TWI812785B - 金剛石基板生成方法 - Google Patents
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Abstract
[課題]提供一種金剛石基板生成方法,能夠低成本地從金剛石晶棒高效率地生成金剛石基板。[解決手段]一種金剛石基板生成方法,包含:剝離帶形成步驟,一邊在正交於結晶面(110)的[110]方向上使金剛石晶棒2與聚光點FP相對地移動,一邊將雷射光束LB照射至金剛石晶棒2以形成剝離帶22;分度進給步驟,在與結晶面(001)平行且與[110]方向正交的方向上,將金剛石晶棒2與聚光點FP相對地分度進給;剝離層形成步驟,反覆實施該剝離帶形成步驟及該分度進給步驟,以在金剛石晶棒2的內部形成平行於結晶面(001)的剝離層24;以及剝離步驟,從金剛石晶棒2的剝離層24將要生成的金剛石基板剝離。
Description
本發明是關於一種金剛石基板生成方法,從以結晶面(001)作為平坦面的金剛石晶棒生成金剛石基板。
IC、LSI等多個元件是在Si(矽)等晶圓形狀半導體基板的上表面層積功能層,並藉由多條交叉的分割預定線劃分而形成在該功能層上,此半導體晶圓藉由切割裝置、雷射加工裝置而分割成一個個元件晶片,經分割的各元件晶片使用於行動電話、個人電腦等電子設備上。
近年來,由於絕緣耐壓、熱傳導率、物理特性優異而利用金剛石作為半導體基板受到了注目(例如參照下述專利文獻1及2)。
[習知技術文獻]
[專利文獻]
[專利文獻1]日本特開2008-78611號公報
[專利文獻2]日本特開2015-57824號公報
[發明所欲解決的課題]
然而,從金剛石晶棒有效率地生成金剛石基板的技術仍在開發中,金剛石基板有昂貴且不經濟的問題。
因此,本發明的目的是提供一種金剛石基板生成方法,能夠低成本地從金剛石晶棒高效率地生成金剛石基板。
[解決課題的技術手段]
根據本發明,提供一種金剛石基板生成方法,從以結晶面(001)作為平坦面的金剛石晶棒生成金剛石基板,該金剛石基板生成方法具備:聚光點定位步驟,將對金剛石具有穿透性之波長的雷射光束的聚光點,從該平坦面定位至相當於要生成之金剛石基板厚度的深度;剝離帶形成步驟,在實施該聚光點定位步驟後,一邊使金剛石晶棒與聚光點在正交於結晶面(110)的[110]方向上相對地移動,一邊將雷射光束照射至金剛石晶棒以形成剝離帶;分度進給步驟,在實施該剝離帶形成步驟後,在與結晶面(001)平行且與[110]方向正交的方向上,將金剛石晶棒與聚光點相對地分度進給;剝離層形成步驟,反覆實施該剝離帶形成步驟及該分度進給步驟,以在金剛石晶棒的內部形成平行於結晶面(001)的剝離層;以及剝離步驟,在實施該剝離層形成步驟後,從金剛石晶棒的該剝離層將要生成的金剛石基板剝離。
較佳為,在該分度進給步驟中,以相鄰的剝離帶會接觸的方式分度進給。
[發明功效]
根據本發明的金剛石基板生成方法,能夠低成本地從金剛石晶棒高效率地生成金剛石基板。
以下,參照圖式並說明關於本發明之金剛石基板生成方法的較佳實施方式。
在圖1中表示出可實施本發明之金剛石基板生成方法的金剛石晶棒2。金剛石晶棒2整體形成為圓柱形,並且具有以結晶面(001)作為平坦面之圓形的第一端面4,與第一端面4相反側之圓形的第二端面6,以及位於第一端面4與第二端面6之間的周面8。在金剛石晶棒2的周面8上,形成有與結晶面(110)平行之矩形的定向平面10。此外,正交於結晶面(110)的[110]方向在圖1中以箭頭表示。
在本實施方式中,首先實施聚光點定位步驟,將對金剛石具有穿透性之波長的雷射光束的聚光點,從平坦面定位至相當於要生成之金剛石基板厚度的深度。聚光點定位步驟能夠使用例如圖2中示出局部的雷射加工裝置12來實施。
雷射加工裝置12具備:保持台14,其保持金剛石晶棒2;以及聚光器16,其將對金剛石具有穿透性之波長的脈衝雷射光束LB照射至保持在保持台14上的金剛石晶棒2。保持台14構成為以在上下方向延伸的軸線為中心旋轉自如,並且構成為分別在圖2中以箭頭X表示的X軸方向和正交於X軸方向的Y軸方向(圖2中以箭頭Y表示的方向)上進退自如。此外,保持台14構成為從雷射加工裝置12的加工區域至後述的剝離裝置26移動自如。另外,X軸方向及Y軸方向所界定的平面實質上是水平的。
在本實施方式的聚光點定位步驟中,首先,將金剛石晶棒2透過適當的接著劑(例如環氧樹脂系接著劑)固定在保持台14的上表面。另外,也可以在保持台14的上表面形成多個吸引孔,並在保持台14的上表面產生吸引力以將金剛石晶棒2吸引保持。接下來,以雷射加工裝置12的攝像單元(未圖示)從上方拍攝金剛石晶棒2,並基於以攝像單元拍攝到的金剛石晶棒2的影像,藉由使保持台14旋轉及移動,將金剛石晶棒2的方向調整至預定的方向,並且調整金剛石晶棒2與聚光器16在XY平面中的位置。在將金剛石晶棒2的方向調整至預定方向時,如圖2(a)所示,藉由使定向平面10對齊Y軸方向,使正交於結晶面(110)的[110]方向對齊X軸方向。接著,如圖2(b)所示,以雷射加工裝置12的聚光點位置調整手段(未圖示)使聚光器16升降,將對金剛石具有穿透性之波長的脈衝雷射光束LB的聚光點FP,從平坦的第一端面4定位至相當於要生成之金剛石基板厚度的深度(例如200μm)。
在實施聚光點定位步驟後,實施剝離帶形成步驟:一邊使金剛石晶棒2與聚光點FP在正交於結晶面(110)的[110]方向上相對地移動,一邊將雷射光束LB照射至金剛石晶棒2以形成剝離帶。
在本實施方式的剝離帶形成步驟中,一邊使保持台14以預定的進給速度在X軸方向上移動,一邊從聚光器16將對金剛石具有穿透性之波長的脈衝雷射光束LB照射至金剛石晶棒2,上述X軸方向對齊正交於結晶面(110)的[110]方向。如此一來,如圖2(c)所示,藉由脈衝雷射光束LB的照射破壞結晶結構,並且沿著[110]方向形成裂痕20從結晶結構被破壞的部分18等向性伸展之剝離帶22。另外,在剝離帶形成步驟中,也可以使聚光器16代替保持台14移動。
接下來,實施分度進給步驟:在與結晶面(001)平行且與[110]方向正交的方向上,將金剛石晶棒2與聚光點FP相對地分度進給。在本實施方式的分度進給步驟中,將保持台14在與[110]方向正交的Y軸方向上分度進給預定分度量Li。另外,在分度進給步驟中,也可以使聚光器16代替保持台14分度進給。
然後,實施剝離層形成步驟:反覆實施多次剝離帶形成步驟及分度進給步驟,以在金剛石晶棒2的內部形成平行於結晶面(001)的剝離層。藉此,如圖2(c)所示,能夠在金剛石晶棒2的內部形成由多條剝離帶22所構成強度降低的剝離層24。另外,在圖2(c)中,雖在相鄰剝離帶22的裂痕20之間設有間隙,但較佳為在分度進給步驟中,以相鄰的剝離帶22會接觸的方式進行分度進給。藉此,能夠使相鄰的剝離帶22彼此連接以使剝離層24的強度進一步降低,在下述剝離步驟中從金剛石晶棒2剝離金剛石基板變得容易。
此種剝離層形成步驟,能夠例如在以下的加工條件下進行。另外,下述遍數是對金剛石晶棒2的同一處進行脈衝雷射光束LB之照射的次數。
脈衝雷射光束的波長:1064nm
平均輸出:1.0W
重複頻率:30kHz
進給速度:350mm/s
遍數:2次
分度量:50μm
實施剝離層形成步驟後,實施剝離步驟:從金剛石晶棒2的剝離層24將要生成的金剛石基板剝離。剝離步驟能夠使用圖3中示出局部的剝離裝置26來實施。剝離裝置26包含實質上水平延伸的臂28,以及附設於臂28前端的馬達30。在馬達30的下表面連接有以延伸於上下方向的軸線為中心旋轉自如之圓盤狀的吸附片32。在構成為於下表面吸附工件的吸附片32中,內建有對吸附片32的下表面施加超音波振動的超音波振動施加手段(未圖示)。
參照圖3繼續說明,在剝離步驟中,首先使保持住金剛石晶棒2的保持台14移動至剝離裝置26的吸附片32之下方。接下來,使臂28下降,如圖3(b)所示,使吸附片32的下表面吸附在金剛石晶棒2的第一端面4(靠近剝離層24側的端面)。接著,使超音波振動施加手段作動,對吸附片32的下表面施加超音波振動,並且以馬達30使吸附片32旋轉。藉此,如圖3(c)所示,能夠從金剛石晶棒2的剝離層24將要生成的金剛石基板34剝離。另外,使用適當的平坦化裝置將金剛石基板34的剝離面36平坦化。
然後,在將已剝離金剛石基板34之金剛石晶棒2的剝離面38平坦化之後,藉由重複上述聚光點定位步驟、剝離帶形成步驟、分度進給步驟、剝離層形成步驟以及剝離步驟,能夠從金剛石晶棒2生成多片金剛石基板34。從而,在本實施方式,能夠低成本地從金剛石晶棒2高效率地生成金剛石基板34。
2:金剛石晶棒
18:結晶結構被破壞的部分
20:裂痕
22:剝離帶
24:剝離層
LB:雷射光束
FP:聚光點
圖1是金剛石晶棒的立體圖。
圖2(a)是表示實施剝離帶形成步驟之狀態的立體圖,(b)是表示實施剝離帶形成步驟之狀態的前視圖,(c)是形成有剝離帶之金剛石晶棒的剖面圖。
圖3(a)是表示將金剛石晶棒定位在剝離裝置下方之狀態的立體圖,(b)是表示實施剝離步驟之狀態的立體圖,(c)是金剛石晶棒及金剛石基板的立體圖。
2:金剛石晶棒
4:第一端面
6:第二端面
8:周面
10:定向平面
12:雷射加工裝置
14:保持台
16:聚光器
18:結晶結構被破壞的部分
20:裂痕
22:剝離帶
24:剝離層
LB:雷射光束
Li:分度量
FP:聚光點
Claims (2)
- 一種金剛石基板生成方法,從以結晶面(001)作為平坦面的金剛石晶棒生成金剛石基板,該金剛石基板生成方法具備: 聚光點定位步驟,將對金剛石具有穿透性之波長的雷射光束的聚光點,從該平坦面定位至相當於要生成之金剛石基板厚度的深度; 剝離帶形成步驟,在實施該聚光點定位步驟後,一邊使金剛石晶棒與聚光點在正交於結晶面(110)的[110]方向上相對地移動,一邊將雷射光束照射至金剛石晶棒以形成剝離帶; 分度進給步驟,在實施該剝離帶形成步驟後,在與結晶面(001)平行且與[110]方向正交的方向上,將金剛石晶棒與聚光點相對地分度進給; 剝離層形成步驟,反覆實施該剝離帶形成步驟及該分度進給步驟,以在金剛石晶棒的內部形成平行於結晶面(001)的剝離層;以及 剝離步驟,在實施該剝離層形成步驟後,從金剛石晶棒的該剝離層將要生成的金剛石基板剝離。
- 如申請專利範圍第1項所述之金剛石基板生成方法,其中,在該分度進給步驟中,以相鄰的該剝離帶會接觸的方式分度進給。
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US20200105543A1 (en) | 2020-04-02 |
US10950462B2 (en) | 2021-03-16 |
KR20200036731A (ko) | 2020-04-07 |
CN110961803B (zh) | 2022-09-30 |
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