano-textured beamsplitter 52 is transmitted therethrough to form a second output beam 76 .
- the second output beam 76 is directed through the second beam dump aperture 32 to one or more external beam dumps (not shown). Further, approximately 5% to about 0.0001% or less of the power and/or fluence of the partially attenuated beam 74 may be directed by the second nano-textured beamsplitter 52 to form at least one attenuated measurement beam 78 (also referred to herein as “attenuated measurement signal 78 ”) directed to the camera/sensor 40 coupled to the body 12 . In one embodiment, the attenuated measurement beam 78 encompasses approximately 0.25% to about 0.001% or less of the power and/or fluence of the input beam 70 .
- the attenuated measurement beam 78 encompasses approximately 0.000001% or less of the power and/or fluence of the input beam 70 .
- the transmission characteristics of the first nano-textured beamsplitter 50 and second nano-textured beamsplitter 52 may range from about 85% to about 99.99999% transmission of all laser radiation (e.g., laser beams or optical signals) incident thereon.
- the laser radiation reflected by at least one of the first nano-textured beamsplitter 50 and the second nano-textured beamsplitter 52 may contain about 15% to about 0.00001% or less of the power and/or fluence of the incident laser radiation.
- the attenuated measurement beam 78 may be directed to the camera/sensor 40 coupled to the body 12 .
- the attenuated measurement beam 78 may traverse through at least one of the first filter 25 located in the first attenuator/filter body 22 , and/or the second filter 29 positioned in the second attenuator/filter body 26 to further attenuate or otherwise filter the attenuated measurement beam 78 .
- the nano-textured attenuator 10 may include a single nanotextured beamsplitter, prism, or optical element within the body 12 .
- FIG. 6 shows an alternate embodiment of a nano-textured attenuator 10 having a single nano-textured beamsplitter 50 within the body 12 .
- the first nano-textured beamsplitter 50 is configured to transmit approximately 95% to about 99.9999% the power and/or fluence of the input beam 70 therethrough.
- the first output beam 72 encompasses approximately 95% to about 99.9999% the power and/or fluence of the input beam 70 , which may be directed to one or more external beam dumps (not shown).
- the partially attenuated beam 74 traversing through the body 12 encompasses approximately 5% to about 0.0001 % or less of the power and/or fluence of the input beam 70 .
- At least a portion of the partially attenuated beam 74 may be incident on a portion of at least one optical component 54 positioned within the body 12 .
- the optical component 54 comprises one or more lenses, beamsplitters, wave plates, polarizers, and the like.
- the optical component 54 may include one or more optical coatings 56 applied thereto.
- Exemplary optical coatings 56 include, without limitation, anti-reflection (AR) coatings, thin-film coatings, and the like.
- the optical component 54 may comprise a nanotextured substrate, a grating, or a similar optical component.
- the optical component 54 may be configured to transmit approximately 95% to about 99.9999% the power and/or fluence of incident optical radiation therethrough.
- the second output beam 76 is directed through the second beam dump aperture 32 to one or more external beam dumps (not shown). Further, approximately 5% to about 0.0001 % or less of the power and/or fluence of the partially attenuated beam 74 may be directed by the optical component 54 to form an attenuated measurement beam 78 which may be directed to the camera/sensor 40 coupled to the body 12 . In one embodiment, the attenuated measurement beam 78 encompasses approximately 0.25% to about 0.0001 % or less of the power and/or fluence of the input beam 70 .
- the attenuated measurement beam 78 encompasses approximately 0.000001% or less of the power and/or fluence of the input beam 70 .
- the transmission characteristics of the first nano-textured beamsplitter 50 and the optical component 54 may range from about 85% to about 99.99999% transmission of all optical radiation (e.g., laser beams or optical signals) incident thereon.
- an optical signal reflected by at least one of the first nano-textured beamsplitter 50 and the optical component 54 may contain about 15% to about 0.00001% or less of the power and/or fluence of the incident radiation.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Optical Elements Other Than Lenses (AREA)
- Lasers (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
The present application discloses a nano-textured attenuator which includes a body defining an input aperture, a measurement aperture, and at least one beam dump aperture. At least one coupling fixture may be formed on or positioned on the body, a first nano-textured beamsplitter is positioned within the body and configured to transmit 85% to 99.9999% of an input beam therethrough while reflecting 0.0001% of the input beam to form a partially attenuated beam, at least a second nano-textured beamsplitter is also positioned within the body and is configured to transmit 85% to 99.9999% of the partially attenuated beam therethrough while reflecting 0.0001% of the partially attenuated beam to form an attenuated measurement beam, and at least one camera in communication with the measurement aperture be configured to measure at least one optical characteristic of the attenuated measurement beam.
Description
- The present application is a continuation of United States Application No. 16/906,335 filed on Jun. 20, 2020, entitled “Nano-Textured Attenuator for Use with Laser Beam Profiling and Laser Beam Characterization Systems and Methods of Use” which claims priority to United States provisional application No. 62/865,160, filed on Jun. 22, 2019 and entitled “Nano-Textured Attenuator for Use with Laser Beam Profiling and Laser Beam Characterization Systems and Methods of Use”, the entire contents of both are incorporated by reference herein.
- Increasingly, laser systems offering high output powers from about 500 W to 5000 W or more are being implemented in various fields. Often, laser measurement systems are used to monitor the performance of such laser systems. Typically, these measurements, which include beam profiling, spectral observations, temporal observations, or intensity observations are performed by creating a sample of the intensity map at a plane transverse to the propagation axis of the laser beam.
- While laser output measurements including beam profiling and laser beam characterization has proven useful in monitoring the performance of low-power laser systems, a number of shortcomings have been identified when these systems are used to monitor the performance of high power laser systems. For example, 2-D matrix sensors such as CCD devices, CMOS devices, pyroelectric devices, and/or InGaAs devices are saturated at fluences several magnitudes less than the fluences of the output beams of the high-power laser systems under test. As a result, presently available beam profiling systems, high laser power measurement systems, and similar laser power measurement systems utilize one or more thin-film coated attenuators to reduce output beam fluence. Unfortunately, the power densities of many high-power laser system output beams exceed the damage threshold of thin-film reflective coatings used in making thin-film coated attenuators. As such, the performance of thin-film coated attenuators tends to degrade, thereby permitting potentially damaging fluence to be incident on sensitive cameras and sensors used in laser beam profiling systems and/or measurement systems.
- In light of the foregoing, there is an ongoing need for durable attenuator devices for use in high laser power beam profiling systems and laser beam characterization systems.
- The present application discloses various embodiments of a nano-textured attenuator for use with a variety of laser beam profiling systems, laser power measurement systems, and various other systems configured to measure or otherwise characterize laser output signals or beams. In one embodiment, the nanotextured attenuators disclosed herein are well suited for use with laser outputs in excess of about 200 W to 5000 W (i.e. high power) or more, although those skilled in the art will appreciate that the various embodiments of the nano-textured attenuator disclosed herein may be used at any variety of laser powers.
- In one embodiment, the nano-textured attenuator includes a body defining an input aperture, a measurement aperture, and at least one beam dump aperture. At least one coupling fixture may be formed on or positioned on the body. In one embodiment, the coupling fixture is positioned proximate to the measurement aperture. A first nano-textured beamsplitter is positioned within the body. During use, the first nano-textured beamsplitter is configured to transmit 85% to 99.9999% of an input beam therethrough while reflecting 0.0001% to form at least one partially attenuated beam. At least a second nano-textured beamsplitter is positioned within the body. During use, the second nano-textured beamsplitter is configured to transmit 85% to 99.9999% of the partially attenuated beam therethrough while reflecting 0.0001 % of the partially attenuated beam to form at least one attenuated measurement beam. At least one camera in communication with the measurement aperture is configured to measure at least one optical characteristic of the attenuated measurement beam. The nano-textured attenuator of claim 1 may further comprise at least one selectively movable mount configured to adjustably support at least one of the first nano-textured beamsplitter and the second nano-textured beamsplitter. A protective window may be installed in at least one of the at least one input aperture, the at least one measurement aperture, and the at least one first beam dump aperture. The 85% to 99.9999% of the at least one partially attenuated beam may form a second output beam directed through at least one second beam dump aperture. In one embodiment, a power of the attenuated measurement beam is approximately 0.0001 % of a power of the input beam. In another embodiment, a power of the attenuated measurement beam is approximately 0.00001% of a power of the input beam. In another embodiment, a power of the attenuated measurement beam is approximately 0.000001% of a power of the input beam. In another embodiment, a power of the attenuated measurement beam is approximately 0.0000001% of a power of the input beam.
- In another embodiment, the nano-textured attenuator includes a body defining an input aperture, a measurement aperture, and at least one beam dump aperture. At least one coupling fixture may be formed on or positioned on the body. In one embodiment, the coupling fixture is positioned proximate to the measurement aperture. A nano-textured beamsplitter is positioned within the body. During use, the nano-textured beamsplitter is configured to transmit 85% to 99.9999% of an input beam therethrough while reflecting 0.0001% to form at least one partially attenuated beam. At least one nano-textured optical component is positioned within the body. During use, the nano-textured optical component is configured to transmit 85% to 99.9999% of the partially attenuated beam therethrough while reflecting 0.0001 % to form at least one attenuated measurement beam. At least one camera in communication with the measurement aperture be configured to measure at least one optical characteristic of the attenuated measurement beam. The nano-textured attenuator of claim 1 may further comprise at least one selectively movable mount configured to adjustably support at least one of the first nano-textured beamsplitter and the nano-textured optical component. A protective window may be installed in at least one of the at least one input aperture, the at least one measurement aperture, and the at least one first beam dump aperture. The 85% to 99.9999% of the at least one partially attenuated beam may form a second output beam directed through at least one second beam dump aperture. In one embodiment, a power of the attenuated measurement beam is approximately 0.0001% of a power of the input beam. In another embodiment, a power of the attenuated measurement beam is approximately 0.00001% of a power of the input beam. In another embodiment, a power of the attenuated measurement beam is approximately 0.000001% of a power of the input beam. In another embodiment, a power of the attenuated measurement beam is approximately 0.0000001% of a power of the input beam.
- The present application also discloses a method of measuring high laser power optical signal which includes directing at least one input beam to a first nanotextured beamsplitter. A portion of the input beam is reflected with the first nanotextured beamsplitter to form at least one partially attenuated beam. The partially attenuated beam has 0.0001% to 15% of the power of the input beam while transmitting 85% to 99.9999% of the input beam through the first nano-textured beamsplitter. Thereafter, a portion of the partially attenuated beam from the first nano-textured beamsplitter is reflected by at least a second nano-textured beamsplitter to form at least one attenuated measurement beam. The attenuated measurement beam has 0.0001% to 15% of the power of the partially attenuated beam while transmitting 85% to 99.9999% of the partially attenuated beam through the second nano-textured beamsplitter. Finally, at least one optical characteristic of the attenuated measurement beam may be measured with at least one sensor system.
- Other features and advantages of the nano-textured attenuator for use with laser beam profiling and laser beam characterization systems as described herein will become more apparent from a consideration of the following detailed description.
- The novel aspects of the embodiments of a nano-textured attenuator for use with laser beam profiling laser beam characterization systems as disclosed herein will be more apparent by consideration of the following figures, wherein:
-
FIG. 1 shows an elevated perspective view of an embodiment of a nanotextured attenuator for with laser beam profiling and laser beam characterization systems. -
FIG. 2 shows alternate elevated perspective view of an embodiment of the nano-textured attenuator for use with laser beam profiling and laser beam characterization systems. -
FIG. 3 shows a planar side view of an embodiment of a nano-textured attenuator having a camera system coupled thereto for use with laser beam profiling and laser beam characterization systems. -
FIG. 4 shows an elevated perspective view of an embodiment of a nanotextured attenuator having a camera system coupled thereto for use with laser beam profiling and laser beam characterization systems. -
FIG. 5 shows a schematic diagram of the internal components of an embodiment of a nano-textured attenuator for use with laser beam profiling and laser beam characterization systems. -
FIG. 6 shows a schematic diagram of the internal components of another embodiment of a nano-textured attenuator for use with laser beam profiling and laser beam characterization systems. - The present application discloses various embodiments of a nano-textured attenuator for use with a variety of laser beam profiling systems, laser power measurement systems, and various other systems configured to measure or otherwise characterize laser beams or signals. In one embodiment, the nanotextured attenuator disclosed herein is well suited for use with laser beams in excess of about 200 Watts to 10,000 Watts (i.e., “high power”) or more, although those skilled in the art will appreciate that the various embodiments of the nano-textured attenuator disclosed herein may be used with laser beams at any variety of laser powers. The optical performance of the embodiments of the nano-textured attenuator disclosed herein are at least partially enabled by novel nanotextured optical surfaces having extremely low reflectivity (e.g., two nano-textured surfaces capable of attenuating a 10 kilowatt input laser beam to approximately 10 nanowatts incident on the sensor of a beam-profiling camera). Those skilled in the art will appreciate that the physical dimensions and configuration of the embodiments of the nano-textured attenuator disclosed herein are intended to illustrate the operation of the nano-textured attenuator and are not intended to limit the components and characteristics of the nano-textured attenuator to those embodiments disclosed.
- The terms “beam” and “optical signal” used herein refer to optical radiation incident on, reflected by, or transmitted through nano-textured surfaces of the optical elements described in the embodiments below. These terms are generally used interchangeably as required in order to recite the novel features of the embodiments disclosed herein. The sources of the beams or optical signals may include coherent sources (e.g., lasers), partially coherent sources, or incoherent sources (e.g., broadband lamps).
-
FIGS. 1-4 show various views of an embodiment of a nano-textured attenuator for use with laser beam profiling systems, laser measurements systems, and similar laser beam characterization systems. In the illustrated embodiment, the nano-texturedattenuator 10 includes abody 12 having at least oneinput aperture 14 formed therein. In the illustrated embodiment, asingle input aperture 14 is formed in thebody 12, although those skilled in the art will appreciate that any number ofinput apertures 14 may be formed on thebody 12. Further, theinput aperture 14 may be formed on any surface of thebody 12. Optionally, theinput aperture 14 may be formed having any variety of transverse dimensions, shapes, or configurations. Further, theinput aperture 14 may include one or more windows or protective elements enclosing theinput aperture 14. Optionally, theinput aperture 14 not include one or more protective windows. - Referring again to
FIGS. 1-4 , at least onecoupling fixture 16 may be formed on or coupled to thebody 12. In the illustrated embodiment, thecoupling fixture 16 defines at least one profiling and/or measurement aperture or characterization aperture 18 (hereinafter measurement aperture 18) therein. Like theinput aperture 14, themeasurement aperture 18 may or may not include at least one protective window. Optionally, any number ofmeasurement apertures 18 may be formed on or positioned proximate to thecoupling fixture 16. Further, thecoupling fixture 16 may include at least one coupling member or feature 20 thereby permitting one or more cameras, sensors, characterization systems, or similar devices to be coupled to thebody 12 of the nano-texturedattenuator 10. In one embodiment, thecoupling member 20 comprises one or more threaded features permitting one or more cameras, sensors, characterization systems, or similar devices to be selectively coupled to and/or detached from thebody 12 of the nano-texturedattenuator 10. Those skilled in the art will appreciate that any variety ofcoupling members 20 or similar coupling features may be used to selectively couple and/or detach one or more cameras, sensors, characterization systems, or similar devices to thebody 12 of the nano-texturedattenuator 10 disclosed herein. In another embodiment, thecoupling member 20 may be configured to couple one or more fiber-optic devices or other systems to thebody 12. Optionally, thecoupling feature 16 may be configured to have one or more cameras, sensors, characterization systems, or similar devices non-detachably coupled to thebody 12. For example, at least one camera, sensor, characterization system, or similar device may be integrally formed on or within thebody 12 of the nano-texturedattenuator 10. As such, thecoupling fixture 16 need not include acoupling member 20. - As shown in
FIGS. 1-6 , the nano-texturedattenuator 10 may include one or more attenuator or filter bodies configured to be selectively inserted into and withdrawn from at least one beam path formed within thebody 12. As shown, the attenuator filter bodies may be positioned between theinput aperture 14 and themeasurement aperture 18. In the illustrated embodiment, a first attenuator/filter body 22 and a second attenuator/filter body 26 may be selectively inserted into and withdrawn from thebody 12. Those skilled in the art will appreciate that any number of attenuator/filter bodies may be used in the embodiments of the nano-texturedattenuator 10 disclosed herein. As shown inFIG. 1 , the first attenuator/filter body 22 includes at least afirst filter receiver 24 form thereon and configured to receive and retain at least a first filter oroptical component 25 therein. Similarly, as shown inFIG. 2 , at least asecond filter receiver 28 may be formed in or coupled to the second attenuator/filter body 26. Like thefirst filter receiver 24, thesecond filter receiver 28 may be configured to receive and retain at least one filter oroptical component 29 therein. For example, thefirst filter receiver 24 and/or thesecond filter receiver 28 may be configured to receive and retain at least one attenuator, optical component, filter, polarizer, wave plate, diffuser, or similar device therein. For example, in one embodiment at least one of thefirst filter 25 and thesecond filter 29 may comprise at least one thin film coated optical filter therein. During use, the first attenuator/filter body 22 and/or the second attenuator/filter body 26 may be selectively inserted into or withdrawn from at least one optical pathway formed within thebody 12. As such, filters or optical components retained by the first attenuator/filter body 22 and/or the second attenuator/filter body 26 may be inserted into withdrawn from at least one optical pathway formed within thebody 12. In the illustrated embodiment, the first attenuator/filter body 22 and the second attenuator/filter body 26 may be manually actuated. Optionally, at least one of the first attenuator/filter body 22 and the second attenuator/filter body 26 may include one or more mechanical actuators permitting autonomous insertion and withdrawal of at least one of the first attenuator/filter body 22 and the second attenuator/filter body 26 from thebody 12. - As shown in
FIGS. 2-4 , one or more beam dump passages or apertures may be formed on thebody 12. For example, as shown inFIGS. 2 and 4 , a firstbeam dump aperture 30 is formed on thebody 12, whileFIG. 3 shows a secondbeam dump aperture 32 formed on thebody 12. As such, in the embodiments shown inFIGS. 2-4 , the nano-texturedattenuator 10 includes a firstbeam dump aperture 30 and at least a secondbeam dump aperture 32 formed on thebody 12. Those skilled in the art will appreciate that any number of beam dump apertures may be formed on thebody 12 of the nano-texturedattenuator 10. During use, the firstbeam dump aperture 30 and the secondbeam dump aperture 32 may be configured to permit at least one output beam to be transmitted or emitted therefrom. As such, the firstbeam dump aperture 30 may be configured to be positioned proximate to at least one beam dump (not shown). Similarly, the secondbeam dump aperture 32 may likewise be configured to be positioned proximate to at least a second beam dump (not shown). In another embodiment, at least one of the firstbeam dump aperture 30 and the secondbeam dump aperture 32 may be configured to transmit or otherwise emit at least one output beam from thebody 12. - As described above, the nano-textured
attenuator 10 may be configured to be coupled to and/or be positioned proximate to at least one camera, sensor, characterization system, or similar device.FIGS. 3 and 4 show various views of an embodiment of a nano-texturedattenuator 10 having one or more cameras, sensors, characterization systems, orsimilar devices 40 coupled thereto. As shown, in one embodiment, thecamera 40 includes afirst camera body 42 and asecond camera body 44. At least one camera coupling device orsystem 46 may be coupled to or formed on at least one of thefirst camera body 42 and thesecond camera body 44. During use, thecamera coupling device 46 may be configured to selectively engage and be retained by thecoupling member 20 formed on thecoupling fixture 16 of the body 12 (seeFIG. 1 ). Optionally, thecamera coupling device 46 may be configured to selectively engage or be coupled to a portion of thebody 12 such that at least a portion of thecamera 40 is in communication with themeasurement aperture 18 formed in thebody 12. Optionally, thecamera 40 need not be detachable from thebody 12. In the illustrated embodiment, thecamera 40 includes at least one output and/ordata coupler 48, thereby permitting measurement or characterization data recorded by thecamera 40 to be provided to at least one external processor (not shown). Those skilled in the art will appreciate that any variety of camera systems or devices may be used with or coupled to thebody 12 of the nano-texturedattenuator 10. Exemplary camera systems or devices include, without limitation, 2-D matrix sensors, CCD devices, CMOS devices, InGaAs devices, polarization sensor or measuring devices, spectral or temporal measurement devices, power meters, and the like. -
FIG. 5 shows the internal components of an embodiment of a nano-textured attenuator. As shown inFIG. 5 , a first nano-textured beamsplitter orprism 50 and at least a second nano-texturedbeamsplitter 52 may be positioned within thebody 12, although those skilled in the art will appreciate that any number of nano-textured beamsplitters, prisms, or alternate nano-textured optical elements may be positioned within thebody 12. In one embodiment, at least one of the first nano-texturedbeamsplitter 50 and the second nano-texturedbeamsplitter 52 may be positioned on at least one selectively adjustable optical mount. As such, the position and/or orientation of at least one of the first nano-texturedbeamsplitter 50 and/or the second nano-texturedbeamsplitter 52 may be selectively adjusted by a user. Optionally, at least one of the first nano-texturedbeamsplitter 50 and the second nano-texturedbeamsplitter 52 may be positioned on fixed optical mounts such that the position and/or orientation of the first nano-texturedbeamsplitter 50 and/or the second nano-texturedbeamsplitter 52 is fixed. - As shown in
FIG. 5 , during use, an input beam 70 (also referred to herein as “input laser signal” or “incident optical signal”) may be directed into thebody 12 of the nano-texturedattenuator 10 via theinput aperture 14. Theinput beam 70 may be incident on a portion of the first nano-texturedbeamsplitter 50 positioned within thebody 12. As a result, a portion of theinput beam 70 may be reflected or otherwise directed by the first nano-texturedbeamsplitter 50 to form a partiallyattenuated beam 74 which is directed within thebody 12. In one embodiment, at least one of the first and second nano-texturedbeamsplitters nanotextured beamsplitters beamsplitters input beam 70 is transmitted through the first nano-texturedbeamsplitter 50 to form a first output beam 72 (also referred to herein as “first output signal 72”). In the illustrated embodiment, thefirst output beam 72 may be emitted from thebody 12 via the firstbeam dump aperture 30. In one embodiment, the first nano-texturedbeamsplitter 50 is configured to transmit approximately 95% to about 99.9999% of the power and/or fluence of theinput beam 70 therethrough. As such, thefirst output beam 72 encompasses approximately 95% to about 99.9999% the power and/or fluence of theinput beam 70, which may be directed to one or more external beam dumps (not shown). As such, the partiallyattenuated beam 74 traversing through thebody 12 encompasses approximately 5% to about 0.0001% or less of the power and/or fluence of theinput beam 70. - Referring again to
FIG. 5 , at least a portion of the partiallyattenuated beam 74 may be incident on a portion of the second nano-texturedbeamsplitter 52 positioned within thebody 12. Like the first nano-texturedbeamsplitter 50, the second nano-texturedbeamsplitter 52 is configured to transmit approximately 95% to about 99.9999% of the power and/or fluence of an incident optical signal (e.g., the partially attenuated beam 74) therethrough. As such, approximately 95% to about 99.9999% the power and/or fluence of the partiallyattenuated beam 74 incident on the second nano-texturedbeamsplitter 52 is transmitted therethrough to form asecond output beam 76. In one embodiment, thesecond output beam 76 is directed through the secondbeam dump aperture 32 to one or more external beam dumps (not shown). Further, approximately 5% to about 0.0001% or less of the power and/or fluence of the partiallyattenuated beam 74 may be directed by the second nano-texturedbeamsplitter 52 to form at least one attenuated measurement beam 78 (also referred to herein as “attenuated measurement signal 78”) directed to the camera/sensor 40 coupled to thebody 12. In one embodiment, theattenuated measurement beam 78 encompasses approximately 0.25% to about 0.001% or less of the power and/or fluence of theinput beam 70. In another embodiment, theattenuated measurement beam 78 encompasses approximately 0.000001% or less of the power and/or fluence of theinput beam 70. Those skilled in the art will appreciate that the transmission characteristics of the first nano-texturedbeamsplitter 50 and second nano-texturedbeamsplitter 52 may range from about 85% to about 99.99999% transmission of all laser radiation (e.g., laser beams or optical signals) incident thereon. As such, the laser radiation reflected by at least one of the first nano-texturedbeamsplitter 50 and the second nano-texturedbeamsplitter 52 may contain about 15% to about 0.00001% or less of the power and/or fluence of the incident laser radiation. - As shown in
FIG. 5 , as stated above, theattenuated measurement beam 78 may be directed to the camera/sensor 40 coupled to thebody 12. Optionally, theattenuated measurement beam 78 may traverse through at least one of thefirst filter 25 located in the first attenuator/filter body 22, and/or thesecond filter 29 positioned in the second attenuator/filter body 26 to further attenuate or otherwise filter theattenuated measurement beam 78. - Optionally, the nano-textured
attenuator 10 may include a single nanotextured beamsplitter, prism, or optical element within thebody 12. For example,FIG. 6 shows an alternate embodiment of a nano-texturedattenuator 10 having a single nano-texturedbeamsplitter 50 within thebody 12. Like the previous embodiment, the first nano-texturedbeamsplitter 50 is configured to transmit approximately 95% to about 99.9999% the power and/or fluence of theinput beam 70 therethrough. As such, thefirst output beam 72 encompasses approximately 95% to about 99.9999% the power and/or fluence of theinput beam 70, which may be directed to one or more external beam dumps (not shown). As such, the partiallyattenuated beam 74 traversing through thebody 12 encompasses approximately 5% to about 0.0001 % or less of the power and/or fluence of theinput beam 70. - At least a portion of the partially
attenuated beam 74 may be incident on a portion of at least oneoptical component 54 positioned within thebody 12. In one embodiment, theoptical component 54 comprises one or more lenses, beamsplitters, wave plates, polarizers, and the like. Further, theoptical component 54 may include one or moreoptical coatings 56 applied thereto. Exemplaryoptical coatings 56 include, without limitation, anti-reflection (AR) coatings, thin-film coatings, and the like. Optionally, theoptical component 54 may comprise a nanotextured substrate, a grating, or a similar optical component. Theoptical component 54 may be configured to transmit approximately 95% to about 99.9999% the power and/or fluence of incident optical radiation therethrough. As such, approximately 95% to about 99.9999% the power and/or fluence of the partiallyattenuated beam 74 incident on theoptical component 54 is transmitted therethrough to form asecond output beam 76. In one embodiment, thesecond output beam 76 is directed through the secondbeam dump aperture 32 to one or more external beam dumps (not shown). Further, approximately 5% to about 0.0001 % or less of the power and/or fluence of the partiallyattenuated beam 74 may be directed by theoptical component 54 to form anattenuated measurement beam 78 which may be directed to the camera/sensor 40 coupled to thebody 12. In one embodiment, theattenuated measurement beam 78 encompasses approximately 0.25% to about 0.0001 % or less of the power and/or fluence of theinput beam 70. In another embodiment, theattenuated measurement beam 78 encompasses approximately 0.000001% or less of the power and/or fluence of theinput beam 70. Those skilled in the art will appreciate that the transmission characteristics of the first nano-texturedbeamsplitter 50 and theoptical component 54 may range from about 85% to about 99.99999% transmission of all optical radiation (e.g., laser beams or optical signals) incident thereon. As such, an optical signal reflected by at least one of the first nano-texturedbeamsplitter 50 and theoptical component 54 may contain about 15% to about 0.00001% or less of the power and/or fluence of the incident radiation. - It is appreciated by persons skilled in the art that the present invention is not limited by what has been particularly shown and described hereinabove. Rather the scope of the present invention includes both combinations and subcombinations of various features described hereinabove as well as variations and modifications thereto which would occur to a person of skill in the art upon reading the above description and which are not in the prior art.
Claims (15)
1. A nano-textured attenuator for use in laser beam characterization systems, comprising:
a body defining at least one input aperture, at least one measurement aperture, and at least one first beam dump aperture;
at least one coupling fixture positioned on the body, the at least one coupling fixture positioned proximate to the at least one measurement aperture;
a first nano-textured beamsplitter positioned within the body, the first nano-textured beamsplitter configured to transmit 85% to 99.9999% of an input beam therethrough and reflect 15% to 0.0001 % of the input beam to form at least one partially attenuated beam;
at least a second nano-textured beamsplitter positioned within the body, the second nano-textured beamsplitter configured to transmit 85% to 99.9999% of the at least one partially attenuated beam therethrough and reflect 15% to 0.0001 % of the at least one partially attenuated beam to form at least one attenuated measurement beam; and
at least one camera system coupled to the body, the at least one camera system configured to receive the at least one attenuated measurement beam and measure at least one characteristic of the at least one attenuated measurement beam.
2. The nano-textured attenuator of claim 1 , further comprising at least one selectively movable mount configured to adjustably support at least one of the first nano-textured beamsplitter and the second nano-textured beamsplitter.
3. The nano-textured attenuator of claim 1 , wherein at least one of the at least one input aperture, the at least one measurement aperture, and the at least one first beam dump aperture includes a protective window.
4. The nano-textured attenuator of claim 1 , wherein the 85% to 99.9999% of the at least one partially attenuated beam forms a second output beam directed through at least one second beam dump aperture.
5. The nano-textured attenuator of claim 1 , wherein a power of the attenuated measurement beam is approximately 0.0001 % of a power of the input beam.
6. The nano-textured attenuator of claim 1 , wherein a power of the attenuated measurement beam is approximately 0.00001% of a power of the input beam.
7. The nano-textured attenuator of claim 1 , wherein a power of the attenuated measurement beam is approximately 0.000001% of a power of the input beam.
8. The nano-textured attenuator of claim 1 , wherein a power of the attenuated measurement beam is approximately 0.0000001% of a power of the input beam.
9. A nano-textured attenuator for use in laser beam characterization systems, comprising:
a body defining at least one input aperture, at least one measurement aperture, and at least one first beam dump aperture;
at least one coupling fixture positioned on the body, the at least one coupling fixture positioned proximate to the at least one measurement aperture;
a nano-textured beamsplitter positioned within the body, the nano-textured beamsplitter configured to transmit 85% to 99.9999% of an input beam therethrough and reflect 15% to 0.0001% of the input beam to form at least one partially attenuated beam;
at least one nano-textured optical element positioned within the body, the at least one nano-textured optical element configured to transmit 85% to 99.9999% of the at least one partially attenuated beam therethrough and reflect 15% to 0.0001% of the at least one partially attenuated beam to form at least one attenuated measurement beam; and
at least one camera system coupled to the body, the at least one camera system configured to receive the at least one attenuated measurement beam and measure at least one characteristic of the at least one attenuated measurement beam.
10. The nano-textured attenuator of claim 9 , further comprising at least one selectively movable mount configured to adjustably support at least one of the nano-textured beamsplitter and the at least one nano-textured optical element.
11. The nano-textured attenuator of claim 9 , wherein at least one of the at least one input aperture, at least one measurement aperture, and at least one beam dump aperture includes a protective window.
12. The nano-textured attenuator of claim 9 , wherein the at least one nano-textured optical element is a beamsplitter.
13. The nano-textured attenuator of claim 9 , wherein the at least one nano-textured optical element is a wave plate.
14. The nano-textured attenuator of claim 9 , wherein the at least one nano-textured optical element is a lens.
15. A method of measuring a high laser power optical signal, comprising:
directing at least one input beam to a first nano-textured beamsplitter;
reflecting a portion of the at least one input beam with the first nano-textured beamsplitter to form at least one partially attenuated beam, the at least one partially attenuated beam having 15% to 0.0001% of a power of the at least one input beam while transmitting 85% to 99.9999% of the at least one input beam through the first nano-textured beamsplitter;
reflecting a portion of the at least one partially attenuated beam from the first nano-textured beamsplitter with at least a second nano-textured beamsplitter to form at least one attenuated measurement beam, the at least one attenuated measurement beam having 0.0001% to 15% of the at least one partially attenuated beam while transmitting 85% to 99.9999% of the at least one partially attenuated through the second nano-textured beamsplitter; and
measuring at least one optical characteristic of the at least one attenuated measurement beam with at least one sensor system.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US18/132,411 US20230296909A1 (en) | 2019-06-22 | 2023-04-09 | Nano-Textured Attenuator for Use with Laser Beam Profiling and Laser Beam Characterization Systems and Method of Use |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201962865160P | 2019-06-22 | 2019-06-22 | |
US16/906,335 US20200400965A1 (en) | 2019-06-22 | 2020-06-19 | Nano-Textured Attenuator for Use with Laser Beam Profiling and Laser Beam Characterization Systems and Method of Use |
US18/132,411 US20230296909A1 (en) | 2019-06-22 | 2023-04-09 | Nano-Textured Attenuator for Use with Laser Beam Profiling and Laser Beam Characterization Systems and Method of Use |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US16/906,335 Continuation US20200400965A1 (en) | 2019-06-22 | 2020-06-19 | Nano-Textured Attenuator for Use with Laser Beam Profiling and Laser Beam Characterization Systems and Method of Use |
Publications (1)
Publication Number | Publication Date |
---|---|
US20230296909A1 true US20230296909A1 (en) | 2023-09-21 |
Family
ID=74038466
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US16/906,335 Abandoned US20200400965A1 (en) | 2019-06-22 | 2020-06-19 | Nano-Textured Attenuator for Use with Laser Beam Profiling and Laser Beam Characterization Systems and Method of Use |
US18/132,411 Pending US20230296909A1 (en) | 2019-06-22 | 2023-04-09 | Nano-Textured Attenuator for Use with Laser Beam Profiling and Laser Beam Characterization Systems and Method of Use |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US16/906,335 Abandoned US20200400965A1 (en) | 2019-06-22 | 2020-06-19 | Nano-Textured Attenuator for Use with Laser Beam Profiling and Laser Beam Characterization Systems and Method of Use |
Country Status (7)
Country | Link |
---|---|
US (2) | US20200400965A1 (en) |
EP (1) | EP3987258A4 (en) |
JP (1) | JP2022537450A (en) |
KR (1) | KR20220024662A (en) |
CN (1) | CN114008418A (en) |
TW (1) | TW202112019A (en) |
WO (1) | WO2020263667A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3824259A4 (en) | 2018-07-20 | 2022-03-30 | Ophir-Spiricon, LLC | Method and apparatus for focus correction of multi-image laser beam quality measurements |
US11874163B2 (en) | 2022-01-14 | 2024-01-16 | Ophir Optronics Solutions, Ltd. | Laser measurement apparatus having a removable and replaceable beam dump |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5329350A (en) | 1992-05-21 | 1994-07-12 | Photon, Inc. | Measuring laser beam parameters using non-distorting attenuation and multiple simultaneous samples |
US5371655A (en) * | 1992-05-22 | 1994-12-06 | Panavision International, L.P. | System for varying light intensity such as for use in motion picture photography |
JPH0815638A (en) * | 1994-06-29 | 1996-01-19 | Toshiba Corp | Laser optical device |
US6497490B1 (en) * | 1999-12-14 | 2002-12-24 | Silicon Light Machines | Laser beam attenuator and method of attenuating a laser beam |
DE10190427T1 (en) * | 2000-01-25 | 2002-06-06 | Lambda Physik Ag | Energy monitoring device for a fluoromolecular laser |
US8999857B2 (en) * | 2010-04-02 | 2015-04-07 | The Board Of Trustees Of The Leland Stanford Junior University | Method for forming a nano-textured substrate |
WO2015011786A1 (en) * | 2013-07-23 | 2015-01-29 | 日立マクセル株式会社 | Optical component having nanoparticle thin film and optical application device using same |
CN104238107A (en) * | 2014-07-07 | 2014-12-24 | 中国科学院上海光学精密机械研究所 | Digitalized variable optical attenuator |
JP6955932B2 (en) * | 2017-08-25 | 2021-10-27 | 株式会社ディスコ | Laser beam profiler unit and laser processing equipment |
-
2020
- 2020-06-18 EP EP20831625.7A patent/EP3987258A4/en active Pending
- 2020-06-18 WO PCT/US2020/038389 patent/WO2020263667A1/en unknown
- 2020-06-18 CN CN202080043679.6A patent/CN114008418A/en active Pending
- 2020-06-18 JP JP2021576284A patent/JP2022537450A/en active Pending
- 2020-06-18 KR KR1020227001705A patent/KR20220024662A/en unknown
- 2020-06-19 US US16/906,335 patent/US20200400965A1/en not_active Abandoned
- 2020-06-20 TW TW109120986A patent/TW202112019A/en unknown
-
2023
- 2023-04-09 US US18/132,411 patent/US20230296909A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2020263667A1 (en) | 2020-12-30 |
JP2022537450A (en) | 2022-08-25 |
TW202112019A (en) | 2021-03-16 |
KR20220024662A (en) | 2022-03-03 |
EP3987258A4 (en) | 2023-07-05 |
EP3987258A1 (en) | 2022-04-27 |
US20200400965A1 (en) | 2020-12-24 |
WO2020263667A9 (en) | 2021-07-01 |
CN114008418A (en) | 2022-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20230296909A1 (en) | Nano-Textured Attenuator for Use with Laser Beam Profiling and Laser Beam Characterization Systems and Method of Use | |
US6497490B1 (en) | Laser beam attenuator and method of attenuating a laser beam | |
US5319434A (en) | Laser rangefinder apparatus with fiber optic interface | |
JP6552060B2 (en) | System and method for non-contact optical power measurement | |
US20110255088A1 (en) | Polarization compensated beam splitter and diagnostic system for high power laser systems | |
US9568680B1 (en) | Optical received with reduced cavity size and methods of making and using the same | |
US6128133A (en) | Optical beamsplitter | |
US9164247B2 (en) | Apparatuses for reducing the sensitivity of an optical signal to polarization and methods of making and using the same | |
US8760653B2 (en) | Assembly for monitoring power of randomly polarized light | |
WO2018058859A1 (en) | Optical subassembly for an optical receiver, optical receiver and transceiver comprising the same, and methods of making and using the same | |
US7265836B1 (en) | In-line optical polarimeter using free-space polarization sampling elements | |
JPH07101249B2 (en) | Optoelectronic device | |
TW201823675A (en) | Light transmitting and receiving device and light detection and ranging system | |
JP2002058696A (en) | Ray unifying unit | |
US10942275B2 (en) | System and method for improving signal-to-noise ratio in a laser imaging system | |
JP3709313B2 (en) | Bi-directional communication optical module element and inspection method thereof | |
US10708537B2 (en) | System and method for reducing ghost images in a laser imaging system | |
KR100459998B1 (en) | system for measuring loss and mode pattern of optical waveguide | |
US20220364915A1 (en) | Optical power meter for safe operation of optical wireless power systems | |
Scaggs et al. | Compact, high power laser beam CMOS profiler with less than-8 inherent optical density | |
JPH0519941U (en) | Optical coupling device | |
JPH07225151A (en) | Laser output measuring instrument | |
JP2907037B2 (en) | Bidirectional line monitor | |
JP2006038547A (en) | Evaluation method of membrane filter | |
CN117169854A (en) | Laser ranging sensor and coaxial optical system |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STPP | Information on status: patent application and granting procedure in general |
Free format text: DOCKETED NEW CASE - READY FOR EXAMINATION |