JP2022537450A5 - - Google Patents

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Publication number
JP2022537450A5
JP2022537450A5 JP2021576284A JP2021576284A JP2022537450A5 JP 2022537450 A5 JP2022537450 A5 JP 2022537450A5 JP 2021576284 A JP2021576284 A JP 2021576284A JP 2021576284 A JP2021576284 A JP 2021576284A JP 2022537450 A5 JP2022537450 A5 JP 2022537450A5
Authority
JP
Japan
Prior art keywords
attenuator
filter body
filter
measurement signal
beam path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021576284A
Other languages
English (en)
Japanese (ja)
Other versions
JP7582980B2 (ja
JP2022537450A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2020/038389 external-priority patent/WO2020263667A1/en
Publication of JP2022537450A publication Critical patent/JP2022537450A/ja
Publication of JP2022537450A5 publication Critical patent/JP2022537450A5/ja
Application granted granted Critical
Publication of JP7582980B2 publication Critical patent/JP7582980B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2021576284A 2019-06-22 2020-06-18 レーザビームプロファイリング及びレーザビーム特性評価システムとともに使用されるナノテクスチャ減衰器及びその使用方法 Active JP7582980B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962865160P 2019-06-22 2019-06-22
US62/865,160 2019-06-22
PCT/US2020/038389 WO2020263667A1 (en) 2019-06-22 2020-06-18 Nano-textured attenuator for use with laser beam profiling and laser beam characterization systems and method of use

Publications (3)

Publication Number Publication Date
JP2022537450A JP2022537450A (ja) 2022-08-25
JP2022537450A5 true JP2022537450A5 (enExample) 2023-06-27
JP7582980B2 JP7582980B2 (ja) 2024-11-13

Family

ID=74038466

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021576284A Active JP7582980B2 (ja) 2019-06-22 2020-06-18 レーザビームプロファイリング及びレーザビーム特性評価システムとともに使用されるナノテクスチャ減衰器及びその使用方法

Country Status (7)

Country Link
US (2) US20200400965A1 (enExample)
EP (1) EP3987258A4 (enExample)
JP (1) JP7582980B2 (enExample)
KR (1) KR102778184B1 (enExample)
CN (1) CN114008418A (enExample)
TW (1) TWI848129B (enExample)
WO (1) WO2020263667A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102767094B1 (ko) * 2018-07-20 2025-02-13 오퍼 옵트로닉스 솔루션스 리미티드 다중-영상 레이저 빔 품질 측정의 초점 보정을 위한 방법 및 장치
US11874163B2 (en) 2022-01-14 2024-01-16 Ophir Optronics Solutions, Ltd. Laser measurement apparatus having a removable and replaceable beam dump
WO2024032997A1 (en) * 2022-08-10 2024-02-15 British Telecommunications Public Limited Company An electromagnetic field detector

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5329350A (en) * 1992-05-21 1994-07-12 Photon, Inc. Measuring laser beam parameters using non-distorting attenuation and multiple simultaneous samples
US5371655A (en) * 1992-05-22 1994-12-06 Panavision International, L.P. System for varying light intensity such as for use in motion picture photography
JPH0815638A (ja) * 1994-06-29 1996-01-19 Toshiba Corp レーザ光学装置
US6497490B1 (en) * 1999-12-14 2002-12-24 Silicon Light Machines Laser beam attenuator and method of attenuating a laser beam
JP2001174327A (ja) * 1999-12-15 2001-06-29 Anritsu Corp 光検出装置
KR20020030736A (ko) * 2000-01-25 2002-04-25 추후제출 분자 불소 레이저용 에너지 감시 장치
WO2001059414A1 (en) 2000-02-09 2001-08-16 Lambda Physik Ag Vuv laser beam characterization system
US6618403B2 (en) * 2000-03-16 2003-09-09 Lambda Physik Ag Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser
JP2002188957A (ja) * 2000-12-21 2002-07-05 Ando Electric Co Ltd 光パワーセンサ
US7846152B2 (en) * 2004-03-24 2010-12-07 Amo Manufacturing Usa, Llc. Calibrating laser beam position and shape using an image capture device
JP4136739B2 (ja) 2003-03-19 2008-08-20 Ｈｏｙａ株式会社 光スポット検査装置
JP2005214752A (ja) 2004-01-29 2005-08-11 Orc Mfg Co Ltd レーザ光線測定装置
US8999857B2 (en) * 2010-04-02 2015-04-07 The Board Of Trustees Of The Leland Stanford Junior University Method for forming a nano-textured substrate
WO2015011786A1 (ja) * 2013-07-23 2015-01-29 日立マクセル株式会社 ナノ粒子薄膜を有する光学部品、及びこれを用いた光学応用装置
CN104238107A (zh) * 2014-07-07 2014-12-24 中国科学院上海光学精密机械研究所 数字化可调光衰减器
JP6903994B2 (ja) * 2016-03-29 2021-07-14 リコーイメージング株式会社 光学素子及びその製造方法
US10423047B2 (en) * 2016-07-27 2019-09-24 Coherent, Inc. Laser machining method and apparatus
WO2018237048A1 (en) * 2017-06-20 2018-12-27 Ipg Photonics Corporation High power integrated delivery cable
JP6955932B2 (ja) 2017-08-25 2021-10-27 株式会社ディスコ レーザービームプロファイラユニット及びレーザー加工装置

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