TWI745431B - 感光性樹脂組合物、硬化物及圖像顯示裝置 - Google Patents

感光性樹脂組合物、硬化物及圖像顯示裝置 Download PDF

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Publication number
TWI745431B
TWI745431B TW106131771A TW106131771A TWI745431B TW I745431 B TWI745431 B TW I745431B TW 106131771 A TW106131771 A TW 106131771A TW 106131771 A TW106131771 A TW 106131771A TW I745431 B TWI745431 B TW I745431B
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Taiwan
Prior art keywords
ring
photopolymerization initiator
mass
resin composition
photosensitive resin
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TW106131771A
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English (en)
Chinese (zh)
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TW201818152A (zh
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植松卓也
関口直人
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日商三菱化學股份有限公司
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/88—Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D307/78—Benzo [b] furans; Hydrogenated benzo [b] furans
    • C07D307/79—Benzo [b] furans; Hydrogenated benzo [b] furans with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
    • C07D307/80—Radicals substituted by oxygen atoms

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Structural Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
TW106131771A 2016-09-16 2017-09-15 感光性樹脂組合物、硬化物及圖像顯示裝置 TWI745431B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016181932 2016-09-16
JP??2016-181932 2016-09-16

Publications (2)

Publication Number Publication Date
TW201818152A TW201818152A (zh) 2018-05-16
TWI745431B true TWI745431B (zh) 2021-11-11

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ID=61619574

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TW106131771A TWI745431B (zh) 2016-09-16 2017-09-15 感光性樹脂組合物、硬化物及圖像顯示裝置

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JP (3) JP6341351B1 (es)
KR (1) KR102402726B1 (es)
CN (1) CN109791357B (es)
TW (1) TWI745431B (es)
WO (1) WO2018052024A1 (es)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101848567B1 (ko) * 2016-11-18 2018-04-12 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이로부터 제조된 차광성 스페이서
WO2019065456A1 (ja) * 2017-09-26 2019-04-04 富士フイルム株式会社 硬化性組成物、硬化膜、固体撮像装置、及び、硬化膜の製造方法
JP7272267B2 (ja) * 2017-09-27 2023-05-12 三菱ケミカル株式会社 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置
JPWO2020196139A1 (es) * 2019-03-27 2020-10-01
JPWO2021006315A1 (es) 2019-07-10 2021-01-14
JP7382768B2 (ja) * 2019-09-06 2023-11-17 日鉄ケミカル＆マテリアル株式会社 ブラックレジスト用感光性樹脂組成物及びその硬化塗膜、並びにカラーフィルター遮光膜の製造方法
JP2021047216A (ja) * 2019-09-17 2021-03-25 Jsr株式会社 硬化性組成物
JP7453023B2 (ja) 2020-03-12 2024-03-19 東京応化工業株式会社 着色感光性組成物、着色膜及び着色膜の製造方法
WO2024004732A1 (ja) * 2022-06-29 2024-01-04 富士フイルム株式会社 感光性組成物、膜、光学フィルタ、固体撮像素子および画像表示装置

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TW201042378A (en) * 2009-04-01 2010-12-01 Toyo Ink Mfg Co Photosensitive colored composition and color filter
WO2011030645A1 (ja) * 2009-09-14 2011-03-17 富士フイルム株式会社 光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、液晶表示装置、平版印刷版原版、並びに、新規化合物
TW201430040A (zh) * 2012-11-01 2014-08-01 Adeka Corp 鹼性顯影性感光性組合物
JP2015045686A (ja) * 2013-08-27 2015-03-12 凸版印刷株式会社 感光性樹脂組成物、カラーフィルタ及び液晶表示装置
TW201535051A (zh) * 2014-03-11 2015-09-16 Dongwoo Fine Chem Co Ltd 藍色感光性樹脂組合物、藍色濾光片和具有其的顯示裝置
WO2016010036A1 (ja) * 2014-07-15 2016-01-21 東京応化工業株式会社 感光性組成物及び化合物

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US20090292039A1 (en) 2006-12-27 2009-11-26 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the same
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JP2010204174A (ja) * 2009-02-27 2010-09-16 Fujifilm Corp 感光性積層体及び感光性フィルム、並びに、プリント基板の製造方法
JP5760374B2 (ja) * 2009-10-23 2015-08-12 三菱化学株式会社 ケトオキシムエステル系化合物及びその利用
KR101469519B1 (ko) * 2011-10-07 2014-12-08 (주)경인양행 옥심 에스테르 화합물 및 그것을 포함하는 광중합 개시제
JP6530410B2 (ja) * 2013-09-10 2019-06-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
KR102356749B1 (ko) * 2013-09-25 2022-01-27 미쯔비시 케미컬 주식회사 감광성 착색 조성물, 블랙 매트릭스, 착색 스페이서, 화상 표시 장치 및 안료 분산액
KR101917406B1 (ko) * 2014-03-21 2018-11-09 동우 화인켐 주식회사 고색재현이 가능한 착색 광경화성 수지조성물, 컬러필터 및 이를 구비한 액정표시장치
KR102305058B1 (ko) * 2014-07-04 2021-09-24 미쯔비시 케미컬 주식회사 수지, 감광성 수지 조성물, 경화물, 컬러 필터 및 화상 표시 장치
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JP6692184B2 (ja) * 2016-03-01 2020-05-13 株式会社Ｄｎｐファインケミカル カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、表示装置
JP7091039B2 (ja) * 2017-09-05 2022-06-27 東洋インキＳｃホールディングス株式会社 有機ｅｌ表示装置用赤色着色組成物、カラーフィルタ及び有機ｅｌ表示装置

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Publication number Priority date Publication date Assignee Title
TW201042378A (en) * 2009-04-01 2010-12-01 Toyo Ink Mfg Co Photosensitive colored composition and color filter
WO2011030645A1 (ja) * 2009-09-14 2011-03-17 富士フイルム株式会社 光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、液晶表示装置、平版印刷版原版、並びに、新規化合物
TW201430040A (zh) * 2012-11-01 2014-08-01 Adeka Corp 鹼性顯影性感光性組合物
JP2015045686A (ja) * 2013-08-27 2015-03-12 凸版印刷株式会社 感光性樹脂組成物、カラーフィルタ及び液晶表示装置
TW201535051A (zh) * 2014-03-11 2015-09-16 Dongwoo Fine Chem Co Ltd 藍色感光性樹脂組合物、藍色濾光片和具有其的顯示裝置
WO2016010036A1 (ja) * 2014-07-15 2016-01-21 東京応化工業株式会社 感光性組成物及び化合物

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CN109791357B (zh) 2023-01-10
JP6341351B1 (ja) 2018-06-13
JP2018156093A (ja) 2018-10-04
JP6977662B2 (ja) 2021-12-08
KR102402726B1 (ko) 2022-05-27
WO2018052024A1 (ja) 2018-03-22
JP7283519B2 (ja) 2023-05-30
JP2022028782A (ja) 2022-02-16
TW201818152A (zh) 2018-05-16
KR20190051976A (ko) 2019-05-15
JPWO2018052024A1 (ja) 2018-09-13
CN109791357A (zh) 2019-05-21

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