TWI704613B - Surface polishing apparatus - Google Patents
Surface polishing apparatus Download PDFInfo
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- TWI704613B TWI704613B TW106112056A TW106112056A TWI704613B TW I704613 B TWI704613 B TW I704613B TW 106112056 A TW106112056 A TW 106112056A TW 106112056 A TW106112056 A TW 106112056A TW I704613 B TWI704613 B TW I704613B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/28—Work carriers for double side lapping of plane surfaces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
- B24B49/04—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
- B24B7/242—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
Abstract
本發明的技術性課題,係在於為了進行根據工件與遊星輪的厚度的差之間隙管理方式的研磨,能夠藉由雷射光確實測定工件的厚度及遊星輪的厚度之兩方,並且獲得更多關於工件的厚度的測定資料數而藉此提升研磨精度。 The technical problem of the present invention is to carry out the grinding according to the gap management method based on the difference between the thickness of the workpiece and the planetary wheel. It is possible to reliably measure both the thickness of the workpiece and the thickness of the planetary wheel by laser light, and obtain more The number of measurement data about the thickness of the workpiece improves the polishing accuracy.
一種平面研磨裝置(1),係一邊將工件(W)保持於被配置在上定盤(20)與下定盤(10)之間且至少一部分以具有透光性的材料形成的遊星輪(40),一邊研磨工件(W)的兩面;其係具有:第1厚度測定器(21a),係安裝在上定盤(20)並測定工件(W)的厚度;以及第2厚度測定器(21b),係安裝在不受上定盤(20)及下定盤(10)的旋轉的影響的位置,並測定遊星輪(40)的厚度。 A plane grinding device (1) is a planetary wheel (40) which is arranged between an upper plate (20) and a lower plate (10) while holding a workpiece (W), and at least a part of which is formed of a translucent material ), one side grinds both sides of the workpiece (W); it has: a first thickness measuring device (21a) installed on the upper plate (20) and measuring the thickness of the workpiece (W); and a second thickness measuring device (21b) ) Is installed at a position that is not affected by the rotation of the upper plate (20) and the lower plate (10), and the thickness of the star wheel (40) is measured.
Description
本發明,係有關於將被保持在由至少一部分具有透光性的材料所形成的遊星輪的半導體晶圓或是玻璃基板等之板狀的工件作研磨的平面研磨裝置,更詳細言之,係有關於測定工件及遊星輪的厚度並作研磨的平面研磨裝置。 The present invention relates to a flat surface polishing device for polishing a plate-shaped workpiece such as a semiconductor wafer or a glass substrate that is held on a planetary wheel made of at least a part of a translucent material. More specifically, It is a flat grinding device for measuring and grinding the thickness of workpieces and planetary wheels.
於平面研磨裝置中,在研磨保持於遊星輪的工件的兩面的情形下,係測定工件的厚度及遊星輪的厚度,並在該工件的厚度與遊星輪的厚度的差(間隙)成為預定的值時使研磨結束,藉此能夠獲得平坦度高的工件。 In the flat surface grinding device, in the case of grinding both sides of the workpiece held on the planetary wheel, the thickness of the workpiece and the thickness of the planetary wheel are measured, and the difference (gap) between the thickness of the workpiece and the thickness of the planetary wheel becomes a predetermined When the value is set, the grinding ends, thereby obtaining a workpiece with high flatness.
在進行如此之管理工件的厚度與遊星輪的厚度的差之間隙管理方式的研磨的情形下,以往係在研磨加工中以雷射光測定工件的厚度,遊星輪的厚度係在未進行工件的研磨時,將該遊星輪從平面研磨裝置取出而以測微器等作測定。因此,會對遊星輪的厚度的測定耗費工夫,不僅缺乏效率,尚有發生測定失誤或測定資料的輸入失誤等人為失 誤之虞。 In the case of the gap management method of grinding that manages the difference between the thickness of the workpiece and the thickness of the planetary wheel, conventionally, the thickness of the workpiece was measured by laser light during the grinding process, and the thickness of the planetary wheel was not used for grinding the workpiece. At this time, the planetary wheel was taken out of the flat grinding device and measured with a micrometer or the like. Therefore, it takes time and effort to measure the thickness of the cruiser. Not only is it inefficient, but there are also human errors such as measurement errors or input errors in measurement data. The risk of error.
於專利文獻1中,係揭示有在平面研磨裝置的支承框架安裝雷射光所致之厚度測定裝置,使來自該厚度測定裝置的雷射光通過設置在上定盤的窗部而照射至工件,並將該工件的表面及裏面所反射的反射光作受光而測定該工件的厚度者。 Patent Document 1 discloses a thickness measuring device in which laser light is installed on the support frame of a flat surface polishing device, and the laser light from the thickness measuring device is irradiated to the workpiece through a window provided on the upper platen. The thickness of the workpiece is measured by receiving the reflected light reflected on the surface and back of the workpiece.
然而,專利文獻1所揭示者,因係從固定設置在支承框架的厚度測定裝置,通過設置在旋轉的上定盤的窗部而使雷射光照射於工件,故僅在窗部通過測定位置時方能夠獲得測定資料,而有測定資料數少之問題。工件的研磨精度,係關於該工件的厚度的測定資料數越多則越得以提升,故期望能夠盡可能獲得更多的測定資料。 However, as disclosed in Patent Document 1, since the thickness measuring device is fixedly installed on the support frame, the laser light is irradiated to the workpiece through the window portion of the rotating upper platen, so only when the window portion passes the measurement position The measurement data can only be obtained, but there is a problem that the number of measurement data is small. The grinding accuracy of a workpiece is improved as the number of measurement data about the thickness of the workpiece increases. Therefore, it is desirable to obtain as many measurement data as possible.
另一方面,於專利文獻2中,係揭示有將包含光源的光學測量裝置安裝於上定盤,使該光學測量裝置一邊與上定盤呈一體旋轉一邊測定工件的厚度者。如此,雖然所獲得的測定資料的數量較多,然而包含由雷射振盪裝置所構成的光源的光學測量裝置,係整體龐大且重量亦大,故不僅包含上定盤的旋轉部分的構成會複雜化,且保持該上定盤之旋轉時的平衡非常困難,故該上定盤容易振動。因此,測定資料係容易受到上定盤的振動所導致之雜訊的影響。此時,因工件的透光性優異,故幾乎沒有受到前述雜訊的大幅影響而難以測定厚度之情事,然而,就與工件相比透光度較低的遊星輪而言,在照射雷射光時的反射強度比工件更弱,故有受到前述雜訊的大幅影響而難以
測定厚度之情事。
On the other hand,
於專利文獻2中,雖然係亦提出將光源從光學測量裝置分離,在上定盤僅安裝光學測量裝置,並從光源透過光旋轉接頭(rotary connector)對光學測量裝置供給雷射光者,然而經過光旋轉接頭的雷射光或反射光係容易因該光旋轉接頭而衰減、或是含有伴隨旋轉的雜訊,故會對與工件相比透光度較低的遊星輪的厚度測定造成阻礙。
In
[先前技術文獻] [Prior Technical Literature]
[專利文獻] [Patent Literature]
[專利文獻1]日本特開2008-227393號公報 [Patent Document 1] JP 2008-227393 A
[專利文獻2]日本特開2002-59364號公報 [Patent Document 2] JP 2002-59364 A
本發明的技術性課題,係在研磨被保持在遊星輪的半導體晶圓或玻璃基板等的工件的平面研磨裝置中,為了進行根據工件與遊星輪的厚度的差之間隙管理方式的研磨,能夠藉由雷射光確實測定工件的厚度及遊星輪的厚度之兩方,並且獲得更多關於工件的厚度的測定資料數而藉此提升研磨精度。 The technical problem of the present invention is that in a plane polishing device that polishes a workpiece such as a semiconductor wafer or a glass substrate held on a planetary wheel, in order to perform a gap management method according to the difference in thickness between the workpiece and the planetary wheel, it can The thickness of the workpiece and the thickness of the planetary wheel are measured by the laser beam, and more measurement data about the thickness of the workpiece can be obtained to improve the grinding accuracy.
為解決前述課題,本發明係一種平面研磨裝置,其係具有:下定盤,係被支承為旋轉自如;上定盤,係被支承為升降自如且旋轉自如;以及遊星輪,係配置在前述上定盤與下定盤之間,並保持受到該上定盤及下定盤所研磨的工件;並將被保持於前述遊星輪的工件以前述上定盤及下定盤作夾持而研磨前述工件的兩面,其特徵為:前述遊星輪,係至少一部分以具有透光性的材料所形成,並具有:第1厚度測定器,係安裝於前述上定盤,對前述工件照射雷射光並將來自該工件的表面及裏面的反射光作受光而藉此測定該工件的厚度;以及第2厚度測定器,係安裝在不受前述上定盤及前述下定盤旋轉的影響的位置,對前述遊星輪照射雷射光並將來自該遊星輪的表面及裏面的反射光作受光而藉此測定該遊星輪的厚度。 In order to solve the aforementioned problems, the present invention is a flat surface grinding device, which has: a lower table, which is supported to be freely rotatable; an upper plate, which is supported to be liftable and rotatable; and a cruiser, which is arranged on the above Between the fixed plate and the lower fixed plate, and hold the workpiece that is ground by the upper and lower fixed plates; and the workpiece held on the planetary wheel is clamped by the upper and lower fixed plates to grind both sides of the workpiece , Characterized in that: the planetary wheel is formed at least partly with a light-transmitting material, and has: a first thickness measuring device installed on the upper platen, irradiating the workpiece with laser light and coming from the workpiece Reflected light on the surface and the inside of the light is received to measure the thickness of the workpiece; and a second thickness measuring device is installed at a position that is not affected by the rotation of the upper plate and the lower plate, and illuminates the cruise star The light is emitted and the reflected light from the surface and the inside of the star wheel is received to measure the thickness of the star wheel.
此時,前述平面研磨裝置,係具有前述雷射光的光源,前述第1厚度測定器,係透過旋轉接頭連接至前述光源為佳。 In this case, it is preferable that the surface polishing device is a light source having the laser light, and the first thickness measuring device is connected to the light source through a rotary joint.
另外,在前述上定盤,係形成有使雷射光穿透的工件用測定窗及遊星輪用測定窗,前述第1厚度測定器,係通過前述工件用測定窗來測定前述工件的厚度,前述第2厚度測定器,係通過前述遊星輪用測定窗來測定前述遊星輪的厚度為佳。 In addition, the upper surface plate is formed with a measuring window for a workpiece and a measuring window for a planetary wheel through which laser light penetrates, and the first thickness measuring device measures the thickness of the workpiece through the measuring window for the workpiece. The second thickness measuring device preferably measures the thickness of the planetary wheel through the measuring window for the planetary wheel.
進而,安裝有前述第2厚度測定器的前述位置,係支承前述上定盤及前述下定盤的機體為佳。 Furthermore, the position where the second thickness measuring device is mounted is preferably a body supporting the upper plate and the lower plate.
依據本發明,對工件照射雷射光而測定工件的厚度的第1厚度測定器,係安裝在被支承為旋轉自如的上定盤,對至少一部分以具有透光性的材料所形成遊星輪照射雷射光而測定遊星輪的厚度的第2厚度測定器,係安裝在不受上定盤及下定盤的旋轉的影響的位置。因此,能夠藉由雷射光確實測定工件的厚度及遊星輪的厚度之兩方,且能夠獲得更多關於工件的厚度的測定資料數。另外,在測定遊星輪的厚度時,因沒有每次將該遊星輪從研磨裝置卸除的必要,故工件的厚度與遊星輪的厚度的間隙管理變得容易,而能夠削減其作業步驟數。另外,因能夠防止遊星輪的卸除、再裝填所導致之遊星輪的變形或破損,故能夠防止該變形或破損導致對於上下定盤的研磨面的接觸不均使研磨面的狀態不穩定而導致工件的加工精度不均的發生,而能夠實現穩定的研磨加工。 According to the present invention, the first thickness measuring device for measuring the thickness of the workpiece by irradiating laser light to the workpiece is mounted on the upper plate supported to be rotatable, and irradiates at least a part of the cruise star made of a light-transmitting material. The second thickness measuring device that emits light to measure the thickness of the planetary wheel is installed at a position that is not affected by the rotation of the upper plate and the lower plate. Therefore, both the thickness of the workpiece and the thickness of the planetary wheel can be reliably measured by laser light, and more measurement data about the thickness of the workpiece can be obtained. In addition, when measuring the thickness of the planetary wheel, there is no need to remove the planetary wheel from the grinding device every time. Therefore, it is easy to manage the gap between the thickness of the workpiece and the thickness of the planetary wheel, and the number of work steps can be reduced. In addition, since it can prevent the planetary wheel from being deformed or damaged due to the removal and reloading of the planetary wheel, it is possible to prevent the deformation or damage from causing uneven contact with the grinding surfaces of the upper and lower surface plates to make the state of the grinding surfaces unstable. This results in uneven machining accuracy of the workpiece, and stable grinding can be achieved.
1‧‧‧平面研磨裝置 1‧‧‧Plane grinding device
2‧‧‧機體 2‧‧‧Body
3‧‧‧光源 3‧‧‧Light source
6‧‧‧旋轉接頭 6‧‧‧Rotary joint
10‧‧‧下定盤 10‧‧‧Place Fix
20‧‧‧上定盤 20‧‧‧Upper Fix
21a‧‧‧第1厚度測定器 21a‧‧‧The first thickness measuring device
21b‧‧‧第2厚度測定器 21b‧‧‧The second thickness tester
24a‧‧‧工件用測定窗 24a‧‧‧Measurement window for workpiece
24b‧‧‧遊星輪用測定窗 24b‧‧‧Measurement window for cruise ship
31‧‧‧定盤懸吊件 31‧‧‧Fitting plate suspension
32‧‧‧升降桿(升降軸) 32‧‧‧Lift rod (lift shaft)
40‧‧‧遊星輪 40‧‧‧Star Cruise
W‧‧‧工件 W‧‧‧Workpiece
[第1圖]係將本發明之平面研磨裝置之實施形態概略表示的剖面圖。 [Figure 1] is a cross-sectional view schematically showing an embodiment of the surface polishing apparatus of the present invention.
[第2圖]係配置於下定盤上的遊星輪與形成於上定盤的測定孔的位置關係的概略俯視圖。 [Figure 2] A schematic plan view of the positional relationship between the planetary wheel arranged on the lower plate and the measuring hole formed on the upper plate.
本實施形態的平面研磨裝置1,係用以研磨如矽晶圓、藍寶石晶圓、陶瓷晶圓、水晶晶圓、玻璃基板等般具有透光性(光穿透性)的板狀的工件W的兩面者,其係具有:下定盤10,係旋轉自如地被支承於機體2;上定盤20,係升降自如且旋轉自如地被支承於機體2;以及遊星輪40,係保持受到上定盤20及下定盤10所研磨的工件W。在上定盤20的下表面及下定盤10的上表面,雖係貼附有研磨墊18a、18b,然而取代研磨墊18a、18b而採取貼附磨石的構造或定盤面本身為研磨面的構造亦可。
The plane polishing device 1 of this embodiment is used to polish a plate-shaped workpiece W having light transmissivity (light permeability) such as silicon wafers, sapphire wafers, ceramic wafers, crystal wafers, glass substrates, etc. The two sides of this system have: a
在下定盤10的中心係配置有太陽齒輪11,在下定盤10的外周係內齒輪12以包圍下定盤10的方式作配置。下定盤10、上定盤20、太陽齒輪11、以及內齒輪12,係以軸線L為中心配置於同軸上。另外,在下定盤10上,遊星輪40係嚙合於太陽齒輪11及內齒輪12而配置有複數個。在太陽齒輪11的中央下部係連接有第1驅動軸13,在下定盤10的中央下部係連接有第2驅動軸14,在內齒輪12的中央下部係連接有第3驅動軸15。另外,在下定盤10的中心係連接有第4驅動軸16,該第4驅動軸16係被收容於第1驅動軸13。第1驅動軸13係被收容於第2驅動軸14,第2驅動軸14係被收容於第3驅動軸15。該等第1至第4驅動軸13~16,係構成為受到未圖示的驅動裝置所驅動及旋轉。
A
如第2圖所示,在上定盤20與下定盤10之間,係於外周以等間隔複數配置有具備齒部的遊星輪
40,該齒部與太陽齒輪11及內齒輪12係彼此嚙合,並藉由太陽齒輪11及內齒輪12的旋轉,遊星輪40係繞太陽齒輪11作自轉及公轉。各遊星輪40,係具有工件W所嵌合的工件保持孔41,工件保持孔41係形成為與該遊星輪40中心不同。遊星輪40,係其一部分或全部,有必要以測定所使用的雷射光能穿透的材料形成。作為該材料,能夠將環氧玻璃(glass epoxy)、聚氯乙烯樹脂、丙烯酸系樹脂、胺基甲酸酯系樹脂、醯胺樹脂、聚對苯二甲酸乙二酯樹脂(PET)、聚碳酸酯樹脂、聚苯乙烯樹脂等之合成樹脂、玻璃等單獨使用,或組合2種以上使用。
As shown in Figure 2, between the
上定盤20,係透過定盤懸吊件31安裝於作為升降軸之升降用致動器7的升降桿32。該升降用致動器7係被支承於機體2,升降桿32係與下定盤10、上定盤20、太陽齒輪11、內齒輪12以相同的軸線L作為中心。
The
針對該構成作更詳細的說明;在定盤懸吊件31的外周側的下表面,係在圓周方向設置有朝向下方向延伸的複數個支承螺柱33,該支承螺柱33係安裝在上定盤20的上表面。另外,在定盤懸吊件31的內周面與升降桿32的外周面之間,係中介設置有:軸承34,係雖將該定盤懸吊件31與升降桿32於上下方向固定地作結合,但於上定盤20的旋轉方向相對地旋轉自如地作結合。
This structure will be described in more detail; on the lower surface of the outer peripheral side of the
上定盤20,係在工件W之非研磨時,藉由升降用致動器7的驅動所致之升降桿32的收縮上升至待命位置(不圖示),並在工件W之研磨時,藉由升降用致動器
7的驅動所致之升降桿32的伸長下降至第1圖的研磨位置。當上定盤20下降,因安裝於上定盤20的鉤22係卡合於第4驅動軸16的上端的驅動器17,上定盤20與定盤懸吊件31係藉由第4驅動軸16透過驅動器17受到驅動,而一體地旋轉。
The
在以如此構成之平面研磨裝置1研磨工件W時,係在各遊星輪40了工件W後,上定盤20藉由升降用致動器7的驅動所致之升降桿32的伸長從待命位置下降至第1圖的研磨位置,而安裝於上定盤20的鉤22係卡合於驅動器17。在該狀態下,藉由第1~第4驅動軸13~16受到未圖示的驅動裝置所驅動及旋轉,各遊星輪40係在太陽齒輪11的周圍自轉及公轉,且被保持於遊星輪40的工件W的上下兩面係藉由上定盤20及下定盤10受到研磨。
When the workpiece W is polished by the flat surface polishing device 1 constructed in this way, after each
在平面研磨裝置1,係設置有:厚度測定裝置,係用以進行測定工件W的厚度及遊星輪40的厚度並在厚度的差(間隙)成為預定的值時結束研磨的間隙管理方式的研磨,並用於以雷射光測定工件W的厚度及遊星輪40的厚度。針對該者於以下作說明。
The surface polishing device 1 is provided with a thickness measuring device for measuring the thickness of the workpiece W and the thickness of the
在機體2,係設置有輸出雷射光的光源3、及運算控制部4,在上定盤20,係設置有用於使用雷射光測定工件W的厚度的第1厚度測定器21a,光源3及第1厚度測定器21a,係藉由光纜51a透過旋轉接頭6受到連接。在不受上定盤20及下定盤10的旋轉的影響的位置,係設置有
用於測定遊星輪40的厚度的第2厚度測定器21b。第2厚度測定器21b與光源3,係藉由光纜51b作連接。另外,光源3係連接至運算控制部4另外,於本實施形態中,雖從光源3所輸出的雷射光係紅外線雷射,然而只要係工件W及遊星輪40之任一者的厚度皆能夠測定者,為其他的雷射亦可。
The
針對用以測定工件W及遊星輪40的厚度測定的機構,係進一步作詳細說明。
The mechanism for measuring the thickness of the workpiece W and the
於支承螺柱33係固定有保持支架36,藉由將第1厚度測定器21a保持於該保持支架36,使第1厚度測定器(探頭)21a安裝於上定盤20的上側。亦即,第1厚度測定器21a,係設置為與上定盤20一起旋轉。又,第1厚度測定器21a,係只要安裝為與上定盤20一起旋轉即可,固定在支承螺柱33以外的部位亦不妨。在該第1厚度測定器21a的正下方,係形成有將上定盤20上下貫穿的第1厚度測定孔23a。在第1厚度測定孔23a,係安裝有工件用測定窗24a。該工件用測定窗24a,係合成樹脂製或玻璃製等的筒狀體,且具有與第1厚度測定孔23a的口徑大致相等的外徑,在該工件用測定窗24a的上端,係設置有比第1厚度測定孔23a的直徑更為大徑的凸緣部25a,並藉由使該凸緣部25a卡合於上定盤20的表面而安裝。另外,在該工件用測定窗24a的下端,係設置有具有透光性的窗板26a。如此,第1厚度測定器21a係恆位於第1厚度測定孔23a的正上方,而能夠獲得更多關於工件W的
厚度的測定資料數。
A holding
另外,如第2圖所示,第1厚度測定孔23a,係形成在研磨加工中通過工件W的中心附近的正上方的範圍E。藉此,第1厚度測定孔23a係能夠以通過工件W的中心或中心附近的方式測定工件W的厚度,因此,能夠進一步獲得更多關於工件W的厚度的測定資料。
In addition, as shown in FIG. 2, the first
第2厚度測定器(探頭)21b,係設置在不受上定盤20及下定盤10的旋轉的影響的位置,於本實施形態中係設置在機體2。藉此,能夠防止關於受到測定的遊星輪40的厚度的測定資料,混入研磨加工中所產生的振動導致的雜訊。在上定盤20之第2厚度測定器21b的正下方的位置,係形成有將上定盤20上下貫穿的第2厚度測定孔23b。在第2厚度測定孔23b,係具有與第1厚度測定孔23a相同的凸緣部25b及窗板26b的遊星輪用測定窗24b,將凸緣部25b卡合於上定盤20的表面而安裝。
The second thickness measuring device (probe) 21b is installed in a position not affected by the rotation of the
並且,第1厚度測定孔23a及第2厚度測定孔23b,係以使第1厚度測定孔23a的中心與軸線L的距離、及第2厚度測定孔23b的中心與軸線L的距離為相等的方式,形成在上定盤20。亦即,第1厚度測定孔23a、第2厚度測定孔23b、第1厚度測定器21a、及第2厚度測定器21b,係以軸線L作為中心而設置在同一圓周上。
In addition, the first
就窗板26a的材料而言,係使用從第1厚度測定器21a所照射的雷射光、及從工件W所反射的雷射光能夠穿透的材料,具體而言,係石英玻璃、BK-7等的
玻璃系材料、藍寶石、樹脂等具有透光性(光穿透性)的材料、較佳為透明的材料。就窗板26b的材料而言,係使用從第2厚度測定器21b所照射雷射光、及從遊星輪40所反射的雷射光能夠穿透的物質,具體而言,係石英玻璃、BK-7等的玻璃系材料、藍寶石、樹脂等具有透光性(光穿透性)的材料、較佳為透明的材料。
As for the material of the
在升降桿32,於與升降桿32的軸線L相同的軸線上配置有旋轉接頭6。於本實施方式中,在升降桿32的下端部與定盤懸吊件31之間配置有旋轉接頭6,並透過該旋轉接頭6,使光源3與第1厚度測定器21a藉由光纜51a作連接。
In the lifting
使用以上的厚度測定裝置,在進行管理工件的厚度與遊星輪的厚度的差之間隙管理方式的研磨時,遊星輪40的厚度的測定係於工件W非研磨時進行,工件的厚度的測定係於研磨中進行。
Using the above thickness measuring device, when performing the grinding of the gap management method that manages the difference between the thickness of the workpiece and the thickness of the planetary wheel, the thickness of the
亦即,遊星輪40的厚度測定,係在研磨最初的工件之前進行,或是於工件的研磨結束後進行研磨漿液或洗淨水等之去除水分之後、於研磨下個工件W之前進行。
That is, the thickness measurement of the
具體而言,遊星輪40的厚度測定,係在安裝於第2厚度測定孔23b的遊星輪用測定窗24b位於第2厚度測定器21b的正下方的狀態下,使上定盤20的旋轉停止並且上升的狀態,並在該狀態下,一邊使遊星輪40緩緩自轉及公轉一邊進行。此時,從第2厚度測定器21b所照射的雷射光,係通過遊星輪用測定窗24b的窗板26b而到達遊
星輪40的表面及裏面,且來自該表面及裏面的反射光係通過窗板26b而以第2厚度測定器21b收訊。並且,所收訊的反射光,係透過光纜51b傳遞至運算控制部4,而根據該反射光,遊星輪40的厚度係受到運算控制部4所運算。
Specifically, the thickness measurement of the
此時,第2厚度測定器21b,因係從光源3不透過旋轉接頭6而以光纜51b作連接,故不致如以旋轉接頭6作連接的情形般受到照射於遊星輪40的雷射光或其反射光的衰減或雜訊所導致的影響,而能夠確實測定其厚度。
At this time, since the second thickness measuring device 21b is connected by the
另一方面,工件W的厚度測定,係在一邊對上定盤20與下定盤10之間供給研磨漿液,一邊研磨工件W時進行。 On the other hand, the thickness measurement of the workpiece W is performed while grinding the workpiece W while supplying the polishing slurry between the upper table 20 and the lower table 10.
具體而言,從第1厚度測定器21a所照射的雷射光,係從光源3所輸出的雷射光,並藉由透過旋轉接頭6的光纜51a所傳遞。從第1厚度測定器21a所照射的雷射光,係在工件W位於安裝在形成於第1厚度測定器21a正下方的第1厚度測定孔23a的工件用測定窗24a的窗板26a的正下方時(工件W通過窗板26a正下方時),通過窗板26a而到達工件W的表面及裏面,且來自工件W的表面及裏面的反射光係通過窗板26a而以第1厚度測定器21a受光。並且,所受光的反射光,係透過光纜51a、旋轉接頭6而傳遞至運算控制部4,而根據該反射光,工件W的厚度係受到運算控制部4所運算。
Specifically, the laser light irradiated from the first
所測定的工件W的厚度及遊星輪40的厚度,
係以運算控制部4作比較,並在該等的差達到預定的值時結束研磨。藉此,能夠獲得平坦度高的所期望的工件W。
The measured thickness of the workpiece W and the thickness of the
又,於本實施形態中,第1厚度測定器21a及第2厚度測定器21b,係以使第1厚度測定孔23a及第2厚度測定孔23b離軸線L為等距離的方式形成在上定盤20。然而,考慮到裝置構造,第1厚度測定器21a與第1厚度測定孔23a、或是第2厚度測定器21b與第2厚度測定孔23b,係形成在離軸線L的距離為不同距離的位置亦可。
In addition, in this embodiment, the first
另外,遊星輪40的厚度測定,係在工件W的研磨時進行亦可。該工件W研磨時的遊星輪40的厚度測定,係在藉由上定盤20的旋轉、與遊星輪40的自轉及公轉,而遊星輪40位於第2厚度測定器21b及第2厚度測定孔23b的正下方時作測定。此時,因上定盤20與下定盤10之間被供給有研磨漿液,故以第2厚度測定器21b所收訊的反射光,係雖包含起因於研磨漿液或洗淨水等的雜訊,然而藉由適當選擇使來自遊星輪40的反射強度比雜訊的值更大的遊星輪40的材料,能夠進行雜訊的影響較少的測定。
In addition, the thickness measurement of the
另外,在工件W的研磨時進行遊星輪40的厚度測定的情形下,係於上定盤20形成複數個第2厚度測定孔23b為佳。此時,各第2厚度測定孔23b,係形成為在以軸線L為中心點的相同圓周上彼此為等距離,且形成為各第2厚度測定孔23b與軸線L的距離、及第2厚度測定器
21b與軸線L的距離相等。
In addition, when measuring the thickness of the
進而,以第1厚度測定器21a及第2厚度測定器21b所測定之關於工件W及遊星輪40的厚度的測定資料,雖係維持反射光的狀態以運算控制部4作演算,然而將來自工件W及遊星輪40的反射光以第1厚度測定器21a及第2厚度測定器21b轉換為電訊號,並經由將該第1厚度測定器21a與運算控制部4透過旋轉接頭6作連結的電纜(不圖示)而傳送至運算控制部4,而經由將該第2厚度測定器21b與運算控制部4不透過旋轉接頭6作連結的電纜(不圖示)而傳送至運算控制部4亦可,或者,藉由從第1厚度測定器21a及第2厚度測定器21b以無線傳送至運算控制部4,亦能夠獲得與本發明相同的作用效果。
Furthermore, although the measurement data about the thickness of the workpiece W and the
進而,光源3、運算控制部4、及第2厚度測定器21b的設置位置,係只要設置在伴隨上定盤20或下定盤10等的旋轉或升降的構成以外的部位,藉由與機體2為另外設置的保持手段等,設置在機體2以外的部位亦能夠獲得本發明的作用效果。
Furthermore, the installation positions of the
1‧‧‧平面研磨裝置 1‧‧‧Plane grinding device
2‧‧‧機體 2‧‧‧Body
3‧‧‧光源 3‧‧‧Light source
4‧‧‧運算控制部 4‧‧‧Computer control unit
6‧‧‧旋轉接頭 6‧‧‧Rotary joint
7‧‧‧升降用致動器 7‧‧‧Elevating actuator
10‧‧‧下定盤 10‧‧‧Place Fix
11‧‧‧太陽齒輪 11‧‧‧Sun Gear
12‧‧‧內齒輪 12‧‧‧Internal gear
13‧‧‧第1驅動軸 13‧‧‧1st drive shaft
14‧‧‧第2驅動軸 14‧‧‧2nd drive shaft
15‧‧‧第3驅動軸 15‧‧‧3rd drive shaft
16‧‧‧第4驅動軸 16‧‧‧4th drive shaft
17‧‧‧驅動器 17‧‧‧Drive
18a‧‧‧研磨墊 18a‧‧‧Lapping Pad
18b‧‧‧研磨墊 18b‧‧‧Lapping Pad
20‧‧‧上定盤 20‧‧‧Upper Fix
21a‧‧‧第1厚度測定器 21a‧‧‧The first thickness measuring device
21b‧‧‧第2厚度測定器 21b‧‧‧The second thickness tester
22‧‧‧鉤 22‧‧‧hook
23a‧‧‧第1厚度測定孔 23a‧‧‧The first thickness measuring hole
23b‧‧‧第2厚度測定孔 23b‧‧‧The second thickness measuring hole
24a‧‧‧工件用測定窗 24a‧‧‧Measurement window for workpiece
24b‧‧‧遊星輪用測定窗 24b‧‧‧Measurement window for cruise ship
25a‧‧‧凸緣部 25a‧‧‧Flange
25b‧‧‧凸緣部 25b‧‧‧Flange
26a‧‧‧窗板 26a‧‧‧Window panel
26b‧‧‧窗板 26b‧‧‧Window panel
31‧‧‧定盤懸吊件 31‧‧‧Fitting plate suspension
32‧‧‧升降桿(升降軸) 32‧‧‧Lift rod (lift shaft)
33‧‧‧支承螺柱 33‧‧‧Support stud
34‧‧‧軸承 34‧‧‧Bearing
36‧‧‧保持支架 36‧‧‧Keep the bracket
40‧‧‧遊星輪 40‧‧‧Star Cruise
51a‧‧‧光纜 51a‧‧‧Optical Cable
51b‧‧‧光纜 51b‧‧‧Optical Cable
W‧‧‧工件 W‧‧‧Workpiece
L‧‧‧軸線 L‧‧‧Axis
Claims (3)
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JP2016081116A JP6760638B2 (en) | 2016-04-14 | 2016-04-14 | Flat surface polishing device |
JP2016-081116 | 2016-04-14 |
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TW201737336A TW201737336A (en) | 2017-10-16 |
TWI704613B true TWI704613B (en) | 2020-09-11 |
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TW106112056A TWI704613B (en) | 2016-04-14 | 2017-04-11 | Surface polishing apparatus |
Country Status (4)
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JP (1) | JP6760638B2 (en) |
KR (1) | KR102315142B1 (en) |
CN (1) | CN107297678A (en) |
TW (1) | TWI704613B (en) |
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JP7046358B2 (en) * | 2018-04-17 | 2022-04-04 | スピードファム株式会社 | Polishing equipment |
CN110193775B (en) * | 2019-03-12 | 2021-09-17 | 上海新昇半导体科技有限公司 | Chemical mechanical polishing method and chemical polishing system |
JP2021102245A (en) * | 2019-12-25 | 2021-07-15 | スピードファム株式会社 | Workpiece hole detection device and workpiece hole detection method |
JP7435113B2 (en) * | 2020-03-23 | 2024-02-21 | 株式会社Sumco | Double-sided polishing device for workpieces |
CN113245973B (en) * | 2021-06-08 | 2022-07-22 | 唐山国芯晶源电子有限公司 | Method for detecting grinding thickness of quartz wafer polishing loose pulley |
IT202100022463A1 (en) * | 2021-08-27 | 2023-02-27 | Biesse Spa | METHOD FOR CHECKING THE PROCESSING OF PANELS OF SUBSTANTIALLY PARALLELEPIPED SHAPE AND MACHINE FOR PROCESSING OF PANELS OF SUBSTANTIALLY PARALLELEPIPED SHAPE, IN PARTICULAR SANDING MACHINE FOR SANDING/GLOSSY OF PANELS OF WOOD, METAL, OR SIMILAR |
JP7296161B1 (en) * | 2022-06-27 | 2023-06-22 | 不二越機械工業株式会社 | Double-sided polishing machine |
CN117359435B (en) * | 2023-12-05 | 2024-03-05 | 福建荣德光电科技有限公司 | Numerical control plane precision milling and grinding machine for optical lens processing |
CN117583975B (en) * | 2024-01-18 | 2024-03-19 | 山西日盛达太阳能科技股份有限公司 | Photovoltaic glass polishing device |
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JP2008227393A (en) * | 2007-03-15 | 2008-09-25 | Fujikoshi Mach Corp | Double-side polishing apparatus for wafer |
JP2015047656A (en) * | 2013-08-30 | 2015-03-16 | 株式会社Sumco | Double-side polishing device and double-side polishing method for workpiece |
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JPH0740233A (en) * | 1993-07-27 | 1995-02-10 | Speedfam Co Ltd | Thickness measuring device of work |
JP2888339B1 (en) * | 1998-03-27 | 1999-05-10 | 直江津電子工業株式会社 | Workpiece holding plate |
JP4324933B2 (en) | 2000-08-23 | 2009-09-02 | Sumco Techxiv株式会社 | Surface polishing machine |
JP4202841B2 (en) * | 2003-06-30 | 2008-12-24 | 株式会社Sumco | Surface polishing equipment |
JP2010023167A (en) * | 2008-07-18 | 2010-02-04 | Epson Toyocom Corp | Abrasive particle processing apparatus and abrasive particle processing method therewith |
JP4955624B2 (en) | 2008-07-31 | 2012-06-20 | 信越半導体株式会社 | Double-side polishing equipment |
KR20100079199A (en) * | 2008-12-30 | 2010-07-08 | 주식회사 동부하이텍 | Method and apparatus for chemical mechanical polishing |
US20120276662A1 (en) * | 2011-04-27 | 2012-11-01 | Iravani Hassan G | Eddy current monitoring of metal features |
JP5917994B2 (en) * | 2012-04-23 | 2016-05-18 | スピードファム株式会社 | Measuring window structure for polishing equipment |
JP6622117B2 (en) * | 2016-03-08 | 2019-12-18 | スピードファム株式会社 | Planar polishing apparatus and carrier |
-
2016
- 2016-04-14 JP JP2016081116A patent/JP6760638B2/en active Active
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2017
- 2017-04-07 KR KR1020170045067A patent/KR102315142B1/en active IP Right Grant
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Patent Citations (2)
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JP2008227393A (en) * | 2007-03-15 | 2008-09-25 | Fujikoshi Mach Corp | Double-side polishing apparatus for wafer |
JP2015047656A (en) * | 2013-08-30 | 2015-03-16 | 株式会社Sumco | Double-side polishing device and double-side polishing method for workpiece |
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JP6760638B2 (en) | 2020-09-23 |
KR20170117878A (en) | 2017-10-24 |
CN107297678A (en) | 2017-10-27 |
TW201737336A (en) | 2017-10-16 |
JP2017189849A (en) | 2017-10-19 |
KR102315142B1 (en) | 2021-10-20 |
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