TWI742424B - Exhaust gas introduction nozzle, water treatment device, and exhaust gas treatment device - Google Patents

Abstract

An exhaust gas introduction nozzle is provided, which can reliably eliminate the clogging of solid reactants in a water treatment device of an exhaust gas treatment device. The exhaust gas introduction nozzle (1) includes: an inner pipe (2), which sprays the introduced exhaust gas (H) from the first outlet (2f) into the high humidity environment in the water treatment tank (20) And the outer pipe (5), which is arranged to surround the outer circumference of the first ejection port (2f) of the inner pipe (2), and has a second ejection port (5f), the second ejection port (5f) ) Is to spray inert gas (F) around the exhaust gas (H) ejected from the first nozzle (2f), and form an inert gas curtain (F1) around the exhaust gas (H) .

Description

Exhaust gas introduction nozzle, water treatment device, and exhaust gas treatment device

The present invention relates to an improvement of an exhaust gas introduction nozzle used in a water treatment process at the stage prior to the thermal decomposition process of exhaust gas, and an improvement of a water treatment device and an exhaust gas treatment device using the nozzle. The exhaust system A component gas or dust that is discharged from the semiconductor manufacturing process and contains water-decomposable components.

This kind of exhaust is the exhaust generated in the manufacturing process of electronic circuit components such as semiconductors and liquid crystals, especially the exhaust generated in the cleaning process and etching process. Its composition Most of it (about 90% or more) is composed of nitrogen, and the rest contains PFC gas (perfluorocarbon gas; perfluorocarbon gas, which has a global warming coefficient much greater than carbon dioxide) _{such as NF 3} , CF ₄ , or C ₂ F ₆ Carbon gas). In order to release such exhaust gas into the atmosphere, it is necessary to thermally decompose the harmful component gas in advance to make it harmless. However, even if the above-mentioned harmful components have been thermally decomposed in an environment with very little moisture, it is still very easy to recombine, and ultimately only a lower decomposition rate can be obtained. Therefore, in order to prevent recombination, the presence of water is indispensable.

In this exhaust gas, for example, water-decomposable component gases such as fluorinated tungsten, dichlorosilane, trichlorosilane, and silicon fluoride may be included. In addition, a large amount of dust is sometimes included. The water-decomposable component gas system reacts with water to form a solid water-decomposable product (tungsten trioxide or silicon oxide). When the water-decomposable component gas flows into the thermal decomposition zone where the presence of water is indispensable along with the exhaust gas, the above-mentioned solid hydrolysis product is generated and accumulated to block the thermal decomposition zone. In addition, when a large amount of dust enters the thermal decomposition zone, it will accumulate and similarly block the thermal decomposition zone.

Therefore, in order to prevent the water-decomposable component gas or dust from entering the thermal decomposition zone, an exhaust gas treatment device Y as shown in Patent Document 1 (FIG. 6) has been proposed as the water-decomposable component gas or A device that removes dust beforehand.

The exhaust gas treatment device Y includes: a water tank 150; and an inlet scrubber (scrubber) 110 and an outlet scrubber 140, which are erected on the water tank 150; and a thermal decomposition tower 125, which is at the inlet scrubber The water tank 150 is erected between 110 and the outlet scrubber 140 and has a thermal decomposition zone 126 inside.

The water tank 150 is filled with circulating water M at the bottom. Between the water M and the top plate is the first flow path for washing exhaust gas H1 and the second flow path for thermal decomposition exhaust gas H2. A partition wall 151 is provided between the second flow path.

The inlet scrubber 110 is provided with an ordinary nozzle 100 on its top to introduce exhaust gas H into the inside, and a shower pipe 111 with a downward spray nozzle 112 is installed directly below it, Further, a filling material layer 115 for promoting gas-liquid contact is provided below it. The bottom of the inlet scrubber 110 is opened to the first flow path of the water tank 150.

The thermal decomposition tower 125 includes: an exhaust gas introduction pipe 127, which opens in the first flow passage; a tower body 128, which is arranged to surround the exhaust gas introduction pipe 127 and forms the thermal decomposition zone 126 In its interior; and a heater 129, which is installed in the thermal decomposition zone 126. The bottom of the tower body 128 is opened in the second flow path.

Then, from such as CVD (Chemical Vapor Deposition (Chemical Vapor Deposition) The exhaust gas H discharged from the semiconductor manufacturing apparatus S of the film forming apparatus is blown into the inlet scrubber 110 from the nozzle 100 through the exhaust gas introduction pipe 120. In the inlet scrubber 110, circulating water M is spread downward from the spray nozzle 112 in such a way that the sprayed fine water droplets do not drip onto the spray outlet 101 of the nozzle 100. A part of the water-decomposable component gas contained in the exhaust gas H contacts the dispersed water M and undergoes hydrolysis, and generates a solid reaction product which is removed before thermal decomposition as the next process. Most of the dust was also captured and removed at the same time. Then, the remaining water-decomposable component gas or dust in the filling material layer 115 below it will come into gas-liquid contact with the water flowing out to the surface of the filling material, and most of it will be removed and used as a water washing exhaust H1 is sent to the thermal decomposition zone 126 together with a large amount of moisture.

Although the thermal decomposition zone 126 contains PFC in an environment where moisture exists, it thermally decomposes the washed exhaust gas H1 in a state where the water-decomposable component gas or dust has been removed to a considerable extent. Furthermore, the pyrolysis exhaust gas H2 is provided in an outlet scrubber 140 connected to the outlet side of the pyrolysis zone 126 to clean the pyrolysis exhaust gas H2 and reach a temperature that can be released into the atmosphere. After cooling, the exhaust gas H3 is released into the atmosphere as the atmosphere. [Prior Technical Literature] [Patent Literature]

Patent Document 1: Japanese Patent Application Publication No. 7-323211

However, in the inlet scrubber 110 of the conventional exhaust gas thermal decomposition device Y as described above, the spray nozzles are dispersed downward so that the fine water droplets do not get onto the discharge port 101 of the nozzle 100 for introducing exhaust gas regardless of whether time has been spent. 112 etc., the nozzle 100 or the exhaust gas introduction pipe 120 (especially the connection part 21 with the nozzle 100) clogging may occur. It can be understood that this is because the moisture in the inlet scrubber 110 will reversely diffuse into the exhaust gas H flowing through the nozzle 100 or the exhaust gas introduction pipe 120 (the flow of the exhaust gas H shown by the two-dot chain line in FIG. 6 Reverse direction), and react with the water-decomposable component gas of the exhaust gas H flowing through the nozzle 100 or the exhaust gas introduction pipe 120, so that the reaction product is deposited on the nozzle 100 or the exhaust port 101 where the exhaust gas H is ejected. Introduced into the piping 120.

Therefore, although attempts have been made to increase the flow rate of the exhaust gas H flowing through the nozzle 100 to the upper limit of the thermally decomposable range, the above-mentioned clogging problem cannot be eliminated. This is because the "reverse diffusion of water" toward the upstream side is faster than the flow of exhaust gas H as expected. As a result, it is necessary to frequently exchange the clogged nozzle 100 or the exhaust gas introduction pipe 120 in the conventional device Y. Furthermore, in the inlet scrubber 110, although it is preferable to generate gas-liquid contact between the exhaust gas H and the dispersed water M at a higher frequency, fine water droplets adhere to the nozzle during the upward dispersion as described above. 100 and promote the above-mentioned occlusion, so it can only spread downward. In this downward spreading, gas-liquid contact near the nozzle 100 does not occur, and the filling material layer 115 has to be thickened to reach this level.

The present invention has been developed in view of such problems. Its first problem to be solved is to provide an exhaust gas introduction nozzle which is used in the water treatment device of the exhaust gas treatment device and can reliably prevent the reverse of moisture. Diffusion and can reliably eliminate the blockage of the solid reactant; its second problem is to provide a water treatment device, which uses the exhaust gas introduction nozzle, and the removal efficiency of the water-decomposable component gas or dust is high, and then An exhaust gas treatment device with this function is provided.

The invention of the first aspect of the present invention (exhaust gas introduction nozzle 1 of the first embodiment: FIG. 1) is a double pipe. An exhaust gas introduction nozzle is installed in the exhaust gas introduction nozzle 1 of the exhaust gas introduction part 22 of the water treatment tank 20 of the water treatment device A. The water treatment device A is designed to provide high-humidity conditions in the water treatment device A. The exhaust gas H of the component gas undergoes hydrolysis treatment, which is characterized in that it contains: The inner pipe 2, which ejects the introduced exhaust gas H from its first ejection port 2f into the high-humidity environment in the aforementioned water treatment tank 20; and The outer tube 5 is arranged to surround the outer periphery of the first ejection port 2f of the inner pipe 2, and has a second ejection port 5f that surrounds the first ejection port. 2f sprays inert gas F around the exhaust gas H, and forms a gas curtain F1 around the exhaust gas H; The second opening end 5k of the second ejection port 5f of the outer pipe 5 is configured to protrude further toward the ejection direction of the exhaust gas H than the first opening end 2k of the first ejection port 2f of the inner pipe 2.

Thereby, the exhaust gas H ejected from the first ejection port 2f of the inner pipe 2 to a high humidity environment is covered by the inert gas curtain F1 throughout its entire circumference until a certain distance away from the first ejection port 2f. Surround and isolate from the surrounding high humidity environment (moisture). Then, the exhaust gas H and the inert gas curtain F1 are placed in front of a place that is only a certain distance away. As their flow velocity decreases, they mix with each other, and then diffuse into the aforementioned high-humidity environment and come into contact with the moisture. Decompose with water. At this time, even if moisture already exists at the place where it is mixed with the inert liquid F, the exhaust gas H will still be diluted by the inert gas F in this area, so it will not be transmitted to the first ejection port 2f. The exhaust gas H is directed toward the "reverse diffusion of water" of the aforementioned first ejection port 2f.

In addition, near the first outlet 2f of the inner tube 2, the exhaust gas H is completely isolated by the action of the inert gas curtain F1 and will not come into contact with the surrounding high-humidity environment, and the hydrolysis products will not be removed from This part is attached to the first ejection port 2f of the inner tube 2.

The so-called "high humidity environment" herein refers to the space K where the moisture in the water treatment tank 20 and the exhaust gas come into gas-liquid contact.

The invention of the second aspect (introduction nozzle 1 of the second embodiment: FIG. 4) is the exhaust gas introduction nozzle 1 of the first aspect, in which a moisture ejection nozzle is further provided around the second ejection port 5f of the outer pipe 5 10. The moisture ejection nozzle 10 has a third ejection port 10f (10f') that ejects fine water droplets or water vapor M along the aforementioned inert gas curtain F1.

The third ejection port 10f of the water ejection nozzle 10 is arranged so as to concentrically surround the outer pipe 5 and forms a triple pipe ((a) in FIG. 5). As a modified example, it is also possible to simply arrange one or a plurality of water ejection nozzle holes 10f' around the outer tube 5 (FIG. 5(b)).

Although the fine water droplets or water vapor M coming out from the third nozzle 10f (10f') (hereinafter, the water used for hydrolysis such as fine water droplets, water vapor, or circulating water may be collectively referred to as "water, etc."), It is sprayed along the outer side of the inert gas curtain F1, but it is mixed with the inert gas curtain F1 or the exhaust gas H at a position far away from the first ejection port 2f, and is brought into contact with the exhaust gas H in this area. Decompose with water. This area is very far away from the first nozzle 2f and is covered by the inert gas curtain F1. Since the exhaust gas H is diluted by the inert gas F, the same "reverse diffusion of water" as described above will not occur.

The invention of the third aspect or the fourth aspect ((b) in FIG. 3 and (b) in FIG. 4) shows the first ejection port 2f of the inner tube 2 of the first aspect and the second aspect Another example of the positional relationship with the second ejection port 5f of the outer pipe 5 is the exhaust gas introduction nozzle 1 of the first or second aspect, wherein the second ejection port 5f of the outer pipe 5 is the second The opening end 5k and the first opening end 2k of the first ejection port 2f of the inner tube 2 constitute the same protruding height (same plane).

In this way, the inert gas curtain F1 sprayed from the second spray port 5f of the outer pipe 5 covers the entire circumference of the exhaust gas H at a certain distance to block the exhaust gas H from the surrounding high-humidity environment. As a result, similar to the above, the hydrolysis product does not adhere to the first ejection port 2f of the inner tube 2.

The fifth aspect of the invention is the second aspect of the exhaust gas introduction nozzle 1 (FIG. 4(a)), in which the second opening end 5k of the second outlet 5f of the outer tube 5 is compared The third opening end 10k of the third ejection port 10f of the aforementioned moisture ejection nozzle 10 is configured to also protrude toward the ejection direction of the exhaust gas H.

The invention of the sixth aspect is another example of the fifth aspect, and is the exhaust gas introduction nozzle 1 of the second aspect ((b) in FIG. 4), in which the second ejection port 5f of the outer tube 5 The second opening end 5k and the third opening end 10k of the third ejection port 10f of the aforementioned water ejection nozzle 10 constitute the same protruding height (same plane).

The water etc. M sprayed from the water spray nozzle 10 flows out along the outer peripheral surface of the outer tube 5, and is shielded by the inert gas curtain F1 on the inner side without entering the inner side, and within a certain spray distance , As long as it does not come close to the exhaust gas H ejected from the first ejection port 2f of the inner pipe 2, it will not contact. Therefore, even if fine water droplets or heated steam are ejected from the moisture ejection nozzle 10 already provided on the outermost periphery, the hydrolysis product does not adhere to the first ejection port 2f of the inner tube 2.

The invention of the seventh aspect is an invention of any one of the first aspect to the sixth aspect, wherein the ejection speed of the inert gas curtain F1 is the same as the ejection speed of the exhaust gas H, or an inert gas The spraying speed of curtain F1 is set faster.

The faster the ejection speed of the inert gas curtain F1 becomes, the longer the shielding distance of the exhaust H of the inert gas curtain F1 becomes, and the stronger the shielding effect becomes. As a result, it is possible to better prevent the reaction product from adhering to the first ejection port 2f of the inner tube 2. In addition, it can also reduce the amount of inactive gas you use.

The eighth aspect relates to an independent water treatment device A equipped with the invention of any one of the first aspect to the seventh aspect (FIG. 1 ). That is, a water treatment device that hydrolyzes the exhaust gas H sent from the semiconductor manufacturing device S and removes the water-decomposable gas components, and sends the water-washed exhaust gas H1 to the next process. The water treatment device A is characterized in that it contains: The exhaust gas introduction nozzle 1 described in any one of the first aspect to the seventh aspect; and The water treatment tank 20 is equipped with the aforementioned exhaust gas introduction nozzle 1 at its exhaust gas introduction part 22; and The steam piping 21 is installed in the water treatment tank 20 and has a nozzle opening 21a for spraying water vapor M, which is installed toward the first ejection port 2f of the inner pipe 2; and The exhaust pipe 26 is connected from the water treatment tank 20 to the next process, and sends the water-washed exhaust gas H1 that has been treated with the water to the next process.

In this independent water treatment device A, since the exhaust gas H ejected from the first ejection port 2f is surrounded by the inert gas curtain F1, and is only a predetermined distance away from the first ejection port 2f as described above The ejection tip is diluted by the inert gas F, so even if the nozzle opening 21a of the steam pipe 21 is installed in the direction of the first ejection port 2f and the water vapor M is ejected from the nozzle opening 21a, the water vapor M will not reach the nozzle opening 21a , There is no "reverse diffusion of water." As a result, the water-decomposable component gas can be hydrolyzed directly below the first jet port 2f, and the water treatment tank 20 can be shortened to this extent. In addition, since the water treatment device A is an independent type, it can also be individually installed in an existing exhaust gas treatment device.

The ninth aspect relates to an exhaust gas treatment device X (FIG. 2) integrally provided with a water treatment device A equipped with any one of the first aspect to the seventh aspect of the invention (exhaust gas introduction nozzle 1) . It is characterized by: Water tank 40, which is filled with circulating water M at the bottom; and The water treatment tank 20 is erected on the top plate portion 41 of the water tank 40, and the interior is kept in a high humidity environment; and The exhaust gas introduction nozzle 1 described in any one of the first aspect to the seventh aspect is installed in the exhaust gas introduction portion 22 of the aforementioned water treatment tank 20 and sent from the semiconductor manufacturing apparatus S The exhaust gas H is blown into the aforementioned water treatment tank 20; and The thermal decomposition tower 50 is erected on the top plate portion 41 of the water tank 40 to introduce the washed exhaust gas H1 washed in the water treatment tank 20 and perform thermal decomposition in the internal thermal decomposition zone 56; and The outlet scrubber 60, which is erected on the top plate 41 of the water tank 40, is used to wash the thermally decomposed exhaust gas H2 after thermal decomposition and remove harmful substances to release the exhaust gas H3 as the atmosphere, and release the atmosphere Gas H3 is released into the atmosphere.

Based on the above, the nozzle 1 of the present invention used in the device X or the water treatment device A is provided with an inert gas curtain F1 around the exhaust gas H ejected from the first ejection port 2f of the inner pipe 2, so Will hinder the "reverse diffusion of water" as mentioned above. As a result, of course, the first ejection port 2f does not adhere to the hydrolysis product in the exhaust gas introduction pipe 8, and even if it is used for a long time, it does not become clogged in this part.

Hereinafter, the present invention will be explained based on the illustrated embodiment. Fig. 1 is an exhaust treatment device X (first embodiment) equipped with the independent water treatment device A of the present invention, and Fig. 2 is an exhaust treatment device X (first embodiment) equipped with the non-independent water treatment device A of the present invention Second embodiment). These are devices used in the semiconductor manufacturing process. For example, a vacuum pump V is used to suck the exhaust gas H discharged from the CVD film forming device S and send it to the exhaust treatment device X, where it undergoes thermal decomposition. A device that makes it harmless and releases it into the atmosphere.

The exhaust gas treatment device X of the first embodiment is composed of an independent water treatment device A and a thermal decomposition device B provided with an outlet scrubber 60. The exhaust gas introduction nozzle 1 built in the water treatment device A is composed of the double pipe shown in Fig. 3 and the triple pipe shown in Fig. 4 and Fig. 5 (a) (or a modified example: Fig. 5 (b) ). First, as the exhaust gas treatment device X of the present invention, the exhaust gas introduction nozzle 1 is described with reference to FIG. 1 and the exhaust gas introduction nozzle 1 is described with respect to the double pipe. After that, the triple tube (and its modification examples) will be described. Finally, the exhaust gas treatment device X in which the water treatment device A of FIG. 2 has been integrated is described.

In the description of the following embodiments, in order to avoid complexity, in the second embodiment, the description is centered on the parts that are different from the first embodiment, and the parts showing the same function are given the same symbols and the description is used as Description of the second embodiment.

The outline of the exhaust treatment device X in FIG. 1 is, for example, a vacuum pump V sucks exhaust gas H from the CVD film forming device S, and the exhaust gas is exhausted by an exhaust gas introduction pipe 8 connecting the vacuum pump V and the water treatment device A H is sent to the water treatment device A. In the water treatment device A, the water-decomposable component gas contained in the exhaust gas H is hydrolyzed to form a solid water-decomposing product, which is combined with the supplied water (spray water for hydrolysis or heating). Water vapor) M is removed together. At the same time, the dust sent in with the exhaust gas H is also washed and removed in the same manner. In addition, when water-soluble gas such as chlorine is contained, it is also removed with M such as water at the same time.

The washing exhaust gas H1 from which the water-decomposable component gas or dust has been removed is sent to the thermal decomposition tower 50 through the exhaust pipe 26, and after it has been thermally decomposed, it is sent to the adjacent outlet side for washing After washing the thermally decomposed exhaust gas H2 after thermal decomposition, the device 60 releases the exhaust gas H3 as a harmless atmosphere and releases it into the atmosphere.

The water treatment device A of the present invention is an exhaust gas that contains a water-decomposable component gas (and further a water-soluble component gas) among various exhaust gases H discharged from the CVD film forming device S during the semiconductor manufacturing process described above. H, is removed before thermal decomposition treatment, so that internal clogging caused by hydrolysis products will not occur, and the exhaust H can be treated efficiently.

The water treatment device A is roughly composed of an exhaust gas introduction nozzle 1, a water treatment tank 20 in which an inlet side filling material layer 25 is provided, a moisture supply part 30, a steam pipe 21, and an exhaust pipe 26. The water treatment tank 20 is provided with an exhaust gas introduction nozzle 1 at an exhaust gas introduction part 22 which is a hollow container at the top, and water M for circulation is stored at the bottom. The space part above the circulating water M, more accurately, the space part containing the filling material layer 25 and above the filling material layer 25 is the gas-liquid contact space K, and is provided below the exhaust gas introduction nozzle 1 There is steam piping 21. The steam pipe 21 is connected to a steam supply pipe (not shown) of a factory, and the steam pipe 21 is supplied with heated steam. Below or beside the steam piping 21, a spray piping 23 on the inlet side is arranged side by side. In the steam pipe 21, upward nozzle ports 21a are arranged on both sides of the exhaust gas introduction nozzle 1 so as to sandwich the exhaust gas introduction nozzle 1, and heated steam is ejected upward from the nozzle ports 21a on both sides of the exhaust gas introduction nozzle 1. The spray pipe 23 on the inlet side is provided with a downward nozzle opening 23b. The downward nozzle opening 23b is arranged directly below the exhaust gas introduction nozzle 1, and fine spray water droplets M are poured radially downward from the downward nozzle opening 23b.

A filler layer 25 is provided below the spray pipe 23 on the inlet side. The filler layer 25 is filled with a filler made of plastic, ceramic, or glass (for example, Teller filler). (Tellerette) (registered trademark) or Raschig ring (Raschig ring)).

An exhaust pipe 26 is provided in the space below the filling layer 25, and the exhaust pipe 26 is drawn from the space and reaches the washing exhaust gas introduction part 53 of the pyrolysis tower 50 described later. The exhaust pipe 26 opens in the space below the filling layer 25. Then, in the case of FIG. 1, the exhaust pipe 26 is drawn out from the side surface of the water treatment tank 20 through the circulating water M, and is connected to the washing exhaust gas introduction part 53 of the thermal decomposition tower 50. (Of course, it is also possible to directly pull out from the side surface of the water treatment tank 20 without passing through the circulating water M.). The inlet opening 27 of the exhaust pipe 26 of this embodiment extends upward from the water surface of the circulating water M, and opens directly below the filling layer 25 to face the lower surface of the filling layer 25.

The spray pipe 23 on the inlet side is connected to a pumping pipe 31 on the inlet side. The pumping pipe 31 on the inlet side is erected from the bottom of the water treatment tank 20 and constitutes a water supply part 30. The pumping pipe 31 on the inlet side is provided with a lift pump 34 on the inlet side, and the circulating water M accumulated at the bottom of the water treatment tank 20 is supplied to the spray pipe 23 on the inlet side. Furthermore, an overflow pipe 37 for maintaining the water level of the circulating water M is provided at the bottom of the water treatment tank 20.

The first embodiment of the exhaust gas introduction nozzle 1 is a double pipe nozzle as shown in Fig. 3, and the second embodiment has a triple pipe nozzle as shown in Fig. 4 and Fig. 5(a), or Fig. 5(b) ) Shows its modification examples and so on. First, the first embodiment will be described, and secondly, the second embodiment will be described. In order to avoid duplication of description, the description of the second embodiment focuses on the parts that are different from the first embodiment, and the description of the first embodiment is used for the omitted parts. In Embodiment 1 and Embodiment 2, the same members are given the same reference numerals.

The first embodiment of the exhaust gas introduction nozzle 1 is a double pipe composed of an inner pipe 2 and an outer pipe 5. In the embodiment shown in the figure, the inner pipe 2 includes: an inner pipe body 2h for introducing exhaust gas; and a sheath pipe 4 covering the upper outer surface of the inner pipe body 2h. The inner tube body 2h and the outer tube 5 are made of high-priced Ni (nickel)-based super alloys (for example, Inconel or Hastelloy (both registered trademarks), which have excellent corrosion resistance), Or high corrosion resistance stainless steel such as SUS316L, or heat and corrosion resistance resin (for example, polyetheretherketone (polyetheretherketone) resin) formed, sheath tube 4 is made of metal material with ordinary corrosion resistance (for example, stainless steel such as SUS304 ). Of course, the sheath tube 4 can be integrated with the inner tube body 2h for introducing exhaust gas.

The inlet portion 2b of the inner tube main body 2h for the exhaust gas introduction is connected to the outlet of the exhaust gas introduction pipe 8. In the cross-sectional shape of the inner tube body 2h, the entrance portion 2b of the inner tube body 2b is formed into a thicker circular straight tube up to the middle portion 2e. The middle portion 2e is reduced in such a way that its inner diameter gradually decreases toward the outlet portion 2g. The inner surface shape of the outlet portion 2g is a straight tube shape which is thinner than the inlet portion 2b and has a constant inner diameter. The front end of the outlet portion 2g is opened as a first ejection port 2f, and its end surface is a first open end 2k. (Although not shown in the figure, the outlet portion 2g may have the same tapered shape as the middle portion 2e and may have a pointed shape up to the first opening end of the front end.). Then, the outer surface of the inner tube body 2h forms a straight tube shape from the entrance side end surface to the middle section, and forms the same taper shape from the middle section to the first open end 2k of the front end and has a pointed shape. Therefore, in the case of the drawing, the thickness of the outlet portion 2g of the inner tube body 2h gradually becomes thinner toward the first opening end 2k. In order not to adhere and accumulate reaction products or dust in this part (the first opening end 2k and its vicinity), it is preferable to form a knife edge shape in advance. Furthermore, the portion where the outer diameter of the inner tube body 2h gradually decreases toward the first open end 2k is the first nozzle portion 2a.

The outer tube 5 is formed with a rim cylindrical storage recess 5b opening at the center of the upper surface, and a tip-shaped (funnel-shaped) nozzle hole is penetrated downward from the center of the storage recess 5b. The part that penetrates the nozzle hole is the second nozzle portion 5a, and the outer surface that reaches the opening on the lower surface is formed with the same cone shape as the nozzle hole. Let the aforementioned lower surface opening be the second opening end 5k.

The inner tube 2 is inserted into the receiving recess 5b from above, and the first nozzle portion 2a of the inner tube body 2h is inserted into the second nozzle portion 5a of the outer tube 5. Then, the flange portion of the sheath tube 4 is mounted on the upper surface of the outer tube 5 in an airtight state. Between the outer peripheral surface 2r of the first nozzle portion 2a of the inner tube body 2h and the inner peripheral surface of the second nozzle portion 5a of the outer tube 5, a uniform gap T1 is formed over the entire circumference. The annular front end opening of the gap T1 is the second ejection port 5f. Here, although the gap T1 has the same width from the inlet to the outlet (second ejection port 5f), in order to increase the ejection speed of the inert gas F, it may become narrower as it reaches the tip. . Then, an inert gas supply piping 6 is connected to the upper side surface of the outer tube 5, and it communicates with the gas tank 7 formed between the inner surface of the housing recess 5b and the outer surface of the inner tube body 2h. The air storage tank 7 communicates with the gap T1 reaching the second ejection port 5f.

Although it is in the positional relationship between the first open end 2k and the second open end 5k, as in the part enclosed by the circle in (a) in FIG. 3, the second open end 5k can be more oriented than the first open end 2k It is arranged in such a way that the direction of exhaust gas is protruding. Let W1 represent the amount of protrusion. (B) in FIG. 3 is another example of (a) in FIG. 3, and is a diagram in which the first opening end 2k is connected to the first opening end 2k as shown in the drawing line drawn from the aforementioned circle. An example where the two open ends 5k have the same height (same plane). In order to prevent the "reverse diffusion of water", the protruding amount W1 is preferably the longer one. However, as shown in (b) of FIG. 3, even when the protrusion amount W1 is zero, as long as the shielding power of the inert gas curtain F1 described later is sufficient, "reverse diffusion of water" can be prevented.

The thermal decomposition device B is composed of a water tank 40, a thermal decomposition tower 50, and a scrubber 60 on the outlet side. The thermal decomposition tower 50 and the scrubber 60 on the outlet side are erected side by side on the water tank 40. In the thermal decomposition tower 50, water-washed exhaust gas H1 connected to the exhaust pipe 26 extending from the aforementioned water treatment device A and washed with water is introduced. The circulating water M is stored at the bottom of the water tank 40 and is maintained at a certain water level by the overflow pipe 42, and the water M is supplied with new water M that is the same as the water M flowing out of the overflow by the water supply pipe 45.

The bottom of the thermal decomposition tower 50 and the scrubber 60 on the outlet side are opened to the water tank 40, and the bottom of the thermal decomposition tower 50 and the bottom of the scrubber 60 on the outlet side are connected between the top 41 of the water tank 40 and the circulating water M The space is connected.

The thermal decomposition tower 50 is a thermal decomposition treatment device using atmospheric pressure plasma (plasma) to wash exhaust gas H1, and includes: a tower body 52; and a non-migrating plasma jet torch 51, which is provided On the top of the tower body 52, a high-temperature plasma jet P is generated toward the inside of the tower body 52; and the water washing exhaust gas introduction part 53 is a ring-shaped setting that surrounds the outer periphery of the upper end of the tower body 52 The outlet of the exhaust pipe 26 of the water treatment device A is connected to its side.

The plasma jet torch 51 has a plasma generation chamber (not shown) inside. The plasma jet torch 51 is provided with a plasma jet P generated in the plasma generation chamber at the center of the lower surface of the plasma jet torch 51. The slurry jet ejection hole (not shown). On the upper side of the plasma jet torch 51, an actuated gas delivery and supply pipe (not shown) such as nitrogen is provided as required.

The internal space of the washing exhaust gas inlet 53 has a washing exhaust passage 53a formed all around the circumference, and the washing exhaust gas H1 supplied from the outlet of the exhaust pipe 26 will flow back to the internal exhaust passage. 53a. The exhaust flow path 53a has an opening (not shown) that opens in a tangential direction with respect to the ejection portion of the plasma jet P.

A straight-pipe tower body 52 is installed at the lower end opening of the washing exhaust gas inlet 53. The tower body 52 is made of heat-resistant materials such as ceramics and has a bottom opening in the water tank 40. The tower body 52 surrounds the plasma jet P and the washed exhaust gas H1 blown in, and the thermal decomposition of the washed exhaust gas H1 is carried out in its interior (thermal decomposition zone 56). The outer surface is made of heat insulating material (not shown) ) Covered. Then, a water storage portion 55 is provided on the outer peripheral part of the upper end of the tower main body 52, and water overflows from the upper end of the tower main body 52 to form a water wall 57 on the entire inner peripheral surface of the tower main body 52. The water storage part 55 is supplied with water from the overflow part from the outside.

The water tank 40 is a member like a hollow rectangular parallelepiped, and the above-mentioned thermal decomposition tower 50 and the outlet scrubber 60 described later are arranged side by side on the top plate portion 41 of the water tank 40. The water tank 40 is filled with circulating water M at the bottom, and the space between the water M and the top plate portion 41 serves as a flow path for the thermal decomposition exhaust gas H2. Then, an overflow pipe 42 that keeps the internal water level at a fixed level is provided.

The scrubber 60 on the outlet side is a so-called wet scrubber. When describing its schematic structure, it is composed of the following: a straight tube scrubber body 60a, which is erected on the top plate 41 of the sink 40; And the pumping pipe 61 on the outlet side; and the lift pump 64 on the outlet side, which is installed in the middle of the pumping pipe 61 on the outlet side; and the spray pipe 63 on the outlet side, which is connected to the aforementioned pumping pipe 61 and is installed in Near the top of the inside of the scrubber 60a; and the nozzle port 63a on the outlet side, which is installed in the spray pipe 63, and forms a chemical liquid M such as an alkaline liquid, an acidic liquid, or water or steam into a heated vapor state. And the filling material layer 65 on the outlet side, which is arranged below the nozzle opening 63a on the outlet side and used for gas-liquid contact; and the exhaust blower 67, which is arranged on the scrubber body 60a And the exhaust pipe 68 for air release, which is installed in the exhaust blower 67. The above-mentioned medicinal solution M after spraying is contained in the water tank 40.

Next, the function of the exhaust gas introduction nozzle 1 in the exhaust gas treatment device X of FIG. 1 will be described. The inert gas F (for example, nitrogen or argon gas) is supplied to the inert gas supply pipe 6 of the exhaust gas introduction nozzle 1. The supplied inert gas F passes through the gas storage tank 7 and passes through the gap T1 between the outer circumferential surface 2r of the first nozzle portion 2a of the inner tube body 2h and the inner circumferential surface of the second nozzle portion 5a of the outer tube 5 The inert gas F is ejected cylindrically from the second ejection port 2f at the tip. This ejected part is referred to as an inert gas curtain F1. The inert gas F is supplied before the introduction of the exhaust gas H.

Here, the shape of the gap T2 is formed into a tapered conical shape, in order to increase the flow rate of the inert gas F sprayed from the second nozzle 5f of the outer tube 5, and to form the use of less inert gas F The amount of inactive gas curtain F1 with sufficient shielding function. From this point of view, the taper of the inner peripheral surface of the second nozzle portion 5a of the outer pipe 5 may be increased with respect to the taper angle of the outer peripheral surface 2r of the first nozzle portion 2a of the inner pipe body 2h for exhaust gas introduction. The shape angle, and the gap T1 formed between the two becomes narrower as it comes to the front end side. In addition, the flow rate of the inert gas curtain F1 may be the same as the flow rate of the exhaust gas H described later, or the flow rate of the inert gas curtain F1 may be increased. The faster the flow rate of the inert gas curtain F1 is, the more the inert gas curtain F1 is extended, and the shielding effect relative to the exhaust gas H is improved. This point is the same in the case of FIG. 4.

In addition, at this time, the lift pump 34 of the suction piping 31 on the inlet side is also activated, and the circulating water M is extracted and supplied to the spray piping 23 on the inlet side. Thereby, the water M turns into fine water droplets from the downward nozzle opening 23b, and spreads downward like an umbrella. The heated steam M is sprayed upward on both sides of the exhaust gas introduction nozzle 1 from the upward nozzle opening 21a of the steam pipe 21.

Then, when the power supply of the control unit (not shown) of the plasma jet torch 51 is turned on, a gas flow of ultra-high temperature (around 10000°C) is generated under atmospheric pressure, that is, a non-migrating gas flow is generated. The plasma jet P is ejected from the plasma jet ejection hole into the tower body 52. Next, after the plasma jet P is generated, the exhaust gas H discharged from the semiconductor manufacturing apparatus S such as a CVD film forming apparatus is introduced into the water treatment apparatus A through the vacuum pump V.

The introduction of the exhaust gas H is carried out through the exhaust gas introduction nozzle 1. The introduced exhaust gas H is passed through the inner tube body 2h for exhaust gas introduction, and is reduced in the middle part 2e, and the flow velocity is increased so that the airflow which becomes a thin cylindrical shape from the outlet part 2g is ejected to the non-circular flow. Inside the active gas curtain F1 ((a) in Figure 3).

The inert gas curtain F1 is jetted by a stream of a narrow cone-shaped tip along the outer peripheral surface 2r of the first nozzle portion 2a. The pointed inert gas curtain F1 flows downward so as to reduce the exhaust gas H by a certain distance while shielding the entire circumference of the exhaust gas H. Then, the flow rate of the inert gas curtain F1 will gradually decrease, and it will contact the exhaust gas H and mix with the exhaust gas H to dilute the exhaust gas H. Let this area be a mixed area R. In the mixing region R, heated steam M sprayed upward from the upward nozzle opening 21a enters, and contacts with the water-decomposable component gas and hydrolyzes it to produce a fine solid reaction product. When dust is contained in the exhaust gas H, it can be trapped by the heated steam at the same time.

In the mixing region R, since the exhaust gas H is diluted as described above, the "reverse diffusion of water" will be weakened, and the "moisture" will not reach the first nozzle portion 2a of the inner tube 2 from the mixing region R. The first ejection port 2f. Since the first ejection port 2f to the mixing area R is shielded by the inert gas curtain F1 as described above, the "moisture" around it still does not reach the first ejection port 2f. As a result, adhesion of the hydrolysis product does not occur in the first ejection port 2f.

As shown in Fig. 3(a), when the second open end 5k of the outer tube 5 only protrudes from the first open end 2k by the protrusion amount W1, the protrusion amount W1 will be added to the spray of the inert gas curtain F1 Length, only this part can increase the shielding effect in the exhaust H. On the other hand, at this point in time, the exhaust blower 67 provided in the outlet scrubber 60 is operated. Thereby, the exhaust gas passes through the thermal decomposition tower 50 from the water treatment device A and flows toward the outlet scrubber 60. In the water treatment tank 20, the fine solid reaction product or dust collected by the fine water droplets and the heated water vapor as described above rides on the airflow to fall together with the fine water droplets or the heated water vapor.

Then, the exhaust gas H reaches the filling material layer 25 on the inlet side while repeating gas-liquid contact with the water and the like M in the water treatment tank 20. In the filling material layer 25 on the inlet side, water M, etc., flows into the inner surface or void of the porous filling material, and passes through the filling material layer 25 while repeating gas-liquid contact with the exhaust gas H. Thereby, the removal of hydrolyzable component gases and the collection of dust can be roughly performed in the water treatment tank 20, and the water and other M are dripped from the filling material layer 25 to the bottom of the water treatment tank 20 for circulation. The gas part of the water M becomes the normal washing exhaust gas H1 and is sent to the thermal decomposition tower 50 as the next process. In the thermal decomposition tower 50, since the water-decomposable component gas has been removed, clogging does not occur, and high-efficiency thermal decomposition of exhaust gas can be performed in the thermal decomposition tower 50 in the presence of moisture.

The thermally decomposed exhaust gas H2 that has been thermally decomposed here is sent to the outlet scrubber 60, is sufficiently cleaned and reduced to a temperature that can be released into the atmosphere, and is released into the atmosphere by the exhaust blower 67.

Next, the exhaust gas introduction nozzle 1 of Embodiment 2 shown in FIG. 4 will be described. The exhaust gas introduction nozzle 1 is a triple pipe, and is installed in such a way that the water ejection nozzle 10 surrounds the second nozzle portion 5a of the outer pipe 2. The moisture ejection nozzle 10 is provided with a third nozzle portion 10a so as to surround the entire circumference of the second nozzle portion 5a. The third nozzle portion 10a is formed in a head cone shape formed by the same taper as the second nozzle portion 5a of the outer tube 5, and is formed on the outer peripheral surface 5r of the second nozzle portion 5a of the outer tube 5 and the third nozzle portion 10a A gap T2 for water ejection is formed between the inner peripheral surfaces of the outer peripheral surface of the second nozzle portion 5a. The gap T2 is connected to the water supply pipe 16 via the water storage tank 17. In Fig. 4, although the water supply pipe 16 is connected to the side surface of the outer pipe 5 and connected to the water storage tank 17 through the water passage already provided in the outer pipe 5, it can also be connected to (b) in Fig. 5 The individual water shown is sprayed out of the nozzle 10.

The first opening end 2k, the second opening end 5k, and the third opening end 10k of the exhaust gas introduction nozzle 1 of the triple pipe are formed in the same position as in Fig. 4(b). In (a) generally inconsistent situation. In the case of inconsistency, the first open end 2k and the second open end 5k are the same as in the first embodiment, and the second open end 5k protrudes more than the first open end 2k. The third open end 10k is set back than the second open end 5k, and then the setback distance is represented by W2.

The function of the exhaust gas introduction nozzle 1 of the triple pipe will be described. In this case, the exhaust gas H ejected from the first ejection port 2f and the second ejection port 5f and the inert gas curtain F1 are as described above. Then, from the third ejection port 10f at the front end of the gap T2, to surround the inert gas curtain F1 inside the third ejection port 10f, and the inert gas curtain F1 is parallel to the inert gas curtain F1, and water for hydrolysis (heated steam or fine Water drop) M. Since the gap T2 is parallel to the gap T1 for forming the inert gas curtain F1, the water for hydrolysis, such as water for hydrolysis, which is ejected from the gap T2 to a position away from the first ejection port 2f by a certain distance, is parallel to the non-reactive gas curtain F1. The active gas curtain F1 is sprayed in parallel, and within this range, it will not break through the inert gas curtain F1 and contact the exhaust H inside.

Here, in the case where the third opening end 10k is retracted upwardly than the second opening end 5k (FIG. 4(a)), the inert gas curtain F1 is at least the retracted distance W2 from the outer nozzle 5a Shielded. As shown in (b) in Figure 4, even when the third open end 10k and the second open end 5k exist at the same position, if the flow velocity of the inert gas curtain F1 is faster and the shielding effect is sufficient, it will not The shielding will be destroyed due to the addition of M such as water for hydrolysis. If M, such as water for hydrolysis, is heated water vapor, the force to break through the inert gas curtain F1 is weaker than that of fine water droplets, and the shielding effect of the inert gas curtain F1 becomes higher.

Fig. 5(b) is an example in which a plurality of nozzle holes 10f' are provided in place of the annular gap T2 for spraying water etc. M for hydrolysis in Fig. 5(a). M such as water for hydrolysis can be ejected from the plurality of nozzle holes 10f' as described above.

Then, when the water for hydrolysis and the like M are ejected in parallel from the third ejection port 10f (or nozzle hole 10f') of the gap T2 toward the inert gas curtain F1 as described above, the inert gas curtain F1 It will be mixed with the exhaust gas H at a certain distance as the flow rate decreases, and the water-decomposable gas components in the exhaust gas H will be hydrolyzed in the mixing zone as described above to produce reaction products. And fall together with M such as water for hydrolysis. The above-mentioned independent water treatment device A has the merit that it can be installed separately in existing equipment.

In contrast, FIG. 2 shows a non-independent type in which the water treatment device A is built in the exhaust gas treatment device X. As shown in FIG. The exhaust gas introduction nozzle 1 is installed in the water treatment device A integrally built in the exhaust gas treatment device X, and removes the water-decomposable component gas or dust before the thermal decomposition treatment. The role of device X is as described above.

1: Exhaust gas inlet nozzle 2: inner tube 2a: The first nozzle part 2b: entrance section 2e: middle part 2f: The first outlet 2g: export part 2h: Inner tube body 2k: first open end 2r: Outer peripheral surface of the first nozzle part 4: sheath 5: Outer tube 5a: The second nozzle part 5b: Storage recess 5f: The second outlet 5k: second open end 5r: Outer peripheral surface of the second nozzle part 6: Inert gas supply piping 7: Air storage tank 8,120: Exhaust gas introduction piping 10: Moisture spray nozzle 10a: The third nozzle part 10f: The third outlet 10f’: Moisture spray nozzle hole 10k: third open end 16: Water supply piping 17: Water storage tank 20: Water treatment tank 21: Steam piping 21a: Upward nozzle opening 22: Exhaust introduction part 23: Spray piping on the inlet side 23b: downward nozzle opening 25: Filling material layer on the entrance side (filling layer) 26: Exhaust pipe 27: entrance opening 30: Moisture Supply Department 31: Pumping piping on the inlet side 34: Ascending pump on the inlet side 37, 42: Overflow piping 40: sink 41: Top plate 45: water supply pipe 50,125: Thermal decomposition tower 51: Plasma jet torch 52, 128: Tower body 53: Washing exhaust introduction part 53a: Exhaust flow path 55: Water Storage Department 56,126: Thermal decomposition zone 57: Water Wall 60,140: Outlet scrubber 60a: Scrubber body 61: Pumping piping on the outlet side 63: Spray piping on the outlet side 63a: nozzle port 64: Ascending pump on the outlet side 65: Filling material layer on the outlet side 67: Exhaust blower 68: Exhaust pipe for atmospheric release 100: The conventional nozzle 101: spout 110: Inlet scrubber 111: Spray piping 112: spray nozzle 115: Filling material layer 121: Exhaust gas inlet nozzle connection part 127: Exhaust inlet pipe 129: heater 150: sink 151: Next Door A: Water treatment device B: Thermal decomposition device F: Inert gas F1: Inactive gas curtain H: Exhaust H1: Washing exhaust H2: Thermal decomposition exhaust H3: Atmospheric release exhaust K: Gas-liquid contact space M: Water, etc. (spray water droplets, fine water droplets, heated steam, circulating water, chemical liquid) P: Plasma jet R: Mixed area S: Semiconductor manufacturing equipment (semiconductor film forming equipment) T1: The gap for the formation of the active gas curtain T2: The gap for spraying water, etc. (spraying brittle liquid, heating steam) V: Vacuum pump W1: The amount of protrusion between the first and second open ends W2: The retreat distance between the second and third open ends X: Exhaust gas treatment device of the present invention Y: Conventional exhaust treatment device

[Fig. 1] It is a flowchart of an exhaust gas treatment equipment including the stand-alone water treatment device of the present invention. [Figure 2] is a flow chart of the exhaust gas treatment equipment including the non-independent water treatment device of the present invention. [FIG. 3] (a) is a cross-sectional view of Embodiment 1 of the exhaust gas introduction nozzle of FIG. 1, and (b) of FIG. 3 is a cross-sectional view of another example of the nozzle of the nozzle. [FIG. 4] (a) is a cross-sectional view of Embodiment 2 of the exhaust gas introduction nozzle of FIG. 1, and (b) of FIG. 4 is a cross-sectional view of another example of the nozzle of the nozzle. [Fig. 5] (a) is a schematic view of the exhaust gas introduction nozzle of Fig. 4 viewed from below, and (b) of Fig. 5 is a modified example thereof. [Figure 6] is a flow chart of the exhaust gas treatment equipment of the conventional example.

1: Exhaust gas inlet nozzle

8: Exhaust introduction piping

20: Water treatment tank

21: Steam piping

21a: Upward nozzle opening

22: Exhaust introduction part

23: Spray piping on the inlet side

23b: downward nozzle opening

25: Filling material layer on the entrance side (filling layer)

26: Exhaust pipe

27: entrance opening

30: Moisture Supply Department

31: Pumping piping on the inlet side

34: Ascending pump on the inlet side

37, 42: Overflow piping

40: sink

41: Top plate

45: water supply pipe

50: Thermal decomposition tower

51: Plasma jet torch

52: Tower body

53: Washing exhaust introduction part

53a: Exhaust flow path

55: Water Storage Department

56: Thermal decomposition zone

57: Water Wall

60: Outlet scrubber

60a: Scrubber body

61: Pumping piping on the outlet side

63: Spray piping on the outlet side

63a: nozzle port

64: Ascending pump on the outlet side

65: Filling material layer on the outlet side

67: Exhaust blower

68: Exhaust pipe for atmospheric release

A: Water treatment device

B: Thermal decomposition device

F: Inert gas

H: Exhaust

H1: Washing exhaust

H2: Thermal decomposition exhaust

H3: Atmospheric release exhaust

K: Gas-liquid contact space

M: Water, etc. (spray water droplets, fine water droplets, heated steam, circulating water, chemical liquid)

P: Plasma jet

S: Semiconductor manufacturing equipment (semiconductor film forming equipment)

V: Vacuum pump

X: Exhaust gas treatment device of the present invention

Claims (7)

An exhaust gas introduction nozzle is an exhaust gas introduction nozzle installed in the exhaust gas introduction part of a water treatment tank of a water treatment device. The water treatment device uses an internal high-humidity environment to exhaust gas containing water-decomposable components The hydrolysis treatment is performed, and it is characterized by comprising: an inner pipe that ejects the introduced exhaust gas from its first outlet into the high-humidity environment in the water treatment tank; and an outer pipe that surrounds the aforementioned water treatment tank. The inner pipe’s first ejection port is arranged on the outer periphery, and has a second ejection port that ejects inert gas so as to surround the exhaust gas ejected from the first ejection port. , And a curtain of inert gas is formed around the exhaust gas; the second opening end of the second outlet of the outer pipe is further toward the exhaust gas than the first opening end of the first outlet of the inner pipe It is constructed in a way that the ejection direction is protruding. For example, the exhaust gas introduction nozzle of claim 1, wherein a moisture ejection nozzle is further provided around the second ejection port of the outer pipe, and the moisture ejection nozzle has a third nozzle that ejects fine water droplets or water vapor along the aforementioned inert gas curtain. Spout. Such as the exhaust gas introduction nozzle of claim 2, wherein the second opening end of the second outlet of the outer pipe is oriented in the direction of exhaust gas ejection than the third opening end of the third outlet of the moisture ejection nozzle Constructed in a prominent way. Such as the exhaust gas introduction nozzle of claim 2, wherein the second opening end of the second ejection port of the outer pipe and the water ejection nozzle The third opening end of the third ejection port constitutes the same protruding height. Such as the exhaust gas introduction nozzle of any one of claims 1 to 4, wherein the ejection speed of the inert gas curtain is the same as the ejection speed of the exhaust gas, or the ejection speed of the inert gas curtain is faster. A water treatment device that hydrolyzes exhaust gas sent from a semiconductor manufacturing device and removes water-decomposable gas components, and sends the water-treated washed exhaust gas to the next process. Its characteristics are It includes: the exhaust gas introduction nozzle described in any one of claims 1 to 5; and a water treatment tank, which has the exhaust gas introduction nozzle installed in its exhaust gas introduction part; and a steam piping, which is installed in In the water treatment tank, there is an upward nozzle opening that is set toward the first spray port of the inner pipe to spray water vapor; and an exhaust pipe, which is connected from the water treatment tank to the next process and connects The water-washed exhaust gas after the water treatment is sent to the next process. An exhaust gas treatment device, which is characterized by comprising: a water tank filled with circulating water at the bottom; and a water treatment tank, which is erected on the top plate of the water tank and kept inside a high humidity environment; and request The exhaust gas introduction nozzle described in any one of items 1 to 5 is installed in the exhaust gas introduction part of the water treatment tank, and blows exhaust gas sent from the semiconductor manufacturing device into the water treatment tank; And a thermal decomposition tower, which is erected on the top plate part of the water tank to introduce the water The water-washed exhaust gas washed by the treatment tank is thermally decomposed in the internal thermal decomposition zone; and the outlet scrubber, which is erected on the top plate of the water tank, is used to clean the thermally decomposed exhaust gas after thermal decomposition And remove harmful substances to use as atmospheric release exhaust gas, and release the atmospheric released exhaust gas into the atmosphere.

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