TWI832986B - 具有高長寬比孔洞及高孔洞密度的氣體分佈板 - Google Patents

具有高長寬比孔洞及高孔洞密度的氣體分佈板 Download PDF

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Publication number
TWI832986B
TWI832986B TW109107594A TW109107594A TWI832986B TW I832986 B TWI832986 B TW I832986B TW 109107594 A TW109107594 A TW 109107594A TW 109107594 A TW109107594 A TW 109107594A TW I832986 B TWI832986 B TW I832986B
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TW
Taiwan
Prior art keywords
diameter
holes
plate
hole
gas distribution
Prior art date
Application number
TW109107594A
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English (en)
Chinese (zh)
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TW202039088A (zh
Inventor
蘇密特 阿加瓦爾
桑傑夫 巴魯札
查德 彼得森
麥可R 萊斯
Original Assignee
美商應用材料股份有限公司
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Publication of TW202039088A publication Critical patent/TW202039088A/zh
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Publication of TWI832986B publication Critical patent/TWI832986B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00—Soldering, e.g. brazing, or unsoldering
    • B23K1/0008—Soldering, e.g. brazing, or unsoldering specially adapted for particular articles or work
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
TW109107594A 2019-03-27 2020-03-09 具有高長寬比孔洞及高孔洞密度的氣體分佈板 TWI832986B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201962824369P 2019-03-27 2019-03-27
US62/824,369 2019-03-27

Publications (2)

Publication Number Publication Date
TW202039088A TW202039088A (zh) 2020-11-01
TWI832986B true TWI832986B (zh) 2024-02-21

Family

ID=72607016

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109107594A TWI832986B (zh) 2019-03-27 2020-03-09 具有高長寬比孔洞及高孔洞密度的氣體分佈板

Country Status (7)

Country Link
US (2) US11332827B2 (enExample)
JP (1) JP7781639B2 (enExample)
KR (1) KR102865277B1 (enExample)
CN (1) CN113508191B (enExample)
SG (1) SG11202108874QA (enExample)
TW (1) TWI832986B (enExample)
WO (1) WO2020197684A1 (enExample)

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US12479775B2 (en) * 2023-03-07 2025-11-25 Rtx Corporation Chemical vapor infiltration tooling for optimizing infiltration in ceramic matrix composites
US12503759B2 (en) 2023-03-07 2025-12-23 Rtx Corporation Chemical vapor infiltration tooling hole modification for optimizing infiltration in ceramic matrix composites
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Also Published As

Publication number Publication date
US11332827B2 (en) 2022-05-17
TW202039088A (zh) 2020-11-01
KR20210133302A (ko) 2021-11-05
JP2022527694A (ja) 2022-06-03
CN113508191B (zh) 2024-06-11
US20200308703A1 (en) 2020-10-01
KR102865277B1 (ko) 2025-09-25
WO2020197684A1 (en) 2020-10-01
US20220380898A1 (en) 2022-12-01
JP7781639B2 (ja) 2025-12-08
SG11202108874QA (en) 2021-10-28
CN113508191A (zh) 2021-10-15

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