JPH0740233A - Thickness measuring device of work - Google Patents
Thickness measuring device of workInfo
- Publication number
- JPH0740233A JPH0740233A JP20370393A JP20370393A JPH0740233A JP H0740233 A JPH0740233 A JP H0740233A JP 20370393 A JP20370393 A JP 20370393A JP 20370393 A JP20370393 A JP 20370393A JP H0740233 A JPH0740233 A JP H0740233A
- Authority
- JP
- Japan
- Prior art keywords
- work
- thickness
- sensors
- surface plate
- measuring device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、ワークの両面を同時に
研磨加工する平面研磨装置に係るものである。さらに詳
しくは平面研磨装置におけるワークの厚さ測定装置に関
するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat surface polishing apparatus for simultaneously polishing both surfaces of a work. More specifically, the present invention relates to a work thickness measuring device in a flat polishing device.
【0002】[0002]
【従来の技術】従来、特公平2−60467号公報に開
示されているように、リング状の定盤の中心において、
磁気センサを利用して上下定盤間隔を測定し、これをワ
ークの厚さに置き換えるものが一般に知られている。2. Description of the Related Art Conventionally, as disclosed in Japanese Patent Publication No. 2-60467, at the center of a ring-shaped surface plate,
It is generally known that a magnetic sensor is used to measure the distance between the upper and lower surface plates, and this is replaced with the thickness of the work.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、加工さ
れたワークの厚さ寸法精度の要求がきびしい状況にある
現在、前記の従来技術においては、上下の定盤が摩耗す
ることや加工中の微振動などにより、ワークの厚さを正
確に測定することができなかった。この問題を解決する
ため、1バッチ目を始める前とそれ以後、数バッチ加工
する毎に機械を停止させ、上定盤を上昇させてワークを
取り出し、ダイヤルゲージやマイクロメータ等の測定装
置によりワーク厚さを測定し、加工中に表示されたワー
ク厚さと比較して、次バッチ加工開始前にコントローラ
に補正値を入力しておく必要があった。本発明は、この
点に鑑み、これをより実際に近い値が測定できるワーク
厚さ測定装置を提供することを目的とするものである。However, in the present situation where the precision of the thickness dimension of the machined work is severely demanded, in the above-mentioned prior art, the upper and lower surface plates are worn and slight vibrations occur during the machining. Therefore, the thickness of the work could not be accurately measured. In order to solve this problem, before starting the first batch and after every few batches, the machine is stopped, the upper platen is lifted to take out the work, and the work is measured by a measuring device such as a dial gauge or a micrometer. It was necessary to measure the thickness, compare it with the work thickness displayed during processing, and input the correction value to the controller before starting the next batch processing. In view of this point, an object of the present invention is to provide a work thickness measuring device capable of measuring a value closer to the actual value.
【0004】[0004]
【課題を解決するための手段】本発明は、上記の課題を
解決するために、次の技術手段を採用した。請求項1記
載の発明は、平面研磨装置において、上下定盤、太陽歯
車、内歯歯車の駆動を停止させ、ワークを上下定盤間に
挟持させたままの状態で、2つのセンサの一方をワーク
の上面、他方を下定盤面に接触させて、加工前後のセン
サによる測定差からワークの厚さを測定するという技術
的手段を採用した。請求項2記載の発明は、平面研磨装
置において、上下定盤、太陽歯車、内歯歯車の駆動を停
止させ、ワークを上下定盤に挟持させたままの状態で、
2つのセンサの一方をワークの上面、他方をキャリヤ上
面に接触させて、加工前後のセンサによる測定差からワ
ークの厚さを測定するという技術的手段を採用した。The present invention adopts the following technical means in order to solve the above problems. According to a first aspect of the present invention, in the surface polishing apparatus, driving of the upper and lower surface plates, the sun gear, and the internal gear is stopped, and one of the two sensors is placed in a state where the work is held between the upper and lower surface plates. A technical means was adopted in which the upper surface of the work and the other surface were brought into contact with the surface of the lower surface plate, and the thickness of the work was measured from the measurement difference by the sensor before and after processing. According to a second aspect of the present invention, in the surface polishing apparatus, the driving of the upper and lower surface plate, the sun gear, and the internal gear is stopped, and the work is held between the upper and lower surface plate,
A technical means is adopted in which one of the two sensors is brought into contact with the upper surface of the work and the other is brought into contact with the upper surface of the carrier, and the thickness of the work is measured from the difference between the sensors before and after processing.
【0005】[0005]
【作用】上下定盤、太陽歯車、内歯歯車の駆動を停止さ
せ、ワークを上下定盤間に挟持させたままの状態で2つ
のセンサの一方をワーク上面、他方を下定盤面又はキャ
リヤ上面に接触させて、加工前後のセンサによる測定値
からワークの厚さを測定するようにしたので、上下定盤
の摩耗を考慮した値を得ることができ、又、加工を停止
した状態であるので微振動の影響もない。さらに、上下
定盤にワークを挟持した状態で測定しているので、も
し、ワークの厚さが最終目標値よりも大きい場合にはそ
のまま加工を再開することができ、これにより作業時間
の短縮を図ることができる。[Operation] With the upper and lower surface plates, the sun gear, and the internal gears stopped driving, one of the two sensors is placed on the upper surface of the work and the other is placed on the lower surface plate or the upper surface of the carrier while the workpiece is held between the upper and lower surface plates. Since the thickness of the work is measured from the values measured by the sensors that come into contact with each other before and after machining, it is possible to obtain a value that takes into account the wear of the upper and lower surface plates, and because machining is stopped, There is no effect of vibration. Furthermore, since the work is clamped between the upper and lower surface plates, the measurement can be restarted if the work thickness is larger than the final target value, which reduces the work time. Can be planned.
【0006】[0006]
【実施例】以下本発明の1実施例を添付図面に基づいて
詳細に説明する。先ず、図1〜図3は本発明の1実施例
を示すもので、この研磨装置は、同軸状に位置する上下
の定盤1、2と太陽歯車3及び内歯歯車4を備え、両歯
車3、4で遊星歯車状に駆動される複数のキャリヤ5に
保持させたワーク6を上下の定盤1、2で両側から挟ん
で研磨加工するものである。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the accompanying drawings. First, FIGS. 1 to 3 show an embodiment of the present invention. This polishing apparatus is provided with upper and lower surface plates 1 and 2 coaxially positioned, a sun gear 3 and an internal gear 4 and both gears. The work 6 held by a plurality of carriers 5 driven in the form of planetary gears 3 and 4 is sandwiched between the upper and lower surface plates 1 and 2 from both sides and polished.
【0007】機体7にはワークの厚さ測定装置8が設け
られている。ワークの厚さ測定装置8は2本のセンサ9
(例えば、磁気センサ等)をエアシリンダ10等のアク
チュエータと直線ガイド11等によって昇降させ、機体
内部に収納したモータ或いは、エアシリンダ等により図
3の測定位置a(実線)と待機位置b(点線)との間を
回転するようにしてある。このようにワークの厚さを測
定する時には、定寸装置によるか、或いは、時間管理に
よって目標値でいったん加工を終了する。この時、定位
置に停止して待機位置から測定位置に回動させて、上定
盤の2つの貫通孔12、13にそれぞれセンサ9のセン
サプローヴ14を挿入し、一方はワーク6上面、他方は
下定盤面上或いは、キャリヤ5上に接触させワーク6の
厚さを測定する。The machine body 7 is provided with a work thickness measuring device 8. The work thickness measuring device 8 has two sensors 9
(For example, a magnetic sensor) is moved up and down by an actuator such as an air cylinder 10 and a linear guide 11 and the like, and a measurement position a (solid line) and a standby position b (dotted line) in FIG. ) To rotate between. In this way, when measuring the thickness of the work, the processing is once finished with a target value by a sizing device or by time management. At this time, the sensor probe 14 of the sensor 9 is inserted into the two through holes 12 and 13 of the upper surface plate by stopping at a fixed position and rotating from the standby position to the measurement position. The thickness of the work 6 is measured by bringing it into contact with the lower surface plate surface or the carrier 5.
【0008】次に前記ワークの厚さ測定装置8を用いて
ワーク厚さを測定するには、 (1)ラッピングマシンの場合、2つのセンサ9のうち
一方のセンサをワーク6上面、他方のセンサを下定盤2
面に接触させれば、それぞれのセンサの読みの差がワー
ク厚さとなる。これを図4で説明すれば、加工後のワー
ク厚さW=(Aの読み)ー(Bの読み)となる。勿論、
加工前にセンサを2本とも下定盤2面に接触させ、0調
整を行ってもよい。 (2)ポリッシングマシンの場合、図5に示すように、
2つのセンサA、Bの内、一方のセンサをワーク6上
面、他方のセンサをキャリヤ5上面に接触させ、キャリ
ヤ5の厚さを一定として(a−c)+(キャリヤの厚
さ)をワークの厚さと比較する。この場合も加工前に2
本のセンサ9をいずれもキャリヤ5上面に接触させて0
調整しても良い。Next, in order to measure the work thickness using the work thickness measuring device 8, (1) In the case of a lapping machine, one sensor of the two sensors 9 is used as the upper surface of the work 6 and the other sensor. The lower surface plate 2
If they are brought into contact with the surface, the difference between the readings of the respective sensors becomes the work thickness. This will be described with reference to FIG. 4. The work thickness after processing is W = (reading of A) − (reading of B). Of course,
Before processing, both sensors may be brought into contact with the two surfaces of the lower surface plate to perform zero adjustment. (2) In the case of polishing machine, as shown in FIG.
Of the two sensors A and B, one sensor is brought into contact with the upper surface of the work 6 and the other sensor is brought into contact with the upper surface of the carrier 5, and the thickness of the carrier 5 is kept constant (a−c) + (the thickness of the carrier). Compare with the thickness of. Also in this case 2 before processing
All the sensors 9 of the book are brought into contact with the upper surface of the carrier 5 and
You may adjust it.
【0009】このように構成されたワークの厚さ測定装
置は、単体で厚さ測定装置として使えることは勿論、従
来の定寸装置と組み合わせて使うことができる。この場
合、図1に示すような構成で上定盤1の下降量をワーク
の厚さとして測定するか、或いは、特公平2−6046
7号公報に開示されているように上下定盤の間隔をワー
クの厚さとして測定するわけであるが、いずれの場合に
も定盤の摩耗量(上定盤の摩耗は圧力と研磨レートに関
係し、下定盤の摩耗はワークの厚さ測定に影響する)を
考慮に入れていないため、実際の厚さと目標値との間に
誤差がある。本発明のワーク厚さ測定装置は、このよう
な誤差を補正するために使用することができる。すなわ
ち、定寸装置が働いた時のワーク厚さは目標値よりも定
盤の摩耗量分厚い。そこで、ワークの削れ量と定盤の削
れ量との比から目標厚さまでの残りの取り代にその時予
想される定盤の削れ量を加えた値を設定して加工を再開
すれば、目標の厚さに加工することができる。The work thickness measuring device thus constructed can be used alone as a thickness measuring device or can be used in combination with a conventional sizing device. In this case, the amount of lowering of the upper surface plate 1 is measured as the thickness of the work with the configuration as shown in FIG.
As disclosed in Japanese Patent Publication No. 7, the distance between the upper and lower stools is measured as the thickness of the work. In either case, the wear amount of the stool (the wear of the upper stool depends on the pressure and the polishing rate). However, since the wear of the lower surface plate affects the measurement of the thickness of the work), there is an error between the actual thickness and the target value. The work thickness measuring device of the present invention can be used to correct such an error. That is, the work thickness when the sizing device operates is thicker than the target value by the wear amount of the surface plate. Therefore, if you set a value that includes the ratio of the amount of work scraped and the amount of surface plate scraped to the target thickness, and the amount of surface plate wear that is expected at that time, and restart processing, the target Can be processed to thickness.
【0010】また、従来の定寸装置でなく、時間管理に
よる研磨と併用することもできる。すなわち、経験的に
得られた研磨レートから目標値に達するまでの時間を計
算し、その時間加工した後、本発明のワーク厚さ測定装
置で実際の厚さを測定し、残りの加工時間を設定する事
ができる。Further, instead of the conventional sizing device, it can be used together with polishing by time management. That is, the time required to reach the target value from the empirically obtained polishing rate is calculated, and after processing for that time, the actual thickness is measured with the work thickness measuring device of the present invention, and the remaining processing time is calculated. Can be set.
【0011】このように、本発明によれば、ワークの厚
さ測定装置単体でワークの厚さ管理に使うことができる
し、従来の方法と組み合わせてより正確な厚さ管理をす
ることもできる。As described above, according to the present invention, the work thickness measuring device alone can be used to control the work thickness, and more accurate thickness control can be performed in combination with the conventional method. .
【0012】[0012]
【発明の効果】本発明は、以上の構成を採用した結果、
次の効果を得ることができる。 (1)簡単な構成で定盤の摩耗に左右されない測定がで
きる。 (2)ワークの厚さ測定装置を待機位置へ回動させれ
ば、そのまま加工を再開できる。 (3)従来の方法、例えば下定盤間隔をウエハーの厚み
として検知する方法などと併用することでよりよい厚さ
管理ができる。As a result of adopting the above configuration, the present invention provides
The following effects can be obtained. (1) With a simple structure, measurement can be performed without being influenced by the wear of the surface plate. (2) If the work thickness measuring device is rotated to the standby position, the machining can be restarted as it is. (3) Better thickness control can be achieved by using it together with a conventional method, for example, a method of detecting the lower platen spacing as the thickness of the wafer.
【図1】本発明を実施するラッピング装置の1実施例を
示す縦断面図である。FIG. 1 is a vertical sectional view showing an embodiment of a lapping apparatus for carrying out the present invention.
【図2】図1の厚さ測定装置を示す要部断面図である。FIG. 2 is a cross-sectional view of essential parts showing the thickness measuring device of FIG.
【図3】図1の厚さ測定装置の測定位置を示す要部平面
図である。FIG. 3 is a plan view of relevant parts showing measurement positions of the thickness measuring device of FIG.
【図4】本発明のセンサを1つはワーク上に、他の1つ
は下定盤上に接触させて測定している状態を示す要部拡
大断面図である。FIG. 4 is an enlarged cross-sectional view of an essential part showing a state where one of the sensors of the present invention is in contact with the work and the other is in contact with the lower surface plate.
【図5】本発明のセンサを1つはワーク上に、他の1つ
はキャリヤ上に接触させて測定している状態を示す要部
拡大断面図である。FIG. 5 is an enlarged cross-sectional view of an essential part showing a state where one of the sensors of the present invention is in contact with a work and the other is in contact with a carrier for measurement.
1‥‥上定盤 2‥‥下定
盤 3‥‥太陽歯車 4‥‥内歯
歯車 5‥‥キャリヤ 6‥‥ワー
ク 7‥‥機体 8‥‥厚み
測定装置 9‥‥センサ 10‥‥エア
シリンダ 11・・・・直線ガイド 12、13・・・・貫
通孔 14‥‥センサプローヴ1 ... upper surface plate 2 ... lower surface plate 3 ... sun gear 4 ... internal gear 5 ... carrier 6 ... work 7 ... machine body 8 ... thickness measuring device 9 ... sensor 10 ... air cylinder 11・ ・ ・ Straight guide 12, 13 ・ ・ ・ Through hole 14 ・ ・ ・ Sensor probe
Claims (2)
車状に駆動されるキャリヤにワークを保持させ、該ワー
クを上定盤及び下定盤により両側から挟んで研磨加工す
る平面研磨装置において、上下定盤、太陽歯車、内歯歯
車の駆動を停止させ、ワークを上下定盤間に挟持させた
ままの状態で、2つのセンサの一方をワーク上面、他方
を下定盤面に接触させて、加工前後のセンサによる測定
差からワークの厚さを測定するようにしたワークの厚さ
測定装置。1. A flat-surface polishing apparatus for holding a work on a carrier that is meshed with a sun gear and an internal gear and driven like a planetary gear, and sandwiches the work from both sides by an upper platen and a lower platen for polishing. , The upper and lower surface plate, the sun gear, and the internal gear are stopped to be driven, and one of the two sensors is brought into contact with the upper surface of the work and the other surface of the lower surface plate with the workpiece held between the upper and lower surface plates, A work thickness measuring device that measures the work thickness from the measurement difference between the sensor before and after machining.
車状に駆動されるキャリヤにワークを保持させ、該ワー
クを上定盤及び下定盤により両側から挟んで研磨加工す
る平面研磨装置において、上下定盤、太陽歯車、内歯歯
車の駆動を停止させ、ワークを上下定盤に挟持させたま
まの状態で、2つのセンサの一方をワーク上面、他方を
キャリヤ上面に接触させて、加工前後のセンサによる測
定差からワークの厚さを測定するようにしたワークの厚
さ測定装置。2. A flat polishing apparatus for holding a work on a carrier which is meshed with a sun gear and an internal gear and driven like a planetary gear, and sandwiches the work from both sides by an upper platen and a lower platen for polishing. , The upper and lower surface plate, the sun gear, and the internal gear are stopped to drive, with one of the two sensors in contact with the upper surface of the work and the upper surface of the carrier while the work is being held between the upper and lower surface plates. A work thickness measuring device that measures the work thickness from the difference between the front and rear sensors.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20370393A JPH0740233A (en) | 1993-07-27 | 1993-07-27 | Thickness measuring device of work |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20370393A JPH0740233A (en) | 1993-07-27 | 1993-07-27 | Thickness measuring device of work |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0740233A true JPH0740233A (en) | 1995-02-10 |
Family
ID=16478458
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20370393A Withdrawn JPH0740233A (en) | 1993-07-27 | 1993-07-27 | Thickness measuring device of work |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0740233A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002154049A (en) * | 2000-11-15 | 2002-05-28 | Fujikoshi Mach Corp | Polishing method |
JP2003089056A (en) * | 2001-09-12 | 2003-03-25 | Hamai Co Ltd | Workpiece thickness measuring method |
KR20170104925A (en) * | 2016-03-08 | 2017-09-18 | 스피드팜 가부시키가이샤 | Surface polishing apparatus and carrier |
JP2017189849A (en) * | 2016-04-14 | 2017-10-19 | スピードファム株式会社 | Flat surface polishing device |
JP2019136783A (en) * | 2018-02-06 | 2019-08-22 | トヨタ自動車株式会社 | Both-side grinding device |
-
1993
- 1993-07-27 JP JP20370393A patent/JPH0740233A/en not_active Withdrawn
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002154049A (en) * | 2000-11-15 | 2002-05-28 | Fujikoshi Mach Corp | Polishing method |
JP2003089056A (en) * | 2001-09-12 | 2003-03-25 | Hamai Co Ltd | Workpiece thickness measuring method |
KR20170104925A (en) * | 2016-03-08 | 2017-09-18 | 스피드팜 가부시키가이샤 | Surface polishing apparatus and carrier |
JP2017189849A (en) * | 2016-04-14 | 2017-10-19 | スピードファム株式会社 | Flat surface polishing device |
JP2019136783A (en) * | 2018-02-06 | 2019-08-22 | トヨタ自動車株式会社 | Both-side grinding device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5812407A (en) | Apparatus for correcting and holding front surface of sheet | |
EP0687526B1 (en) | Polishing method and apparatus for automatic reduction of wafer taper in single-wafer polishing | |
KR20090115717A (en) | Silicon wafer beveling device, silicon wafer manufacturing method, and etched silicon wafer | |
JP3730409B2 (en) | Eyeglass lens processing equipment | |
CN110293467B (en) | Intelligent ring polishing machine tool and control method thereof | |
US6196897B1 (en) | Automatic lapping method and a lapping apparatus using the same | |
KR102296692B1 (en) | Workpiece machining device and workpiece machining method | |
JPH0740233A (en) | Thickness measuring device of work | |
KR20210013205A (en) | Double-sided polishing device and double-sided polishing method of work | |
CN115488437A (en) | Combined rolling processing technology for large disc gear and large tripod gear on double-sided circular knitting machine | |
JPH06151586A (en) | Method and device for dicing | |
JP2020049612A (en) | Double surface polishing device and double surface polishing method of workpiece | |
JP2002164311A (en) | Method and apparatus of orientation flat machining of ingot | |
JP2001260014A (en) | Sheet-type double-face lapping machine and wafer manufacturing method | |
JPS62137510A (en) | Measurement of lens shape | |
JPH05337787A (en) | Boring diameter correcting device of machine tool | |
JP2941317B2 (en) | Fixed size polishing processing method | |
JPH04354673A (en) | Control method for grinding machine | |
JPH09239639A (en) | Ductile mode machining device using ae | |
JP2599924B2 (en) | Measurement method of electrode guide position in wire electric discharge machine | |
JP2019136783A (en) | Both-side grinding device | |
JP3571559B2 (en) | Surface polishing equipment | |
CN219842370U (en) | Large-scale roller surface defect detection device | |
JP3213094B2 (en) | Surface polishing machine with sizing device | |
JPH04244371A (en) | Method for measuring amount of lapping in lapping machine |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20001003 |