TWI799695B - 基板處理方法以及基板處理裝置 - Google Patents
基板處理方法以及基板處理裝置 Download PDFInfo
- Publication number
- TWI799695B TWI799695B TW109112893A TW109112893A TWI799695B TW I799695 B TWI799695 B TW I799695B TW 109112893 A TW109112893 A TW 109112893A TW 109112893 A TW109112893 A TW 109112893A TW I799695 B TWI799695 B TW I799695B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate processing
- processing device
- processing method
- substrate
- processing
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title 2
- 238000003672 processing method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019-079465 | 2019-04-18 | ||
JP2019079465A JP7208091B2 (ja) | 2019-04-18 | 2019-04-18 | 基板処理方法および基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202102314A TW202102314A (zh) | 2021-01-16 |
TWI799695B true TWI799695B (zh) | 2023-04-21 |
Family
ID=72837785
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109112893A TWI799695B (zh) | 2019-04-18 | 2020-04-17 | 基板處理方法以及基板處理裝置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7208091B2 (ja) |
KR (1) | KR102638814B1 (ja) |
CN (1) | CN113728416A (ja) |
TW (1) | TWI799695B (ja) |
WO (1) | WO2020213481A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7301662B2 (ja) | 2019-07-29 | 2023-07-03 | 株式会社Screenホールディングス | 基板処理方法および基板処理装置 |
JP2022178469A (ja) * | 2021-05-20 | 2022-12-02 | 株式会社Screenホールディングス | 基板処理方法および基板処理装置 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200823979A (en) * | 2006-09-20 | 2008-06-01 | Dainippon Screen Mfg | Substrate treatment apparatus and substrate treatment method |
CN100490060C (zh) * | 2006-06-19 | 2009-05-20 | 大日本网目版制造株式会社 | 基板处理方法以及基板处理装置 |
JP2010050143A (ja) * | 2008-08-19 | 2010-03-04 | Dainippon Screen Mfg Co Ltd | 基板処理方法および基板処理装置 |
JP2017117954A (ja) * | 2015-12-24 | 2017-06-29 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
TW201806010A (zh) * | 2016-08-08 | 2018-02-16 | 日商東京威力科創股份有限公司 | 液體處理方法、基板處理裝置及記錄媒體 |
TW201820396A (zh) * | 2016-11-18 | 2018-06-01 | 美商應用材料股份有限公司 | 乾燥高深寬比特徵 |
TWI626710B (zh) * | 2015-06-16 | 2018-06-11 | 思可林集團股份有限公司 | 基板處理方法及基板處理裝置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5043406B2 (ja) | 2006-11-21 | 2012-10-10 | 大日本スクリーン製造株式会社 | 基板乾燥方法および基板乾燥装置 |
JP6818607B2 (ja) * | 2017-03-27 | 2021-01-20 | 株式会社Screenホールディングス | 基板処理方法および基板処理装置 |
-
2019
- 2019-04-18 JP JP2019079465A patent/JP7208091B2/ja active Active
-
2020
- 2020-04-07 CN CN202080028876.0A patent/CN113728416A/zh active Pending
- 2020-04-07 WO PCT/JP2020/015689 patent/WO2020213481A1/ja active Application Filing
- 2020-04-07 KR KR1020217033017A patent/KR102638814B1/ko active IP Right Grant
- 2020-04-17 TW TW109112893A patent/TWI799695B/zh active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100490060C (zh) * | 2006-06-19 | 2009-05-20 | 大日本网目版制造株式会社 | 基板处理方法以及基板处理装置 |
TW200823979A (en) * | 2006-09-20 | 2008-06-01 | Dainippon Screen Mfg | Substrate treatment apparatus and substrate treatment method |
JP2010050143A (ja) * | 2008-08-19 | 2010-03-04 | Dainippon Screen Mfg Co Ltd | 基板処理方法および基板処理装置 |
TWI626710B (zh) * | 2015-06-16 | 2018-06-11 | 思可林集團股份有限公司 | 基板處理方法及基板處理裝置 |
JP2017117954A (ja) * | 2015-12-24 | 2017-06-29 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
TW201909248A (zh) * | 2015-12-24 | 2019-03-01 | 日商斯庫林集團股份有限公司 | 基板處理裝置及基板處理方法 |
TW201806010A (zh) * | 2016-08-08 | 2018-02-16 | 日商東京威力科創股份有限公司 | 液體處理方法、基板處理裝置及記錄媒體 |
TW201820396A (zh) * | 2016-11-18 | 2018-06-01 | 美商應用材料股份有限公司 | 乾燥高深寬比特徵 |
Also Published As
Publication number | Publication date |
---|---|
JP2020178046A (ja) | 2020-10-29 |
WO2020213481A1 (ja) | 2020-10-22 |
TW202102314A (zh) | 2021-01-16 |
KR102638814B1 (ko) | 2024-02-20 |
CN113728416A (zh) | 2021-11-30 |
JP7208091B2 (ja) | 2023-01-18 |
KR20210137182A (ko) | 2021-11-17 |
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