TWI829830B - 感光性著色組合物、硬化物、著色間隔物、及圖像顯示裝置 - Google Patents

感光性著色組合物、硬化物、著色間隔物、及圖像顯示裝置 Download PDF

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Publication number
TWI829830B
TWI829830B TW108145974A TW108145974A TWI829830B TW I829830 B TWI829830 B TW I829830B TW 108145974 A TW108145974 A TW 108145974A TW 108145974 A TW108145974 A TW 108145974A TW I829830 B TWI829830 B TW I829830B
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Taiwan
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TW108145974A
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Chinese (zh)
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TW202035467A (zh
Inventor
中谷和裕
小川善秀
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日商三菱化學股份有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
TW108145974A 2018-12-18 2019-12-16 感光性著色組合物、硬化物、著色間隔物、及圖像顯示裝置 TWI829830B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018236121 2018-12-18
JP2018-236121 2018-12-18

Publications (2)

Publication Number Publication Date
TW202035467A TW202035467A (zh) 2020-10-01
TWI829830B true TWI829830B (zh) 2024-01-21

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TW108145974A TWI829830B (zh) 2018-12-18 2019-12-16 感光性著色組合物、硬化物、著色間隔物、及圖像顯示裝置

Country Status (5)

Country Link
JP (1) JP7375773B2 (ko)
KR (1) KR20210105876A (ko)
CN (1) CN113168094B (ko)
TW (1) TWI829830B (ko)
WO (1) WO2020129807A1 (ko)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201715305A (zh) * 2015-09-29 2017-05-01 Fujifilm Corp 感光性組成物、硬化膜、紅外線截止濾波器、紅外線透過濾波器、硬化膜的製造方法、固體攝像元件、紅外線感測器、固體攝像元件的製造方法及紅外線感測器的製造方法

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JPH08234212A (ja) 1995-02-28 1996-09-13 Casio Comput Co Ltd 液晶表示素子
JP4461681B2 (ja) 2002-01-29 2010-05-12 東洋インキ製造株式会社 カラーフィルタ用着色組成物およびカラーフィルタ
JP3912405B2 (ja) 2003-11-11 2007-05-09 三菱化学株式会社 硬化性組成物、硬化物、カラーフィルタ及び液晶表示装置
JP2011215186A (ja) 2010-03-31 2011-10-27 Dainippon Printing Co Ltd カラーフィルタ用紫色顔料分散液、カラーフィルタ用青色感光性樹脂組成物及びその製造方法、カラーフィルタ、及び液晶表示装置
JP6036708B2 (ja) 2012-01-31 2016-11-30 三菱化学株式会社 着色感光性組成物、ブラックフォトスペーサー、及びカラーフィルター
JP2015038607A (ja) 2013-07-16 2015-02-26 三菱化学株式会社 感光性組成物、硬化物、スペーサー及び画像表示装置
WO2015046332A1 (ja) 2013-09-25 2015-04-02 東京応化工業株式会社 感放射線性組成物及びパターン製造方法
JP2015143797A (ja) * 2014-01-31 2015-08-06 東洋インキScホールディングス株式会社 有機el表示装置用着色組成物、カラーフィルタ、および有機el表示装置
JP2018183878A (ja) * 2015-09-24 2018-11-22 日立化成株式会社 積層体及びその製造方法、フィルムセット、並びに、感光性導電フィルム
JP2018009132A (ja) 2016-07-15 2018-01-18 Jsr株式会社 着色組成物、着色硬化膜及びその形成方法、並びに表示素子
JP2018025681A (ja) * 2016-08-10 2018-02-15 Jsr株式会社 カラーフィルタ及び表示素子
CN109923475B (zh) * 2016-10-14 2022-12-02 三菱化学株式会社 感光性着色组合物、固化物、着色间隔物、图像显示装置
US11360386B2 (en) * 2016-12-22 2022-06-14 Toray Industries, Inc. Organic EL display device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201715305A (zh) * 2015-09-29 2017-05-01 Fujifilm Corp 感光性組成物、硬化膜、紅外線截止濾波器、紅外線透過濾波器、硬化膜的製造方法、固體攝像元件、紅外線感測器、固體攝像元件的製造方法及紅外線感測器的製造方法

Also Published As

Publication number Publication date
CN113168094B (zh) 2024-06-11
JP7375773B2 (ja) 2023-11-08
TW202035467A (zh) 2020-10-01
CN113168094A (zh) 2021-07-23
WO2020129807A1 (ja) 2020-06-25
KR20210105876A (ko) 2021-08-27
JPWO2020129807A1 (ja) 2021-10-28

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