TWI800614B - 過濾裝置、純化裝置及藥液的製造方法 - Google Patents
過濾裝置、純化裝置及藥液的製造方法 Download PDFInfo
- Publication number
- TWI800614B TWI800614B TW108108115A TW108108115A TWI800614B TW I800614 B TWI800614 B TW I800614B TW 108108115 A TW108108115 A TW 108108115A TW 108108115 A TW108108115 A TW 108108115A TW I800614 B TWI800614 B TW I800614B
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid medicine
- manufacturing liquid
- purification device
- filtration device
- filtration
- Prior art date
Links
- 239000003814 drug Substances 0.000 title 1
- 238000001914 filtration Methods 0.000 title 1
- 239000007788 liquid Substances 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 238000000746 purification Methods 0.000 title 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/58—Multistep processes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/14—Fractional distillation or use of a fractionation or rectification column
- B01D3/143—Fractional distillation or use of a fractionation or rectification column by two or more of a fractionation, separation or rectification step
- B01D3/145—One step being separation by permeation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D36/00—Filter circuits or combinations of filters with other separating devices
- B01D36/02—Combinations of filters of different kinds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/025—Reverse osmosis; Hyperfiltration
- B01D61/026—Reverse osmosis; Hyperfiltration comprising multiple reverse osmosis steps
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/027—Nanofiltration
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/145—Ultrafiltration
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/145—Ultrafiltration
- B01D61/146—Ultrafiltration comprising multiple ultrafiltration steps
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/16—Feed pretreatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/22—Controlling or regulating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
- B01D65/02—Membrane cleaning or sterilisation ; Membrane regeneration
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D67/0081—After-treatment of organic or inorganic membranes
- B01D67/0093—Chemical modification
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01D67/0081—After-treatment of organic or inorganic membranes
- B01D67/0093—Chemical modification
- B01D67/00931—Chemical modification by introduction of specific groups after membrane formation, e.g. by grafting
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- B01D69/02—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor characterised by their properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01D71/66—Polymers having sulfur in the main chain, with or without nitrogen, oxygen or carbon only
- B01D71/68—Polysulfones; Polyethersulfones
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- B01D71/06—Organic material
- B01D71/76—Macromolecular material not specifically provided for in a single one of groups B01D71/08 - B01D71/74
- B01D71/82—Macromolecular material not specifically provided for in a single one of groups B01D71/08 - B01D71/74 characterised by the presence of specified groups, e.g. introduced by chemical after-treatment
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
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- B01D2311/04—Specific process operations in the feed stream; Feed pretreatment
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- B01D2311/252—Recirculation of concentrate
- B01D2311/2523—Recirculation of concentrate to feed side
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- B01D2311/26—Further operations combined with membrane separation processes
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01D2325/02—Details relating to pores or porosity of the membranes
- B01D2325/022—Asymmetric membranes
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01D—SEPARATION
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- B01D2325/42—Ion-exchange membranes
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Water Supply & Treatment (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Nanotechnology (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Transplantation (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018055045 | 2018-03-22 | ||
JP2018-055045 | 2018-03-22 | ||
JP2018153253 | 2018-08-16 | ||
JP2018-153253 | 2018-08-16 |
Publications (2)
Publication Number | Publication Date |
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TW201940217A TW201940217A (zh) | 2019-10-16 |
TWI800614B true TWI800614B (zh) | 2023-05-01 |
Family
ID=67986108
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW108108115A TWI800614B (zh) | 2018-03-22 | 2019-03-12 | 過濾裝置、純化裝置及藥液的製造方法 |
TW112111895A TW202332497A (zh) | 2018-03-22 | 2019-03-12 | 過濾裝置、純化裝置及藥液的製造方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW112111895A TW202332497A (zh) | 2018-03-22 | 2019-03-12 | 過濾裝置、純化裝置及藥液的製造方法 |
Country Status (6)
Country | Link |
---|---|
US (2) | US11833475B2 (zh) |
JP (1) | JP7072634B2 (zh) |
KR (1) | KR102405561B1 (zh) |
CN (1) | CN111787995B (zh) |
TW (2) | TWI800614B (zh) |
WO (1) | WO2019181440A1 (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP7262601B2 (ja) * | 2019-09-27 | 2023-04-21 | 富士フイルム株式会社 | 感放射線性樹脂組成物の製造方法、パターン形成方法、電子デバイスの製造方法 |
CN114514471A (zh) * | 2019-10-09 | 2022-05-17 | 富士胶片株式会社 | 感放射线性树脂组合物的制造方法、图案形成方法及电子器件的制造方法 |
CN115298038A (zh) * | 2020-03-19 | 2022-11-04 | 富士胶片株式会社 | 非浸透性基材用预处理液、油墨组、图像记录用基材、图像记录用基材的制造方法、图像记录物及图像记录方法 |
JP2024033021A (ja) * | 2021-01-14 | 2024-03-13 | 日産化学株式会社 | 感光性樹脂組成物中の金属不純物を除去する金属除去フィルターを用いた金属除去方法 |
CN115181596B (zh) * | 2022-08-02 | 2023-10-27 | 合肥万豪能源设备有限责任公司 | 一种煤层气机械脱水装置 |
CN116464576B (zh) * | 2023-02-17 | 2024-03-22 | 北京星河动力装备科技有限公司 | 推进剂药浆过滤装置及挤压式固体发动机装药系统 |
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TW200424763A (en) * | 2002-12-19 | 2004-11-16 | Tokyo Ohka Kogyo Co Ltd | Producing method for photoresist composition, filtration equipment, application equipment, and photoresist composition |
TW200714645A (en) * | 2005-08-26 | 2007-04-16 | Entegris Inc | Porous membranes containing exchange resin |
TW201625357A (zh) * | 2014-11-20 | 2016-07-16 | 恩特格林斯公司 | 接枝超高分子量聚乙烯微孔膜 |
TW201807506A (zh) * | 2016-04-08 | 2018-03-01 | Fujifilm Corp | 處理液、其製造方法、圖案形成方法及電子器件的製造方法 |
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US4788043A (en) * | 1985-04-17 | 1988-11-29 | Tokuyama Soda Kabushiki Kaisha | Process for washing semiconductor substrate with organic solvent |
US5242468A (en) * | 1991-03-19 | 1993-09-07 | Startec Ventures, Inc. | Manufacture of high precision electronic components with ultra-high purity liquids |
JP3092864B2 (ja) * | 1991-05-09 | 2000-09-25 | 東燃化学株式会社 | 分離用膜及び分離方法 |
KR100796067B1 (ko) * | 2006-05-09 | 2008-01-21 | 울산화학주식회사 | 반도체 제조용 건식 에칭 개스 및 그의 제조방법 |
CN101820982A (zh) * | 2007-07-25 | 2010-09-01 | 理德尔技术公司 | 亲水膜 |
CN102423637B (zh) * | 2011-08-03 | 2013-09-25 | 浙江云涛生物技术股份有限公司 | 一种用于提纯樟脑磺酸液的膜分离系统及提纯方法 |
JP6075124B2 (ja) | 2012-03-15 | 2017-02-08 | Jsr株式会社 | 現像液の精製方法 |
EP2844374B1 (en) * | 2012-05-01 | 2018-09-19 | Entegris, Inc. | Organic solvent purifier and method of using |
ES2816948T3 (es) * | 2012-10-11 | 2021-04-06 | Evoqua Water Tech Llc | Membranas de intercambio iónico revestidas |
US9421498B2 (en) * | 2012-11-12 | 2016-08-23 | Pall Corporation | Systems and methods for conditioning a filter assembly |
CN102988989B (zh) * | 2012-12-20 | 2014-04-23 | 江苏久吾高科技股份有限公司 | 一种代血浆的膜分离精制提纯方法 |
CN103894066B (zh) * | 2014-03-27 | 2016-08-17 | 金发科技股份有限公司 | 一种用于纯化后处理母液的膜分离装置和方法 |
JP6404056B2 (ja) * | 2014-09-29 | 2018-10-10 | 東京応化工業株式会社 | 半導体フォトリソグラフィー用薬液の精製方法、半導体フォトリソグラフィー用薬液の精製装置、及び半導体フォトリソグラフィー用薬液 |
JP2016073922A (ja) * | 2014-10-07 | 2016-05-12 | 信越化学工業株式会社 | 有機溶剤の精製装置 |
JP6838347B2 (ja) * | 2015-12-24 | 2021-03-03 | 株式会社リコー | 洗浄液、インクと洗浄液のセット、洗浄液収容容器、インクジェット印刷装置、及びインクジェット印刷方法 |
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2019
- 2019-03-01 JP JP2020508129A patent/JP7072634B2/ja active Active
- 2019-03-01 CN CN201980016119.9A patent/CN111787995B/zh active Active
- 2019-03-01 WO PCT/JP2019/008146 patent/WO2019181440A1/ja active Application Filing
- 2019-03-01 KR KR1020207024595A patent/KR102405561B1/ko active IP Right Grant
- 2019-03-12 TW TW108108115A patent/TWI800614B/zh active
- 2019-03-12 TW TW112111895A patent/TW202332497A/zh unknown
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2020
- 2020-08-12 US US16/991,158 patent/US11833475B2/en active Active
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- 2023-09-29 US US18/477,662 patent/US20240050898A1/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200424763A (en) * | 2002-12-19 | 2004-11-16 | Tokyo Ohka Kogyo Co Ltd | Producing method for photoresist composition, filtration equipment, application equipment, and photoresist composition |
TW200714645A (en) * | 2005-08-26 | 2007-04-16 | Entegris Inc | Porous membranes containing exchange resin |
TW201625357A (zh) * | 2014-11-20 | 2016-07-16 | 恩特格林斯公司 | 接枝超高分子量聚乙烯微孔膜 |
TW201807506A (zh) * | 2016-04-08 | 2018-03-01 | Fujifilm Corp | 處理液、其製造方法、圖案形成方法及電子器件的製造方法 |
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US11833475B2 (en) | 2023-12-05 |
TW202332497A (zh) | 2023-08-16 |
US20200368691A1 (en) | 2020-11-26 |
US20240050898A1 (en) | 2024-02-15 |
JP7072634B2 (ja) | 2022-05-20 |
CN111787995B (zh) | 2022-06-17 |
WO2019181440A1 (ja) | 2019-09-26 |
TW201940217A (zh) | 2019-10-16 |
KR20200113255A (ko) | 2020-10-06 |
JPWO2019181440A1 (ja) | 2021-02-25 |
KR102405561B1 (ko) | 2022-06-08 |
CN111787995A (zh) | 2020-10-16 |
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