CN108619876A - The purifier of fluoride in a kind of manufacture of semiconductor exhaust gas - Google Patents
The purifier of fluoride in a kind of manufacture of semiconductor exhaust gas Download PDFInfo
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- CN108619876A CN108619876A CN201810747069.9A CN201810747069A CN108619876A CN 108619876 A CN108619876 A CN 108619876A CN 201810747069 A CN201810747069 A CN 201810747069A CN 108619876 A CN108619876 A CN 108619876A
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- water
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- pipe
- reaction
- exhaust gas
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- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 title claims abstract description 26
- 239000004065 semiconductor Substances 0.000 title claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 148
- 238000006243 chemical reaction Methods 0.000 claims abstract description 138
- 239000007789 gas Substances 0.000 claims abstract description 62
- 239000000567 combustion gas Substances 0.000 claims abstract description 41
- 239000007921 spray Substances 0.000 claims abstract description 9
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000003546 flue gas Substances 0.000 claims abstract description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 17
- 229910052710 silicon Inorganic materials 0.000 claims description 17
- 239000010703 silicon Substances 0.000 claims description 17
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 10
- 239000000843 powder Substances 0.000 claims description 10
- 239000004575 stone Substances 0.000 claims description 9
- 238000005406 washing Methods 0.000 claims description 4
- 239000007787 solid Substances 0.000 claims description 3
- 238000003466 welding Methods 0.000 claims description 3
- 238000002485 combustion reaction Methods 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- 238000000746 purification Methods 0.000 abstract description 4
- 238000005352 clarification Methods 0.000 abstract description 3
- 230000035484 reaction time Effects 0.000 abstract description 3
- 238000004064 recycling Methods 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 16
- 239000000377 silicon dioxide Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000004927 fusion Effects 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- 239000002912 waste gas Substances 0.000 description 3
- 101100373011 Drosophila melanogaster wapl gene Proteins 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000003682 fluorination reaction Methods 0.000 description 2
- 239000002737 fuel gas Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 210000004483 pasc Anatomy 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- 241000790917 Dioxys <bee> Species 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910003978 SiClx Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- -1 rack Chemical class 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/75—Multi-step processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
- B01D53/685—Halogens or halogen compounds by treating the gases with solids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/76—Gas phase processes, e.g. by using aerosols
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/81—Solid phase processes
- B01D53/82—Solid phase processes with stationary reactants
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
- B01D2257/204—Inorganic halogen compounds
- B01D2257/2047—Hydrofluoric acid
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Dispersion Chemistry (AREA)
- Treating Waste Gases (AREA)
Abstract
The present invention provides a kind of purifier of fluoride in manufacture of semiconductor exhaust gas, is related to purifier technical field.The purifier of fluoride in the manufacture of semiconductor exhaust gas, including rack, the left end of the rack is communicated with discarded output end by flue gas leading, the top of the rack is installed with flame reaction chamber, the inner wall bottom end of the flame reaction chamber is installed with hollow pipe, combustion gas reaction unit is fixedly mounted in the top of the hollow pipe, the combustion gas reaction unit includes combustion gas reaction chamber, the flame reaction chamber is communicated with combustion gas output end by air inlet, and the outer surface of the combustion gas reaction chamber is installed with flame spray head.The purifier of fluoride in the manufacture of semiconductor exhaust gas, the more thorough of the fluoride purification in exhaust gas, more efficiently, it has saved the clarification time, while energy saving using recycling for thermal energy, it is more environmentally-friendly, so that pyroreaction and water reaction bonded, saving reaction time and energy saving.
Description
Technical field
The present invention relates to purifier technical field, the purification dress of fluoride in specially a kind of manufacture of semiconductor exhaust gas
It sets.
Background technology
Semiconductor is a kind of common carriers for electronic components, with the development of society, electronic product is more and more diversified,
The application of semiconductor is also increasingly common, and the process for preparing semiconductor is also increasingly known.
Semiconductor will appear a large amount of harmful gases during preparation, these gas direct emissions can endanger environment and
The health of the mankind, it is especially the most serious with the harm of fluoride, so there is a kind of device of purification fluoride, traditional purification
Device is to first pass through the process of initial water wash, then into the process for crossing high temperature, finally in the process washed, wherein last washing
Process thoroughly can not efficiently purify, be unfavorable for environmental protection.
Invention content
In view of the deficiencies of the prior art, the present invention provides a kind of purifier of fluoride in manufacture of semiconductor exhaust gas,
Solve the problems, such as that the purifier of the fluoride thoroughly cannot efficiently purify fluoride and not environmentally.
Technical solution
In order to achieve the above object, the present invention is achieved by the following technical programs：Fluorine in a kind of manufacture of semiconductor exhaust gas
The left end of the purifier of compound, including rack, the rack is communicated with discarded output end, the top of the rack by flue gas leading
End is installed with flame reaction chamber, and the inner wall bottom end of the flame reaction chamber is installed with hollow pipe, the hollow pipe
Top be fixedly mounted combustion gas reaction unit, the combustion gas reaction unit includes combustion gas reaction chamber, the flame reaction chamber by into
Gas port is communicated with combustion gas output end, and the outer surface of the combustion gas reaction chamber is installed with flame spray head, the combustion gas reaction chamber
The opposite side in outer surface be installed with water reaction chamber, the combustion gas reaction chamber is communicated with combustion gas output with combustion gas output end
Pipe, the inner wall bottom of the rack, which is bolted, is equipped with No.1 water pump, and the No.1 water pump is communicated with one with hollow pipe
The inner wall bottom of number water pipe, the rack is installed with water tank, and the No.1 water pump is communicated with No. two water pipes with water tank, described
The inner bottom of flame reaction chamber is fixedly welded with ignition device, and the ignition device includes sparking room, the interior of room of striking sparks
Welding firestone is fixed in portion, and the outer surface of the firestone slidably connects friction stone, and the friction stone is far from firestone
One end is connected with push rod, and the side that the outer surface of the push rod is opposite is installed with spring, the inner wall of the sparking room
Leakage hole is offered, fan house is fixedly welded on the right side of the flame reaction chamber, the inside of the fan house passes through mounting plate
It is installed with wind turbine, washed reaction room is fixedly welded at the top of the rack, peace is fixed at the top of the escape pipe of the wind turbine
Equipped with wind nozzle, silicon dioxde reaction box is fixedly welded on the right side of the inner wall of the washed reaction room, the bottom of the rack is logical
It crosses bolt and is installed with No. two water pumps, No. two water pumps are communicated with No. three water pipes, No. two water pumps and washing with water tank
Reative cell is communicated with No. four water pipes, and the inner wall bottom end of the washed reaction room is installed with bearing arrangement, the washed reaction
The top of room is installed with motor by mounting plate, and the top movable of the bearing arrangement is connected with rotation pipe, the washing
Reative cell is internally provided with sink.
Further, the inside of the silicon dioxde reaction box is placed with SiO 2 powder, the silicon dioxde reaction
Box outer surfac right side opening is equipped with hole.
Further, the outer surface of the rotation pipe offers leakage hole, and circle is fixedly welded at the top of the rotation pipe
Column plate, the one end of the cylindrical plate far from rotation pipe are flexibly connected with the output end of motor.
Further, the bearing arrangement includes shell, and the inner wall of the shell slidably connects ball, the ball with
The outer surface of rotation pipe is slidably connected.
Further, branch pipe is communicated on the right side of the No.1 water pipe, the branch pipe sequentially passes through rack and sink and prolongs
Extend to the inside of sink.
Further, the wind turbine is connected to by aspiration channel with flame reaction chamber, and the discharge pipe of the wind turbine runs through
Washed reaction room simultaneously extends to washed reaction chamber interior.
Operation principle：In use, so that flue gas output is conveyed exhaust gas by exhaust output tube enters flame reaction room, then
So that fuel gas transmission end is entered by gas supply pipe delivery of fuel gas in combustion gas reaction chamber, while starting No.1 water pump so that one
Number water pump is sucked out the water in water tank by No. two water pipes, then water is discharged into water reaction chamber by No.1 water pipe, restarts and beats
Fiery device so that mantle friction of the push rod with dynamic friction stone in firestone goes out Mars so that Mars, which draws, penetrates leakage hole entrance
The combustion gas of sparking room so that entire flame reaction chamber burning waste gas, while the bottom of water reaction chamber is heated by flame spray head,
So that the water heating and gasifying in water reaction chamber so that vapor increase with the response area of exhaust gas, by flame it is calcined exhaust gas
It is reacted with vaporized water vapour in air so that exhaust gas is tentatively reacted with water, and another part exhaust gas enters water reaction chamber
It is reacted with water so that exhaust gas is further reacted with water, and the fluoride in exhaust gas generates HF gases after calcining, restarts
Wind turbine so that flame reaction chamber is sucked out by blast pipe in HF gases by wind turbine, then is discharged into washed reaction room, outlet air by discharge pipe
Pipe faces silicon dioxde reaction box so that the indoor SiO 2 powder of silicon dioxde reaction is blown out two by the HF gases being discharged into
Silica reaction box, increases the contact of silica and HF gases, while starting motor so that and motor rotation drives rotation pipe,
Starting No. two water pumps so that No. two water pumps are sucked out the water in water tank by No. three water pipes, then water is arranged by No. four water pipes
Enter to rotate in pipe so that water is sprayed onto through leakage hole in washed reaction room under the action of rotating pipe centrifugal force so that water
It is adequately merged with HF gases, and then tentatively with the aerial silicon dioxde reaction of floating, in the exhaust gas for eliminating a part
Fluoride opens simultaneously the valve of branch pipe so that water enters in sink, and sink is connected with the inner wall of flame reaction chamber so that fire
The thermal energy of flame reaction chamber is absorbed by the water in sink so that avoids the passage of thermal energy, while the temperature of sink increases, further
It accelerates HF gases and aqueous fusion is closed and silicon dioxde reaction so that the fluoride in exhaust gas completely eliminates.
Advantageous effect
Compare the prior art：
1, in the manufacture of semiconductor exhaust gas fluoride purifier, pass through No.1 water pump, branch pipe, wind turbine, silica
Reaction box, No. two water pumps, No. three water pipes, No. four water pipes, motor and the mutual cooperation for rotating pipe start wind turbine so that wind turbine handle
Flame reaction chamber is sucked out by blast pipe in HF gases, then is discharged into washed reaction room by discharge pipe, and discharge pipe faces titanium dioxide
Pasc reaction box so that the indoor SiO 2 powder of silicon dioxde reaction is blown out silicon dioxde reaction box by the HF gases being discharged into,
Increase the contact of silica and HF gases, while starting motor so that motor rotation drives rotation pipe, restarts No. two water
Pump so that the water in No. two pump handle water tanks is discharged into rotation pipe so that water penetrates leak under the action of rotating pipe centrifugal force
Hole is sprayed onto in washed reaction room so that water is adequately merged with HF gases, and then tentatively with float aerial dioxy
SiClx is reacted, and is eliminated the fluoride in the exhaust gas of a part, is opened simultaneously the valve of branch pipe, and water enters in sink, sink and fire
The inner wall of flame reaction chamber is connected so that the thermal energy of flame reaction chamber is absorbed by the water in sink, avoids the passage of thermal energy, simultaneously
The temperature of sink increases, and has further speeded up HF gases and aqueous fusion is closed and silicon dioxde reaction, in summary the purifier,
Fluoride in exhaust gas purifies more thorough, more efficiently, has saved the clarification time, while recycling section using thermal energy
The about energy, it is more environmentally-friendly.
2, in the manufacture of semiconductor exhaust gas fluoride purifier, pass through flame reaction chamber, hollow pipe, combustion gas reaction dress
It sets, the phase interworking of combustion gas reaction chamber, flame spray head, water reaction chamber, No.1 water pump, No.1 water pipe, No. two water pipes and ignition device
It closes, starts No.1 water pump so that No.1 water pump is sucked out the water in water tank by No. two water pipes, then water is arranged by No.1 water pipe
Enter in water reaction chamber, restart ignition device, push rod goes out Mars with dynamic friction stone in the mantle friction of firestone, and Mars draws thoroughly
Cross the combustion gas that leakage hole enters sparking room so that entire flame reaction chamber burning waste gas, while the bottom of water reaction chamber is by fire
The heating of flame nozzle, the water heating and gasifying in water reaction chamber so that vapor increases the response area with exhaust gas, is calcined by flame
Cross exhaust gas is reacted with vaporized water vapour in air so that exhaust gas is tentatively reacted with water, another part exhaust gas enter
Water reaction chamber is reacted with water so that exhaust gas is further reacted with water, and the purifier makes pyroreaction in summary
With water reaction bonded, reaction time and energy saving is saved.
Description of the drawings
Fig. 1 is schematic structural view of the invention；
Fig. 2 is ignition device structural schematic diagram of the present invention；
Fig. 3 is inventive silica reaction box structural schematic diagram；
Fig. 4 is present invention rotation pipe structural schematic diagram；
Fig. 5 is bearing arrangement structural schematic diagram of the present invention.
In figure：1, rack；2, output end is discarded；3, flame reaction chamber；4, hollow pipe；5, combustion gas reaction unit；51, combustion gas
Output end；52, combustion gas reaction chamber；6, flame spray head；7, water reaction chamber；8, combustion gas efferent duct；9, No.1 water pump；10, No.1 water
Pipe；101, branch pipe；11, water tank；12, No. two water pipes；13, ignition device；131, sparking room；132, firestone；133, rub stone；
134, push rod；135, spring；136, leakage hole；14, fan house；15, wind turbine；16, washed reaction room；17, wind nozzle；18, two
Silica reaction box；181, SiO 2 powder；182, hole；19, No. two water pumps；20, No. three water pipes；21, No. four water pipes；
22, bearing arrangement；221, shell；222, ball；23, motor；24, rotation pipe；241, leakage hole；242, cylindrical plate；25, water
Slot.
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
As shown in Figs. 1-5, the embodiment of the present invention provides a kind of purifier of fluoride in manufacture of semiconductor exhaust gas, including
The left end of rack 1, rack 1 is communicated with discarded output end 2 by flue gas leading, and the top of rack 1 is installed with flame reaction chamber
3, the inner wall bottom end of flame reaction chamber 3 is installed with hollow pipe 4, and combustion gas reaction unit 5 is fixedly mounted in the top of hollow pipe 4,
Combustion gas reaction unit 5 includes combustion gas reaction chamber 52, and flame reaction chamber 3 is communicated with combustion gas output end 51 by air inlet, and combustion gas is anti-
The outer surface of case 52 is answered to be installed with flame spray head 6, the side that the outer surface of combustion gas reaction chamber 52 is opposite is installed with water
Reaction chamber 7, combustion gas reaction chamber 52 are communicated with combustion gas efferent duct 8 with combustion gas output end 51, and the inner wall bottom of rack 1 is solid by bolt
Dingan County is equipped with No.1 water pump 9, and No.1 water pump 9 is communicated with No.1 water pipe 10 with hollow pipe 4, and the right side of No.1 water pipe 10 is communicated with branch
Pipe 101, branch pipe 101 sequentially pass through rack 1 and sink 25 and the inside for extending to sink 25, and peace is fixed in the inner wall bottom of rack 1
Equipped with water tank 11, No.1 water pump 9 is communicated with No. two water pipes 12 with water tank 11, and the inner bottom of flame reaction chamber 3 is fixedly welded with
Ignition device 13, ignition device 13 include sparking room 131, and welding firestone 132, firestone are fixed in the inside of sparking room 131
132 outer surface slidably connects friction stone 133, and the one end of friction stone 133 far from firestone 132 is connected with push rod 134,
The side that the outer surface of push rod 134 is opposite is installed with spring 135, and the inner wall of sparking room 131 offers leakage hole 136, leads to
Cross flame reaction chamber 3, hollow pipe 4, combustion gas reaction unit 5, combustion gas reaction chamber 52, flame spray head 6, water reaction chamber 7, No.1 water pump
9, the mutual cooperation of 10, No. two water pipes 12 and ignition device 13 of No.1 water pipe starts No.1 water pump 9 so that No.1 water pump 9 passes through
No. two water pipes 12 are sucked out the water in water tank 11, then water are discharged into water reaction chamber 7 by No.1 water pipe 10, restart sparking dress
Set 13 so that entire 3 burning waste gas of flame reaction chamber, while the bottom of water reaction chamber 7, by the heating of flame spray head 6, water is anti-
Answer the water heating and gasifying in chamber 7 so that vapor increase with the response area of exhaust gas, by flame it is calcined exhaust gas in air
Vaporized water vapour is reacted so that exhaust gas is tentatively reacted with water, and another part exhaust gas enters water reaction chamber 7 to carry out with water
Reaction so that exhaust gas is further reacted with water, and the purifier, pyroreaction and water reaction bonded, to save in summary
Reaction time and energy saving, the right side of flame reaction chamber 3 is fixedly welded with fan house 14, and the inside of fan house 14 passes through installation
Plate is installed with wind turbine 15, and the top of rack 1 is fixedly welded with washed reaction room 16, and wind turbine 15 is anti-with flame by aspiration channel
Chamber 3 is answered to be connected to, the discharge pipe of wind turbine 15 through washed reaction room 16 and extends to inside washed reaction room 16, the outlet of wind turbine 15
Tube top portion is installed with wind nozzle 17, is fixedly welded with silicon dioxde reaction box 18 on the right side of the inner wall of washed reaction room 16, and two
The inside of silica reaction box 18 is placed with SiO 2 powder 181, and 18 outer surface right side opening of silicon dioxde reaction box is equipped with hole
Hole 182, the bottom of rack 1, which is bolted, is equipped with No. two water pumps 19, and No. two water pumps 19 are communicated with No. three water with water tank 11
Pipe 20, No. two water pumps 19 are communicated with No. four water pipes 21 with washed reaction room 16, and the inner wall bottom end of washed reaction room 16 is fixedly mounted
It includes shell 221 to have bearing arrangement 22, bearing arrangement 22, and the inner wall of shell 221 slidably connects ball 222, ball 222 and rotation
The outer surface of tube 24 is slidably connected, and the top of washed reaction room 16 is installed with motor 23, bearing arrangement by mounting plate
22 top movable is connected with rotation pipe 24, and the outer surface of rotation pipe 24 offers leakage hole 241, and the top of rotation pipe 24 is fixed
It is welded with cylindrical plate 242, the one end of cylindrical plate 242 far from rotation pipe 24 is flexibly connected with the output end of motor 23, washed reaction
Room 16 is internally provided with sink 25, passes through 18, No. two No.1 water pump 9, branch pipe 101, wind turbine 15, silicon dioxde reaction box water pumps
19,20, No. four water pipes 21 of No. three water pipes, motor 23 and the mutual cooperation for rotating pipe 24 start wind turbine 15 so that wind turbine 15 is HF
Flame reaction chamber 3 is sucked out by blast pipe in gas, then is discharged into washed reaction room 16 by discharge pipe, and discharge pipe faces titanium dioxide
Pasc reaction box 18 so that the SiO 2 powder 181 in silicon dioxde reaction box 18 is blown out silica by the HF gases being discharged into
Reaction box 18, increases the contact of SiO 2 powder 181 and HF gases, while starting motor 23 so that the rotation of motor 23 drives
Pipe 24 is rotated, No. two water pumps 19 are restarted so that No. two water pumps 19 are discharged into the water in water tank 11 in rotation pipe 24 so that water exists
It is sprayed onto in washed reaction room 16 through leakage hole 241 under the action of rotation 24 centrifugal force of pipe so that water and HF gases are abundant
Fusion, and then tentatively with float aerial SiO 2 powder 181 and react, eliminate the fluorination in a part of exhaust gas
Object opens simultaneously the valve of branch pipe 101, and water enters in sink 25, and sink 25 is connected with the inner wall of flame reaction chamber 3 so that fire
The thermal energy of flame reaction chamber 3 is absorbed by the water in sink 25, the passage of thermal energy is avoided, while the temperature of sink 25 increases, into one
Step accelerates HF gases and aqueous fusion closes and reacted with SiO 2 powder 181, in summary the purifier, the fluorination in exhaust gas
Object purifies more thorough, more efficiently, has saved the clarification time, while energy saving using recycling for thermal energy, more
Environmental protection.
It although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with
Understanding without departing from the principles and spirit of the present invention can carry out these embodiments a variety of variations, modification, replace
And modification, the scope of the present invention is defined by the appended.
Claims (6)
1. the purifier of fluoride in a kind of manufacture of semiconductor exhaust gas, including rack (1), it is characterised in that：The rack (1)
Left end flue gas output (2) is communicated with by flue gas leading, the top of the rack (1) is installed with flame reaction chamber (3),
The inner wall bottom end of the flame reaction chamber (3) is installed with hollow pipe (4), and combustion is fixedly mounted in the top of the hollow pipe (4)
Solid/liquid/gas reactions device (5), the combustion gas reaction unit (5) include combustion gas reaction chamber (52), and the flame reaction chamber (3) passes through air inlet
Mouth is communicated with combustion gas output end (51), and the outer surface of the combustion gas reaction chamber (52) is installed with flame spray head (6), the combustion
The side that the outer surface of solid/liquid/gas reactions case (52) is opposite is installed with water reaction chamber (7), the combustion gas reaction chamber (52) and combustion gas
Output end (51) is communicated with combustion gas efferent duct (8), and the inner wall bottom of the rack (1), which is bolted, is equipped with No.1 water pump
(9), the No.1 water pump (9) is communicated with No.1 water pipe (10) with hollow pipe (4), and peace is fixed in the inner wall bottom of the rack (1)
Equipped with water tank (11), the No.1 water pump (9) is communicated with No. two water pipes (12) with water tank (11), the flame reaction chamber (3)
Inner bottom is fixedly welded with ignition device (13), and the ignition device (13) includes sparking room (131), the sparking room
(131) welding is fixed with firestone (132) in inside, and the outer surface of the firestone (132) slidably connects friction stone
(133), the described one end of friction stone (133) far from firestone (132) is connected with push rod (134), the push rod (134)
The opposite side in outer surface is installed with spring (135), and the inner wall of sparking room (131) offers leakage hole (136), institute
It states and is fixedly welded with fan house (14) on the right side of flame reaction chamber (3), the inside of the fan house (14) is fixed by mounting plate
Wind turbine (15) is installed, washed reaction room (16), the escape pipe of the wind turbine (15) are fixedly welded at the top of the rack (1)
Top is installed with wind nozzle (17), and silicon dioxde reaction box is fixedly welded on the right side of the inner wall of the washed reaction room (16)
(18), the bottom of the rack (1), which is bolted, is equipped with No. two water pumps (19), No. two water pumps (19) and water tank
(11) No. three water pipes (20) are communicated with, No. two water pumps (19) are communicated with No. four water pipes (21), institute with washed reaction room (16)
The inner wall bottom end for stating washed reaction room (16) is installed with bearing arrangement (22), passes through at the top of the washed reaction room (16)
Mounting plate is installed with motor (23), and the top movable of the bearing arrangement (22) is connected with rotation pipe (24), the washing
Reative cell (16) is internally provided with sink (25).
2. the purifier of fluoride in a kind of manufacture of semiconductor exhaust gas according to claim 1, it is characterised in that：It is described
The inside of silicon dioxde reaction box (18) is placed with SiO 2 powder (181), silicon dioxde reaction box (18) outer surface
Right side opening is equipped with hole (182).
3. the purifier of fluoride in a kind of manufacture of semiconductor exhaust gas according to claim 1, it is characterised in that：It is described
The outer surface of rotation pipe (24) offers leakage hole (241), and cylindrical plate is fixedly welded at the top of the rotation pipe (24)
(242), the one end of the cylindrical plate (242) far from rotation pipe (24) is flexibly connected with the output end of motor (23).
4. the purifier of fluoride in a kind of manufacture of semiconductor exhaust gas according to claim 1, it is characterised in that：It is described
Bearing arrangement (22) includes shell (221), and the inner wall of the shell (221) slidably connects ball (222), the ball
(222) outer surface with rotation pipe (24) is slidably connected.
5. the purifier of fluoride in a kind of manufacture of semiconductor exhaust gas according to claim 1, it is characterised in that：It is described
Branch pipe (101) is communicated on the right side of No.1 water pipe (10), the branch pipe (101) sequentially passes through rack (1) and sink (25) and prolongs
Extend to the inside of sink (25).
6. the purifier of fluoride in a kind of manufacture of semiconductor exhaust gas according to claim 1, it is characterised in that：It is described
Wind turbine (15) is connected to by aspiration channel with flame reaction chamber (3), and the discharge pipe of the wind turbine (15) runs through washed reaction room (16)
And it is internal to extend to washed reaction room (16).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810747069.9A CN108619876A (en) | 2018-07-09 | 2018-07-09 | The purifier of fluoride in a kind of manufacture of semiconductor exhaust gas |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810747069.9A CN108619876A (en) | 2018-07-09 | 2018-07-09 | The purifier of fluoride in a kind of manufacture of semiconductor exhaust gas |
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| Publication Number | Publication Date |
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| CN108619876A true CN108619876A (en) | 2018-10-09 |
Family
ID=63688820
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| Application Number | Title | Priority Date | Filing Date |
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| CN201810747069.9A Pending CN108619876A (en) | 2018-07-09 | 2018-07-09 | The purifier of fluoride in a kind of manufacture of semiconductor exhaust gas |
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| CN113015573A (en) * | 2018-11-06 | 2021-06-22 | 北京康肯环保设备有限公司 | Exhaust gas introduction nozzle, water treatment device, and exhaust gas treatment device |
| CN113648806A (en) * | 2021-08-11 | 2021-11-16 | 上海协微环境科技有限公司 | Purification device for fluoride in semiconductor process waste gas |
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