TWI785095B - 被處理體之處理方法 - Google Patents

被處理體之處理方法 Download PDF

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TWI785095B
TWI785095B TW107128535A TW107128535A TWI785095B TW I785095 B TWI785095 B TW I785095B TW 107128535 A TW107128535 A TW 107128535A TW 107128535 A TW107128535 A TW 107128535A TW I785095 B TWI785095 B TW I785095B
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Taiwan
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film
gas
processing
hole
plasma
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TW107128535A
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Chinese (zh)
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TW201920716A (zh
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田端雅弘
久松亨
木原嘉英
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日商東京威力科創股份有限公司
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    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/28008—Making conductor-insulator-semiconductor electrodes
    • H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
    • H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
    • H01L21/28123—Lithography-related aspects, e.g. sub-lithography lengths; Isolation-related aspects, e.g. to solve problems arising at the crossing with the side of the device isolation; Planarisation aspects
    • H01L21/28132—Lithography-related aspects, e.g. sub-lithography lengths; Isolation-related aspects, e.g. to solve problems arising at the crossing with the side of the device isolation; Planarisation aspects conducting part of electrode is difined by a sidewall spacer or a similar technique, e.g. oxidation under mask, plating

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CN109427561A (zh) 2019-03-05
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