JP2012152858A - Grinding device - Google Patents

Grinding device Download PDF

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JP2012152858A
JP2012152858A JP2011014588A JP2011014588A JP2012152858A JP 2012152858 A JP2012152858 A JP 2012152858A JP 2011014588 A JP2011014588 A JP 2011014588A JP 2011014588 A JP2011014588 A JP 2011014588A JP 2012152858 A JP2012152858 A JP 2012152858A
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workpiece
grinding
holding
ground
detection
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JP5654365B2 (en
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Shinji Yoshida
真司 吉田
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Disco Corp
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Disco Corp
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Abstract

PROBLEM TO BE SOLVED: To perform accurate grinding so that a prescribed member embedded into the other member may be applied with cueing.SOLUTION: The grinding device comprises a holding means in which a holding face for holding a workpiece is formed, a processing means which grinds the workpiece held by the holding means, and a control means which controls the movement of the processing means. The workpiece is constituted of a first member whose reflectance is first reflectance, and a second member which covers the first member and whose reflectance is second reflectance, the control means has a detection part which irradiates detection light to a face to be ground of the workpiece, and receives reflection light from the face to be ground, and when it is decided that the first member covered by the second member is exposed on the basis of a light receiving amount detected by the detection part, the grinding of the workpiece is stopped.

Description

本発明は、半導体ウェーハ等のワークを研削加工する研削装置に関するものである。   The present invention relates to a grinding apparatus for grinding a workpiece such as a semiconductor wafer.

半導体デバイスの製造プロセスでは、半導体デバイスの目的厚みを得るために、多数の半導体デバイスの集合体であるワークの段階で、その裏面を研削,研磨して薄化することが行われている。また、昨今の半導体デバイスの顕著な薄型化に伴い、ワークは一層薄く加工されるようになっている。   In the manufacturing process of a semiconductor device, in order to obtain a target thickness of the semiconductor device, the back surface thereof is ground and polished at the stage of a work which is an aggregate of a large number of semiconductor devices, and thinned. In addition, with recent remarkable thinning of semiconductor devices, workpieces are processed to be thinner.

一般に、ワークの研削や研磨はその厚みを測定しながら進められる。本願発明の出願人は、測定用プローブを被加工面に接触させながらワークの厚みを正確に計測し、所望の厚みに研削する研削装置を提案している(特許文献1参照)。   In general, grinding or polishing of a workpiece is performed while measuring its thickness. The applicant of the present invention has proposed a grinding apparatus that accurately measures the thickness of a workpiece while bringing the measuring probe into contact with the surface to be processed and grinds the workpiece to a desired thickness (see Patent Document 1).

特開2000−6018号公報JP 2000-6018 A

しかしながら、上記の研削装置によれば、たとえば樹脂に埋め込まれたCuポストを樹脂を研削することにより頭出しする場合など、所定の部材の頭出しを行なう場合には、当該部材が埋め込まれている高さが一定とは限らないため、ワークを一定の厚みに研削しても当該部材の頭出しが適切に行なえない場合があった。   However, according to the above grinding apparatus, for example, when cueing a predetermined member such as cueing a Cu post embedded in resin by grinding the resin, the member is embedded. Since the height is not always constant, cueing of the member may not be performed properly even if the workpiece is ground to a constant thickness.

本発明は、上記課題に鑑みてなされたものであって、その目的は、所定の部材の頭出しを高精度に行なうことが可能な研削装置を提供することにある。   The present invention has been made in view of the above problems, and an object of the present invention is to provide a grinding apparatus capable of cueing a predetermined member with high accuracy.

上記課題を解決し、目的を達成するために、本発明に係る研削装置は、ワークを保持する保持面が形成された保持手段と、該保持手段に保持されたワークを研削加工する加工手段と、該加工手段の動きを制御する制御手段とを有する研削装置であって、前記ワークは、反射率が第一の反射率である第一部材と、該第一の部材を被覆した反射率が第二の反射率である第二部材で構成され、該制御手段は、研削中の前記ワークの被研削面に検出光を照射して被研削面からの反射光を受光する検出部を有し、該検出部で検出された受光量に基づいて該第二の部材に覆われた該第一の部材が露出したと判断した際に、前記ワークの研削を停止することを特徴とする。   In order to solve the above-described problems and achieve the object, a grinding apparatus according to the present invention includes a holding unit having a holding surface for holding a workpiece, and a processing unit for grinding the workpiece held by the holding unit. A grinding device having a control means for controlling the movement of the processing means, wherein the workpiece has a first member whose reflectance is a first reflectance and a reflectance covering the first member. Consists of a second member having a second reflectivity, and the control means has a detection unit for irradiating the surface to be ground of the workpiece being ground with detection light and receiving the reflected light from the surface to be ground. The grinding of the workpiece is stopped when it is determined that the first member covered by the second member is exposed based on the amount of received light detected by the detection unit.

本発明に係る研削装置によれば、所定の部材の頭出しを高精度に行なうことができる。   According to the grinding device of the present invention, it is possible to cue a predetermined member with high accuracy.

図1は、本発明の一実施形態である研削装置の構成を示す斜視図である。FIG. 1 is a perspective view showing a configuration of a grinding apparatus according to an embodiment of the present invention. 図2は、本発明の一実施形態である研削装置の構成を示す側面図である。FIG. 2 is a side view showing a configuration of a grinding apparatus according to an embodiment of the present invention. 図3は、本発明の一実施形態である研削装置の検出部の構成を示す模式図である。FIG. 3 is a schematic diagram illustrating a configuration of a detection unit of a grinding apparatus according to an embodiment of the present invention. 図4は、本発明の一実施形態であるワークWの構成を示す模式図である。FIG. 4 is a schematic diagram showing a configuration of a workpiece W that is an embodiment of the present invention. 図5は、本発明の一実施形態である検出処理の流れを示すフローチャートである。FIG. 5 is a flowchart showing the flow of detection processing according to an embodiment of the present invention. 図6は、本発明の一実施形態である検出処理を説明するための図である。FIG. 6 is a diagram for explaining detection processing according to an embodiment of the present invention. 図7は、本発明の一実施形態である検出処理を説明するための図である。FIG. 7 is a diagram for explaining detection processing according to an embodiment of the present invention. 図8は、本発明の一実施形態である検出処理を説明するための図である。FIG. 8 is a diagram for explaining detection processing according to an embodiment of the present invention. 図9は、本発明の一実施形態であるワークWの変形例の構成を示す模式図である。FIG. 9 is a schematic diagram showing a configuration of a modified example of the workpiece W according to the embodiment of the present invention.

以下、図面を参照して、本発明の一実施形態である研削装置の構成及びその動作について説明する。なお、この実施の形態によりこの発明が限定されるものではない。   Hereinafter, the configuration and operation of a grinding apparatus according to an embodiment of the present invention will be described with reference to the drawings. Note that the present invention is not limited to the embodiments.

〔研削装置の構成〕
始めに、図1〜3を参照して、本発明の一実施形態である研削装置の構成について説明する。図1は本発明の一実施形態である研削装置の構成を示す斜視図であり、図2は本発明の一実施形態である研削装置の構成を示す側面図である。図3は、本発明の一実施形態である研削装置の検出部の構成を示す模式図である。
[Configuration of grinding equipment]
First, with reference to FIGS. 1-3, the structure of the grinding device which is one Embodiment of this invention is demonstrated. FIG. 1 is a perspective view illustrating a configuration of a grinding apparatus according to an embodiment of the present invention, and FIG. 2 is a side view illustrating a configuration of a grinding apparatus according to an embodiment of the present invention. FIG. 3 is a schematic diagram illustrating a configuration of a detection unit of a grinding apparatus according to an embodiment of the present invention.

図1に示すように、本発明の一実施形態である研削装置1は、直方体状の基台2を備える。基台2の上面の前方側には、研削装置1に対する各種指示を受け付ける操作パネル3が設けられている。操作パネル3の後方側には、チャックテーブル41を支持するテーブル支持台4が設けられている。テーブル支持台4の後方側には、支柱部5が設けられている。支柱部5の前面には、上下方向に移動可能に研削ユニット6が支持されている。研削ユニット6の近傍には、チャックテーブル41に保持されたワークWを構成する部材を検出する検出部70が設けられている。これらの各構成部を制御部(制御手段)Cが制御・統括している。   As shown in FIG. 1, a grinding apparatus 1 according to an embodiment of the present invention includes a rectangular parallelepiped base 2. On the front side of the upper surface of the base 2, an operation panel 3 that receives various instructions for the grinding device 1 is provided. A table support 4 for supporting the chuck table 41 is provided on the rear side of the operation panel 3. A column portion 5 is provided on the rear side of the table support 4. A grinding unit 6 is supported on the front surface of the support column 5 so as to be movable in the vertical direction. In the vicinity of the grinding unit 6, a detection unit 70 that detects a member constituting the workpiece W held on the chuck table 41 is provided. A control unit (control means) C controls and supervises these components.

ワークWは、基板上に配設された2種の部材からなり、第一の部材が第二の部材に埋め込まれるように構成されている。ワークWを構成する部材としては、特に限定されないが、例えば第一の部材としてはCu、第二の部材としてはモールド樹脂などが例示できる。基板についても特に限定されず、シリコンウェーハ、ガリウムヒ素ウェーハ、シリコンカーバイドウェーハ等の半導体ウェーハ、セラミック基板、ガラス基板、サファイア基板等の無機材料基板などが例示できる。   The workpiece W is composed of two types of members disposed on the substrate, and is configured such that the first member is embedded in the second member. Although it does not specifically limit as a member which comprises the workpiece | work W, For example, Cu can be illustrated as a 1st member and mold resin etc. can be illustrated as a 2nd member. The substrate is not particularly limited, and examples thereof include semiconductor wafers such as silicon wafers, gallium arsenide wafers, and silicon carbide wafers, inorganic material substrates such as ceramic substrates, glass substrates, and sapphire substrates.

テーブル支持台4は、正方形状に設けられ、チャックテーブル41を回転可能に支持する。テーブル支持台4は、図示しない駆動機構に接続され、この駆動機構から供給される駆動力によって、基台2の上面に形成された開口部2a内を前後方向にスライド移動される。これにより、チャックテーブル41は、研削ユニット6にワークWの露出面を対向させる研削位置と、この研削位置から前方側に離間し、加工前のワークWが供給される一方、加工後のワークWが回収される載せ換え位置との間でスライド移動される。テーブル支持台4の前後には、ワークWの研削加工時に発生する研削砥石のくずなどが基台2内に侵入することを抑制する防塵カバー8が設けられている。防塵カバー8は、テーブル支持台4の前面及び後面に取り付けられると共に、テーブル支持台4の移動位置に応じて伸縮可能に設けられ、基台2の開口部2aを覆うように構成されている。   The table support 4 is provided in a square shape and rotatably supports the chuck table 41. The table support 4 is connected to a drive mechanism (not shown), and is slid in the front-rear direction within the opening 2 a formed on the upper surface of the base 2 by a drive force supplied from the drive mechanism. As a result, the chuck table 41 is separated from the grinding position where the exposed surface of the workpiece W is opposed to the grinding unit 6 and forwardly from the grinding position, and the workpiece W before processing is supplied, while the workpiece W after processing is supplied. Is slid to and from the repositioning position at which it is collected. Before and after the table support 4, a dust-proof cover 8 is provided that suppresses grinding wheel waste generated during grinding of the workpiece W from entering the base 2. The dust cover 8 is attached to the front and rear surfaces of the table support 4, and is provided so as to be expandable / contractable according to the movement position of the table support 4, and is configured to cover the opening 2 a of the base 2.

チャックテーブル41は、本発明に係る保持手段を構成するものであり、円盤状に形成され、その上面には図中矢印Aが示す方向に搬入されたワークWが保持される保持面41aが形成されている。保持面41aの中央部分には、ポーラスセラミック材により吸着面が形成されている。チャックテーブル41は、基台2内に配置された図示しない吸引源に接続され、保持面41aの吸着面においてワークWを吸着保持する。また、チャックテーブル41は、図示しない回転駆動機構に接続され、この回転駆動機構により保持面41aにワークWを保持した状態で回転される。   The chuck table 41 constitutes a holding means according to the present invention, and is formed in a disk shape. A holding surface 41a for holding a workpiece W carried in the direction indicated by an arrow A in the figure is formed on the upper surface thereof. Has been. An adsorption surface is formed of a porous ceramic material at the central portion of the holding surface 41a. The chuck table 41 is connected to a suction source (not shown) arranged in the base 2 and sucks and holds the workpiece W on the suction surface of the holding surface 41a. Further, the chuck table 41 is connected to a rotation drive mechanism (not shown), and is rotated while the workpiece W is held on the holding surface 41a by the rotation drive mechanism.

支柱部5は、直方体状に設けられ、その前面にはチャックテーブル41の上方において研削ユニット6を移動させる研削ユニット移動機構51が設けられている。研削ユニット移動機構51は、支柱部5に対してボールねじ式の移動機構により上下方向に移動するZ軸テーブル52を有している。Z軸テーブル52には、その前面側に取り付けられた支持部53を介して研削ユニット6が支持されている。   The support column 5 is provided in a rectangular parallelepiped shape, and a grinding unit moving mechanism 51 for moving the grinding unit 6 above the chuck table 41 is provided on the front surface thereof. The grinding unit moving mechanism 51 has a Z-axis table 52 that moves in the vertical direction with respect to the support column 5 by a ball screw type moving mechanism. The grinding unit 6 is supported on the Z-axis table 52 via a support portion 53 attached to the front side thereof.

研削ユニット6は、本発明に係る加工手段を構成するものであり、図示しないスピンドルの下端に着脱自在に装着された研削砥石61を有している。この研削砥石61は、例えば、ダイヤモンドの砥粒をメタルボンドやレジンボンド等の結合剤で固めたダイヤモンド砥石で構成されている。研削ユニット6は、チャックテーブル41の回転方向と同じ方向に研削砥石61を回転させつつ、研削位置に配置されたワークWの表面に研削砥石61を当接させることによって、ワークWの表面に露出した部材を研削加工する。   The grinding unit 6 constitutes processing means according to the present invention, and has a grinding wheel 61 that is detachably attached to a lower end of a spindle (not shown). The grinding wheel 61 is composed of, for example, a diamond grinding stone in which diamond abrasive grains are hardened with a binder such as metal bond or resin bond. The grinding unit 6 is exposed to the surface of the workpiece W by rotating the grinding wheel 61 in the same direction as the rotation direction of the chuck table 41 and bringing the grinding wheel 61 into contact with the surface of the workpiece W arranged at the grinding position. The processed member is ground.

検出部70は、基台2の開口部2aの側方側に立設された逆L字形状のアーム部71と、アーム部71の先端に設けられたレーザヘッド部72とを備える。図2に示すように、検出部70は、レーザヘッド部72からワークWの表面にレーザ光を照射し、ワークWの表面で反射したレーザ光を受光する。   The detection unit 70 includes an inverted L-shaped arm portion 71 erected on the side of the opening 2 a of the base 2, and a laser head portion 72 provided at the tip of the arm portion 71. As shown in FIG. 2, the detection unit 70 irradiates the surface of the work W with laser light from the laser head unit 72 and receives the laser light reflected on the surface of the work W.

レーザヘッド部72は、図3に示すように、ケース721と、分離壁722と、光源とレンズを含む照射系723と、制御部Cに接続されたセンサー724とを備え、ケース721と分離壁722とで囲まれた空間に、ケース721の側面に設けられた給水口725から給水された水を、ケース721下面に設けられた排水口726からワークWの表面に供給しながら、照射系723がワークWの表面にレーザ光を照射するとともにセンサー724で反射光を受光する。そして、制御部Cが、反射光の受光量の変化に基づいてワークW表面に露出した部材を検出する。   As shown in FIG. 3, the laser head unit 72 includes a case 721, a separation wall 722, an irradiation system 723 including a light source and a lens, and a sensor 724 connected to the control unit C. Irradiating system 723 while supplying water supplied from a water supply port 725 provided on the side surface of the case 721 to the surface of the workpiece W from a drainage port 726 provided on the lower surface of the case 721 in a space surrounded by 722. Irradiates the surface of the workpiece W with laser light and receives reflected light with the sensor 724. And the control part C detects the member exposed to the workpiece | work W surface based on the change of the received light quantity of reflected light.

以上のように構成される研削装置1の各構成部の動作を統括的に制御する制御部Cは、研削装置1の動作に必要な各種データを保持するメモリを内蔵したマイクロコンピュータ等で構成される。この制御部Cの制御のもとで、研削装置1は、以下に説明する検出処理を実行する。   The control unit C that comprehensively controls the operation of each component of the grinding device 1 configured as described above is configured by a microcomputer or the like with a built-in memory that holds various data necessary for the operation of the grinding device 1. The Under the control of the control unit C, the grinding device 1 executes a detection process described below.

〔検出処理〕
図3に示すように、検出部70のレーザヘッド部72は、チャックテーブル41の回転に伴って回転するワークWの被研削面に対し、検出光としてのレーザ光を照射するとともに、反射光を受光する。このような処理を、ワークWの構成に応じて、ワークW(チャックテーブル41)の回転軸Lからの距離を適宜に変更し検出の経路を決定して行なう。
[Detection processing]
As shown in FIG. 3, the laser head unit 72 of the detection unit 70 irradiates the ground surface of the workpiece W rotating with the rotation of the chuck table 41 with laser light as detection light and applies reflected light. Receive light. Such processing is performed by appropriately changing the distance from the rotation axis L of the workpiece W (chuck table 41) according to the configuration of the workpiece W and determining the detection path.

ここで、図4および図5を参照して、本実施の形態に係る検出処理手順について説明する。図4は本実施の形態の検出対象としてのワークWを例示する模式図であり、図5は検出処理手順を示すフローチャートである。   Here, a detection processing procedure according to the present embodiment will be described with reference to FIGS. FIG. 4 is a schematic view illustrating a workpiece W as a detection target of the present embodiment, and FIG. 5 is a flowchart showing a detection processing procedure.

図4に示すように、ワークWは、基板上に配設された2種の部材からなり、第一の部材が第二の部材に埋め込まれるように構成されている。例えば第一の部材としてのCuのチップが基板上に配設され、第二の部材としてのモールド樹脂により被覆されている。   As shown in FIG. 4, the workpiece W includes two types of members disposed on the substrate, and is configured such that the first member is embedded in the second member. For example, a Cu chip as a first member is disposed on a substrate and covered with a mold resin as a second member.

このようなワークWの第二の部材を研削して第一の部材が頭出しされた場合に、本実施の形態にかかる検出処理を行なう。例えば、ワークW(チャックテーブル41)を回転させながら図4中矢印Bに示す経路で検出処理を行なうと、検出部70は、周期的に第一の部材からの反射光と第二の部材からの反射光を受光する。ここで、第一の部材での反射率と第二の部材での反射率が異なることから、反射光の強度が周期的に変化する。   When the second member of the workpiece W is ground and the first member is cued, the detection process according to the present embodiment is performed. For example, when the detection process is performed along the path indicated by the arrow B in FIG. 4 while rotating the workpiece W (chuck table 41), the detection unit 70 periodically reflects the reflected light from the first member and the second member. The reflected light is received. Here, since the reflectance of the first member is different from the reflectance of the second member, the intensity of the reflected light changes periodically.

一方、第二の部材の研削が不十分で、第一の部材が頭出しされていない場合や、第一の部材の頭出しが不十分な場合には、同じ経路で検出処理を行なっても、反射光の強度は変化しない。そこで、反射光の強度が変化したことで、第一の部材の頭出しが十分になされたと判断できる。   On the other hand, if the grinding of the second member is inadequate and the first member has not been cueed, or if the cueing of the first member is inadequate, the detection process may be performed along the same path. The intensity of reflected light does not change. Therefore, it can be determined that the first member has been sufficiently cueed because the intensity of the reflected light has changed.

図5に示すフローチャートは、オペレータが操作パネル3を操作して検出処理の実行を指示したタイミングで開始となり、検出処理はステップS1の処理に進む。   The flowchart shown in FIG. 5 starts at the timing when the operator operates the operation panel 3 to instruct the execution of the detection process, and the detection process proceeds to step S1.

ステップS1の処理では、制御部Cは、検出部70の動作を制御して、チャックテーブル41の回転に伴って回転するワークWに対し、レーザ光を照射するとともに反射光を受光して、受光量をメモリに記憶させる。これにより、ステップS1の処理は完了し、検出処理はステップS2の処理に進む。   In the process of step S1, the control unit C controls the operation of the detection unit 70 to irradiate the workpiece W rotating with the rotation of the chuck table 41 with the laser beam and to receive the reflected light. Store the amount in memory. Thereby, the process of step S1 is completed and a detection process progresses to the process of step S2.

ステップS2の処理では、制御部Cは、ステップS1で記憶した受光量を確認し、変化の有無を判断する。変化していない場合には(ステップS2,No)、第一の部材の頭出しは不十分と判断し(ステップS3)、ワークWの研削を続行し(ステップS4)、ステップS1に戻る。一方、変化があった場合には(ステップS2,Yes)、第一の部材の頭出しが完了したと判断し(ステップS5)、研削ユニット6を制御してワークWの研削を停止して(ステップS6)、一連の検出処理を終了する。   In step S2, the control unit C confirms the amount of received light stored in step S1 and determines whether there is a change. If not changed (Step S2, No), it is determined that the first member is not sufficiently positioned (Step S3), the grinding of the workpiece W is continued (Step S4), and the process returns to Step S1. On the other hand, if there is a change (step S2, Yes), it is determined that the cueing of the first member has been completed (step S5), and the grinding unit 6 is controlled to stop grinding the workpiece W ( Step S6), a series of detection processing is terminated.

ここで、具体的に受光量の変化の有無を判断する方法について、図6〜図8を参照して説明する。図6〜図8は、図4のワークWについて図4中矢印Bに示す経路で、受光した反射光の強度データを計測し、データの移動平均値を計算した結果を例示する。図6は、第二の部材の研削が不十分で第一の部材が頭出しされていないワークWについてのものであり、図7は、第二の部材の研削が不十分で第一の部材の頭出しが不十分なワークWについてのものであり、図8は、第二の部材を研削して第一の部材が十分に頭出しされたワークWについてのものである。   Here, a specific method for determining whether there is a change in the amount of received light will be described with reference to FIGS. 6 to 8 illustrate the result of measuring the intensity data of the received reflected light and calculating the moving average value of the data along the path indicated by the arrow B in FIG. 4 for the workpiece W in FIG. FIG. 6 is for a workpiece W in which the second member is not sufficiently ground and the first member is not cued, and FIG. 7 is the first member in which the second member is not sufficiently ground. FIG. 8 is for a workpiece W in which the second member is ground and the first member is sufficiently cueed.

例えば図4のワークWについては、前述のステップS2の受光量の変化があったことを反射光の強度データの移動平均値が、所定の閾値を超えたことで判断し、第一の部材の頭出しが十分になされたと判断できる。閾値については、あらかじめ第一の部材、第二の部材の反射率に基づいて設定する。そうすると、図6、図7では移動平均値が閾値を下回っているので研削は続行される。図8では移動平均値が閾値を上回っているので研削が停止される。   For example, for the workpiece W in FIG. 4, it is determined that the change in the amount of received light in step S <b> 2 described above has occurred because the moving average value of the intensity data of the reflected light has exceeded a predetermined threshold value. It can be judged that the cue has been sufficiently made. About a threshold value, it sets based on the reflectance of a 1st member and a 2nd member previously. Then, in FIG. 6 and FIG. 7, since the moving average value is below the threshold value, grinding is continued. In FIG. 8, since the moving average value exceeds the threshold value, grinding is stopped.

本実施の形態に係る研削処理は、図9に示すような、第一の部材からなるプレートが第二の部材に埋め込まれたワークWにも適用可能である。このようなワークWについて、第一の部材が頭出しされている場合には、上記ステップS1において図中矢印Cに示す経路で検出される受光量は一定になる。そこで、上記ステップS2において、反射光の強度データがあらかじめ第一の部材、第二の部材の反射率に基づいて設定された閾値を超えて変化した場合に、反射光の受光量が変化し第一の部材の頭出しがされたと判断する。   The grinding process according to the present embodiment can also be applied to a workpiece W in which a plate made of a first member is embedded in a second member as shown in FIG. For such a workpiece W, when the first member is cueed, the amount of received light detected along the path indicated by the arrow C in FIG. Therefore, in step S2, when the intensity data of the reflected light changes in excess of a threshold set in advance based on the reflectance of the first member and the second member, the amount of reflected light received is changed. It is determined that one member has been cueed.

以上の説明から明らかなように、本発明の一実施形態である検出処理によれば、検出部70は、第一の部材と第二の部材の反射率の違いにより第二の部材に埋め込まれた第一の部材の頭出しを検出できるので、所定の部材の頭出しを高精度に行なうことができる。   As is clear from the above description, according to the detection process according to an embodiment of the present invention, the detection unit 70 is embedded in the second member due to the difference in reflectance between the first member and the second member. Further, since the cue of the first member can be detected, cueing of the predetermined member can be performed with high accuracy.

1 研削装置
6 研削ユニット
41 チャックテーブル
70 検出部
W ワーク
C 制御部
DESCRIPTION OF SYMBOLS 1 Grinding device 6 Grinding unit 41 Chuck table 70 Detection part W Work C Control part

Claims (1)

ワークを保持する保持面が形成された保持手段と、該保持手段に保持されたワークを研削加工する加工手段と、該加工手段の動きを制御する制御手段とを有する研削装置であって、
前記ワークは、反射率が第一の反射率である第一部材と、該第一の部材を被覆した反射率が第二の反射率である第二部材で構成され、
該制御手段は、研削中の前記ワークの被研削面に検出光を照射して被研削面からの反射光を受光する検出部を有し、該検出部で検出された受光量に基づいて該第二の部材に覆われた該第一の部材が露出したと判断した際に、前記ワークの研削を停止することを特徴とする研削装置。
A grinding apparatus having a holding means formed with a holding surface for holding a work, a processing means for grinding the work held by the holding means, and a control means for controlling the movement of the processing means,
The workpiece is composed of a first member whose reflectivity is the first reflectivity and a second member whose reflectivity covering the first member is the second reflectivity,
The control means has a detection unit that irradiates the surface to be ground of the workpiece being ground with detection light and receives reflected light from the surface to be ground, and based on the amount of received light detected by the detection unit A grinding apparatus characterized by stopping grinding of the workpiece when it is determined that the first member covered by the second member is exposed.
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