JP7582980B2 - レーザビームプロファイリング及びレーザビーム特性評価システムとともに使用されるナノテクスチャ減衰器及びその使用方法 - Google Patents

レーザビームプロファイリング及びレーザビーム特性評価システムとともに使用されるナノテクスチャ減衰器及びその使用方法 Download PDF

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JP7582980B2
JP7582980B2 JP2021576284A JP2021576284A JP7582980B2 JP 7582980 B2 JP7582980 B2 JP 7582980B2 JP 2021576284 A JP2021576284 A JP 2021576284A JP 2021576284 A JP2021576284 A JP 2021576284A JP 7582980 B2 JP7582980 B2 JP 7582980B2
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attenuator
nano
measurement
attenuated
textured
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JP2022537450A5 (enExample
JP2022537450A (ja
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カーカム，ケビン
フェレ，ケネス
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オフィール オプトロニクス ソリューションズ リミテッド
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0418—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using attenuators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/108—Beam splitting or combining systems for sampling a portion of a beam or combining a small beam in a larger one, e.g. wherein the area ratio or power ratio of the divided beams significantly differs from unity, without spectral selectivity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/281—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for attenuating light intensity, e.g. comprising rotatable polarising elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J2001/0276—Protection
    • G01J2001/0285—Protection against laser damage
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/0014—Monitoring arrangements not otherwise provided for

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lasers (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2021576284A 2019-06-22 2020-06-18 レーザビームプロファイリング及びレーザビーム特性評価システムとともに使用されるナノテクスチャ減衰器及びその使用方法 Active JP7582980B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962865160P 2019-06-22 2019-06-22
US62/865,160 2019-06-22
PCT/US2020/038389 WO2020263667A1 (en) 2019-06-22 2020-06-18 Nano-textured attenuator for use with laser beam profiling and laser beam characterization systems and method of use

Publications (3)

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JP2022537450A JP2022537450A (ja) 2022-08-25
JP2022537450A5 JP2022537450A5 (enExample) 2023-06-27
JP7582980B2 true JP7582980B2 (ja) 2024-11-13

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US (2) US20200400965A1 (enExample)
EP (1) EP3987258A4 (enExample)
JP (1) JP7582980B2 (enExample)
KR (1) KR102778184B1 (enExample)
CN (1) CN114008418A (enExample)
TW (1) TWI848129B (enExample)
WO (1) WO2020263667A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102767094B1 (ko) * 2018-07-20 2025-02-13 오퍼 옵트로닉스 솔루션스 리미티드 다중-영상 레이저 빔 품질 측정의 초점 보정을 위한 방법 및 장치
US11874163B2 (en) 2022-01-14 2024-01-16 Ophir Optronics Solutions, Ltd. Laser measurement apparatus having a removable and replaceable beam dump
WO2024032997A1 (en) * 2022-08-10 2024-02-15 British Telecommunications Public Limited Company An electromagnetic field detector

Citations (8)

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JP2001174327A (ja) 1999-12-15 2001-06-29 Anritsu Corp 光検出装置
JP2002188957A (ja) 2000-12-21 2002-07-05 Ando Electric Co Ltd 光パワーセンサ
JP2003522941A (ja) 2000-02-09 2003-07-29 ラムダ フィジーク アーゲー Ｖｕｖレーザビーム特徴付けシステム
JP2004279369A (ja) 2003-03-19 2004-10-07 Pentax Corp 光スポット検査装置
JP2005214752A (ja) 2004-01-29 2005-08-11 Orc Mfg Co Ltd レーザ光線測定装置
WO2015011786A1 (ja) 2013-07-23 2015-01-29 日立マクセル株式会社 ナノ粒子薄膜を有する光学部品、及びこれを用いた光学応用装置
JP2017182065A (ja) 2016-03-29 2017-10-05 リコーイメージング株式会社 光学素子及びその製造方法
JP2019039830A (ja) 2017-08-25 2019-03-14 株式会社ディスコ レーザービームプロファイラユニット及びレーザー加工装置

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US5329350A (en) * 1992-05-21 1994-07-12 Photon, Inc. Measuring laser beam parameters using non-distorting attenuation and multiple simultaneous samples
US5371655A (en) * 1992-05-22 1994-12-06 Panavision International, L.P. System for varying light intensity such as for use in motion picture photography
JPH0815638A (ja) * 1994-06-29 1996-01-19 Toshiba Corp レーザ光学装置
US6497490B1 (en) * 1999-12-14 2002-12-24 Silicon Light Machines Laser beam attenuator and method of attenuating a laser beam
KR20020030736A (ko) * 2000-01-25 2002-04-25 추후제출 분자 불소 레이저용 에너지 감시 장치
US6618403B2 (en) * 2000-03-16 2003-09-09 Lambda Physik Ag Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser
US7846152B2 (en) * 2004-03-24 2010-12-07 Amo Manufacturing Usa, Llc. Calibrating laser beam position and shape using an image capture device
US8999857B2 (en) * 2010-04-02 2015-04-07 The Board Of Trustees Of The Leland Stanford Junior University Method for forming a nano-textured substrate
CN104238107A (zh) * 2014-07-07 2014-12-24 中国科学院上海光学精密机械研究所 数字化可调光衰减器
US10423047B2 (en) * 2016-07-27 2019-09-24 Coherent, Inc. Laser machining method and apparatus
WO2018237048A1 (en) * 2017-06-20 2018-12-27 Ipg Photonics Corporation High power integrated delivery cable

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001174327A (ja) 1999-12-15 2001-06-29 Anritsu Corp 光検出装置
JP2003522941A (ja) 2000-02-09 2003-07-29 ラムダ フィジーク アーゲー Ｖｕｖレーザビーム特徴付けシステム
JP2002188957A (ja) 2000-12-21 2002-07-05 Ando Electric Co Ltd 光パワーセンサ
JP2004279369A (ja) 2003-03-19 2004-10-07 Pentax Corp 光スポット検査装置
JP2005214752A (ja) 2004-01-29 2005-08-11 Orc Mfg Co Ltd レーザ光線測定装置
WO2015011786A1 (ja) 2013-07-23 2015-01-29 日立マクセル株式会社 ナノ粒子薄膜を有する光学部品、及びこれを用いた光学応用装置
JP2017182065A (ja) 2016-03-29 2017-10-05 リコーイメージング株式会社 光学素子及びその製造方法
JP2019039830A (ja) 2017-08-25 2019-03-14 株式会社ディスコ レーザービームプロファイラユニット及びレーザー加工装置

Also Published As

Publication number Publication date
WO2020263667A9 (en) 2021-07-01
KR102778184B1 (ko) 2025-03-11
EP3987258A1 (en) 2022-04-27
KR20220024662A (ko) 2022-03-03
US20200400965A1 (en) 2020-12-24
EP3987258A4 (en) 2023-07-05
US20230296909A1 (en) 2023-09-21
TWI848129B (zh) 2024-07-11
JP2022537450A (ja) 2022-08-25
CN114008418A (zh) 2022-02-01
US12326572B2 (en) 2025-06-10
WO2020263667A1 (en) 2020-12-30
TW202112019A (zh) 2021-03-16

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