JPWO2020095358A1 - Exhaust gas introduction nozzle, water treatment device and exhaust gas treatment device - Google Patents

Abstract

Provided is an exhaust gas introduction nozzle capable of surely eliminating clogging of a solid reactant in a water treatment apparatus of an exhaust gas treatment apparatus. The exhaust gas introduction nozzle 1 surrounds the inner pipe 2 that ejects the introduced exhaust gas H from the first outlet 2f into the high humidity atmosphere in the water treatment tank 20 and the outer periphery of the first outlet 2f of the inner pipe 2. An outside having a second outlet 5f which is arranged and ejects an inert gas F so as to surround the exhaust gas H ejected from the first exhaust gas H 2f and forms an inert gas curtain F1 around the exhaust gas H. It is composed of a tube 5.

Description

The present invention is an improvement of an exhaust gas introduction nozzle used in a water treatment process, which is a pre-stage of a thermal decomposition process, for exhaust gas containing hydrolyzable component gas and dust discharged from a semiconductor manufacturing process, and the nozzle. Regarding the improvement of the used water treatment equipment and exhaust gas treatment equipment.

This type of exhaust gas is exhaust gas generated in the manufacturing process of electronic circuit elements such as semiconductors and liquid crystals, especially in the cleaning and etching processes. Most of the components (generally 90% or more) are composed of nitrogen, and the rest is NF ₃ . It contains PFC gas (perfluorocarbon gas) whose global warming potential is much larger than that of carbon dioxide, such as CF ₄ or C ₂ F ₆ . In order to release such exhaust gas to the atmosphere, these harmful component gases must be thermally decomposed to make them harmless in advance.
However, even if the above-mentioned harmful component gas is thermally decomposed in an environment where the water content is extremely low, it is very easy to recombinate, and finally only a low decomposition rate can be obtained. Therefore, it is said that the presence of water is indispensable to prevent recombination.

This exhaust gas may contain hydrolyzable component gases such as tungsten fluoride, dichlorosilane, trichlorosilane, and silicon fluoride. In addition, a large amount of dust may be contained. This hydrolyzable component gas reacts with water to form solid hydrolysis products (tungsten trioxide and silicon oxide). When this hydrolyzable component gas is accompanied by exhaust gas and flows into a pyrolysis zone in which the presence of water is indispensable, the solid hydrolysis product is generated and accumulated to block the pyrolysis zone.
Further, when a large amount of dust enters the pyrolysis zone, it accumulates and similarly closes the pyrolysis zone.

Therefore, in order to prevent hydrolyzable component gas and dust from entering the thermal decomposition zone, an exhaust gas treatment device Y as shown in Patent Document 1 (FIG. 6) has been proposed as a device for removing these in advance.

The exhaust gas treatment device Y is installed on the water tank 150 between the water tank 150, the inlet scrubber 110 and the outlet scrubber 140 erected on the water tank 150, and the inlet scrubber 110 and the outlet scrubber 140. It is composed of a pyrolysis tower 125 having a pyrolysis zone 126 inside.

The bottom of the water tank 150 is filled with water M for circulation, and the space between the water M and the ceiling is a first flow passage for the flush exhaust gas H1 and a second flow passage for the pyrolysis exhaust gas H2. A partition wall 151 is provided between the flow passage and the second flow passage.

In the inlet scrubber 110, a normal nozzle 100 for introducing the exhaust gas H into the inside is installed at the top thereof, a shower pipe 111 having a downward spray nozzle 112 is installed directly below the nozzle 100, and gas-liquid contact is promoted further below the nozzle pipe 111. Filler layer 115 for use is installed. The bottom of the inlet scrubber 110 opens into the first flow passage of the water tank 150.

The pyrolysis tower 125 is provided so as to surround the exhaust gas introduction pipe 127 which is open to the first flow passage, the exhaust gas introduction pipe 127, and the tower main body 128 which forms the thermal decomposition zone 126 inside, and the thermal decomposition. It is composed of a heater 129 installed in the zone 126. The bottom of the tower body 128 is open to the second stream passage.

Then, the exhaust gas H discharged from the semiconductor manufacturing apparatus S such as the CVD film forming apparatus passes through the exhaust gas introduction pipe 120 and is blown into the inlet scrubber 110 from the nozzle 100. In the inlet scrubber 110, water M for circulation is sprayed downward from the spray nozzle 112 so that the fine water droplets ejected to the ejection port 101 of the nozzle 100 do not hit.
A part of the hydrolyzable component gas contained in the exhaust gas H is hydrolyzed in contact with the sprayed water M to generate a solid reaction product before the next step, thermal decomposition. Will be removed. Most of the dust is also collected and removed at the same time. Then, while passing through the filler layer 115 underneath, the remaining hydrolyzable component gas and dust come into gas-liquid contact with the water flowing down the surface of the filler, and most of them are removed, resulting in a large amount of flush exhaust gas H1. It is sent to the thermal decomposition zone 126 together with the moisture.

In the thermal decomposition zone 126, PFC is contained in an environment where water is present, but the water-washed exhaust gas H1 in a state where hydrolyzable component gas and dust are removed to a considerable extent is thermally decomposed. The pyrolysis exhaust gas H2 is an outlet scrubber 140 provided so as to communicate with the outlet side of the pyrolysis zone 126, and the pyrolysis exhaust gas H2 is cleaned and cooled to a temperature at which it can be released to the atmosphere. It is released to the atmosphere as H3.

Japanese Unexamined Patent Publication No. 7-323211

However, in the inlet scrubber 110 of the conventional exhaust gas thermal decomposition device Y as described above, the spray nozzle 112 is sprayed downward so that the fine water droplets do not hit the ejection port 101 of the nozzle 100 for introducing the exhaust gas. Nevertheless, there has been a problem that the nozzle 100 and the exhaust gas introduction pipe 120 (particularly, the connection portion 121 with the nozzle 100) are clogged. This is because the moisture in the inlet scrubber 110 reverse diffuses in the exhaust gas H flowing through the nozzle 100 and the exhaust gas introduction pipe 120 (in the opposite direction of the flow of the exhaust gas H shown by the two-point chain line in FIG. 6), and the nozzle 100 and the exhaust gas This is because the reaction product was deposited in the exhaust gas outlet 101 and the exhaust gas introduction pipe 120 where the exhaust gas H of the nozzle 100 was ejected by reacting with the hydrolyzable component gas of the exhaust gas H flowing in the introduction pipe 120. Do you get it.

Therefore, we tried to increase the flow velocity of the exhaust gas H flowing through the nozzle 100 to the upper limit of the range in which thermal decomposition is possible, but the above-mentioned blockage problem could not be solved. This is because the "backdiffusion of water" toward the upstream side was faster than expected compared to the flow of the exhaust gas H.
As a result, in the conventional device Y, the clogged nozzle 100 and the exhaust gas introduction pipe 120 have to be frequently replaced.
In the inlet scrubber 110, it is preferable to generate gas-liquid contact between the exhaust gas H and the sprayed water M at a high frequency, but in the upward spraying as described above, fine water droplets adhere to the nozzle 100 and block the nozzle 100. Only downward spraying was possible to promote. In this downward spraying, gas-liquid contact did not occur in the vicinity of the nozzle 100, and the filler layer 115 had to be thickened accordingly.

The present invention has been made in view of such a problem, and the first problem to be solved is a solid reaction product used in a water treatment device of an exhaust gas treatment device, which can surely prevent back diffusion of water. The purpose is to provide an exhaust gas introduction nozzle capable of surely eliminating clogging. Second, a water treatment device using this exhaust gas introduction nozzle, which has high efficiency in removing hydrolyzable component gas and dust, and further, the same. The purpose is to provide an exhaust gas treatment device having such a function.

The invention according to claim 1 (exhaust gas introduction nozzle 1: FIG. 3 of the first embodiment) is a double pipe.
The exhaust gas H introduced in the exhaust gas introduction nozzle 1 installed in the exhaust gas introduction portion 22 of the water treatment tank 20 of the water treatment device A that hydrolyzes the exhaust gas H containing the hydrolyzable component gas in a high humidity atmosphere inside. The inner pipe 2 that ejects the gas from the first outlet 2f into the high humidity atmosphere in the water treatment tank 20.
The inner pipe 2 is arranged so as to surround the outer periphery of the first ejection port 2f, and the inert gas F is ejected so as to surround the exhaust gas H ejected from the first ejection port 2f, and the exhaust gas H is ejected. It is characterized in that it is composed of an outer pipe 5 having a second outlet 5f forming an inert gas curtain F1 around the.

As a result, the exhaust gas H ejected from the first ejection port 2f of the inner pipe 2 into a high humidity atmosphere is wrapped in the inert gas curtain F1 to a range separated from the first ejection port 2f by a certain distance on the entire circumference thereof. It is isolated from the surrounding high humidity atmosphere (moisture). Then, beyond the point separated by a certain distance, the exhaust gas H and the inert gas curtain F1 are mixed with each other as the flow velocity decreases, and further diffuse into the high humidity atmosphere to come into contact with the moisture. Is hydrolyzed.
At this time, even if water is present at the point where it is mixed with the inert gas F, the exhaust gas H is diluted with the inert gas F in this region, so that the exhaust gas H is injected from the first ejection port 2f. "Back diffusion of water" that travels through the exhaust gas H and heads for the first ejection port 2f does not occur.
In addition, in the vicinity of the first ejection port 2f of the inner pipe 2, the exhaust gas H is completely blocked by the action of the inert gas curtain F1 and the exhaust gas H does not come into contact with the surrounding high humidity atmosphere, and the inner pipe also from this portion. The hydrolysis product does not adhere to the first outlet 2f of 2.
Here, the "high humidity atmosphere" is a space K in which the moisture in the water treatment tank 20 and the exhaust gas H come into gas-liquid contact.

The invention according to claim 2 (introduction nozzle 1: FIG. 4 of the second embodiment)
In the exhaust gas introduction nozzle 1 according to claim 1,
A moisture ejection nozzle 10 having a third ejection port 10f (10f') for ejecting fine water droplets or water vapor M along the inert gas curtain F1 is further provided around the second ejection port 5f of the outer pipe 5. It is characterized by being.

The third ejection port 10f of the moisture ejection nozzle 10 is provided so as to concentrically surround the outer tube 5 to form a triple tube (FIG. 5A). As a modification, simply one or more water ejection nozzle holes 10f'may be arranged around the outer pipe 5 (FIG. 5 (b)).
Water for hydrolysis, such as fine water droplets or water vapor M (hereinafter, fine water droplets, water vapor, or water for circulation) emitted from the third ejection port 10f (10f'), may be collectively referred to as "water or the like". ) Is ejected along the outside of the inert gas curtain F1, but is mixed with the inert gas curtain F1 and the exhaust gas H at a certain distance from the first ejection port 2f, and comes into contact with the exhaust gas H in this region. This is hydrolyzed. Since this region is sufficiently separated from the first ejection port 2f, is shielded by the inert gas curtain F1, and the exhaust gas H is diluted with the inert gas F, the "back diffusion of water" is similar to the above. Does not occur.

The invention according to claim 3 (FIGS. 3A and 4A) shows the positional relationship between the first outlet 2f of the inner pipe 2 of claims 1 and 2 and the second outlet 2f of the outer pipe 5. In an example showing
In the exhaust gas introduction nozzle 1 according to claim 1 or 2.
The second opening end 5k of the second ejection port 5f of the outer pipe 5 is configured to protrude from the first opening end 2k of the first ejection port 2f of the inner pipe 2 in the ejection direction of the exhaust gas H. It is a feature.

The invention according to claim 4 (FIGS. 3 (b) and 4 (b)) shows the positional relationship between the first outlet 2f of the inner pipe 2 and the second outlet 5f of the outer pipe 5 of claims 1 and 2. In another example showing
In the exhaust gas introduction nozzle 1 according to claim 1 or 2.
The second opening end 5k of the second spout 5f of the outer pipe 5 and the first opening end 2k of the first spout 2f of the inner pipe 2 are configured to have the same protruding height (plane). It is characterized by.

As a result, the inert gas curtain F1 ejected from the second ejection port 5f of the outer pipe 5 cuts off the exhaust gas H from the surrounding high humidity atmosphere over the entire circumference of the exhaust gas H for a certain distance. As a result, similarly to the above, the hydrolysis product does not adhere to the first ejection port 2f of the inner pipe 2.

A fifth aspect of the present invention is the exhaust gas introduction nozzle 1 (FIG. 4A) according to the second aspect.
The second opening end 5k of the second ejection port 5f of the outer pipe 5 is configured to protrude from the third opening end 10k of the third ejection port 10f of the moisture ejection nozzle 10 in the ejection direction of the exhaust gas H. It is characterized by that.

A sixth aspect of the present invention is another example of the fifth aspect, in the exhaust gas introduction nozzle 1 (FIG. 4B) according to the second aspect.
The second opening end 5k of the second ejection port 5f of the outer pipe 5 and the third opening end 10k of the third ejection port 10f of the water ejection nozzle 10 are configured to have the same protrusion height (floating surface). It is characterized by that.

As a result, the water or the like M ejected from the moisture ejection nozzle 10 flows out along the outer peripheral surface of the outer pipe 5 and is shielded by the inner inert gas curtain F1 so that it does not enter the inside thereof, and within a certain ejection distance. , The exhaust gas H ejected from the first ejection port 2f of the inner pipe 2 is neither close to nor in contact with the exhaust gas H. Therefore, even if fine water droplets or heated steam are ejected from the moisture ejection nozzle 10 provided on the outermost circumference, the hydrolysis product does not adhere to the first ejection port 2f of the inner pipe 2.

7 is the invention according to any one of claims 1 to 6.
The feature is that the ejection speed of the inert gas curtain F1 is the same as the ejection speed of the exhaust gas H, or the ejection speed of the inert gas curtain F1 is set to be faster.

The faster the ejection speed of the inert gas curtain F1, the longer the shielding distance of the exhaust gas H of the inert gas curtain F1, and the stronger the shielding effect. As a result, the adhesion of the reaction product to the first ejection port 2f of the inner pipe 2 is better prevented. In addition, the amount of the inert gas F used is also reduced.

Claim 8 relates to a stand-alone water treatment apparatus A equipped with the invention according to any one of claims 1 to 7 (FIG. 1). That is,
In the water treatment device A, which hydrolyzes the exhaust gas H sent from the semiconductor manufacturing device S to remove the hydrolyzable gas component, and sends the water-treated flush exhaust gas H1 to the next process.
The exhaust gas introduction nozzle 1 according to any one of claims 1 to 7 and
The water treatment tank 20 in which the exhaust gas introduction nozzle 1 is mounted on the exhaust gas introduction unit 22 and
A steam pipe 21 provided in the water treatment tank 20 and provided toward the first ejection port 2f of the inner pipe 2 and having a nozzle port 21a for ejecting steam M.
It is characterized in that it is composed of an exhaust pipe 26 which is connected to the next process from the water treatment tank 20 and sends out the water-treated flush exhaust gas H1 to the next process.

In this stand-alone water treatment device A, the exhaust gas H ejected from the first ejection port 2f is wrapped in the inert gas curtain F1 and at the ejection destination separated from the first ejection port 2f by a predetermined distance as described above. Since it is diluted with the inert gas F, the nozzle port 21a of the steam pipe 21 is provided toward the first ejection port 2f, and even if the steam M is ejected from the nozzle port 21a, the steam M is still in the nozzle port 21a. There is no "reverse diffusion of water". As a result, the hydrolyzable component gas can be hydrolyzed directly under the first spout 2f, and the water treatment tank 20 can be shortened by that amount. Further, since the water treatment device A is a stand-alone type, it can be individually installed in the existing exhaust gas treatment device.

Claim 9 relates to an exhaust gas treatment device X integrally having a water treatment device A equipped with the invention (exhaust gas introduction nozzle 1) according to any one of claims 1 to 7 (FIG. 2).
A water tank 40 filled with water M for circulation at the bottom,
A water treatment tank 20 that is erected on the ceiling 41 of the water tank 40 and whose inside is maintained in a high humidity atmosphere.
The exhaust gas introduction nozzle 1 according to any one of claims 1 to 7, which is mounted on the exhaust gas introduction unit 22 of the water treatment tank 20 and blows the exhaust gas H sent from the semiconductor manufacturing apparatus S into the water treatment tank 20. ,
A thermal decomposition tower 50 that is erected on the ceiling 41 of the water tank 40, introduces the flush exhaust gas H1 that has been washed with water in the water treatment tank 20, and thermally decomposes in the internal thermal decomposition zone 56.
It is erected on the ceiling 41 of the water tank 40, and is composed of an outlet scrubber 60 that cleans the pyrolyzed pyrolyzed exhaust gas H2, removes harmful substances to obtain an atmospheric exhaust gas H3, and releases the atmospheric exhaust gas H3 to the atmosphere. It is characterized by being done.

From the above, the nozzle 1 of the present invention used in the apparatus X and the water treatment apparatus A is provided with an inert gas curtain F1 around the exhaust gas H ejected from the first ejection port 2f of the inner pipe 2. It inhibits "back diffusion of water" as described above. As a result, the hydrolysis product does not adhere to the exhaust gas introduction pipe 8 as well as the first ejection port 2f, and the portion is not clogged even after long-term use.

It is a flow chart of the exhaust gas treatment equipment including the stand-alone water treatment apparatus of this invention. It is a flow chart of the exhaust gas treatment equipment including the non-independent water treatment apparatus of this invention. (A) is a cross-sectional view of the first embodiment of the exhaust gas introduction nozzle of FIG. 1, and (b) is a cross-sectional view of another example of the nozzle of the nozzle. (A) is a cross-sectional view of the second embodiment of the exhaust gas introduction nozzle of FIG. 1, and (b) is a cross-sectional view of another example of the nozzle of the nozzle. (A) The exhaust gas introduction nozzle of FIG. 4 is viewed from below, and (b) is a modification thereof. It is a flow chart of the exhaust gas treatment equipment of a conventional example.

Hereinafter, the present invention will be described with reference to the illustrated examples. FIG. 1 is an exhaust gas treatment device X (first embodiment) equipped with the independent water treatment device A of the present invention, and FIG. 2 is an exhaust gas treatment device X (second embodiment) equipped with a non-independent water treatment device A. Example). These are devices used in the semiconductor manufacturing process. For example, the exhaust gas H discharged from the CVD film forming apparatus S is sucked by the vacuum pump V and sent to the exhaust gas treatment apparatus X, which is thermally decomposed to be detoxified and released to the atmosphere. Is.

The exhaust gas treatment device X of the first embodiment is composed of an independent water treatment device A and a thermal decomposition device B in which an outlet scrubber 60 is installed. The exhaust gas introduction nozzle 1 incorporated in the water treatment device A includes a double pipe of FIG. 3 and a triple pipe of FIGS. 4 and 5 (a) (or a modified example thereof: FIG. 5 (b)). First, as the exhaust gas treatment device X of the present invention, FIG. 1 will be described, and the exhaust gas introduction nozzle 1 will be described with respect to a double pipe. After that, the triple tube (and its modified example) will be described. Finally, the exhaust gas treatment device X in which the water treatment device A of FIG. 2 is integrated will be described.

In the explanation of the following examples, in order to avoid complication, in the second embodiment, the parts different from those of the first embodiment will be mainly described, and the parts showing the same action are designated by the same reference numerals, and the description thereof will be described in the second embodiment. Use as an explanation.

The outline of the exhaust gas treatment device X of FIG. 1 shows, for example, that the exhaust gas H from the CVD film forming apparatus S is sucked by the vacuum pump V, and the exhaust gas H is introduced by the exhaust gas introduction pipe 8 connecting the vacuum pump V and the water treatment device A. It is sent to the water treatment device A. In the water treatment apparatus A, the hydrolyzable component gas contained in the exhaust gas H is hydrolyzed and removed as a solid hydrolysis product together with the supplied water or the like (spray water for hydrolysis or heated steam) M. .. At the same time, the dust sent along with the exhaust gas H is also washed and removed with water. If a water-soluble gas such as chlorine is contained, it is also removed with water or the like M at the same time.

The flush exhaust gas H1 from which the hydrolyzable component gas and dust have been removed is sent to the thermal decomposition tower 50 by the exhaust pipe 26, pyrolyzed there, and then sent to the adjacent scrubber 60 on the outlet side to generate heat. After the pyrolysis exhaust gas H2 after decomposition is washed, it is released into the atmosphere as harmless atmospheric exhaust gas H3.

As described above, the water treatment apparatus A of the present invention uses hydrolyzable component gas (further, water-soluble component gas) among various exhaust gases H discharged from, for example, CVD film forming apparatus S in the semiconductor manufacturing process. It is an apparatus capable of efficiently treating the exhaust gas H contained in the exhaust gas H prior to the thermal decomposition treatment without causing internal clogging due to the hydrolysis product.

The water treatment device A is roughly composed of an exhaust gas introduction nozzle 1, a water treatment tank 20 provided with a filler layer 25 on the inlet side inside, a water supply unit 30, a steam pipe 21, and an exhaust pipe 26.
The water treatment tank 20 is a hollow container in which an exhaust gas introduction nozzle 1 is installed in an exhaust gas introduction portion 22 at the top, and water M for circulation is stored in the bottom.
The space above the water M for circulating water, more precisely, the filler layer 25, the space above the filler layer 25 is the gas-liquid contact space K, and steam below the exhaust gas introduction nozzle 1. The pipe 21 is installed. A factory steam supply pipe (not shown) is connected to the steam pipe 21, and heated steam is supplied to the steam pipe 21.
The spray pipes 23 on the inlet side are installed under the steam pipes 21 or side by side.
Upward nozzle ports 21a are arranged on both sides of the steam pipe 21 so as to sandwich the exhaust gas introduction nozzle 1, and heated steam is ejected upward from the nozzle ports 21a on both sides of the exhaust gas introduction nozzle 1.
The spray pipe 23 on the inlet side is provided with a downward nozzle port 23b. The downward nozzle port 23b is arranged directly below the exhaust gas introduction nozzle 1, and fine spray water droplets M radiate downward from the downward nozzle port 23b.

Below the spray pipe 23 on the inlet side, a filling layer 25 filled with a filling made of plastic, ceramic, or glass (for example, Terralet (registered trademark) or Raschig ring) is provided.

In the space below the packing layer 25, an exhaust pipe 26 drawn from this space and reaching the flush exhaust gas introduction portion 53 of the pyrolysis tower 50, which will be described later, is provided. The exhaust pipe 26 opens in the space below the filling layer 25. In the case of FIG. 1, the exhaust pipe 26 is pulled out from the side surface of the water treatment tank 20 through the water M for circulation, and is connected to the flush exhaust gas introduction section 53 of the pyrolysis tower 50. (Of course, it may be pulled out directly from the side surface of the water treatment tank 20 without passing through the water M for circulation.)
The inlet opening 27 of the exhaust pipe 26 of this embodiment extends upward from the water surface of the water M for circulation and opens directly below the filling layer 25 toward the lower surface of the filling layer 25.

The spray pipe 23 on the inlet side is connected to the pump pipe 31 on the inlet side, which is raised from the bottom of the water treatment tank 20 and constitutes the water supply unit 30. A pump 34 on the inlet side is installed in the pumping pipe 31 on the inlet side, and water M for circulation collected at the bottom of the water treatment tank 20 is supplied to the spray pipe 23 on the inlet side. Further, an overflow pipe 37 for maintaining the water level of M for circulating water is installed at the bottom of the water treatment tank 20.

The first embodiment of the exhaust gas introduction nozzle 1 is a double pipe nozzle as shown in FIG. 3, and the second embodiment is the triple pipe nozzle shown in FIGS. 4 and 5 (a) or the triple pipe nozzle shown in FIG. 5 (b). There are examples of variations. First, the first embodiment will be described, and then the second embodiment will be described. In order to avoid duplication of description, in the second embodiment, the parts different from the first embodiment will be mainly described, and the omitted parts will be referred to the description of the first embodiment. In the first embodiment and the second embodiment, the same members have the same reference numerals.

The first embodiment of the exhaust gas introduction nozzle 1 is a double pipe composed of an inner pipe 2 and an outer pipe 5. In the embodiment shown in the figure, the inner pipe 2 is composed of an inner pipe main body 2h for introducing exhaust gas and a sheath pipe 4 covered on the upper outer surface thereof. The inner tube main body 2 and the outer tube 5 are expensive Ni-based superalloys having excellent corrosion resistance (for example, Inconel and Hastelloy (both are registered trademarks), highly corrosion-resistant stainless steel such as SUS316L, or heat-resistant corrosion-resistant resin (for example). For example, it is made of polyether ether ketone resin)), and the sheath tube 4 is made of a metal material having normal corrosion resistance (for example, stainless steel such as SUS304). Of course, the sheath pipe 4 can be integrated with the inner pipe main body 2h for introducing exhaust gas.

The inlet portion 2b of the inner pipe main body 2h for introducing exhaust gas is connected to the exhaust gas introduction pipe 8 at the outlet. The cross-sectional shape of the inner pipe body 2h is such that the inlet portion 2b thereof is formed in a thick circular straight tubular shape up to the intermediate portion 2e. The inner diameter of the intermediate portion 2e is narrowed so as to gradually decrease toward the outlet portion 2g. The inner surface shape of the outlet portion 2g is formed into a straight tube shape having an inner diameter that is smaller than that of the inlet portion 2b and does not change. The tip opening of the outlet portion 2g is the first spout 2f, and the end face thereof is the first opening end 2k. (Although not shown, the outlet portion 2g may be tapered to the first opening end at the tip with the same taper as the intermediate portion 2e.)
The outer surface of the inner pipe body 2h is formed in a straight pipe shape from the inlet side end surface to the middle stage portion, and is tapered from the middle stage portion to the first opening end 2k at the tip with the same taper. Therefore, in the case of the figure, the thickness of the outlet portion 2g of the inner pipe main body 2h gradually decreases toward the first opening end 2k. It is preferable to form the reaction product or dust in a knife edge shape so as not to adhere and accumulate on this portion (the first opening end 2k and its vicinity). The portion where the outer diameter of the inner tube main body 2h gradually decreases toward the first opening end 2k is the first nozzle portion 2a.

The outer pipe 5 is formed with a cylindrical storage recess 5b that opens in the center of the upper surface, and a tapered (rohto-shaped) nozzle hole is formed from the center of the storage recess 5b downward. The portion where the nozzle hole is bored is the second nozzle portion 5a, and the outer surface thereof leading to the opening on the lower surface thereof is formed with the same taper as the nozzle hole. The lower surface opening is defined as the second opening end 5k.

The inner pipe 2 is inserted into the storage recess 5b from above, and the first nozzle portion 2a of the inner pipe main body 2h is inserted into the second nozzle portion 5a of the outer pipe 5. The flange portion of the sheath tube 4 is attached to the upper surface of the outer tube 5 in an airtight state.
An even gap T1 is formed over the entire circumference between the outer peripheral surface 2r of the first nozzle portion 2a of the inner tube main body 2h and the inner peripheral surface of the second nozzle portion 5a of the outer tube 5. The ring-shaped tip opening of the gap T1 is the second spout 5f.
Here, the gap T1 has the same width from the inlet to the outlet (second ejection port 5f), but in order to increase the ejection speed of the inert gas F, the gap T1 may be gradually narrowed toward the tip. Good.
An inert gas supply pipe 6 is connected to the upper side surface of the outer pipe 5 and communicates with a gas reservoir 7 formed between the inner surface of the storage recess 5b and the outer surface of the inner pipe main body 2h. The gas reservoir 7 communicates with the gap T1 leading to the second ejection port 5f.

Regarding the positional relationship between the first opening end 2k and the second opening end 5k, as shown in the circled portion in FIG. 3A, the second opening end 5k is in the exhaust gas ejection direction from the first opening end 2k. Position it so that it sticks out. The protrusion allowance is indicated by W1.
FIG. 3B is another example of FIG. 3A, in which the first opening end 2k and the second opening end 5k have the same height as shown in the figure in the circle indicated by the lead line from the circle. This is an example of flushing). In order to prevent "back diffusion of water", it is preferable that the protrusion allowance W1 is long. However, even when the protrusion allowance W1 is zero as shown in FIG. 3B, "back diffusion of water" can be prevented if the shielding force of the inert gas curtain F1 described later is sufficient.

The pyrolysis apparatus B includes a water tank 40, a pyrolysis tower 50, and a scrubber 60 on the outlet side.
The pyrolysis tower 50 and the scrubber 60 on the outlet side are erected side by side on the water tank 40. The pyrolysis tower 50 is connected to an exhaust pipe 26 extending from the water treatment device A, and the flushed exhaust gas H1 is introduced. Circulating water M is stored in the bottom of the water tank 40, is maintained at a constant water level by the overflow pipe 42, and is supplied with the same new water M as the water M that overflows due to the water supply pipe 45.

The bottom of the pyrolysis tower 50 and the scrubber 60 on the outlet side is open to the water tank 40, and the bottom of the pyrolysis tower 50 and the bottom of the scrubber 60 on the outlet side are the ceiling 41 of the water tank 40 and the water M for circulation. It communicates in the space between them.

The thermal decomposition tower 50 is a thermal decomposition treatment device for the flush exhaust gas H1 using atmospheric pressure plasma, and is installed on the tower main body 52 and the top of the tower main body 52, and a high-temperature plasma jet P is directed toward the inside of the tower main body 52. The outlet of the exhaust pipe 26 of the water treatment device A is connected to the side surface of the non-transition type plasma jet torch 51 to be generated and the ring-shaped space installed so as to surround the outer periphery of the upper end of the tower body 52. It is composed of a flush exhaust gas introduction unit 53.

The plasma jet torch 51 has a plasma generation chamber (not shown) inside, and a plasma jet ejection hole (not shown) for ejecting the plasma jet P generated in the plasma generation chamber in the center of the lower surface of the plasma jet torch 51. ) Is provided. If necessary, a working gas supply pipe (not shown) such as nitrogen gas is provided on the upper side surface of the plasma jet torch 51.

A flush exhaust gas flow path 53a is formed in the internal space of the flush exhaust gas introduction portion 53 over the entire circumference in the circumferential direction, so that the flush exhaust gas H1 supplied from the outlet of the exhaust pipe 26 circulates in the internal exhaust gas flow path 53a. It has become. The exhaust gas flow path 53a has an opening (not shown) that opens tangentially to the ejection portion of the plasma jet P.

A straight pipe type tower body 52 made of a heat-resistant material such as ceramic and having a bottom opening to the water tank 40 is attached to the lower end opening of the flush exhaust gas introduction portion 53. The tower main body 52 surrounds the plasma jet P and the blown flush exhaust gas H1 and thermally decomposes the flush exhaust gas H1 inside (thermal decomposition zone 56), and the outer surface is a heat insulating material (not shown). ) Is covered. A water reservoir 55 is provided on the outer peripheral portion of the upper end of the tower main body 52, and water overflows from the upper end of the tower main body 52 to form a water wall 57 on the entire inner peripheral surface of the tower main body 52. Overflow water is supplied to the water reservoir 55 from the outside.

The water tank 40 is a member like a hollow rectangular parallelepiped, and the pyrolysis tower 50 and the outlet scrubber 60 described later are erected side by side on the ceiling portion 41 thereof. The bottom of the water tank 40 is filled with water M for circulation, and the space between the water M and the ceiling portion 41 is a flow passage for the pyrolysis exhaust gas H2. An overflow pipe 42 that keeps the water level inside constant is installed.

The outlet side scrubber 60 is a so-called wet scrubber, and the schematic structure thereof will be described as a straight pipe type scrubber main body 60a erected on the ceiling 41 of the water tank 40, an outlet side pumping pipe 61 and the middle thereof. The outlet-side pump 64 provided in the scrubber body, the outlet-side spray pipe 63 connected to the pumping pipe 61 and installed near the top inside the scrubber body 60a, and the spray pipe 63 installed in the alkaline liquid and acidic. A nozzle port 63a on the outlet side for spraying a liquid or a chemical solution M such as water or steam in a heated steam state and a filler on the outlet side for gas-liquid contact installed below the nozzle port 63a on the outlet side. It is composed of a layer 65, an exhaust blower 67 installed on the top of the scrubber main body 60a, and an atmospheric discharge exhaust pipe 68 installed on the exhaust blower 67. The sprayed chemical solution M is stored in the water tank 40.

Next, the operation of the exhaust gas introduction nozzle 1 in the exhaust gas treatment device X of FIG. 1 will be described. The inert gas F (for example, nitrogen gas or argon gas) is supplied to the inert gas supply pipe 6 of the exhaust gas introduction nozzle 1. The supplied inert gas F passes through the gas reservoir 7 and passes through the gap T1 between the outer peripheral surface 2r of the first nozzle portion 2a of the inner pipe body 2h and the inner peripheral surface of the second nozzle portion 5a of the outer pipe 5. The inert gas F is ejected in a cylindrical shape from the second ejection port 2f at the tip. This ejected portion is referred to as an inert gas curtain F1. This inert gas F has been supplied before the introduction of the exhaust gas H.

Here, the shape of the gap T2 is tapered to increase the flow velocity of the inert gas F ejected from the second ejection port 5f of the outer pipe 5, and the amount of the inert gas F used is small. This is to form the Inactive Gas Curtain F1 having a sufficient shielding function. From this point of view, the taper angle of the inner peripheral surface of the second nozzle portion 5a of the outer pipe 5 is made larger than the taper angle of the outer peripheral surface 2r of the first nozzle portion 2a of the inner pipe main body 2h for introducing exhaust gas. , The gap T1 formed between the two may be narrowed toward the tip side.
Further, the flow velocity of the inert gas curtain F1 may be the same as the flow velocity of the exhaust gas H described later, or the flow velocity of the inert gas curtain F1 may be faster. As the flow velocity of the inert gas curtain F1 is increased, the inert gas curtain F1 is elongated and the shielding effect on the exhaust gas H is improved. This point is the same in the case of FIG.

At this time, the pump 34 of the pumping pipe 31 on the inlet side also operates to pump the water M for circulation and supply it to the spray pipe 23 on the inlet side. As a result, the water M becomes fine water droplets from the downward nozzle opening 23b and is sprayed downward like an umbrella.
Heated steam M is blown up from both sides of the exhaust gas introduction nozzle 1 from the upward nozzle port 21a of the steam pipe 21.

Then, when the power of the control unit (not shown) of the plasma jet torch 51 is turned on, a gas flow at an ultra-high temperature (about 10,000 ° C.), that is, a non-transition type plasma jet P is generated under atmospheric pressure, and the plasma is generated. This plasma jet P is ejected into the tower body 52 from the jet ejection hole. Subsequently, after the plasma jet P is generated, the exhaust gas H discharged from the semiconductor manufacturing apparatus S such as the CVD film forming apparatus S is introduced into the water treatment apparatus A via the vacuum pump V.

The exhaust gas H is introduced through the exhaust gas introduction nozzle 1. The introduced exhaust gas H passes through the inner pipe main body 2h for introducing the exhaust gas, is throttled at the intermediate portion 2e, increases the flow velocity, and becomes a thin cylindrical airflow from the outlet portion 2g in the inert gas curtain F1. (Fig. 3 (a)).

The inert gas curtain F1 is ejected as a tapered conical airflow along the outer peripheral surface 2r of the first nozzle portion 2a. The tapered inert gas curtain F1 flows downward so as to narrow down the exhaust gas H by a certain distance while shielding the entire circumference of the exhaust gas H. Then, the flow velocity of the inert gas curtain F1 gradually decreases, and it comes into contact with the exhaust gas H and mixes with the exhaust gas H to dilute the exhaust gas H. This region is referred to as a mixed region R.
The heated steam M spouted from the upward nozzle port 21a enters the mixed region R and comes into contact with the hydrolyzable component gas to hydrolyze it, producing a fine solid reaction product. If the exhaust gas H contains dust, it is simultaneously collected by the heated steam.

Since the exhaust gas H is diluted in this mixing region R as described above, the "back diffusion force of water" is weak, and from this mixing region R to the first nozzle 2f of the first nozzle portion 2a of the inner pipe 2 " "Moisture" does not reach. Since the area from the first outlet 2f to the mixed region R is shielded by the inert gas curtain F1 as described above, the surrounding "moisture" does not reach the first outlet 2f either. As a result, the hydrolysis product does not adhere to the first ejection port 2f.

As shown in FIG. 3A, when the second opening end 5k of the outer pipe 5 protrudes from the first opening end 2k by the protrusion W1, the protrusion W1 is added to the ejection length of the inert gas curtain F1. Therefore, the shielding effect of the exhaust gas H is increased by that amount.
On the other hand, at this point, the exhaust blower 67 installed at the outlet scrubber 60 is in operation. As a result, the exhaust gas flows from the water treatment device A through the pyrolysis tower 50 toward the outlet scrubber 60. In the water treatment tank 20, the fine water droplets and the fine solid reaction products and dust collected by the fine water droplets and the heated steam fall together with the fine water droplets and the heated steam on the air flow.

Then, the exhaust gas H reaches the filler layer 25 on the inlet side while repeating gas-liquid contact with water or the like M in the water treatment tank 20. In the filler layer 25 on the inlet side, water or the like M flows through the inner surface of the porous filler or in the voids, and passes through the filler layer 25 while repeating gas-liquid contact with the exhaust gas H.
As a result, the hydrolyzable component gas is almost removed and the dust is collected in the water treatment tank 20, and the water M is transferred from the filler layer 25 to the circulating water M collected at the bottom of the water treatment tank 20. After dropping, the gas content becomes normal water-washed exhaust gas H1 and is sent to the pyrolysis tower 50, which is the next step.
Since the hydrolyzable component gas is removed in the pyrolysis tower 50, highly efficient thermal decomposition of the exhaust gas H is performed in the thermal decomposition tower 50 in the presence of water without causing clogging.

Here, the pyrolyzed exhaust gas H2 is sent to the outlet scrubber 60, thoroughly washed, lowered to a temperature at which it can be released to the atmosphere, and released to the atmosphere by the exhaust blower 67.

Next, the exhaust gas introduction nozzle 1 of the second embodiment shown in FIG. 4 will be described. The exhaust gas introduction nozzle 1 is a triple pipe, and is provided so that the moisture ejection nozzle 10 surrounds the second nozzle portion 5a of the outer pipe 5.
The water ejection nozzle 10 is provided with a third nozzle portion 10a so as to surround the entire circumference of the second nozzle portion 5a. The third nozzle portion 10a is formed in a tapered conical shape formed with the same taper as the second nozzle portion 5a of the outer tube 5, and the outer peripheral surface 5r and the third nozzle portion of the second nozzle portion 5a of the outer tube 5 are formed. A gap T2 for ejecting water is formed between the inner peripheral surface of 10a and the inner peripheral surface of the second nozzle portion 5a over the entire outer peripheral surface.
The gap T2 is connected to the water supply pipe 16 via a water pool 17. In FIG. 4, the water supply pipe 16 is connected to the side surface of the outer pipe 5 and is connected to the water pool 17 through the water passage provided in the outer pipe 5, but individual water ejections as shown in FIG. 5 (b). It may be connected to the nozzle 10.

The first, second, and third opening ends 2k, 5k, and 10k of the exhaust gas introduction nozzle 1 of the triple pipe are formed at the same positions as shown in FIG. 4B and as shown in FIG. 4A. There may be a discrepancy. In the case of disagreement, the relationship between the first and second opening ends 2k and 5k is the same as in the first embodiment, and the second opening end 5f protrudes from the first opening end 2k. The third opening end 10k is recessed from the second opening end 5k, and the receding distance is represented by W2.

The operation of the exhaust gas introduction nozzle 1 of the triple pipe will be described. In this case, the exhaust gas H and the inert gas curtain F1 ejected from the first and second ejection ports 2f and 5f are as described. Then, from the third ejection port 10f at the tip of the gap T2, water for hydrolysis (heated steam or fine water droplets) so as to surround the inside of the inert gas curtain F1 and in parallel with the inert gas curtain F1. ) M erupts. Since this gap T2 and the gap T1 for forming the inert gas curtain F1 are parallel to each other, the hydrolysis water or the like M ejected from the gap T2 to a position separated by a certain distance from the first ejection port 2f is an inert gas. It is ejected in parallel with the curtain F1 and does not break through the inert gas curtain F1 and come into contact with the inner exhaust gas H within that range.

Here, when the third opening end 10k is retracted upward from the second opening end 5k (FIG. 4A), the inert gas curtain F1 is shielded by the outer nozzle 5a by at least the retracting distance W2. ..
As shown in FIG. 4B, even when the third opening end 10k and the second opening end 5k are present at the same position, if the flow velocity of the inert gas curtain F1 is high and the shielding effect is sufficient, hydrolysis is performed. The shield will not be broken by M such as water for use.
If the water or the like M for hydrolysis is heated steam, the force to break through the inert gas curtain F1 is weaker than that of fine water droplets, and the shielding effect of the inert gas curtain F1 is higher.

FIG. 4D is an example in which a plurality of nozzle holes 10f'are provided in place of the ring-shaped gap T2 for ejecting water or the like M for hydrolysis in FIG. 4C. Water or the like for hydrolysis is ejected from the plurality of nozzle holes 10f'as described above.

Then, when water or the like M for hydrolysis is ejected from the third ejection port 10f (or nozzle hole 10f') of the gap T2 in parallel with the inert gas curtain F1 as described above, a certain distance is determined as the flow velocity decreases. At this point, the inert gas curtain F1 and the exhaust gas 1 are mixed, and in this mixed region R, the hydrolyzable gas component in the exhaust gas H is hydrolyzed to generate a reaction product, which is hydrolyzed. It falls with water such as water for M.
The stand-alone water treatment device A as described above has an advantage that it can be installed independently in existing equipment.

On the other hand, FIG. 2 is a non-independent type in which the water treatment device A is incorporated in the exhaust gas treatment device X. The exhaust gas introduction nozzle 1 is installed in the water treatment device A integrally incorporated in the exhaust gas treatment device X, and hydrolyzable component gas and dust are removed before the heat decomposition treatment. The operation of the device X is as described above.

A: Water treatment device, B: Thermal decomposition device, F: Inactive gas, F1: Inactive gas curtain, H: Exhaust gas, H1: Washing exhaust gas, H2: Thermally decomposed exhaust gas, H3: Atmospheric emission exhaust gas, K: Gas-liquid Contact space, M: water, etc. (spray water droplets, fine water droplets, heated steam, water for circulation, chemical solution), P: plasma jet, R: mixed region, S: semiconductor manufacturing equipment (semiconductor film forming equipment), T1: activity Gap for forming gas curtain, T2: Gap for ejecting water (spray pancreatic fluid, heated steam), V: Vacuum pump, W1: Protruding allowance between 1st and 2nd opening ends, W2: 2nd and 3rd Retreat distance between opening ends, X: exhaust gas treatment device of the present invention, Y: conventional exhaust gas treatment device, 1: exhaust gas introduction nozzle, 2: inner pipe, 2a: first nozzle portion, 2b: inlet portion, 2e: intermediate Part, 2f: 1st nozzle, 2g: Outlet, 2h: Inner tube body, 2k: 1st opening end, 2r: Outer surface of 1st nozzle, 4: Sheath tube, 5: Outer tube, 5a: No. 2 nozzles, 5b: storage recess, 5f: second outlet, 5k: second opening end, 5r: outer peripheral surface of the second nozzle, 6: inert gas supply pipe, 7: gas pool, 8: exhaust gas introduction Piping, 10: Moisture ejection nozzle, 10a: Third nozzle, 10f: Third ejection port, 10f': Moisture ejection nozzle hole, 10k: Third opening end, 16: Moisture supply piping, 17: Water pool, 20: Water Processing tank, 21: steam pipe, 21a: upward nozzle port, 22: exhaust gas introduction part, 23: inlet side spray pipe, 23b: downward nozzle port, 25: inlet side filler layer, 26: exhaust pipe, 27: Inlet opening, 30: Moisture supply, 31: Inlet side pumping pipe, 34: Inlet side pumping pump, 37: Overflow pipe, 40: Water tank, 41: Ceiling, 42: Overflow pipe, 45: Water supply pipe , 50: Thermal decomposition tower, 51: Plasma jet torch, 52: Tower body, 53: Washing exhaust gas introduction part, 53a: Exhaust flow path, 55: Water reservoir, 56: Thermal decomposition zone, 57: Water wall, 60: Outlet Scrubber, 60a: scrubber body, 61: outlet side pumping pipe, 63: outlet side spray pipe, 63a: nozzle port, 64: outlet side pumping pump, 65: outlet side filler layer, 67: exhaust blower, 68: Exhaust pipe for atmospheric discharge, 100: Conventional nozzle, 101: Ejection, 110: Inlet scrubber, 111: Shower pipe, 112: Spray nozzle, 115: Filler layer, 120: Exhaust gas introduction pipe, 121: Exhaust gas introduction Nozzle connection part, 125: Thermal decomposition tower, 126: Thermal decomposition zone, 127: Exhaust gas introduction pipe, 128 : Tower body, 129: Heater, 140: Outlet scrubber, 150: Water tank, 151: Bulkhead.

Claims (9)

In the exhaust gas introduction nozzle installed in the exhaust gas introduction part of the water treatment tank of the water treatment device that hydrolyzes the exhaust gas containing the hydrolyzable component gas in a high humidity atmosphere inside.
An inner pipe that ejects the introduced exhaust gas from its first outlet into the high humidity atmosphere in the water treatment tank, and
The inner pipe is arranged so as to surround the outer periphery of the first ejection port, and an inert gas is ejected so as to surround the exhaust gas ejected from the first ejection port, and the inert gas is ejected around the exhaust gas. An exhaust gas introduction nozzle characterized by being composed of an outer pipe having a second ejection port forming a curtain. In the exhaust gas introduction nozzle according to claim 1,
An exhaust gas introduction nozzle characterized in that a moisture ejection nozzle having a third ejection port for ejecting fine water droplets or water vapor along the inert gas curtain is further provided around the second ejection port of the outer pipe. In the exhaust gas introduction nozzle according to claim 1 or 2.
An exhaust gas introduction nozzle characterized in that the second opening end of the second ejection port of the outer pipe is configured to protrude in the exhaust gas ejection direction from the first opening end of the first ejection port of the inner pipe. In the exhaust gas introduction nozzle according to claim 1 or 2.
An exhaust gas introduction nozzle characterized in that the second opening end of the second ejection port of the outer pipe and the first opening end of the first ejection port of the inner pipe 2 are configured to have the same protruding height. In the exhaust gas introduction nozzle according to claim 2,
The exhaust gas introduction is characterized in that the second opening end of the second ejection port of the outer pipe is configured to protrude in the exhaust gas ejection direction from the third opening end of the third ejection port of the moisture ejection nozzle. nozzle. In the exhaust gas introduction nozzle according to claim 2,
An exhaust gas introduction nozzle characterized in that the second opening end of the second ejection port of the outer pipe and the third opening end of the third ejection port of the moisture ejection nozzle are configured to have the same protruding height. The exhaust gas introduction nozzle according to any one of claims 1 to 6, wherein the ejection speed of the inert gas curtain is the same as the ejection speed of the exhaust gas, or the ejection speed of the inert gas curtain is faster. In a water treatment device that hydrolyzes the exhaust gas sent from a semiconductor manufacturing device to remove hydrolyzable gas components and sends the water-treated flush exhaust gas to the next process.
The exhaust gas introduction nozzle according to any one of claims 1 to 7.
A water treatment tank in which the exhaust gas introduction nozzle is attached to the exhaust gas introduction portion, and
A steam pipe provided in the water treatment tank, provided toward the first ejection port of the inner pipe, and having an upward nozzle port for ejecting steam, and a steam pipe.
A water treatment apparatus characterized in that it is connected to a next process from a water treatment tank and is composed of an exhaust pipe that sends out the water-treated wash exhaust gas to the next process. A water tank filled with water for circulation at the bottom,
A water treatment tank that is erected on the ceiling of the aquarium and has a high humidity atmosphere inside.
The exhaust gas introduction nozzle according to any one of claims 1 to 7, which is mounted on the exhaust gas introduction portion of the water treatment tank and blows the exhaust gas sent from the semiconductor manufacturing apparatus into the water treatment tank.
A thermal decomposition tower that is erected on the ceiling of the water tank, introduces flush exhaust gas that has been washed with water in the water treatment tank, and thermally decomposes in the internal thermal decomposition zone.
It is erected on the ceiling of the water tank, and is characterized by being composed of an outlet scrubber that cleans the pyrolyzed pyrolyzed exhaust gas H to remove harmful substances to make it air-released exhaust gas and releases the atmospherically-released exhaust gas to the atmosphere. Exhaust gas treatment equipment.