KR102778184B1 - 레이저 빔 프로파일링과 사용하기 위한 나노-텍스처 감쇠기 및 레이저 빔 특성화 시스템 및 사용 방법 - Google Patents

레이저 빔 프로파일링과 사용하기 위한 나노-텍스처 감쇠기 및 레이저 빔 특성화 시스템 및 사용 방법 Download PDF

Info

Publication number
KR102778184B1
KR102778184B1 KR1020227001705A KR20227001705A KR102778184B1 KR 102778184 B1 KR102778184 B1 KR 102778184B1 KR 1020227001705 A KR1020227001705 A KR 1020227001705A KR 20227001705 A KR20227001705 A KR 20227001705A KR 102778184 B1 KR102778184 B1 KR 102778184B1
Authority
KR
South Korea
Prior art keywords
nano
textured
attenuator
attenuated
input
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020227001705A
Other languages
English (en)
Korean (ko)
Other versions
KR20220024662A (ko
Inventor
케빈 커크함
케네스 페리
Original Assignee
오퍼 옵트로닉스 솔루션스 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 오퍼 옵트로닉스 솔루션스 리미티드 filed Critical 오퍼 옵트로닉스 솔루션스 리미티드
Publication of KR20220024662A publication Critical patent/KR20220024662A/ko
Application granted granted Critical
Publication of KR102778184B1 publication Critical patent/KR102778184B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0418—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using attenuators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/108—Beam splitting or combining systems for sampling a portion of a beam or combining a small beam in a larger one, e.g. wherein the area ratio or power ratio of the divided beams significantly differs from unity, without spectral selectivity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/281—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for attenuating light intensity, e.g. comprising rotatable polarising elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J2001/0276—Protection
    • G01J2001/0285—Protection against laser damage
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/0014—Monitoring arrangements not otherwise provided for

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lasers (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
KR1020227001705A 2019-06-22 2020-06-18 레이저 빔 프로파일링과 사용하기 위한 나노-텍스처 감쇠기 및 레이저 빔 특성화 시스템 및 사용 방법 Active KR102778184B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962865160P 2019-06-22 2019-06-22
US62/865,160 2019-06-22
PCT/US2020/038389 WO2020263667A1 (en) 2019-06-22 2020-06-18 Nano-textured attenuator for use with laser beam profiling and laser beam characterization systems and method of use

Publications (2)

Publication Number Publication Date
KR20220024662A KR20220024662A (ko) 2022-03-03
KR102778184B1 true KR102778184B1 (ko) 2025-03-11

Family

ID=74038466

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227001705A Active KR102778184B1 (ko) 2019-06-22 2020-06-18 레이저 빔 프로파일링과 사용하기 위한 나노-텍스처 감쇠기 및 레이저 빔 특성화 시스템 및 사용 방법

Country Status (7)

Country Link
US (2) US20200400965A1 (enExample)
EP (1) EP3987258A4 (enExample)
JP (1) JP7582980B2 (enExample)
KR (1) KR102778184B1 (enExample)
CN (1) CN114008418A (enExample)
TW (1) TWI848129B (enExample)
WO (1) WO2020263667A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102767094B1 (ko) * 2018-07-20 2025-02-13 오퍼 옵트로닉스 솔루션스 리미티드 다중-영상 레이저 빔 품질 측정의 초점 보정을 위한 방법 및 장치
US11874163B2 (en) 2022-01-14 2024-01-16 Ophir Optronics Solutions, Ltd. Laser measurement apparatus having a removable and replaceable beam dump
WO2024032997A1 (en) * 2022-08-10 2024-02-15 British Telecommunications Public Limited Company An electromagnetic field detector

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001174327A (ja) 1999-12-15 2001-06-29 Anritsu Corp 光検出装置
US20010028664A1 (en) 2000-01-25 2001-10-11 Klaus Vogler Energy monitor for molecular fluorine laser
US20010042840A1 (en) 2000-03-16 2001-11-22 Uwe Stamm Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser
JP2002188957A (ja) 2000-12-21 2002-07-05 Ando Electric Co Ltd 光パワーセンサ
JP2003522941A (ja) 2000-02-09 2003-07-29 ラムダ フィジーク アーゲー Ｖｕｖレーザビーム特徴付けシステム
WO2015011786A1 (ja) 2013-07-23 2015-01-29 日立マクセル株式会社 ナノ粒子薄膜を有する光学部品、及びこれを用いた光学応用装置
JP2017182065A (ja) 2016-03-29 2017-10-05 リコーイメージング株式会社 光学素子及びその製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5329350A (en) * 1992-05-21 1994-07-12 Photon, Inc. Measuring laser beam parameters using non-distorting attenuation and multiple simultaneous samples
US5371655A (en) * 1992-05-22 1994-12-06 Panavision International, L.P. System for varying light intensity such as for use in motion picture photography
JPH0815638A (ja) * 1994-06-29 1996-01-19 Toshiba Corp レーザ光学装置
US6497490B1 (en) * 1999-12-14 2002-12-24 Silicon Light Machines Laser beam attenuator and method of attenuating a laser beam
US7846152B2 (en) * 2004-03-24 2010-12-07 Amo Manufacturing Usa, Llc. Calibrating laser beam position and shape using an image capture device
JP4136739B2 (ja) 2003-03-19 2008-08-20 Ｈｏｙａ株式会社 光スポット検査装置
JP2005214752A (ja) 2004-01-29 2005-08-11 Orc Mfg Co Ltd レーザ光線測定装置
US8999857B2 (en) * 2010-04-02 2015-04-07 The Board Of Trustees Of The Leland Stanford Junior University Method for forming a nano-textured substrate
CN104238107A (zh) * 2014-07-07 2014-12-24 中国科学院上海光学精密机械研究所 数字化可调光衰减器
US10423047B2 (en) * 2016-07-27 2019-09-24 Coherent, Inc. Laser machining method and apparatus
WO2018237048A1 (en) * 2017-06-20 2018-12-27 Ipg Photonics Corporation High power integrated delivery cable
JP6955932B2 (ja) 2017-08-25 2021-10-27 株式会社ディスコ レーザービームプロファイラユニット及びレーザー加工装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001174327A (ja) 1999-12-15 2001-06-29 Anritsu Corp 光検出装置
US20010028664A1 (en) 2000-01-25 2001-10-11 Klaus Vogler Energy monitor for molecular fluorine laser
JP2003522941A (ja) 2000-02-09 2003-07-29 ラムダ フィジーク アーゲー Ｖｕｖレーザビーム特徴付けシステム
US20010042840A1 (en) 2000-03-16 2001-11-22 Uwe Stamm Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser
JP2002188957A (ja) 2000-12-21 2002-07-05 Ando Electric Co Ltd 光パワーセンサ
WO2015011786A1 (ja) 2013-07-23 2015-01-29 日立マクセル株式会社 ナノ粒子薄膜を有する光学部品、及びこれを用いた光学応用装置
JP2017182065A (ja) 2016-03-29 2017-10-05 リコーイメージング株式会社 光学素子及びその製造方法

Also Published As

Publication number Publication date
JP7582980B2 (ja) 2024-11-13
WO2020263667A9 (en) 2021-07-01
EP3987258A1 (en) 2022-04-27
KR20220024662A (ko) 2022-03-03
US20200400965A1 (en) 2020-12-24
EP3987258A4 (en) 2023-07-05
US20230296909A1 (en) 2023-09-21
TWI848129B (zh) 2024-07-11
JP2022537450A (ja) 2022-08-25
CN114008418A (zh) 2022-02-01
US12326572B2 (en) 2025-06-10
WO2020263667A1 (en) 2020-12-30
TW202112019A (zh) 2021-03-16

Similar Documents

Publication Publication Date Title
US12326572B2 (en) Nano-textured attenuator for use with laser beam profiling and laser beam characterization systems and method of use
US9791347B2 (en) Method and system for non-contact optical-power measurement
US8988669B2 (en) Power monitor for optical fiber using background scattering
US6548807B2 (en) Radiation receiver with active optical protection system
CN110646378A (zh) 用于表征弯曲的零件的棱镜耦合系统和方法
US20090103867A1 (en) Variable Optical Attenuator
CA1332291C (en) Optical power meter
CN103697920B (zh) 一种光纤传感头和基于该传感头的测量液体折射率的光纤传感系统及方法
JP3709313B2 (ja) 双方向通信光モジュール用素子及びその検査方法
KR100459998B1 (ko) 광 도파로의 손실 및 모드패턴 측정시스템
EP1136799A2 (en) Method for processing low coherence interferometric data
JP3148332B2 (ja) 導波路型光デバイス動作特性評価方法
CN107588917A (zh) 一种可调光学滤波器的在线冲击振动测试系统
CN107543610B (zh) 一种可见光纤光谱仪的灵敏度测量装置
JPH07225151A (ja) レーザ出力測定装置
EP0948150A2 (en) Light monitoring apparatus with simple structure
JPS61113034A (ja) 音響光学スイツチ
JP2006038547A (ja) 薄膜フィルタの評価方法
JP2000121877A (ja) 定偏波ファイバ用アダプタ
Chen et al. Characterization of Hole-Assisted Fibers as Single Polarization Fibers and Polarization Maintaining Fibers
SBZ Laser shutter can handle IO kW of CO2 power

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20220117

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20241106

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20250226

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20250304

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20250305

End annual number: 3

Start annual number: 1

PG1601 Publication of registration