TWI709457B - Surface polishing apparatus and carrier - Google Patents
Surface polishing apparatus and carrier Download PDFInfo
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- TWI709457B TWI709457B TW106107403A TW106107403A TWI709457B TW I709457 B TWI709457 B TW I709457B TW 106107403 A TW106107403 A TW 106107403A TW 106107403 A TW106107403 A TW 106107403A TW I709457 B TWI709457 B TW I709457B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/28—Work carriers for double side lapping of plane surfaces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
即使是載具為不具有光透過性之載具的情 況,亦可藉由雷射光來測量該載具的厚度,且省去在前述載具的厚度測量之際將該載具從研磨裝置拆卸的麻煩,使工件之厚度與載具之厚度的間隙管理變得容易,並刪減其作業步驟。 Even if the vehicle is a vehicle that does not transmit light In addition, the thickness of the carrier can also be measured by laser light, and the trouble of removing the carrier from the grinding device during the thickness measurement of the carrier is eliminated, and the gap between the thickness of the workpiece and the thickness of the carrier is eliminated. Management becomes easier, and the operation steps are deleted.
一種用來研磨被保持在載具(30)之工 件(40)的平面研磨裝置(1),具有測量該工件(40)及載具(30)之厚度的厚度測量裝置(X),前述厚度測量裝置(X),係構成為將雷射光照向前述工件(40)及前述載具(30),且根據來自表背面的反射光來測量厚度,前述載具(30),係具有:具有用來保持前述工件(40)之工件保持孔(32)的本體部(31)、以及具備測量孔(34)及嵌入至該測量孔(34)之透光構件(35)的厚度測量部(Y)。 A tool used to grind the carrier (30) The surface grinding device (1) of the piece (40) has a thickness measuring device (X) for measuring the thickness of the workpiece (40) and the carrier (30). The aforementioned thickness measuring device (X) is configured to illuminate the laser To the workpiece (40) and the carrier (30), and measure the thickness based on the reflected light from the front and back. The carrier (30) has: a workpiece holding hole (40) for holding the workpiece (40) The main body part (31) of 32) and the thickness measuring part (Y) provided with a measuring hole (34) and a light-transmitting member (35) embedded in the measuring hole (34).
Description
本發明,係關於用來研磨半導體晶圓等之工件之表背面的平面研磨裝置、以及用來保持前述工件的載具。 The present invention relates to a plane polishing device for polishing the front and back surfaces of a workpiece such as a semiconductor wafer, and a carrier for holding the aforementioned workpiece.
用來研磨半導體晶圓或玻璃基板等之板狀工件的平面研磨裝置,一般係構成為:具有配置成旋轉自如的上定盤及下定盤、以及保持前述工件的載具,將被該載具所保持的前述工件以上定盤及下定盤來夾持,且藉由前述上定盤與下定盤來研磨該工件的表背面。 A flat surface polishing device used to polish plate-shaped workpieces such as semiconductor wafers or glass substrates is generally configured to have an upper and lower platen that are rotatably arranged, and a carrier that holds the aforementioned workpiece. The held work piece is clamped by the upper and lower platens, and the front and back sides of the work are polished by the upper and lower plates.
此種平面研磨裝置,已知係藉由在工件的厚度與載具的厚度之差成為既定值的時間點結束研磨,來得到具有高平面度的工件。因此,以往係如專利文獻1所揭示般,分別測量工件的厚度與載具的厚度,管理該工件的厚度與載具的厚度之差(間隙),而進行研磨加工直到該間隙成為既定值為止。
Such a flat polishing device is known to obtain a high flatness workpiece by terminating the polishing when the difference between the thickness of the workpiece and the thickness of the carrier becomes a predetermined value. Therefore, in the past, as disclosed in
但是,專利文獻1所揭示者,係在研磨開始
前測量載具的厚度,且在非研磨時(研磨砥粒的切換時機)來測量工件的厚度,故有著作業效率不佳的缺點。
However, as disclosed in
另一方面,於專利文獻2揭示有:於支撐框架安裝有雷射光的厚度測量裝置,由該厚度測量裝置對工件照射雷射光,並根據由該工件表面及背面所反射的反射光來算出該工件的厚度。根據此,可在研磨中測量工件的厚度,故作業效率優異。至於載具,由於來自該載具的反射光較弱,故會將該反射光作為測量異常,於是沒有用雷射光進行厚度測量。
On the other hand,
由於平面研磨加工所使用的載具係被反覆使用,故必須要有耐久性,於是一般來說使用耐久性優異的載具。其中,又以金屬或纖維強化塑膠等所成之不具有光透過性(透光性)的載具或光透過性(透光性)較低且反射光較弱的載具(以下稱為「不具有光透過性(透光性)的載具」)的反射光,其強度較弱故由反射光所得到的測量資料的峰值會被因研磨加工時之研磨裝置的振動等所產生的雜訊給蓋過,故會被當成雜訊來處理(成為測量異常)。特別是金屬製載具的情況,由於雷射光不會穿透,故無法以該雷射光進行厚度測量。因此,在使用金屬製載具來研磨工件的情況,必須在非研磨時特地將該載具從研磨裝置取出並使用測微器等的測量器具來測量厚度,作業效率差。 Since the carrier used in the surface grinding process is repeatedly used, it must be durable, so in general, a carrier with excellent durability is used. Among them, a carrier made of metal or fiber-reinforced plastic that does not have light transmission (transmittance) or a carrier with low light transmission (transmission) and weak reflected light (hereinafter referred to as " The reflected light of a carrier that does not have light transmittance (transparent)") has weak intensity, so the peak value of the measurement data obtained from the reflected light will be affected by the vibration of the polishing device during the polishing process. If the information is overwritten, it will be treated as noise (it becomes a measurement anomaly). Especially in the case of metal carriers, since the laser light does not penetrate, the thickness measurement cannot be performed with the laser light. Therefore, when a metal carrier is used to polish a workpiece, the carrier must be taken out of the polishing device during non-polishing and the thickness must be measured using a measuring instrument such as a micrometer, which results in poor work efficiency.
[專利文獻1]日本特開2010-45279號公報 [Patent Document 1] JP 2010-45279 A
[專利文獻2]日本特開2008-227393號公報 [Patent Document 2] JP 2008-227393 A
於是,本發明的技術性課題,係即使當載具為上述不具有光透過性(透光性)之載具的情況,亦可藉由雷射光來測量該載具的厚度,沒有必要在測量該載具的厚度之際將該載具從研磨裝置拆除,可有效率地進行間隙管理所致之工件的研磨。 Therefore, the technical problem of the present invention is that even when the carrier is the above-mentioned non-transparent (transparent) carrier, the thickness of the carrier can be measured by laser light, and there is no need to measure When the thickness of the carrier is to be removed from the polishing device, the workpiece can be polished efficiently due to gap management.
為了達成上述目的,根據本發明,提供一種平面研磨裝置,係具有配置成旋轉自如的上定盤及下定盤、以及用來保持工件的載具,將被保持於該載具的工件以前述上定盤及下定盤來夾持並研磨該工件的兩面,其特徵為,前述平面研磨裝置,具有用來測量前述工件及載具之厚度的厚度測量裝置,前述厚度測量裝置,係構成為將雷射光照向前述工件及載具,且根據來自該工件及載具之表面的反射光與來自背面的反射光來測量該工件及載具的厚度,前述載具,係具有:具有用來保持前述工件之工件保持孔的本體部、以及用來測量該載具之厚度的厚度測量 部,該厚度測量部,係具有形成在與前述工件保持孔不同位置的測量孔、以及嵌入至該測量孔的透光構件,該透光構件的光透過性(透光性)係比前述本體部還優異,且,該透光構件的厚度係與前述本體部的厚度相等,且,該透光構件的表背面係與前述本體部的表背面位在相同平面。 In order to achieve the above-mentioned object, according to the present invention, there is provided a surface grinding device, which has an upper and lower platen that are rotatably arranged, and a carrier for holding a workpiece, and the workpiece held on the carrier is The fixed plate and the lower fixed plate are used to clamp and grind both sides of the workpiece. The characteristic is that the flat surface grinding device has a thickness measuring device for measuring the thickness of the workpiece and the carrier, and the thickness measuring device is configured to The light is directed to the workpiece and the carrier, and the thickness of the workpiece and the carrier is measured based on the reflected light from the surface of the workpiece and the carrier and the reflected light from the back. The carrier has: The body part of the workpiece holding hole of the workpiece, and the thickness measurement used to measure the thickness of the carrier The thickness measuring part has a measuring hole formed at a position different from the aforementioned workpiece holding hole, and a light-transmitting member inserted into the measuring hole, and the light-transmitting member has a higher light transmittance (translucent) than the aforementioned body The part is also excellent, and the thickness of the light-transmitting member is equal to the thickness of the body part, and the front and back of the light-transmitting member are on the same plane as the front and back of the body.
關於本發明的平面研磨裝置,其較佳為,前述測量孔的口徑,比前述工件保持孔的口徑還小。且,前述透光構件的研磨速率,係與前述本體部的研磨速率同等或在其之下較佳。 Regarding the surface polishing device of the present invention, it is preferable that the diameter of the measuring hole is smaller than the diameter of the workpiece holding hole. Moreover, the polishing rate of the light-transmitting member is preferably equal to or lower than the polishing rate of the main body.
且,根據本發明,提供一種載具,其配置在平面研磨裝置的上定盤與下定盤之間,用來保持被該上定盤與下定盤研磨的工件,其特徵為,前述載具,係具有:具有用來保持前述工件之工件保持孔的本體部、以及用來以雷射光測量該載具之厚度的厚度測量部,該厚度測量部,係具有形成在與前述工件保持孔不同位置的測量孔、以及嵌入至該測量孔的透光構件,該透光構件的光透過性(透光性)係比前述本體部還優異,且,該透光構件的厚度係與前述本體部的厚度相等,且,該透光構件的表背面係與前述本體部的表背面位在相同平面。 Furthermore, according to the present invention, there is provided a carrier, which is arranged between the upper and lower plates of the planar grinding device, and is used to hold the workpieces ground by the upper and lower plates, characterized in that the aforementioned carrier, It is provided with a body part having a workpiece holding hole for holding the aforementioned workpiece, and a thickness measuring part for measuring the thickness of the carrier with laser light. The thickness measuring part is formed at a position different from the aforementioned workpiece holding hole The measuring hole of the measuring hole and the light-transmitting member embedded in the measuring hole, the light-transmitting member (translucent) is better than the aforementioned body, and the thickness of the light-transmitting member is the same as the thickness of the aforementioned body The thickness is equal, and the front and back of the light-transmitting member are on the same plane as the front and back of the aforementioned main body.
關於本發明的載具,其較佳為,前述測量孔的口徑,比前述工件保持孔的口徑還小。且,前述透光構件的研磨速率,係與前述本體部的研磨速率同等或在其之下較佳。 Regarding the carrier of the present invention, it is preferable that the diameter of the measuring hole is smaller than the diameter of the workpiece holding hole. Moreover, the polishing rate of the light-transmitting member is preferably equal to or lower than the polishing rate of the main body.
如上述般,根據本發明,即使載具為不具有光透過性(透光性)或光透過性(透光性)較低的材料,亦可藉由雷射光測量該載具的厚度,且,在測量載具的厚度之際,沒有必要特地將該載具從研磨裝置拆除,故工件厚度與載具厚度的間隙管理成為容易,能夠刪減作業工數。且,可防止因載具的拆除、再裝填所致之載具的變形或破損,故可防止由該變形或破損使上下定盤對研磨面的接觸成為不均勻而使研磨面的狀態成為不安定導致工件之加工精度偏差的發生,可實現穩定的研磨加工。 As described above, according to the present invention, even if the carrier is a material with no light transmittance (transmittance) or low light transmittance (transparency), the thickness of the carrier can be measured by laser light, and When measuring the thickness of the carrier, there is no need to specifically remove the carrier from the polishing device, so the gap management between the thickness of the workpiece and the thickness of the carrier becomes easy, and the number of work can be reduced. In addition, it can prevent the deformation or damage of the carrier caused by the removal and reloading of the carrier, so it can prevent the deformation or damage from making the contact between the upper and lower table and the polishing surface become uneven and the state of the polishing surface becomes uneven. Stability leads to deviations in the machining accuracy of the workpiece, and stable grinding can be achieved.
1:平面研磨裝置 1: Plane grinding device
2:上定盤 2: Upper fixing
3:下定盤 3: next fix
30:載具 30: Vehicle
31:本體部 31: body part
32:工件保持孔 32: Workpiece holding hole
34:測量孔 34: Measuring hole
35:透光構件 35: light transmitting member
40:工件 40: Workpiece
50:第2探頭 50: 2nd probe
X:厚度測量裝置 X: Thickness measuring device
Y:厚度測量部 Y: Thickness measurement department
圖1為表示關於本發明之平面研磨裝置之一實施形態之整體構造的概略剖面圖。 Fig. 1 is a schematic cross-sectional view showing the overall structure of an embodiment of a flat surface polishing apparatus related to the present invention.
圖2為表示在上定盤與下定盤上所配置之複數個載具的概略俯視圖。 Fig. 2 is a schematic plan view showing a plurality of carriers arranged on the upper plate and the lower plate.
圖3為表示測量工件厚度之狀態的概略部分擴大圖。 Fig. 3 is a schematic enlarged view showing the state of measuring the thickness of the workpiece.
圖4為表示本實施形態之載具之第一例的概略俯視圖。 Fig. 4 is a schematic plan view showing the first example of the carrier of the present embodiment.
圖5為表示前述載具之第二例的概略俯視圖。 Fig. 5 is a schematic plan view showing a second example of the aforementioned carrier.
圖6為表示前述載具之第三例的概略俯視圖。 Fig. 6 is a schematic plan view showing a third example of the aforementioned carrier.
圖7為表示前述載具之第四例的概略俯視圖。 Fig. 7 is a schematic plan view showing a fourth example of the aforementioned carrier.
圖8為表示測量載具厚度之狀態的概略部分擴大圖。 Fig. 8 is an enlarged view of a schematic part showing the state of measuring the thickness of the carrier.
以下,針對關於本發明之平面研磨裝置的一實施形態,使用圖式進行詳細說明。關於本實施形態的平面研磨裝置1,係用來研磨如矽晶圓或玻璃基板般具有光透過性(透光性)之板狀工件40的表背面者,如圖1所示般,於該平面研磨裝置1的機體具有以軸線L為中心旋轉自如地配設的上定盤2及下定盤3與太陽齒輪4及內齒輪5,並在前述下定盤3上具有以等間隔載置且咬合於前述太陽齒輪4及內齒輪5的金屬製載具30。於該載具30,形成有用來保持前述工件40的工件保持孔32。
Hereinafter, an embodiment of the surface polishing apparatus of the present invention will be described in detail using drawings. Regarding the
且,前述平面研磨裝置1,係具備第1~第4驅動軸2a~5a,其以前述軸線L為中心配設成同軸狀且下端與驅動馬達等的驅動源連接,於第1驅動軸2a的上端安裝有驅動器10,第2驅動軸3a的上端係與前述下定盤3連接,第3驅動軸4a的上端係與前述太陽齒輪4連接,第4驅動軸5a的上端係與前述內齒輪5連接,藉由該等驅動軸2a~5a使前述上定盤2及下定盤3、太陽齒輪4及內齒輪5,以前述軸線L為中心驅動、旋轉。又,前述第1驅動軸2a所致之上定盤2的驅動,係由以下的說明而明瞭。
In addition, the
於前述上定盤2的上方,設有與前述機體成為一體的支撐框架6,於該支撐框架6,安裝有馬達或氣缸等之昇降用致動器7,於該昇降用致動器7之昇降桿7a
的下端,連結有定盤懸吊件8,於該定盤懸吊件8使前述上定盤2被複數個支承螺柱8a所支撐。在前述定盤懸吊件8的內周、與前述昇降桿7a的外周之間,設有軸承12,藉由該軸承12,使前述昇降桿7a與定盤懸吊件8連結成在上下方向互相固定,但以前述軸線L為中心於旋轉方向相對地旋轉自如。
Above the upper
然後,在工件40的研磨時,藉由前述昇降用致動器7使昇降桿7a伸長並使上定盤2下降至圖1的研磨位置為止時,設在該上定盤2的鉤9與前述第1驅動軸2a之上端的前述驅動器10卡合,藉此使該上定盤2透過前述驅動器10,以前述第1驅動軸2a來驅動、旋轉。
Then, during the grinding of the
在工件的非研磨時,藉由前述昇降用致動器7使昇降桿7a收縮,並使前述上定盤2從研磨位置上升至離開的退避位置後,解除前述鉤9與驅動器10的卡合。
During the non-grinding of the workpiece, the lifting
如圖1所示般,在前述上定盤2的下面與下定盤3的上面,分別黏貼有具有均勻厚度的研磨墊11。作為該研磨墊11,使用有不織布製者或聚氨酯製者。但是,研磨墊11並非必須,亦可為取代研磨墊11來黏貼砥石的構造或定盤面本身成為研磨面的構造。
As shown in FIG. 1, a
前述載具30,係由不具有光透過性(透光性)或光透過性(透光性)較低的材料所成的載具。作為如此之載具的材質,有著:不鏽鋼、SK鋼、鈦等之金屬;陶瓷;使用玻璃纖維、碳纖維、芳綸纖維等的纖維強化塑膠;芳綸樹脂;氯乙烯;夾布酚醛塑料;或是將該等
以具有耐摩耗性、耐藥品性、耐久性的材料來塗覆者等,但在此以金屬來進行說明。如圖4所示般,載具30係在本體部31的外周具有齒輪31a,且在偏心的位置具有與工件成為相同形狀的1個工件保持孔32,在該工件保持孔32內保持有前述工件40(參照圖1及圖2)。該載具30,係載置於前述下定盤3的研磨墊11上,將外周的齒輪31a與前述太陽齒輪4和內齒輪5咬合,藉此以該等太陽齒輪4與內齒輪5的旋轉,來繞前述太陽齒輪4一邊自轉一邊公轉。
The
前述載具30,係製作得比研磨前之工件40的厚度還薄,且在將該研磨前的工件40保持在工件保持孔32時,該工件40從載具30的表面往上方突出(參照圖1及圖3)。
The
且,前述載具30,係如圖4~圖7所示般,具有漿液導入孔33,在研磨工件40時,由未圖示的漿液供給部所供給的研磨漿液,係通過該漿液導入孔33而遍及工件40的表背面。
Furthermore, the
藉由前述平面研磨裝置1進行工件40的研磨之際,在使前述上定盤2上升至退避位置的狀態,如圖2所示般,將複數個前述載具30以等間隔配置在下定盤3上,並將形成於其外周的前述齒輪31a,咬合於前述太陽齒輪4和內齒輪5。然後,在各載具30的工件保持孔32保持工件40之後,如圖1所示般,使前述上定盤2下降至研磨位置,並以該上定盤2和下定盤3夾住載具30。
在此狀態,透過前述驅動軸2a~5a使上定盤2及下定盤3與太陽齒輪4及內齒輪5,以事先設定的旋轉方向及旋轉速度來旋轉,藉由在前述上定盤2與下定盤3之間供給研磨漿液,而使繞著前述太陽齒輪4自轉及公轉的前述載具30所保持的工件40的表背面被前述上定盤2與下定盤3給研磨。
When the
又,圖2的例中,係將4個載具30在圓周方向以等間隔並排,但配置在下定盤3上的載具30之數量為任意。
In the example of FIG. 2, four
且,本實施形態的平面研磨裝置1,係構成為:分別測量工件40的厚度(T)與載具30的厚度(t),且在該工件40的厚度與載具30的厚度之差(間隙)成為所期望之值的時間點結束研磨,來進行間隙管理方式的研磨。因此,前述平面研磨裝置1,係具有用來以雷射光測量工件40之厚度與載具30之厚度的光學式厚度測量裝置X。
In addition, the
前述厚度測量裝置X,係構成為:可在前述工件40的研磨中,即時地測量該工件40的厚度與前述載具30的厚度之雙方。因此該厚度測量裝置X,係如圖1所示般,具有:輸出紅外線波長領域之雷射光的光源部20;將由該光源部20所輸出的雷射光照射朝向工件40藉此測量該工件40之厚度的第1探頭21;以及將由前述光源部20所輸出的雷射光照射朝向載具30藉此測量該載具30之厚度的第2探頭50。
The thickness measuring device X is configured to be capable of instantly measuring both the thickness of the
前述第1探頭21,係設置成與前述上定盤2一起旋轉。亦即,該第1探頭21,係於前述定盤懸吊件8或前述支承螺柱8a等,透過保持支架24而被安裝成朝向下,藉此配置在前述上定盤2的上方,且藉由第1光纜22,透過旋轉接頭23而連接於前述光源部20。然後,如圖3所示般,於前述工件40的研磨加工中,通過形成在前述上定盤2之測量用的第1測量窗部25對該工件40照射雷射光,並接受由該工件40之表面及背面所反射的反射光。根據所接受之反射光的測量資料,係通過前述第1光纜22送至演算控制部29,並在演算控制部29進行演算處理來算出工件40的厚度。
The
前述第1探頭21所致之工件40之厚度的測量,係在繞太陽齒輪4自轉及公轉的載具30所保持的工件40通過前述第1探頭21的正下方亦即前述第1測量窗部25的正下方時進行。
The thickness of the
又,根據前述第1探頭21所接受之反射光的測量資料,係可通過前述第1光纜22以光的狀態直接送至前述演算控制部29,但亦可在前述第1探頭21變換成電氣訊號,通過藉由旋轉接頭23連結該第1探頭21與前述演算控制部29之未圖示的電氣纜線來送至前述演算控制部29,或是以無線傳送亦可。
In addition, based on the measurement data of the reflected light received by the
前述第1測量窗部25,係配設在前述第1探頭21的正下方,具有:上下貫通該上定盤2的通過孔26、嵌合於該通過孔26的套管27、以及安裝於該套管27
之下端的透過板28。又,黏貼於前述上定盤2的研磨墊11,於設有前述第1測量窗部25的部分設有開口11a。
The
前述套管27,係合成樹脂製或玻璃製等的圓筒體,具有與前述通過孔26之口徑大致相等的外徑,且上端的突緣部27a固定在上定盤2的上面。又,前述通過孔26及前述套管27並不限於圓筒體,亦可為多角筒體等之形狀。
The
且,前述透過板28,係由合成樹脂或玻璃等之具有光透過性(透光性)的材料,較佳為由透明的材料形成板狀者,並安裝成塞住前述套管27下端的開口。
In addition, the
另一方面,用來測量載具30之厚度的前述第2探頭50,係朝向下安裝在前述支撐框架6,且藉由第2光纜51連接於前述光源部20。該第2探頭50,係與和上定盤2一起旋轉的前述第1探頭21不同,是在前述支撐框架6的定位置藉由適當的固定手段來固定配置。
On the other hand, the
由於係藉由前述第2探頭50,通過旋轉的前述上定盤2來測量載具30的厚度,故於該上定盤2設有一個或複數個用來使雷射光穿透的第2測量窗部52。在圖2所示的實施形態中,合計5個的第2測量窗部52,係在與前述第1測量窗部25相同的圓周上,以等間隔來配設。但是,前述第2測量窗部52的配設位置,亦可為與前述第1測量窗部25在上定盤2之半徑方向不同的位置。
Since the thickness of the
且,如圖8所示般,前述第2測量窗部52,
係與前述第1測量窗部25同樣地,具有:上下貫通上定盤2的通過孔26、嵌合於該通過孔26的套管27、以及安裝於該套管27之下端的透過板28。又,黏貼於前述上定盤2的研磨墊11,於設有前述第2測量窗部52的部分,與設有前述第1測量窗部25的部分同樣地設有開口11a。
And, as shown in FIG. 8, the aforementioned
前述套管27,係合成樹脂製或玻璃製等的圓筒體,具有與前述通過孔26之口徑大致相等的外徑,且上端的突緣部27a固定在上定盤2的上面。又,前述通過孔26及前述套管27並不限於圓筒體,亦可為多角筒體等之形狀。
The
且,前述透過板28,係由合成樹脂或玻璃等之具有光透過性(透光性)的材料,較佳為由透明的材料形成板狀者,並安裝成塞住前述套管27下端的開口。
In addition, the
但是,在前述載具30為金屬製的情況,即使以前述第2探頭50對該載具30照射雷射光,雷射光亦無法穿透該載具30,而無法得到來自該載具30之背面側的反射光,故無法測量該載具30的厚度。
However, when the
於是,本發明中,係如圖1~圖4所示般,於前述載具30形成有用來以雷射光測量厚度的1個厚度測量部Y。該厚度測量部Y,係由與前述工件保持孔32及漿液導入孔33形成在不同位置的測量孔34、和埋入至該測量孔34的透光構件35所形成。
Therefore, in the present invention, as shown in FIGS. 1 to 4, one thickness measuring part Y for measuring the thickness by laser light is formed on the
前述測量孔34,係將載具30從表面往背面貫
通之圓形的孔,其口徑以比前述工件保持孔32的口徑還小為佳。藉此,不會損及載具30的強度,可抑制設置在前述測量孔的前述透光構件35與研磨面接觸所產生的摩耗。該測量孔34,以盡量形成在接近載具30之中心的位置較佳。又,前述測量孔34的形狀並不限於圓形,亦可為多角形。
The
前述透光構件35,係以具有光透過性(透光性)的材料所形成,比前述本體部31的光透過性(透光性)還優異,且具有與前述本體部31之厚度相等的厚度,其表背面與前述本體部31的表背面成為相同平面,且嵌入至前述測量孔34內。
The light-transmitting
由於在金屬製的載具30形成有上述般之由測量孔34及透光構件35所成的厚度測量部Y,藉此以前述第2探頭50來對該透光構件35照射雷射光,而可得到來自該透光構件35之表面及背面的反射光,其結果,可測量該載具30的厚度。
Since the
前述透光構件35,作為具有光透過性(透光性)的材料,例如可由:丙烯酸系樹脂、聚氨酯系樹脂‧聚對苯二甲酸乙二酯樹脂(PET)等的合成樹脂;石英;藍寶石;玻璃;矽等所構成,重要的是適當選擇光透過性(透光性)比前述本體部31的材質還要優異的材料。特別是,重要的是適當選擇紅外線波長領域之雷射光的光透過性(透光性)比前述本體部31的材質還要優異的材料(紅外線透過材料)。又,該透光構件35對前述測量孔
34的安裝,例如,亦可由接著劑來接著,亦可為楔式嵌合,可用適當的手段來安裝。
The aforementioned light-transmitting
且,前述透光構件35的研磨速率,以與前述本體部31的研磨速率同等或比前述本體部31的研磨速率還低(較難研磨)為佳。其理由,係在研磨加工時,下定盤3的研磨面經常與前述本體部31的下面接觸故前述本體部31受到研磨,且,隨著研磨加工進行會使前述上定盤2與前述本體部31之上面的距離會縮短,使前述上定盤2的研磨面與前述本體部31的上面接觸,藉此會使前述本體部31受到研磨。因此,若前述透光構件35的研磨速率比前述本體部31的研磨速率還高(較易研磨)的話,該透光構件35會被研磨而變得比前述本體部31還薄,導致厚度的測量精度降低。
In addition, the polishing rate of the light-transmitting
如圖8所示般,在工件40的研磨加工中以前述第2探頭50所進行之載具30的厚度測量,係使形成於旋轉之上定盤2的前述第2測量窗部52、以及安裝在載具30的前述透光構件35,位在前述第2探頭50之正下方時來進行。此時,由前述第2探頭50對前述透光構件35所照射的雷射光,係在該透光構件35的表面及背面被反射,該反射光係作為測量資料而被前述第2探頭50接受。所接受的測量資料,係通過前述第2光纜51送至演算控制部29,並在演算控制部29進行演算處理來算出載具30的厚度。
As shown in FIG. 8, in the grinding process of the
來自前述第2探頭50的雷射光,可在工件40
的研磨加工中經常照射,但亦可控制成只有在上定盤2的第2測量窗部52與載具30的透光構件35並排在該第2探頭50之正下方的瞬間才照射。此情況,藉由將複數個第2測量窗部52予以等間隔配置,可用規則性的時序來進行照射。又,藉由複數設置第2測量窗部52,測量次數變多而提高測量精度。
The laser light from the aforementioned
且,根據前述第2探頭50的測量資料,係可通過前述第2光纜51以光的狀態直接送至前述演算控制部29,但亦可在前述第2探頭50變換成電氣訊號,通過將該第2探頭50與前述演算控制部29予以連結之未圖示的電氣纜線來送至該演算控制部29,或是以無線傳送亦可。
In addition, the measurement data of the
若在工件40的研磨加工中以此方式來測量工件40的厚度與載具30的厚度的話,兩者的測量資料係在前述演算控制部29進行比較,在工件40的厚度與載具30的厚度之差成為所期望之值的時間點結束研磨。
If the thickness of the
又,如上述般在工件40的研磨加工中對該工件40的厚度與載具30的厚度進行測量的情況,雖然前述第1探頭21及第2探頭50,係接受來自前述工件40之表背面的反射光、以及來自前述載具30之透光構件35之表背面的反射光之雙方的反射光,但兩者的峰值有著差異,有必要利用其差異來調整成:使前述第1探頭21僅接受來自工件40的反射光作為測量資料,且使第2探頭50僅接受來自載具30之透光構件35的反射光作為測量資料。
In addition, when measuring the thickness of the
前述載具30的厚度測量,可在沒有研磨工件40的時候進行。例如,在研磨開始前將新的工件40設置於載具30時,或是在工件40的研磨後使用純水進行洗滌步驟時等,可利用批次處理間的時間來進行。此時的厚度測量,係使該上定盤2停止而使該上定盤2之任何一個第2測量窗部52位在第2探頭50之正下方的位置,慢慢使太陽齒輪4與內齒輪5旋轉來使載具30自轉及公轉,使前述透光構件35通過前述第2測量窗部52下方來進行。如上述般,在工件40之非研磨時進行載具30之厚度測量的裝置中,形成於上定盤2的前述第2測量窗部52亦可為一個。
The thickness measurement of the
於圖5~圖7表示關於本發明之載具30的變形例。
5 to 7 show a modification of the
圖5所示的載具30和圖4所示的載具30之不同處,係3個厚度測量部Y在載具30的圓周方向以等間隔(120度間隔)形成。如上述般,藉由設置複數個厚度測量部Y,來增大測量資料的取得數量。
The difference between the
於圖6所示的載具30,在載具30的圓周方向以等間隔(120度間隔)形成有3個工件保持孔32,且在鄰接之前述工件保持孔32間個別地形成有3個漿液導入孔33,於該載具30的中心部形成有單一的厚度測量部Y。載具30的中心部,係在該載具30自轉及公轉之際移動量最少的位置,故藉由在此處設置厚度測量部Y,有著在研磨加工中不容易使透光構件35被上定盤2和下定盤3研磨的
優點。
In the
圖7所示的載具30和圖6所示的載具30之不同處,係形成有複數個厚度測量部Y。亦即,分別夾持各漿液導入孔33來形成2個厚度測量部Y,藉此共形成有三組亦即6個厚度測量部Y。
The difference between the
如此一來,本實施形態的平面研磨裝置1中,即使在照射雷射光時使用由具有比來自工件40之反射光強度還低反射光強度的材料所成的載具30,亦可測量工件40的厚度與載具30的厚度並以間隙管理方式來進行研磨,其結果,可得到具有高平面度的工件40。而且,前述載具30之厚度的測量,係將該載具30設置在平面研磨裝置不必取出就可藉由雷射光來進行,故不像以往的裝置那般,必須將載具從裝置取出並藉由測微器等來進行測量,故省去測量的麻煩而有優異的作業性。且,由於沒有必要每次都進行載具的拆除、再裝填,可防止載具的變形或破損,故可防止由該變形或破損所起因之上下定盤對研磨面的接觸成為不均勻且研磨面的狀態成為不安定導致工件的加工精度偏差的發生,其結果,可實現穩定的研磨加工。
In this way, in the
以上,針對關於本發明的平面研磨裝置進行了說明,但本發明並不限定於上述的實施形態及變形例,在不超脫申請專利範圍主旨的範圍內可進行各種設計變更。例如,如前述般,前述第1探頭21及第2探頭50,係可接受來自前述工件40之表背面的反射光、以及來自前述載具30之透光構件35之表背面的反射光等雙方的反
射光,故可省略任一方的探頭,構成為藉由第1探頭21或第2探頭50來測量工件40的厚度與載具30的厚度之雙方。且,亦可構成為省略第1測量窗部25和第2測量窗部52之任一方的測量窗部,而藉由第1測量窗部25或第2測量窗部52來測量工件40的厚度與載具30的厚度之雙方。
As mentioned above, the surface polishing device of the present invention has been described, but the present invention is not limited to the above-mentioned embodiments and modifications, and various design changes can be made without departing from the scope of the patent application. For example, as described above, the
1:平面研磨裝置 1: Plane grinding device
2:上定盤 2: Upper fixing
2a:第1驅動軸 2a: 1st drive shaft
3:下定盤 3: next fix
3a:第2驅動軸 3a: 2nd drive shaft
4:太陽齒輪 4: Sun gear
4a:第3驅動軸 4a: 3rd drive shaft
5:內齒輪 5: Internal gear
5a:第4驅動軸 5a: 4th drive shaft
6:支撐框架 6: Support frame
7:昇降用致動器 7: Actuator for lifting
7a:昇降桿 7a: Lifting rod
8:定盤懸吊件 8: Fixing plate suspension
8a:支承螺柱 8a: Support stud
9:鉤 9: hook
10:驅動器 10: Drive
11:研磨墊 11: Grinding pad
11a:開口 11a: opening
12:軸承 12: Bearing
20:光源部 20: Light source
21:第1探頭 21: The first probe
22:第1光纜 22: The first optical cable
23:旋轉接頭 23: Rotary joint
24:保持支架 24: Keep the bracket
25:第1測量窗部 25: The first measurement window
29:演算控制部 29: Calculation Control Department
30:載具 30: Vehicle
31:本體部 31: body part
32:工件保持孔 32: Workpiece holding hole
34:測量孔 34: Measuring hole
35:透光構件 35: light transmitting member
40:工件 40: Workpiece
50:第2探頭 50: 2nd probe
51:第2光纜 51: 2nd optical cable
52:第2測量窗部 52: The second measurement window
X:厚度測量裝置 X: Thickness measuring device
Y:厚度測量部 Y: Thickness measurement department
Claims (6)
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JP6760638B2 (en) * | 2016-04-14 | 2020-09-23 | スピードファム株式会社 | Flat surface polishing device |
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JP7035748B2 (en) * | 2018-04-11 | 2022-03-15 | 株式会社Sumco | Work double-sided polishing device |
JP7046358B2 (en) * | 2018-04-17 | 2022-04-04 | スピードファム株式会社 | Polishing equipment |
JP7364217B2 (en) * | 2019-11-05 | 2023-10-18 | スピードファム株式会社 | polishing equipment |
JP2021102245A (en) * | 2019-12-25 | 2021-07-15 | スピードファム株式会社 | Workpiece hole detection device and workpiece hole detection method |
JP7435113B2 (en) * | 2020-03-23 | 2024-02-21 | 株式会社Sumco | Double-sided polishing device for workpieces |
JP7425411B2 (en) * | 2020-10-12 | 2024-01-31 | 株式会社Sumco | Carrier measurement device, carrier measurement method, and carrier management method |
CN117506703B (en) * | 2023-12-01 | 2024-05-10 | 苏州博宏源机械制造有限公司 | Measuring device and polishing system |
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JP6622117B2 (en) | 2019-12-18 |
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